WO2016098329A1 - Dispositif d'affichage et procédé permettant de fabriquer un dispositif d'affichage - Google Patents

Dispositif d'affichage et procédé permettant de fabriquer un dispositif d'affichage Download PDF

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Publication number
WO2016098329A1
WO2016098329A1 PCT/JP2015/006189 JP2015006189W WO2016098329A1 WO 2016098329 A1 WO2016098329 A1 WO 2016098329A1 JP 2015006189 W JP2015006189 W JP 2015006189W WO 2016098329 A1 WO2016098329 A1 WO 2016098329A1
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Prior art keywords
layer
light
region
display body
pixel region
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PCT/JP2015/006189
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English (en)
Japanese (ja)
Inventor
雅史 川下
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凸版印刷株式会社
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Priority claimed from JP2014253158A external-priority patent/JP6596820B2/ja
Priority claimed from JP2014253159A external-priority patent/JP6672585B2/ja
Application filed by 凸版印刷株式会社 filed Critical 凸版印刷株式会社
Publication of WO2016098329A1 publication Critical patent/WO2016098329A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
    • B32B3/12—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material characterised by a layer of regularly- arranged cells, e.g. a honeycomb structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F19/00—Advertising or display means not otherwise provided for
    • G09F19/12—Advertising or display means not otherwise provided for using special optical effects

Definitions

  • the present invention relates to a display body using structural color development and a manufacturing method thereof.
  • Patent Document 1 discloses a technique related to a wavelength selection element using guided mode resonance.
  • the present invention provides the following display body in order to solve this problem.
  • a waveguide layer and a lattice layer are sequentially stacked on the surface side of the base material.
  • An absorption layer is formed on the back side of the base material or between the surface of the base material and the waveguiding layer.
  • the grating layer has a pixel region in which light diffracted by the diffraction grating structure and light propagating through the waveguide layer resonate and light in the resonance wavelength region is reflected.
  • the low-reflective pixel region made up of an assembly of concavo-convex structures that reduce surface reflection is provided in the region excluding.
  • the absorption layer absorbs at least light in the resonance wavelength region.
  • the inversion structure of the diffraction grating structure is formed in a region corresponding to the pixel region, and the region corresponding to the low reflection pixel region is the above.
  • An inversion structure of the concavo-convex structure in the low reflection pixel region is formed, and a ratio of a difference in the concave portion volume of the inversion structure of the concavo-convex structure in the low reflection pixel region to a concave volume of the inversion structure in the low reflection pixel region is 10% or less
  • an absorption layer that absorbs light in a wavelength region that is reflected by guided mode resonance is formed in a display body, and a concavo-convex structure that reduces surface reflection in a portion that is not represented by a pattern is formed.
  • the symbol is expressed using the guided mode resonance, there is an effect that the high-contrast symbol including black can be expressed. That is, according to one embodiment of the present invention, even a display body using a waveguide mode resonance grating can express high color contrast including black.
  • a pixel includes the meaning of a unit (dot) for performing a minimum drawing expression on a printed matter or the like.
  • sub-pixel refers to a plurality of pixels forming a single pixel (such as a single color dot finer than the pixel), such as RGB regions in a color filter or the like.
  • a single pixel such as a single color dot finer than the pixel
  • RGB regions in a color filter or the like.
  • FIG. 1 is a schematic cross-sectional view of a pixel or subpixel using guided mode resonance according to a first embodiment of the present invention.
  • a waveguide layer 21 is formed on the surface of the substrate 11
  • a grating layer 31 is formed on the surface of the waveguide layer 21, and a diffraction grating is formed in the pixel region 51 of the grating layer 31.
  • a structure is formed, and an absorption layer 41 made of a material that absorbs light in the visible light wavelength region is formed on the back surface of the substrate 11.
  • the base material 11 and the absorption layer 41 do not need to be in complete contact with each other, and the absorption layer 41 only needs to exist on the back side of the substrate.
  • the waveguide layer 21 and the grating layer 31 are transmissive to the visible light wavelength region, the waveguide layer 21 is made of a material having a higher refractive index than that of the substrate 11, and the grating layer 31 is formed of the waveguide layer 21. And the light diffracted by the diffraction grating structure formed in the pixel region 51 of the grating layer 31 and the light propagating through the waveguide layer 21 in a single mode are resonant. Then, it is taken out as reflected light from the surface of the display body.
  • a structure in which the waveguide layer 21 and the grating layer 31 satisfying such material characteristics are combined is referred to as a “guided mode resonance grating layer” in the first embodiment.
  • the resonance wavelength region by the waveguide mode resonance grating layer is determined by the structural period of the diffraction grating structure formed on the surface and the film thickness of the waveguide layer 21.
  • the resonance wavelength is reflected in the pixel region 51, and light outside the resonance wavelength region is transmitted through the substrate 11 and absorbed by the absorption layer 41. Therefore, only the color of the reflected resonance wavelength region is visually recognized with high contrast by the human eye.
  • the reflection contrast of the pixel region 51 can be adjusted by adjusting the visible light absorption rate of the absorption layer 41.
  • the waveguide mode resonance phenomenon does not occur because there is no diffraction grating structure, and incident light is transmitted through the grating layer 31, the waveguide layer 21, and the substrate 11, and is absorbed by the absorption layer 41. Absorbed.
  • the grating layer 31 is desirably 500 nm or less in order to propagate light in the visible light wavelength region in a single mode
  • the base material is made of a material having a different refractive index with respect to the visible light wavelength region. 11 and the waveguide layer 21 cause an interference phenomenon due to light reflected at the interface.
  • the lattice layer 31 is made of a material different from that of the waveguide layer 21, an interference phenomenon occurs similarly.
  • a thin film interference phenomenon occurs if the refractive index for the absorption layer 41 and the visible light wavelength region are different.
  • the substrate 11 is at least on the order of ⁇ m, the thin film interference phenomenon due to the substrate 11 can be ignored.
  • white light is absorbed by the absorption layer 41 in the region excluding the pixel region 51, but light reflected at the interface of each layer before reaching the absorption layer 41 causes a thin film or multilayer film interference phenomenon.
  • the wavelength dependence of the reflection intensity is increased. As a result, since the color is visually recognized by the human eye, it is difficult to express black with high contrast.
  • the pixel region 52 of the lattice layer 32 or the pixel region 53 of the lattice layer 33 is not formed as shown in FIG.
  • a low reflection pixel region 61 or 62 having an uneven structure in the region is formed.
  • the surface reflection of the region (the low reflection pixel region 61 or 62) where the pixel region 52 of the lattice layer 32 or the pixel region 53 of the lattice layer 33 is not formed is suppressed.
  • the uneven structure formed in the low reflection pixel region may be a structure design that suppresses surface reflection.
  • the uneven structure formed in the low reflection pixel region 61 shown in FIG. 1B is a diffraction grating structure with a constant period.
  • the structure period of the above diffractive structure is larger than, for example, the visible light wavelength, visible light is visually recognized regardless of whether the display body is observed from the surface or from an oblique direction due to the diffraction phenomenon on the surface of the diffraction grating structure. End up. Further, if the structural period of the diffractive structure is the same as the structural period of the waveguide mode resonance grating layer formed in the pixel region 52, a waveguide mode resonance phenomenon occurs, and the observation is performed at an angle satisfying the resonance condition. Then, the light having the resonated wavelength is reflected. Therefore, the structural period of the diffractive structure formed in the low reflection pixel region 61 is smaller than the visible light wavelength region, and smaller than the structural cycle of the waveguide mode resonance grating layer having a resonance wavelength in the visible light wavelength region. There must be.
  • the diffraction grating structure formed in the low-reflection pixel region 61 has a constant period, even if the structure period is small, when viewed from an oblique direction, the color may be visually recognized by the naked eye due to a diffraction phenomenon. Therefore, by providing a plurality of structural periods as the concavo-convex structure formed in the low reflection pixel region 61, the diffraction effect of a specific wavelength can be reduced, and the low reflection effect by the concavo-convex structure can be enhanced. Further, the most preferable uneven structure formed in the low-reflection pixel region 61 is an uneven structure having no periodicity.
  • an assembly of protrusion structures represented by eyelids may be used.
  • the structural period is smaller than the visible light wavelength region, and further smaller than the structural period of the waveguide mode resonant grating layer having a resonance wavelength in the visible light wavelength region.
  • a reflection suppressing effect is obtained.
  • the presence of a plurality of structural periods also increases the reflection suppression effect.
  • each layer is sequentially formed on the front surface or the back surface of the base material 11 using a known film formation method such as sputtering, and thereafter
  • the lattice layer 32 or 33 may be processed into a desired shape by a known fine processing technique such as charged particle beam lithography and plasma etching. More specifically, a reversal structure of the diffraction grating structure is formed in a region corresponding to the pixel regions 52 and 53, and a reversal structure of the uneven structure of the low reflection pixel regions 61 and 62 is formed in a region corresponding to the low reflection pixel regions 61 and 62.
  • a charged particle beam lithography resist can be applied as the lattice layer.
  • the waveguide layer 21 is made of an insulating material, if the concavo-convex structure to be formed can be resolved by, for example, ultraviolet lithography, the optical lithography required if the optical characteristics required for the lattice layer 32 or 33 are satisfied. It is also possible to apply the resist for use as a lattice layer.
  • thermoplastic resin or thermosetting It is also possible to apply a curable resin or an ultraviolet curable resin to the lattice layer 32 or 33.
  • nanoimprint lithography is applied, a residual film peculiar to the process is generated, which needs to be removed by plasma exposure. In this case, the material forming the waveguide layer 21 needs to be resistant to the remaining film removal conditions.
  • FIG. 2 is a schematic cross-sectional view of a pixel or sub-pixel using guided mode resonance according to the second embodiment of the present invention.
  • the absorption layer 42 is formed on the surface of the substrate 12.
  • a material that absorbs light in the visible light wavelength region such as carbon or iron oxide can be applied, but the refractive index of these materials in the visible light wavelength region is as high as 2 or more. Therefore, a low refractive index layer 71 is formed on the surface of the absorption layer 42 in order to generate a waveguide mode resonance phenomenon.
  • a waveguide mode resonance grating layer 81 having a diffraction grating structure formed in the pixel region 54 is formed on the surface of the low refractive index layer 71.
  • the waveguide mode resonance grating layer 81 has a structure in which a diffraction grating structure that diffracts light and a waveguide layer through which diffracted light propagates are formed of a single material.
  • the low-refractive index layer 71 and the waveguide mode resonance grating layer 81 are made of a material that transmits light in the visible light wavelength region, but the waveguide mode resonance grating layer 81 is more visible than the low refractive index layer 71.
  • the region is made of a material having a high refractive index for light.
  • the resonant wavelength is reflected, and light other than the resonant wavelength is transmitted through the low refractive index layer 71 and absorbed by the absorption layer 42. Therefore, only the color of the reflected resonance wavelength is visually recognized with high contrast by the human naked eye.
  • the reflection contrast of the pixel region 54 can be adjusted by adjusting the absorption factor of visible light by the absorption layer 42 described above.
  • incident light passes through the waveguide mode resonance grating layer 81 and the low refractive index layer 71 where the diffraction grating structure is not formed, and is absorbed by the absorption layer 42.
  • the waveguide mode resonance grating layer 81, the low refractive index layer 71, and the absorption layer 42 are made of different materials, reflection occurs at each interface. A thin film or multilayer film interference phenomenon occurs, and the color due to the interference is visually recognized by the human eye.
  • the pixel region 55 of the waveguide mode resonance grating layer 82 or the pixels of the waveguide mode resonance grating layer 83 In order to prevent visual recognition of the color due to the interference described above, for example, as shown in FIGS. 2B and 2C, the pixel region 55 of the waveguide mode resonance grating layer 82 or the pixels of the waveguide mode resonance grating layer 83.
  • a low reflection pixel region 63 or 64 having an uneven structure is formed in a region where the region 56 is not formed.
  • the pixel region 55 of the waveguide mode resonance grating layer 82 or the pixel region 56 of the waveguide mode resonance grating layer 83 is not formed (the low reflection pixel region 63 or 64). Surface reflection can be suppressed.
  • the film thickness of the low refractive index layer 71 be 30 nm or less, or 5 ⁇ m or more.
  • the uneven structure formed in the low reflection pixel region 63 or 64 may be a structure design that suppresses surface reflection.
  • the uneven structure formed in the low reflection pixel region 63 shown in FIG. 2B is a diffraction grating structure with a constant period.
  • the structure period of the above diffractive structure is larger than, for example, the visible light wavelength, visible light is visually recognized regardless of whether the display body is observed from the surface or from an oblique direction due to the diffraction phenomenon on the surface of the diffraction grating structure. End up. Further, if the structural period of the diffractive structure is the same as the structural period of the waveguide mode resonance grating layer 82 formed in the pixel region 55, a waveguide mode resonance phenomenon occurs and the angle satisfies the resonance condition. When observed, light having a resonated wavelength is reflected.
  • the structural period of the diffractive structure formed in the low reflection pixel region 63 is smaller than the structural period of the waveguide mode resonant grating layer 82 having a smaller resonant wavelength in the visible light wavelength region and having a resonance wavelength in the visible light wavelength region. It needs to be small. However, when the diffraction grating structure formed in the low reflection pixel region 63 has a constant period, even if the structure period is small, the color may be visually perceived by the diffraction phenomenon when observed from an oblique direction.
  • the concavo-convex structure formed in the low reflection pixel region 63 by providing a plurality of structural periods as the concavo-convex structure formed in the low reflection pixel region 63, the diffraction effect of a specific wavelength can be reduced, and the low reflection effect by the concavo-convex structure can be enhanced. Furthermore, the most preferable uneven structure formed in the low-reflection pixel region 63 is an uneven structure having no periodicity. As a structural design for suppressing surface reflection, an assembly of protrusion structures represented by eyelids may be used.
  • the structural period is smaller than the visible light wavelength region and further smaller than the structural period of the waveguide mode resonant grating layer 83 having a resonance wavelength in the visible light wavelength region, but constant even if larger.
  • the antireflection effect can be obtained.
  • the reflection suppressing effect is enhanced by the presence of a plurality of structural periods.
  • each layer is sequentially formed on the surface of the substrate 12 using a known film formation method such as sputtering, and then, for example,
  • the surface of the waveguide mode resonance grating layer 82 or 83 may be processed into a desired shape by known fine processing techniques such as charged particle beam lithography and plasma etching.
  • the material of the waveguide mode resonance grating layer 82 or 83 is made of a thermoplastic resin, a thermosetting resin, or an ultraviolet curable resin that satisfies the optical characteristics required for the waveguide mode resonance grating layer 82 or 83.
  • the waveguide mode resonance grating layer 82 or 83 is formed by nanoimprint lithography using a resin, a residual film unique to the process can be used as the waveguide layer. For this reason, a display body manufacturing process can be simplified.
  • the remaining film thickness formed in the nanoimprint lithography process varies depending on the volume of the convex part or concave part of the concavo-convex structure. Therefore, when the pixel region 55 or 56 shown in FIG. 2B or FIG. 2C and the low reflection pixel region 63 or 64 are collectively formed by thermal or ultraviolet nanoimprint lithography, the pixel region 55 or 56, if the volume of the convex portion or concave portion of the low reflection pixel region 63 or the volume of the convex portion or concave portion of the low reflection pixel region 64 is greatly different, the remaining film thickness of the pixel region 55 or 56 is reduced to the low reflection pixel region 63 or 64. As a result, the waveguide mode resonance condition is not satisfied, and a display body that reflects desired light cannot be obtained.
  • the structure period is 360 nm
  • the structure height is 250 nm
  • the fill factor obtained by dividing the convex portion by the structure period is 0.5
  • the remaining film thickness the waveguide mode resonance grating layer 83 having a waveguide layer thickness of 100 nm is formed
  • the low-reflective pixel region 64 is designed so that square pyramidal projection structures having a structure period of 200 nm are arranged in a square arrangement without gaps.
  • the structure height of the quadrangular pyramidal protrusion structure formed in the low reflection pixel region 64 is set to the pixel region 56.
  • the convex volume of the quadrangular pyramidal protrusion structure formed in the low reflection pixel region 64 is the same as that of the diffractive structure formed in the pixel region 56. 2/3 of the convex volume.
  • the low reflection pixel area 64 In order to make the convex volume of the quadrangular pyramidal projection structure formed in the low reflection pixel area 64 equal to the convex volume of the diffractive structure formed in the pixel area 56, the low reflection pixel area
  • the structure height of the quadrangular pyramidal protrusion structure formed in 64 must be 375 nm, the total height of the structure height of the diffractive structure formed in the pixel region 56 and the thickness of the waveguide layer exceeds 350 nm. It is difficult to form a batch by the method. If the structure height of the quadrangular pyramidal protrusion structure formed in the low reflection pixel region 64 is 340 nm, the remaining film thickness is about 10 nm, and batch formation by the nanoimprint method is possible.
  • the convex volume difference between the pixel region 56 and the low reflection pixel region 64 is about 10%. Furthermore, by making the shape of the protruding structure bell-shaped, it is possible to make the convex volume of the pixel region 56 and the low reflection pixel region 64 equal even if the height of the protruding structure is 250 nm. From the above, when the waveguide mode resonance grating layer 82 or 83 of the display body shown in FIG. 2B or FIG. 2C is collectively formed by the nanoimprint method, the pixel region 55 or 56 and the low reflection are obtained. It is preferable that the volume of the convex portion or concave portion of the pixel region 63 or the convex portion or concave portion of the low reflection pixel region 64 is equal.
  • the low reflection pixel region 64 in which the protrusion structures are arranged preferably has a bell shape.
  • batch formation by nanoimprinting is possible even when there is a difference in volume between the pixel region 55 or 56 and the convex or concave portion of the low reflective pixel region 63 or the convex or concave portion of the low reflective pixel region 64, or Range satisfying the resonance condition of the light propagating through the waveguide layer having the remaining film thickness as the remaining film and the light in the visible light wavelength region diffracted by the diffractive structure formed in the pixel region 55 or 56 described above. If so, the present invention is applicable.
  • the first and second embodiments of the present invention have been described in detail. However, in practice, the present invention is not limited to the above-described embodiments, and there are changes in the scope that do not depart from the gist of the present invention. Are also included in the present invention.
  • FIG. 3 is a schematic view of a display body manufactured in an example according to one embodiment of the present invention.
  • A is the top view which looked at the display body from right above
  • (b) is the figure which showed the cross section typically.
  • an ultraviolet nanoimprint method using ultraviolet light as a light source is employed, but a thermal nanoimprint method using a thermoplastic resin or a thermosetting resin may be applied as long as the refractive index of the material satisfies the conditions.
  • a synthetic quartz mold synthetic quartz mold for ultraviolet nanoimprinting
  • synthetic quartz mold is the structure where the unevenness
  • a region corresponding to the diffraction grating structure formation region 59a has a structure period of 360 nm, a structure height of 250 nm, a concavo-convex size ratio of 1: 1, and a rectangular shape.
  • an inverted pattern of a bell-shaped structure having a structure period of 200 nm and a structure height of 250 nm was formed in the low reflection pixel region 65, respectively. Since the pattern shape is greatly different between the diffraction grating pattern and the inverted structure of the bell-shaped structure, the pattern formation on the synthetic quartz mold is performed for the diffraction grating pattern and the inverted pattern of the bell-shaped structure, respectively. Individual charged particle beam lithography and plasma etching were performed. Optool (manufactured by Daikin Industries) was applied as a release agent to the surface of the synthetic quartz mold.
  • a synthetic quartz substrate 13 was prepared, and carbon was vapor-deposited on the back surface while half the area was masked to form a carbon film 43 in the back surface black region 91.
  • the film thickness was 1 ⁇ m.
  • a synthetic quartz substrate 13 having a carbon film 43 formed on the back half thereof is coated with a photocurable resin MUR (manufactured by Maruzen Petrochemical Co., Ltd.) having a thickness of 225 nm and a release agent is applied.
  • the mold surface was brought into contact and a pressure of 2 MPa was applied.
  • UV ultraviolet light
  • UV ultraviolet light having a wavelength of 365 nm
  • This treatment was performed at room temperature, and the exposure amount of ultraviolet light was 100 mJ / cm 2 .
  • the synthetic quartz substrate 13 was peeled off from the synthetic quartz mold to obtain the display shown in FIG. A white paper was laid under the display body thus obtained and observed from the front under natural light.
  • an interference color in which red and blue were mixed was visually recognized by the human eye.
  • the interference color was hardly visually recognized, and it was confirmed to be black.
  • FIG. 4 is a schematic cross-sectional view of a pixel or subpixel using guided mode resonance according to the third embodiment of the present invention.
  • the waveguide layer 21 is formed on the surface of the base material 11
  • the grating layer 34 is formed on the surface of the waveguide layer 21, and a diffraction grating is formed in the pixel region 57 of the grating layer 34.
  • a structure is formed, and an absorption layer 41 made of a material that absorbs light in the visible light wavelength region is formed on the back surface of the substrate 11.
  • the base material 11 and the absorption layer 41 do not need to be in complete contact, and the absorption layer 41 only needs to exist on the back side of the substrate.
  • the base material 11 the waveguide layer 21, the grating layer 34, the pixel region 57, the diffraction grating structure formed in the pixel region 57, the function and material of the absorption layer 41, the first embodiment and the second embodiment. Therefore, detailed description thereof is omitted here.
  • the waveguide layer 21 and the grating layer 34 are transmissive with respect to the visible light wavelength region, the waveguide layer 21 is made of a material having a higher refractive index than that of the substrate 11, and the grating layer 34 is formed of the waveguide layer 21. And the light diffracted by the diffraction grating structure formed in the pixel region 57 of the grating layer 34 and the light propagating in the single mode through the waveguide layer 21 are resonant. Then, it is taken out as reflected light from the surface of the display body.
  • the structure in which the waveguide layer 21 and the grating layer 34 satisfying such material characteristics are combined is referred to as a “guided mode resonance grating layer” as in the first embodiment.
  • the resonance wavelength region by the waveguide mode resonance grating layer is determined by the structural period of the diffraction grating structure formed on the surface and the film thickness of the waveguide layer 21.
  • the waveguide mode resonance grating layer When white light is incident on the waveguide mode resonance grating layer, light in the resonance wavelength region is reflected in the pixel region 57, and light other than the resonance wavelength region is transmitted through the substrate 11 and absorbed by the absorption layer 41. Is done. Therefore, only the color of the reflected resonance wavelength region is visually recognized with high contrast by the human eye. Furthermore, the reflection contrast of the pixel region 57 can be adjusted by adjusting the visible light absorption rate by the absorption layer 41. On the other hand, in a region other than the pixel region 57, since there is no diffraction grating structure, a waveguide mode resonance phenomenon does not occur, and incident light is transmitted through the grating layer 34, the waveguide layer 21, and the base material 11, Absorbed.
  • the grating layer 34 is desirably 500 nm or less, and thus the base material 11 made of a material having a different refractive index with respect to the visible light wavelength region and In the waveguide layer 21, an interference phenomenon due to light reflected at the interface occurs. Further, when the grating layer 34 is made of a material different from that of the waveguide layer 21, an interference phenomenon occurs as described above. Further, when the thickness of the substrate 11 is sufficiently thin, a thin film interference phenomenon occurs if the refractive index for the absorption layer 41 and the visible light wavelength region are different. However, if the substrate 11 is at least on the order of ⁇ m, the interference phenomenon due to the substrate 11 can be ignored.
  • the buffer layer 101 that transmits light in the visible light wavelength region is formed below the waveguide layer 21.
  • the multilayer buffer layer 111 is formed, and the interference phenomenon due to the buffer layer 101 or the multilayer buffer layer 111 is given.
  • the reflection spectrum observed on the surface of the region excluding the pixel region 57 can be changed, and as a result, the wavelength dependence of the reflection intensity can be reduced, and a display body capable of high contrast color expression can be obtained. Can do.
  • the buffer layer 101 When the buffer layer 101 is formed between the base material 11 and the waveguide layer 21 as shown in FIG. 4B, in order to satisfy the waveguide mode resonance condition in the pixel region 57, the buffer layer 101 is formed.
  • the refractive index with respect to the visible light wavelength region of the constituent material (the material constituting the outermost surface of the buffer layer 101 when the composition changes with respect to the film thickness as the buffer layer 101 is an inclined film) is the waveguide layer 21.
  • the refractive index for the visible light wavelength region of the material forming the film needs to be smaller.
  • the refractive index with respect to the visible light wavelength region of the material constituting the buffer layer 101 is higher than the refractive index with respect to the visible light wavelength region of the material constituting the base material 11, it is observed in the region excluding the pixel region 57.
  • the wavelength dependence of the reflection intensity of the reflection spectrum can be reduced.
  • the intensity of light reflected by the waveguide mode resonance Tend to be relatively weak.
  • the multilayer buffer layer 111 is composed of a laminate of at least two layers, each layer is composed of a material that transmits light in the visible light wavelength region, and adjacent layers have different refractive indices with respect to the visible light wavelength region. Composed of materials.
  • the outermost layer of the multilayer buffer layer 111 needs to be made of a material having a refractive index smaller than that of the material forming the waveguide layer 21 with respect to the visible light wavelength region.
  • the multilayer layer including the lattice layer 34, the waveguide layer 21, the base material 11 depending on the film thickness, and the multilayer buffer layer 111 described above By designing the refractive index and film thickness of the material constituting each layer of the multilayer buffer layer 111 to an appropriate value, the wavelength dependence of the reflection intensity due to the multilayer buffer is reduced, and the pixel region In a region excluding 57 and a region where the absorption layer 41 exists on the back surface side of the base material 11, high contrast black expression is possible. Since the method for manufacturing the display body shown in FIG. 4B or 4C has been described in the first embodiment, detailed description thereof is omitted here.
  • FIG. 5 is a schematic cross-sectional view of a pixel or sub-pixel using guided mode resonance according to the fourth embodiment of the present invention.
  • the absorption layer 42 is formed on the surface of the base material 12.
  • the absorbing layer 42 may be made of a material that absorbs light in the visible light wavelength region, such as carbon or iron oxide, but the refractive index of these materials in the visible light wavelength region is as high as 2 or more. Therefore, a low refractive index layer 71 is formed on the surface of the absorption layer 42 in order to generate a waveguide mode resonance phenomenon.
  • a waveguide mode resonance grating layer 84 in which a diffraction grating structure is formed in the pixel region 58 is formed on the surface of the low refractive index layer 71.
  • the waveguide mode resonant grating layer 84 has a structure in which a diffraction grating structure that diffracts light and a waveguide layer that propagates diffracted light are formed of a single material.
  • the low refractive index layer 71 and the waveguide mode resonance grating layer 84 are made of a material that transmits light in the visible light wavelength region, and the waveguide mode resonance grating layer 84 is more visible than the low refractive index layer 71. And a material having a high refractive index with respect to light.
  • the pixel region 58 in which the diffraction grating structure is formed In the pixel region 58 in which the diffraction grating structure is formed, light in the resonance wavelength region is reflected, and light outside the resonance wavelength region passes through the low refractive index layer 71 and is absorbed by the absorption layer 42. Therefore, only the color of the reflected resonance wavelength region is visually recognized with high contrast by the human eye. Furthermore, the reflection contrast of the pixel region 58 can be adjusted by adjusting the visible light absorption rate by the absorption layer 42. On the other hand, in the region excluding the pixel region 58, incident light passes through the waveguide mode resonance grating layer 84 and the low refractive index layer 71 where the diffraction grating structure is not formed, and is absorbed by the absorption layer 42.
  • the waveguide mode resonance grating layer 84, the low refractive index layer 71, and the absorption layer 42 are made of different materials, reflection occurs at each interface. As a result, a thin film or multilayer film interference phenomenon occurs, and the color caused by the interference is visually recognized by the human naked eye.
  • the film thickness of the low refractive index layer 71 when the film thickness of the low refractive index layer 71 is in the visible light wavelength region or less, the color due to interference appears remarkably. Therefore, the influence of the low refractive index layer 71 can be reduced by setting the film thickness of the low refractive index layer 71 to about 10 ⁇ m, for example.
  • the reflection spectrum observed on the surface of the region excluding the pixel region 58 has a large wavelength dependency of the reflection intensity. Since the color is visually recognized, it is difficult to express black.
  • a buffer that transmits light in the visible light wavelength region below the waveguide mode resonance grating layer 84 In order to prevent the color from being visually recognized due to the interference described above, for example, as shown in FIG. 5B and FIG. 5C, a buffer that transmits light in the visible light wavelength region below the waveguide mode resonance grating layer 84.
  • the reflection spectrum observed on the surface of the region excluding the pixel region 58 is changed by forming the layer 102 or the multilayer buffer layer 112 and applying the interference phenomenon due to the buffer layer 102 or the multilayer buffer layer 112 described above.
  • the wavelength dependence of the reflection intensity can be reduced, and a display body capable of high contrast color expression can be obtained.
  • a buffer is used.
  • the refractive index of the material composing the layer 102 (the material composing the outermost surface of the buffer layer 102 when the composition of the buffer layer 102 is changed with respect to the film thickness like a tilted film) with respect to the visible light wavelength region is
  • the refractive index of the material forming the wave mode resonance grating layer 84 needs to be smaller than the refractive index with respect to the visible light wavelength region.
  • the refractive index with respect to the visible light wavelength region of the material constituting the buffer layer 102 is higher than the refractive index with respect to the visible light wavelength region of the material constituting the absorbing layer 42, it is observed in the region other than the pixel region 58.
  • the wavelength dependence of the reflection intensity of the reflection spectrum can be reduced.
  • the difference in the refractive index with respect to the visible light wavelength region from the material constituting the waveguide mode resonance grating layer 84 is reduced by forming the buffer layer 102, so that reflection is caused by the waveguide mode resonance.
  • the light intensity tends to be relatively weak.
  • the multilayer buffer layer 112 is composed of a laminate of at least two layers, each layer is composed of a material that transmits light in the visible light wavelength region, and adjacent layers have different refractive indexes with respect to the visible light wavelength region. Composed of materials.
  • the outermost layer of the multilayer buffer layer 112 needs to be made of a material having a refractive index smaller than that of the waveguide mode resonance grating layer 84 with respect to the visible light wavelength region.
  • a multilayer film composed of a waveguide mode resonance grating layer 84, a low refractive index layer 71 depending on the film thickness, and the multilayer buffer layer 112 described above. be able to.
  • the refractive index and the film thickness of the material constituting each layer of the multilayer buffer layer 112 are designed to appropriate values, the wavelength dependence of the reflection intensity due to the multilayer buffer is alleviated, and the pixel region 58 is excluded.
  • high contrast black expression is possible. Since the method for manufacturing the display body shown in FIG. 5B or 5C has been described in the second embodiment, detailed description thereof is omitted here.
  • FIG. 6 is a schematic view of a display body manufactured in an example according to one embodiment of the present invention.
  • A is the top view which looked at the display body from right above
  • (b) is the figure which showed the cross section typically.
  • an ultraviolet nanoimprint method using ultraviolet light as a light source is employed, but a thermal nanoimprint method using a thermoplastic resin or a thermosetting resin may be applied as long as the refractive index of the material satisfies the conditions.
  • a synthetic quartz mold synthetic quartz mold for ultraviolet nanoimprinting
  • synthetic quartz mold is the structure where the unevenness
  • a pattern was formed. Pattern formation on the synthetic quartz mold was performed by charged particle beam lithography and plasma etching. Optool (manufactured by Daikin Industries) was applied as a release agent to the surface of the synthetic quartz mold.
  • a synthetic quartz substrate 13 was prepared, carbon was vapor-deposited on the back surface in a state where half the area was masked, and a carbon film 43 was formed on the back half (back surface black region 91).
  • the film thickness was 1 ⁇ m.
  • an aluminum oxide film with a film thickness of 15 nm, a silicon dioxide film with a film thickness of 25 nm, an aluminum oxide film with a film thickness of 15 nm, and an aluminum oxide film with a film thickness of 10 nm are formed on the surface of the synthetic quartz substrate 13 having the carbon film 43 formed on the back half thereof.
  • a silicon dioxide film was sequentially formed by reactive sputtering to form a multilayer buffer layer 113.
  • the refractive index in the visible light wavelength region of the aluminum oxide film formed by reactive sputtering was about 1.7, and the refractive index in the visible light wavelength region of the aluminum oxide film was about 1.4.
  • a photocurable resin MUR manufactured by Maruzen Petrochemical Co., Ltd.
  • a photocurable resin MUR manufactured by Maruzen Petrochemical Co., Ltd.
  • UV ultraviolet light
  • UV ultraviolet light
  • This treatment was performed at room temperature, and the exposure amount of ultraviolet light was 100 mJ / cm 2 .
  • the synthetic quartz substrate 13 was peeled off from the above synthetic quartz mold to obtain the display shown in FIG. A white paper was laid under the display body thus obtained and observed from the front under natural light.
  • the color due to the thin film interference of the photocurable resin MUR layer 85 is hardly visible, and the display body having the same configuration excluding the multilayer buffer layer 113
  • the black contrast was greatly improved compared to Further, in the region where the back surface black region 91 is not formed and the region other than the diffraction grating structure forming region 59b, the color due to the thin film interference of the photocurable resin MUR layer 85 is not visually recognized, and a high contrast white color is observed. It was done.
  • the green contrast in the back surface black region 91 is very high. It was done. Therefore, another synthetic quartz substrate was prepared, only the film thickness of the carbon film was changed to 50 nm, and a display body was produced in the same process as the synthetic quartz substrate 13. As a result, it was confirmed that even in a display body having a carbon film thickness of 50 nm, the green contrast is increased due to the presence of the carbon film on the back surface in the diffraction grating structure formation region 59b.
  • the contrast was lowered due to the difference in the light absorption rate in the visible light wavelength region due to the thinning of the carbon film. Therefore, it was confirmed that the contrast of the reflected color can be changed by changing the absorptance of the visible light wavelength region light absorption layer, even if the diffraction structure having the same structural period is formed.
  • the invention according to this embodiment has the following effects.
  • the waveguide layer 21 and the lattice layers 31 to 33 are sequentially laminated on the front surface side of the base material 11, and the absorption layer 41 is formed on the back surface side of the base material 11.
  • the grating layers 31 to 33 have pixel regions 51 to 53 in which light diffracted by the diffraction grating structure and light propagating through the waveguide layer 21 resonate and light in the resonance wavelength region is reflected.
  • the regions other than the pixel regions 52 and 53 have low-reflection pixel regions 61 and 62 made of an assembly of uneven structures that reduce surface reflection, and the absorption layer 41 absorbs light in at least the resonance wavelength region.
  • waveguide mode resonance grating layers 81 to 83 having a structure in which the waveguide layer 21 and the grating layers 31 to 33 are combined are formed on the surface side of the substrate 12.
  • An absorption layer 42 is formed between the surface of the material 12 and the waveguide mode resonance grating layers 81 to 83.
  • the waveguide mode resonance grating layers 81 to 83 include the light diffracted by the diffraction grating structure and the waveguide mode. Resonating with the light propagating through the waveguide layer 21 of the resonant grating layers 81-83, the pixel regions 54-56 are reflected and the light in the resonance wavelength region is reflected.
  • the low-reflection pixel regions 63 and 64 are formed of an aggregate of uneven structures that reduce reflection, and the absorption layer 42 absorbs light in at least the resonance wavelength region.
  • the absorption layers 41 and 42 that absorb light in the wavelength region reflected by the guided mode resonance are formed, and the concavo-convex structure that reduces the surface reflection is formed in a portion that is not represented by a pattern.
  • high-contrast design including black is possible when design is represented using guided mode resonance. That is, with such a configuration, even a display body using a waveguide mode resonance grating can express high color contrast including black.
  • the waveguide layer 21 is made of a material having a higher refractive index with respect to the wavelength of light than the lower layer adjacent to the waveguide layer 21, and the lattice layers 31 to 33 are made of the waveguide layer 21. Compared with, it may be made of a material whose refractive index with respect to the wavelength of light is equal to or less. With such a configuration, reflected light can be efficiently extracted from the surface of the display body.
  • the structure period of the concavo-convex structure of the low reflection pixel regions 61 to 64 may be made smaller than the structure period of the diffraction grating structure of the pixel regions 51 to 56. With such a configuration, it is possible to reduce the occurrence of the guided mode resonance phenomenon and reduce the reflection of light having a resonant wavelength even when observed at an angle satisfying the resonance condition.
  • the structure period of the concavo-convex structure of the low reflection pixel regions 61 to 64 may be at least two types. With such a configuration, the diffraction effect of a specific wavelength can be reduced, and the low reflection effect due to the concavo-convex structure can be enhanced.
  • the uneven structure of the low reflection pixel regions 61 to 64 may include a protrusion structure having no top surface and no bottom surface. With such a configuration, surface reflection can be effectively suppressed by the concavo-convex structure.
  • the lattice layers 31 to 33 may be made of a resin material. With such a configuration, the lattice layers 31 to 33 can be easily formed.
  • the waveguide layer 21 and the lattice layers 31 to 33 may be made of the same material. With such a configuration, the waveguide mode resonance grating layers 81 to 83 can be easily formed.
  • the low refractive index layer 71 is formed in the lower layer adjacent to the waveguide layer 21, and the waveguide layer 21 is a material having a higher refractive index with respect to the wavelength of light than the low refractive index layer 71. You may comprise. With such a configuration, reflected light can be efficiently extracted from the surface of the display body.
  • the buffer layer 101 (multilayer film buffer layer 111), the waveguide layer 21, and the lattice layer 34 are sequentially laminated on the surface side of the substrate 11.
  • An absorption layer 41 is formed on the back surface side of the pixel, and the grating layer 34 is a pixel in which light diffracted by the diffraction grating structure and light propagating through the waveguide layer 21 resonate and light in the resonance wavelength region is reflected.
  • the buffer layer 101 (multilayer film buffer layer 111) transmits at least light in the resonance wavelength region, and the absorption layer 41 absorbs light in at least the resonance wavelength region.
  • the display according to the present embodiment has a waveguide mode resonance having a structure in which the buffer layer 102 (multilayer film buffer layer 112), the waveguide layer 21, and the lattice layer 34 are combined on the surface side of the substrate 12.
  • the grating layer 84 is laminated in order, the absorption layer 42 is formed between the surface of the substrate 12 and the buffer layer 102 (multilayer film buffer layer 112), and the waveguide mode resonance grating layer 84 has a diffraction grating structure.
  • the diffracted light and the light propagating through the waveguide layer 21 portion of the waveguide mode resonance grating layer 84 resonate and have a pixel region 58 in which the light in the resonance wavelength region is reflected, and the buffer layer 102 (multilayer film)
  • the buffer layer 112 transmits at least light in the resonance wavelength region, and the absorption layer 42 absorbs light in at least the resonance wavelength region.
  • the absorption layers 41 and 42 that absorb light in the wavelength region reflected by the guided mode resonance are formed, and the concavo-convex structure that reduces the surface reflection is formed in a portion that is not represented by a pattern.
  • high-contrast design including black is possible when design is represented using guided mode resonance. That is, with such a configuration, even a display body using a waveguide mode resonance grating can express high color contrast including black.
  • the waveguide layer 21 is made of a material having a higher refractive index with respect to the wavelength of light than the buffer layers 101 and 102 (multilayer film buffer layers 111 and 112). You may comprise with the material whose refractive index with respect to the wavelength of light is equivalent or less compared with the waveguide layer 21. FIG. With such a configuration, reflected light can be efficiently extracted from the surface of the display body.
  • the buffer layers 101 and 102 are formed as a laminated structure of at least two layers, and the buffer layers 101 and 102 (multilayer film buffer layers 111 and 112).
  • the outermost layer may be made of a material having a lower refractive index than the waveguide layer 21 with respect to the wavelength of light. With such a configuration, reflected light can be efficiently extracted from the surface of the display body. (12)
  • the waveguide layer 21 and the lattice layer 34 may be made of the same material. With such a configuration, the waveguide mode resonance grating layer 84 can be easily formed.
  • the inverted structure of the diffraction grating structure is formed in the region corresponding to the pixel regions 51 to 56, and the low reflection is performed in the region corresponding to the low reflection pixel regions 61 to 64.
  • the inverted structure of the concavo-convex structure of the pixel regions 61 to 64 is formed, and the ratio of the concave volume of the inverted structure of the concavo-convex structure of the low reflection pixel regions 61 to 64 to the concave volume of the inverted structure of the diffraction grating structure is 10% or less.
  • the pixel is applied to any one of the step of applying either a resin or a thermosetting resin, and a photocurable resin, a photothermoplastic resin, or a thermosetting resin applied from the mold to the substrate 11 (12) by a photo nanoimprint method.
  • Region 5 It is provided with a step of transferring a to 56 and the low reflective pixel areas 61-64.
  • absorption layers 41 and 42 that absorb light in the wavelength region reflected by guided mode resonance are formed, and an uneven structure that reduces surface reflection is formed at a location that is not represented by a pattern.
  • a display body capable of expressing a high-contrast symbol including black can be manufactured.
  • Structural coloration typified by morpho butterfly scales and iridescent epidermis is not the color development associated with the energy transition of the electronic state of molecules such as dyes and pigments, but the coloration phenomenon caused by the action of optical phenomena such as light diffraction, interference and scattering. is there.
  • multi-layer interference which occupies the largest distribution among the structural colors that exist in nature, is a structural color that occurs when reflected light generated at each interface of the laminate interferes, and a specific wavelength region is selectively used. It can be applied to a wavelength-selectable optical element that transmits or reflects light.
  • the wavelength of the reflected light is limited by the film thickness of each layer of the stacked body. For this reason, in order to manufacture a display body composed of a plurality of color components on a single substrate, masking and multilayer film formation must be repeated by the number of color components. It becomes very complicated.
  • a wavelength selection element using waveguide mode resonance is disclosed in Patent Document 1 described above.
  • the element has a structure in which a waveguiding layer and a grating layer made of a material having a refractive index higher than that of the above-described base material are sequentially formed on the base material, and a sub-wavelength grating structure formed in the grating layer.
  • a primary color wavelength selection element such as a color filter is formed with a mold or It can be formed by batch processing with a mask.
  • the display according to one embodiment of the present invention includes an absorption layer that absorbs light including light in the resonance wavelength region between the back surface of the base material or the surface of the base material and the waveguide mode resonance grating layer.
  • an absorption layer that absorbs light including light in the resonance wavelength region between the back surface of the base material or the surface of the base material and the waveguide mode resonance grating layer.
  • the buffer layer in the wave mode resonance grating layer By forming the buffer layer in the wave mode resonance grating layer, it is possible to suppress the wavelength dependence of the reflection intensity in the reflection spectrum observed mainly by the thin film interference of the waveguide mode resonance grating layer. Thereby, the display body by the waveguide mode resonance grating layer which can express high color contrast including black can be provided. Therefore, the display body according to one embodiment of the present invention can be used for a display object with high design properties. Moreover, since it is a display body having a fine pattern formed with high accuracy, it is expected to be used for anti-counterfeiting technology.

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Abstract

L'invention concerne un dispositif d'affichage à réseau de résonance à mode guidé avec lequel il est possible de représenter un fort contraste des couleurs, y compris du noir. Dans le dispositif d'affichage, une couche de guidage (21) et une couche de réseau (31) sont stratifiées dans cet ordre à la surface avant d'un matériau de base (11). Une couche absorbante (41) est formée côté surface arrière du matériau de base (11). La couche de réseau (31) comporte des zones de pixels (51 à 53) dans lesquelles résonnent la lumière diffractée par une structure de réseau de diffraction et la lumière qui se propage à travers la couche de guidage (21), et la lumière de la région de longueur d'onde de résonance est réfléchie, et comporte en outre des zones de pixels à faible réflexion (61, 62) comprenant des agrégats présentant des structures d'aspérité pour réduire une réflexion de surface dans des zones autres que les zones de pixels (52, 53). La couche absorbante (41) absorbe au moins la lumière de la région de longueur d'onde de résonance.
PCT/JP2015/006189 2014-12-15 2015-12-11 Dispositif d'affichage et procédé permettant de fabriquer un dispositif d'affichage WO2016098329A1 (fr)

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