WO2010131485A1 - Appareil mobile, appareil de transmission d'energie, appareil d'exposition, et procede de fabrication de dispositif - Google Patents

Appareil mobile, appareil de transmission d'energie, appareil d'exposition, et procede de fabrication de dispositif Download PDF

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Publication number
WO2010131485A1
WO2010131485A1 PCT/JP2010/003284 JP2010003284W WO2010131485A1 WO 2010131485 A1 WO2010131485 A1 WO 2010131485A1 JP 2010003284 W JP2010003284 W JP 2010003284W WO 2010131485 A1 WO2010131485 A1 WO 2010131485A1
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WIPO (PCT)
Prior art keywords
moving body
axis
direction parallel
moving
pattern
Prior art date
Application number
PCT/JP2010/003284
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English (en)
Japanese (ja)
Inventor
青木保夫
Original Assignee
株式会社ニコン
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ニコン filed Critical 株式会社ニコン
Priority to KR1020117029995A priority Critical patent/KR101693168B1/ko
Priority to JP2011513255A priority patent/JP5626206B2/ja
Priority to KR1020197035191A priority patent/KR102211255B1/ko
Priority to KR1020187016854A priority patent/KR102051842B1/ko
Priority to KR1020167036987A priority patent/KR101869463B1/ko
Publication of WO2010131485A1 publication Critical patent/WO2010131485A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062—Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Definitions

  • the present invention relates to a moving body device, a power transmission device, an exposure apparatus, and a device manufacturing method, and more specifically, a moving body device including a moving body that moves along a predetermined two-dimensional plane, the moving body, and an external device.
  • the present invention relates to a power transmission device used for transmission of power to and from an apparatus, an exposure apparatus including the moving body, and a device manufacturing method using the exposure apparatus.
  • a mask or reticle (hereinafter collectively referred to as “mask”) and an object such as a glass plate or a wafer.
  • substrate is a step-and-transfer process in which a pattern formed on a mask is transferred onto a substrate via a projection optical system while being moved synchronously along a predetermined scanning direction (scanning direction).
  • a scanning projection exposure apparatus a so-called scanning stepper (also called a scanner)
  • scanning stepper also called a scanner
  • This type of scanning exposure apparatus includes a mask stage device that holds a mask and moves in the scanning direction (scan direction), and a substrate stage device that holds the substrate and moves in the scanning direction (for example, see Patent Document 1).
  • the mask stage apparatus provided in the scanning exposure apparatus described in Patent Document 1 uses a linear motor including a stator extended in the scanning direction and a mover fixed to the mask stage in the scanning direction. Drive with a long stroke. At this time, for example, in order to follow the substrate stage, the mask stage is slightly driven in a direction (cross scan direction) perpendicular to the scan direction in the horizontal plane together with the scan direction.
  • a cable for supplying various powers such as electric power from the outside is connected to the mask stage apparatus or the substrate stage apparatus. For this reason, when the mask stage apparatus or the substrate stage apparatus moves, there is a possibility that dust generation or vibration may occur due to sliding between the cable and a support member for horizontally supporting the cable.
  • a first moving body that is movable along a two-dimensional plane including a first axis and a second axis that are orthogonal to each other; and the first moving body in a direction parallel to the first axis.
  • a second moving body arranged on one side of the moving body and movable at a predetermined stroke in a direction parallel to at least the second axis; on the other side of the first moving body in a direction parallel to the first axis
  • a third moving body arranged and movable at least with a predetermined stroke in a direction parallel to the second axis; a first drive for driving both the second and third moving bodies in a direction parallel to the second axis And switching between a first state in which the first to third moving bodies can be driven integrally and a second state in which the first to third moving bodies cannot be driven integrally.
  • a first mobile device comprising: a state setting device;
  • the first movement is performed.
  • the body moves integrally with the second and third moving bodies in a direction parallel to the second axis. That is, the first to third moving bodies move integrally in a direction parallel to the second axis. Therefore, the first to third moving bodies can be driven in the direction parallel to the second axis using the first drive system.
  • the first moving body movable along a two-dimensional plane including the first and second axes orthogonal to each other; and the first movement with respect to a direction parallel to the first axis
  • a second moving body disposed on one side of the body and movable at a predetermined stroke in at least a direction parallel to the second axis; and disposed on the other side of the first moving body with respect to a direction parallel to the first axis
  • a third moving body that is movable at a predetermined stroke in a direction parallel to at least the second axis
  • a first drive system that drives both the second and third moving bodies in a direction parallel to the second axis
  • a connecting device for connecting the first moving body to the second and third moving bodies in a non-contact state; and a predetermined range of relative movement between the first moving body and the second and third moving bodies.
  • a first position limited to a range of the first moving body, and the second and third moving bodies Second mobile device is provided with a; and the restriction device having a
  • the first moving body connected by the connecting device moves to the second and third movements. Moves in a direction parallel to the second axis integrally with the body.
  • the movable member of the limiting device is located at the first position, the relative movable range between the first moving body and the second and third moving bodies is limited to a predetermined range. Even if the first drive system becomes uncontrollable, the first moving body is prevented from separating from the second and third moving bodies beyond the relative movable range.
  • the movable member of the restriction device is positioned at the second position, the first moving body and the second and third moving bodies can be separated from each other.
  • an exposure apparatus for transferring the pattern to the object by exposing the object with an energy beam through the pattern, the pattern holding body having the pattern, the object, One of the first and second moving body devices of the present invention held by the first moving body; and a holding device that holds the other of the pattern holding body and the object.
  • An exposure apparatus is provided.
  • an exposure apparatus for transferring the pattern onto the object by exposing the object with an energy beam through the pattern, the pattern holder having the pattern, the object, A main stage that is movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other; one side and the other side of the main stage with respect to a direction parallel to the first axis And a pair of substages that are movable at a predetermined stroke in a direction parallel to at least the second axis; a first drive system that drives the pair of substages in a direction parallel to the second axis; A first state in which the main stage and the pair of substages can be driven integrally; and the main stage and the pair of substages cannot be driven integrally.
  • Second exposure apparatus is provided comprising; a capability of the second state, and a state setting unit to switch setting; a holding device for holding the other of said pattern holding member and the object.
  • the main stage is Move in a direction parallel to the second axis integrally with the sub-stage. That is, the main stage and the pair of substages move integrally in a direction parallel to the second axis. Therefore, the main stage and the pair of substages can be driven in a direction parallel to the second axis using the first drive system.
  • an exposure apparatus for transferring the pattern to the object by exposing the object with an energy beam through the pattern, the pattern holder having the pattern, the object, A main stage that is movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other; one side and the other side of the main stage with respect to a direction parallel to the first axis And a pair of substages that are movable at a predetermined stroke in a direction parallel to at least the second axis; a first drive system that drives the pair of substages in a direction parallel to the second axis; A connecting device for connecting the main stage to each of the pair of substages in a non-contact state; and the main stage abutting each of the pair of substages; A first position for limiting a relative movable range between the main stage and the pair of substages to a predetermined range, and a relative movement exceeding the predetermined range between the main stage and the
  • the main stage coupled by the coupling device is integrally parallel to the second axis with the pair of substages. Move in any direction.
  • the movable member of the limiting device is positioned at the first position, the relative movable range between the main stage and the pair of substages is limited to a predetermined range. Even if the control becomes impossible, the main stage is prevented from being separated from the pair of substages beyond the relative movable range.
  • the movable member of the limiting device is positioned at the second position, the main stage and the pair of substages can be separated.
  • an enlarged image of the pattern formed on the second surface is formed through a projection optical system having a magnification by irradiating the pattern arranged on the first surface with an energy beam.
  • An exposure apparatus that exposes an object to be arranged, the main stage holding a mask on which the pattern is formed, and movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other; A pair of sub-stages disposed respectively on one side and the other side of the main stage with respect to a direction parallel to the first axis and movable integrally with the main stage; and the pattern with respect to a direction parallel to the first axis And a projection optical system having a plurality of magnifications in which projection areas of the image are arranged at predetermined intervals.
  • a fourth exposure apparatus is provided.
  • the pair of sub-stages respectively arranged on one side and the other side of the main stage with respect to the direction parallel to the first axis can move integrally with the main stage.
  • the main stage is appropriately moved with a predetermined stroke in a direction parallel to the first axis integrally with the pair of sub-stages, and a projection optical system having a plurality of magnifications is used to scan the main stage.
  • the utility force is transferred between the moving body that moves in a direction parallel to the first axis in a two-dimensional plane including the first and second axes orthogonal to each other and the external device.
  • a second intermediate portion on one end side in the longitudinal direction of the member is fixed, and is provided so as to be able to approach and separate from the first rotating member by moving together with the moving body in a direction parallel to the first axis.
  • Able to rotate at least within a predetermined range around a second axis parallel to the second axis A second rotational member; the utility transmission system comprising is provided.
  • utility means any energy or object used in the moving body (for example, electric power, electrical signal, pressurized gas, vacuum suction force, refrigerant), and the utility between the moving body and the external device.
  • the transmission of the above means that the above-mentioned power is exchanged between the moving body and the external device (power supply, electric signal transmission / reception, refrigerant supply and recovery, etc.).
  • the term “utility” is used in this sense.
  • the second rotating member moves in a direction parallel to the first axis together with the moving body, and approaches and separates from the first rotating member.
  • the flexible member in which different intermediate portions are fixed to the first rotating member and the second rotating member, respectively bends according to the approach and separation operations of the first and second rotating members, Or pulled in a direction parallel to the first axis.
  • the first and second rotating members rotate, dust generation or vibration caused by sliding between the flexible member and the first and second rotating members (or other members) occurs. Occurrence is suppressed.
  • each of the first and second rotating members rotates, it is possible to prevent a large bending stress from acting on the flexible member.
  • an exposure apparatus for transferring the pattern to the object by exposing the object with an energy beam through a pattern holding body having a predetermined pattern, wherein the moving body is A force transmission device of the present invention for guiding the pattern holder in a direction parallel to the first axis; an object holding device for holding the object and guiding the object in a direction parallel to the first axis; A fifth exposure apparatus is provided.
  • a device manufacturing method comprising: exposing an object using any of the first to fifth exposure apparatuses according to the present invention; and developing the exposed object. A method is provided.
  • a manufacturing method for manufacturing a flat panel display as a device is provided by using a flat panel display substrate as the substrate.
  • substrate for flat panel displays contains a film-like member etc. other than a glass substrate.
  • FIG. 4A and 4B are diagrams showing states before and after movement when the main stage of the mask stage apparatus moves in the cross-scan direction, respectively.
  • FIGS. 5A and 5B are views showing a state before and after the main stage is positioned by a pair of positioning devices, respectively.
  • FIG. 7 is a cross-sectional view of the mask stage apparatus of FIG. 6 taken along line AA.
  • FIG. 12A and 12B are diagrams showing a schematic configuration of the locking device and the stopper device, and FIG. 12A is a state in which the main stage and the substage are connected by the locking device. (B) shows a state where the connection is released.
  • FIG. 17 (A) and 17 (B) are diagrams showing a schematic configuration of the lock device and the stopper device.
  • FIG. 17 (A) is a state where connection by the lock device is not performed
  • FIG. 17 (B) is a diagram.
  • FIG. 17 (A) and FIG. 17 (B) The state in which the main stage and the substage are connected by the locking device. It is a figure which shows schematic structure of the locking device and stopper device which were provided in the position different from the locking device and stopper device which are shown to FIG. 17 (A) and FIG. 17 (B). It is a figure which shows the state by which the stopper apparatus was cancelled
  • FIG. 21 is a cross-sectional view of the mask stage apparatus of FIG. 20 taken along line BB. It is FIG. (1) for demonstrating operation
  • FIGS. 23A and 23B are views (No. 2 and No.
  • FIG. 3 for explaining the operation of the mask loader device included in the mask stage device according to the fifth embodiment.
  • FIG. (1) for demonstrating operation
  • FIGS. 26A and 26B are views (No. 2 and No. 3) for explaining the operation of the mask loader device according to the sixth embodiment.
  • FIG. 30 is a sectional view taken along line CC of FIG. 29. It is a figure for demonstrating operation
  • FIG. 1 shows a schematic configuration of a liquid crystal exposure apparatus 10 according to the first embodiment.
  • the liquid crystal exposure apparatus 10 is a step-and-scan projection exposure apparatus, a so-called scanner.
  • the liquid crystal exposure apparatus 10 includes an illumination system IOP, a mask stage apparatus MST including a main stage 40 that holds a mask M, a projection optical system PL, a mask stage apparatus MST, a projection optical system PL, and the like.
  • a body stage BD, a substrate stage device PST including a fine movement stage 21 that holds the substrate P movably along the XY plane, and a control system thereof are provided.
  • the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system PL at the time of exposure is the X-axis direction
  • the direction orthogonal to the horizontal plane (XY plane) is the Y-axis direction
  • X The direction orthogonal to the axis and the Y-axis direction is taken as the Z-axis direction
  • the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis are taken as the ⁇ x, ⁇ y, and ⁇ z directions, respectively.
  • the illumination system IOP is configured similarly to the illumination system disclosed in, for example, US Pat. No. 6,552,775. That is, the illumination system IOP converts light emitted from a mercury lamp (not shown) as exposure illumination light (illumination light) IL through a reflection mirror, a dichroic mirror, a shutter, a wavelength selection filter, various lenses, and the like (not shown). Irradiate the mask M.
  • the illumination light IL for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), and h-line (wavelength 405 nm) (or combined light of i-line, g-line, and h-line) is used.
  • the wavelength of the illumination light IL can be appropriately switched according to the required resolution by a wavelength selection filter.
  • the light source is not limited to the ultra-high pressure mercury lamp, and for example, a pulse laser light source such as an excimer laser or a solid-state laser device can be used.
  • the mask stage apparatus MST includes a main stage 40 disposed above a lens barrel base plate 31 that is a part of a body BD described later, one side ( ⁇ Y side) of the main stage 40 in the Y-axis direction, and the other side.
  • Substage guides 37a and 37b for supporting the stages 50 and 70 on the floor surface F are provided.
  • the main stage 40 is supported on a pair of main stage guides 35 made of a prismatic member whose longitudinal direction is the X-axis direction and is integrally fixed to the upper surface of the lens barrel base plate 31.
  • a mask M on which a circuit pattern (hereinafter also referred to as a mask pattern as appropriate) is formed on its pattern surface (lower surface in FIG. 1) is fixed by, for example, vacuum suction.
  • Each of the substages 50 and 70 is movable on the substage guides 37a and 37b with a predetermined stroke in the X-axis direction (the direction orthogonal to the paper surface in FIG. 1).
  • the main stage 40 When the substages 50 and 70 move in the X-axis direction, the main stage 40 is guided by these and moves in the X-axis direction. Details of the mask stage apparatus MST will be described later in detail, including specific configurations such as the main stage 40, substages 50 and 70, and substage guides 37a and 37b, and a drive system and a measurement system.
  • the projection optical system PL is supported by the lens barrel base plate 31 below the mask stage apparatus MST in FIG.
  • the projection optical system PL of this embodiment has the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775. That is, the projection optical system PL includes a plurality of projection optical systems (also referred to as multi-lens projection optical systems) in which the projection areas of the pattern image of the mask M are arranged at predetermined intervals along the Y-axis direction. It functions in the same manner as a projection optical system having a single rectangular image field whose longitudinal direction is the axial direction.
  • each of the plurality of projection optical systems for example, an apparatus that forms an erect image with a bilateral telecentric enlargement system is used.
  • a plurality of projection areas arranged along the Y-axis direction are collectively referred to as an exposure area.
  • the projection image (partial upright image) of the circuit pattern of the mask M in the illumination area is arranged on the second surface (image plane) side of the projection optical system PL through the projection optical system PL by the illumination light IL that has passed through the projection optical system PL. Then, it is formed on the irradiation area (exposure area) of the illumination light IL conjugate to the illumination area on the substrate P whose surface is coated with a resist (sensitive agent).
  • the mask M is moved relative to the illumination area (illumination light IL) in the scanning direction (X-axis direction) and the exposure area (illumination light IL).
  • the substrate P By moving the substrate P relative to the scanning direction (X-axis direction), scanning exposure of one shot region (partition region) on the substrate P is performed, and the pattern of the mask M (mask pattern) is applied to the shot region. ) Is transcribed. That is, in this embodiment, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the pattern is formed on the substrate P by exposure of the sensitive layer (resist layer) on the substrate P by the illumination light IL. Is formed.
  • the body BD is horizontally disposed through a substrate stage frame 33 and a pair of support members 32 fixed on the substrate stage frame 33.
  • a lens barrel surface plate 31 supported.
  • the substrate stage mount 33 is supported by a plurality of vibration isolation devices 34 installed on the floor surface F, and is vibrationally separated from the floor surface F.
  • the substrate stage device PST is mounted on the surface plate 12 fixed on the substrate stage frame 33, the X coarse motion stage 23X, and the X coarse motion stage 23X, and constitutes an XY two-dimensional stage device together with the X coarse motion stage 23X.
  • the surface plate 12 is a plate-like member that is rectangular in plan view (as viewed from the + Z side) formed of, for example, stone, and the upper surface thereof is finished with a very high degree of flatness.
  • the X coarse movement stage 23X is composed of a rectangular plate-shaped (or rectangular parallelepiped) member in plan view, and has a length extending in the Z-axis direction with the Y-axis direction as the longitudinal direction at the center of the plane parallel to the XY plane. A hole-like opening (not shown) is formed.
  • the X coarse movement stage 23X is mounted on a plurality of X linear guide members (not shown) installed above the surface plate 12, and, for example, an X coarse movement stage drive system (not shown) including a linear motor allows the plurality of X coarse movement stages 23X. It is driven in the X-axis direction on the linear guide member.
  • the Y coarse movement stage 23Y is formed of a rectangular plate-like (or cuboid) member in a plan view whose dimension in the Y-axis direction is shorter than that of the X coarse movement stage 23X, and Z is formed at the center of the plane parallel to the XY plane. An opening (not shown) penetrating in the axial direction is formed.
  • the Y coarse movement stage 23Y is mounted on a plurality of Y linear guide members (not shown) fixed to the upper surface of the X coarse movement stage 23X.
  • the Y coarse movement stage 23Y is driven by a Y coarse movement stage drive system (not shown) including a linear motor. It is driven in the Y-axis direction on the moving stage 23X.
  • the drive system for driving the X coarse movement stage 23X and the Y coarse movement stage 23Y in the X-axis direction and the Y-axis direction, respectively, may be, for example, a drive system using a feed screw or a belt drive system.
  • the fine movement stage 21 is made of a plate-like (or rectangular parallelepiped) member having a substantially square shape in plan view, and holds the substrate P on its upper surface via the substrate holder PH.
  • the substrate holder PH has, for example, at least a part of a vacuum suction device (or electrostatic suction device) (not shown), and holds the substrate P on the upper surface thereof.
  • a Y moving mirror (bar mirror) 22Y having a reflecting surface on the ⁇ Y side surface is fixed to the ⁇ Y side surface of the fine movement stage 21 via a fixing member 24Y.
  • a similar movable mirror (hereinafter referred to as “X movable mirror”) is also fixed to the side surface on the ⁇ X side of fine movement stage 21.
  • the positional information of the fine movement stage 21 in the XY plane is, for example, about 0.5 to 1 nm by a laser interferometer system 28 that irradiates each of the Y moving mirror 22Y and the X moving mirror with a measurement beam and receives the reflected light. Is always detected with a resolution of.
  • the laser interferometer system includes an X laser interferometer and a Y laser interferometer corresponding to the Y moving mirror 22Y and the X moving mirror, respectively.
  • the meter is shown as laser interferometer system 28.
  • the fine movement stage 21 includes a stator (for example, a coil unit) (not shown) fixed to the Y coarse movement stage 23Y on the Y coarse movement stage 23Y and a movable element (for example, a magnet) fixed to the fine movement stage 21.
  • a fine movement stage drive system including a voice coil motor composed of a unit) and slightly driven in directions of six degrees of freedom (X-axis, Y-axis, Z-axis, ⁇ x, ⁇ y, and ⁇ z directions).
  • the substrate stage apparatus PST can drive the substrate P with a long stroke (coarse movement) in the XY two-axis directions and can finely drive (fine movement) in the direction of six degrees of freedom.
  • the self-weight cancel device 26 extends in the Z-axis direction for supporting the self-weight of a system including the fine movement stage 21 (specifically, a system including the fine movement stage 21, the substrate holder PH, the substrate P, etc.) on the surface plate 12.
  • the self-weight cancel device 26 is inserted into the opening of the X coarse movement stage 23X and the opening of the Y coarse movement stage 23Y.
  • the dead weight canceling device 26 is levitated and supported on the surface plate 12 by a static gas bearing (not shown) such as an air bearing.
  • the self-weight cancel device 26 is connected to the Y coarse movement stage 23Y through a flexure device (not shown), and moves in the X-axis direction and the Y-axis direction integrally with the Y coarse movement stage 23Y.
  • a leveling device 27 is disposed between the self-weight cancel device 26 and the fine movement stage 21.
  • the fine movement stage 21 is supported by the self-weight canceling device 26 via the leveling device 27 so as to be tiltable (swingable) in the ⁇ x direction and the ⁇ y direction.
  • the details of the configuration of the substrate stage apparatus PST, including the above-described self-weight canceling apparatus 26, leveling apparatus 27, flexure apparatus, and the like, are disclosed in, for example, International Publication No. 2008/129762 (corresponding US Patent Application Publication No. 2010/0018950). And the like.
  • the liquid crystal exposure apparatus 10 combines a plurality of projection images formed on the substrate P via each of the plurality of enlarged projection optical systems constituting the projection optical system PL, thereby forming one pattern (pattern).
  • the pattern surface of the mask M is simultaneously illuminated by the illumination system IOP at a plurality of locations separated by a predetermined interval in the Y-axis direction. That is, on the mask M, a plurality of illumination areas spaced apart at a predetermined interval in the Y-axis direction are formed.
  • a plurality of strip-shaped (strip-shaped) regions extending in the scanning direction (X-axis direction) are provided on the pattern surface of the mask M at predetermined intervals in the Y-axis direction.
  • the intervals in the Y-axis direction are set so that the plurality of band-like areas are illuminated every other illumination system IOP.
  • a part of a mask pattern for forming a specific pattern (hereinafter referred to as pattern A) on the substrate P, and another pattern different from the pattern A hereinafter referred to as “pattern A”.
  • a part of the mask pattern for forming (pattern B) on the substrate is alternately formed in the Y-axis direction (illustration of each mask pattern is omitted).
  • the Y-axis is set such that the illumination system IOP illuminates a plurality of strip-shaped regions having at least a part of the mask pattern for forming the pattern A on the substrate P
  • the pattern A can be formed on the substrate P, and a belt-like pattern having at least a part of the mask pattern for forming the pattern B on the substrate P.
  • the pattern B can be formed on the substrate P by performing scanning exposure with the mask M positioned in the Y-axis direction so that the region is illuminated by the illumination system IOP.
  • the mask M may have only one of the different patterns A and B.
  • the main stage 40 that holds the mask M is also set in the Y axis direction (cross scan direction) in order to enable positioning of the mask M in the Y axis direction. It can be moved with the stroke.
  • FIG. 2 shows a plan view of the mask stage apparatus MST.
  • FIG. 3 shows a side view of the mask stage apparatus MST as viewed from the + X side.
  • the main stage 40 has a main body portion 41 which is a plate-like member parallel to an XY plane having a longitudinal direction in the Y-axis direction.
  • the main body 41 has an end (corner) on the + Y side and + X side and an end (corner) on the + Y side and ⁇ X side of the rectangular plate-like member as viewed from above (+ Z side). It has an outer shape (hexagonal shape) that is cut off obliquely.
  • a rectangular opening 41a penetrating in the Z-axis direction is formed at the center of the main body 41, and the mask M is accommodated in the opening 41a.
  • the main body 41 includes a chuck unit 42 including a plurality of electrostatic chucks (or vacuum chucks or mechanical chucks) fixed to the + X side and ⁇ X side wall surfaces (inner wall surfaces) forming the opening 41a.
  • a chuck unit 42 including a plurality of electrostatic chucks (or vacuum chucks or mechanical chucks) fixed to the + X side and ⁇ X side wall surfaces (inner wall surfaces) forming the opening 41a.
  • the mask M is held by the chuck unit 42.
  • the opening 41a may have a stepped shape in which a rectangular opening is formed at the center, and the chuck unit 42 may be attached to the inner periphery of the step.
  • a portion (region) on the ⁇ Y side of the opening 41a is supported from below by a main stage guide 35 on the ⁇ Y side, and a portion (region) on the + Y side of the opening 41a is on the + Y side.
  • the main stage guide 35 is supported from below.
  • Each of the pair of main stage guides 35 is formed of, for example, stone, and the upper surface thereof is finished with a very high flatness.
  • two static pressure gas bearings for example, air bearings 43a and 43b whose bearing surfaces face the upper surface of the main stage guide 35 on the -Y side, and bearings on the upper surface of the main stage guide 35 on the + Y side.
  • One static pressure gas bearing for example, an air bearing 43c, whose surfaces face each other is attached.
  • the air bearings 43a and 43b are spaced apart from each other in the X-axis direction, and the three air bearings 43a to 43c are disposed at three locations that are not on the same straight line.
  • Each of the air bearings 43a, 43b, 43c ejects a high-pressure (pressurized) gas (for example, air) supplied from a gas supply device (not shown) onto the upper surface of the opposing main stage guide 35, thereby pairing the main body portion 41 with each other. It floats on the main stage guide 35.
  • a high-pressure (pressurized) gas for example, air supplied from a gas supply device (not shown) onto the upper surface of the opposing main stage guide 35, thereby pairing the main body portion 41 with each other. It floats on the main stage guide 35.
  • the number of air bearings is not limited to this, and for example, a plurality of (for example, two) air
  • a concave portion 41 b that opens to the + Y side is formed at the center of the upper surface of the main body portion 41 on the + Y side, and the bottom portion of the concave portion 41 b is spaced apart in the Z-axis direction.
  • the Y mover 44 composed of a pair of plate-like members is fixed via a fixing member 44a.
  • the pair of plate-like members constituting the Y mover 44 has a magnet unit (not shown) including a plurality of magnets on each of a pair of opposed surfaces facing each other.
  • X movable elements 45 and 46 having a U-shaped cross section are respectively provided in the center part of the lower surface of the main body 41 on the + Y side (that is, below the Y movable element 44) and the upper surface central part on the -Y side.
  • the fixing members 45a and 46a are fixed.
  • Each of the X movers 45 and 46 has a magnet unit (not shown) including a plurality of magnets on each of a pair of opposed surfaces facing each other.
  • a pair of X movable mirrors (bar mirrors) 48x are fixed to the side surface on the ⁇ X side of the main body portion 41 so that the reflecting surfaces thereof are oriented substantially perpendicular to the X axis.
  • the positional information regarding the X-axis direction (and the ⁇ z direction) of the main stage 40 is, for example, 0.5 by a pair of X laser interferometers 98x that irradiate each of the pair of X movable mirrors 48x with a measurement beam Lx parallel to the X axis. It is always measured with a resolution of ⁇ 1nm.
  • a Y movable mirror (bar mirror) 48y whose longitudinal direction is the X-axis direction is provided on the side surface on the ⁇ Y side of the main body 41 so that the reflection surface thereof is in a direction substantially perpendicular to the Y-axis. It is fixed towards.
  • the lens barrel base plate 31 constitutes a laser interferometer system together with the pair of X laser interferometers 98x described above, and a Y laser interferometer 98y that irradiates a length measuring beam Ly parallel to the Y axis to the Y movable mirror 48y. Is fixed.
  • the position information of the main stage 40 in the Y-axis direction is always measured by the Y laser interferometer 98y with a resolution of about 0.5 to 1 nm, for example.
  • the reflecting surfaces of the pair of X moving mirror 48x and Y moving mirror 48y are XY planes (hereinafter referred to as measurement reference planes) whose centers in the Z-axis direction are substantially the same as the lower surface (pattern surface) of the mask M. It is arranged at almost the same height.
  • each of the pair of X laser interferometer 98x and Y laser interferometer 98y irradiates each of the movable mirrors 48a to 48c with the length measurement beams Lx and Ly on the measurement reference plane, and the main stage 40 in the XY plane. Position information is measured on the measurement reference plane without so-called Abbe error.
  • the substages 50 and 70 are mounted on the substage guides 37a and 37b, respectively.
  • the substage guide 37a is installed on the floor surface F in a state of being separated from the body BD, on the -Y side of the body BD, and the substage guide 37b on the + Y side of the body BD, respectively.
  • the substage guide 37a has a guide part 38a (see FIG. 2) that is a plate-like member parallel to the XY plane with the X-axis direction as the longitudinal direction, and a plurality of, for example, four, supporting the guide part 38a on the floor surface F.
  • a pair of leg portions 39a (in FIG. 1, the two leg portions 39a on the -X side are hidden behind the paper surface).
  • the substage guide 37b also has a guide portion 38b having a similar configuration and a plurality of leg portions 39b.
  • the guide part 38a of the substage guide 37a is disposed at a higher position (+ Z side) than the guide part 38b of the substage guide 37b (that is, the leg part 39a is longer than the leg part 39b).
  • support members 36a and 36b for supporting cable chains 89a and 89b are fixed to the leg portions 39a and 39b of the substage guides 37a and 37b, respectively.
  • the cable chain 89a supplies power to the substage 50 (or to the main stage 40 via the substage 50)
  • the cable chain 89b supplies power to the substage 70 (or to the main stage 40 via the substage 70).
  • Cable or a tube for supplying utility for example, vacuum suction force, pressurized gas, cooling liquid, etc.).
  • a pair of X linear guides 51 is fixed on the upper surface of the guide portion 38a.
  • the pair of X linear guides 51 are arranged at predetermined intervals in the Y-axis direction with the X-axis direction as the longitudinal direction.
  • a magnet unit 52 including a plurality of magnets arranged along the X-axis direction is fixed between the pair of X linear guides 51 on the upper surface of the guide portion 38a.
  • an X scale 53 made of a plate member parallel to the XZ plane whose longitudinal direction is the X axis direction is fixed to the side surface on the ⁇ Y side of the guide portion 38a.
  • the guide part 38b has the same configuration as the guide part 38a. That is, the pair of X linear guides 71 and the magnet unit 72 are fixed to the upper surface of the guide portion 38b, and the X scale 73 is fixed to the side surface on the ⁇ Y side of the guide portion 38b.
  • the substage 50 is mounted on the X stage 54 that is movable in the X axis direction on the guide portion 38 a of the substage guide 37 a, and is mounted on the X stage 54. And a Y stage 55 movable in the direction.
  • the X stage 54 is composed of a rectangular plate-like member in plan view with the X-axis direction as the longitudinal direction (see FIG. 2), and rolling bearings (eg, balls, rollers, etc.) (not shown) are provided at the four corners of the lower surface thereof.
  • the slider 56 having an inverted U-shaped cross section is fixed (only two on the + X side are shown in FIG. 3 and two on the ⁇ X side are hidden behind the drawing).
  • the two sliders 56 on the + Y side are engaged with the X linear guide 51 on the + Y side, and the two sliders 56 on the ⁇ Y side are engaged with the X linear guide 51 on the ⁇ Y side in a slidable state.
  • a coil unit 57 including a coil is fixed to the central portion of the lower surface of the X stage 54 so as to face the magnet unit 52.
  • the coil unit 57 and the magnet unit 52 constitute an X linear motor for driving the X stage 54 on the pair of X linear guides 51 in the X axis direction.
  • the magnitude and direction of the current supplied to the coils constituting the coil unit 57 are controlled by a main controller (not shown).
  • X linear that measures positional information in the X axis direction of the X stage 54 is measured.
  • An X head 58 constituting the encoder system is fixed via a predetermined fixing member.
  • the measurement value of the X head 58 is supplied to a main control device (not shown), and the main control device controls the X linear motor based on the measurement value of the X head 58 to thereby determine the position of the X stage 54 in the X axis direction. Control.
  • a coil unit 60 including a coil is fixed as shown in FIG.
  • size and direction of the electric current supplied to the coil which comprises the coil unit 60 are controlled by the main controller which is not shown in figure.
  • a slider 61 having a U-shaped cross section including a rolling bearing (not shown) such as a ball and a roller is fixed (in FIG. 3, only two on the + X side). The two on the -X side are hidden behind the drawing).
  • the Y stage 55 is composed of a rectangular plate-like member having a longitudinal direction in the X-axis direction in plan view (see FIG. 2), and a magnet unit 62 including a plurality of magnets arranged in the Y-axis direction at the center of the lower surface. Is fixed.
  • the magnet unit 62 constitutes a Y linear motor that drives the Y stage 55 in the Y-axis direction together with the coil unit 60.
  • the Y linear motor may have a moving coil system in which the arrangement relationship between the coil unit and the magnet unit is the reverse of the above case (moving magnet system).
  • a Y linear guide 63 whose longitudinal direction is the Y axis direction is fixed to the + X side and the ⁇ X side of the magnet unit 62 on the lower surface of the Y stage 55 (in FIG. 3, the Y linear guide on the ⁇ X side is a drawing).
  • Each of the pair of Y linear guides 63 is slidably engaged with a slider 61 fixed on the upper surface of the X stage 54, and the Y stage 55 moves straight in the Y axis direction on the X stage 54. While guiding, the movement of the Y stage 55 in the X-axis direction on the X stage 54 is restricted.
  • the arrangement relationship between the Y linear guide and the slider may be opposite to that described above.
  • a Y scale 64 made of a plate member parallel to the YZ plane whose longitudinal direction is the Y-axis direction is fixed to the side surface of the Y stage 55 on the + X side.
  • a one-dimensional grating having a Y axis direction as a periodic direction is formed.
  • a Y head 59 constituting a Y linear encoder system that measures positional information in the Y axis direction of the Y stage 55 together with the Y scale 64 is located at the center of the upper surface of the X stage 54 on the + X side. It is fixed via a predetermined fixing member.
  • the measurement value of the Y head 59 is supplied to a main control device (not shown), and the main control device controls the Y linear motor based on the measurement value of the Y head 59 to thereby determine the position of the Y stage 55 in the Y axis direction. Control.
  • the Y head 59 and the Y scale 64 are not shown in FIGS. 1 and 3.
  • An X stator 65 is fixed to a central portion on the + Y side on the upper surface of the Y stage 55 via an attachment member 65a (see FIG. 3) having an L-shaped cross section.
  • the X stator 65 has a coil unit (not shown) including a plurality of coils.
  • the X-axis direction driving force (for example, electromagnetic force (Lorentz force)) is generated by the electromagnetic interaction, and the main stage 40 is driven in the X-axis direction with respect to the substage 50 to move the main stage 40 in the X-axis direction.
  • An inductive X voice coil motor (hereinafter abbreviated as XVCM1 (see FIG. 3)) is configured. That is, when the substage 50 is driven in the X-axis direction by the above-described X linear motor, the main stage 40 is driven integrally with the substage 50 by the XVCM 1 generating a driving force.
  • the relative position information of the main stage 40 and the substage 50 in the X-axis and Y-axis directions is fixed to the substage 50 via a predetermined fixing member, for example, an eddy current method.
  • a gap sensor an X-axis direction measurement gap sensor 66 and a Y-axis direction measurement gap sensor 67
  • a displacement sensor or a capacitance type or the like
  • the gap sensors 66 and 67 measure the gaps between the targets 49a and 49b, respectively, thereby measuring the relative position information of the main stage 40 and the substage 50 in the X-axis and Y-axis directions.
  • the substage 70 includes a drive system and a measurement system except that the position of an X stator 85 to be described later is different and has a Y stator 88 to be described later. It is constituted similarly. That is, the substage 70 has an X stage 74 and a Y stage 75.
  • the X stage 74 is mounted on the X linear guide 71 via a slider 76 fixed to the lower surface thereof, and is configured by an X linear motor composed of a coil unit 77 and a magnet unit 72 fixed to the lower surface thereof. It is driven on the guide 71 in the X-axis direction.
  • the Y stage 75 is mounted on a slider 81 fixed on the X stage 74 via a Y linear guide 83 fixed on the lower surface thereof, and the upper surface of the X unit 74 and the magnet unit 82 fixed on the lower surface thereof. It is driven in the Y-axis direction on the X stage 74 by a Y linear motor composed of a coil unit 80 fixed to the X stage.
  • the position information of the X stage 74 in the X-axis direction includes the X head 78 fixed to the X stage 74 via a predetermined fixing member and the X head fixed to the guide portion 38b, as shown in FIGS. It is measured by an X linear encoder system configured with a linear scale 73. Further, the position information of the Y stage 75 in the Y-axis direction is composed of a Y head 79 fixed to the X stage 74 via a predetermined fixing member, and a Y linear scale 84 fixed to the Y stage 75. It is measured by a linear encoder system.
  • an X stator 85 is fixed to the upper surface of the Y stage 75 via a fixing member 85a having an L-shaped cross section.
  • the X stator 85 is an X voice coil motor that generates a driving force for driving the main stage 40 relative to the substage 70 in the X-axis direction by electromagnetic interaction with the X mover 45 fixed to the main stage 40.
  • XVCM2 X voice coil motor
  • the main controller (not shown) also combines XVCM1 and XVCM2.
  • the main stage 40 is driven in the same direction as the substages 50 and 70 with respect to the substages 50 and 70, thereby moving the main stage 40 and the substages 50 and 70 integrally in the X-axis direction.
  • the main control device slightly drives the main stage 40 in the ⁇ z direction as appropriate by varying the driving forces of the XVCM1 and XVCM2.
  • a Y stator 88 is fixed above the X stator 85 to the fixing member 85a.
  • the Y stator 88 has a coil unit (not shown) including a plurality of coils.
  • the Y stator 88 is a Y voice coil motor (hereinafter referred to as YVCM) that slightly drives the main stage 40 in the Y-axis direction with respect to the sub stage 70 by electromagnetic interaction with the Y mover 44 fixed to the main stage 40. For short).
  • YVCM Y voice coil motor
  • relative position information of the main stage 40 and the substage 70 in the X-axis direction is transferred to the main stage 40 by a gap sensor 86 fixed to the X stage 74 via a predetermined fixing member.
  • the relative position information about the Y-axis direction between the main stage 40 and the substage 70 is fixed to the Y stage 75 via a predetermined fixing member, measured through a target 49c fixed via a predetermined fixing member.
  • the gap sensor 87 is used for measurement through a target 49d fixed to the main stage 40 via a predetermined fixing member.
  • FIGS. 4 (A) and 4 (B) an operation (Y step operation) when the main stage 40 moves with a predetermined stroke in the + Y direction, for example, will be described with reference to FIGS. 4 (A) and 4 (B).
  • FIGS. 4A and 4B the leg portions and the bodies of the substage guides 37a and 37b are not shown.
  • the main stage 40 is located in the vicinity of the ⁇ Y side end of the movable range in the Y-axis direction.
  • the main controller (not shown) controls the Y linear motors of the sub-stages 50 and 70, respectively. Are driven in the + Y direction on the X stages 54 and 74 (see FIG. 4B).
  • the main controller since the main stage 40 and the substages 50 and 70 are in a non-contact state, the main controller also outputs the output of the above-described optical interferometer system (Y laser interferometer 98y (see FIG. 3)).
  • the main stage 40 is guided in the Y-axis direction by controlling the YVCM based on the above and driving the main stage 40 in the + Y direction with respect to the substage 70 (the main stage 40 is pulled to the substage 70 via the YVCM). )
  • the main stage 40 and the sub-stages 50 and 70 are integrally moved in the + Y direction.
  • the main control device performs the same control when driving the main stage 40 in the -Y direction.
  • the movement stroke of the substages 50 and 70 in the Y-axis direction is a distance corresponding to the interval in the Y-axis direction on the wafer W between two adjacent projection areas of the plurality of projection areas of the mask pattern image described above. It is set above.
  • a plurality of strip-shaped (strip-shaped) regions extending in the scanning direction (X-axis direction) are provided on the pattern surface of the mask M at predetermined intervals in the Y-axis direction.
  • the moving stroke in the Y-axis direction of 70 is set to be equal to or greater than the interval between adjacent belt-like regions among the plurality of belt-like regions.
  • the main control device drives the main stage 40 in the X-axis direction, it controls the pair of X linear motors to drive the X stages 54 and 74 of the substages 50 and 70 synchronously in the X-axis direction. To do.
  • the main control device controls the XVCM1 and XVCM2 based on the output of the optical interferometer system (a pair of X laser interferometers 98x (see FIG. 2)), and controls the main stage 40 to the substages 50 and 70.
  • the optical interferometer system a pair of X laser interferometers 98x (see FIG. 2)
  • the main controller when the main stage 40 is driven with a long stroke in the X-axis direction (scan direction) using the substages 50 and 70 at the time of exposure or the like, the main controller appropriately uses the YVCM in combination with the XVCM1 and XVCM2.
  • the main stage 40 In order to control and follow the movement of the substrate P (see FIG. 1) driven by, for example, the substrate stage apparatus PST (see FIG. 1), the main stage 40 is slightly driven in the Y-axis direction (cross scan during the scanning operation). Drive slightly in the direction).
  • XVCM1, XVCM2, and YVCM in the Z-axis direction will be described.
  • XVCM1 and XVCM2 are arranged on the upper surface side and the lower surface side of the main stage 40, respectively, and XVCM1, Since the thrust when the XVCM2 drives the main stage 40 in the X-axis direction is substantially the same force (the magnitude and direction of the force), the thrust generation position by the XVCM1 and the thrust generation position by the XVCM2 are intermediate points. It acts on the main stage 40.
  • XVCM1 and XVCM2 are arranged at equal distances in the Z-axis direction from the XY plane including the center of gravity position CG of the main stage 40. Therefore, XVCM1 and XVCM2 cause the main stage 40 to exert thrust in the X-axis direction within the XY plane including the center of gravity position CG of the main stage 40. Similarly, the arrangement position of the YVCM in the Z-axis direction is set so that thrust acts on the main stage 40 in a plane parallel to the XY plane including the center of gravity position CG of the main stage 40.
  • the main stage 40 when the main stage 40 is driven in the X-axis direction and / or the Y-axis direction using the XVCM1, XVCM2, and YVCM with respect to the substages 50 and 70, the moment (pitching) around the axis orthogonal to the driving direction is driven. Moment) does not act on the main stage 40, and the main stage 40 can be driven along the XY plane with high accuracy.
  • the mask stage apparatus MST has a pair of positioning apparatuses 90 for positioning the main stage 40 at a specific position in the XY plane, as shown in FIG.
  • the pair of positioning devices 90 includes a pair of positioning members 91 (see FIG. 2) fixed to the side surface on the + X side of the main body 41 of the main stage 40 so as to be separated in the Y-axis direction, and the pair of positioning members 91. It has a pair of positioning cylinders 95 fixed to the upper surface of the lens barrel base plate 31 at substantially the same interval. A conical recess 92 that opens downward ( ⁇ Z side) is formed on the lower surface of the pair of positioning members 91.
  • Each of the pair of positioning cylinders 95 includes a cylinder case 95a extending in the Z-axis direction and a rod 95b having one end inserted into the cylinder case 95a, for example, an air cylinder (or a hydraulic cylinder, or an electric uniaxial drive) Device).
  • a ball 96 is attached to the other end of the rod 95b.
  • the pair of positioning cylinders 95 are stopped when the position information of the main stage 40 is measured for the first time by the laser interferometer system, for example, when the liquid crystal exposure apparatus 10 is used for the first time or after maintenance of the liquid crystal exposure apparatus 10 is performed. This is used when positioning the main stage 40 at the measurement origin position of the laser interferometer system (hereinafter abbreviated as the measurement origin position) when the measurement is resumed.
  • the pair of positioning cylinders 95 are cylinders such that the ball 96 does not come into contact with the main stage 40 except when the main stage 40 is positioned (for example, during exposure). It is set as the state accommodated in case 95a (accommodated state).
  • the position of the main stage 40 is set so that the positions of the pair of positioning members 91 and the pair of positioning cylinders 95 in the X-axis direction and the Y-axis direction are approximately the same.
  • the position is adjusted. This adjustment may be performed manually by the operator of the liquid crystal exposure apparatus 10 or controlled so that the positioning is automatically adjusted based on the outputs of the gap sensors 66, 67, 86, 87 (see FIG. 2). You may do it.
  • air or the like is supplied into the cylinder case 95a, the rod 95b protrudes from the cylinder case 95a and the ball 96 is fitted into the recess 92, as shown in FIG.
  • the main stage 40 is not restrained in the X-axis direction and the Y-axis direction with respect to the sub-stages 50 and 70, and is levitated and supported on the pair of main stage guides 35. Therefore, the ball 96 is fitted in the recess 92. At this time, the surface of the ball 96 and the surface (tapered surface) forming the recess 92 of the positioning member 91 slide, and the main stage 40 is guided to a position where the center axis of the cylinder 95 and the center axis of the recess 92 coincide. The Therefore, the main stage 40 can always be positioned with high accuracy at the same position. Further, in a state where the pair of balls 96 are fitted in the pair of recesses 92, the outer peripheral surface of the ball 96 and the tapered surface forming the recess 92 are in contact with each other without any gap. Shaking is prevented.
  • the movement of the main stage 40 in the X-axis direction, the Y-axis direction, and the ⁇ z direction is restricted in a state where the pair of balls 96 are fitted in the pair of recesses 92, respectively.
  • Each of the pair of moving mirrors 48x and the moving mirror 48y (see FIG. 2) is a measurement beam emitted from the corresponding laser interferometer 98x, 98y in a state where the main stage 40 is positioned by the pair of positioning devices 90.
  • the mounting position with respect to the main body 41 is adjusted so that Lx and Ly are perpendicularly incident on the reflecting surface.
  • the main stage 40 is positioned at the measurement origin position using the pair of positioning devices 90.
  • the main stage 40 is positioned using the pair of positioning devices 90, and the main control device (not shown) performs main processing based on the outputs of the gap sensors 66, 67, 86, 87 described above.
  • the positional relationship between the stage 40 and each of the substages 50 and 70 is stored.
  • the main stage 40 that is supported in a non-contact floating manner (that is, there is no member that restrains its position in the horizontal plane) flows. This prevents a situation in which measurement by the laser interferometer system cannot be performed.
  • the arrangement relationship between the ball and the positioning member (concave portion) may be reversed (the positioning member having the concave portion in the cylinder may be fixed, and the ball may be fixed to the main stage).
  • the mask M is loaded onto the mask stage apparatus MST by a mask loader (not shown) and
  • the substrate P is loaded onto the substrate stage device PST by the illustrated substrate loader.
  • the main controller performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its description is omitted.
  • the mask stage apparatus MST included in the liquid crystal exposure apparatus 10 uses the YVCM including the Y stator 88 included in the substage 70 and the Y movable element 44 included in the main stage 40, so that the main stage 40. Is driven slightly in the cross-scan direction (Y-axis direction) with respect to the sub-stages 50 and 70 (on the sub-stages 50 and 70). Therefore, even if the main stage 40 is slightly driven in the cross-scan direction, Since the relative positions of the magnet unit 52 and the coil unit 57 constituting the X linear motor for driving the stages 50 and 70 in the X-axis direction and the magnet unit 72 and the coil unit 77 in the cross-scan direction do not change. Do not increase the size of the X linear motor stator (magnet units 52, 72). , It is possible to drive the main stage 40 is always in the scan direction at constant thrust.
  • the main stage 40 holding the mask M is connected to a pair of Y linear motors (a magnet unit 62 and a coil unit 60, and a magnet unit 82 and a coil unit 80, respectively) via a YVCM.
  • Y linear motors a magnet unit 62 and a coil unit 60, and a magnet unit 82 and a coil unit 80, respectively
  • YVCM Y linear motors
  • the exposure operation for transferring the pattern B over the pattern A is continuously performed without exchanging the mask. Can be done.
  • XVCM1, XVCM2, and YVCM for guiding the main stage 40 in the X-axis direction and the Y-axis direction are moving magnet type voice coil motors, respectively.
  • the main stage 40 includes a Y mover including a magnet unit. 44 and X movers 45 and 46 need only be provided, and it is not necessary to connect a power supply cable or the like to the main stage 40. Therefore, it is possible to prevent external vibration (disturbance) from being transmitted to the main stage via a cable or the like. Further, the position control of the main stage is not difficult due to the tension of the cable.
  • the liquid crystal exposure apparatus of the second embodiment is the same as that of the liquid crystal exposure apparatus of the first embodiment except that a masking blade apparatus (masking system) for shielding part of the mask from illumination light is provided in the mask stage apparatus. Since it has the same configuration as the exposure apparatus 10, only the configuration of the mask stage apparatus will be described below.
  • the description is abbreviate
  • FIG. 6 shows a plan view of the mask stage apparatus MSTa according to the second embodiment.
  • FIG. 7 shows a cross-sectional view taken along line AA of FIG. 6 and 7, the gap sensor provided in the substages 50 and 70 and the target provided in the main stage 40 are not shown in order to avoid complication of the drawings. Is the same as in the first embodiment.
  • the masking blade device MB includes a pair of blade main bodies 110 installed between the substages 50 and 70 and a pair of blade driving devices 140 that drive the pair of blade main bodies 110 in the X-axis direction. And.
  • the configuration of the pair of blade main bodies 110 is the same except that one is disposed on the ⁇ X side of the other. Therefore, in the following, one blade main body 110 shown in FIG. The configuration will be described.
  • the blade body 110 includes a light shielding part 111, a pair of driven parts 112, and a pair of connection parts 113 that connect the light shielding part 111 and the pair of driven parts 112. ing.
  • the light shielding part 111 is a rectangular plate-like member that is arranged in parallel to the XY plane and whose longitudinal direction is the Y-axis direction. The dimension in the longitudinal direction is set longer than the longitudinal dimension of the mask M.
  • the light shielding portion 111 is accommodated in the opening 41a of the stage main body 41 of the main stage 40, and the lower surface thereof faces the upper surface of the mask M via a predetermined clearance.
  • Each of the pair of driven parts 112 is composed of a rectangular plate-like member having a longitudinal direction in the Y-axis direction that is arranged in parallel to the XY plane.
  • the pair of driven parts 112 are arranged at a predetermined interval with respect to the Y-axis direction.
  • the + Y side driven portion 112 has the + Y side end disposed above the ⁇ Y side end of the light shielding portion 111, and the + Y side driven portion 112 has the ⁇ Y side driven portion 112 the light shielding portion.
  • 111 is arranged above the + Y side end of 111.
  • Each of the pair of connection portions 113 is a plate-like member extending in the Z-axis direction.
  • One connecting portion 113 connects the end portion on the -Y side of the light shielding portion 111 and the end portion on the + Y side of the driven portion 112 on the -Y side, and the other connecting portion 113 connects + Y of the light shielding portion 111. And the ⁇ Y side end of the driven portion 112 on the + Y side are connected.
  • the blade body 110 is not in contact with the main stage 40.
  • Each of the pair of blade driving devices 140 is a member having the longitudinal direction in the X-axis direction, and one is mounted on the substage 50 and the other is mounted on the substage 70 via a pair of fixing members 141 each having an L-shaped cross section. Has been.
  • the configuration of the pair of blade driving devices 140 is the same.
  • the pair of blade driving devices 140 support the + Y side and ⁇ Y side ends of the pair of blade main bodies 110 on the upper surfaces thereof.
  • the blade driving device 140 has, for example, a coil unit (not shown) including a plurality of coils, and is fixed to the coil unit and the + Y side and the ⁇ Y end of each of the pair of blade bodies 110.
  • Each of the pair of blade bodies 110 is independently driven in the X-axis direction by a linear motor constituted by a magnet unit (not shown).
  • a guide member that linearly guides the pair of blade main bodies 110 in the X-axis direction may be provided. Further, as long as the pair of blade bodies 110 can be driven on the pair of substages 50 and 70, the driving method is not limited to this, and for example, a feed screw or the like may be used.
  • the pair of blade bodies 110 are separated from each other by the pair of blade driving devices 140, respectively.
  • the mask M moves away from the movement path of the mask M during loading and unloading.
  • the pair of blade main bodies 110 are driven in directions close to each other by the pair of blade driving devices 140 and appropriately positioned at arbitrary positions on the mask M, so that the mask M is related to the X-axis direction. Any position above is shielded from illumination light. Thereby, the illumination area on the mask M illuminated by the illumination light is limited.
  • a masking blade device (not shown) that has a pair of light shielding members movable in the Y-axis direction with respect to the mask M and shields an arbitrary position on the mask M from the illumination light in the Y-axis direction is, for example, a mask It may be arranged between stage device MSTa and illumination system IOP (see FIG. 1) or below projection optical system PL.
  • an arbitrary position of the mask M can be shielded from illumination light using the masking blade apparatus MB. Therefore, only the pattern at an arbitrary position on the mask M can be reliably transferred to the substrate P.
  • the masking blade device MB since the masking blade device MB is arranged over the substages 50 and 70 and is not in contact with the main stage 40, the weight of the masking blade device MB does not act on the main stage 40. Thereby, deformation of the main stage 40 and the mask M held by the main stage 40 can be prevented. Further, since the masking blade device MB and the main stage 40 are separated in vibration, the occurrence of a resonance phenomenon between them is prevented, and the position of the main stage 40 can be controlled with high accuracy. In addition, since the main stage does not become heavier than when a masking blade device (not shown) having the same function as the masking blade device MB is mounted on the main stage, for example, the main stage can be driven with a small thrust. Therefore, the actuator (the voice coil motor in the above embodiment) that drives the main stage can be reduced in size.
  • the configuration of the mask stage apparatus included in the liquid crystal exposure apparatuses of the first and second embodiments is merely an example.
  • modified examples of the mask stage apparatus included in the liquid crystal exposure apparatus of the above embodiment will be described.
  • the same or similar reference numerals as those in the first embodiment are used for the same or equivalent components as those in the first embodiment. Description is omitted.
  • FIG. 8 a part of the liquid crystal exposure apparatus 10a according to the first modification is omitted, and a partial sectional view is shown.
  • a mask stage device MSTb, a body BDa, a substrate stage device (not shown) (see FIG. 1), and the like are housed in a chamber 200 installed on a floor surface (see FIG. 1).
  • the guide portions 38a and 38b that support the substages 50 and 70 are suspended from the ceiling of the chamber 200 via the suspension members 239a and 239b, respectively. It is different from the first and second embodiments in that it is fixed.
  • each of the suspension members 239a and 239b is provided as a pair spaced apart in the X-axis direction, and both ends of the guide portions 38a and 38b in the X-axis direction are provided. Supports hanging from the ceiling.
  • the body BDa (and the substrate stage apparatus not shown) can be enlarged because the substage guides are not arranged on both sides of the body BDa, compared to the above embodiments.
  • a masking blade device mounted on the mask stage device of the second embodiment may be mounted on the mask stage device MSTb of the first modification shown in FIG.
  • FIG. 9 shows a perspective view in which a part of the mask stage apparatus MSTc according to the second modification is omitted.
  • the mask stage apparatus MSTc shown in FIG. 9 is different from the first and second embodiments in the positions of the pair of X movable mirrors 48x fixed to the main stage 340.
  • On the lower surface of the main body 341 of the main stage 340 a pair of recesses 347 opened to the ⁇ X side are formed apart from each other in the Y-axis direction.
  • Each of the pair of X movable mirrors 48x is housed in each of the pair of recesses 347 and fixed to the main body 341.
  • the pair of X movable mirrors 48x are arranged on the inner side of the main body 341.
  • the position control of the main stage 340 can be performed with high accuracy.
  • the rigidity of the attachment position can be increased as compared with the X movement mirror attachment position of the first and second embodiments, the natural frequency of the X movement mirror unit can be increased and the control performance can be improved.
  • FIG. 10 shows a plan view of a mask stage apparatus MSTd included in the liquid crystal exposure apparatus 1000 of the third embodiment
  • FIG. 11 shows a side view of the mask stage apparatus MSTd viewed from the + X direction.
  • the liquid crystal exposure apparatus 1000 of the third embodiment has the same configuration as the liquid crystal exposure apparatus 10 of the first embodiment described above except that it has a mask stage apparatus MSTd instead of the mask stage apparatus MST. Have. Only the configuration of the mask stage apparatus MSTd will be described below.
  • the mask stage apparatus MSTd according to the third embodiment is configured in the same manner as the mask stage apparatus MST according to the first embodiment as is apparent from, for example, comparing FIG. 10 and FIG. However, some configurations are different. Hereinafter, the third embodiment will be described focusing on such differences.
  • the locking devices 100a and 100b for connecting the main stage 40 and the substage 50 shown in FIG. 10 and the main stage 40 and the substage 70 are connected.
  • the locking device 100a and the locking device 100b have substantially the same configuration.
  • the locking device 100c and the locking device 100d have substantially the same configuration.
  • FIG. 12A schematically shows the configuration of the locking device 100a on the ⁇ Y side and the + X side of the main stage 40 as a representative of the locking devices 100a and 100b.
  • the lock device 100a has a lock part 101 fixed to the end of the upper surface of the Y stage 55 on the + Y side via a fixing member 102 having an L-shaped cross section. Yes.
  • the aforementioned gap sensor 67 for Y-axis direction measurement is fixed to the fixing member 102 via an attachment member 67a having an L-shaped cross section.
  • the lock unit 101 has a shaft 103 that extends in the Z-axis direction and is movable in the Z-axis direction.
  • the method for driving the shaft 103 in the Z-axis direction is not particularly limited, and can be driven by, for example, an air cylinder device or a solenoid.
  • a ball 104 is fixed to the lower end of the shaft 103.
  • a flat support member 105 is fixed to the ⁇ Y side end of the upper surface of the main body 41 of the main stage 40.
  • the aforementioned target 49 b which is a target for measuring the gap with the gap sensor 67, is fixed to the upper surface of the support member 105.
  • a support member 106 which is a plate-like member having an L-shaped cross section is fixed to the lower surface of the end portion on the ⁇ Y side of the support member 105.
  • an engagement member 107 made of a disk-like (a column with a low height) below the shaft 103 (position facing the ball 104). It is fixed.
  • a conical recess 107 a that opens upward (+ Z side) is formed on the upper surface of the engagement member 107.
  • the main stage 40 is The substage 50 is not restrained.
  • FIG. 12B when the shaft 103 moves in the ⁇ Z direction and the ball 104 fits into the concave portion 107a, the main stage 40 and the substage 50 are connected, and within the XY plane. The relative movement of is limited. Further, since the locking device 100a (and the locking device 100b) is configured to fit the ball 104 into the conical recess 107a, the main stage 40 shown in FIG. Then, the relative positional relationship between the main stage 40 and the substage 50 is always the same.
  • the gap sensor 66 for measuring the X-axis direction is fixed to the X stage 54 via a predetermined fixing member, and the gap sensor 66 is used to measure the gap.
  • the above-described target 49 a is fixed to the upper surface of the support member fixed to the main stage 40.
  • Each of the gap sensor 66 and the target 49a is fixed to the fixing member and the support member in such a direction that the gap measurement direction is the X-axis direction.
  • FIG. 13 shows a schematic configuration of the locking device 100c on the + Y side and the + X side of the main stage 40 as a representative of the locking devices 100c and 100d.
  • the locking device 100c has a structure in which the locking device 100a shown in FIG. 12A is turned upside down. That is, the locking device 100c has a lock portion 101 fixed to the Y stage 75 via a fixing member 102, and the lock portion 101 has a shaft 103 that can move up and down and has a ball 104 fixed to the upper end. Yes.
  • the gap sensor 87 for measuring the Y-axis direction is fixed to the fixed member 102.
  • an engagement member 107 having a conical recess 107 a that opens downward through the support members 105 and 106 is fixed to the main stage 40.
  • the aforementioned target 49 d which is a target for measuring the gap with the gap sensor 87, is fixed to the support member 106.
  • the locking device 100c connects the main stage 40 and the substage 70 by fitting the ball 104 into the recess 107a, and restricts relative movement in the XY plane.
  • the gap sensor 86 for measuring the X-axis direction is fixed to the fixing member 102, and the above-mentioned target 49c, which is a target for measuring the gap by the gap sensor 86, is a support member.
  • the gap sensor 86 and the target 49c are each fixed to the fixing member 102 and the supporting member 105 in such a direction that the gap measurement direction is the X-axis direction.
  • the main stage 40 in a state where the main stage 40 is connected to each of the substages 50 and 70 using the locking devices 100a to 100d, when the X stages 54 and 74 are driven in the X-axis direction by the X linear motor, The main stage 40 can be driven in the X-axis direction without using XVCM1 and XVCM2 (see FIG. 11) to accelerate to the target speed during exposure, or the main stage 40 can be decelerated. For this reason, it is not necessary to use what can generate a large thrust as XVCM1 and XVCM2, and XVCM1 and XVCM2 can be downsized. Similarly, when the Y stages 55 and 75 are driven in the Y-axis direction using the Y linear motor, the main stage 40 can be driven in the Y-axis direction without using YVCM (see FIG. 11).
  • the main controller (not shown) connects the substages 50 and 70 and the main stage 40 using the lock devices 100a to 100d, and uses the substages 50 and 70 to bring the main stage 40 to the measurement origin position. Tow. Then, after the main controller 40 positions the main stage 40 at the measurement origin position, the main controller 40 releases the connection by the lock devices 100a to 100d, and the gap sensors 66, 67, 86, 87 (see FIG. 10) described above are released. Preset the interferometer system while monitoring misalignment based on the output.
  • each of the locking devices 100a to 100d the contact surface between the outer peripheral surface of each ball 104 and the tapered surface forming each recess 107a is representative of the main stage 40 as shown in FIG.
  • the positions of the engaging members 107 are set so as to be arranged on a plane parallel to the XY plane including the gravity center position CG. Accordingly, when both the substages 50 and 70 are driven in the X-axis direction and / or the Y-axis direction in a state where the substages 50 and 70 and the main stage 40 are connected using the locking devices 100a to 100d, the substage 50 , 70 presses the main stage 40 and acts in a plane parallel to the XY plane including the center of gravity position CG of the main stage 40.
  • the main stage 40 when the main stage 40 is driven in the X-axis direction and / or the Y-axis direction, a moment around the axis (pitching moment) perpendicular to the drive direction does not act on the main stage 40, and the main stage 40 is stably operated. It can be guided along the XY plane. Further, in the locking devices 100a to 100d, the outer peripheral surface of the ball 104 and the tapered surface forming the concave portion 107a are in contact with each other without a gap, so that a large pressing force is applied when the main stage 40 is pressed against each of the substages 50 and 70. Can act.
  • the mask stage apparatus MSTd of the third embodiment includes stopper apparatuses 120 a and 120 b that limit the relative movement range of the main stage 40 and the substage 50, and the main stage 40 and the substage 50.
  • Stopper devices 120c and 120d for limiting the relative movement range with respect to the stage 70 are provided.
  • the stopper device 120a and the stopper device 120b have substantially the same configuration.
  • the stopper device 120c and the stopper device 120d have substantially the same configuration.
  • FIG. 12A shows the configuration of the stopper device 120a on the ⁇ Y side and the + X side of the main stage 40 as a representative of the four stopper devices.
  • a stopper member 121 is attached to the lower end of the fixing member 102 described above.
  • the stopper member 121 is formed in a rectangular frame shape (a shape having a rectangular outer shape and a rectangular opening (through hole) at the center) in plan view.
  • the above-described support member 106 is accommodated in the opening of the stopper member 121.
  • the support member 106 has a buffer pad 123 (-X formed of, for example, a rubber-based material on a surface facing the stopper member 121 (that is, four side surfaces of + X side, -X side, + Y side, and -Y side). The buffer pad on the side is not shown).
  • a predetermined clearance (gap) is formed between each of the buffer pads 123 fixed to the + X side, ⁇ X side, + Y side, and ⁇ Y side of the support member 106 and the stopper member 121.
  • FIG. 12A shows a schematic configuration of the stopper device 120c.
  • the stopper device 120 c is formed in a rectangular frame shape fixed to the fixing member 102, and has a stopper member 121 that accommodates the support member 106 in the opening, and the main stage 40 and the substage 70. Is limited by the width of the clearance between the stopper member 121 and the support member 106 (buffer pad 123).
  • the main stage 40 is moved to the X axis using the substages 50 and 70.
  • the four stopper members 121 come into contact with the respective four cushion pads 123 on the periphery of the corresponding support member 106, thereby preventing the main stage 40 from moving away from the substages 50 and 70.
  • the configuration of other parts of the liquid crystal exposure apparatus 1000 is the same as that of the liquid crystal exposure apparatus 10 of the first embodiment described above, and the same exposure operation is performed.
  • the liquid crystal exposure apparatus 1000 of the third embodiment is configured in the same manner as the liquid crystal exposure apparatus 10 of the first embodiment described above, except for a part of the configuration of the mask stage apparatus MSTd. Therefore, an equivalent effect can be obtained.
  • the main stage 40 is used in a plane including the center of gravity position CG of the main stage 40 using the lock apparatuses 100a to 100d.
  • the substages 50 and 70 can be connected to each other, so that the main stage 40 can be appropriately driven in the X-axis direction and / or the Y-axis direction without using XVCM1, XVCM2, and YVCM.
  • the main stage 40 and the substage 50 are provided at two locations using the lock apparatuses 100a and 100b, and the main stage 40 and the substage 70 are connected to the lock apparatus 100c. Since 100d is used for connection at two locations (four locations in total), the main stage 40 does not rotate in the ⁇ z direction. Further, since the shaft 103 moves in the Z-axis direction, the lock devices 100a to 100d can quickly connect the main stage 40 and the substages 50 and 70, respectively, and have high rigidity in the X-axis direction and the Y-axis direction.
  • the movable shaft may be provided on the main stage, and the engaging member for fitting the ball fixed to the shaft may be provided on the substage side.
  • the shaft which is a movable member, on the substage because the main stage can be reduced in weight.
  • the mask stage device MSTd has stopper devices 120a to 120d that limit the relative movable range between the main stage 40 and the substages 50 and 70.
  • the substages 50 and 70 are temporarily stopped. Even in such a case, the main stage 40 can be prevented from moving away from the substages 50 and 70 due to its inertia. Further, since the buffer pad 123 is provided on the contact surface between the main stage 40 and the substages 50 and 70, the impact at the time of the collision is reduced.
  • the configuration of the mask stage apparatus included in the liquid crystal exposure apparatus of the third embodiment is merely an example.
  • modified examples of the mask stage apparatus provided in the liquid crystal exposure apparatus of the third embodiment will be described.
  • the same reference numerals are used for the same or equivalent components for the sake of simplification of description and convenience of illustration, and description thereof is omitted.
  • FIG. 14 shows a schematic configuration of the lock device 200a and the stopper device 220a of the mask stage device MSTe of the modified example. As in the above embodiment, there are four locking devices and two stopper devices on the ⁇ Y side and the + Y side of the main stage 40, respectively, and FIG. 14 shows one of them. The lock device 200a and the stopper device 220a on the ⁇ Y side and the + X side of the main stage 40 are representatively shown.
  • the contact surface between the stopper member 121 and the support member 106 (buffer pad 123) is arranged on a plane including the center of gravity position CG of the main stage 40. Therefore, when the support member 106 (buffer pad 123) and the stopper member 122 abut and the relative movement between the main stage 40 and the substages 50 and 70 is restricted, the stopper member 121 and the support member 106 are Since the main stage 40 contacts (collises) in the plane including the center of gravity position CG, a moment around the axis (pitching moment) perpendicular to the moving direction does not act on the main stage 40.
  • the connection position of the main stage 40 and each of the substages 50 and 70 by the locking device 200a is on the + Z side from the plane including the center of gravity position CG of the main stage 40.
  • the distance from the plane including the center of gravity position CG of the main stage 40 is very small, and the main stage 40 and the substages 50 and 70 are connected at four positions in the XY plane, so that the above embodiment is substantially implemented.
  • the main stage 40 can be driven along the XY plane with high accuracy.
  • the present invention is not limited to this, for example, the connection position between the main stage and each of the pair of substages by the locking device, and the contact position between the main stage and each of the pair of substages set by the stopper device, respectively. It may be on a two-dimensional plane including the position CG.
  • the lock devices are provided at a total of four locations, two on each side of the main stage.
  • the present invention is not limited to this, and there may be three locations if they are not on the same straight line.
  • the member that comes into contact with the ball may have a groove shape extending in one axis direction (for example, the X-axis direction or the Y-axis direction), even if a part thereof is not a cone.
  • the pair of substages may be movable only in the scanning direction.
  • the main stage and the pair of substages can be integrally driven by at least one of the YVCM and the pair of XVCM1 and XVCM2 and / or the lock devices 100a to 100d.
  • the main stage and the pair of substages are integrated.
  • the configuration of the state setting device that switches between the first driveable state and the second state in which the main stage and the pair of substages cannot be driven integrally is not limited thereto.
  • FIG. 15 shows a plan view of a mask stage apparatus included in the liquid crystal exposure apparatus 2000 of the fourth embodiment.
  • the liquid crystal exposure apparatus 2000 of the third embodiment has the same configuration as the liquid crystal exposure apparatus 10 of the first embodiment described above except that it has a mask stage apparatus MSTf instead of the mask stage apparatus MST. Have. Only the configuration of the mask stage apparatus MSTf will be described below.
  • the mask stage apparatus MSTf according to the fourth embodiment is configured in the same manner as the mask stage apparatus MST according to the first embodiment as is apparent from, for example, comparing FIG. 15 and FIG. However, some configurations are different. Hereinafter, the fourth embodiment will be described focusing on the difference.
  • the mask stage device MSTf includes lock devices 100 a and 100 b that connect the main stage 40 and the sub stage 50, and lock devices 100 c and 100 d that connect the main stage 40 and the sub stage 70.
  • the locking device 100a and the locking device 100b have substantially the same configuration.
  • the locking device 100c and the locking device 100d have substantially the same configuration.
  • FIG. 16A schematically shows the configuration of the locking device 100a on the ⁇ Y side and the + X side of the main stage 40 as a representative of the locking devices 100a and 100b.
  • the locking devices 100a and 100b are configured in the same manner as the locking devices 100a and 100b of the third embodiment described above.
  • the main stage 40 is It is not restrained by the substage 50.
  • FIG. 17B when the shaft 103 moves in the ⁇ Z direction and the ball 104 is fitted into the recess 107a, the main stage 40 and the substage 50 are connected, and within the XY plane. The relative movement of is limited. Further, since the locking device 100a (and the locking device 100b) is configured to fit the ball 104 into the conical recess 107a, the main stage 40 shown in FIG. Then, the relative positional relationship between the main stage 40 and the substage 50 is always the same as in the positioning device 90 described above.
  • FIG. 18 shows a schematic configuration of the locking device 100c on the + Y side and the + X side of the main stage 40 on behalf of the locking devices 100c and 100d.
  • the locking devices 100c and 100d are configured in the same manner as the locking devices 100c and 100d of the third embodiment described above.
  • the locking device 100c connects the main stage 40 and the substage 70 by fitting the ball 104 into the recess 107a, and restricts relative movement in the XY plane.
  • the XVCM1 , XVCM2 can be used to drive the main stage 40 in the X-axis direction to accelerate to the target speed during exposure, or to decelerate the main stage 40. For this reason, it is not necessary to use what can generate a large thrust as XVCM1 and XVCM2, and XVCM1 and XVCM2 can be downsized.
  • the main stage 40 can be driven in the Y-axis direction without using YVCM.
  • the outer peripheral surface of the ball 104 and the tapered surface forming the concave portion 107a are in contact with each other without a gap, so that a large pressing force is applied when the main stage 40 is pressed against each of the substages 50 and 70. Can act.
  • Each of the locking devices 100a to 100d uses the pair of positioning devices 90 described above to place the main stage 40 in the vicinity of the measurement origin position (a position where the ball 96 and the recess 92 correspond (see, for example, FIG. 16A)). It is also used when positioned in
  • the mask stage apparatus MSTf of the fourth embodiment includes stopper apparatuses 120 a ′ and 120 b ′ that limit the relative movement range of the main stage 40 and the substage 50, and the main stage 40.
  • the stopper device 120a 'and the stopper device 120b' have substantially the same configuration.
  • the stopper device 120c 'and the stopper device 120d' have substantially the same configuration.
  • FIG. 17A shows the configuration of the stopper device 120a 'on the -Y side and the + X side of the main stage 40, representing the four stopper devices.
  • a rotating shaft 122 whose axial direction is the X-axis direction is provided at the lower end of the fixing member 102 described above.
  • a member 124 is attached to the lower end of the fixing member 102 so as to be rotatable (reciprocating) about the rotation shaft 122.
  • the stopper member 121 having a rectangular frame shape as described above is integrated with one end of the member 124. Fixed. In this case, the member 124 and the stopper member 121 have an L-shape when viewed from the + X side.
  • the stopper member 121 is rotated around the rotation shaft 122 by an actuator (not shown). As shown in FIG.
  • the above-mentioned support member 106 is accommodated in the opening of the stopper member 121.
  • the support member 106 has a buffer pad 123 ( ⁇ X formed of, for example, a rubber-based material on a surface facing the stopper member 121 (that is, four side surfaces of + X side, ⁇ X side, + Y side, and ⁇ Y side). The buffer pad on the side is not shown).
  • a predetermined clearance is formed between each of the buffer pads 123 fixed to the + X side, ⁇ X side, + Y side, and ⁇ Y side of the support member 106 and the stopper member 121.
  • FIG. 17A shows a schematic configuration of the stopper device 120c ′.
  • the stopper device 120c ′ also has a stopper member 121 attached to the fixed member 102 so as to be rotatable together with the member 124 around the rotation shaft 122.
  • the relative movable range with respect to 70 is limited by the width of the clearance between the stopper member 121 and the support member 106 (buffer pad 123).
  • the main stage 40 is moved to the X axis using the substages 50 and 70.
  • the main stage 40 moves in the X-axis direction and / or the Y-axis direction due to its inertia.
  • the four stopper members 121 abut against the corresponding support members 106, the main stage 40 is prevented from moving away from the substages 50 and 70 (overrun).
  • each of the stopper devices 120a ′ to 120d ⁇ ⁇ ′ the contact surface between each stopper member 121 and each support member 106 is representatively shown, for example, in FIGS. 17 (A) and 18 (A).
  • the positions of the stopper members 121 and the support members 106 are set so as to be arranged on a plane parallel to the XY plane including the center of gravity position CG of the main stage 40. Therefore, when the movement of the main stage 40 is stopped using the stopper devices 120a ′ to 120d ′, that is, when the stopper members 121 and the support members 106 are brought into contact with each other, the main stage 40 is orthogonal to the moving direction. A moment around the axis (pitching moment) does not act, and the posture of the main stage 40 can be prevented from being greatly disturbed.
  • FIG. 19 shows a state in which the stopper member 121 is rotated around the rotation shaft 122 by an actuator (not shown) and separated from the support member 106.
  • the substages 50 and 70 can move away from the main stage 40 and move on the substage guides 37a and 37b in the X-axis direction.
  • the main stage 40 may be kept stationary on the pair of main stage guides 35 by using the pair of positioning devices 90 (see FIGS. 16A and 16B) described above.
  • the fourth embodiment as shown in FIG.
  • the substage 50 , 70 can move away from the main stage 40 only in the ⁇ X direction with respect to the main stage 40.
  • Examples of the case where the substages 50 and 70 are separated from the main stage 40 include a case where maintenance of the substages 50 and 70 is performed.
  • the configuration of other parts of the liquid crystal exposure apparatus 2000 is the same as that of the liquid crystal exposure apparatus 10 of the first embodiment described above, and the same exposure operation is performed.
  • the liquid crystal exposure apparatus 2000 of the fourth embodiment is configured in the same manner as the liquid crystal exposure apparatus 10 of the first embodiment described above, except for a part of the configuration of the mask stage apparatus MSTf. Therefore, an equivalent effect can be obtained.
  • the liquid crystal exposure apparatus 2000 of the fourth embodiment includes the lock devices 100a to 100d having the same configuration as the liquid crystal exposure apparatus 1000 of the third embodiment described above.
  • the main stage 40 can be appropriately driven in the X-axis direction and / or the Y-axis direction without using XVCM1, XVCM2, and YVCM. Therefore, small XVCM1, XVCM2, and YVCM that have a small thrust can be used, thereby reducing power consumption, thereby reducing costs.
  • the main stage 40 and the substage 50 are arranged at two locations using the lock devices 100a and 100b, and the main stage 40 and the substage 70 are locked at the lock devices 100c and 100d. Are connected at two places (total of four places), so that the main stage 40 does not rotate in the ⁇ z direction. Further, in the locking devices 100a to 100d, since the shaft 103 moves in the Z-axis direction, the main stage 40 and the substages 50 and 70 can be quickly connected.
  • the mask stage apparatus MSTf includes the stopper apparatuses 120a ′ to 120d ′ that limit the relative movable ranges of the main stage 40 and the substages 50 and 70, respectively.
  • the main stage 40 is separated from the substages 50 and 70 due to its inertia. Can be prevented.
  • the buffer pad 123 is provided on the contact surface between the main stage 40 and the substages 50 and 70, the impact at the time of the collision is reduced.
  • each of the stopper devices 120a ′ to 120d ′ is different from the stopper devices 120a to 120d described above in that the stopper member 121 is not fixed and is a position that restricts relative movement between the main stage 40 and the substages 50 and 70, respectively. It is configured to be movable between a (restricted position) and a position where the relative movement is not restricted (release position). For this reason, the main stage 40 and the substages 50 and 70 can also be separated by arranging the stopper member 121 at the release position.
  • the movable stopper member may be provided on the main stage, and the member contacting the stopper member may be provided on the substage side.
  • providing the stopper member, which is a movable member, on the substage is advantageous because the main stage can be reduced in weight.
  • a liquid crystal exposure apparatus according to a fifth embodiment.
  • a mask loader device that transfers a mask to and from the main stage is provided in the mask stage device, and a pair of guide portions that support each of the pair of substages. Except for the point that is longer in the X-axis direction than the fourth embodiment (and the first to third embodiments), it has the same configuration as the liquid crystal exposure apparatus 2000 of the fourth embodiment.
  • the same reference numerals are used for the same or equivalent components as in the first and fourth embodiments, and the description thereof is omitted.
  • FIG. 20 shows a plan view of a mask stage apparatus MSTg according to the fifth embodiment. From the viewpoint of avoiding complications in the drawings, the locking devices 100a to 100d, the stopper devices 120a ′ to 120d ′, the gap sensors 66, 67, 86, 87, the targets 49a to 49d (see FIG. 15 respectively), etc. are not shown. It is omitted.
  • the mask loader device ML includes a pair of mask holding devices 130.
  • One of the pair of mask holding devices 130 is mounted on the upper surface of the Y stage 55 of the substage 50, and the other is mounted on the upper surface of the Y stage 75 of the substage 70.
  • the configuration of the pair of mask holding devices 130 is substantially the same except that they are arranged symmetrically (laterally symmetrical) with respect to the X axis.
  • the (-Y side) mask holding device 130 mounted on the substage 50 will be described below.
  • the mask holding device 130 has a movable member 131 and a support member 135.
  • the movable member 131 is a rectangular plate-like member parallel to the XZ plane (see FIG. 20).
  • a pair of claw members 132 that are spaced apart in the X-axis direction are fixed to the lower end of the movable member 131.
  • the ⁇ Y side mask holding device 130 supports the ⁇ Y side of the mask M (or a mask holder not shown) from below with a pair of claw members 132, and the + Y side mask holding device 130 has a pair of
  • the nail member 132 supports the + Y side of the mask M from below.
  • the movable member 131 is fixed to the surface on the ⁇ Y side in a state where a pair of Z linear guide members 133 extending in the Z-axis direction are separated in the X-axis direction (see FIG. 20).
  • the support member 135 is formed of a rectangular plate-like member parallel to the XZ plane facing the ⁇ Y side surface of the movable member 131.
  • Slide members 136 having a U-shaped cross section are fixed to the four corners of the + Y side surface of the support member 135 (see FIG. 21).
  • a drive device 134 including a feed screw device, for example, is provided between the movable member 131 and the support member 135.
  • the movable member 131 is moved up and down (driven in the + Z direction or the ⁇ Z direction) with respect to the support member 135 via the driving device 134.
  • the support member 135 is fixed on the Y stage 55 via a pair of fixing members 137 having an L-shaped cross section and a pair of connection members 138 parallel to the XY plane.
  • the pair of connecting members 138 are connected by a rectangular plate-shaped stiffening member 139 having the X-axis direction as a longitudinal direction. Since the substage 70 is positioned on the ⁇ Z side with respect to the substage 50, the ⁇ Y side fixing member 137 is longer in the Z-axis direction than the + Y side fixing member 137 ( For convenience, the same symbols are used).
  • each of the substages 50 and 70 can transport the mask M held via the mask loader device ML to a predetermined mask exchange position.
  • the mask exchange position is arranged on the ⁇ X side with respect to the area where the main stage 40 moves during scanning exposure, for example.
  • the balls 104 of the locking devices 100a to 100d are separated from the engaging members 107. Further, the main stage 40 is kept stationary on the pair of main stage guides 35 by using the pair of positioning devices 90 (see FIGS. 16A and 16B) described above.
  • the mask M delivery operation described below is performed under the control of a main controller (not shown).
  • the main control device drives each of the substages 50 and 70 in the ⁇ X direction to position the mask loader device ML at the mask exchange position as shown in FIG.
  • a mask (not shown) to be held is exchanged at a mask exchange position, for example, by a mask transport device (not shown).
  • the new mask M is placed on the claw member 132.
  • the mask loader device ML holding the new mask M is positioned above the main stage 40 when the substages 50 and 70 are driven in the X-axis direction (see FIG. 20).
  • the movable member 131 is positioned on the + Z side of the movable range in the Z-axis direction so as not to contact the main stage 40 (see FIG. 21).
  • the pair of movable members 131 holding the mask M is driven in the ⁇ Z direction by the driving device 134 (see FIG. 20) (the movable member 131 descends). See arrow A).
  • the mask M is placed on the chuck unit 42.
  • each member constituting the mask loader device ML such as the movable member 131 and the Z linear guide member 133 is not in contact with the main stage 40.
  • the main controller drives the movable member 131 in the ⁇ Z direction even after placing the mask M on the chuck unit 42, so that the claw member 132, the mask M, Separate them.
  • the main controller performs the exposure processing operation in the state shown in FIG. 23B, that is, in a state where the mask loader device ML is not in contact with either the mask M or the main stage 40. Further, when the mask M held by the main stage 40 is transferred to the mask loader device ML, an operation reverse to the above case is performed.
  • the substages 50 and 70 on which the mask loader apparatus ML is mounted can be moved away from the main stage 40 to the mask exchange position.
  • the length (dimension) in the X-axis direction of the main stage guide 35 that guides the movement of the main stage 40 can be shortened as compared with the case where the 40 itself is moved to the mask exchange position.
  • the liquid crystal exposure apparatus of the sixth embodiment is different in the configuration of the mask loader device provided in the mask stage apparatus, and the point that the guide portion supporting the pair of substages is longer in the X-axis direction than in the fifth embodiment. Except for the liquid crystal exposure apparatus of the fifth embodiment. Below, the structure of a mask loader apparatus is demonstrated. In addition, about the thing which has the structure similar to the said 4th and 5th embodiment, the same code
  • FIG. 24 shows a plan view of the mask stage apparatus MSTh of the sixth embodiment.
  • the mask loader device MLb includes a transfer stage 250 mounted with the substage 50 on the guide portion 438a, a transfer stage 270 mounted with the substage 70 on the guide portion 438b, a pair of mask holding devices 130, It has.
  • the transfer stage 250 is disposed on the ⁇ X side of the substage 50.
  • the transport stage 250 has its drive system except that the dimension in the X-axis direction is set to be somewhat shorter and does not have the X stator 65 and the gap sensors 66 and 67 (see FIG. 15 respectively).
  • the measurement system is included and is configured in the same manner as the substage 50. That is, the transfer stage 250 has an X stage 254 that moves in the X-axis direction on the guide portion 438a, and a Y stage 255 that moves in the Y-axis direction on the X stage 254.
  • the positional information about the X axis direction of the X stage 254 is measured by the X head 258 that constitutes the X linear encoder together with the X scale 53, and the positional information about the Y axis direction of the Y stage 255 constitutes the Y linear encoder together with the Y scale 264. Measured by the Y head 259.
  • the position of the transfer stage 250 is controlled on the guide portion 438a independently of the substage 50 by a main controller (not shown).
  • the transfer stage 270 is arranged on the ⁇ X side of the substage 70.
  • the transfer stage 270 is set such that the dimension in the X-axis direction is set somewhat shorter, and does not have the X stator 85, the Y stator 88, and the gap sensors 86 and 87 (see FIG. 15 respectively). Except for this, the drive system and the measurement system are included, and the configuration is the same as that of the substage 70. That is, the transfer stage 270 includes an X stage 274 that moves in the X-axis direction on the guide portion 438b, and a Y stage 275 that moves in the Y-axis direction on the X stage 274.
  • the positional information about the X axis direction of the X stage 274 is measured by the X head 278 that constitutes the X linear encoder together with the X scale 73, and the positional information about the Y axis direction of the Y stage 275 constitutes the X linear encoder together with the Y scale 284. Measured by the Y head 279.
  • the position of the transfer stage 270 is controlled on the guide portion 438b independently of the substage 70 by a main controller (not shown).
  • One of the pair of mask holding devices 130 is fixed to the upper surface of the Y stage 255, and the other is fixed to the upper surface of the Y stage 275.
  • the configuration of the pair of mask holding devices 130 is substantially the same as that of the fifth embodiment, and a description thereof will be omitted. Further, as shown in FIG. 24, in the mask stage apparatus MSTh, the guide portions 438a and 438b are formed longer in the + X and ⁇ X directions than the guide portions of the fifth embodiment.
  • the delivery operation of the mask M is performed under the control of a main controller (not shown).
  • the main controller When delivering the mask M to the main stage 40, the main controller first positions the mask loader device MLb holding the mask M at the mask exchange position as shown in FIG.
  • the mask loader MLb is exchanged at a mask exchange position, for example, by a mask transport device (not shown).
  • the main controller separates the substages 50 and 70 from the main stage 40 and positions them on the + X side of the main stage 40.
  • the gap sensor used for measuring the distance between the main stage 40 and the sub-stages 50 and 70 in the X-axis direction and the Y-axis direction, and the arrangement of targets (not shown) are as follows. Contrary to the fourth embodiment (see FIG. 15), each gap sensor is arranged on the + X side of the corresponding target (not shown). Thereby, the substages 50 and 70 can move away from the main stage 40 in the + X direction.
  • the main control device controls the X linear motor to drive the mask loader device MLb holding the mask M in the + X direction, thereby positioning the mask M above the main stage 40.
  • the movable member 131 of the mask loader device MLb is moved downward, and the mask M is moved to the chuck unit 42. Is passed on.
  • the main controller controls the Y linear motor to drive the Y stage 255 in the ⁇ Y direction and the Y stage 275 in the + Y direction, respectively.
  • the member 132) is separated from the mask M (see the arrow in FIG. 26A).
  • the main control device controls the drive device 134 (see FIG. 24), and as shown in FIG. 26B, each of the pair of movable members 131 and the lower surface of the claw member 132 is the upper surface of the main stage 40. Drive upward (in the + Z direction) to a higher position (see arrow in FIG. 26B).
  • the main control device controls the X linear motor to drive the mask loader device MLb in the -X direction so as to be positioned at the mask exchange position, and to set each of the substages 50 and 70 to -X.
  • the main stage 40 is positioned on the ⁇ Y side and the + Y side so as to be replaced with the mask loader device MLb. Thereafter, the main stage 40 and each of the substages 50 and 70 are connected in a non-contact state (electromagnetically) or in a contact state (mechanically), and the main stage 40 is connected to the X using the substages 50 and 70.
  • the scanning exposure operation is performed by being driven in the axial direction.
  • the pair of mask holding devices 130 of the mask loader device MLb are sub-stages. 50 and 70 are driven in the X-axis direction by transfer stages 250 and 270, which are members different from 50 and 70, respectively. The load on the motor can be reduced.
  • the pair of mask holding devices 130 of the mask loader device MLb are transported in the same configuration as the substages 50 and 70 as shown in FIG.
  • the driving stages 250 and 270 are driven in the Y-axis direction.
  • the transfer stage can be moved only in the X-axis direction. 24) may be configured to be able to expand and contract in the Y-axis direction, or the mask holding device 130 may be driven in the Y-axis direction on a stage that can move only in the X-axis direction. good.
  • FIG. 28 schematically shows the configuration of a liquid crystal exposure apparatus 3000 according to the seventh embodiment.
  • the liquid crystal exposure apparatus 3000 is a step-and-scan type projection exposure apparatus, a so-called scanner.
  • the mask stage apparatus MSTi is provided with a cable unit, which will be described later, used for supplying working force to the pair of substages.
  • the configuration of other parts is the same as that of the liquid crystal exposure apparatus 10. Therefore, hereinafter, the description will be focused on the differences.
  • the substage guides 37a and 37b included in the mask stage apparatus MSTi have utility, for example, power, high pressure, in the substages 50 and 70, respectively.
  • Cables and tubes for supplying gas (for example, compressed air) or the like hereinafter collectively referred to as cables 99), or transmission / reception of electric signals between the substages 50 and 70 and a main controller (not shown).
  • a cable unit 300 having a similar configuration including cables for the purpose is provided.
  • the cable unit 300 includes a support portion 201 made of a plate-like member having a U-shaped cross section fixed to the X stage 54 of the substage 50.
  • a bearing portion 202 made of a pair of plate-like members spaced apart in the Y-axis direction is fixed to the lower surface of the support portion 201.
  • a pair of bearing portions 202 spaced apart in the X-axis direction are fixed to the bearing portion 202.
  • the rollers 203 are rotatably supported via a pair of rotating shafts 204 each having the Y-axis direction as an axial direction.
  • the cable unit 300 is rotatable about a shaft 205 that is fixed between a pair of leg portions 39a on each of the + X side and the ⁇ X side (each leg portion on the + Y side is hidden behind the paper surface).
  • a supported roller 206 is provided.
  • the cable unit 300 includes a cable bundle 99a composed of a plurality of cables 99 arranged on the + X side of the substage 50 and a cable bundle 99b composed of a plurality of cables 99 arranged on the ⁇ X side of the substage 50. And have. As shown in FIG. 30, the plurality of cables 99 constituting each of the cable bundles 99a and 99b are arranged apart from each other in the Y-axis direction, and each of the cable bundles 99a and 99b is formed in a long strip shape. Is formed.
  • the cable bundle may be a fused cable in which adjacent cables are joined together.
  • Each of the plurality of cables 99 constituting the cable bundles 99a and 99b has one end connected to the Y stage 55 of the substage 50 and the other end connected to an external device (not shown) such as a switchboard, main controller, gas supply device, etc. It is connected.
  • an external device such as a switchboard, main controller, gas supply device, etc. It is connected.
  • the plurality of cables 99 connected to the Y stage 55 are branched on the substage 50, and some of them are the X stage 54 or the main stage 40. (See FIG. 28).
  • the cable bundle 99a on the + X side has an intermediate portion on the other end side (external device side) fixed to the leg portion 39a on the + X side by a fixing member 220. Further, the cable bundle 99a is fixed to the outer peripheral surface of the roller 206 by a fixing member 220 at an intermediate portion on one end side of the portion fixed to the leg portion 39a. Further, the cable bundle 99 a is fixed to the outer peripheral surface of the roller 203 on the + X side of the pair of rollers 203 by a plurality of fixing members 220 with respect to the portion fixed to the roller 206.
  • the region between the portion fixed to the roller 206 and the portion fixed to the roller 203 in the cable bundle 99a is a state in which the substage 50 shown in FIG. 29 is positioned at the center of the movement range in the X-axis direction. So, it bends downward (hangs down due to gravity).
  • the region of the cable bundle 99a on the one end side of the portion fixed to the roller 203 is bent into a U-shape as shown in FIG. 30, and the inside of the opening 201a formed in the support portion 201.
  • the end (one end) is connected to the Y stage 55 through the space.
  • the region of one end side of the portion of the cable bundle 99 a fixed to the roller 203 is fixed to the support portion 201 by the fixing member 220.
  • Each of the fixing members 220 includes a plurality of members corresponding to the plurality of cables 99 constituting the cable bundle 99a, as representatively shown in FIG.
  • two intermediate portions in the longitudinal direction are fixed to the rollers 203 and 206, respectively.
  • each of the pair of rollers 203 and the pair of rollers 206 swings (rotates by a predetermined amount in the ⁇ y direction), thereby preventing a large bending stress from acting on the cables 99 constituting the cable bundles 99a and 99b.
  • the substage 50 moves in the ⁇ X direction
  • the cable bundle 99b bends downward and the cable bundle 99a is pulled in the ⁇ X direction, contrary to the case shown in FIG.
  • the configuration of other parts of the liquid crystal exposure apparatus 3000 is the same as that of the liquid crystal exposure apparatus 10 of the first embodiment described above, and the same exposure operation is performed.
  • the liquid crystal exposure apparatus 3000 of the seventh embodiment is the same as the liquid crystal exposure apparatus 10 of the first embodiment described above, except that the cable unit 300 is provided in the mask stage apparatus MSTi.
  • the same effect can be obtained from the configuration.
  • cable bundles 99a and 99b including cables 99 for transmitting utility force between the substages 50 and 70 and the external apparatus. Since each of the regions fixed to the rollers 203 and 206 is configured to bend downward by the action of gravity according to the movement of the substages 50 and 70, or pulled horizontally, the cables 99 and other members Generation of dust or vibration due to sliding is prevented.
  • the cable unit 300 according to the seventh embodiment is an apparatus used in a clean room, such as a liquid crystal exposure apparatus 3000 (see FIG. 28), or an apparatus that needs to control the position of a moving body with high accuracy. Especially suitable. Further, when the cable bundles 99a and 99b are bent downward or pulled in the horizontal direction, the rollers 203 and 206 are rotated so that a large bending stress acts on the cables 99 constituting the cable bundles 99a and 99b. Therefore, it is possible to avoid troubles such as the tube being bent and the pipeline being blocked. Further, the cable unit 300 according to the seventh embodiment is light in weight because it does not have a member that supports the intermediate portion of the cables 99, and maintenance such as replacement work of the cables 99 is easy.
  • FIG. 32 shows a side view of the mask stage apparatus MSTj according to the eighth embodiment viewed from the ⁇ Y side.
  • the mask stage apparatus MSTj according to the eighth embodiment differs from the mask stage apparatus MSTi according to the seventh embodiment in the configuration of the cable unit.
  • the same reference numerals as those of the first embodiment are used for the same or equivalent components as those of the above-described seventh embodiment, and description thereof is omitted.
  • a pair of X linear guide members 93 having the X axis direction as the longitudinal direction and spaced apart in the Y axis direction are fixed to the lower surface of the guide portion 38a (the + Y side X linear).
  • the guide member is hidden behind the paper surface).
  • a movable portion 210 made of a plate-like member parallel to the XY plane whose longitudinal direction is the X-axis direction is disposed below the guide portion 38a (on the ⁇ Z side).
  • Sliders 211 having a U-shaped cross section are fixed to the four corners of the upper surface of the movable portion 210 (the two sliders on the + Y side are hidden behind the paper surface).
  • the two sliders 211 on the ⁇ Y side are slidably engaged with the X linear guide member 93 on the ⁇ Y side, and the two sliders 211 on the + Y side are slidably engaged with the X linear guide member 93 on the + Y side. is doing.
  • a bearing portion 212 (a + Y side plate-like member is hidden behind the drawing) made of a pair of plate-like members spaced in the Y-axis direction is fixed.
  • a roller 213 is supported by the bearing portion 212 via a rotary shaft 214 whose axial direction is the Y-axis direction.
  • a substantially central portion of a region between the portion fixed to the roller 203 and the portion fixed to the roller 206 is fixed to the roller 213 via the fixing member 220.
  • a bearing portion 212 is fixed to the lower surface of the ⁇ X side end of the movable portion 210, and a roller 213 is rotatably supported on the bearing portion 212 via a rotation shaft 214.
  • the cable bundle 99 b is fixed to the roller 213 via a fixing member 220 at a substantially central portion between the portion fixed to the roller 203 and the portion fixed to the roller 206. Accordingly, the pair of rollers 213 moves integrally in the X-axis direction.
  • a pulley 216 is rotatably supported on each of the pair of bearing portions 212 via a rotation shaft 215 having the Y-axis direction as an axial direction.
  • a rope 217 is wound around the pulley 216 on the ⁇ X side.
  • One end of the rope 217 is fixed to the leg portion 39 a on the + X side, and the other end is fixed to the end portion on the ⁇ X side of the bearing portion 202.
  • a part is omitted from the viewpoint of avoiding the complication of the drawing, but the rope 218 is similarly wound around the pulley 216 on the + X side.
  • the rope 218 has one end fixed to the ⁇ X side leg 39 a and the other end fixed to the + X side end of the bearing 202.
  • the bearing portion 212 that supports the ⁇ X side pulley 216 around which the rope 217 is wound is pulled by the rope 217.
  • the pulley 216 functions as a moving pulley, and the bearing portion 212 follows the substage 50 at half the speed of the substage 50.
  • the bearing portion 212 on the + X side also moves to the + X side at half the speed of the substage 50.
  • the cable unit 300a according to the eighth embodiment also bends (hangs down) in the middle of the cable bundles 99a and 99b in accordance with the movement of the substage 50. ), Or the configuration of being pulled in the horizontal direction, it is possible to obtain the effect of preventing the generation of dust and the vibration as in the cable unit according to the seventh embodiment.
  • the cable bundles 99a and 99b are in a state in which the middle portions of the cable bundles 99a and 99b hang down. Therefore, tension is applied to the cables 99 constituting the cable bundles 99a and 99b by their own weight. . Since the horizontal component of tension acting on the cables 99 tends to move the substage 50 in the X-axis direction, position control of the substage 50 in the X-axis direction may be difficult. Specifically, as shown in FIG. 33, when the substage 50 is positioned on the + X side on the guide portion 38a, as shown in FIG. 33, the tension acting on the + X side cable bundle 99a generally acts in the Z-axis direction.
  • the horizontal component that is, the force for moving the substage 50 in the + X direction is small.
  • the horizontal component of the tension due to its own weight is larger than the horizontal component of the tension acting on the cable bundle 99a. Due to the difference in the horizontal component of the tension, a force to move the substage 50 in the ⁇ X direction acts.
  • the cable bundles 99a and 99b are supported at three locations (rollers 203, 206, and 213), respectively, and the cable bundle 99a between the rollers 203 and the rollers 213 is supported.
  • the roller 213 is always positioned between the roller 203 and the roller 206 in order to cause the bearing portion 212 that rotatably supports the pair of rollers 213 to follow the substage 50 at half the speed of the substage 50. Can do.
  • the bearing part 212 is made to follow the substage 50 using the pulley 216 and the ropes 217 and 218, the structure is simple.
  • the amount of downward deflection of the cable bundle (the amount of sag due to gravity) can be made smaller than in the seventh embodiment, the space in the Z-axis direction can be reduced to save the device (the length of the legs is short). Is also good).
  • FIG. 34 shows a side view of the mask stage apparatus MSTk according to the ninth embodiment as viewed from the ⁇ Y side.
  • the mask stage apparatus MSTk according to the ninth embodiment differs from the mask stage apparatus MSTj according to the eighth embodiment in the support structure of the pair of rollers 213.
  • the same reference numerals as those in the seventh and eighth embodiments are used for the same or equivalent components as those in the seventh and eighth embodiments described above, and the description thereof is omitted. Is omitted.
  • each of the pair of rollers 213 includes a bearing portion 212b including a pair of plate-like members separated in the Y-axis direction. It is supported so as to be rotatable via a rotating shaft 214.
  • Each of the pair of bearing portions 212b is connected to each of the pair of movable members 221 disposed above the guide portion 38a.
  • the pair of movable members 221 are provided on the + X side and the ⁇ X side of the substage 50, respectively.
  • a pair of sliders 222 having an inverted U-shaped cross section that is slidably engaged with the pair of X linear guide members 51 fixed to the guide portion 38a is fixed to the lower surface of each of the pair of movable members 221 ( (The illustration of the X linear guide member and slider on the + Y side is omitted).
  • the pair of bearing portions 212b are connected by a connecting member 223 and move integrally with respect to the X-axis direction.
  • a pulley 216 is attached to each of the pair of bearing portions 212b via the rotation shaft 215, as in the eighth embodiment.
  • a rope 224 is wound around each of the pair of pulleys 216.
  • Each of the pair of ropes 224 has one end fixed to the center of the lower surface of the guide portion 38 a and the other end fixed to the support portion 201.
  • the cable unit 300b according to the ninth embodiment also has a pair of bearing portions 212b when the substage 50 is driven in the X-axis direction, as in the eighth embodiment. Then, it is pulled by the rope 224 and moves following the substage 50 at a moving speed half that of the substage 50.
  • the cable unit 300b according to the ninth embodiment guides the pair of bearing portions 212b in the X-axis direction by using the X linear guide member 51 that guides the X stage 54 of the substage 50 in the X-axis direction.
  • the number of members is smaller than that of the cable unit 300a according to the eighth embodiment (however, the movable amount of the substage 50 in the X direction is limited).
  • FIG. 36 shows a modification of the cable unit of the seventh embodiment.
  • the cable bundle 99b is fixed to a support member 230 including a plate-shaped member having an arcuate cross section rotatably supported around the rotation shaft 205 through a fixing member 220.
  • a support member 230 including a plate-shaped member having an arcuate cross section rotatably supported around the rotation shaft 205 through a fixing member 220.
  • the ⁇ Y side plate-like member is omitted from the pair of plate-like members constituting the ⁇ Y side leg portion 39a and the bearing portion 202).
  • the support member 230 shown in FIG. 36 may be used instead of the roller 213 (see FIGS. 32 and 34, respectively) of the eighth and ninth embodiments.
  • the bearing portions 212 and 212b are pulled by the support portion 201 (that is, the substage 50) via a rope, so that Although it is the structure which moves to the X-axis direction at the half speed of the stage 50, as a system which moves the bearing parts 212 and 212b to an X-axis direction, it is not restricted to this,
  • a feed screw drive, a linear motor drive, a belt The driving may be performed independently of the substage by a driving method such as driving.
  • the bearing portions 212 and 212b are provided on the + X side and the ⁇ X side of the substage, respectively.
  • the number is not limited to this.
  • two or more may be provided on each of the + X side and the ⁇ X side of the substage according to the length of the X guide (that is, the movement stroke of the substage).
  • the first to ninth embodiments described above may be combined as appropriate unless it is unreasonable to combine them in nature.
  • the fourth to ninth embodiments may be combined with the second embodiment described above. That is, in the fourth to ninth embodiments, a masking blade device (masking system) may be provided.
  • each linear motor included in the exposure apparatus of each of the above embodiments may be either a moving magnet type or a moving coil type, and its driving method is not limited to the Lorentz force driving method, but a variable magnetoresistive driving method, etc. Other methods may be used.
  • the pair of substages is driven by a linear motor.
  • the system (actuator) for driving the pair of substages is not limited to this, for example, feed screw driving or belt driving. May be.
  • the pair of substages is an XY two-dimensional stage apparatus including two stages each including an X stage and a Y stage mounted on the X stage.
  • the present invention is not limited to this.
  • Each of the pair of substages may be a single stage that is driven in the XY two-dimensional direction by, for example, a planar motor.
  • the mask stage apparatus that holds the light transmission type mask is a movable body apparatus.
  • the present invention is not limited thereto, and for example, a substrate (or wafer) that is an exposure target of the exposure apparatus.
  • the stage device that guides the image along the XY plane may be a mobile device.
  • the illumination light is ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F 2 laser light (wavelength 157 nm).
  • illumination light for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium).
  • harmonics converted into ultraviolet light using a nonlinear optical crystal may be used.
  • a solid laser (wavelength: 355 nm, 266 nm) or the like may be used.
  • the projection optical system PL is a multi-lens projection optical system including a plurality of optical systems.
  • the number of projection optical systems is not limited to this, and one or more projection optical systems are used. I need it.
  • the projection optical system is not limited to a multi-lens type projection optical system, and may be a projection optical system using an Offner type large mirror, for example.
  • the projection optical system PL uses an enlargement system having a projection magnification.
  • the present invention is not limited to this, and the projection optical system may be either an equal magnification system or a reduction system.
  • the exposure apparatus of each of the above embodiments exposes a substrate having a size (including at least one of an outer diameter, a diagonal line, and one side) of 500 mm or more, for example, a large substrate for a flat panel display (FPD) such as a liquid crystal display element.
  • the present invention is particularly effective when applied to an exposure apparatus. This is because the exposure apparatus of each of the above embodiments is configured to cope with an increase in the size of the substrate.
  • the present invention is not limited to this, and exposure of the exposure apparatus of each of the above embodiments.
  • the apparatus may be a proximity type exposure apparatus that does not use a projection optical system.
  • the exposure apparatus of each of the above embodiments may be a step-and-repeat type exposure apparatus (so-called stepper) or a step-and-stitch type exposure apparatus.
  • a light transmissive mask in which a predetermined light shielding pattern (or phase pattern / dimming pattern) is formed on a light transmissive mask substrate is used.
  • an electronic mask (variable molding mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, for example, Alternatively, a variable molding mask using DMD (Digital Micro-mirror Device) which is a kind of non-light emitting image display element (also referred to as a spatial light modulator) may be used.
  • DMD Digital Micro-mirror Device
  • the use of the exposure apparatus is not limited to an exposure apparatus for liquid crystal that transfers a liquid crystal display element pattern onto a square glass plate.
  • the present invention can also be widely applied to an exposure apparatus for manufacturing.
  • the present invention can also be applied to an exposure apparatus that transfers a circuit pattern.
  • the object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks.
  • an exposure apparatus for transferring a circuit pattern onto a silicon wafer or the like for example, an immersion type exposure in which a liquid is filled between a projection optical system and a wafer as disclosed in, for example, US Patent Application Publication No. 2005/0259234. You may apply to an apparatus etc.
  • the present invention is also applied to an exposure apparatus (lithography system) that forms line and space patterns on a wafer by forming interference fringes on the wafer. can do.
  • an exposure apparatus lithography system
  • the mobile device according to each of the above embodiments may be applied not only to the exposure apparatus but also to an element manufacturing apparatus provided with, for example, an ink jet type functional liquid application device.
  • a liquid crystal display element as a micro device can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate).
  • a so-called photolithography process is performed in which a pattern image is formed on a photosensitive substrate (such as a glass substrate coated with a resist) using the exposure apparatus of each of the embodiments described above.
  • a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate.
  • the exposed substrate is subjected to various processes such as a developing process, an etching process, and a resist stripping process, whereby a predetermined pattern is formed on the substrate.
  • a developing process an etching process, and a resist stripping process
  • a predetermined pattern is formed on the substrate.
  • a set of three dots corresponding to R (Red), G (Green), and B (Blue) is arranged in a matrix, or a set of three stripe filters of R, G, and B
  • a color filter arranged in a plurality of horizontal scanning line directions is formed.
  • Cell assembly process Next, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern forming step, the color filter obtained in the color filter forming step, and the like.
  • liquid crystal is injected between a substrate having a predetermined pattern obtained in the pattern formation step and a color filter obtained in the color filter formation step to manufacture a liquid crystal panel (liquid crystal cell).
  • a liquid crystal panel liquid crystal cell
  • components such as an electric circuit and a backlight for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) are attached to complete the liquid crystal display element.
  • the moving body device of the present invention is suitable for moving the moving body along a predetermined two-dimensional plane.
  • the power transmission device of the present invention is suitable for transmitting power between a moving body and an external device along a predetermined two-dimensional plane.
  • the exposure apparatus of the present invention is suitable for forming a pattern on an object by exposure.
  • the device manufacturing method of the present invention is suitable for the production of micro devices.

Abstract

La présente invention concerne un procédé selon lequel des sous-étages (50, 70) sont disposés sur les côtés négatif et positif de l'axe des y d'un étage principal (40) qui assure le support d'un masque (M). Les sous-étages peuvent se déplacer dans de longues courses dans le sens de l'axe des x, qui est la direction de balayage. Des déplacements fins de l'étage principal (40) par rapport aux sous-étages, sont effectués au moyen d'un moteur à bobine mobile comportant : un élément mobile dans l'axe des y (44) qui comprend une unité d'aimant prévue sur l'étage principal (40) ; et un élément stationnaire dans l'axe des y (88) qui comprend une unité de bobine prévue sur un sous-étage (50). En outre, des appareils de verrouillage (100a-100d) sont utilisés pour connecter l'étage principal (40) aux sous-étages (50, 70), en contact (ou pas en contact) avec chaque sous-étage. L'étage principal (40) se déplace dans le sens de l'axe des x par le simple entraînement des sous-étages (50, 70).
PCT/JP2010/003284 2009-05-15 2010-05-14 Appareil mobile, appareil de transmission d'energie, appareil d'exposition, et procede de fabrication de dispositif WO2010131485A1 (fr)

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KR1020117029995A KR101693168B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
JP2011513255A JP5626206B2 (ja) 2009-05-15 2010-05-14 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法
KR1020197035191A KR102211255B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
KR1020187016854A KR102051842B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
KR1020167036987A KR101869463B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법

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TWI754036B (zh) 2022-02-01
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TWI526787B (zh) 2016-03-21
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JPWO2010131485A1 (ja) 2012-11-01
JP6315294B2 (ja) 2018-04-25
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JP2016145996A (ja) 2016-08-12
JP5626206B2 (ja) 2014-11-19
TW201621477A (zh) 2016-06-16
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JP2018110271A (ja) 2018-07-12
KR102211255B1 (ko) 2021-02-02

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