WO2008105437A1 - 半導体装置、リードフレームおよび半導体装置の製造方法 - Google Patents

半導体装置、リードフレームおよび半導体装置の製造方法 Download PDF

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Publication number
WO2008105437A1
WO2008105437A1 PCT/JP2008/053353 JP2008053353W WO2008105437A1 WO 2008105437 A1 WO2008105437 A1 WO 2008105437A1 JP 2008053353 W JP2008053353 W JP 2008053353W WO 2008105437 A1 WO2008105437 A1 WO 2008105437A1
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Prior art keywords
semiconductor device
semiconductor chip
leadframe
lead
groove
Prior art date
Application number
PCT/JP2008/053353
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English (en)
French (fr)
Inventor
Yasumasa Kasuya
Motoharu Haga
Shoji Yasunaga
Original Assignee
Rohm Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Rohm Co., Ltd. filed Critical Rohm Co., Ltd.
Priority to US12/528,759 priority Critical patent/US8115299B2/en
Publication of WO2008105437A1 publication Critical patent/WO2008105437A1/ja

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49541Geometry of the lead-frame
    • H01L23/49548Cross section geometry
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/561Batch processing
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    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
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    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
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    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
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    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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    • H01L2924/181Encapsulation
    • H01L2924/183Connection portion, e.g. seal
    • H01L2924/18301Connection portion, e.g. seal being an anchoring portion, i.e. mechanical interlocking between the encapsulation resin and another package part

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Geometry (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Die Bonding (AREA)

Abstract

 ばりに起因する実装不良の発生を防止することができる、半導体装置およびリードフレーム、ならびにそのリードフレームを用いた半導体装置の製造方法を提供する。半導体装置は、半導体チップと、半導体チップの周囲に配置されて、半導体チップの側面と交差する方向に延び、少なくとも半導体チップから遠い側の端部が実装基板に接合されるリードとを備えている。リードには、実装基板に対する接合面および半導体チップから遠い側の端面で開放される溝が、厚さ方向と直交かつ当該端面に沿う幅方向の全幅にわたって形成されている。そして、溝には、半田からなる埋設体が埋設されている。
PCT/JP2008/053353 2007-02-27 2008-02-27 半導体装置、リードフレームおよび半導体装置の製造方法 WO2008105437A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/528,759 US8115299B2 (en) 2007-02-27 2008-02-27 Semiconductor device, lead frame and method of manufacturing semiconductor device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007047394A JP5122835B2 (ja) 2007-02-27 2007-02-27 半導体装置、リードフレームおよび半導体装置の製造方法
JP2007-047394 2007-02-27

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WO2008105437A1 true WO2008105437A1 (ja) 2008-09-04

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US (1) US8115299B2 (ja)
JP (1) JP5122835B2 (ja)
TW (1) TWI421998B (ja)
WO (1) WO2008105437A1 (ja)

Cited By (1)

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US10008472B2 (en) * 2015-06-29 2018-06-26 Stmicroelectronics, Inc. Method for making semiconductor device with sidewall recess and related devices

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CN106067511A (zh) * 2010-03-30 2016-11-02 大日本印刷株式会社 带树脂引线框、半导体装置及其制造方法
JP2012023281A (ja) * 2010-07-16 2012-02-02 Nitto Denko Corp 発光装置の製法
JP2012028694A (ja) * 2010-07-27 2012-02-09 Panasonic Corp 半導体装置
US8513787B2 (en) * 2011-08-16 2013-08-20 Advanced Analogic Technologies, Incorporated Multi-die semiconductor package with one or more embedded die pads
US8841758B2 (en) * 2012-06-29 2014-09-23 Freescale Semiconductor, Inc. Semiconductor device package and method of manufacture
DE102013202551A1 (de) 2013-02-18 2014-08-21 Heraeus Materials Technologies GmbH & Co. KG Verfahren zur Herstellung eines Substrats mit einer Kavität
US20140377915A1 (en) * 2013-06-20 2014-12-25 Infineon Technologies Ag Pre-mold for a magnet semiconductor assembly group and method of producing the same
JP6244147B2 (ja) * 2013-09-18 2017-12-06 エスアイアイ・セミコンダクタ株式会社 半導体装置の製造方法
US9578744B2 (en) * 2014-12-22 2017-02-21 Stmicroelectronics, Inc. Leadframe package with pre-applied filler material
JP6505540B2 (ja) * 2015-07-27 2019-04-24 新光電気工業株式会社 半導体装置及び半導体装置の製造方法
US20170271244A1 (en) * 2016-03-21 2017-09-21 Texas Instruments Incorporated Lead frame with solder sidewalls
JP6603169B2 (ja) * 2016-04-22 2019-11-06 ルネサスエレクトロニクス株式会社 半導体装置の製造方法および半導体装置
JP6864440B2 (ja) * 2016-06-15 2021-04-28 ローム株式会社 半導体装置
US20190252256A1 (en) * 2018-02-14 2019-08-15 Nxp B.V. Non-leaded device singulation
US10810932B2 (en) * 2018-10-02 2020-10-20 Sct Ltd. Molded LED display module and method of making thererof
US11545418B2 (en) * 2018-10-24 2023-01-03 Texas Instruments Incorporated Thermal capacity control for relative temperature-based thermal shutdown
JP7243016B2 (ja) * 2019-01-30 2023-03-22 日清紡マイクロデバイス株式会社 半導体装置およびその製造方法
JP7183964B2 (ja) * 2019-06-11 2022-12-06 株式会社デンソー 半導体装置
CN113748510B (zh) * 2019-06-24 2024-03-08 株式会社村田制作所 电子模块
CN112768413B (zh) * 2019-10-21 2022-08-16 珠海格力电器股份有限公司 一种封装基板及半导体芯片封装结构
CN111180412B (zh) * 2020-01-03 2021-05-04 长电科技(宿迁)有限公司 一种侧边开槽的引线框架及其制造方法

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Cited By (2)

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Publication number Priority date Publication date Assignee Title
US10008472B2 (en) * 2015-06-29 2018-06-26 Stmicroelectronics, Inc. Method for making semiconductor device with sidewall recess and related devices
US10943885B2 (en) 2015-06-29 2021-03-09 Stmicroelectronics, Inc. Method for making semiconductor device with sidewall recess and related devices

Also Published As

Publication number Publication date
JP5122835B2 (ja) 2013-01-16
US8115299B2 (en) 2012-02-14
TWI421998B (zh) 2014-01-01
US20100013069A1 (en) 2010-01-21
TW200845351A (en) 2008-11-16
JP2008211041A (ja) 2008-09-11

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