TW200907590A - Exposure apparatus and method - Google Patents

Exposure apparatus and method Download PDF

Info

Publication number
TW200907590A
TW200907590A TW97112393A TW97112393A TW200907590A TW 200907590 A TW200907590 A TW 200907590A TW 97112393 A TW97112393 A TW 97112393A TW 97112393 A TW97112393 A TW 97112393A TW 200907590 A TW200907590 A TW 200907590A
Authority
TW
Taiwan
Prior art keywords
substrate
mask
exposure
reticle
light
Prior art date
Application number
TW97112393A
Other languages
English (en)
Chinese (zh)
Inventor
Shusaku Karuishi
Shinichiro Hayashi
Tadashi Gotou
Toshiyuki Kondou
Takuya Miyaji
Nobuhito Saji
Yosuke Takagi
Masaaki Matsuzaka
Original Assignee
Nsk Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007097015A external-priority patent/JP5184808B2/ja
Priority claimed from JP2007149340A external-priority patent/JP5099318B2/ja
Priority claimed from JP2007153967A external-priority patent/JP5279207B2/ja
Priority claimed from JP2007154205A external-priority patent/JP5089258B2/ja
Priority claimed from JP2007153965A external-priority patent/JP5089255B2/ja
Priority claimed from JP2007153966A external-priority patent/JP5084356B2/ja
Priority claimed from JP2007154203A external-priority patent/JP5089257B2/ja
Priority claimed from JP2007154204A external-priority patent/JP5077655B2/ja
Priority claimed from JP2007154202A external-priority patent/JP5046157B2/ja
Priority claimed from JP2007159196A external-priority patent/JP5105152B2/ja
Priority claimed from JP2007160255A external-priority patent/JP5068107B2/ja
Priority claimed from JP2007160256A external-priority patent/JP5150949B2/ja
Priority claimed from JP2007166530A external-priority patent/JP2009003365A/ja
Application filed by Nsk Co Ltd filed Critical Nsk Co Ltd
Publication of TW200907590A publication Critical patent/TW200907590A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW97112393A 2007-04-03 2008-04-03 Exposure apparatus and method TW200907590A (en)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
JP2007097015A JP5184808B2 (ja) 2007-04-03 2007-04-03 露光方法及び露光装置
JP2007149340A JP5099318B2 (ja) 2007-06-05 2007-06-05 露光装置及び露光方法
JP2007154205A JP5089258B2 (ja) 2007-06-11 2007-06-11 近接スキャン露光装置及びその露光方法
JP2007153965A JP5089255B2 (ja) 2007-06-11 2007-06-11 露光装置
JP2007153967A JP5279207B2 (ja) 2007-06-11 2007-06-11 露光装置用基板搬送機構
JP2007153966A JP5084356B2 (ja) 2007-06-11 2007-06-11 露光装置用基板搬送機構及びそれを用いた基板位置調整方法
JP2007154203A JP5089257B2 (ja) 2007-06-11 2007-06-11 近接スキャン露光装置
JP2007154204A JP5077655B2 (ja) 2007-06-11 2007-06-11 近接スキャン露光装置及びエアパッド
JP2007154202A JP5046157B2 (ja) 2007-06-11 2007-06-11 近接スキャン露光装置
JP2007159196A JP5105152B2 (ja) 2007-06-15 2007-06-15 近接スキャン露光装置及びその制御方法
JP2007160255A JP5068107B2 (ja) 2007-06-18 2007-06-18 露光装置用基板搬送機構及びその制御方法
JP2007160256A JP5150949B2 (ja) 2007-06-18 2007-06-18 近接スキャン露光装置及びその制御方法
JP2007166530A JP2009003365A (ja) 2007-06-25 2007-06-25 近接スキャン露光装置及びその制御方法

Publications (1)

Publication Number Publication Date
TW200907590A true TW200907590A (en) 2009-02-16

Family

ID=39808365

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97112393A TW200907590A (en) 2007-04-03 2008-04-03 Exposure apparatus and method

Country Status (3)

Country Link
KR (2) KR101111934B1 (fr)
TW (1) TW200907590A (fr)
WO (1) WO2008120785A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI587430B (zh) * 2010-02-17 2017-06-11 尼康股份有限公司 A conveyance device, a conveying method, an exposure apparatus, and an element manufacturing method
CN112185864A (zh) * 2020-10-13 2021-01-05 常州常耀电子科技有限公司 一种uv灯曝光解胶机
CN117420741A (zh) * 2023-12-19 2024-01-19 深圳市欣光辉科技有限公司 一种曝光定位结构及曝光机

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102187280B (zh) * 2008-10-15 2014-11-12 株式会社尼康 曝光装置及其组装方法、以及器件制造方法
JP5304566B2 (ja) * 2009-09-16 2013-10-02 株式会社安川電機 フェールセーフ機構を備えた基盤搬送装置
JP2011090097A (ja) * 2009-10-21 2011-05-06 Nsk Ltd 近接スキャン露光装置及び近接スキャン露光方法
JP2011134937A (ja) * 2009-11-30 2011-07-07 Nsk Ltd 近接スキャン露光装置及びその制御方法
US20120064461A1 (en) * 2010-09-13 2012-03-15 Nikon Corporation Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
JP5510299B2 (ja) * 2010-12-13 2014-06-04 ウシオ電機株式会社 露光装置および露光方法
JP5533769B2 (ja) * 2011-04-14 2014-06-25 ウシオ電機株式会社 マスクとワークの位置合せ方法
JP6356971B2 (ja) * 2013-01-30 2018-07-11 株式会社ブイ・テクノロジー 近接露光装置、近接露光方法及び照明光学系
CN106444302A (zh) * 2016-11-23 2017-02-22 南京华东电子信息科技股份有限公司 一种可移动式掩模载置台
CN113632203A (zh) 2019-05-31 2021-11-09 极光先进雷射株式会社 激光退火装置和电子器件的制造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62102524A (ja) * 1985-10-29 1987-05-13 Canon Inc マスクチエンジヤ−
JPH10223525A (ja) * 1997-02-10 1998-08-21 Nikon Corp 露光装置のフォーカス制御方法
WO2000059012A1 (fr) * 1999-03-26 2000-10-05 Nikon Corporation Procede et dispositif d'exposition
JP2001166496A (ja) * 1999-12-07 2001-06-22 Nikon Corp 露光方法および露光装置
JP2001215717A (ja) * 2000-02-02 2001-08-10 Nikon Corp 走査露光方法および走査型露光装置
JP2001319871A (ja) * 2000-02-29 2001-11-16 Nikon Corp 露光方法、濃度フィルタの製造方法、及び露光装置
JP2004311896A (ja) * 2003-04-10 2004-11-04 Nikon Corp 露光方法及び装置、デバイス製造方法、並びにマスク
JP2006235533A (ja) * 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP4917780B2 (ja) * 2005-09-08 2012-04-18 住友化学株式会社 露光装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI587430B (zh) * 2010-02-17 2017-06-11 尼康股份有限公司 A conveyance device, a conveying method, an exposure apparatus, and an element manufacturing method
CN112185864A (zh) * 2020-10-13 2021-01-05 常州常耀电子科技有限公司 一种uv灯曝光解胶机
CN117420741A (zh) * 2023-12-19 2024-01-19 深圳市欣光辉科技有限公司 一种曝光定位结构及曝光机
CN117420741B (zh) * 2023-12-19 2024-03-12 深圳市欣光辉科技有限公司 一种曝光定位结构及曝光机

Also Published As

Publication number Publication date
KR20110091013A (ko) 2011-08-10
KR20090128436A (ko) 2009-12-15
WO2008120785A1 (fr) 2008-10-09
KR101111934B1 (ko) 2012-04-06
KR101111933B1 (ko) 2012-04-06

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