WO2008120785A1 - Appareil d'exposition et procédé d'exposition - Google Patents

Appareil d'exposition et procédé d'exposition Download PDF

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Publication number
WO2008120785A1
WO2008120785A1 PCT/JP2008/056413 JP2008056413W WO2008120785A1 WO 2008120785 A1 WO2008120785 A1 WO 2008120785A1 JP 2008056413 W JP2008056413 W JP 2008056413W WO 2008120785 A1 WO2008120785 A1 WO 2008120785A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
exposure
masks
prescribed direction
patterns
Prior art date
Application number
PCT/JP2008/056413
Other languages
English (en)
Japanese (ja)
Inventor
Shusaku Karuishi
Shinichiro Hayashi
Tadashi Gotou
Toshiyuki Kondou
Takuya Miyaji
Nobuhito Saji
Yosuke Takagi
Masaaki Matsuzaka
Original Assignee
Nsk Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007097015A external-priority patent/JP5184808B2/ja
Priority claimed from JP2007149340A external-priority patent/JP5099318B2/ja
Priority claimed from JP2007153966A external-priority patent/JP5084356B2/ja
Priority claimed from JP2007154202A external-priority patent/JP5046157B2/ja
Priority claimed from JP2007153965A external-priority patent/JP5089255B2/ja
Priority claimed from JP2007154205A external-priority patent/JP5089258B2/ja
Priority claimed from JP2007154203A external-priority patent/JP5089257B2/ja
Priority claimed from JP2007154204A external-priority patent/JP5077655B2/ja
Priority claimed from JP2007153967A external-priority patent/JP5279207B2/ja
Priority claimed from JP2007159196A external-priority patent/JP5105152B2/ja
Priority claimed from JP2007160255A external-priority patent/JP5068107B2/ja
Priority claimed from JP2007160256A external-priority patent/JP5150949B2/ja
Priority claimed from JP2007166530A external-priority patent/JP2009003365A/ja
Application filed by Nsk Ltd. filed Critical Nsk Ltd.
Priority to KR1020117014245A priority Critical patent/KR101111934B1/ko
Priority to KR1020097020367A priority patent/KR101111933B1/ko
Publication of WO2008120785A1 publication Critical patent/WO2008120785A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un appareil d'exposition à balayage de proximité (1) qui comporte un mécanisme de transfert de substrat (20), qui supporte un substrat (W) au moins dans une région d'exposition par flottaison du substrat et transfert le substrat (W) dans une direction prescrite ; plusieurs sections de maintien de masque (71), qui maintiennent respectivement plusieurs masques (M) sur lesquels des motifs (P) sont formés, et qui sont disposées de façon décalée le long d'une direction coupant une direction prescrite ; et plusieurs sections d'irradiation (80), qui sont respectivement disposées sur des parties supérieures des sections de maintien de masque (71), et qui irradient de la lumière pour l'exposition. Ensuite, le substrat (W) qui est transféré dans la direction prescrite se voit appliqué une lumière d'exposition (EL) à travers les masques (M), et les motifs (P) des masques (M) sont exposés au substrat (W).
PCT/JP2008/056413 2007-04-03 2008-03-31 Appareil d'exposition et procédé d'exposition WO2008120785A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020117014245A KR101111934B1 (ko) 2007-04-03 2008-03-31 노광 장치 및 노광 방법
KR1020097020367A KR101111933B1 (ko) 2007-04-03 2008-03-31 노광 장치 및 노광 방법

Applications Claiming Priority (26)

Application Number Priority Date Filing Date Title
JP2007-097015 2007-04-03
JP2007097015A JP5184808B2 (ja) 2007-04-03 2007-04-03 露光方法及び露光装置
JP2007-149340 2007-06-05
JP2007149340A JP5099318B2 (ja) 2007-06-05 2007-06-05 露光装置及び露光方法
JP2007-153965 2007-06-11
JP2007-154202 2007-06-11
JP2007-154205 2007-06-11
JP2007-154203 2007-06-11
JP2007-153967 2007-06-11
JP2007154203A JP5089257B2 (ja) 2007-06-11 2007-06-11 近接スキャン露光装置
JP2007154204A JP5077655B2 (ja) 2007-06-11 2007-06-11 近接スキャン露光装置及びエアパッド
JP2007153966A JP5084356B2 (ja) 2007-06-11 2007-06-11 露光装置用基板搬送機構及びそれを用いた基板位置調整方法
JP2007154202A JP5046157B2 (ja) 2007-06-11 2007-06-11 近接スキャン露光装置
JP2007-154204 2007-06-11
JP2007153967A JP5279207B2 (ja) 2007-06-11 2007-06-11 露光装置用基板搬送機構
JP2007-153966 2007-06-11
JP2007154205A JP5089258B2 (ja) 2007-06-11 2007-06-11 近接スキャン露光装置及びその露光方法
JP2007153965A JP5089255B2 (ja) 2007-06-11 2007-06-11 露光装置
JP2007159196A JP5105152B2 (ja) 2007-06-15 2007-06-15 近接スキャン露光装置及びその制御方法
JP2007-159196 2007-06-15
JP2007160255A JP5068107B2 (ja) 2007-06-18 2007-06-18 露光装置用基板搬送機構及びその制御方法
JP2007160256A JP5150949B2 (ja) 2007-06-18 2007-06-18 近接スキャン露光装置及びその制御方法
JP2007-160256 2007-06-18
JP2007-160255 2007-06-18
JP2007-166530 2007-06-25
JP2007166530A JP2009003365A (ja) 2007-06-25 2007-06-25 近接スキャン露光装置及びその制御方法

Publications (1)

Publication Number Publication Date
WO2008120785A1 true WO2008120785A1 (fr) 2008-10-09

Family

ID=39808365

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/056413 WO2008120785A1 (fr) 2007-04-03 2008-03-31 Appareil d'exposition et procédé d'exposition

Country Status (3)

Country Link
KR (2) KR101111934B1 (fr)
TW (1) TW200907590A (fr)
WO (1) WO2008120785A1 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011066136A (ja) * 2009-09-16 2011-03-31 Yaskawa Electric Corp フェールセーフ機構を備えた基盤搬送装置
JP2011090097A (ja) * 2009-10-21 2011-05-06 Nsk Ltd 近接スキャン露光装置及び近接スキャン露光方法
JP2011134937A (ja) * 2009-11-30 2011-07-07 Nsk Ltd 近接スキャン露光装置及びその制御方法
JPWO2010044268A1 (ja) * 2008-10-15 2012-03-15 株式会社ニコン 露光装置及びその組立て方法、並びにデバイス製造方法
CN102763209A (zh) * 2010-02-17 2012-10-31 株式会社尼康 搬送装置、搬送方法、曝光装置、以及元件制造方法
CN103097959A (zh) * 2010-09-13 2013-05-08 株式会社尼康 移动体装置、曝光装置、元件制造方法、平板显示器的制造方法、及物体交换方法
JP2014167616A (ja) * 2013-01-30 2014-09-11 Nsk Technology Co Ltd 近接露光装置、近接露光方法及び照明光学系
CN106444302A (zh) * 2016-11-23 2017-02-22 南京华东电子信息科技股份有限公司 一种可移动式掩模载置台

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5510299B2 (ja) * 2010-12-13 2014-06-04 ウシオ電機株式会社 露光装置および露光方法
JP5533769B2 (ja) * 2011-04-14 2014-06-25 ウシオ電機株式会社 マスクとワークの位置合せ方法
CN117420741B (zh) * 2023-12-19 2024-03-12 深圳市欣光辉科技有限公司 一种曝光定位结构及曝光机

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62102524A (ja) * 1985-10-29 1987-05-13 Canon Inc マスクチエンジヤ−
JPH10223525A (ja) * 1997-02-10 1998-08-21 Nikon Corp 露光装置のフォーカス制御方法
WO2000059012A1 (fr) * 1999-03-26 2000-10-05 Nikon Corporation Procede et dispositif d'exposition
JP2001166496A (ja) * 1999-12-07 2001-06-22 Nikon Corp 露光方法および露光装置
JP2001215717A (ja) * 2000-02-02 2001-08-10 Nikon Corp 走査露光方法および走査型露光装置
JP2001319871A (ja) * 2000-02-29 2001-11-16 Nikon Corp 露光方法、濃度フィルタの製造方法、及び露光装置
JP2004311896A (ja) * 2003-04-10 2004-11-04 Nikon Corp 露光方法及び装置、デバイス製造方法、並びにマスク
JP2006235533A (ja) * 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2007072267A (ja) * 2005-09-08 2007-03-22 Sumitomo Chemical Co Ltd 露光装置

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62102524A (ja) * 1985-10-29 1987-05-13 Canon Inc マスクチエンジヤ−
JPH10223525A (ja) * 1997-02-10 1998-08-21 Nikon Corp 露光装置のフォーカス制御方法
WO2000059012A1 (fr) * 1999-03-26 2000-10-05 Nikon Corporation Procede et dispositif d'exposition
JP2001166496A (ja) * 1999-12-07 2001-06-22 Nikon Corp 露光方法および露光装置
JP2001215717A (ja) * 2000-02-02 2001-08-10 Nikon Corp 走査露光方法および走査型露光装置
JP2001319871A (ja) * 2000-02-29 2001-11-16 Nikon Corp 露光方法、濃度フィルタの製造方法、及び露光装置
JP2004311896A (ja) * 2003-04-10 2004-11-04 Nikon Corp 露光方法及び装置、デバイス製造方法、並びにマスク
JP2006235533A (ja) * 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2007072267A (ja) * 2005-09-08 2007-03-22 Sumitomo Chemical Co Ltd 露光装置

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014160263A (ja) * 2008-10-15 2014-09-04 Nikon Corp 露光装置及びその組立て方法、並びにデバイス製造方法
JP2015187752A (ja) * 2008-10-15 2015-10-29 株式会社ニコン 露光装置及びその組立て方法、並びにデバイス製造方法
TWI480706B (zh) * 2008-10-15 2015-04-11 尼康股份有限公司 An exposure apparatus, a method of assembling the same, and a method of manufacturing the same
JPWO2010044268A1 (ja) * 2008-10-15 2012-03-15 株式会社ニコン 露光装置及びその組立て方法、並びにデバイス製造方法
JP2011066136A (ja) * 2009-09-16 2011-03-31 Yaskawa Electric Corp フェールセーフ機構を備えた基盤搬送装置
JP2011090097A (ja) * 2009-10-21 2011-05-06 Nsk Ltd 近接スキャン露光装置及び近接スキャン露光方法
JP2011134937A (ja) * 2009-11-30 2011-07-07 Nsk Ltd 近接スキャン露光装置及びその制御方法
CN102763209B (zh) * 2010-02-17 2017-02-08 株式会社尼康 搬送装置、搬送方法、曝光装置、以及元件制造方法
CN102763209A (zh) * 2010-02-17 2012-10-31 株式会社尼康 搬送装置、搬送方法、曝光装置、以及元件制造方法
CN107017191A (zh) * 2010-02-17 2017-08-04 株式会社尼康 搬送装置、搬送方法、曝光装置、以及元件制造方法
CN107017191B (zh) * 2010-02-17 2020-08-14 株式会社尼康 搬送装置、曝光装置、以及元件制造方法
CN103097959A (zh) * 2010-09-13 2013-05-08 株式会社尼康 移动体装置、曝光装置、元件制造方法、平板显示器的制造方法、及物体交换方法
JP2014167616A (ja) * 2013-01-30 2014-09-11 Nsk Technology Co Ltd 近接露光装置、近接露光方法及び照明光学系
CN106444302A (zh) * 2016-11-23 2017-02-22 南京华东电子信息科技股份有限公司 一种可移动式掩模载置台

Also Published As

Publication number Publication date
KR101111933B1 (ko) 2012-04-06
KR101111934B1 (ko) 2012-04-06
TW200907590A (en) 2009-02-16
KR20090128436A (ko) 2009-12-15
KR20110091013A (ko) 2011-08-10

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