Classifications

• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K3/00—Apparatus or processes for manufacturing printed circuits
  • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K3/00—Apparatus or processes for manufacturing printed circuits
  • H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
  • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
  • B05C11/06—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface with a blast of gas or vapour
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
  • B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
  • B05C3/09—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material for treating separate articles
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B15/00—Layered products comprising a layer of metal
  • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
  • B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
• • C—CHEMISTRY; METALLURGY
  • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
  • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
  • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
• • C—CHEMISTRY; METALLURGY
  • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
  • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
  • C25D21/00—Processes for servicing or operating cells for electrolytic coating
  • C25D21/10—Agitating of electrolytes; Moving of racks
• • C—CHEMISTRY; METALLURGY
  • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
  • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
  • C25D7/00—Electroplating characterised by the article coated
  • C25D7/06—Wires; Strips; Foils
  • C25D7/0614—Strips or foils
  • C25D7/0621—In horizontal cells
• • C—CHEMISTRY; METALLURGY
  • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
  • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
  • C25D7/00—Electroplating characterised by the article coated
  • C25D7/06—Wires; Strips; Foils
  • C25D7/0614—Strips or foils
  • C25D7/0642—Anodes
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
  • H05K2203/01—Tools for processing; Objects used during processing
  • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
  • H05K2203/0143—Using a roller; Specific shape thereof; Providing locally adhesive portions thereon
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
  • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
  • H05K2203/0736—Methods for applying liquids, e.g. spraying
  • H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
  • H05K2203/15—Position of the PCB during processing
  • H05K2203/1509—Horizontally held PCB
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
  • H05K2203/15—Position of the PCB during processing
  • H05K2203/1572—Processing both sides of a PCB by the same process; Providing a similar arrangement of components on both sides; Making interlayer connections from two sides

Definitions

• the invention relates to a method and a system for treating areal material to be treated and a device for removing or holding treatment liquid from a flat material to be treated. More particularly, the invention relates to such methods, equipment, and devices that permit treatment of articles to be treated having a sensitive surface or surfaces. The invention also relates to such methods, systems and devices in which a contact between a useful area to be treated of the material to be treated and solid elements can be largely avoided when liquid is removed from the material to be treated.
• treatment of the material to be treated often takes place in a wet-chemical process line.
• treatment liquid such as a process chemical or water
• squeeze rolls can be used. Such rolls can be used, for example, to make a damming of treatment liquid for an immersion treatment in a treatment station, as described in DE 43 37 988 A1.
• FIG. 9 is a schematic representation of a treatment station 200, in which the liquid level of the treatment liquid is higher than a transport plane of the material to be treated 203, so that the material to be treated 203 can be transported submerged.
• the material to be treated 203 is transported in a horizontal transport direction 204 through the treatment station.
• roller pairs 211-216 are provided which come into contact with the upwardly or downwardly facing surfaces of the material to be treated 203 in order to transport this.
• an inner container 201 is provided, in which the treatment liquid is accumulated to the (not shown) high level.
• the inner container 201 is surrounded by an outer container 202 so that the outer container 202 catches the treatment liquid flowing over from the inner container 201.
• the treatment liquid is pumped by a pump 210 back into the inner container 201.
• the treatment liquid may be discharged back into the inner container 201 via inflow nozzles 206, 207 or the like.
• pairs of so-called nip rolls 213, 215 are used in the inlet and outlet regions of the inner container 201.
• the pairs of squeezing rollers 213, 215 may, for example, have a cylindrical lateral surface.
• the squeeze rolls 213a, 213b of the pair 213 and the squeeze rolls of the pair of rolls 215 abut against the laundry 203, the free cross section through which the processing liquid can escape from the inner vessel 201 is restricted.
• a desired level of the treatment liquid in the inner container 201 can be adjusted.
• Additional pairs of rollers, such as the pairs of rollers 211, 212, 214 and 216 in the inlet or outlet region of the treatment station can also act as squeezing rollers.
• the invention has for its object to provide a method and a system for treating sheet-like material to be treated and a device for removing or holding treatment liquid for a plant for treating sheet-like material to be treated, in which or at the risk of damaging sensitive surfaces of the material to be treated can be reduced.
• the invention is also based on the object of specifying a method for the production of printed circuit boards, in which the risk of damaging sensitive surface areas of the printed circuit board can be reduced.
• the object is achieved by a method and a plant for treating flat material to be treated and a device for removing or holding treatment liquid, as stated in the independent claims are.
• the dependent claims define preferred and advantageous embodiments of the invention.
• the method for treating a flat material to be treated which is transported in a system for wet-chemical treatment of the material to be treated along a transport path, provides that a retaining surface for retaining a
• Treatment liquid which is exposed to the material to be treated in the system, is provided.
• the retaining surface is positioned on the transport path such that between the
• Retaining surface and a surface of the material to be treated remains free a gap when the material to be treated is guided past the retaining surface.
• a surface As a retaining surface for retaining treatment liquid, a surface is designated, which due to its design and arrangement can restrict a flow of liquid in at least one direction, in particular in a transport direction of the material to be treated.
• the retaining surface need not completely prevent the liquid flow, but may, in particular through the formed gap, allow a passage of treatment liquid.
• the retaining surface is positioned so that a gap remains free between the retaining surface and a surface of the material to be treated when the material to be treated on the
• Retention area is passed is the portion of the material to be treated, where the
• Gap is arranged, not touched by the retaining surface.
• the retaining surface may in particular be designed such that the gap extends along a useful region of the
• Good to be treated extends so that the retention surface does not touch the useful area of the material to be treated.
• the retaining surface may be configured and arranged such that the retaining surface does not touch a useful region of the material to be treated, which extends continuously between opposite edge regions of the material to be treated.
• the retaining surface may be configured and arranged such that the retaining surface is spaced from the entire useful area of the material to be treated.
• the retaining surface may be configured and arranged so that the gap extends in a direction transverse to the transport direction of the material to be treated continuously over the entire useful range of the material to be treated, when the material to be treated is guided past the retaining surface.
• the gap may have a minimum gap height. The minimum gap height is the minimum distance between the retaining surface and the material to be conveyed past the retaining surface.
• the treatment liquid may be accumulated to a level higher than the minimum gap height of the gap.
• the material to be treated can thus be immersed immersed in the treatment liquid on the at least one side of the retaining surface.
• the retention surface can reduce the liquid level of the item to be treated or remove treatment liquid from the item to be treated, for example, if the item to be treated is guided past the retention surface at a discharge area of a treatment station.
• the minimum gap height may be less than 1 mm, in particular less than 0.7 mm, in particular less than 0.5 mm.
• the minimum gap height may be at least 0.05 mm, in particular at least 0.07 mm, in particular at least 0.09 mm.
• a treatment liquid passing through the gap can be removed from the material to be treated with a fluid stream, for example blown off with a gas stream.
• the treatment liquid can be accumulated to a level lower than the level of the treatment liquid in a working region of the treatment station. In this way, a level cascade can be realized.
• the fluid flow may be directed to the material to be treated. This can be set up so that it does not pass through the gap.
• one or one or more of a volume flow, a flow velocity and a flow direction of the fluid flow can be adjusted so that the fluid flow does not pass through the gap, that is, for example, does not enter the accumulated treatment liquid.
• the fluid stream used for removing treatment liquid can flow to the material to be treated in a direction which has a component directed transversely to the transport direction and parallel to the transport plane of the material to be treated.
• the treatment liquid can be removed transversely to the transport direction of the material to be treated.
• the retaining surface may be formed on a roller.
• the roller may extend in the width direction, i. transverse to the transport direction of the material to be treated, along the treated extend.
• the roller may be arranged so that its axis extends parallel to the transport plane. If the material to be treated is transported in a horizontal transport plane, the roller may be provided above or below the transport plane.
• the roller may be designed so that the roller surface is spaced from the entire useful area of the material to be treated.
• the roller may be rotated so that the part of the roller surface which defines the gap on one side moves in a direction opposite to the direction of transport of the material to be treated.
• the outlet of treatment liquid can be further reduced. It can also be the mass transfer to the surface of the material to be improved.
• the roller With the roller not only the treatment liquid can be retained or accumulated, but also the material to be treated can be transported in the transport direction. At least one transport section can be provided on the roller, which is coupled to the material to be treated in order to transport the material to be treated.
• the retaining surface may be provided offset relative to the transport portion to form the gap.
• the transport section can be rotated to transport the material to be treated.
• the transport portion may be rotatable relative to the retention surface to allow independent rotation of the transport and retention surfaces.
• a level difference of the treatment liquid can be adjusted. On both sides of the
• Spaltes treatment liquid may be present on the material to be treated.
• the level of the treatment liquid can be changed stepwise on the retention surface in order to achieve a desired liquid level in the treatment area.
• the retention surface may be rotated to reduce or eliminate passage of treatment liquid through the gap.
• the retaining surface can be configured and the rotational speed of the retaining surface can be selected so that the displacement of treatment liquid by the rotating retaining surface reduces or eliminates the flow of the treatment liquid through the gap.
• the treatment liquid can be accumulated with the retention surface in a treatment station so that the material to be treated is transported immersed in the treatment station in the treatment liquid.
• the submerged transporting the material to be treated can be used in particular for the treatment of thin material to be treated with low inherent rigidity.
• the material to be treated may be a film-like material, in particular a foil-like printed circuit board or conductor foil.
• the material to be treated can also be a continuous material.
• the device provided according to one aspect of the invention for removing or holding treatment liquid from a flat material to be treated for a system for wet-chemical treatment of the material to be treated comprises a retaining surface for retaining the treatment liquid.
• the device is adapted to be arranged relative to a transport path of the material to be treated so that the device forms a gap between the retaining surface and a surface of the material to be transported along the transport path.
• removal or removal of treatment liquid are used in the sense that the device is arranged to at least partially retain treatment liquid, without the treatment liquid must be completely removed or held.
• the device is arranged to be positioned so that between the
• Retaining surface and a surface of the material to be treated remains a gap, the portion of the material to be treated, on which the gap is formed, not from the
• the device can in particular be designed so that the gap extends along a useful region of the material to be treated, so that the retaining surface does not touch the useful area of the material to be treated.
• the gap may have a minimum gap height.
• the "minimal gap height” refers to the minimum distance between the retaining surface and the material to be conveyed past the retaining surface
• the device can be set up such that the treatment liquid is applied to at least one side of the retaining surface
• Material to be treated can thus be transported immersed in the treatment liquid at the side of the retaining surface.
• the minimum gap height may be less than 1 mm, in particular less than 0.7 mm, in particular less than 0.5 mm.
• the minimum gap height may be at least 0.05 mm, in particular at least 0.07 mm, in particular at least 0.09 mm.
• the apparatus may comprise a flow-off device spaced from the retention surface and adapted to flow the material to be treated with a fluid flow in order to remove the treatment liquid from the material to be treated. With the flow device can be removed through the gap emerging treatment liquid.
• the on-flow device can be designed to generate the fluid flow with a velocity component which is directed parallel to the transport plane and transversely to the transport direction of the material to be treated. With a flow device designed in this way, the treatment liquid can be removed from the material to be treated transversely to the transport direction.
• the on-flow device can be set up and arranged such that the fluid flow does not pass through the gap.
• one or more of a volume flow, a flow velocity and a flow direction of the fluid flow may be suitably configured such that the fluid flow does not pass through the gap into the accumulated treatment fluid. In this way, bubble formation, for example in the accumulated treatment liquid, can be reduced or prevented by the fluid flow.
• the device may comprise a further retention surface, the device being arranged to be arranged relative to the transport path of the material to be treated be that the device forms a further gap between the further retaining surface and another surface of the transported along the transport path treated.
• the retaining surface and the further retaining surface may for example be opposite to opposite surfaces of the material to be treated in order to remove liquid from them.
• the retaining surface and the further retaining surface may be provided on rollers of a roller pair, between which the material to be treated is transported.
• the device may be arranged so that the treatment liquid can pass through the gap. If the passage of a, in particular small, stream of treatment liquid through the gap is tolerated, measures for the complete suppression of a passage of treatment liquid can be dispensed with.
• the retaining surface may be formed on a rotatably mounted roller of the device.
• the roller may be designed so that the roller surface is spaced from the entire useful area of the material to be treated.
• the apparatus may comprise drive means arranged to rotate the roller so that the part of the roller surface which bounds the gap on one side moves in a direction opposite to the transport direction of the material to be treated.
• the outlet of treatment liquid can be further reduced. It can also be the mass transfer to the surface of the material to be improved.
• the roller may be arranged to be usable not only for retaining the treatment liquid with the retaining surface but also for transporting the material to be treated.
• at least one transport section can be provided on the roller, which can be coupled for transporting the material to be treated with the material to be treated.
• Two transport sections for transporting the material to be treated can be provided on the roller, and the retaining surface can be arranged between the at least two transport sections.
• transport portions may be provided at axial edge portions of the roller, and the retention surface may extend between the axial edge portions.
• the retaining surface may be formed as a relative to the at least one transport section or the at least two transport sections offset surface.
• the roller may be arranged to extend in the width direction, ie transversely to the transport direction of the material to be treated, along the material to be treated. If the material to be treated is transported in a horizontal transport plane, the roller may be arranged to be provided above or below the transport plane.
• the device may be designed so that the roller is adjustable perpendicular to a transport plane of the material to be treated, for example by providing a vertically adjustable bearing.
• the geometry of the gap in particular the minimum gap height, can be adjustable.
• the at least one transport section or the at least two transport sections can be rotatable relative to the retaining surface.
• the device can be set up for a rotary drive of the transport section or the transport sections and an independent rotary drive of the retaining surface.
• the device may comprise a cuboidal element on which the retaining surface is formed.
• the apparatus may be adapted for use in the method of treating the material to be treated according to one aspect or embodiment.
• the plant provided according to one aspect of the invention for treating a flat material to be treated comprises a device for removing or holding treatment liquid from the material to be treated, which is designed as a device according to one aspect or embodiment of the invention.
• the system may include several such devices. For example, at least two devices spaced from one another in a transport direction of the material to be treated may be provided in order to remove the treatment liquid from the material to be treated. By using a plurality of such device for removing the treatment liquid, a substantial removal of treatment liquid is possible even when liquid passes through the gaps formed by the devices.
• a plurality of spaced apart in the transport direction of the treated material devices may also be provided in an inlet region of a treatment station to accumulate the treatment liquid in the treatment station and to reduce leakage of the treatment liquid from the treatment station.
• the system may comprise a treatment station in which the treatment liquid is staubar. Both in an inlet area of the treatment station and in a
• Outlet region of the treatment station can be provided in each case a device for removing or holding treatment liquid from the treated.
• the treatment liquid can be accumulated in the treatment station.
• At least two can each also
• Devices for removing or holding treatment liquid may be provided.
• the treatment liquid can be accumulated in several levels.
• the system can be set up to turn in opposite directions the retention surface of a device provided in the inlet region of the treatment station above the transport plane and the retention surface of a device provided in the outlet region of the treatment station above the transport plane. Additionally or alternatively, the system may be arranged to counter-rotate the retaining surface of a device provided in the inlet region of the treatment station below the transport plane and the retaining surface of a device provided in the outlet region of the treatment station below the transport plane. By suitable choice of the directions of rotation, the passage of treatment liquid through the gaps of the devices provided in the inlet region and the outlet region can be reduced or prevented.
• a method for making a printed circuit board is disclosed. It is provided to produce the printed circuit board from a treated, which has been treated with the method for treating the treated material according to one aspect or embodiment. With the method, for example, a printed circuit board can be produced.
• Embodiments of the invention make it possible to remove or keep a treatment liquid from the material to be treated in a system for the wet-chemical treatment of a material to be treated.
• a retaining surface for retaining treatment liquid at a distance from a useful region of the material to be treated can be arranged such that a gap is formed in order to reduce or avoid direct contact of the working region with a solid element.
• Embodiments of the invention can be used in particular in systems in which flat material to be treated is transported with a sensitive surface in a horizontal or substantially in a horizontal transport plane. However, the embodiments are not limited to this field of application.
• Fig. 1 is a schematic front view of an apparatus for removing or holding treatment liquid according to an embodiment.
• FIG. 2 is a schematic, partially sectioned side view of the device of FIG. 1.
• FIG. 2 is a schematic, partially sectioned side view of the device of FIG. 1.
• Fig. 3 is a schematic, partially sectioned side view of an apparatus for removing treatment liquid according to another embodiment.
• FIG. 4 is a schematic, partially sectioned side view of a portion of a treatment station having a plurality of treatment liquid removal apparatuses according to an embodiment.
• Fig. 5 is a schematic, partially sectioned side view of a portion of a treatment station having a plurality of treatment liquid removing apparatuses according to another embodiment.
• Fig. 6 is a schematic front view of a device for removing or holding treatment liquid according to another embodiment.
• Fig. 7 is a schematic, partially sectioned side view of a device for removing treatment liquid according to another embodiment.
• Fig. 8 is a schematic, partially sectioned side view of a treatment station with devices for removing or holding treatment liquid according to an embodiment in an inlet and outlet area.
• Fig. 9 is a schematic, partially sectioned side view of a treatment station with nip roll pairs.
• Direction or position information relating to the material to be treated shall be indicated by convention in relation to the direction of transport.
• the direction which is parallel or antiparallel to the transport direction when transporting the material to be treated is referred to as the longitudinal direction, the direction lying in the transport plane orthogonal to the transport direction as the width direction of the material to be treated.
• Treatment liquid is understood to mean any liquid which can be exposed to the material to be treated in a plant for wet-chemical treatment, in particular a process chemical, a rinsing liquid such as water or the like.
• a transport in a horizontal transport plane can be understood to mean, in particular, a transport of material to be treated in which at least three corners of the material to be treated lie in a horizontal plane. This does not exclude that at least individual section or areas of the material to be treated are located outside the transport plane during transport, for example in the case of a material to be treated with little inherent rigidity.
• FIG. 1 is a schematic front view of a device 1 for removing treatment liquid from a material to be treated 10.
• FIG. 2 is a schematic side view of the device 1 along the direction indicated by M-II in FIG.
• the sectional plane of the partially sectioned side view is a vertical plane that intersects the transport plane along a line at which a useful area of the material to be treated is transported.
• the device 1 comprises a roller 2 and a further roller 3, which are arranged on opposite sides of a transport plane for the material to be treated 10 so that the material to be treated 10 is transported between the roller 2 and the further roller 3.
• the device 1 may be used, for example, as a pair of squeeze rollers 213 or 215 at the treatment station 200 of FIG. 9.
• the roller 2 has a retaining surface 4 for treatment liquid, which is provided as a stepped portion of the lateral surface of the roller 2.
• the roller 2 is positioned relative to a transport path of the material to be treated 10 so that a gap 8 between the retaining surface 4 and the material to be treated 10 remains free when the material to be treated 10 is transported past the roller 2.
• the retaining surface 4 forming portion of the lateral surface of the roller 2 may be formed substantially cylindrical.
• the further roller 3 has a further retaining surface 14 for the treatment liquid, which is provided as a stepped portion of the lateral surface of the roller 3.
• Roller 3 is positioned relative to the transport path of the material 10 to be treated
• Gap 18 remains free between the further retaining surface 14 and the material to be treated 10 when the material to be treated 10 is transported past the roller 3.
• Retaining surface 14 forming portion of the lateral surface of the roller 3 may be formed substantially cylindrical.
• a useful area 11 of the material 10, which extends over a large part of the width direction of the material 10, does not come with fixed elements of the device 1 in contact.
• the risk of damage to the surfaces of the material to be treated 10 in the useful area 11 can be reduced in this way.
• gaps 8, 18 Due to the cylindrical shape of the retaining surface 4 and the further retaining surface 14, the gaps 8, 18 have a variable in the transport direction 20 of the material to be treated 10 gap height or clear height.
• a minimum gap height 9, 19 of the gaps 8, 18 is determined by those points of the retaining surfaces 4, 14 which have the smallest distance from the surface of the material 10 facing the respective roll 2 or 3.
• FIG. 2 schematically shows a treatment liquid 21 accumulated on one side of the roll 2 up to a level 22, and a layer of treatment liquid 23 remaining after passing the material to be treated 10 on the apparatus 1, which has a lower level 24.
• the device 1 can be set up such that the treatment liquid 21 on one side of the rollers 2, 3 (in FIG.
• the treatment liquid 23 still remaining on the material to be treated after the material 10 has been carried past the retaining surfaces 4, 14 can be removed in a suitable manner, for example by flowing the material to be treated with a fluid stream ,
• the rollers 2, 3 of the device 1 can be set up not only for removing liquid from the material to be treated 10, but also for transporting the material 10 to be treated.
• the roller 2 at its two axial ends increased edge portions 5, 6, which are brought into contact with an edge region 12 of the material to be treated 10 when the material to be treated is guided past the rollers 2, 3.
• the raised edge portions 5, 6 can be driven in rotation to transport the material 10 to be treated.
• a shaft 7 is provided, which is rotatably mounted when using the device 1 in a treatment plant for the material 10. By rotation of the edge portions 5, 6 in a direction of rotation 25, the material to be treated 10 can be transported.
• the roller 3 at its two axial ends increased edge portions 15, 16 which are brought into abutment with an edge region 12 of the material to be treated 10 when the material to be treated is guided past the rollers 2, 3.
• the raised edge portions 15, 16 can be driven in rotation to transport the material 10 to be treated.
• a shaft 17 is provided, which is rotatably mounted when using the device 1 in a treatment plant for the material 10.
• the edge portions 5, 6 and / or the edge portions 15, 16 may be in a frictional connection and / or in a form fit with the material to be treated 10 in order to transport this.
• projections may be formed on the edge sections 5, 6 and / or on the edge sections 15, 16, which engage in corresponding recesses of the material to be treated 10 in order to transport the material 10 to be treated.
• the raised edge sections 5, 6 act as transport sections, which can be coupled to the material to be treated 10 for transporting the material to be treated 10.
• the retaining surface 4 is offset relative to the edge portions 5, 6. The increase or in comparison to the radius of the retaining surface 4 larger radius of the edge portions 5, 6 determines the minimum gap height 9.
• the raised edge portions 15, 16 as transport sections, for transporting the material 10 with the treated 10 can be coupled.
• the retaining surface 14 is offset relative to the edge portions 15, 16. The increase or in comparison to the radius of the retaining surface 14 larger radius of the edge portions 15, 16 determines the minimum gap height 19th
• the radii of the edge portions and the retaining surface can be selected suitable for the desired field of application.
• the radius of the edge portions and the retaining surface can be selected suitable for the desired field of application.
• the radius of the edge portions and the retaining surface can be selected suitable for the desired field of application.
• Retaining surface forming portion of the roller 2, 3 may be at least 0.05 mm, in particular by at least 0.07 mm, in particular by at least 0.09 mm smaller than the radius of the edge portions of the roller 2, 3, which serve as transport sections.
• the shaft 7 of the roller 2 and / or the shaft 17 of the further roller 3 may be mounted with a height-adjustable bearing such that a distance of the shaft 7 from the upper surface of the material 10 and / or a distance of the shaft 17 from the lower Surface of the material to be treated 10 can be adjusted.
• the roller 2 and the further roller 3 can be set up so that upon rotation of the edge sections 5, 6 or 15, 16 serving as transport sections, the retaining surfaces 4 and 14 of the respective roller rotate in the same direction as the transport sections of the respective roller. In this way, a relative movement between the retaining surfaces 4 and 14 and the surface of the material to be treated 10 can be reduced.
• the roller 2 or the roller 3 may for example be designed so that both the transport sections and the retaining surface are formed on their surface rotationally fixed to each other.
• the transport sections may be rotatable relative to the retaining surface, as will be explained in more detail with reference to FIG. 8.
• the transport sections may be rotatable relative to the retention surface.
• An angular velocity of the retaining surface may be selected depending on an angular velocity of the conveying portions, a radius of the conveying portions, and a radius of the retaining surface forming portion of the roll.
• the angular velocity of the retaining surface may be selected so that the peripheral speed at the retaining surface is equal to the transport speed of the material to be treated.
• rollers 2, 3 of the device 1 have at their axial ends elevations 5, 6, 15, 16, more than two raised portions may be provided on the roller 2 and / or on the further roller 3.
• the further elevated sections may in particular be arranged on the roller 2 and / or on the further roller 3 in such a way that they touch the material to be treated 10 at surface areas where such a mechanical contact is not critical.
• surface regions of the material to be treated which extend in the longitudinal direction of the material to be treated 10 can be supported with further elevations of the roller 2 and / or the further roller 3.
• the useful area 11 of the material to be treated 10 can be defined by those surface areas of the material to be treated which are not touched by elevations of the roller 2 or the further roller 3.
• the additional support effect which is caused by the further increases, can reduce the risk of undesirable contact of the material to be treated 10 in its working area.
• a retaining surface may be provided only on one side a surface of the material to be treated forms a gap.
• a gap-forming retaining surface only at the top or only at the bottom of the transport plane be arranged.
• a roller may be provided which has a substantially constant diameter. The roller can then touch a surface of the material to be treated in the useful area of the material to be treated.
• the gap-forming retaining surface provided on the other side can lead to a reduction of the forces exerted on the surfaces of the material to be treated in order to reduce the risk of damage to the surfaces.
• a circumferential surface of a roll having a diameter that is constant, i. which does not vary along the axial direction of the roller serve as a retaining surface defining a gap between the retaining surface and the surface of the material to be treated.
• the design of the gap, in particular the minimum gap height, can be made adjustable by the roller is mounted with a bearing which is adjustable in height relative to the transport plane. It is also possible to provide two such rolls in order to remove liquid at the top and at the bottom of the material to be treated, a gap being formed between the corresponding roll and the material to be treated.
• FIG. 3 is a schematic side view of a treatment liquid removing apparatus 31 according to another embodiment.
• the device 31 may be used in the lead-out area of the treatment station 200 of FIG. 9 instead of the pairs of squeezing rollers 214, 215, 216.
• Elements or devices of the device 31, which correspond in their function and / or configuration elements or devices of the device 1, are provided with the same reference numerals and will not be explained again in detail.
• the device 31 comprises a retaining surface 4 for retaining liquid.
• the device 31 is set up such that the retaining surface 4 forms a gap 8 with the surface of a material to be treated 10 facing it (in FIG. 3 with the upper surface of the material to be treated 10).
• the retaining surface 4 may be provided, for example, on a rotatably mounted roller 2.
• the roller 2 may be configured as described with reference to FIGS. 1 and 2.
• the retaining surface 4 removes treatment liquid from the treated material 10 transported past the retaining surface 4. Since the gap 8 permits the passage of treatment liquid in one embodiment, treatment liquid 34 may also be present on the material to be treated 10 after it has passed the roller 2 with the retaining surface 4 Has.
• the device 31 further comprises an on-flow device 32 with a nozzle arrangement.
• the on-flow device 32 is arranged in the transport direction at a distance from the roller 2 and the roller 2 provided on the retaining surface 4.
• the onflow device 32 is downstream in the transport direction, that is, in the transport direction, the roller 2 with the retaining surface 4 is arranged.
• the onflow device 32 is set up to remove a portion of the treatment liquid 34, which has remained on the material to be treated 10 after passing through the gap 8, from the material to be treated 10.
• the onflow device 32 can be set up to remove a large part of the treatment liquid 34, which has remained on the item to be treated 10 after passing through the gap 8, from the item to be treated 10.
• the onflow device 32 can output a fluid flow 33, in particular a gas flow, for example an air flow, in order to blow off the treatment fluid 34 from the material to be treated 10 or otherwise to remove it with the fluid flow 33.
• the fluid flow 33 can have at least one flow component in the direction of the gap-forming retaining surface 4 of the device 31 (in FIG. 3, a leftward component). At the retaining surface 4, the treatment liquid can flow laterally from the material to be treated.
• the on-flow device may also be arranged so that the fluid flow 33 has a flow component which is directed parallel to the transport plane and transversely to the transport direction 20, i. parallel to the axial direction of the roller 2, on which the retaining surface 4 is formed. In this way, the treatment liquid 34 can be removed laterally from the item to be treated 10.
• the onflow device 32 can extend over the entire width of the material to be treated 10, that is, over the extent of the material to be treated 10 transversely to the transport direction, over the material 10 to be treated.
• the onflow device 32 may have one or more nozzle openings.
• the nozzle openings may be formed, for example, as a continuous slot, a plurality of slots or a plurality of bores, which is or are formed in the width direction of the material to be treated 10 on the onflow device 32.
• the onflow device 32 can be designed such that the distance between the nozzle openings to the surface of the material to be treated 10 over the entire width of the material to be treated is substantially equal.
• the onflow device 32 may comprise a straight channel body, which is directed parallel to the transport plane and transversely to the transport direction 20.
• the channel body may alternatively also be aligned parallel to the transport plane and obliquely to the transport direction 20.
• the on-flow device 32 may be formed such that a widthwise portion of the processed material 32 is located closer to the gap-forming retention surface 4 than an edge portion of the flow-through device 32.
• the flow-type device 32 may have a shape that is in plan view from a direction perpendicular to the transport plane (ie, in view from above perpendicular to the transport plane in Fig. 3) has a to the formed by the retaining surface 4 gap 8 out convex shape.
• the on-flow device 32 may have a V-shape in plan view, the tip of which points towards the retaining surface 4.
• a so-formed on-flow device is adapted to output the fluid flow with a velocity component in the direction of an edge of the material to be treated in order to effectively convey the treatment liquid to the edge of the material to be treated and so to remove.
• the on-flow device 32 can be set up to output a gas stream, in particular an air stream, and to feed the material to be treated therewith.
• the onflow device 32 can be set up such that an outflow velocity of the gas stream 33 is at least 2 m / sec, in particular at least 10 m / sec, in particular at least 30 m / sec.
• the on-stream device 32 can also be set up to dispense a liquid flow and to feed the material to be treated therewith.
• the onflow device 32 can be set up such that an outflow velocity of the liquid flow 33 is at least 0.1 m / sec, in particular at least 1 m / sec, in particular at least 3 m / sec.
• the onflow device 32 can be set up such that an outflow direction of the fluid flow 33 can be parallel or oblique to the surface of the material to be treated.
• the onflow device 32 may be designed such that the fluid flow flows out of the nozzle openings of the onflow device 32 in the direction of the gap 8 and / or transversely to the transport direction in the direction of an edge of the material 10 to be treated.
• the outflow direction can also be directed perpendicular to the surface of the material 10 to be treated.
• the on-flow device 32 may be designed such that the fluid flow 33 does not pass through the gap 8, ie, does not enter the treatment liquid accumulated on the opposite side of the gap-forming retention surface 4.
• the fluid flow 33 causes a bubble formation in the treatment liquid 21.
• one or more of a volume flow the outflow velocity and / or the outflow direction of the fluid flow 33 from the onflow device 32 can be adjusted accordingly, for example.
• the device 31 may be configured so that a distance or the different distances between the gap 8 and the nozzle opening or the nozzle openings of the onflow device 32 is at most 100 mm and at least 10 mm.
• the device 31 can furthermore have a further retaining surface 14 arranged below the transport plane, which can be formed on a further roller 3.
• Retaining surface 4 is arranged downstream, a device for holding off
• Treatment liquid also be designed so that the onflow device in the transport direction of the material to be treated before or upstream of the gap-forming
• Retaining surface is arranged.
• Such a device can be used in particular in an inlet region of a treatment station.
• the Anström worn 32 may alternatively or additionally be provided below the transport plane to blow off liquid from an underside of the material 10 or otherwise with the discharged from the Anström personality fluid stream 33 of the treated 10 to remove.
• the on-flow device may be configured such that the fluid flow generated by the on-flow device has a velocity component parallel to the transport direction, away from the directed spar-generating retaining surface.
• the fluid flow generated by the onflow device may have a velocity component directed in the transport direction.
• a tramp sport element can be provided at the corresponding position below the transport plane.
• an on-flow device is provided for removing treatment liquid below the transport plane, at the corresponding position above the transport plane a Trannsportelement be provided.
• the transport element and the onflow device can be arranged at the same position in the transport direction on opposite sides of the transport plane.
• the transport element can be set up, for example, to support and / or transport the item to be treated.
• the transport element may be formed as a roller.
• the roller may have a stepped retaining surface, but may also have a substantially constant diameter in the axial direction.
• the transport element can also be designed as a wheel axle, on which a plurality of wheels are provided. The wheels can be designed to touch the material to be treated for transporting the material to be treated.
• FIG. 4 is a schematic side view of a discharge area 41 of a treatment station.
• Such an outlet region 41 can be provided at the treatment station 200 of FIG. 9 at one end of the inner container 201, at which the material to be treated leaves the treatment station.
• the outlet region 41 comprises a plurality of devices 43, 44 and 45 for removing treatment liquid from the item to be treated.
• the devices 43, 44 and 45 for removing the treatment liquid are arranged spaced from each other in the transport direction 20 along a transport path of the material 10 to be treated.
• Each of the devices 43, 44 and 45 may have a retaining surface, which is arranged relative to the transport plane so that a gap between the retaining surface and the surface of the material to be treated 10 opposite it is formed.
• the devices 43, 44 and 45 may be formed as devices for removing treatment liquid according to an embodiment.
• the device 43 may comprise a pair of rollers 51, 52 arranged so that the material to be treated 10 may be passed therebetween.
• a gap-forming retaining surface for retaining the treatment liquid may be formed such that a gap is formed between the retaining surface and the surface of the material 10 facing it, as the material to be treated passes by the rollers 51, 52 becomes.
• at least one of the rollers 51, 52 may have raised edge regions for transporting the material to be treated 10 and a stepped-down support surface provided therebetween.
• the device 43 may, for example, be designed like the device 1 explained with reference to FIGS. 1 and 2.
• the device 44 may have a roller 53 arranged upstream of the transport plane and an onrun device 54 and a roller 55 and an upstream device 56 arranged below the transport plane. On at least one of the rollers 53, 55 of the device
• the 44 may be formed a gap-forming retaining surface for retaining the treatment liquid so that a gap between the retaining surface and the opposite surface of the treated material 10 is formed when the material to be treated is guided past the rollers 53, 55.
• at least one of the rollers 53, 55 can have raised edge regions for transporting the material to be treated 10 and a remote retaining surface provided therebetween, as explained with reference to FIGS. 1 and 2.
• the onflow devices 54 and 56 flow to the item to be treated 10 with a fluid flow 33, for example, an air flow to remove remaining on the treated material treatment liquid.
• the fluid streams 33 emitted by the onflow devices 54 and 56 can be directed so that they move the treatment liquid in the direction of an edge of the material to be treated and thus remove it.
• the device 45 may comprise a roller 57 arranged upstream of the transport plane and an on-flow device 58 and a roller 59 and onflow device 60 arranged below the transport plane. On at least one of the rollers 57, 59 of the device
• the onflow devices 58 and 60 flow the material 10 to be treated with a fluid flow 33, for example an air flow, in order to remove treatment liquid remaining on the material to be treated.
• a fluid flow 33 for example an air flow
• the fluid streams 33 emitted by the onflow devices 58 and 60 can be directed so that they move the treatment liquid in the direction of an edge of the material to be treated and thus remove it.
• the gap-forming retaining surfaces of the devices 43, 44 and 45, which passes through the material to be treated 10 in succession, may have a different configuration.
• the gaps at the devices may become increasingly narrow.
• the device 43 may be configured such that a gap having a first minimum gap height is formed between the retaining surface of the device 43 and the opposite surface of the material to be treated 10, while the device 43 downstream of the device 43 in the direction of transport may be configured such that a Gap is formed with a second minimum gap height between the retaining surface of the device 44 and the opposite surface of the treated material 10.
• the second minimum gap height at the device 44 may be smaller than the first minimum gap height at the device 43, i. the gaps may have a smaller height in the outlet region of the treatment station from one device to another device for removing treatment liquid arranged downstream of this in the transport direction.
• the device 43 delimiting the treatment area 42 is arranged to adjust a level difference 74 of the treatment liquid between the opposite sides of the roller 51 in the transporting direction.
• the treatment liquid 21 is accumulated up to a level 71, while in the adjacent area on the other side of the roller 51 the treatment liquid is accumulated up to a level 72.
• the device 44 which is arranged downstream of the device 43 in the transport direction, is set up such that treatment liquid is removed from the item to be treated 10 when the item to be treated 10 passes through the rollers 53, 55.
• Treatment liquid 73 which is still present after passing the material to be treated 10 on the rollers 53, 55 on the material to be treated 10, 56 is at least partially removed by the Anström wornen 54, 56.
• the device 45 in the transport direction of the device 44th downstream, a further part of the treatment liquid can be removed from the material to be treated, which can still be present on the material to be treated 10 after passing through the device 44.
• treatment liquid can be reliably removed from the material to be treated 10 even if gaps remain between the retention surfaces and the material 10 to be treated.
• a weir 47 is provided between a bottom 46 of an inner container of the treatment station and arranged below the transport plane roller 52 of the device 43.
• Openings 61 for example in the form of slots, holes or slots formed.
• the openings 61 may be closable to adjust the fluid passage through the weir 47 and thus the level difference 74 between the
• the level 72 in the region adjacent the treatment area 42 is determined by a balance of incoming and outgoing streams of treatment liquid.
• one or more openings for example closable bores, can be provided in the floor 46 between the weirs 47, 48.
• a basic setting for a desired level 72 in the area adjacent to the treatment area 42 can be selected.
• overflow weirs may be provided on elements laterally delimiting the treatment station, for example, on bearing receivers intended for supporting the rollers 51, 52, 53 and 55. Additional inflowing liquid quantities can be removed via the overflow weirs.
• treatment liquid can be conveyed into the treatment area 42 with a pump (not shown).
• a weir 48 is provided between the bottom 46 of the inner container of the treatment station and arranged below the transport plane roller 55 of the device 44.
• the weir 48 need not have closable openings for adjusting the liquid level exhibit.
• the weir 48 helps to reduce drainage of the treatment fluid from the treatment area.
• modifications of the outlet region 41 may be realized.
• device 45 may be omitted.
• two devices for removing treatment liquid can be provided in the outlet region. At least the last in the transport direction of these devices may have a flow device.
• the onflow device can be provided at least above the transport plane.
• a plurality of fluid removal devices may be provided having a weir having one or more openings for adjusting a level difference.
• the weir may each have a configuration as explained with reference to the weir 47.
• two devices, each with at least one roller may be provided, for example, in the entry or exit area having a retaining surface for retaining liquid, which forms a gap with the treated material passing thereto, wherein in each of the devices below the transport plane a weir with one opening or a plurality of openings is provided, as has been described for the weir 47.
• a further device Spaced in the direction of transport to these two devices, a further device may be provided which has a configuration corresponding to the device 44. In this way, for example, at least two regions can be formed with a level of the treatment liquid lowered relative to the treatment region in an inlet or outlet region.
• each of the devices for removing liquid may be formed so a retaining surface is provided only at the roller provided above the transport plane, which leaves free a gap between the retaining surface and the material to be conveyed past it.
• the rolls provided below the transport plane can have a diameter which is constant in the axial direction of the rolls.
• one of the flow devices 54, 56 may be replaced by a transport element.
• the transport item can be set up to do this To support and / or transport laundry.
• the transport element may be formed, for example, as a roller or as a wheel axis.
• one of the onflow devices 58, 60 may be replaced by a transport element.
• the transport element can be set up to support and / or transport the item to be treated.
• the transport element may be formed, for example, as a roller or as a wheel axis.
• one of the on-conveyor devices 56, 60 provided below the transport plane may be configured such that the fluid stream 33 generated by the on-stream device 56, 60 has a velocity component that points in the outflow region 41 in the transport direction.
• Fig. 5 is a schematic side view of a discharge area 81 of a treatment station.
• Such an outlet region 81 can be provided at the treatment station 200 of FIG. 9 at one end of the inner container 201, at which the material to be treated leaves the inner container 201.
• Elements or devices of the outlet region 81 which correspond in their function and / or configuration to elements or devices outlet region 41, are provided with the same reference numerals and will not be explained again in detail.
• the liquid level 91 in the treatment area 82 may, for example, be arranged at least 15 mm above the transport level.
• the spout area 81 is provided with a plurality of devices 83, 44 and 45 for removing or holding treatment liquid.
• the device 83 comprises rollers 84, 85, which are arranged so that the material to be treated 10 can be carried out therebetween.
• Retaining surface for retaining the treatment liquid to be formed such that a
• Gap between the retaining surface and the opposite surface of the material to be treated 10 is formed when the material to be treated is guided past the rollers 84, 85.
• at least one of the rollers 84, 85 can be increased
• Edge regions for transporting the material to be treated 10 and an intermediate Have provided remote retention surface.
• the pair of rollers 84, 85 may be formed, for example, like the device 1 explained with reference to Figs.
• the device 83 above the roller 84 has a further retaining element 86.
• the further retaining element 86 is designed to assist in the accumulation of the treatment liquid at a high liquid level in the treatment area 82 by serving as a wall for the accumulated liquid.
• the further retention member 86 may be formed as a roller that is complementary to the roller 84 so that the rollers 84, 86 close tightly and allow little or no passage of fluid between the rollers 84, 86.
• Other configurations for the further element 86 are possible, for example in the form of an upstand.
• the device 83 is arranged to adjust and maintain a level difference 97 of the treatment liquid between the level 91 in the treatment area 82 and a level 92 in the adjacent area on the other side of the device 83 via the device 83.
• the downstream device 44 in the transport direction of the device 83 removes further treatment liquid from the item to be treated 10 when it passes the device 44. Instead of the level 92, there is only a smaller amount of treatment liquid 93 on the item to be treated 10 when the product 10 has passed the pair of rollers of the apparatus 44.
• the downstream in the transport direction of the device 44 device 45 may remove further treatment liquid from the material 10, if this is still necessary after passing through the device 44.
• closable openings 61 are provided in the weir 47.
• the level 92 in the region adjacent to the treatment area 82 is determined by a balance of incoming and outgoing streams of treatment liquid.
• one or more openings 96 for example closable bores, can be provided in the floor 46 between the weirs 47, 48.
• overflow weirs are provided on elements which delimit the treatment station laterally. Additional inflowing liquid quantities can be removed via the overflow weirs.
• a stream 94 of treatment liquid is conveyed into the treatment area 82 with a pump 94.
• Treatment station can be provided.
• Holding treatment liquid can be provided to prevent the treatment liquid flows onto the material to be treated before it is introduced in the inlet region in the treatment station.
• the configuration of the gap-forming retention surface can be suitably selected depending on the specific fields of application.
• Fig. 6 is a schematic front view of a device 101 for removing or holding treatment liquid according to another embodiment.
• the device 101 comprises a roller 102 and a further roller 103.
• the roller 102 and the further roller 103 are arranged so that a material to be treated 10 between the
• Rollers 102 and 103 can be transported through.
• a lateral surface of the roller 102 has a retaining surface 104, which is designed to retain the treatment liquid.
• the roller 102 with the retaining surface 104 is formed so that a gap
• Axial end portions 105 of the roller 102 are a smaller one
• Diameter than the retaining surface 104 defining the central portion of the roller 102 is formed to act as transport portions for transporting the material to be treated 10 when it is supported at its longitudinal edges with support rails.
• a lateral surface of the further roller 103 has a further retaining surface 106, which is designed to retain the treatment liquid.
• the further roller 103 with the further retaining surface 106 is formed so that a gap 18 between the further retaining surface 106 of the further roller 103 and a surface of the treated material 10 opposite thereto remains free when the material to be treated 10 is guided past the further roller 103.
• Axial end portions 107 of the further roller 103 are formed with a smaller diameter than the further retaining surface 106 defining central portion of the further roller 103 to act as transport portions for transporting the material to be treated 10 when it is supported at its longitudinal edges with support rails.
• rollers 108, 109 which support the material to be treated for transporting the material to be treated 10.
• Such support rails 108, 109 can be used in particular when transporting material to be treated with low intrinsic stiffness, in order to give the material to be treated additional stability.
• the roller 102 and further roller 103 of the device 101 are designed such that their smaller diameter axial end sections 105, 107 come into contact with the support rails 108, 109. By rotation of the roller 102 and the further roller 103, the material to be treated 10 can be transported on the support rails 108, 109.
• the retaining surfaces 104, 106 of the rollers 102, 103 are offset from the transport section provided at the axial end of the rollers 102, 103 such that gaps 8, 18 with the desired minimum gap height between the retaining surfaces 104, 106 and the surfaces opposite them of the material to be treated 10 are formed when the material to be treated 10 is guided past the retaining surfaces 104, 106.
• the rollers 102, 103 do not touch the material 10 directly.
• the transport of the material to be treated 10 via a coupling of the transport sections 105, 107 with the support rails 108, 109, where the material to be treated 10 is supported.
• the rollers 102, 103 may be configured to contact the material 10 to be treated in an edge area adjacent to the support rails 108, 109 for transporting.
• increased transport sections can be provided on the rollers 102, 103, which contact the material to be treated next to the support rails 108, 109.
• the rollers 102, 103 can furthermore be set up such that a gap also exists between the rollers 102, 103 and the support rails 108, 109 is formed by liquid.
• corresponding recessed grooves or grooves for squeezing liquid from the support rails to the rollers 102, 103 can be provided relative to the transport sections of the rollers.
• the gap formed between the rollers and the support rails may have a minimum gap height, which may be less than 1 mm, in particular less than 0.7 mm, in particular less than 0.5 mm.
• the gap formed between the rollers and the support rails may have a minimum gap height, which may be at least 0.05 mm, in particular at least 0.07 mm, in particular at least 0.09 mm.
• the apparatus 101 for squeezing liquid from retained laundry may further comprise an on-stream device.
• the on-flow device can be designed as explained with reference to FIG. 3.
• the onflow device can be designed such that the fluid flow output by the onflow device also removes treatment fluid from the support rails.
• passages may be provided which allow passage of liquid through the support rails transversely to the transport direction.
• the rollers 102, 103 may be arranged to exert force on at least one of the longitudinal edges provided retaining rails 108, 109 with a force component which lies in the transport plane and is directed transversely to the transport direction.
• the retaining rail 108 and / or 109 at least one longitudinal edge of the
• the roller 102 provided above the transport plane and / or the roller 103 provided below the transport plane may comprise one or more magnets
• Magnets to exert on the support rail an electromagnetic force may be directed so that the support rails to the opposite
• Fig. 7 is a schematic side view of a device 11 for removing or holding treatment liquid according to a further embodiment.
• the retaining surfaces are not provided on a rotatably mounted roller.
• the device 1 1 1 comprises two substantially cuboidal elements 1 12, 1 13, which can be used as inserts in a plant for the treatment of a material to be treated 10.
• the insert 112 is above the transport plane, and the insert 1 13 is disposed below the transport plane.
• a surface of the inserts 112, 113 serves as a retaining surface which retains treatment liquid.
• the inserts 112, 113 of the device 1 11 are arranged relative to a transport path of the material to be treated 10 so that between one of the upper surface of the treated material 10 and one of these facing side surface 114 of the insert 112, a gap 1 15 remains free if the material to be treated 10 at the Device 1 11 is passed, and that between the lower surface of the material to be treated 10 and one of these facing side surface 1 17 of the insert 113, a gap 1 18 remains free when the material to be treated 10 is passed to the device 1 11.
• the side surface 114 of the insert 112 and the side surface 117 of the insert 117 may have a planar configuration such that the gaps 115 and 118 extend along the transport direction at a constant gap height.
• the inserts 112, 113 of the device 11 1 have an inlet region which opens against the transport direction 20 and is formed by chamfers 116, 119 on the inserts 12, 13.
• Such an inlet region can be used, for example, for guiding treated articles with low inherent rigidity, for example foils.
• the device 111 with the inserts 112, 113 can be used for damming the treatment liquid 21 in a system for wet-chemical treatment of the material 10 to be treated. If the item to be treated 10 of a arranged on a first side (left in Fig. 7) of the inserts treatment area in which the treatment liquid 21 is dammed up to a level 121, past the inserts 1 12, 1 13 remains a layer of treatment liquid with a smaller thickness 122 on the item to be treated 10th
• the inserts 112, 1 13 can be suitably configured depending on the structural conditions of the system in which the device 111 is used.
• the inserts 112, 113 may be configured so that the gaps 1 15, 118 in the transport direction 20 are as long as possible.
• the inserts 112, 113 may be non-rotatably mounted in the system for wet-chemical treatment.
• the inserts 112, 113 can in the system especially at an in Transport direction fixed position be attached.
• the inserts 112, 113 may be mounted so that they are vertically movable against each other.
• a cuboid insert is provided above the transport plane, while below the transport plane, a roller is provided for transporting the material to be treated.
• the parallelepiped insert may, for example, have the same configuration as the insert 112 of the device 11.
• FIG. 8 is a schematic side view of a treatment station 131 in which a pair of rollers 132, 133 are provided in an inlet region and a further pair of rollers 134, 135 in a discharge region.
• the roller 132 in the inlet region is above the
• Transport level and the roller 133 in the inlet region is below the transport plane of a
• the roller 134 in the outlet area is above the
• Transport level and the roller 135 in the outlet region is arranged below the transport plane of a material to be treated 10. With the roller pairs is the
• Treatment liquid 21 accumulated in the treatment station 131 up to a level 136.
• Each of the rollers 132-135 has at its axial ends transport sections in the form of elevations 5, 15 for transporting the material to be treated. Between the transport sections provided at the ends, a retaining surface 4, 14 with a smaller diameter is formed. As explained with reference to Figs. 1 and 2, the retaining surface 4, 14 of the rollers forms a gap with the treated material passing past the rollers, which extends in the widthwise direction of the material to be treated.
• the various sections of the roller 132 in the inlet region are driven in rotation so that the transport sections 5 and the retaining surface 4 arranged therebetween of the roller 132 provided above the transport plane rotate in the same direction.
• the various sections of the roller 133 in the inlet region are driven in rotation so that the transport sections 15 and the retaining surface 14 arranged therebetween of the roller 133 provided below the transport plane rotate in the same direction.
• the direction of rotation 141 of the transport sections 5 of the roller 132 provided above the transport plane is selected such that the transport sections 5 move at their points of contact with the item to be treated 10 in the transport direction 20 in order to transport the item to be treated 10 in the transport direction 20.
• the direction of rotation 143 of the transport sections 15 of the roller 133 provided below the transport plane is selected so that the transport sections 15 are at their points of contact with the To move treated 10 in the transport direction 20 to transport the material to be treated 10 in the transport direction 20.
• the retaining surface 4 of the roller 132 provided above the transport plane is rotated in the same direction as the transport sections 5 of the roller 132 in a direction of rotation 142 in such a way that the portion of the retaining surface 4 that is just facing the material to be treated 10 moves in the direction of the higher liquid level (in FIG 8 to the right).
• the retainer surface 14 of the roller 133 provided below the transport plane is rotated in the same direction as the transport sections 15 in a direction of rotation 144 so that the portion of the retainer surface 14 which is just toward the item to be treated 10 moves in the direction of the higher liquid level (in FIG to the right).
• rollers 132, 133 By suitable design of the rollers 132, 133, a sufficiently high liquid level 136 can be accumulated while the movement of the retention surfaces 4 against the high liquid level region sufficiently reduces the passage of liquid through the gaps formed on the retention surfaces 4 of the rollers 132, 133.
• the rollers 132, 133 may be configured such that a gap with a minimum gap height of less than 0.3 mm, for example approximately 0.1 mm, is formed between the retaining surface 4, 14 and the surface of the material 10 facing the retaining surface ,
• the transport sections can be increased by less than 0.3 mm, for example by about 0.1 mm, relative to the retention surface.
• the transport sections 5, 15 of the rollers 134, 135 are rotated with a direction of rotation 145, 147 so that the transport sections 5, 15 move at their points of contact with the item to be treated 10 in the transport direction 20.
• the roller 134 provided above the transport plane can be designed such that the retaining surface 4 of the roller 134 is rotatable relative to the transport section 5 of the roller 134 is.
• the roller 135 provided below the transport plane may be formed so that the retaining surface 14 of the roller 135 is rotatable relative to the conveying portion 15 of the roller 135.
• the retaining surface 4 of the roller 134 provided above the transport plane can be rotated in a direction of rotation 146 which is opposite to the direction of rotation 145 of the transport section 5 of this roller 134.
• the retaining surface 14 of the roller 135 provided below the transport plane can be rotated in a direction of rotation 148 which is opposite to the direction of rotation 147 of the transport section 15 of this roller 135.
• the retaining surfaces 4, 14 can also be rotated in the outlet region in such a way that the portion of the retaining surface 4 of the roller 134 provided above the transport plane, which straightly faces the material to be treated 10, moves in the direction of the higher liquid level (in FIG left) moves.
• the retaining surface 14 of the roller 135 can be rotated in the opposite direction to the transporting section 15 such that the portion of the retaining surface 14 of the roller 135 that is just facing the material to be treated 10 moves in the direction of the higher fluid level (to the left in FIG. 8) ,
• the rollers 134, 135 in the outlet region can also be designed such that a gap having a minimum gap height of less than 0.3 mm, for example approximately 0.1 mm, between the retaining surface 4, 14 and the surface of the material 10 facing the retaining surface is trained.
• the transport sections can be increased by less than 0.3 mm, for example by about 0.1 mm, relative to the retention surface.
• one or more blowing devices may be provided in the inlet region and / or in the outlet region of the treatment station 131 in order to remove the treatment liquid leaving the gap with a fluid flow, as explained with reference to FIG.
• roller pairs in the inlet region and / or outlet region it is possible to reduce leakage of liquid through the gaps, which remain free during transporting the material to be treated, that in the inlet region and / or in the outlet region of the treatment station no flow device for blowing off treatment liquid is provided.
• a plurality of devices for removing or holding treatment liquid can also be provided, as explained with reference to FIGS. 4 and 5.
• the apparatuses and methods according to various embodiments make it possible to remove or remove a treatment liquid from the item to be treated in a system for the wet-chemical treatment of items to be treated, wherein a direct contact between squeezing rollers and a useful portion of the item to be treated can be reduced or avoided.
• Numerous modifications of the embodiments shown in the figures and described in detail can be realized in other embodiments.
• the gap-forming retaining surface may also be formed so that the cross-section of the gap, in particular the gap height in the
• Width direction of the material to be treated changed.
• the retaining surface in the width direction of the material to be treated may be concave, so that the formed gap, as a function of a position in the width direction of the material to be treated, in the middle of
• embodiments can be used in particular in treatment plants in which the material to be treated is transported continuously and in a horizontal transport plane, embodiments can also be used in systems in which the material to be treated is transported in a vertical transport plane.
• a combination of gap-forming retention surface and onflow device can also be used to accumulate liquid when the material to be treated is transported in a vertical transport plane.

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• Chemical Kinetics & Catalysis (AREA)
• Electrochemistry (AREA)
• Materials Engineering (AREA)
• Metallurgy (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Manufacturing & Machinery (AREA)
• Coating Apparatus (AREA)
• Electroplating Methods And Accessories (AREA)
• Rollers For Roller Conveyors For Transfer (AREA)
• Cleaning By Liquid Or Steam (AREA)
• Manufacturing Of Printed Circuit Boards (AREA)
• Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
• Cleaning Or Drying Semiconductors (AREA)
• Treatment Of Fiber Materials (AREA)
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• 2010
  • 2010-05-12 KR KR1020117029494A patent/KR101284197B1/ko not_active Expired - Fee Related
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  • 2010-05-12 CN CN201080021230.6A patent/CN102422727B/zh active Active
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