WO2009011220A1 - 半導体装置およびその製造方法、ならびに表示装置およびその製造方法 - Google Patents
半導体装置およびその製造方法、ならびに表示装置およびその製造方法 Download PDFInfo
- Publication number
- WO2009011220A1 WO2009011220A1 PCT/JP2008/061919 JP2008061919W WO2009011220A1 WO 2009011220 A1 WO2009011220 A1 WO 2009011220A1 JP 2008061919 W JP2008061919 W JP 2008061919W WO 2009011220 A1 WO2009011220 A1 WO 2009011220A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor layer
- semiconductor device
- display device
- manufacturing
- device manufacturing
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 9
- 238000004519 manufacturing process Methods 0.000 title 2
- 238000005192 partition Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
- G02F1/13685—Top gates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/80—Constructional details
- H10K10/82—Electrodes
- H10K10/84—Ohmic electrodes, e.g. source or drain electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/02—Materials and properties organic material
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008800235936A CN101689510B (zh) | 2007-07-13 | 2008-07-01 | 半导体装置及其制造方法、显示装置及其制造方法 |
US12/667,972 US8168983B2 (en) | 2007-07-13 | 2008-07-01 | Semiconductor device, method for manufacturing semiconductor device, display device, and method for manufacturing display device |
EP08790782A EP2169711A4 (en) | 2007-07-13 | 2008-07-01 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, DISPLAY DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-184172 | 2007-07-13 | ||
JP2007184172A JP2009021477A (ja) | 2007-07-13 | 2007-07-13 | 半導体装置およびその製造方法、ならびに表示装置およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009011220A1 true WO2009011220A1 (ja) | 2009-01-22 |
Family
ID=40259558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/061919 WO2009011220A1 (ja) | 2007-07-13 | 2008-07-01 | 半導体装置およびその製造方法、ならびに表示装置およびその製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8168983B2 (ja) |
EP (1) | EP2169711A4 (ja) |
JP (1) | JP2009021477A (ja) |
KR (1) | KR20100032407A (ja) |
CN (1) | CN101689510B (ja) |
TW (1) | TWI385806B (ja) |
WO (1) | WO2009011220A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110012097A1 (en) * | 2008-03-17 | 2011-01-20 | Sony Corporation | Semiconductor device and display apparatus |
CN110112145A (zh) * | 2015-01-21 | 2019-08-09 | 群创光电股份有限公司 | 显示装置 |
US11008448B2 (en) | 2014-12-23 | 2021-05-18 | Bridgestone Americas Tire Operations, Llc | Oil-containing rubber compositions and related methods |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5533050B2 (ja) * | 2009-04-23 | 2014-06-25 | セイコーエプソン株式会社 | 半導体装置の製造方法、半導体装置、アクティブマトリクス装置、電気光学装置および電子機器 |
JP5502864B2 (ja) * | 2009-07-01 | 2014-05-28 | シャープ株式会社 | アクティブマトリクス基板及び有機el表示装置 |
KR101904811B1 (ko) | 2009-07-24 | 2018-10-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
KR101274719B1 (ko) * | 2010-06-11 | 2013-06-25 | 엘지디스플레이 주식회사 | 박막트랜지스터 기판 및 그 제조 방법과 그를 가지는 평판 표시 소자 |
US9018704B2 (en) | 2011-10-20 | 2015-04-28 | Panasonic Corporation | Thin-film transistor and method of manufacturing the same |
TW201321871A (zh) * | 2011-11-29 | 2013-06-01 | Au Optronics Corp | 顯示面板及其製作方法 |
KR102056864B1 (ko) * | 2013-04-09 | 2019-12-18 | 삼성디스플레이 주식회사 | 미러 기능을 구비한 유기 발광 표시 장치 |
US9960256B2 (en) * | 2014-05-20 | 2018-05-01 | Globalfoundries Inc. | Merged gate and source/drain contacts in a semiconductor device |
TWI577000B (zh) * | 2015-01-21 | 2017-04-01 | 群創光電股份有限公司 | 顯示裝置 |
CN105118929B (zh) * | 2015-08-03 | 2018-01-02 | 京东方科技集团股份有限公司 | 电极结构和有机发光单元及其制造方法 |
CN105206678A (zh) * | 2015-10-29 | 2015-12-30 | 京东方科技集团股份有限公司 | 薄膜晶体管及阵列基板的制作方法 |
CN105655257A (zh) * | 2016-01-13 | 2016-06-08 | 深圳市华星光电技术有限公司 | 薄膜晶体管结构的制造方法 |
TWI607595B (zh) * | 2016-07-22 | 2017-12-01 | 元太科技工業股份有限公司 | 電子元件封裝體 |
CN107644937B (zh) * | 2016-07-22 | 2021-06-15 | 元太科技工业股份有限公司 | 电子组件封装体 |
JP6980498B2 (ja) | 2017-11-22 | 2021-12-15 | 株式会社ジャパンディスプレイ | 表示装置 |
EP3660907B1 (en) * | 2018-11-28 | 2023-03-22 | Samsung Display Co., Ltd. | Display device |
Citations (8)
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JPH08330597A (ja) * | 1995-06-05 | 1996-12-13 | Canon Inc | 半導体基板、半導体装置、及び画像表示装置 |
JP2000269504A (ja) * | 1999-03-16 | 2000-09-29 | Hitachi Ltd | 半導体装置、その製造方法及び液晶表示装置 |
JP2002518844A (ja) * | 1998-06-19 | 2002-06-25 | シン フイルム エレクトロニクス エイエスエイ | 集積無機/有機相補型薄膜トランジスタ回路およびその製造方法 |
JP2005086147A (ja) * | 2003-09-11 | 2005-03-31 | Sony Corp | 金属単層膜形成方法、配線形成方法、及び、電界効果型トランジスタの製造方法 |
JP2006114862A (ja) | 2004-10-15 | 2006-04-27 | Samsung Electronics Co Ltd | 有機半導体を利用した薄膜トランジスタ表示板及びその製造方法 |
JP2007140520A (ja) * | 2005-11-16 | 2007-06-07 | Samsung Electronics Co Ltd | 有機薄膜トランジスタ表示板及びその製造方法 |
JP2007150240A (ja) * | 2005-11-29 | 2007-06-14 | Lg Philips Lcd Co Ltd | 薄膜トランジスタ及びその製造方法、薄膜トランジスタを備えたアレイ基板及びその製造方法 |
JP2007220713A (ja) * | 2006-02-14 | 2007-08-30 | Toppan Printing Co Ltd | 薄膜トランジスタ |
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JP3580092B2 (ja) * | 1997-08-21 | 2004-10-20 | セイコーエプソン株式会社 | アクティブマトリクス型表示装置 |
JP3850005B2 (ja) * | 1999-03-03 | 2006-11-29 | パイオニア株式会社 | スイッチング素子及び有機エレクトロルミネッセンス素子表示装置 |
KR101209046B1 (ko) * | 2005-07-27 | 2012-12-06 | 삼성디스플레이 주식회사 | 박막트랜지스터 기판과 박막트랜지스터 기판의 제조방법 |
US7800101B2 (en) | 2006-01-05 | 2010-09-21 | Samsung Electronics Co., Ltd. | Thin film transistor having openings formed therein |
US20070278493A1 (en) * | 2006-06-02 | 2007-12-06 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element and display device |
JP2008122649A (ja) * | 2006-11-13 | 2008-05-29 | Seiko Epson Corp | 電気光学装置の製造方法、電気光学装置、液晶装置、有機エレクトロルミネッセンス装置、及び電子機器 |
JP4801037B2 (ja) * | 2006-12-13 | 2011-10-26 | 三星モバイルディスプレイ株式會社 | 電子素子、及びその製造方法 |
GB2450675A (en) * | 2007-04-04 | 2009-01-07 | Cambridge Display Tech Ltd | Active matrix organic displays |
KR101348025B1 (ko) * | 2007-04-04 | 2014-01-06 | 삼성전자주식회사 | 박막 트랜지스터의 제조방법 |
JP4389962B2 (ja) * | 2007-04-26 | 2009-12-24 | ソニー株式会社 | 半導体装置、電子機器、および半導体装置の製造方法 |
KR101326129B1 (ko) * | 2007-07-24 | 2013-11-06 | 삼성디스플레이 주식회사 | 유기 박막 트랜지스터 표시판 및 그 제조 방법 |
GB2455747B (en) * | 2007-12-19 | 2011-02-09 | Cambridge Display Tech Ltd | Electronic devices and methods of making the same using solution processing techniques |
JP2009224542A (ja) * | 2008-03-17 | 2009-10-01 | Sony Corp | 半導体装置および表示装置 |
JP4618337B2 (ja) * | 2008-06-17 | 2011-01-26 | ソニー株式会社 | 表示装置およびその製造方法、ならびに半導体装置およびその製造方法 |
-
2007
- 2007-07-13 JP JP2007184172A patent/JP2009021477A/ja active Pending
-
2008
- 2008-07-01 WO PCT/JP2008/061919 patent/WO2009011220A1/ja active Application Filing
- 2008-07-01 US US12/667,972 patent/US8168983B2/en not_active Expired - Fee Related
- 2008-07-01 KR KR1020107000079A patent/KR20100032407A/ko active IP Right Grant
- 2008-07-01 CN CN2008800235936A patent/CN101689510B/zh not_active Expired - Fee Related
- 2008-07-01 EP EP08790782A patent/EP2169711A4/en not_active Withdrawn
- 2008-07-02 TW TW097124893A patent/TWI385806B/zh not_active IP Right Cessation
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JPH08330597A (ja) * | 1995-06-05 | 1996-12-13 | Canon Inc | 半導体基板、半導体装置、及び画像表示装置 |
JP2002518844A (ja) * | 1998-06-19 | 2002-06-25 | シン フイルム エレクトロニクス エイエスエイ | 集積無機/有機相補型薄膜トランジスタ回路およびその製造方法 |
JP2000269504A (ja) * | 1999-03-16 | 2000-09-29 | Hitachi Ltd | 半導体装置、その製造方法及び液晶表示装置 |
JP2005086147A (ja) * | 2003-09-11 | 2005-03-31 | Sony Corp | 金属単層膜形成方法、配線形成方法、及び、電界効果型トランジスタの製造方法 |
JP2006114862A (ja) | 2004-10-15 | 2006-04-27 | Samsung Electronics Co Ltd | 有機半導体を利用した薄膜トランジスタ表示板及びその製造方法 |
JP2007140520A (ja) * | 2005-11-16 | 2007-06-07 | Samsung Electronics Co Ltd | 有機薄膜トランジスタ表示板及びその製造方法 |
JP2007150240A (ja) * | 2005-11-29 | 2007-06-14 | Lg Philips Lcd Co Ltd | 薄膜トランジスタ及びその製造方法、薄膜トランジスタを備えたアレイ基板及びその製造方法 |
JP2007220713A (ja) * | 2006-02-14 | 2007-08-30 | Toppan Printing Co Ltd | 薄膜トランジスタ |
Non-Patent Citations (1)
Title |
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See also references of EP2169711A4 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110012097A1 (en) * | 2008-03-17 | 2011-01-20 | Sony Corporation | Semiconductor device and display apparatus |
US8569745B2 (en) * | 2008-03-17 | 2013-10-29 | Sony Corporation | Semiconductor device and display apparatus |
US11008448B2 (en) | 2014-12-23 | 2021-05-18 | Bridgestone Americas Tire Operations, Llc | Oil-containing rubber compositions and related methods |
US11674020B2 (en) | 2014-12-23 | 2023-06-13 | Bridgestone Americas Tire Operations, Llc | Oil-containing rubber compositions and related methods |
CN110112145A (zh) * | 2015-01-21 | 2019-08-09 | 群创光电股份有限公司 | 显示装置 |
CN110112145B (zh) * | 2015-01-21 | 2023-08-29 | 群创光电股份有限公司 | 显示装置 |
Also Published As
Publication number | Publication date |
---|---|
EP2169711A1 (en) | 2010-03-31 |
US20110012198A1 (en) | 2011-01-20 |
TWI385806B (zh) | 2013-02-11 |
TW200917490A (en) | 2009-04-16 |
CN101689510A (zh) | 2010-03-31 |
US8168983B2 (en) | 2012-05-01 |
KR20100032407A (ko) | 2010-03-25 |
JP2009021477A (ja) | 2009-01-29 |
CN101689510B (zh) | 2012-07-04 |
EP2169711A4 (en) | 2011-11-23 |
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