WO2006013814A1 - 結晶化膜の形成方法及びその装置 - Google Patents
結晶化膜の形成方法及びその装置 Download PDFInfo
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- WO2006013814A1 WO2006013814A1 PCT/JP2005/014025 JP2005014025W WO2006013814A1 WO 2006013814 A1 WO2006013814 A1 WO 2006013814A1 JP 2005014025 W JP2005014025 W JP 2005014025W WO 2006013814 A1 WO2006013814 A1 WO 2006013814A1
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- Prior art keywords
- lens
- optical path
- path difference
- reduced
- generating member
- Prior art date
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- 238000000034 method Methods 0.000 title claims description 15
- 238000002425 crystallisation Methods 0.000 title description 5
- 230000008025 crystallization Effects 0.000 title description 5
- 230000003287 optical effect Effects 0.000 claims abstract description 120
- 230000001427 coherent effect Effects 0.000 claims description 15
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000007493 shaping process Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 27
- 239000013078 crystal Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 238000005286 illumination Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 230000004907 flux Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
- C30B13/24—Heating of the molten zone by irradiation or electric discharge using electromagnetic waves
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
Definitions
- the present invention relates to a method and apparatus for forming a crystallized film by laser light.
- Patent Document 1 As a conventional apparatus of this type, one described in Patent Document 1 is known. This is because in the illumination device of a semiconductor exposure device, the resolution line width of the transferred circuit pattern is proportional to the wavelength of the light source. It is an illumination device that can reduce the interference fringes generated in the light source and illuminate the illuminated surface uniformly.
- the light beam from the laser light source 71 is divided into a plurality of light beams Bl, B2 by the light beam splitting means 72 having the optical members 79 and 80 composed of a plurality of beam splitters.
- detour means Rl, R2 having a reflecting mirror force are provided between the optical members 79, 80, and the detour means It is characterized in that an optical path difference of 11 12 or more is provided between the plurality of light beams B1, ⁇ 2,... ⁇ via R1 and R2.
- the optical path difference 11 +12 can be made longer than the coherent length of the light source 71.
- Reference numeral 73 denotes a focal lens (first array lens), which reduces the diameter of a plurality of incident light beams from the light beam splitting means 72.
- 75 is a fly-eye lens (second array lens) made up of a plurality of microlenses, and each of the plurality of light beams from the afocal lens 73 is converged on the focal plane of each microlens to form an incoherent second lens.
- a next light source surface 76 is formed.
- Reference numeral 77 denotes a condenser lens that illuminates the irradiated surface R on which a circuit pattern such as a reticle is formed using each light beam from the secondary light source surface 76.
- Reference numeral 78 denotes a projection optical system that projects the circuit pattern on the irradiated surface R onto the Ueno and W planes.
- Patent Document 2 As another conventional device, one described in Patent Document 2 is also known. This is because, as shown in FIG. 6, the laser light source 60 and the luminous flux supplied from the laser light source 60 are also plural.
- the light flux from the laser light source 60 indicated by the point light source 61 and the positive lens 62 passes through the optical path difference generating member 63 having a plurality of steps, and then is the same as the number of steps of the optical path difference generating member 63.
- the same number of light source images 61 ′ as the number of steps of the optical path difference generating member 63 are formed in the vicinity of the exit surface by the lenticular lens 64 (array lens) having the lens blocks.
- Light beams from the plurality of light source images 61 ′ illuminate the illuminated object 66 surface in a superimposed manner via a condenser lens 65.
- Patent Document 1 Japanese Patent Publication No. 62-25483
- Patent Document 2 Japanese Patent Publication No. 7-21583
- the optical system of Patent Document 1 includes a light splitting means including a focal lens 73 and a beam splitter or reflecting mirror 79, 80, R1, before a fly-eye lens 75 (second array lens). Since the optical path difference generating members made up of R2 are sequentially provided, the light beams split by the beam splitter (79) and incident on the fly-eye lens 75 (second array lens) become Gaussian beams. ! / Even if multiple Gaussian beams forming one mountain are superimposed on the irradiated surface, illumination with excellent uniformity cannot be obtained.
- an optical path difference between each of the plurality of light beams B1, ⁇ 2 ⁇ ⁇ is given as an optical path difference 1 1-12 or more, and an optical path difference 11 +12 is the light source 1 Coherent of It is possible to make the length longer than the length, but the means for giving the optical path difference is constituted by the bypass means Rl, R2 ′, ′ provided between the optical members 79, 80 without using the optical path difference generating member.
- an optical path difference is provided between the plurality of light beams B1, ⁇ 2,.
- an optical path difference generating member 63 having a plurality of steps is provided by disposing an optical path difference generating member 63 between a laser light source 60 and a lenticular lens 64 (array lens). After transmission, the same number of light source images 61 ′ as the number of steps of the optical path difference generating member 63 are formed in the vicinity of the exit surface by the lenticular lens 64 (array lens) having the same number of lens blocks.
- the lenticular lens 64 (array lens) is arranged on the rear side of the optical path difference generating member 63, the laser light as a light beam having a divergence angle ⁇ is emitted from the laser light source 60. After this passes through one block portion of the single optical path difference generating member 63, it enters the plurality of lens portions of the lenticular lens 64 (array lens). In other words, the laser light that has passed through the plurality of step portions of the optical path difference generating member 63 enters one lens portion of the lenticular lens 64 (array lens).
- the optical path difference generating member 63 is configured by a set of a plurality of independent block portions, and before being reduced to a plurality of divided beams by the lenticular lens 64 (array lens), the laser beam is generated by the optical path difference generating member.
- the laser beam When transmitted through 63, the laser beam as a parallel light bundle having an unavoidable divergence angle ⁇ generates a large amount of reflected light on the inner side surface of each block portion of the optical path difference generating member 63, and is uniform. It is not possible to obtain excellent lighting. This is facilitated by the fact that the width of the block portion of the optical path difference generating member 63 is equal to the incident width of the laser beam.
- each lens portion of the lenticular lens 64 (array lens) forms a flat surface, so that the divergence angle after incidence on each lens portion ⁇ A large amount of the laser beam having a reflection on the side surface of each lens portion.
- the present invention has been made in view of such a conventional technical problem, and in particular, has a technical problem caused by emitting a laser beam as a light beam having a predetermined divergence angle.
- the problem to be solved is as follows.
- the invention of claim 1 is directed to a laser light source A that emits a laser beam 1 as a light bundle having a divergence angle ⁇ , as viewed from one side, a first array lens 2 composed of a plurality of cylindrical lenses 2a, a plurality of The second array lens 3 composed of the cylindrical lens 3a, the optical path difference generating member 7 including a plurality of block portions 7a for providing an optical path difference, the condenser lens 5 and the irradiated surface 6 are sequentially arranged.
- Laser light 1 emitted from the laser light source A is transmitted through the first array lens 2, and is divided into a plurality of reduced portions according to the number of adjacent cylindrical lenses 2a having the width d of the first array lens 2.
- a plurality of light beams 9 are obtained, and the divided light beams 9 are individually transmitted through the corresponding cylindrical lenses 3a of the second array lens 3 to be narrower than the width d of the cylindrical lenses 2a of the first array lens 2.
- the reduced divided light beams 10 are individually transmitted through the corresponding block portions 7 a of the optical path difference generating member 7 while reducing the reflection on the divided surface side, thereby adjusting the coherency. In this way, after the optical path difference is generated between the reduced divided light beams 10, the respective reduced divided light beams 10 are superimposed by the condenser lens 5 and irradiated onto the irradiated surface 6. .
- the difference in length (AL) between the block portions 7a of the optical path difference generating member 7 is set so as to generate an optical path difference exceeding the coherent length in each reduced divided beam 10.
- the invention of claim 3 is characterized in that the width a of the block portion 7a of the optical path difference generating member 7 is equal to or smaller than the width d of the cylindrical lens 2a of the first array lens 2. Is a method of forming a crystallized film 2.
- the invention of claim 4 is directed to the incident of the laser beam 1 of the cylindrical lens 2a of the first array lens 2. 4. The crystallized film forming method according to claim 1, wherein the projecting surface 11 is a positive convex curved surface.
- the invention according to claim 5 is the method for forming a crystallized film according to claim 1, 2, 3 or 4, wherein the first array lens 2 and the irradiated surface 6 are in a conjugate relationship.
- the invention of claim 6 is a crystallized film forming apparatus for shaping the laser beam 1 as a light beam having a divergence angle ⁇ by being emitted from the laser beam source A force and irradiating the irradiated surface 6 with respect to the laser beam source A.
- the laser beam 1 is divided into a plurality of parts' reduced to become divided light beams 9, and then divided and reduced means (2, 3) to obtain reduced divided light beams 10 by using each divided light beam 9 as an individual reduced light beam bundle.
- An optical path difference generating member 7 having a block portion 7a for causing each reduced divided light beam 10 to individually transmit with reduced reflection on the divided surface side and to generate an optical path difference between the reduced divided light beams 10 so as to adjust coherency.
- a condensed lens 5 that emits the reduced divided light beam 10 that has passed through the optical path difference generating member 7, and the irradiated surface 6 is illuminated by the laser beam that is transmitted through the condenser lens 5 and superimposed.
- the respective reduced divided light beams 10 are individually transmitted through the corresponding block portions 7a of the optical path difference generating member 7 while reducing the reflection on the divided surface side, and adjusted to the coherent property.
- the generation of the optical path difference includes not only the case where the reduced divided beams 10 are made incoherent with each other, but also the case where predetermined reduced interference is adjusted between the reduced divided beams 10.
- each divided beam is converted into individual reduced beam bundles to obtain reduced divided beams, and the respective reduced divided beams are individually transmitted through the block portion of the optical path difference generating member while reducing reflection on the dividing surface side.
- Each block portion of the optical path difference generating member generates an optical path difference between the reduced divided light beams so as to adjust coherency.
- Each reduced divided light beam that has passed through the optical path difference generating member is condensed by a condensing lens, and the irradiated surface is illuminated by superimposing laser light that passes through the condensing lens.
- the laser light is converted into a plurality of individual reduced divided beams having optical path differences.
- the reflection on the side surface of the optical path difference generating member is reduced, and a uniform laser can be obtained.
- uniform laser light can be obtained by transmitting only one reduced divided light beam to each block portion of the optical path difference generating member.
- interference between laser beams is controlled, and a thin film material is irradiated with a uniform laser to perform crystallization, thereby obtaining uniform-sized crystal grains.
- the optical path difference generating member, the condenser lens, and the irradiated surface are sequentially arranged, the optical path difference generating member that does not affect the beam shape of the irradiated surface is provided. It is possible to control the interference between laser beams by arbitrarily setting the length.
- the difference in length between the block portions of the optical path difference generating member is set so as to generate an optical path difference exceeding the coherent length in each reduced divided beam. Interference between the reduced divided beams when irradiating the irradiated surface is satisfactorily prevented.
- the width a of the block portion of the optical path difference generating member is equal to or smaller than the width d of the cylindrical lens of the first array lens, the individual reduced beam bundle The reduced divided light beam transmitted through the optical path difference generating member having a small block portion can achieve the same effect as the invention according to claim 1.
- the incident surface of the laser beam of the cylindrical lens of the first array lens forms a positive convex curved surface, reflection from the side surface of the cylindrical lens of the first array lens is prevented. It can suppress well and can obtain a more uniform laser beam.
- the beam immediately after being split by the first array lens The shape will be superimposed on the irradiated surface, reducing the influence of the laser light source and making it more uniform Illumination can be obtained on the illuminated surface.
- the light beam conjugate between the first array lens and the surface to be irradiated becomes a parallel light beam between the second array lens and the condenser lens, an optical path difference generating member composed of a block portion is placed at this position. Even if it is installed, it is possible to change only the optical path difference of the divided rays without changing the conjugate relationship. Parallel rays can also prevent diffraction that is likely to occur at the input and output ends of the block.
- FIG. 1 is a schematic view showing a crystallized film forming apparatus according to an embodiment of the present invention as viewed from one side.
- FIG. 2 is a diagram showing a cylindrical lens of a first array lens in which the incident surface is formed as a positive convex curved surface.
- FIG. 3 is a diagram showing a cylindrical lens of the first array lens, which similarly forms a plane of incidence.
- FIG. 5 is a schematic view showing the light beam splitting means.
- FIG. 6 is a schematic view showing another conventional crystallized film forming apparatus.
- An object of the present invention is to obtain a uniform laser by reducing reflection on the side surface of an optical path difference generating member when laser light is converted into a plurality of individual reduced divided beams having an optical path difference.
- FIG. 1 and 2 show one embodiment of a crystallized film forming apparatus according to the present invention.
- symbol A indicates a laser light source
- the first array lens 2 the second array lens 3
- an optical path difference generating member 7 for providing an optical path difference
- the optical lens 5 and the irradiated surface 6 are sequentially arranged with the optical axis X aligned.
- the lenticular lens and fly-eye lens referred to in the conventional example are defined as an array lens.
- the laser light source A includes a light source and a positive lens (not shown), and the coherent light emitted from the laser light source A is a force that becomes a laser beam 1 that is a theoretically parallel light bundle. 1 has an inevitable divergence angle ⁇ ( ⁇ lmrad) due to the fact that it is actually emitted from the laser light source A.
- the first and second array lenses 2 and 3 are formed by connecting a plurality of adjacent cylindrical lenses 2a and 3a (5 in the figure), and constitute a homogenizer together with the condenser lens 5. ing.
- Each cylindrical lens 2a of the first array lens 2 has a focal length fl
- each cylindrical lens 3a of the second array lens 3 has a focal length f 2 and is arranged extending in the same direction.
- the distance between the first and second array lenses 2 and 3 is matched with f2.
- the laser light 1 emitted from the laser light source A enters the first array lens 2 and is converged and divided by each cylindrical lens 2a to become divided light beams 9.
- f2> fl and fl> f2Z2 are set.
- Each divided light beam 9 forms a light source image 4 corresponding to the number of cylindrical lenses 2a of the first array lens 2 in front of the second array lens 3, and each light source image 4 light 9
- the incident light is individually incident on each cylindrical lens 3 a of the second array lens 3 and is formed into a substantially parallel reduced divided light beam 10.
- Each cylindrical lens 2a of the first array lens 2 and each cylindrical lens 3a of the second array lens 3 divide and reduce the laser beam 1, and then convert each divided beam 9 into individual substantially parallel beam bundles.
- the dividing / reducing means is obtained to obtain the reduced divided light beam 10.
- Each cylindrical lens 2a of the first array lens 2 reduces the laser beam 1 to the split light beam 9 while reducing the laser beam 1 in the Y direction (vertical direction in the side view shown in FIG.
- Each cylindrical lens 3a of the second array lens 3 is divided into reduced divided light beams 10 which are parallel light bundles while reducing the divided light beams 9 in the Y direction orthogonal to the optical axis X.
- each reduced divided light beam 10 is a plurality of reduced divided light beams 10 reduced to be narrower than the width d of the cylindrical lens 2a of the first array lens 2, each reduced divided light beam 10 is converted into each reduced divided light beam 10. Since light can be transmitted individually without causing reflection by the side surfaces at both ends in the Y direction of the block portion 7a of the optical path difference generating member 7, it does not necessarily have to be exactly parallel light bundles. In short, each reduced divided light beam 10 may be individually transmitted through the corresponding block portion 7a of the optical path difference generating member 7 by reducing reflection on the divided surface side by the cylindrical lens 2a.
- the laser light 1 of the cylindrical lens 2a of the first array lens 2 that obtains the convergent light is
- the incident curvature surface 11 is set to a positive convex curved surface as shown in FIG. As a result, it is possible to reduce the reflection of the laser beam 1 having the divergence angle ⁇ , which is generated on the side surfaces 13 at both ends in the Y direction of the cylindrical lens 2a of the first array lens 2.
- the condensing lens 5 is composed of one large cylindrical lens having a focal length fc, and is irradiated with all the reduced divided light beams 10 individually transmitted through the block portions 7a of the optical path difference generating member 7. Converge to the same part of 6 and superimpose it. Therefore, an arbitrary point P on the illuminated surface 6 is illuminated by light from all the light source images 4. The distance between the irradiated surface 6 and the condensing lens 5 is matched with the focal length fc of the condensing lens 5.
- the irradiated surface 6 is a surface on which a semiconductor (thin film material) for forming a crystallized film is placed.
- the distance between the first and second array lenses 2 and 3 is made equal to the focal length f2 of the second array lens 3, and the distance between the irradiated surface 6 and the condenser lens 5 is The arrangement that matches the focal length fc of the condenser lens 5 gives a conjugate relationship between the first array lens 2 and the irradiated surface 6.
- the laser light 1 emitted from the laser light source A passes through the first and second array lenses 2, 3 and the condenser lens 5 constituting the homogenizer, and illuminates the irradiated surface 6.
- a crystallized film can be formed on the thin film material placed on the irradiated surface 6.
- the beam shape of the divided light beam 9 immediately after being divided by the first array lens 2 is superimposed on the irradiated surface 6. Therefore, uniform illumination can be obtained on the irradiated surface 6.
- the light beam 8 (shown in FIG. 1) conjugated with the first array lens 2 and the irradiated surface 6 becomes a parallel light beam between the second array lens 3 and the condenser lens 5. Therefore, even if the optical path difference generating member 7 is installed at this position, only the optical path difference of the divided light beam can be changed without changing the conjugate relationship.
- the reduced split light beam 10 transmitted through the optical path difference generating member 7 can be made narrower than the width a of the block part 7a constituting the optical path difference generating member 3 by setting fl> f2Z2 to be reduced, so that the block part 7a In addition, since the reduced divided light beam 10 becomes a parallel light beam, it is possible to prevent diffraction generated at the input / output end of the block portion 7a.
- the optical path difference generating member 7 generates the optical path difference of each reduced divided light beam 10 at an arbitrary point P of the irradiated surface 6 so that the coherency of the laser light 1 emitted from the laser light source A is adjusted. It has a function to suppress or control interference and thus interference fringes, and a plurality of N (5 in the figure) optical path difference generating block portions 7a are arranged in parallel according to the number of reduced divided beams 10 Configured. In general, the optical path difference generating member 7 makes the optical path difference larger than the coherence distance of the laser beam 1 to prevent generation of interference fringes.
- Each block portion 7a has a predetermined refractive index larger than that of air, and has the same width a in the Y direction and different lengths L in the optical axis X direction.
- the width a of each block portion 7a is equal to or smaller than the width d of the cylindrical lens 2a of the first array lens 2, and the length L of each block portion 7a is set so as to suppress or control interference fringes.
- all the reduced divided beams 10 emitted from the second array lens 3 are set so as to generate an optical path difference exceeding the coherent length.
- each block portion 7a of the optical path difference generating member 7 is made of quartz glass of a rectangular column having a width a and a length L1 + (N ⁇ 1) ⁇ AL of the block portion 7a.
- L1 is the length of the minimum block part 7a
- N is an integer corresponding to the number of block parts 7a. That is, the five block parts 7a made of quartz glass have the length L1 of the smallest block part 7a, and the difference between the lengths of the block parts 7a of each step is AL, and the length LI +4 in the center. 'AL, LI + 3.
- the length difference ⁇ L between the block portions 7a is generally a length that causes an optical path difference exceeding the coherent length in the laser light 1.
- the reduced divided light beam 10 from each light source image 4 individually incident on each cylindrical lens 3a of the second array lens 3 and formed into a substantially parallel light beam passes through the central portion of each block portion 7a.
- the light is transmitted individually and a different optical path length is given for each optical path.
- Laser light source A force A laser beam 1 which is a parallel beam bundle having a divergence angle ⁇ ( ⁇ lmmd) is converged as each divided beam 9 by each cylindrical lens 2a of the first array lens 2, and is then reflected by the second array.
- a light source image 4 corresponding to the number of cylindrical lenses 2 a is formed on the same surface in front of the lens 3.
- the divided light beam 9 from each light source image 4 is the second array lens.
- Each of the cylindrical lenses 3a is individually incident on each of the cylindrical lenses 3a, and is almost parallel.
- the laser light 1 generated from the coherent light source A with the divergence angle ⁇ is transmitted through the first array lens 2 composed of N cylindrical lenses 2a having a focal length f 1 and a lens width d.
- the light passes through a second array lens 3 composed of N cylindrical lenses 3a having a focal length f2 and a width d. Accordingly, the laser beam 1 is divided into a plurality of divided beams 9 that have been divided and reduced by the dividing unit (2, 3), and then each divided beam 9 becomes a reduced divided beam 10 composed of individual parallel beam bundles. .
- each divided light beam 9 is The central lens 3a of the second array lens 3 having the same width d or less as the width d of each cylindrical lens 2a of the array lens 2 can pass through. Since the divided light beam 9 passes through the central portion of the cylindrical lens 3a, the reflection generated on the side surface of the second array lens 3 is reduced.
- each cylindrical lens 2a of the first array lens 2 on which the laser beam 1 is incident is set to a positive convex curved surface as shown in FIG. 2, the first array lens The reflection generated on the side face of 2 is reduced.
- the laser beam 1 having a parallel light flux from the laser light source A has a slight divergence angle ⁇
- the curvature surface 11 on which the laser light 1 of the cylindrical lens 2a of the first array lens 2 is incident is set to a convex curved surface, and converged light immediately after the incidence.
- the incident surface 11 ′ of each cylindrical lens 2 a ′ is formed as a flat surface (or a concave curved surface) as shown in FIG.
- the laser beam 1 having the divergence angle ⁇ is reflected in the Y direction of the array lens 2 after refraction.
- a large amount of light is totally reflected at a certain side surface 13 ′, and the reflected light enters not only the corresponding cylindrical lens 3 a of the second array lens 3 but also the adjacent non-corresponding cylindrical lens 3 a.
- the exit surface 12 of each cylindrical lens 2a of the first array lens 2 is A flat surface is acceptable.
- the reduced divided light beam 10 transmitted through the second array lens 3 in this way is made into a substantially parallel light beam having a narrower width than the width d and is transmitted through each block portion 7a of the optical path difference generating member 7. .
- the width a in the Y direction of the block portion 7a of the optical path difference generating member 7 may be equal to or less than the width d of the lens 2a of the first array lens 2 in the same direction.
- Each reduced divided light beam 10 passes through the block portion 7a of the corresponding optical path difference generating member 7, and then passes through the condensing lens 5 having the focal length fc to be superposed and shaped laser light. Illuminate the illuminated surface 6. Since the condensing lens 5 is disposed at a focal distance fc from the irradiated surface 6, each reduced divided light beam 10 having a parallel light flux is gathered on the irradiated surface 6 through the condensing lens 5. Then, the irradiated surface 6 is irradiated and a crystallized film is formed on the semiconductor surface installed on the irradiated surface 6.
- each reduced divided light beam 10 transmitted through the block portion 7a of the optical path difference generating member 7 is generally in a substantially non-coherent state, generation of interference fringes on the irradiated surface 6 is prevented.
- the shaped laser beam 1 with excellent uniformity is irradiated onto the thin-film material, and a crystallized film with excellent in-plane uniformity such as uniform crystal grain size can be obtained. It becomes possible.
- any one point of the first array lens 2 is not affected by the length L of the optical path difference generating member 7, regardless of the length L. Condensed to an arbitrary point P on irradiated surface 6. Diffraction that tends to occur at the entrance / exit end face of the block 7a can also be prevented.
- the laser annealing apparatus that has been configured so far with a low coherent excimer laser is converted into a solid-state laser. Is possible.
- the laser light source A that generates the excimer laser uses an active gas
- this type of maintenance can be achieved by using a solid-state laser that requires maintenance such as gas exchange once every few days. Devices that are not required can be configured.
- solid lasers have excellent pulse energy fluctuation rates (excimer lasers are said to be 4-6%, solid lasers are said to be 1-2%), and repetition rates are high (excimer lasers are 300-400 kHz).
- the solid-state laser is 10-20kHz) and is linearly polarized (excimer laser is randomly polarized). It is possible to crystallize a thin-film material that makes the best use of the characteristics of a solid-state laser, and can be expected to improve the uniformity of crystal grains in the film and increase the size of crystal grains.
- a coherent laser light source A that emits laser light 1 of 532 nm, which is the second harmonic of the YAG laser, is used, and does not interfere.
- the optical path difference provided between the block portions 7a constituting the optical path difference generating member 7 is made to be approximately the same as or slightly shorter than the coherent length of the laser beam 1, which is disclosed in JP-A-10-256152. It is also possible to control the crystal shape by generating the light beam interference as described and controlling the period of the heat density distribution. In other words, in order to grow large crystal grains, it is important to adjust the intensity of the laser beam to control the residual nucleus density and the position of nucleation, and the laser beam has a periodic intensity of several Wm. It is effective to form a distribution and form residual nuclei in the low-intensity part.
- This periodic intensity distribution of the laser light can be created by interference of laser light in which an optical path difference is caused between the reduced divided beams 10 to be the same as or slightly shorter than the coherent length and the coherency is adjusted.
- each of the reduced divided light beams 10 is reduced in reflection on the divided surface side, individually transmitted through the corresponding block portion 7a of the optical path difference generating member 7, and the coherency is adjusted.
- an optical path difference is generated in each reduced divided light beam 10, and then each reduced divided light beam 10 is superimposed by the condensing lens 5 to irradiate the irradiated surface 6 to form a crystallized film on the irradiated surface 6.
- the laser beam 1 as a parallel beam bundle having a divergence angle ⁇ is used to convert the laser beam 1 into a plurality of individual reduced beam bundles to obtain a reduced divided beam 10, which is used for the optical path difference generating member 7.
- the reflection on the side surface can be reduced and a uniform laser can be obtained. Further, only one reduced divided light beam 10 is transmitted through each block portion 7a of the optical path difference generating member 7, and uniform laser light 1 is obtained. In addition, the interference between the laser beams is well controlled, and the leveling is uniform. Crystallization can be performed by irradiating a thin film of material with a single laser beam to obtain crystal grains of uniform size.
- the plurality of block portions 7a of the optical path difference generating member 7 of the one embodiment are formed by an assembly of individual block portions 7a, a single optical path difference generating member 7 having a stepped shape is formed. Multiple block parts 7a may be formed at the same time!
- the present invention is applicable not only to a semiconductor exposure apparatus but also to an image forming field such as a printer.
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Abstract
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DE112005001847T DE112005001847B4 (de) | 2004-08-06 | 2005-08-01 | Verfahren und Vorrichtung zur Bildung eines kristallisierten Films |
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JP2004-230095 | 2004-08-06 | ||
JP2004230095A JP4291230B2 (ja) | 2004-08-06 | 2004-08-06 | 結晶化膜の形成方法及びその装置 |
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KR (1) | KR100755229B1 (ja) |
DE (1) | DE112005001847B4 (ja) |
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US20150370173A1 (en) * | 2014-06-19 | 2015-12-24 | SCREEN Holdings Co., Ltd. | Light irradiation apparatus and drawing apparatus |
US9609294B2 (en) | 2011-05-10 | 2017-03-28 | Dai Nippon Printing Co., Ltd. | Illumination device, projection type image display device, and optical device |
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JP4478670B2 (ja) * | 2006-09-08 | 2010-06-09 | ソニー株式会社 | 1次元照明装置及び画像生成装置 |
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JP2008124149A (ja) * | 2006-11-09 | 2008-05-29 | Advanced Lcd Technologies Development Center Co Ltd | 光学装置および結晶化装置 |
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JP4347546B2 (ja) * | 2002-06-28 | 2009-10-21 | 株式会社 液晶先端技術開発センター | 結晶化装置、結晶化方法および光学系 |
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- 2004-08-06 JP JP2004230095A patent/JP4291230B2/ja active Active
-
2005
- 2005-08-01 DE DE112005001847T patent/DE112005001847B4/de active Active
- 2005-08-01 WO PCT/JP2005/014025 patent/WO2006013814A1/ja active Application Filing
- 2005-08-01 KR KR1020067018539A patent/KR100755229B1/ko active IP Right Grant
- 2005-08-03 TW TW094126366A patent/TWI263385B/zh active
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JPS61169815A (ja) * | 1985-01-22 | 1986-07-31 | Nippon Kogaku Kk <Nikon> | 露光装置 |
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US8164740B2 (en) | 2005-12-02 | 2012-04-24 | Asml Holding N.V. | Illumination system coherence remover with two sets of stepped mirrors |
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Also Published As
Publication number | Publication date |
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KR100755229B1 (ko) | 2007-09-04 |
JP4291230B2 (ja) | 2009-07-08 |
DE112005001847T5 (de) | 2007-06-21 |
TW200610240A (en) | 2006-03-16 |
TWI263385B (en) | 2006-10-01 |
KR20070004703A (ko) | 2007-01-09 |
DE112005001847B4 (de) | 2011-05-26 |
JP2006049656A (ja) | 2006-02-16 |
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