WO2007140766A2 - Verfahren zum anordnen einer pulverschicht auf einem substrat sowie schichtaufbau mit mindestens einer pulverschicht auf einem substrat - Google Patents
Verfahren zum anordnen einer pulverschicht auf einem substrat sowie schichtaufbau mit mindestens einer pulverschicht auf einem substrat Download PDFInfo
- Publication number
- WO2007140766A2 WO2007140766A2 PCT/DE2007/001012 DE2007001012W WO2007140766A2 WO 2007140766 A2 WO2007140766 A2 WO 2007140766A2 DE 2007001012 W DE2007001012 W DE 2007001012W WO 2007140766 A2 WO2007140766 A2 WO 2007140766A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- powder
- substrate
- layer
- powder layer
- substrate surface
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/02—Electrophoretic coating characterised by the process with inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/12—Electrophoretic coating characterised by the process characterised by the article coated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0041—Processes relating to semiconductor body packages relating to wavelength conversion elements
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
Definitions
- the invention relates to a method for arranging a powder layer on a substrate surface of a substrate.
- a layer structure with at least one powder layer on a substrate surface of a substrate is specified.
- the substrate is, for example, a semiconductor device.
- the semiconductor device is, for example, a conversion LED.
- a conversion LED can have an LED (Light Emitting Diode) on whose surface, which can thus form the abovementioned substrate surface, a converter layer is applied.
- the converter layer has, for example, a ceramic
- a phosphor of the phosphor powder has the task of converting primary electromagnetic radiation emitted by the LED into electromagnetic secondary radiation.
- the converter layer is applied to a semiconductor surface of the semiconductor substrate. But it may be possible that not all LEDs of the semiconductor substrate for
- Conversion LEDs are suitable. From the surface of the converter layer should be easily removable again.
- the object of the present invention is therefore to specify a method for arranging a powder layer on a substrate surface of a substrate, wherein the Powder layer can be easily removed at certain points of the substrate surface.
- a method for arranging a powder layer with a powder on a substrate surface of a substrate with the following method steps: a) providing the substrate with the substrate surface, b) applying a mixture with the powder and an adhesion promoter on the substrate surface, c) Removing the adhesion promoter and d) fixing the powder layer on the substrate surface.
- a novel layer structure is accessible, comprising at least one structured powder layer with powder on a substrate surface of a substrate.
- a novel layer structure can be produced, having at least one structured powder layer with powder on a substrate surface of a substrate.
- a loosely adhering powder layer can be produced on the substrate surface.
- the powder layer can be fixed. Before or after fixing, structuring of the powder layer can take place.
- At least one embodiment of the method can find application in particular in the production of conversion LEDs.
- the powder layer may form a converter layer applied to an LED.
- semiconductor wafers with a variety of LEDs can be used. On certain areas of the surface of the wafer, the converter layer can be selectively generated.
- a basic idea is to first apply the powder layer so that it can be easily removed. This succeeds with the adhesion promoter.
- the primer can be easily removed. After removal of the primer results in low adhesion the powder particles on the substrate surface and adhesion of the powder particles with each other.
- the low adhesion is based for example on weak adhesion and cohesion forces (eg Van der Waals forces). Due to the weak adhesion and Koos ⁇ ons sanction the powder layer can be easily removed again.
- any materials are conceivable that hold the powder to the substrate surface and contribute to the formation of layers.
- the materials are conceivable that hold the powder to the substrate surface and contribute to the formation of layers.
- Adhesive selected from the group consisting of water, organic solvent, inorganic binder and organic binder.
- the organic solvent is, for example, an alcohol, an ester or a ketone.
- these adhesion promoters form, for example, dispersions.
- a binder can be distinguished by the fact that it is networkable and thus leads to stratification. Crosslinking takes place, for example, during curing of the binder.
- the inorganic binder is, for example, water glass (Na 2 SiO 3 or K 2 S 1 O 3 ).
- the organic binder is, for example, an acrylic binder. It is also possible to use mixtures of the abovementioned adhesion promoters.
- the adhesion promoter used is a mixture of water and an alcohol.
- a mixture of organic binder and organic solvent for example an acrylic binder and ketone.
- Solvent only the temperature must be increased and / or an ambient pressure lowered to remove the solvent from the substrate surface. If, on the other hand, an organic binder is used, the temperature is raised so that the binder burns out.
- the binder is chosen so that the temperature at which the binder burns out is adapted to the temperature to which the substrate is stable. For example, in a semiconductor substrate a binder which burns out at relatively low temperature (up to a maximum of 350 ° C). For a glass substrate, care is taken that the binder burns out at a temperature below the softening point of the glass of the substrate.
- a printing method can be performed to apply the mixture.
- the printing method is, for example, a screen printing method.
- the mixture is a printable paste with the powder and an organic binder as adhesion promoter. This paste is printed on the substrate surface of the substrate.
- an electrophoresis method can be performed to apply the mixture.
- the powder particles of the powder are applied to the substrate surface electrophoretically, ie by applying an electric field.
- the application of the electric field takes place, for example, by means of an electrically conductive substrate surface.
- adhesion promoters in the form of polar solvents (for example water and / or alcohol).
- a sedimentation process can be carried out for applying the mixture.
- the substrate is immersed in a container with the mixture of adhesion promoter, for example a solvent, and powder.
- the substrate surface is wetted and / or covered by the mixture. Due to different densities of powder and adhesion promoter, such as the solvent, it comes to sedimentation.
- the powder "sinks" onto the surface of the substrate where it is deposited and, after deposition, removes the coupling agent, for example the solvent, which can be used to obtain a homogeneous layer of powder Sedimentation can be controlled by adjusting the density of the solvent.
- another binder can be applied to the powder layer for fixing.
- the application of the further binder is carried out, for example, by dropping, spraying, stamping and printing.
- the further binder is characterized in that it impregnates the applied powder layer or intercalates into intermediate spaces of the powder layer and fixes the powder layer on the substrate.
- an organic binder can be used, which can be thermally and / or optically cured after application to the powder layer.
- water glass as a further binder.
- a silicone has
- Binder especially proven as a further binder. Therefore, another binder may be a silicone-containing binder or silicone.
- the application of the mixture, the removal of the adhesion promoter and / or the fixing of the powder layer can be carried out regionally, ie structured.
- the mixture can be applied to certain areas of the substrate surface. Preferably, however, certain (desired) areas are removed from the applied, loose and / or poorly adhering powder layer and / or certain areas are fixed. For example, first the mixture is applied over a large area. Subsequently, a large-area, loosely adhering powder layer is produced by removing the adhesion promoter. In the further course, areas of the loosely adhering powder layer are removed. The loosely adhering powder layer is structured.
- the removal of the powder layer is carried out for example by Brushing, scraping or by rinsing with liquids or with gases.
- the remaining on the substrate surface areas of the initially loosely adhering powder layer are fixed.
- an unstructured, loosely adhering powder layer is applied.
- certain areas of the loosely adhering powder layer are fixed.
- a structured, fixed powder layer remains on the substrate surface.
- Masks can be used in the enumerated procedures. The enumerated structuring possibilities can be carried out individually or in combination with one another.
- the powder may consist of any organic or inorganic material.
- Powder a metal powder Preferably, a ceramic powder is used as the powder.
- a powder with a ceramic phosphor is used as the ceramic powder.
- Ceramic phosphors can be used, for example, as described above, in converter layers of conversion LEDs.
- the procedure can be carried out once. This means that a single layer of powder is applied to the substrate surface of the substrate. It is also conceivable that the entire process or individual process steps can be performed several times. As a result, for example, a multilayer powder layer can be produced.
- process steps b) and c) can be carried out repeatedly with different powders so that a multi-layer structure with a plurality of powder layers arranged one above the other can arise with the different powders.
- the process step d) can finally be carried out once. It can thus be a one-time fix all applied, loosely adhering powder layers. It may also be possible that after the process steps b) and c) each fixing a loosely applied Powder layer takes place. It may therefore be possible to carry out process step d) repeatedly in addition to process steps b) and c).
- the substrate any substrate can be used.
- the substrate is a ceramic substrate or a glass substrate.
- a semiconductor substrate can be used as the substrate.
- the semiconductor substrate can only consist of a single semiconductor component. It can be a
- the substrate having a plurality of semiconductor devices.
- the substrate may comprise a wafer or be a wafer.
- the loosely adhering powder layer can be applied over a large area.
- the fixing of the loosely adhering powder layer can be carried out before or after the separation of the wafer into individual semiconductor components. If the fixing is carried out only after the singulation, it may be necessary or possibly necessary to ensure sufficient adhesive strength of the loosely adhering powder layer for singulating (for example by sawing).
- the powder layer can be applied loosely and thus easily removable again on the substrate surface of the substrate.
- This may be particularly advantageous in connection with conversion LEDs:
- a removal of the converter layer from the LED surface would have to be carried out by thermal burning out of a binder of the converter layer.
- the binders used with suitable optical Properties eg sufficient stability against the electromagnetic primary radiation Radiation, possibly burn out only at very high temperatures, and the LEDs, in contrast, for example, are stable only up to a maximum of 400 ° C.
- a powder layer can be structured on a substrate surface of a substrate. This is particularly advantageous in the context of processing whole wafers. In the manufacturing process, the available resources can be optimally utilized.
- At least one embodiment of the method can be particularly advantageous in the application of converter layers to LEDs:
- a thickness of the powder layer can be changed very easily by the described method, for example by repeated application of powder layers or by subsequent thinning of the loosely adhering powder layer.
- a color location (emission wavelength) of the conversion LED can be set.
- Figure 1 is a schematic representation of a layer structure according to an embodiment
- Figures 2A to 2E is a schematic representation of a
- Figures 3A and 3B are schematic representations of individual
- Embodiments, and Figures 4A to 4E is a schematic representation of a
- Figure 1 shows a layer structure consisting of a substrate 1, on the substrate surface 11, a powder layer 2 is applied.
- the substrate is an LED.
- the powder layer is a converter layer with a ceramic phosphor.
- Substrate surface 11 of the substrate 1 is printed or geräkelt ( Figure 2A). Subsequently, the binder 22 is cured. The result is a sufficiently firmly adhering powder layer, the mechanical stresses of any subsequent operations (such as singling) withstands.
- the paste 20 shown in FIG. 2A can also be patterned, ie, applied in regions, as described in the general part, as shown in FIG. 3A.
- the further process steps can then be as in the preceding Embodiment be performed.
- a singling of the substrate 1 into individual LEDs 10 can take place, for example, after the fixing of the structured powder layer 2 (not shown).
- the unstructured, loosely adhering powder layer 2 can be structured in regions by dropping a further binder 23.
- a mask 4 can be used.
- the regions of the powder layer 2 which are not fixed with the further binder 23 can be removed as described in the general part after application of the further binder 25. Alternatively, these areas of the powder layer 2 can also be removed before the further binder 23 is applied.
- FIGS. 4A to 4E show an exemplary embodiment of a method for producing a layer structure having a multilayer structure of powder layers.
- a mixture with a powder 21 and a bonding agent 22 is applied to a substrate surface 11 (FIG. 4A).
- a loose powder layer 2 is produced (FIG. 4B).
- a mixture 24 with a further powder 25 and a further bonding agent 26 is applied ( Figure 4C).
- the further powder 25 and the further bonding agent 26 may in each case be the same or different from the powder 21 and the adhesion promoter 22.
- a further loose powder layer 5 is produced on the powder layer 2.
- a further binder 23 is applied to the multilayer structure with the multilayer structure of two powder layers 2, 5 as shown in the exemplary embodiment, by means of which the multilayer structure is fixed (FIG. 4E).
- a fixing by applying the further binder 23 respectively take place after applying the loose powder layers 2 and 5 respectively.
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- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
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Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/303,928 US8202747B2 (en) | 2006-06-07 | 2007-06-06 | Method for arranging a powder layer on a substrate and layer structure with at least one powder layer on a substrate |
JP2009513545A JP2009540551A (ja) | 2006-06-07 | 2007-06-06 | 粉末層を基板上に配置する方法並びに少なくとも1つの粉末層を基板上に有する層構造体 |
CN200780020781.9A CN101460661B (zh) | 2006-06-07 | 2007-06-06 | 在基材上布置粉末层的方法以及在基材上具有至少一个粉末层的层结构 |
EP07722519A EP2016208A2 (de) | 2006-06-07 | 2007-06-06 | Verfahren zum anordnen einer pulverschicht auf einem substrat sowie schichtaufbau mit mindestens einer pulverschicht auf einem substrat |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006026481.9 | 2006-06-07 | ||
DE102006026481A DE102006026481A1 (de) | 2006-06-07 | 2006-06-07 | Verfahren zum Anordnen einer Pulverschicht auf einem Substrat sowie Schichtaufbau mit mindestens einer Pulverschicht auf einem Substrat |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2007140766A2 true WO2007140766A2 (de) | 2007-12-13 |
WO2007140766A3 WO2007140766A3 (de) | 2008-11-13 |
WO2007140766A9 WO2007140766A9 (de) | 2009-04-16 |
Family
ID=38663670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2007/001012 WO2007140766A2 (de) | 2006-06-07 | 2007-06-06 | Verfahren zum anordnen einer pulverschicht auf einem substrat sowie schichtaufbau mit mindestens einer pulverschicht auf einem substrat |
Country Status (8)
Country | Link |
---|---|
US (1) | US8202747B2 (de) |
EP (1) | EP2016208A2 (de) |
JP (1) | JP2009540551A (de) |
KR (1) | KR20090028611A (de) |
CN (1) | CN101460661B (de) |
DE (1) | DE102006026481A1 (de) |
TW (1) | TWI385818B (de) |
WO (1) | WO2007140766A2 (de) |
Cited By (2)
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US8482191B2 (en) | 2008-08-11 | 2013-07-09 | Osram Gesellschaft Mit Beschraenkter Haftung | Conversion LED |
US8946983B2 (en) | 2011-06-16 | 2015-02-03 | Toray Industries, Inc. | Phosphor-containing sheet, LED light emitting device using the same, and method for manufacturing LED |
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DE102008054029A1 (de) * | 2008-10-30 | 2010-05-06 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauteil |
DE102008054219A1 (de) | 2008-10-31 | 2010-05-06 | Osram Opto Semiconductors Gmbh | Organisches strahlungsemittierendes Bauelement und Verfahren zur Herstellung eines organischen strahlungsemittierenden Bauelements |
JP5486688B2 (ja) * | 2010-09-15 | 2014-05-07 | ライタイザー コリア カンパニー リミテッド | 発光ダイオード及びその製造方法 |
KR101053111B1 (ko) * | 2011-02-28 | 2011-08-01 | 박건 | 실리콘 기판을 이용한 질화물계 발광소자 및 그 제조 방법 |
JP5110229B1 (ja) * | 2011-06-07 | 2012-12-26 | 東レ株式会社 | 樹脂シート積層体、その製造方法およびそれを用いた蛍光体含有樹脂シート付きledチップの製造方法 |
US8916409B2 (en) * | 2011-10-18 | 2014-12-23 | International Business Machines Corporation | Photovoltaic device using nano-spheres for textured electrodes |
DE102012207854A1 (de) * | 2012-05-11 | 2013-11-14 | Osram Opto Semiconductors Gmbh | Optoelektronisches bauelement undverfahren zum herstellen eines optoelektronischen bauelements |
DE102012208932A1 (de) | 2012-05-29 | 2013-12-05 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines Bauelementes und Vorrichtung zum Herstellen eines Bauelementes |
DE102013102482A1 (de) * | 2013-03-12 | 2014-10-02 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements |
DE102013207226A1 (de) * | 2013-04-22 | 2014-10-23 | Osram Opto Semiconductors Gmbh | Herstellung eines Schichtelements für einen optoelektronischen Halbleiterchip |
CN103280509A (zh) * | 2013-05-24 | 2013-09-04 | 北京半导体照明科技促进中心 | 粉料涂覆方法和使用其进行led 荧光粉涂覆的方法 |
EP2860231A1 (de) * | 2013-10-08 | 2015-04-15 | Siemens Aktiengesellschaft | Verfahren zur Herstellung einer dünnen Lotschicht |
DE102015004570A1 (de) * | 2014-08-05 | 2016-02-11 | Miranda Fateri | Additive Manufacturing Verfahren und Vorrichtung zur Durchführung des Additive Manufacturing Verfahrens |
JP6387954B2 (ja) | 2015-12-24 | 2018-09-12 | 日亜化学工業株式会社 | 波長変換部材を用いた発光装置の製造方法 |
WO2018095816A1 (en) * | 2016-11-22 | 2018-05-31 | Osram Opto Semiconductors Gmbh | Method for producing at least one optoelectronic semiconductor component and optoelectronic semiconductor component |
DE102017208220A1 (de) * | 2017-05-16 | 2018-11-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Herstellen eines Trockenfilms sowie Trockenfilm und mit dem Trockenfilm beschichtetes Substrat |
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- 2007-06-06 CN CN200780020781.9A patent/CN101460661B/zh not_active Expired - Fee Related
- 2007-06-06 WO PCT/DE2007/001012 patent/WO2007140766A2/de active Application Filing
- 2007-06-06 KR KR1020097000168A patent/KR20090028611A/ko not_active Application Discontinuation
- 2007-06-06 JP JP2009513545A patent/JP2009540551A/ja active Pending
- 2007-06-06 EP EP07722519A patent/EP2016208A2/de not_active Withdrawn
- 2007-06-06 US US12/303,928 patent/US8202747B2/en active Active
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US8482191B2 (en) | 2008-08-11 | 2013-07-09 | Osram Gesellschaft Mit Beschraenkter Haftung | Conversion LED |
US8946983B2 (en) | 2011-06-16 | 2015-02-03 | Toray Industries, Inc. | Phosphor-containing sheet, LED light emitting device using the same, and method for manufacturing LED |
Also Published As
Publication number | Publication date |
---|---|
CN101460661A (zh) | 2009-06-17 |
KR20090028611A (ko) | 2009-03-18 |
TW200810154A (en) | 2008-02-16 |
CN101460661B (zh) | 2016-10-26 |
JP2009540551A (ja) | 2009-11-19 |
DE102006026481A1 (de) | 2007-12-13 |
TWI385818B (zh) | 2013-02-11 |
WO2007140766A3 (de) | 2008-11-13 |
EP2016208A2 (de) | 2009-01-21 |
WO2007140766A9 (de) | 2009-04-16 |
US8202747B2 (en) | 2012-06-19 |
US20100224893A1 (en) | 2010-09-09 |
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