TW200801177A - Cleaning treatment solution - Google Patents

Cleaning treatment solution

Info

Publication number
TW200801177A
TW200801177A TW096109258A TW96109258A TW200801177A TW 200801177 A TW200801177 A TW 200801177A TW 096109258 A TW096109258 A TW 096109258A TW 96109258 A TW96109258 A TW 96109258A TW 200801177 A TW200801177 A TW 200801177A
Authority
TW
Taiwan
Prior art keywords
surfactant
processing solution
cleaning processing
based surfactant
filter
Prior art date
Application number
TW096109258A
Other languages
English (en)
Chinese (zh)
Inventor
Toshiyuki Masuda
Mitsutoshi Tanaka
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200801177A publication Critical patent/TW200801177A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/38—Cationic compounds
    • C11D1/65—Mixtures of anionic with cationic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/72—Ethers of polyoxyalkylene glycols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/0325—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW096109258A 2006-03-20 2007-03-19 Cleaning treatment solution TW200801177A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006077737A JP2007254510A (ja) 2006-03-20 2006-03-20 洗浄処理液

Publications (1)

Publication Number Publication Date
TW200801177A true TW200801177A (en) 2008-01-01

Family

ID=38522223

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109258A TW200801177A (en) 2006-03-20 2007-03-19 Cleaning treatment solution

Country Status (5)

Country Link
JP (1) JP2007254510A (fr)
KR (1) KR20080113359A (fr)
CN (1) CN101400775B (fr)
TW (1) TW200801177A (fr)
WO (1) WO2007108186A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090004578A1 (en) * 2007-06-28 2009-01-01 Jsr Corporation Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device
JP5264427B2 (ja) * 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
JP5020871B2 (ja) * 2008-03-25 2012-09-05 富士フイルム株式会社 平版印刷版の製造方法
JP5705607B2 (ja) 2011-03-23 2015-04-22 メルクパフォーマンスマテリアルズＩｐ合同会社 リソグラフィー用リンス液およびそれを用いたパターン形成方法
JP5980088B2 (ja) * 2012-10-23 2016-08-31 花王株式会社 ３ｄプリンタ造形物用現像液組成物、３ｄプリンタ造形物の現像方法、及び３ｄプリンタ造形物の製造方法
WO2017038339A1 (fr) * 2015-08-31 2017-03-09 富士フイルム株式会社 Procédé de production de couche colorée, filtre de couleur, film de blocage de lumière, élément de formation d'image à semi-conducteurs, et dispositif d'affichage d'image

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3287696B2 (ja) * 1993-05-27 2002-06-04 花王株式会社 高濃度一液型アルカリ洗浄剤組成物およびその製造方法
JPH10219283A (ja) * 1997-02-13 1998-08-18 Lion Corp 伸線用洗浄剤組成物
JPH11258819A (ja) * 1997-07-31 1999-09-24 Hitachi Chem Co Ltd 現像液、着色画像の製造法及びカラーフィルタの製造法
JPH11106799A (ja) * 1997-10-01 1999-04-20 Asahi Kagaku Kogyo Co Ltd 液状アルカリ洗浄剤組成物
CN1126006C (zh) * 1999-12-30 2003-10-29 奇美实业股份有限公司 显影液的组成物
JP2002351091A (ja) * 2001-05-22 2002-12-04 Fuji Photo Film Co Ltd 現像液、画像形成方法、着色画像形成方法、カラーフィルタの製造方法、カラーフィルタ付アレイ基板の製造方法、樹脂層付アレイ基板の製造方法
JP2003005382A (ja) * 2001-06-22 2003-01-08 Fuji Photo Film Co Ltd 現像液、画像形成方法、着色画像形成方法、カラーフィルタの製造方法、カラーフィルタ付アレイ基板の製造方法、樹脂層付アレイ基板の製造方法
JP2003336097A (ja) * 2002-05-21 2003-11-28 Fuji Photo Film Co Ltd 洗浄処理液、着色画像の形成方法、カラーフィルターの製造方法、及び、カラーフィルター付きアレイ基板の製造方法
KR100840530B1 (ko) * 2002-11-19 2008-06-23 주식회사 동진쎄미켐 포토레지스트 현상액 조성물
JP2005049542A (ja) * 2003-07-31 2005-02-24 Fuji Photo Film Co Ltd 画像形成方法及び現像液
JP2005146171A (ja) * 2003-11-18 2005-06-09 Fuji Photo Film Co Ltd 洗浄処理液並びにそれを用いた着色画像の形成方法、カラーフィルターの製造方法、及び、カラーフィルター付きアレイ基板の製造方法
JP2005196143A (ja) * 2003-12-03 2005-07-21 Fuji Photo Film Co Ltd 感光性平版印刷版用現像液
JP2005202392A (ja) * 2003-12-19 2005-07-28 Fuji Photo Film Co Ltd 画像形成方法

Also Published As

Publication number Publication date
CN101400775B (zh) 2011-03-16
CN101400775A (zh) 2009-04-01
JP2007254510A (ja) 2007-10-04
WO2007108186A1 (fr) 2007-09-27
KR20080113359A (ko) 2008-12-30

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