WO2007108186A1 - Liquide de traitement de nettoyage - Google Patents

Liquide de traitement de nettoyage Download PDF

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Publication number
WO2007108186A1
WO2007108186A1 PCT/JP2006/324768 JP2006324768W WO2007108186A1 WO 2007108186 A1 WO2007108186 A1 WO 2007108186A1 JP 2006324768 W JP2006324768 W JP 2006324768W WO 2007108186 A1 WO2007108186 A1 WO 2007108186A1
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WO
WIPO (PCT)
Prior art keywords
surfactant
cleaning
photosensitive layer
cleaning treatment
substrate
Prior art date
Application number
PCT/JP2006/324768
Other languages
English (en)
Japanese (ja)
Inventor
Toshiyuki Masuda
Mitsutoshi Tanaka
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Priority to CN2006800539449A priority Critical patent/CN101400775B/zh
Publication of WO2007108186A1 publication Critical patent/WO2007108186A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/38—Cationic compounds
    • C11D1/65—Mixtures of anionic with cationic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/72—Ethers of polyoxyalkylene glycols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/0325—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose

Definitions

  • the present invention relates to a cleaning treatment liquid, a method for forming a colored image using the same, a method for producing a color filter, and a method for producing an array substrate with a color filter.
  • color filters have been widely used in liquid crystal display devices, sensors, color separation devices, and the like.
  • a method for producing this color filter a method of patterning a dyeable resin (for example, natural gelatin or casein) and dyeing the resin with a dye to form a pixel has been adopted.
  • the pixel formed by the above method has a problem that heat resistance and light resistance are inferior due to restrictions on the material.
  • the polyoxyethylene nonyl phenyl ether has an endocrine disrupting action on fish and is a subject of endocrine regulation, so that it cannot be used due to environmental problems.
  • cleaning treatment liquids using a surfactant disclosed in Patent Document 1 and Patent Document 2 have been proposed.
  • This cleaning agent has solved not only environmental problems but also problems such as development residue.
  • the construction of the color filter production line has changed with the increase in size of the substrate, etc., and the time for empty showering of the cleaning device (spraying only the shower and the substrate does not flow) has become longer. Degradation has become a problem.
  • Patent Document 1 Japanese Unexamined Patent Publication No. 2003-336097
  • Patent Document 2 JP-A-2005-146171
  • An object of the present invention is to solve the conventional problems and achieve the following objects. That is, the present invention is excellent in cleaning and removal of stains such as development residues, has no environmental problems, does not deteriorate even in an empty shower operation, and a colored image forming method using the cleaning processing liquid, It is an object to provide a method for producing a color filter and a method for producing an array substrate with a color filter.
  • ⁇ 1> a basic compound and at least one surfactant selected from an acetylene surfactant containing at least one hydroxyl group, an alkyl ether surfactant, and a phenoxyalkylene surfactant;
  • the basic compound is sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium phosphate, potassium phosphate, sodium pyrophosphate, potassium pyrophosphate, potassium carbonate, metasilicic acid.
  • the cleaning solution according to the above item 1> which is at least one kind of inorganic alkaline compound in which sodium and potassium metasilicate are also selected.
  • ⁇ 3> The cleaning liquid according to any one of ⁇ 1> to ⁇ 2>, wherein the content of the basic compound in the cleaning liquid is 0.01 to 50% by mass.
  • acetylene surfactant is an acetylenic diol surfactant.
  • ⁇ 5> The cleaning treatment solution according to any one of 1> to 4>, wherein the phenoxyalkylene surfactant is represented by the following structural formula (1):
  • Ph--- 0- ( "CH CH 2 - .. 0 structural formula (1) where the structural formula (1), Ph represents R is a full group, represents n is a hydrogen atom or an alkyl group Represents an integer of 1 or more.
  • R represents an alkyl group
  • R is a hydrogen atom or an alkyl group
  • M represents Na, K or H.
  • ⁇ 7> The cleaning treatment liquid according to any one of ⁇ 1> to ⁇ 6>, wherein the cleaning treatment liquid is applied to an object to be treated under a pressurized condition.
  • ⁇ 12> a photosensitive layer forming step of forming on the substrate a photosensitive layer capable of alkali development;
  • a colored image comprising at least an exposure and development step for exposing and developing a layer, and a cleaning treatment step for performing a washing treatment using the washing treatment liquid according to any one of the above ⁇ 1> Karaku 11> It is the formation method.
  • the photosensitive layer is formed of a transfer material containing at least a resin having an acid value of 20 to 300, a pigment, a monomer containing a photopolymerizable unsaturated bond, and a photopolymerization initiator. This is a colored image forming method.
  • ⁇ 14> Forming a plurality of colored images on the same substrate, including at least a photosensitive layer forming step for forming an alkali developable photosensitive layer on the substrate, and an exposure and developing step for exposing and developing the photosensitive layer.
  • a method for producing a color filter, further comprising a washing treatment step of washing with the washing treatment liquid according to any one of ⁇ 1> to 11 above. is there.
  • a photosensitive layer forming step of forming an alkali-developable photosensitive layer on the TFT array substrate, and an exposure and developing step of exposing and developing the photosensitive layer, and a plurality of colored images on the same TFT array substrate A method for producing an array substrate with a color filter that forms a color filter, comprising a cleaning process step of cleaning using the cleaning process liquid according to any one of the above items 1> Karaku 11> This is a method of manufacturing an attached array substrate.
  • the cleaning treatment liquid of the present invention is selected from a basic compound, an acetylene surfactant containing at least one hydroxyl group, an alkyl ether surfactant, and a phenoxyalkylene surfactant. It contains at least one surfactant and a naphthalene surfactant.
  • a colored image can be formed without deterioration even in an empty shower operation that is excellent in cleaning and removing dirt such as development residues and has no environmental problems.
  • the colored image forming method of the present invention includes at least a photosensitive layer forming step, an exposure and development step, and a washing treatment step.
  • a photosensitive layer capable of alkali development is formed on a substrate in the photosensitive layer forming step, and the photosensitive layer is exposed and developed in the exposure and development steps.
  • the cleaning process Wash with a bright cleaning solution.
  • a colored image can be formed without deterioration even in an empty shower operation that is excellent in cleaning and removing dirt such as development residues and has no environmental problems.
  • a conventional cleaning treatment solution that can solve various problems in the prior art, is excellent in cleaning removal of dirt such as development residues, has no environmental problems, and does not deteriorate even in an empty shower operation, It is possible to provide a colored image forming method, a color filter manufacturing method, and a method of manufacturing an array substrate with a color filter.
  • the cleaning treatment liquid of the present invention comprises at least one selected from a basic compound, an acetylene surfactant containing at least one hydroxyl group, an alkyl ether surfactant, and a phenoxyalkylene surfactant. It contains a surfactant and a naphthalene surfactant, and further contains other components as necessary.
  • the basic compound is not particularly limited as long as it exhibits basicity, and can be appropriately selected according to the purpose. Examples thereof include inorganic alkali compounds and organic alkali compounds.
  • Examples of the inorganic alkaline compound include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium phosphate, potassium phosphate, sodium pyrophosphate, potassium pyrophosphate, potassium carbonate, Examples thereof include sodium silicate such as sodium metasilicate, potassium metasilicate, and the like, and potassium hydroxide, potassium carbonate, and the like. These inorganic alkali compounds may be used alone or in combination of two or more.
  • organic alkali compound examples include triethanolamine, diethanolamine, butyramine, phenol hydrazine, tetramethyl ammonium hydroxide, and the like. These organic alkali compounds may be used alone or in combination of two or more.
  • inorganic alkaline compounds are preferred from the viewpoint of handleability such as no odor.
  • the basic compound it is preferable to use a salt of a weak acid from the viewpoint of not damaging the pixels when the cleaning treatment of the present invention and a brush are used at the same time.
  • carbonates and / or phosphates are preferably used as the weak acid salts.
  • Examples of the carbonate and / or phosphate include sodium carbonate, sodium hydrogen carbonate, potassium carbonate, potassium hydrogen carbonate, sodium phosphate, sodium hydrogen phosphate, sodium hydrogen phosphate, potassium phosphate, hydrogen phosphate.
  • Examples include potassium, potassium phosphate-hydrogen hydrogen, sodium pyrophosphate, potassium pyrophosphate, and hydrated salts thereof. These may be used alone, for example, sodium carbonate and sodium bicarbonate, potassium carbonate and potassium bicarbonate, sodium phosphate and sodium phosphate, potassium phosphate and hydrogen phosphate In addition, it is preferable to combine those having an approximate number of substitutions of hydrogen as an acid with metal in an equimolar ratio or a ratio close to this in order to suppress pH change. From the viewpoint of waste liquid treatment, carbonate is most preferable.
  • the carbonate and / or phosphate of the present invention is described in the form of a salt added as a raw material. Needless to say, in the actual cleaning liquid of the present invention, some of these salts are present in a dissociated state. No.
  • the content of the basic compound in the cleaning treatment liquid is preferably 0.01 to 50% by mass, more preferably 0.01 to 20% by mass, and still more preferably 0.05 to 15% by mass. It is particularly preferably 0.1 to 10% by mass. If the content is less than 0.01% by mass, the resolution may be insufficient, and if it exceeds 50% by mass, the photoresist itself may peel off the substrate.
  • the phenoxyalkylene surfactant is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include those having a structure represented by the following structural formula (1).
  • R represents a hydrogen atom or an alkyl group.
  • alkyl group examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert butyl group, a pentyl group, a neopentyl group, and a hexyl group.
  • the ru group is preferred.
  • n represents an integer of 1 or more, preferably 1 to 50.
  • phenoxyalkylene surfactants represented by the structural formula (1) the phenoxyoxyalkylene surfactant described in [0021] Koki et al. [0037] of JP-A-2005-146171. It is preferable to use a surfactant.
  • the content of the phenoxyalkylene surfactant in the cleaning treatment liquid is preferably 0.01 to 50% by mass, more preferably 0.05 to 10% by mass.
  • the resolution may be insufficient, and when it exceeds 50% by mass, the storage stability of the liquid is deteriorated.
  • the use of the phenoxyalkylene surfactant as a main component enables removal of development residues and the like more efficiently. Is preferable.
  • the acetylene surfactant containing at least one hydroxyl group can be appropriately selected depending on the purpose without particular limitation.
  • acetylene glycol surfactant for example, the acetylene glycol surfactant described in [0042] to [0045] of JP-A-2005-146171 is preferable.
  • the content of the acetylene surfactant containing at least one hydroxyl group in the cleaning treatment liquid is preferably 0.01 to 50% by mass, more preferably 0.05 to 5% by mass.
  • the content is less than 0.01% by mass, the resolution may be insufficient.
  • the content exceeds 50% by mass, the storage stability of the liquid may be deteriorated.
  • the acetylene surfactant containing at least one hydroxyl group is combined with another surfactant.
  • development residues and the like can be efficiently removed even with a low content.
  • using the phenoxyalkylene surfactant as a main component and the acetylene surfactant containing at least one hydroxyl group is used in combination. It is preferable in that it can remove development residues more efficiently.
  • the alkyl ether surfactant used in the cleaning solution of the present invention is not particularly limited.
  • JP 2005-1461 A can be selected as appropriate according to the purpose.
  • Alkyl ether surfactants described in JP-A No. 71 [0050] to [0053] are preferred.
  • the content of the alkyl ether surfactant in the cleaning treatment liquid is not particularly limited and may be appropriately selected depending on the purpose, and is preferably 0 to 5% by mass.
  • polycarboxylic acid type polymer surfactants polyon acid type dispersants such as polysulfonic acid type polymer surfactants; polyoxyethylene / polyoxypropylene block polymers, etc.
  • a non-one dispersant or the like can be added.
  • naphthalene-based surfactant can be appropriately selected according to the purpose without any particular restriction, and examples thereof include those having a structure represented by the following structural formula (2).
  • R represents an alkyl group
  • R is a hydrogen atom or an alkyl group
  • M represents Na, K or H.
  • M is preferably Na or K from the viewpoint of water solubility.
  • -SO M is in position 1 or 2
  • the position 2 is preferred from the viewpoint of residue removal.
  • R represents an alkyl group. From the viewpoint of residue removal, a butyl group or a propyl group is preferred. R represents a hydrogen atom or an alkyl group. From the standpoint of residue removal, R is a butyl group. Or prefer propyl group U.
  • the content of the naphthalene surfactant in the cleaning liquid is preferably 0.01 to 50% by mass, more preferably 0.05 to 10% by mass.
  • the resolution may be insufficient, and when it exceeds 50% by mass, the storage stability of the liquid is deteriorated.
  • At least one surfactant selected from the group consisting of an acetylene surfactant containing at least one hydroxyl group, an alkyl ether surfactant, and a phenoxyalkylene surfactant is used.
  • the content of the cleaning treatment liquid containing at least one kind and containing a naphthalene surfactant is preferably 0.01 to 50% by mass, more preferably 0.01 to 20% by mass. More preferably, it is 05-15 mass%.
  • the following are preferably added to the cleaning agent of the present invention for the purpose of storage stability of the liquid, prevention of alteration during processing, and prevention of reattachment of residues.
  • Chelating agents (EDTA-sodium salt, EDTA tetrasodium salt, EGTA, 0.5 1 to 0. 5 mass 0/0), a polymer (poly Bulle pyrrolidone, methylcellulose hydroxypropyl methyl cellulose, gelatin, Agarosu, 0. 1 0.5 wt%), antifoaming agent (manufactured by Shin-Etsu chemical Siri corn oil KS- 502 Kusumoto chemicals OX- 66 OX- 715 OX- 1930N 1934 Maruzen pharmaceutical chemistry en Chicks # 100 0.1 01-0. 1 mass 0/0 )
  • the cleaning treatment liquid of the present invention is used by being applied to an object to be processed, and is preferably used by being applied to an object to be processed under a pressure condition. Therefore, it is extremely excellent in cleaning and removing dirt.
  • the object to be processed has a configuration in which a photosensitive layer is provided on a substrate, in particular, a case in which the target object has a configuration in which a photosensitive layer, an oxygen blocking layer, and the like are sequentially stacked on the substrate. In this case, a development residue or the like is likely to occur on the substrate or the photosensitive layer surface.
  • the cleaning solution of the present invention preferably by applying under pressure conditions, development residues and the like in the substrate and the photosensitive layer can be efficiently removed, surface smoothness, edge shape is good, and resolution is improved. High V and colored images can be formed.
  • the photosensitive layer and the oxygen blocking layer will be described in detail in the colored image forming method of the present invention.
  • the cleaning treatment solution of the present invention is preferably used after diluting it 5 to 1,000 times with a diluent, and more preferably 10 to 200 times.
  • the diluting solution can be appropriately selected according to the purpose without any particular limitation.
  • tap water, water, pure water, distilled water, various organic solvents, a mixed solvent of water and various organic solvents, Etc. are used.
  • the colored image forming method of the present invention includes a photosensitive layer forming process, an exposure process and a developing process, and further includes a cleaning process, and includes other processes as necessary.
  • the cleaning treatment step may be provided before or after the photosensitive layer forming step, or may be provided before or after the exposure and development steps.
  • the purpose is to clean the substrate, it is preferably provided before the photosensitive layer forming step, and when the purpose is to remove the development residue, after the exposure and image forming steps. Preferably it is provided.
  • the photosensitive layer formed in the photosensitive layer forming step can be alkali-developable and is preferably formed from the colored image forming material described below.
  • the colored image-forming material is alkali-developable and has photosensitivity! / If there is no particular limitation, it is not limited, but it is a resin, a colorant such as a pigment 'dye, a monomer containing a photopolymerizable unsaturated bond, And it is preferable to contain a photoinitiator and other components.
  • JP-A-2005-146171 describes in [0064] to [0099].
  • JP-A-2 005-146171, [0100] to [0121] describe a method for forming a photosensitive layer, a method for preparing a coating solution for a photosensitive layer, a thermoplastic resin layer, an oxygen barrier layer, and others. .
  • the exposure of the photosensitive layer formed on the substrate can be suitably performed by a method of irradiating the photosensitive layer with an actinic ray in an image-like manner.
  • the film can be cured.
  • an oxygen blocking film such as polyvinyl alcohol may be formed on the surface of the film with a thickness of 0.5 to 30 m, and the exposure may be performed thereon.
  • the active light source include carbon arc lamps, ultrahigh pressure mercury lamps, high pressure mercury lamps, xenon lamps, metal halide lamps, fluorescent lamps, tungsten lamps, and visible light lasers. Using these light sources, actinic rays are irradiated in the form of an image by pattern exposure through a photomask or direct drawing by scanning.
  • the developer can be appropriately selected according to the purpose without any particular limitation. For example, all known developers that are usually used for developing a photosensitive layer and the like are preferably used.
  • a colored image pattern of a cured film corresponding to an image can be obtained by removing the unexposed portion by a method of spraying a developer or immersing in a developer.
  • a heating time in which a temperature of 60 to 280 ° C is preferable is more preferably about 1 to 60 minutes.
  • the washing treatment solution of the present invention is used, and preferably the substrate, the photosensitive layer, the colored image, etc. are washed under pressure.
  • the dirt can be easily removed and removed.
  • the cleaning treatment liquid of the present invention is used in the cleaning treatment step, preferably under pressurized conditions.
  • pressurizing conditions, pressurizing means, and the like are the same as those described in the section "Cleaning treatment liquid" of the present invention.
  • the method for producing a color filter of the present invention includes a photosensitive layer forming step, an exposure and image forming step, and further includes a cleaning treatment step.
  • the formation of the photosensitive layer, exposure 'development, and washing treatment are the same as in the colored image forming method of the present invention.
  • a method for forming red, green, and blue colored images on a black matrix formed by chromium vapor deposition or the like in the same manner as the colored image forming method of the present invention, and a black colored image forming material After forming a black matrix using, a method for forming red, green, and blue colored images in the same manner as the colored image forming method of the present invention, as in the colored image forming method of the present invention. Examples thereof include a method of forming a black matrix using a black image forming material in the gap between these colored images after forming red, green and blue colored images.
  • the order in which the colored images of red, green and blue are formed is not particularly limited. Further, it may be used for manufacturing a color filter having transparent pixels W in addition to colored pixels such as RGB.
  • the method for producing an array substrate with a color filter of the present invention comprises a photosensitive layer forming step of forming a predetermined photosensitive layer on a TFT (thin film transistor) active matrix substrate (TFT array substrate), and an exposure and development step. In addition, it has a cleaning process.
  • TFT active matrix substrate a conventional one without particular limitation can be used without limitation.
  • a gate signal line and an additional capacitance electrode are formed on an active matrix substrate (array substrate), and gate insulation is formed thereon.
  • a semiconductor layer and a channel protective layer are formed, and an n + Si layer that becomes a TFT source and drain is formed, and then a metal layer and an ITO film are formed by a sputtering method. By patterning, a drain signal line and a source signal line can be formed.
  • the method for producing an array substrate with a color filter of the present invention can be preferably carried out according to, for example, the description in JP-A-10-206888.
  • the TFT active matrix substrate is formed of an amorphous silicon, a low-temperature polysilicon substrate, or a continuous-grain silicon substrate. I like it.
  • the color filter of the array substrate with a color filter may have transparent pixels W in addition to colored pixels such as RGB, or only black or only one spacer may be formed. Further, a transparent interlayer insulating film having a contact hole may be formed.
  • a brush in the cleaning process from the viewpoint of not scratching the TFT, but in that case, a residue may be a problem even with a transparent resin not containing a pigment.
  • the present invention is also preferably used in that case.
  • the composition of K pigment dispersion 1 was as follows.
  • Carbon black (trade name: Nipex35, manufactured by Degussa Japan Co., Ltd.) 13.1 parts, dispersant (compound 1 below) 0.65 parts
  • composition of the binder 2 was as follows.
  • composition of DPHA solution is
  • Surfactant 1 0.07 Colored photosensitive resin composition
  • R101 is the first to remove the amount of R pigment dispersion 1, R pigment dispersion 2, propylene glycol monomethyl ether acetate in the amounts shown in Table 2, and the temperature is 24 °. Mix at C ( ⁇ 2 ° C) and stir at 150 RPM for 10 minutes, then the amount of methyl ethyl ketone, binder 1, DPHA solution, 2 trichloromethyl-5- (p-styrylstyryl) -1, 3 , 4-Oxadiazole, 2, 4 Bis (trichloromethyl) 6— [4,1 (N, N-bisethoxycarboromethylamino) -3, -bromophenol] — s Triazine and phenolothiazine are weighed and Add in this order at 24 ° C ( ⁇ 2 ° C) and stir at 150 RPM for 30 minutes.Further remove the amount of Surfactant 1 listed in Table 2 to a temperature of 24 ° C (
  • additive 1 was a phosphate ester special activator (Takamoto Kasei Co., Ltd., trade name: HIPLAAD ED152).
  • composition of R pigment dispersion 1 was as follows.
  • composition of R pigment dispersion 2 was as follows.
  • Colored photosensitive resin composition G101 is prepared by first removing G pigment dispersion 1, Y pigment dispersion 1, and propylene glycol monomethyl ether acetate in the amounts shown in Table 3 at a temperature of 24. Mix at ° C ( ⁇ 2 ° C) and stir at 150 RPM for 10 minutes, then the amount of methyl ethyl ketone, cyclohexanone, binder 2, DPHA solution, 2 trichloromethyl mono 5- (p-styryl styryl) listed in Table 3 ) -1, 3, 4 Oxadiazole, 2, 4 Bis (trichloromethyl) 6 — [4, — (N, N bisethoxycarboromethylamino) —3, -bromophenol] — s— Triazine and phenothiazine Then, add it in this order at a temperature of 24 ° C ( ⁇ 2 ° C), stir for 150R PM for 30 minutes, and then force off the amount of surfactant 1 listed in Table 4 to
  • G pigment dispersion 1 “trade name: GT 2” manufactured by Fuji Film Elect Kokuku Materials Co., Ltd. was used.
  • Y pigment dispersion 1 “trade name: CF Yellow EX3393” manufactured by Mikuni Color Co., Ltd. was used.
  • Colored photosensitive resin composition B101 is prepared by first removing B pigment dispersion 1, B pigment dispersion 2, and propylene glycol monomethyl ether acetate in the amounts shown in Table 4 at a temperature of 24 ° C ( ⁇ 2 ° C) and stirred at 150 RPM for 10 minutes, then the amounts of methyl ethyl ketone, binder 3, DPHA solution, 2 trichloromethyl-5- (p-styrylstyryl)-1, 3, 4 —Oxadiazole, 2, 4 Bis (trichloromethyl) 6— [4,1- (N, N-bisethoxycarboromethylamino) -3, -bromophenol] — s Triazine and phenothiazine, temperature 25 ° C ( ⁇ 2 ° C) was added in this order, and stirred at a temperature of 40 ° C ( ⁇ 2 ° C) for 1 50 RPM for 30 minutes, and then the amount of surfactant 1 listed in Table 4 was applied. It is
  • B pigment dispersion 1 “trade name: CF Blue EX3357” manufactured by Mikuni Color Co., Ltd. was used.
  • B pigment dispersion 2 “trade name: CF Blue EX3383” manufactured by Mikuni Color Co., Ltd. was used.
  • the composition of binder 3 is
  • the photosensitive resin composition s is a transparent material for forming an interlayer insulating film on an active matrix substrate.
  • Comparison liquid 1 Comparison liquid 2 Comparison liquid 3 Comparison liquid 4 Comparison liquid 5 Comparison liquid 6
  • thermoplastic resin layer having the following formulation HI On a 75 ⁇ m-thick polyethylene terephthalate film temporary support, using a slit nozzle, a coating solution for a thermoplastic resin layer having the following formulation HI was applied and dried. Next, an intermediate layer coating solution having the following formulation P1 was applied and dried. Further, the colored photosensitive resin composition K1 is applied and dried, and a thermoplastic resin layer having a dry film thickness of 14. on the temporary support, an intermediate layer having a dry film thickness of 1. and a dry layer are dried. A photosensitive resin layer with a thickness of 2. was provided and a protective film (12 m thick polypropylene film) was pressure-bonded.
  • a photosensitive resin transfer material comprising a temporary support, a thermoplastic resin layer, an intermediate layer (oxygen barrier film), and a photosensitive resin layer of black (K) is produced, and the sample name is photosensitive. It was named as a natural oil transfer material K1.
  • Coating liquid for thermoplastic resin layer Formulation HI
  • the colored photosensitive resin composition K1 used in the production of the photosensitive resin transfer material K1 is used as the colored photosensitive resin composition R101, G101, B101, and the photosensitive resin.
  • the composition S was changed to the photosensitive resin transfer material R101,
  • G101, B101, and S were prepared.
  • the substrate After removing the protective film of the photosensitive resin transfer material K1, the substrate heated to 100 ° C using a laminator (manufactured by Hitachi Industries, Ltd. (Lamic II type)), rubber roller temperature 130 ° C, wire Lamination was performed at a pressure of 100 NZcm and a conveyance speed of 2. 2 mZ.
  • a laminator manufactured by Hitachi Industries, Ltd. (Lamic II type)
  • wire Lamination was performed at a pressure of 100 NZcm and a conveyance speed of 2. 2 mZ.
  • the substrate and mask (quartz exposure mask with image pattern) are used with a proximity type exposure machine (manufactured by Dainippon Kaken Co., Ltd.) with an ultra-high pressure mercury lamp. ) was set vertically, the distance between the exposure mask surface and the thermoplastic resin layer was set to 200 ⁇ m, and pattern exposure was performed with an exposure amount of 70 mjZcm2.
  • triethanol amine developing solution triethanolamine ⁇ Min 30 mass 0/0 containing, trade name: T - PD2, manufactured by Fuji Photo Film Co., 12 times with pure water (T-PD2 1
  • T-PD2 1 The solution obtained by diluting 11 parts by mass of pure water with 11 parts by mass) was developed with shower at 30 ° C. for 50 seconds and a flat nozzle pressure of 0.04 MPa to remove the thermoplastic resin layer and the intermediate layer.
  • the air was blown off to drain the liquid, and then pure water was sprayed for 10 seconds in a shower, washed with a pure water shutter, and air was blown to reduce the liquid pool on the substrate.
  • the cleaning solution of the present invention described in Table 6 was diluted 10-fold with pure water, sprayed in a shower at 33 ° C for 20 seconds and a cone type nozzle pressure of 0.02 MPa, and further formed with a rotating brush having nylon bristles.
  • the image was rubbed to remove the residue, and a black (K) image was obtained.
  • the substrate was subjected to heat treatment at 220 ° C. for 15 minutes after post-exposure with an exposure amount of 500 miZcm 2 (1,000 mj / cm 2 in both sides) with an ultra-high pressure mercury lamp.
  • the substrate on which this K image was formed was again cleaned with a brush as described above, and after pure water shower cleaning, the silane coupling solution was not used and was sent to a substrate preheating device.
  • a heat-treated red (R) pixel was obtained in the same process as the photosensitive resin transfer material K1.
  • the exposure was 40 mjZcm 2 and development with Na carbonate-based image solution was 35 ° C for 35 seconds.
  • the substrate on which the K image and R pixel were formed was again cleaned with a brush as described above, and after pure water shower cleaning, the silane coupling solution was not used and was sent to the substrate preheating device.
  • the substrate on which the R, G pixel, and B images were formed was beta-treated at 240 ° C for 50 minutes to obtain the target color filter.
  • the substrate was extracted before post-exposure when forming the R pixel, and the residue removal property was evaluated.
  • the degree of deterioration after empty shower operation the same evaluation was performed after 6 hours of empty shower operation.
  • the operation time of the empty shower was assumed to be 6 hours, assuming that the color filter line of G5 to G8 size was used, and that it was placed for the longest time due to adjustment.
  • the equipment used is a 1.2m wide, 2.5m high and 0.8m high development zone with a roller conveyor installed in a developing zone of 4 meters and four arm forces with 15 nozzles. It was of the type that was installed evenly in the length direction and had two rotating brushes between the second and third arms.
  • the cleaning solution showered from the nozzles of the four arms returns to the stock tank (capacity: 200 liters) from the drain port under the zone, and the stock tank force is sent to the nozzles again by the pump. It was.
  • the development residue in the unexposed area was observed with a scanning electron microscope for the obtained colored image and evaluated according to the following criteria.
  • a pixel edge by exposure with a mask that gives a linear image is a straight line.
  • Example 1 except that the photosensitive resin transfer material S was used instead of the photosensitive resin transfer material K1, as described in K1 of Example 1, the description in JP-A-10-206888 Therefore, an active matrix substrate with an interlayer insulating film was fabricated. At that time, a mask having a circular contact hole with a diameter of 20 m for each pixel was used, and the cleaning treatment liquid was carried out in the same manner as in Example 1 except that no brush was used.
  • the cleaning solution of the present invention is excellent in cleaning and removing dirt such as development residues, and is free from environmental problems. It can form a colored image using the cleaning solution that does not deteriorate even in an empty shower operation. It is.
  • the color filter obtained by the method for forming a colored image and the method for producing a color filter of the present invention using the cleaning solution is high-quality, and the array with the color filter of the present invention using the color filter.
  • the array substrate with a color filter manufactured by the substrate manufacturing method can be suitably used for a liquid crystal display device, a sensor, a color separation device, and the like.

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  • Life Sciences & Earth Sciences (AREA)
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Abstract

La présente invention concerne un liquide de traitement de nettoyage qui excelle en termes de capacité de nettoyage à éliminer les taches, telle qu'un résidu de développement, et qui préserve l'environnement et ne se détériore pas même dans un ralenti de douche ; et l'utilisation du liquide de traitement de nettoyage, un procédé pour former des images de couleur, un procédé pour produire un filtre de couleur et un procédé pour produire un substrat d'analyse avec un filtre de couleur. La présente invention concerne un liquide de traitement de nettoyage caractérisé en ce qu'il contient un composé basique et au moins un agent tensioactif choisi parmi un agent tensioactif de type phénoxyoxyalkylène, un agent tensioactif de type éther d'alkyle et un agent tensioactif de type acétylène possédant au moins un groupe hydroxyle, et contenant un agent tensioactif de type naphtalène.
PCT/JP2006/324768 2006-03-20 2006-12-12 Liquide de traitement de nettoyage WO2007108186A1 (fr)

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JP2006077737A JP2007254510A (ja) 2006-03-20 2006-03-20 洗浄処理液
JP2006-077737 2006-03-20

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WO2007108186A1 true WO2007108186A1 (fr) 2007-09-27

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Cited By (4)

* Cited by examiner, † Cited by third party
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EP2012182A3 (fr) * 2007-06-28 2009-03-18 JSR Corporation Composition sensible aux radiations pour former un filtre couleur pour un dispositif de détection d'images à l'état solide, filtre couleur, et dispositif de détection d'images à l'état solide
CN101981506A (zh) * 2008-03-25 2011-02-23 富士胶片株式会社 制备平版印刷版的方法
CN101981507A (zh) * 2008-03-25 2011-02-23 富士胶片株式会社 平版印刷版的制版方法
US9298095B2 (en) 2011-03-23 2016-03-29 Merck Patent Gmbh Rinse solution for lithography and pattern formation method employing the same

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JP5980088B2 (ja) * 2012-10-23 2016-08-31 花王株式会社 ３ｄプリンタ造形物用現像液組成物、３ｄプリンタ造形物の現像方法、及び３ｄプリンタ造形物の製造方法
JP6476302B2 (ja) * 2015-08-31 2019-02-27 富士フイルム株式会社 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置

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JP2005202392A (ja) * 2003-12-19 2005-07-28 Fuji Photo Film Co Ltd 画像形成方法

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JPH10219283A (ja) * 1997-02-13 1998-08-18 Lion Corp 伸線用洗浄剤組成物
JPH11258819A (ja) * 1997-07-31 1999-09-24 Hitachi Chem Co Ltd 現像液、着色画像の製造法及びカラーフィルタの製造法
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JP2005049542A (ja) * 2003-07-31 2005-02-24 Fuji Photo Film Co Ltd 画像形成方法及び現像液
JP2005146171A (ja) * 2003-11-18 2005-06-09 Fuji Photo Film Co Ltd 洗浄処理液並びにそれを用いた着色画像の形成方法、カラーフィルターの製造方法、及び、カラーフィルター付きアレイ基板の製造方法
JP2005196143A (ja) * 2003-12-03 2005-07-21 Fuji Photo Film Co Ltd 感光性平版印刷版用現像液
JP2005202392A (ja) * 2003-12-19 2005-07-28 Fuji Photo Film Co Ltd 画像形成方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2012182A3 (fr) * 2007-06-28 2009-03-18 JSR Corporation Composition sensible aux radiations pour former un filtre couleur pour un dispositif de détection d'images à l'état solide, filtre couleur, et dispositif de détection d'images à l'état solide
CN101981506A (zh) * 2008-03-25 2011-02-23 富士胶片株式会社 制备平版印刷版的方法
CN101981507A (zh) * 2008-03-25 2011-02-23 富士胶片株式会社 平版印刷版的制版方法
US9298095B2 (en) 2011-03-23 2016-03-29 Merck Patent Gmbh Rinse solution for lithography and pattern formation method employing the same

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JP2007254510A (ja) 2007-10-04
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KR20080113359A (ko) 2008-12-30
TW200801177A (en) 2008-01-01

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