TW200801177A - Cleaning treatment solution - Google Patents

Cleaning treatment solution

Info

Publication number
TW200801177A
TW200801177A TW096109258A TW96109258A TW200801177A TW 200801177 A TW200801177 A TW 200801177A TW 096109258 A TW096109258 A TW 096109258A TW 96109258 A TW96109258 A TW 96109258A TW 200801177 A TW200801177 A TW 200801177A
Authority
TW
Taiwan
Prior art keywords
surfactant
processing solution
cleaning processing
based surfactant
filter
Prior art date
Application number
TW096109258A
Other languages
Chinese (zh)
Inventor
Toshiyuki Masuda
Mitsutoshi Tanaka
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200801177A publication Critical patent/TW200801177A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/38—Cationic compounds
    • C11D1/65—Mixtures of anionic with cationic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/72—Ethers of polyoxyalkylene glycols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • C11D2111/22—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/0325—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

The object of the invention is to provide a cleaning processing solution having excellent washing-removing capability of fouling such as developing residue and others, without causing environment problem, and not deteriorating even during empty shower running; a method for forming colored images by using said cleaning processing solution; a method for manufacturing color-filter; and a method for manufacturing array substrate with color-filter. The cleaning processing solution is characterized by comprising an alkali compound, at least one surfactant and a naphthalene-based surfactant, wherein the surfactant is selected from the group consisting of acetylene-based surfactant containing at least one hydroxyl, alkyl ether-based surfactant and phenoxyoxyalkylene surfactant.
TW096109258A 2006-03-20 2007-03-19 Cleaning treatment solution TW200801177A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006077737A JP2007254510A (en) 2006-03-20 2006-03-20 Liquid detergent

Publications (1)

Publication Number Publication Date
TW200801177A true TW200801177A (en) 2008-01-01

Family

ID=38522223

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109258A TW200801177A (en) 2006-03-20 2007-03-19 Cleaning treatment solution

Country Status (5)

Country Link
JP (1) JP2007254510A (en)
KR (1) KR20080113359A (en)
CN (1) CN101400775B (en)
TW (1) TW200801177A (en)
WO (1) WO2007108186A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090004578A1 (en) * 2007-06-28 2009-01-01 Jsr Corporation Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device
JP5264427B2 (en) * 2008-03-25 2013-08-14 富士フイルム株式会社 Preparation method of lithographic printing plate
JP5020871B2 (en) * 2008-03-25 2012-09-05 富士フイルム株式会社 Planographic printing plate manufacturing method
JP5705607B2 (en) 2011-03-23 2015-04-22 メルクパフォーマンスマテリアルズＩｐ合同会社 Rinsing liquid for lithography and pattern forming method using the same
JP5980088B2 (en) * 2012-10-23 2016-08-31 花王株式会社 Developer composition for 3D printer modeled object, method for developing 3D printer modeled object, and method for manufacturing 3D printer modeled object
JP6476302B2 (en) * 2015-08-31 2019-02-27 富士フイルム株式会社 Colored layer manufacturing method, color filter, light shielding film, solid-state imaging device, and image display device

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3287696B2 (en) * 1993-05-27 2002-06-04 花王株式会社 High-concentration one-part alkaline cleaning composition and method for producing the same
JPH10219283A (en) * 1997-02-13 1998-08-18 Lion Corp Detergent composition for wire drawing
JPH11258819A (en) * 1997-07-31 1999-09-24 Hitachi Chem Co Ltd Developer, production of color image and production of color filter
JPH11106799A (en) * 1997-10-01 1999-04-20 Asahi Kagaku Kogyo Co Ltd Liquid alkaline detergent composition
CN1126006C (en) * 1999-12-30 2003-10-29 奇美实业股份有限公司 Composition of developing liquid
JP2002351091A (en) * 2001-05-22 2002-12-04 Fuji Photo Film Co Ltd Developer, image forming method, color image forming method, method of manufacturing color filter, method of manufacturing array substrate with color filter, manufacturing method of array substrate with resin layer
JP2003005382A (en) * 2001-06-22 2003-01-08 Fuji Photo Film Co Ltd Developing solution, image forming method, colored image forming method, method for producing color filter, method for producing array substrate with color filter and method for producing array substrate with resin layer
JP2003336097A (en) * 2002-05-21 2003-11-28 Fuji Photo Film Co Ltd Cleaning fluid, method for forming colored image, method for producing color filter, and method for producing color-filter-fitted array substrate
KR100840530B1 (en) * 2002-11-19 2008-06-23 주식회사 동진쎄미켐 Photoresist Developer Composition
JP2005049542A (en) * 2003-07-31 2005-02-24 Fuji Photo Film Co Ltd Picture forming method and developer
JP2005146171A (en) * 2003-11-18 2005-06-09 Fuji Photo Film Co Ltd Liquid detergent, formation process of colored image using the same, preparation process of color filter and preparation process of color filter-attached array substrate
JP2005196143A (en) * 2003-12-03 2005-07-21 Fuji Photo Film Co Ltd Developing solution for photosensitive planographic printing plate
JP2005202392A (en) * 2003-12-19 2005-07-28 Fuji Photo Film Co Ltd Image forming method

Also Published As

Publication number Publication date
WO2007108186A1 (en) 2007-09-27
JP2007254510A (en) 2007-10-04
CN101400775A (en) 2009-04-01
KR20080113359A (en) 2008-12-30
CN101400775B (en) 2011-03-16

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