WO2011083636A1 - 有機薄膜太陽電池 - Google Patents

有機薄膜太陽電池 Download PDF

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Publication number
WO2011083636A1
WO2011083636A1 PCT/JP2010/071024 JP2010071024W WO2011083636A1 WO 2011083636 A1 WO2011083636 A1 WO 2011083636A1 JP 2010071024 W JP2010071024 W JP 2010071024W WO 2011083636 A1 WO2011083636 A1 WO 2011083636A1
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layer
electrode
photoelectric conversion
electrode layer
thin film
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English (en)
French (fr)
Japanese (ja)
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鈴木　裕行
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Priority to US13/519,629 priority Critical patent/US20120298174A1/en
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/88—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
    • H10K39/10—Organic photovoltaic [PV] modules; Arrays of single organic PV cells
    • H10K39/12—Electrical configurations of PV cells, e.g. series connections or parallel connections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/10—Transparent electrodes, e.g. using graphene
    • H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
    • H10K39/10—Organic photovoltaic [PV] modules; Arrays of single organic PV cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Definitions

  • the present invention relates to an organic thin film solar cell having a metal electrode.
  • An organic thin film solar cell is a solar cell in which an organic thin film having an electron donating function and an electron accepting function is disposed between two different electrodes, and a manufacturing process compared to an inorganic solar cell typified by silicon or the like. Is easy, and has the advantage that the area can be increased at low cost.
  • the structure of the organic thin film solar cell is based on a laminated structure of anode / organic thin film / cathode.
  • one electrode is a transparent electrode and the other electrode is a metal electrode, and a transparent electrode, an organic thin film, and a metal electrode are sequentially laminated on a transparent substrate.
  • a method for forming a metal electrode usually, a vacuum deposition method, a sputtering method, a PVD method such as an ion plating method, a dry process such as a CVD method, or a metal paste containing a metal colloid such as silver (Ag) is used. A wet process is used.
  • the thickness of the metal electrode is set to about several nm to several hundred nm.
  • Organic thin film solar cells may be sealed to protect the organic thin film from moisture and oxygen.
  • a sealing substrate such as a glass substrate or a gas barrier film
  • a transparent electrode, an organic thin film, and a metal electrode are sequentially laminated on a supporting substrate (transparent substrate) such as a glass substrate or a plastic film.
  • a sealing agent such as a glass substrate or a gas barrier film
  • a gas barrier film is used for the sealing substrate, but such a film is expensive.
  • the present invention has been made in view of the above circumstances, and has as its main object to provide an organic thin film solar cell that protects an organic thin film from moisture and oxygen and can easily extract power to an external circuit. To do. Furthermore, it aims at providing an inexpensive flexible organic thin-film solar cell.
  • the present invention provides a transparent substrate, a first electrode layer formed on the transparent substrate, a photoelectric conversion layer formed on the first electrode layer, and the photoelectric conversion layer. And an organic thin film solar cell comprising a second electrode layer made of a metal substrate.
  • the second electrode layer is made of a metal substrate such as a metal foil or a metal plate, it has a barrier property against moisture and oxygen, and can protect the photoelectric conversion layer from moisture and oxygen. It is possible to suppress deterioration of the photoelectric conversion layer. Further, since the second electrode layer is made of a metal base material and has a barrier property against moisture and oxygen, it is not necessary to perform sealing using a sealing substrate from above the second electrode layer. It is possible to easily extract power from the second electrode layer to an external circuit.
  • an insulating adhesive layer is formed between the first electrode layer and the second electrode layer along the outer periphery of the photoelectric conversion layer.
  • the first electrode layer and the second electrode layer can be directly bonded together via an adhesive layer, and the photoelectric conversion layer can be sealed with good airtightness. Thereby, the penetration
  • an adhesive bond layer has insulation, a short circuit does not arise between a 1st electrode layer and a 2nd electrode layer.
  • the metal substrate is preferably a metal foil.
  • the metal substrate is a metal foil, an organic thin film solar cell having flexibility can be obtained at a low cost.
  • the present invention provides an organic thin film solar cell module, wherein a plurality of the above organic thin film solar cells are connected in series or in parallel.
  • power can be easily taken out from the first electrode layer and the second electrode layer to an external circuit, and a plurality of organic layers can be obtained using the first electrode layer and the second electrode layer.
  • Thin film solar cells can be easily connected.
  • the second electrode layer is made of a metal substrate such as a metal foil or a metal plate, the photoelectric conversion layer can be protected from moisture and oxygen, and deterioration of the photoelectric conversion layer can be suppressed. It is not necessary to perform sealing using a sealing substrate from above the electrode layer, and there is an effect that power can be easily taken out from the first electrode layer and the second electrode layer to an external circuit.
  • the organic thin film solar cell of the present invention comprises a transparent substrate, a first electrode layer formed on the transparent substrate, a photoelectric conversion layer formed on the first electrode layer, and the photoelectric conversion layer. It has the 2nd electrode layer which is formed on and consists of a metal base material, It is characterized by the above-mentioned.
  • FIG. 1 is a schematic sectional view showing an example of the organic thin film solar cell of the present invention.
  • the organic thin film solar cell 1 includes a transparent substrate 2, a first electrode layer 3 formed on the transparent substrate 2, a photoelectric conversion layer 4 formed on the first electrode layer 3, It has the 2nd electrode layer 5 which is formed on the photoelectric converting layer 4 and consists of a metal base material.
  • the photoelectric conversion layer 4 and the second electrode layer 5 have the same area.
  • the second electrode layer is made of a metal base material such as a metal foil or a metal plate, permeation of moisture and oxygen from the second electrode layer side can be prevented. Therefore, the photoelectric conversion layer can be protected from moisture and oxygen by the second electrode layer, and deterioration of the photoelectric conversion layer can be suppressed.
  • the second electrode layer is made of a metal base material and has a barrier property against moisture and oxygen, it is not necessary to perform sealing using a sealing substrate from above the second electrode layer. Therefore, it is possible to easily extract electric power from the first electrode layer and the second electrode layer to the external circuit. Furthermore, the structure of the organic thin film solar cell can be simplified, and the manufacturing process can be simplified.
  • FIGS. 2A and 2B are a schematic plan view and a sectional view showing another example of the organic thin film solar cell of the present invention
  • FIG. 2 (b) is a sectional view taken along line AA of FIG. FIG.
  • the photoelectric conversion layer 4 is indicated by a one-dot chain line
  • the second electrode layer 5 is indicated by a broken line.
  • the organic thin film solar cell 1 shown in FIGS. 2A and 2B includes a transparent substrate 2, a first electrode layer 3 formed on the transparent substrate 2, and a photoelectric conversion formed on the first electrode layer 3.
  • the layer 4 is formed on the photoelectric conversion layer 4, and is formed so as to surround the outer periphery of the photoelectric conversion layer 4 between the second electrode layer 5 made of a metal base material and the first electrode layer 3 and the second electrode layer 5. And an adhesive layer 6 having insulating properties. Since the adhesive layer 6 has insulating properties, no short circuit occurs between the first electrode layer 3 and the second electrode layer 5.
  • a 1st electrode layer and a 2nd electrode layer can be directly bonded together through an adhesive bond layer.
  • the second electrode layer is made of a metal base material and has a barrier property against moisture and oxygen, it is not necessary to perform sealing using a sealing substrate from above the second electrode layer. Since electric power can be taken out from the electrode layer and the second electrode layer to an external circuit, it is not necessary to arrange a wiring for taking out electric power between the transparent substrate and the adhesive layer as in the prior art. Therefore, the airtightness is not impaired at the portion where the wiring is arranged.
  • the adhesive layer is bonded to both the first electrode layer and the second electrode layer. Good properties. Therefore, the photoelectric conversion layer can be sealed with good airtightness by forming the adhesive layer. Therefore, intrusion of moisture or oxygen into the photoelectric conversion layer can be prevented, and deterioration of the photoelectric conversion layer can be effectively suppressed. Further, when the metal substrate is a metal foil, the metal foil has a barrier property against moisture and oxygen even when the metal foil is thin, so that an organic thin film solar cell having flexibility can be obtained. Therefore, a flexible organic thin film solar cell can be obtained inexpensively without requiring an expensive gas barrier film.
  • the 2nd electrode layer in this invention is formed on a photoelectric converting layer, and consists of a metal base material.
  • the second electrode layer is an electrode for extracting electrons generated in the photoelectric conversion layer (electron extraction electrode).
  • the second electrode layer has a barrier property against moisture and oxygen.
  • the water vapor permeability of the second electrode layer is preferably 1 ⁇ 10 ⁇ 2 g / (m 2 ⁇ day) or less, more preferably 1 ⁇ 10 ⁇ 3 g / (m 2 ⁇ day) or less, particularly 1 ⁇ It is preferably 10 ⁇ 4 g / (m 2 ⁇ day) or less.
  • the oxygen permeability of the second electrode layer is preferably 1 ⁇ 10 ⁇ 4 ml / (m 2 ⁇ day) or less.
  • the oxygen permeability is preferably as small as possible, the lower limit is not particularly limited.
  • the water vapor transmission rate is a value measured using a water vapor transmission rate measuring device (manufactured by MOCON: PERMATRA).
  • the oxygen permeability is a value measured using an oxygen gas permeability measuring device (manufactured by MOCON: OX-TRAN).
  • metal foil and a metal plate are mentioned.
  • metal foil is preferably used.
  • the metal substrate is a metal foil, an organic thin film solar cell having flexibility can be obtained at a low cost.
  • metal foil means what has flexibility.
  • a metal plate means what does not have flexibility.
  • the metal substrate has flexibility refers to bending when a force of 5 KN is applied in the metal material bending test method of JIS Z 2248.
  • the metal material constituting the metal substrate is not particularly limited as long as it functions as an electrode and can be a metal foil or a metal plate and satisfies the above-described barrier properties.
  • the second electrode layer is an electron extraction electrode, it is preferable that the work function is low.
  • Specific examples include aluminum, copper, titanium, chromium, tungsten, molybdenum, platinum, tantalum, niobium, zirconium, zinc, silver, gold, various stainless steels, and alloys thereof. Of these, aluminum and silver are preferable.
  • the thickness of the metal substrate is not particularly limited as long as the metal substrate functions as an electrode and can provide a metal substrate satisfying the above-described barrier properties. Specifically, the thickness may be 10 ⁇ m or more, and 10 ⁇ m to It can be about 3 mm. The thicker the metal substrate, the better the conductivity and barrier properties. On the other hand, the thinner the metal substrate, the richer the flexibility. In consideration of flexibility, the thickness of the metal substrate is preferably in the range of 10 ⁇ m to 300 ⁇ m, and more preferably in the range of 30 ⁇ m to 300 ⁇ m.
  • the method for producing the metal substrate is not particularly limited as long as it is a method for obtaining a single metal substrate, and a general method can be used, depending on the type of metal material and the thickness of the metal substrate. Are appropriately selected.
  • the second electrode layer is formed on the photoelectric conversion layer so as to protect the photoelectric conversion layer from moisture and oxygen, and between the first electrode layer and the second electrode layer. If it arrange
  • the second electrode layer 5 may be formed to have the same area as the photoelectric conversion layer 4. In this case, since the second electrode layer and the photoelectric conversion layer have the same area, the photoelectric conversion layer can be protected by the second electrode layer, and a short circuit may occur between the first electrode layer and the second electrode layer. Absent. Further, as shown in FIGS.
  • the second electrode layer 5 is formed to have a larger area than the photoelectric conversion layer 4, and between the second electrode layer 5 and the first electrode layer 3.
  • An adhesive layer 6 having an insulating property may be formed in a portion where the photoelectric conversion layer 4 is not formed. In this case, since the second electrode layer has a larger area than the photoelectric conversion layer, the photoelectric conversion layer can be protected by the second electrode layer, and an insulating adhesive layer is formed. In addition, no short circuit occurs between the first electrode layer and the second electrode layer.
  • the method for forming the second electrode layer on the photoelectric conversion layer is not particularly limited as long as the second electrode layer made of a metal substrate can be disposed on the photoelectric conversion layer with good adhesion.
  • the method of thermocompression bonding a metal base material on a photoelectric converting layer is mentioned. Since the photoelectric conversion layer contains an organic material such as a conductive polymer material, the metal substrate can be laminated with good adhesion by thermally laminating the metal substrate on the photoelectric conversion layer.
  • Adhesive layer In the present invention, it is preferable that an insulating adhesive layer is formed between the first electrode layer and the second electrode layer along the outer periphery of the photoelectric conversion layer. In order to prevent a short circuit between the first electrode layer and the second electrode layer, an adhesive layer is always formed in a portion where the photoelectric conversion layer is not formed between the first electrode layer and the second electrode layer. preferable.
  • the adhesive layer is formed between the first electrode layer and the second electrode layer along the outer periphery of the photoelectric conversion layer, and a short circuit occurs between the first electrode layer and the second electrode layer. It is not particularly limited as long as it is arranged so that it does not exist.
  • the adhesive layer 6 may be formed between the first electrode layer 3 and the second electrode layer 5 so as to surround the outer periphery of the photoelectric conversion layer 4.
  • 3 (a) to 3 (c) the adhesive layer 6 may be formed between the first electrode layer 3 and the second electrode layer 5 along a part of the outer periphery of the photoelectric conversion layer 4.
  • 3C is a cross-sectional view taken along the line BB in FIG.
  • the photoelectric conversion layer 4 is The alternate long and short dash line and the second electrode layer 5 are indicated by broken lines.
  • the adhesive layer may be formed so as to surround the four sides of the photoelectric conversion layer, and is formed along the three sides of the photoelectric conversion layer. It may be formed along two sides of the photoelectric conversion layer, or may be formed along one side of the photoelectric conversion layer. In any case, as described above, in order to prevent a short circuit between the first electrode layer and the second electrode layer, the portion where the photoelectric conversion layer is not formed between the first electrode layer and the second electrode layer is provided. An adhesive layer is always formed.
  • the adhesive layer is formed so as to surround the outer periphery of the photoelectric conversion layer. This is because the adhesion between the first electrode layer and the second electrode layer can be improved, and moisture and oxygen can be prevented from entering the photoelectric conversion layer.
  • the adhesive used for the adhesive layer is not particularly limited as long as it has insulating properties and can bond the first electrode layer and the second electrode layer.
  • a photocurable resin A thermosetting resin or a thermoplastic resin can be used.
  • a thermosetting resin is preferable, and a thermosetting epoxy resin is particularly preferable.
  • the method for forming the adhesive layer is not particularly limited as long as the adhesive layer can be disposed at a desired position, and a method of applying an adhesive is usually used.
  • the adhesive application method include an inkjet method, a dispenser method, a micro gravure coating method, a gravure coating method, a bar coating method, a roll coating method, a wire bar coating method, a dip coating method, a die coating method, a flexographic printing method, and an offset.
  • Examples thereof include a printing method and a screen printing method. Among these, an inkjet method, a dispenser method, and a screen printing method are preferably used.
  • the adhesive may be applied on the first electrode layer or the second electrode layer, but is usually applied on the first electrode layer.
  • the adhesive is a thermosetting resin
  • the metal base material (second electrode layer) is thermocompression-bonded on the photoelectric conversion layer, and the adhesive is thermally cured to bond the adhesive.
  • An agent layer can be formed.
  • the adhesive is a thermoplastic resin
  • a metal substrate (second electrode layer) is thermocompression-bonded on the photoelectric conversion layer, and the adhesive is heated and cooled.
  • An adhesive layer can be formed.
  • the adhesive is a photocurable resin
  • a metal substrate (second electrode layer) is thermocompression-bonded on the photoelectric conversion layer, and the adhesive is photocured.
  • An adhesive layer can be formed.
  • the adhesive is a photocurable resin, it may be further thermally cured after the adhesive is photocured.
  • the photoelectric conversion layer used in the present invention is formed between the first electrode layer and the second electrode layer.
  • the “photoelectric conversion layer” refers to a member that contributes to charge separation of the organic thin film solar cell and has a function of transporting generated electrons and holes toward electrodes in opposite directions.
  • the photoelectric conversion layer may be a single layer having both an electron-accepting function and an electron-donating function (first aspect), or an electron-accepting layer having an electron-accepting function and an electron-donating function.
  • a layer in which an electron donating layer having n is laminated may be used (second embodiment).
  • the 1st aspect of the photoelectric converting layer in this invention is a single layer which has both an electron-accepting function and an electron-donating function, and contains an electron-donating material and an electron-accepting material It is.
  • this photoelectric conversion layer since charge separation occurs using a pn junction formed in the photoelectric conversion layer, it functions as a photoelectric conversion layer alone.
  • the electron donating material is not particularly limited as long as it has a function as an electron donor, but it is preferable that the material can be formed by a wet coating method.
  • a polymer material is preferred.
  • a conductive polymer is a so-called ⁇ -conjugated polymer, which is composed of a ⁇ -conjugated system in which double bonds or triple bonds containing carbon-carbon or hetero atoms are alternately linked to single bonds, and exhibits semiconducting properties. It is. In the conductive polymer material, ⁇ conjugation is developed in the polymer main chain, so that charge transport in the main chain direction is basically advantageous.
  • the electron transfer mechanism of the conductive polymer is mainly hopping conduction between molecules by ⁇ stacking, it is advantageous not only for the main chain direction of the polymer but also for the charge transport in the film thickness direction of the photoelectric conversion layer. is there.
  • the conductive polymer material can be easily formed by a wet coating method using a coating solution in which the conductive polymer material is dissolved or dispersed in a solvent, a large-area organic thin film solar cell Can be manufactured at low cost without requiring expensive equipment.
  • Examples of the electron-donating conductive polymer material include polyphenylene, polyphenylene vinylene, polysilane, polythiophene, polycarbazole, polyvinyl carbazole, porphyrin, polyacetylene, polypyrrole, polyaniline, polyfluorene, polyvinyl pyrene, polyvinyl anthracene, and derivatives thereof. And copolymers thereof, or phthalocyanine-containing polymers, carbazole-containing polymers, organometallic polymers, and the like.
  • thiophene-fluorene copolymer polyalkylthiophene, phenylene ethynylene-phenylene vinylene copolymer, phenylene ethynylene-thiophene copolymer, phenylene ethynylene-fluorene copolymer, fluorene-phenylene vinylene copolymer
  • a thiophene-phenylene vinylene copolymer is preferably used. This is because the energy level difference is appropriate for many electron-accepting materials.
  • a phenylene ethynylene-phenylene vinylene copolymer Poly [1,4-phenyleneethynylene-1,4- (2,5-dioctadodecyloxyphenylene) -1,4-phenyleneethene-1,2-diyl-1,4- ( 2,5-dioctadodecyloxyphenylene) ethene-1,2-diyl]
  • the electron-accepting material is not particularly limited as long as it has a function as an electron acceptor, but it is preferable that it can be formed into a film by a wet coating method.
  • a conductive polymer material is preferable. This is because the conductive polymer material has the advantages as described above.
  • Examples of the electron-accepting conductive polymer material include polyphenylene vinylene, polyfluorene, and derivatives thereof, and copolymers thereof, or carbon nanotubes, fullerene derivatives, CN group or CF 3 group-containing polymers, and the like. And —CF 3 substituted polymer.
  • polyphenylene vinylene derivative examples include CN-PPV (Poly [2-Methoxy-5- (2′-ethylhexyloxy) -1,4- (1-cyanovinylene) phenylene]), MEH-CN-PPV (Poly [2 -Methoxy-5- (2′-ethylhexyloxy) -1,4- (1-cyanovinylene) phenylene]) and the like.
  • an electron accepting material doped with an electron donating compound, an electron donating material doped with an electron accepting compound, or the like can be used.
  • a conductive polymer material doped with an electron donating compound or an electron accepting compound is preferably used.
  • Conductive polymer materials are basically advantageous in charge transport in the direction of the main chain because of the development of ⁇ conjugation in the polymer main chain, and are doped with electron-donating compounds and electron-accepting compounds. This is because electric charges are generated in the ⁇ -conjugated main chain, and the electrical conductivity can be greatly increased.
  • Examples of the electron-accepting conductive polymer material doped with the electron-donating compound include the above-described electron-accepting conductive polymer material.
  • a Lewis base such as an alkali metal such as Li, K, Ca, or Cs or an alkaline earth metal can be used.
  • the Lewis base acts as an electron donor.
  • the electron-donating conductive polymer material doped with the electron-accepting compound include the above-described electron-donating conductive polymer material.
  • a Lewis acid such as FeCl 3 (III), AlCl 3 , AlBr 3 , AsF 6 or a halogen compound can be used. In addition, Lewis acid acts as an electron acceptor.
  • the film thickness of the photoelectric conversion layer As the film thickness of the photoelectric conversion layer, the film thickness generally employed in bulk heterojunction organic thin-film solar cells can be employed. Specifically, it can be set within the range of 0.2 nm to 3000 nm, and preferably within the range of 1 nm to 600 nm. This is because when the film thickness is thicker than the above range, the volume resistance in the photoelectric conversion layer may increase. On the other hand, if the film thickness is thinner than the above range, light may not be sufficiently absorbed.
  • the mixing ratio of the electron-donating material and the electron-accepting material is appropriately adjusted to an optimal mixing ratio depending on the type of material used.
  • the method for forming the photoelectric conversion layer is not particularly limited as long as it can be uniformly formed in a predetermined film thickness, but a wet coating method is preferably used. This is because if the wet coating method is used, the photoelectric conversion layer can be formed in the air, and the cost can be reduced and the area can be easily increased.
  • the method for applying the photoelectric conversion layer coating liquid is not particularly limited as long as it can uniformly apply the photoelectric conversion layer coating liquid.
  • a die coating method, a spin coating method, a dip coating, and the like examples thereof include a coating method, a roll coating method, a bead coating method, a spray coating method, a bar coating method, a gravure coating method, an ink jet method, a screen printing method, and an offset printing method.
  • coating method of the coating liquid for photoelectric conversion layers is a method which can adjust thickness mainly according to the application amount.
  • Methods that can adjust the thickness mainly according to the coating amount include, for example, a die coating method, a bead coating method, a bar coating method, a gravure coating method, an ink jet method, a screen printing method, and an offset printing method. Can be mentioned.
  • the printing method is suitable for increasing the area of the organic thin film solar cell.
  • a drying treatment for drying the formed coating film may be performed. It is because productivity can be improved by removing the solvent etc. which are contained in the coating liquid for photoelectric conversion layers at an early stage.
  • a drying method for example, a general method such as heat drying, air drying, vacuum drying, infrared heat drying, or the like can be used.
  • the electron-accepting layer used in this embodiment has an electron-accepting function and contains an electron-accepting material.
  • the electron-accepting material is not particularly limited as long as it has a function as an electron acceptor, but is preferably a material that can be formed into a film by a wet coating method.
  • a polymer material is preferred. This is because the conductive polymer material has the advantages as described above. Specific examples include the same electron-accepting conductive polymer materials used for the photoelectric conversion layer of the first aspect.
  • a film thickness generally employed in a bilayer type organic thin film solar cell can be employed. Specifically, it can be set within a range of 0.1 nm to 1500 nm, and preferably within a range of 1 nm to 300 nm. This is because if the film thickness is larger than the above range, the volume resistance in the electron-accepting layer may be increased. On the other hand, if the film thickness is thinner than the above range, light may not be sufficiently absorbed.
  • the method for forming the electron-accepting layer can be the same as the method for forming the photoelectric conversion layer of the first aspect.
  • the electron donating layer used in this embodiment has an electron donating function and contains an electron donating material.
  • the electron donating material is not particularly limited as long as it has a function as an electron donor, but it is preferable that the material can be formed by a wet coating method.
  • a polymer material is preferred. This is because the conductive polymer material has the advantages as described above. Specific examples include the same electron donating conductive polymer materials used for the photoelectric conversion layer of the first aspect.
  • a film thickness generally employed in a bilayer type organic thin film solar cell can be employed. Specifically, it can be set within a range of 0.1 nm to 1500 nm, and preferably within a range of 1 nm to 300 nm. This is because if the film thickness is larger than the above range, the volume resistance in the electron donating layer may be increased. On the other hand, if the film thickness is thinner than the above range, light may not be sufficiently absorbed.
  • the method for forming the electron donating layer can be the same as the method for forming the photoelectric conversion layer of the first aspect.
  • the 1st electrode layer in this invention is an electrode which is formed on a transparent substrate and opposes the said 2nd electrode layer.
  • the first electrode layer is usually an electrode for extracting holes generated in the photoelectric conversion layer (hole extraction electrode).
  • the first electrode layer side is the light receiving surface.
  • the first electrode layer is not particularly limited as long as it is an electrode on the light receiving surface side, and may be a transparent electrode, or a laminate of a transparent electrode and a patterned auxiliary electrode. May be. As illustrated in FIG. 4, when the first electrode layer 3 is a laminate of the patterned auxiliary electrode 3a and the transparent electrode 3b, even if the sheet resistance of the transparent electrode is relatively high, By making the sheet resistance of the auxiliary electrode sufficiently low, the resistance of the first electrode layer as a whole can be reduced. Therefore, the generated power can be collected efficiently.
  • the transparent electrode and the auxiliary electrode will be described.
  • Transparent electrode The transparent electrode used in the present invention is formed on a transparent substrate.
  • the constituent material of the transparent electrode is not particularly limited as long as it has conductivity and transparency.
  • In—Zn—O (IZO), In—Sn—O (ITO), ZnO—Al, Zn—Sn— O etc. can be mentioned.
  • the constituent material of the transparent electrode layer is preferably a material having a high work function.
  • ITO is preferably used as a material having conductivity and transparency and a high work function.
  • the total light transmittance of the transparent electrode is preferably 85% or more, more preferably 90% or more, and particularly preferably 92% or more. This is because when the total light transmittance of the transparent electrode is within the above range, light can be sufficiently transmitted through the transparent electrode and light can be efficiently absorbed by the photoelectric conversion layer.
  • the total light transmittance is a value measured using an SM color computer (model number: SM-C) manufactured by Suga Test Instruments Co., Ltd. in the visible light region.
  • the sheet resistance of the transparent electrode is preferably 20 ⁇ / ⁇ or less, more preferably 10 ⁇ / ⁇ or less, and particularly preferably 5 ⁇ / ⁇ or less. This is because if the sheet resistance is larger than the above range, the generated charge may not be sufficiently transmitted to the external circuit.
  • the said sheet resistance is measured based on JIS R1637 (Resistance test method of fine ceramics thin film: Measurement method by 4 probe method) using a surface resistance meter (Loresta MCP: Four-terminal probe) manufactured by Mitsubishi Chemical Corporation. It is the value.
  • the transparent electrode may be a single layer or may be laminated using materials having different work functions.
  • the thickness of the transparent electrode is preferably in the range of 0.1 nm to 500 nm, particularly 1 nm to 300 nm when the transparent electrode is a single layer, and the total film thickness is preferably in the range of 0.1 nm to 500 nm. It is preferable to be within the range. If the film thickness is less than the above range, the sheet resistance of the transparent electrode becomes too large, and the generated charge may not be sufficiently transmitted to the external circuit. On the other hand, if the film thickness is thicker than the above range, the total light transmittance This is because there is a possibility that the photoelectric conversion efficiency is lowered.
  • a general electrode forming method can be used as a method for forming the transparent electrode.
  • the auxiliary electrode used for this invention is formed in a pattern form on a transparent substrate.
  • the auxiliary electrode usually has a lower resistance value than the transparent electrode.
  • a metal is usually used as a material for forming the auxiliary electrode.
  • the metal used for the auxiliary electrode include aluminum (Al), gold (Au), silver (Ag), cobalt (Co), nickel (Ni), platinum (Pt), copper (Cu), and titanium (Ti).
  • conductive metals such as iron (Fe), stainless steel, aluminum alloy, copper alloy, titanium alloy, iron-nickel alloy and nickel-chromium alloy (Ni-Cr).
  • conductive metals described above those having a relatively low electrical resistance value are preferred. Examples of such a conductive metal include Al, Au, Ag, and Cu.
  • the auxiliary electrode may be a single layer made of the conductive metal as described above, and is formed by appropriately laminating the conductive metal layer and the contact layer in order to improve the adhesion to the substrate or the transparent electrode. It may be.
  • the material for forming the contact layer include nickel (Ni), chromium (Cr), nickel chromium (Ni—Cr), titanium (Ti), and tantalum (Ta).
  • the contact layer is laminated on the conductive metal layer in order to obtain adhesion between the desired auxiliary electrode and the substrate or the transparent electrode, and may be laminated only on one side of the conductive metal layer. You may laminate on both sides.
  • a preferred metal may be selected according to the work function of the material for forming the second electrode layer.
  • the first electrode layer is a hole extraction electrode, and therefore the metal used for the auxiliary electrode preferably has a high work function.
  • Al is preferably used.
  • the shape of the auxiliary electrode is not particularly limited as long as it is a pattern, and is appropriately selected depending on desired conductivity, permeability, strength, and the like.
  • the auxiliary electrode may have a mesh-shaped mesh portion and a frame portion arranged around the mesh portion, or may be formed of a mesh-shaped mesh portion.
  • the mesh portion and the frame portion may be arranged, for example, when the auxiliary electrode is rectangular, the frame portion may be arranged so as to surround four sides of the mesh portion. Further, it may be arranged so as to surround three sides of the mesh part, may be arranged so as to surround two sides of the mesh part, or may be arranged on one side of the mesh part. Especially, it is preferable that the frame part is arrange
  • the shape of the mesh portion is not particularly limited as long as it is a mesh shape, and is appropriately selected depending on desired conductivity, permeability, strength, and the like.
  • a polygon such as a triangle, a quadrangle, and a hexagon, a circular lattice, and the like can be given.
  • a polygon or circular “lattice shape” refers to a shape in which polygons or circles are periodically arranged.
  • polygonal or circular lattice shape for example, polygonal openings may be arranged in a straight line or zigzag.
  • the shape of the mesh portion is preferably a hexagonal lattice shape or a parallelogram lattice shape. This is because the current flowing through the mesh portion can be prevented from being concentrated locally.
  • the hexagonal openings are arranged in a zigzag (so-called honeycomb shape).
  • the acute angle of the parallelogram is preferably within the range of 40 ° to 80 °, more preferably within the range of 50 ° to 70 °, and even more preferably 55 ° to 65 °. Within the range of °.
  • the opening of the mesh part of the auxiliary electrode is relatively large.
  • the ratio of the openings in the mesh portion of the auxiliary electrode is preferably about 50% to 98%, more preferably in the range of 70% to 98%, and still more preferably in the range of 80% to 98%. Within range.
  • the pitch of the openings of the mesh portion of the auxiliary electrode and the line width of the mesh portion are appropriately selected according to the area of the entire auxiliary electrode and the like.
  • the line width of the frame portion is appropriately selected according to the area of the entire auxiliary electrode.
  • the thickness of the auxiliary electrode is not limited as long as the short circuit does not occur between the first electrode layer and the second electrode layer, and the thickness of the photoelectric conversion layer, the hole extraction layer, the electron extraction layer, etc. It is selected as appropriate. Specifically, when the total film thickness of the layers (photoelectric conversion layer, hole extraction layer, electron extraction layer) formed between the first electrode layer and the second electrode layer is 1, the thickness of the auxiliary electrode is It is preferably 5 or less, more preferably 3 or less, further 2 or less, particularly preferably 1.5 or less, and most preferably 1 or less. This is because if the thickness of the auxiliary electrode is larger than the above range, a short circuit may occur between the electrodes.
  • the thickness of the auxiliary electrode is preferably in the range of 100 nm to 1000 nm, more preferably in the range of 200 nm to 800 nm, further in the range of 200 nm to 500 nm, particularly in the range of 200 nm to 400 nm. It is preferable. This is because if the thickness of the auxiliary electrode is thinner than the above range, the sheet resistance of the auxiliary electrode may increase. Moreover, it is because there exists a possibility that a short circuit may arise between electrodes when the thickness of an auxiliary electrode is thicker than the said range.
  • the thickness of the auxiliary electrode is preferably in the range of 200 nm to 300 nm.
  • the photoelectric conversion layer is formed on the first electrode layer by a method capable of adjusting the thickness mainly according to the coating amount, if the thickness of the auxiliary electrode is larger than the above range, the mesh portion of the auxiliary electrode or It becomes difficult to cover the edge of the frame part, and a short circuit is likely to occur between the electrodes. Further, if the thickness of the auxiliary electrode is larger than the above range, the photoelectric conversion layer may be formed thicker than the desired thickness due to surface tension.
  • the thickness of the photoelectric conversion layer is too thick, it exceeds the electron diffusion length and the hole diffusion length, and the conversion efficiency decreases. It is preferable to adjust the thickness of the auxiliary electrode so that the photoelectric conversion layer is not formed thicker than desired due to surface tension. In particular, since it is known that the distance that holes and electrons can move in the photoelectric conversion layer is about 100 nm, the auxiliary electrode is formed so that the photoelectric conversion layer is not formed thicker than the desired thickness due to surface tension. It is preferable to adjust the thickness. On the other hand, when the photoelectric conversion layer is formed by, for example, a spin coating method, a uniform film is formed by centrifugal force, so that the edge of the auxiliary electrode can be covered even if the auxiliary electrode is relatively thick.
  • the thickness can be adjusted by the number of rotations, so that a uniform film can be obtained even if the auxiliary electrode is relatively thick. Therefore, when the photoelectric conversion layer is formed mainly by a method capable of adjusting the thickness according to the coating amount, the above range is particularly preferable.
  • the sheet resistance of the auxiliary electrode may be lower than that of the transparent electrode.
  • the sheet resistance of the auxiliary electrode is preferably 5 ⁇ / ⁇ or less, more preferably 3 ⁇ / ⁇ or less, more preferably 1 ⁇ / ⁇ or less, particularly preferably 0.5 ⁇ / ⁇ or less, and 0.1 ⁇ . Most preferably, it is less than / ⁇ . This is because if the sheet resistance of the auxiliary electrode is larger than the above range, desired power generation efficiency may not be obtained.
  • the said sheet resistance is measured based on JIS R1637 (Resistance test method of fine ceramics thin film: Measurement method by 4 probe method) using a surface resistance meter (Loresta MCP: Four-terminal probe) manufactured by Mitsubishi Chemical Corporation. It is the value.
  • the auxiliary electrode and the transparent electrode may be stacked in this order on the transparent substrate, or the transparent electrode and the auxiliary electrode may be stacked in this order on the transparent substrate.
  • the auxiliary electrode As a position where the auxiliary electrode is formed, when the adhesive layer is formed, the auxiliary electrode is preferably disposed so as to be in contact with the adhesive layer. This is because the adhesive force can be improved by forming the adhesive layer in contact with the auxiliary electrode made of metal and the second electrode layer made of the metal substrate.
  • the auxiliary electrode can be disposed so as to be in contact with the adhesive layer. For example, as shown in FIG. 4, when the auxiliary electrode 3a and the transparent electrode 3b are laminated in this order on the transparent substrate, by providing a region where the transparent electrode 3b is not laminated on the auxiliary electrode 3a, The auxiliary electrode 3a can be disposed so as to be in contact with the adhesive layer 6.
  • the method for forming the auxiliary electrode is not particularly limited, and examples thereof include a method in which a metal thin film is formed on the entire surface and then patterned in a mesh shape, and a method in which a mesh-like conductor is directly formed. These methods are appropriately selected depending on the auxiliary electrode forming material, configuration, and the like.
  • the method for forming the metal thin film is preferably a vacuum film forming method such as a vacuum deposition method, a sputtering method, or an ion plating method. That is, the auxiliary electrode is preferably a metal thin film formed by a vacuum film forming method.
  • the metal species formed by the vacuum film formation method has less inclusions than the plating film and can reduce the specific resistance, and can also reduce the specific resistance as compared with those formed using Ag paste or the like.
  • a vacuum film formation method is also suitable as a method for forming a metal thin film having a thickness of 1 ⁇ m or less, preferably 500 nm or less, with a precise thickness and a uniform thickness.
  • the method for patterning the metal thin film is not particularly limited as long as it can be accurately formed into a desired pattern, and examples thereof include a photoetching method.
  • Transparent substrate The transparent substrate used in the present invention is not particularly limited.
  • a transparent rigid material having no flexibility such as quartz glass, Pyrex (registered trademark), synthetic quartz plate, or a transparent resin film
  • examples thereof include a transparent flexible material having flexibility such as an optical resin plate.
  • a transparent substrate is flexible materials, such as a transparent resin film.
  • Transparent resin films have excellent processability, are useful in reducing manufacturing costs, reducing weight, and making organic thin-film solar cells hard to break, and they can be applied to various applications such as curved surfaces. is there.
  • a hole extraction layer 7 may be formed between the photoelectric conversion layer 4 and the first electrode layer 3.
  • the hole extraction layer is a layer provided so that holes can be easily extracted from the photoelectric conversion layer to the hole extraction electrode. Thereby, since the hole extraction efficiency from the photoelectric conversion layer to the hole extraction electrode is increased, the photoelectric conversion efficiency can be improved.
  • the material used for the hole extraction layer is not particularly limited as long as it is a material that stabilizes the extraction of holes from the photoelectric conversion layer to the hole extraction electrode.
  • a thin film of metal such as Au, In, Ag, Pd, etc. can be used.
  • a thin film of metal or the like may be formed alone or in combination with the above organic material.
  • PEDOT polyethylenedioxythiophene
  • TPD triphenyldiamine
  • the film thickness of the hole extraction layer is preferably within a range of 10 nm to 200 nm when the organic material is used, and within a range of 0.1 nm to 5 nm when the metal thin film is used. Is preferred.
  • Electron Extraction Layer In the present invention, as illustrated in FIG. 5, an electron extraction layer 8 may be formed between the photoelectric conversion layer 4 and the second electrode layer 5.
  • the electron extraction layer is a layer provided so that electrons can be easily extracted from the photoelectric conversion layer to the electron extraction electrode. Thereby, since the electron extraction efficiency from the photoelectric conversion layer to the electron extraction electrode is increased, the photoelectric conversion efficiency can be improved.
  • the material used for the electron extraction layer is not particularly limited as long as it is a material that stabilizes the extraction of electrons from the photoelectric conversion layer to the electron extraction electrode.
  • conductive organic compounds such as doped polyaniline, polyphenylene vinylene, polythiophene, polypyrrole, polyparaphenylene, polyacetylene, triphenyldiamine (TPD), or electron donation such as tetrathiofulvalene, tetramethylphenylenediamine, etc.
  • An organic material that forms a charge transfer complex composed of an organic compound and an electron-accepting compound such as tetracyanoquinodimethane and tetracyanoethylene.
  • the metal dope layer with an alkali metal or alkaline-earth metal is mentioned.
  • Suitable materials include bathocuproin (BCP) or bathophenantrone (Bphen) and metal doped layers such as Li, Cs, Ba, Sr.
  • the organic thin film solar cell of the present invention may have constituent members to be described later as necessary in addition to the constituent members described above.
  • the organic thin film solar cell of the present invention is a functional layer such as a protective sheet, a filler layer, a barrier layer, a protective hard coat layer, a strength support layer, an antifouling layer, a high light reflection layer, a light containment layer, a sealing material layer, etc. You may have.
  • an adhesive layer may be formed between the functional layers depending on the layer configuration. These functional layers can be the same as those described in JP-A-2007-73717.
  • Organic thin film solar cell module The organic thin film solar cell module of the present invention is characterized in that a plurality of the above organic thin film solar cells are connected in series or in parallel.
  • FIG. 6 is a schematic cross-sectional view showing an example of the organic thin film solar cell module of the present invention.
  • three cells (organic thin film solar cells 1) are connected in series.
  • Each cell includes a transparent substrate 2, a first electrode layer 3 formed on the transparent substrate 2, a photoelectric conversion layer 4 formed on the first electrode layer 3, and a photoelectric conversion layer. 4, a second electrode layer 5 made of a metal substrate, and an insulating adhesive formed so as to surround the outer periphery of the photoelectric conversion layer 4 between the first electrode layer 3 and the second electrode layer 5 And an agent layer 6.
  • the insulating adhesive layer is formed, no short circuit occurs between the first electrode layer and the second electrode layer in the cell. Moreover, since the insulating adhesive layer is formed, there is no short circuit between the first electrode layers and between the second electrode layers between adjacent cells.
  • the organic thin film solar cell described above since the organic thin film solar cell described above is included, it is not necessary to perform sealing using a sealing substrate from above the second electrode layer, and the first electrode layer and the second electrode layer can be easily externalized. Not only can electric power be taken out of the circuit, but also a plurality of organic thin-film solar cells can be easily connected using the first electrode layer and the second electrode layer.
  • connection of the plurality of organic thin-film solar cells is not limited as long as a desired electromotive force can be obtained, may be only in series, may be only in parallel, or may be a combination of series and parallel.
  • a plurality of organic thin film solar cells may be formed and connected on the same transparent substrate, and organic thin film solar cells separately produced independently may be connected by wiring or the like.
  • the present invention is not limited to the above embodiment.
  • the above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.
  • Example 1 Forming a thin film of SiO 2 by PVD on a PET film substrate having a thickness of 125 [mu] m, the reactive ion plating method using a pressure gradient type plasma gun on the upper surface (power: 3.7kW, oxygen partial pressure: 73% An ITO film (film thickness: 150 nm, sheet resistance: 20 ⁇ / ⁇ ), which is a transparent electrode, was formed at a film forming pressure of 0.3 Pa, a film forming rate of 150 nm / min, and a substrate temperature of 20 ° C.
  • the substrate on which the ITO film was formed was cleaned using acetone, a substrate cleaning solution, and IPA.
  • a conductive polymer paste (poly- (3,4-ethylenedioxide) is formed on the ITO film so that the area is larger than the area of the ITO film and a part of the ITO film is exposed.
  • Oxythiophene) dispersion was formed into a film and dried at 100 ° C. for 10 minutes to form a buffer layer.
  • polythiophene P3HT: poly (3-hexylthiophene-2,5-diyl)
  • C60PCBM [6,6] -phenyl-C61-butyric acid mettric ester: manufactured by Nano-C
  • a coating solution for a photoelectric conversion layer having a solid content concentration of 1.4 wt% was prepared.
  • the same solution was applied onto the buffer layer by a bar coating method so as to have the same area as the buffer layer, and dried at 100 ° C. for 10 minutes to form a photoelectric conversion layer.
  • an insulating adhesive containing a thermosetting epoxy resin was applied to a portion of the ITO film where the buffer layer and the photoelectric conversion layer were not formed.
  • an aluminum plate having a thickness of 10 ⁇ m was laminated on the photoelectric conversion layer by a heat laminating method to obtain a metal electrode.
  • the insulating adhesive was thermally cured. Thereby, the contact part of an ITO film
  • electric power was taken out to the external circuit by bringing the metal clip for the positive electrode into contact with the ITO film and the metal clip for the negative electrode with the aluminum plate.

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