WO2006001537A1 - ヒドラゾン化合物の製造方法 - Google Patents
ヒドラゾン化合物の製造方法 Download PDFInfo
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- WO2006001537A1 WO2006001537A1 PCT/JP2005/012275 JP2005012275W WO2006001537A1 WO 2006001537 A1 WO2006001537 A1 WO 2006001537A1 JP 2005012275 W JP2005012275 W JP 2005012275W WO 2006001537 A1 WO2006001537 A1 WO 2006001537A1
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- -1 hydrazone compound Chemical class 0.000 title claims abstract description 87
- 238000000034 method Methods 0.000 title claims abstract description 14
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims abstract description 24
- 150000001728 carbonyl compounds Chemical class 0.000 claims abstract description 5
- 238000006243 chemical reaction Methods 0.000 claims description 24
- 238000006722 reduction reaction Methods 0.000 claims description 19
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 239000003960 organic solvent Substances 0.000 claims description 11
- 239000012046 mixed solvent Substances 0.000 claims description 9
- 235000010288 sodium nitrite Nutrition 0.000 claims description 9
- RYYXDZDBXNUPOG-UHFFFAOYSA-N 4,5,6,7-tetrahydro-1,3-benzothiazole-2,6-diamine;dihydrochloride Chemical compound Cl.Cl.C1C(N)CCC2=C1SC(N)=N2 RYYXDZDBXNUPOG-UHFFFAOYSA-N 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 7
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 5
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 5
- 238000000605 extraction Methods 0.000 claims description 2
- REOJLIXKJWXUGB-UHFFFAOYSA-N mofebutazone Chemical group O=C1C(CCCC)C(=O)NN1C1=CC=CC=C1 REOJLIXKJWXUGB-UHFFFAOYSA-N 0.000 claims description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 claims 1
- 238000009833 condensation Methods 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 231100000299 mutagenicity Toxicity 0.000 abstract description 2
- 230000007886 mutagenicity Effects 0.000 abstract description 2
- 231100000419 toxicity Toxicity 0.000 abstract description 2
- 230000001988 toxicity Effects 0.000 abstract description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 30
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 26
- 239000000243 solution Substances 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 238000004128 high performance liquid chromatography Methods 0.000 description 11
- 239000013078 crystal Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- YHYKLKNNBYLTQY-UHFFFAOYSA-N 1,1-diphenylhydrazine Chemical compound C=1C=CC=CC=1N(N)C1=CC=CC=C1 YHYKLKNNBYLTQY-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 230000008034 disappearance Effects 0.000 description 9
- 238000001914 filtration Methods 0.000 description 9
- 150000002429 hydrazines Chemical class 0.000 description 7
- JGOAZQAXRONCCI-SDNWHVSQSA-N n-[(e)-benzylideneamino]aniline Chemical compound C=1C=CC=CC=1N\N=C\C1=CC=CC=C1 JGOAZQAXRONCCI-SDNWHVSQSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 6
- UESSERYYFWCTBU-UHFFFAOYSA-N 4-(n-phenylanilino)benzaldehyde Chemical compound C1=CC(C=O)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 UESSERYYFWCTBU-UHFFFAOYSA-N 0.000 description 5
- 150000007857 hydrazones Chemical class 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 239000007806 chemical reaction intermediate Substances 0.000 description 4
- 238000004811 liquid chromatography Methods 0.000 description 4
- XKLJHFLUAHKGGU-UHFFFAOYSA-N nitrous amide Chemical class ON=N XKLJHFLUAHKGGU-UHFFFAOYSA-N 0.000 description 4
- JMVDVHYMDWJOSI-UHFFFAOYSA-N 4-(dibenzylamino)-2-methylbenzaldehyde Chemical compound C1=C(C=O)C(C)=CC(N(CC=2C=CC=CC=2)CC=2C=CC=CC=2)=C1 JMVDVHYMDWJOSI-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- MIVUDWFNUOXEJM-UHFFFAOYSA-N amino(diphenyl)azanium;chloride Chemical compound Cl.C=1C=CC=CC=1N(N)C1=CC=CC=C1 MIVUDWFNUOXEJM-UHFFFAOYSA-N 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009776 industrial production Methods 0.000 description 3
- 238000007034 nitrosation reaction Methods 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 108091008695 photoreceptors Proteins 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000004809 thin layer chromatography Methods 0.000 description 3
- XCGLXUJEPIVZJM-UHFFFAOYSA-N 4-(4-methyl-n-(4-methylphenyl)anilino)benzaldehyde Chemical compound C1=CC(C)=CC=C1N(C=1C=CC(C=O)=CC=1)C1=CC=C(C)C=C1 XCGLXUJEPIVZJM-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- AZBHVSHRTSHTKQ-UHFFFAOYSA-N 2-anilinobenzaldehyde Chemical compound O=CC1=CC=CC=C1NC1=CC=CC=C1 AZBHVSHRTSHTKQ-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 101150046432 Tril gene Proteins 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- SSVFMICWXDVRQN-UHFFFAOYSA-N ethanol;sodium Chemical compound [Na].CCO SSVFMICWXDVRQN-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 231100000219 mutagenic Toxicity 0.000 description 1
- 230000003505 mutagenic effect Effects 0.000 description 1
- JRERFXZAKKDIEW-UHFFFAOYSA-N n,n-diphenyl-4-[(phenylhydrazinylidene)methyl]aniline Chemical compound C=1C=CC=CC=1NN=CC(C=C1)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 JRERFXZAKKDIEW-UHFFFAOYSA-N 0.000 description 1
- XBCIOBSQHJYVBQ-UHFFFAOYSA-N naphthalen-1-ylhydrazine Chemical compound C1=CC=C2C(NN)=CC=CC2=C1 XBCIOBSQHJYVBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000007867 post-reaction treatment Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000005185 salting out Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- UIIMBOGNXHQVGW-UHFFFAOYSA-N sodium;hydron;carbonate Chemical compound [Na+].OC(O)=O UIIMBOGNXHQVGW-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C249/00—Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C249/16—Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of hydrazones
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C241/00—Preparation of compounds containing chains of nitrogen atoms singly-bound to each other, e.g. hydrazines, triazanes
- C07C241/02—Preparation of hydrazines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/72—Hydrazones
- C07C251/86—Hydrazones having doubly-bound carbon atoms of hydrazone groups bound to carbon atoms of six-membered aromatic rings
Definitions
- the present invention relates to a method for producing a hydrazone compound useful as a photoconductive substance used in an electrophotographic photoreceptor.
- hydrazone compounds have been useful as photoconductive materials used in electrophotographic photoreceptors, and their application to electrophotographic photoreceptors and production methods have been disclosed (for example, see Patent Documents 1 to 5).
- Patent Document 1 Japanese Patent Application Laid-Open No. 06-6 16 6 6 7
- Patent Document 2 Japanese Patent Laid-Open No. 02-3 0 8 8 6 2
- Patent Document 3 Japanese Patent Laid-Open No. 02-3 08 8 61
- Patent Document 4 Japanese Patent Laid-Open No. Sho 6 1-2-3 15 4
- Patent Document 5 JP-A-60-2 5 5 8 5 4
- the hydrazone compound can be generally obtained by reducing an N-nitrosamine compound to obtain a hydrazine compound, taking it out as a hydrochloride, and then subjecting it to a condensation reaction with a force sulfonyl compound.
- an industrially high quality hydrazone compound is to be produced in a high yield, it is required to obtain an oxidative and unstable hydrazine compound in a high quality and a high yield at the end of the reaction.
- many N-nitrosamine compounds and hydrazine compounds are known to be toxic (mutagenic). From the viewpoint of ensuring the safety of workers, work with N-nitrosamine compounds and hydrazine compounds High exposure control measures are required. 5 012275
- N-phenyl or N-nitroyl or ⁇ -naphthylamine 1 part by weight in organic acid 3 to 30 parts by weight is added to a solution of sodium nitrite soda solution to form N-ditroso
- a hydrazone compound characterized by condensing a reaction liquid containing N-phenyl N-tri- or 5-naphthyl hydrazine and a corresponding carbonyl compound by reducing the liquid containing N-nitrosamine compound.
- Manufacturing methods have been proposed (see, for example, Patent Documents 6 to 7).
- the N-nitrosamine compound is reduced with metal powder such as zinc and acetic acid, and therefore, a filtration step of the reducing agent residue is essential in the post-reaction treatment. Oxidation is promoted, and as a result, the yield (around 60%) and quality of the final target hydrazone compound are reduced.
- exposure to hydrazine compounds is inevitable during filtration operations and handling of filtration residues. From the viewpoint of ensuring worker safety, it is not suitable as an industrial production method for hydrazone compounds. Absent.
- a hydrazine compound is obtained by reducing an N-nitrosamine compound with zinc powder monoacetate, sodium-ethanol, sodium-liquid ammonia, aluminum lithium hydride, etc., and separating the hydrazine compound from the reaction mixture. Further, it can be obtained by purification by salting out, precision distillation, chromatography, recrystallization and the like.
- any of these reducing agents is dangerous in handling, and the processing of the reducing agent residue and waste liquid after the reaction is complicated.
- the N—N bond is easily cleaved, and the yield of the hydrazine compound However, it is not satisfactory because it is not sufficient.
- a device for avoiding this problem is disclosed (for example, see Patent Document 8).
- Patent Document 8 is a method in which N 12-trososamine compound is reduced by thiourea dioxide and al force in an aqueous medium.
- the worker's hydrazine compound is removed. Exposure is unavoidable, and it is not suitable as an industrial production method for hydrazone compounds because it cannot completely suppress the breaking of NN bonds.
- Patent Document 6 Japanese Patent Laid-Open No. 5 9-3 9 8 60
- Patent Document ⁇ Japanese Patent Laid-Open No. 5-8-6 5 2 6 1
- Patent Document 8 Japanese Patent Laid-Open No. 1 2 2 4 3 3 Disclosure of Invention
- the present invention avoids worker exposure to N-ditrosamine compounds and hydrazine compounds as reaction intermediates leading to hydrazone compounds, does not generate reducing agent residues, and produces high-quality hydrazone compounds in high yield.
- the object is to provide a production method that can be synthesized.
- R 2 , R 3 and R 4 may be the same or different, and may be a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, a 2_propyl group, an n-butyl group, an isobutyl group, a secondary butyl group, Represents a primary butyl group, a methoxy group, an ethoxy group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group, and R and R 2 combine to form a ring. Or R 3 and R 4 may combine to form a ring.)
- reaction solution containing the N-ditrosamine compound represented by A step of applying a reduction to reduce the strength (wherein R 2 , R 3 and R 4 have the same meaning as in the general formula (1)), the reaction solution containing the N-ditrosamine compound represented by A step of applying a reduction to reduce the strength;
- R 5 , R 6 and R 7 may be the same or different, and may be a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, a 2-propyl group, an n-butyl group, an isobutyl group, or a secondary monobutyl group. Or a substituted or unsubstituted aryl group, or a substituted or unsubstituted aryl group).
- R 2 , R 3 , R 4 , R 6 R 6 and R 7 may be the same or different and may be a hydrogen atom, methyl group, ethyl group, n-propyl group, 2-propyl group, n- Represents a butyl group, an isoptyl group, a secondary butyl group, an evenly butyl group, a methoxy group, an ethoxy group, a substituted or unsubstituted aralkyl group or a substituted or unsubstituted aryl group, and R R 2 may be bonded to form a ring, or 3 ⁇ 3 and R 4 may be bonded to form a ring.)).
- the present invention provides a hydrazone compound effective as a photoconductive material used for an electrophotographic photosensitive member, while taking out a hydrazine compound as a reaction intermediate from a reactor while ensuring a high level of safety for workers. Therefore, the present invention provides a production method that can be synthesized with high quality and high yield with little waste, and its industrial value is great.
- the aralkyl groups of R i, R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are benzyl group, phenethyl.
- aryl groups include phenyl and naphthyl groups. These substituents include halogen atoms (fluorine, chlorine, bromine), hydroxy groups, vinyl groups, trifluoromethyl groups, methyl groups, ethyl groups, n-propyl groups, 2-propyl groups, n-butyl groups.
- Alkyl groups such as til group, isobutyl group, secondary butyl group and evening butyl group, alkoxy groups such as methoxy group and ethoxy group, or the above aryl group.
- the N-nitrosation of the amine compound represented by the general formula (1) in the present invention is performed by adding an acid and an aqueous solution of sodium nitrite in a mixed solvent of water and a water-miscible organic solvent.
- water-miscible organic solvents include methanol, ethanol, 2-propanol, ethylene glycol and other alcohols, dioxane, trioxane, ethylene glycol dimethyl ether, tetrahydrofuran and the like.
- ethers include inorganic acids such as hydrochloric acid and dilute sulfuric acid, and organic acids such as formic acid and acetic acid.
- N-nitrosamine compound represented by the general formula (2) is used in the reaction solution without taking it out.
- the reduction reaction of the N-nitrosamine compound represented by the general formula (2) is carried out by adding Al force and thiourea dioxide to the above reaction solution.
- Sodium hydroxide is suitable as the usable alkali power, but is not limited to this, and lithium hydroxide, potassium hydroxide, and the like can also be used.
- the amount of thiourea dioxide and alkali used is 2.0 to 2.5 moles of thiourea dioxide per mole of the amine compound represented by the general formula (1), and alkali is used for N-nitrosation. In addition to the amount required for neutralization of the acid, it is appropriate to use it in the range of 4.5 to 6.0 mol.
- the cleavage of the N—N bond occurs as in the case of the other reducing agents described above.
- this is not due to the action of the reducing agent itself, but is represented by the generated general formula (3).
- This is due to the reaction between the hydrazine compound and the N-nitrosamine compound represented by the general formula (2). Therefore, the definition of the total amount of the mixed solvent used for the nitrosation reaction is particularly important from the viewpoint of suppressing the by-production of the amine compound represented by the general formula (1).
- the total amount of the mixed solvent is suitably in the range of 14 to 31 times the weight of thiourea dioxide, and the proportion of water is suitably in the range of 30 to 60% by weight of the mixed solvent.
- the amine compound represented by the general formula (1) is remarkably produced as a by-product, so that the yield and quality of the final product hydrazone compound are lowered.
- the by-product of the amine compound represented by the general formula (1) is temperature-dependent, and the reduction reaction has a temperature in the range of 35 to 45 ° C, preferably in the range of 38 to 43 ° C. It is appropriate to do this. When the reaction temperature is 45 ° C or higher, a significant by-product of the amine compound represented by the general formula (1) is generated. On the other hand, when the reaction temperature is 35 ° C or lower, the reaction rate is remarkably reduced.
- a solution of the hydrazine compound represented by the general formula (3) is obtained by distilling off the water-miscible organic solvent after completion of the reduction reaction and extracting the residue using an appropriate organic solvent.
- an organic solvent having a specific gravity of less than 1.0 that dissolves the hydrazine compound represented by the general formula (3) and the carbonyl compound represented by the general formula (4) and is immiscible with water is suitable.
- Specific examples include ethers such as jetyl ether and isopropyl ether, and aromatic hydrocarbons such as toluene and xylene.
- the hydrazone compound which is the final product in the present invention, can be obtained by reacting the extract of the hydrazine compound represented by the above general formula (3) with a strong sulfonyl compound represented by the general formula (4).
- This dehydration condensation reaction can be promoted by adding an acid as generally known.
- an inorganic acid such as hydrochloric acid or dilute sulfuric acid, or an organic acid such as acetic acid is used.
- the reaction proceeds satisfactorily at room temperature without heating, but promotes the reaction It may be heated for this purpose. In either case, the reaction time is 1 to 5 hours.
- the precipitated crystals are filtered off, or if the crystals do not precipitate or the crystals are not sufficiently precipitated, the crystals formed by adding alcohols such as methanol and ethanol, hydrous alcohol, etc. are filtered off.
- the final target product can be taken out by filtering off a part of the organic solvent that has been distilled off under reduced pressure and dispersed with an alcohol such as methanol or ethanol, or a hydrous alcohol.
- Examples of the hydrazone compound produced by the production method of the present invention include the following. p —Jetylaminobenzaldehyde-diphenyl drazone, p —Diphenylaminobenz aldehyde-diphenyl hydrazone, p— (p — tril) Phenylamino benzaldehyde ⁇ diphenyl hydrazone, p —di (p—tril) Amidobenzaldehyde-diphenylhydrazone, p— (p—methoxyphenyl) Phenylaminobenzene-diphenylhydrazone, 2-methyl-4-dibenzylaminobenzaldehyde, di-diphenylhydrazone, p—diphenylaminobenzaldehyde (p — Tolyl) Hydrazone, p — Diphenylaminobens aldehyde bis (6-Tetralyl) hydrazone
- Example 5 To the toluene solution of 1,1-diphenylhydrazine obtained in Example 1, 28.0 g (89
- diphenylamine 1 6.9 g (1 0 0 mm o 1), 15.1 g (25 1 mmol) of acetic acid and 256 g of methanol were added and dissolved by stirring.
- 13.8 g (200 mmo 1) of sodium nitrite dissolved in 57 g of water was added to this was added 13.8 g (200 mmo 1) of sodium nitrite dissolved in 57 g of water, and the mixture was stirred at 15 to 20 ° C. for 8 hours.
- the mixture was stirred at 40 to 45 ° C for 3 hours.
- the method for producing a hydrazone compound according to the present invention is structurally unstable and
- the target hydrazone compound can be increased without removing any hydrazine compound, which is a reaction intermediate that may have a safety impact on workers due to its toxicity (mutagenicity), from the reactor. It is useful in that it can be obtained with high quality and high yield.
Description
Claims
Priority Applications (4)
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KR1020067027544A KR101180563B1 (ko) | 2004-06-29 | 2005-06-28 | 히드라존 화합물의 제조 방법 |
US11/571,399 US7884245B2 (en) | 2004-06-29 | 2005-06-28 | Process for producing hydrazone compound |
EP05755876.9A EP1762564B1 (en) | 2004-06-29 | 2005-06-28 | Process for producing hydrazone compound |
JP2006528872A JP4824564B2 (ja) | 2004-06-29 | 2005-06-28 | ヒドラゾン化合物の製造方法 |
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JP2004-191082 | 2004-06-29 | ||
JP2004191082 | 2004-06-29 |
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WO2006001537A1 true WO2006001537A1 (ja) | 2006-01-05 |
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PCT/JP2005/012275 WO2006001537A1 (ja) | 2004-06-29 | 2005-06-28 | ヒドラゾン化合物の製造方法 |
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US (1) | US7884245B2 (ja) |
EP (1) | EP1762564B1 (ja) |
JP (1) | JP4824564B2 (ja) |
KR (1) | KR101180563B1 (ja) |
CN (2) | CN103232364A (ja) |
TW (1) | TWI356817B (ja) |
WO (1) | WO2006001537A1 (ja) |
Cited By (1)
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EP2090576A1 (en) | 2008-02-01 | 2009-08-19 | Merz Pharma GmbH & Co.KGaA | 6-halo-pyrazolo[1,5-a]pyridines, a process for their preparation and their use as metabotropic glutamate receptor (mGluR) modulators |
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US11338983B2 (en) | 2014-08-22 | 2022-05-24 | Plastipak Packaging, Inc. | Oxygen scavenging compositions, articles containing same, and methods of their use |
CN106366017A (zh) * | 2016-08-16 | 2017-02-01 | 天津大学 | 9‑蒽甲醛‑1,1‑二苯基腙的制备方法 |
CN112341357B (zh) * | 2020-09-24 | 2023-08-08 | 国药集团化学试剂有限公司 | 一种4-甲氧基苯肼盐酸盐的制备方法 |
CN115160180A (zh) * | 2022-06-22 | 2022-10-11 | 广东海洋大学 | 一种香草醛缩2,4-二硝基苯腙的绿色合成法 |
Citations (2)
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JPS5865261A (ja) * | 1981-10-13 | 1983-04-18 | Canon Inc | ヒドラゾン化合物の合成法 |
JPH01224333A (ja) * | 1988-03-01 | 1989-09-07 | Inui Kk | N,n−ジ置換ヒドラジンの製造法 |
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DE2758027A1 (de) * | 1977-12-24 | 1979-06-28 | Bayer Ag | Verfahren zur herstellung von hydrazinen |
DE3029742A1 (de) * | 1980-08-06 | 1982-03-04 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von n-nitroso-diphenylamin |
US4313002A (en) * | 1980-10-29 | 1982-01-26 | Uop Inc. | Preparation of p-aminodiphenylamines |
JPS57154162A (en) * | 1981-03-16 | 1982-09-22 | Ricoh Co Ltd | Novel hydrazone compound and its preparation |
JPS5939860A (ja) * | 1982-08-31 | 1984-03-05 | Canon Inc | ヒドラゾン化合物の製造法 |
JPH06234720A (ja) * | 1993-02-09 | 1994-08-23 | Mitsubishi Gas Chem Co Inc | ヒドラゾン構造を有するジヒドロキシ化合物およびその製造法 |
-
2005
- 2005-06-28 CN CN2013100938794A patent/CN103232364A/zh active Pending
- 2005-06-28 JP JP2006528872A patent/JP4824564B2/ja not_active Expired - Fee Related
- 2005-06-28 KR KR1020067027544A patent/KR101180563B1/ko not_active IP Right Cessation
- 2005-06-28 WO PCT/JP2005/012275 patent/WO2006001537A1/ja not_active Application Discontinuation
- 2005-06-28 CN CNA2005800215426A patent/CN1976896A/zh active Pending
- 2005-06-28 US US11/571,399 patent/US7884245B2/en not_active Expired - Fee Related
- 2005-06-28 EP EP05755876.9A patent/EP1762564B1/en not_active Expired - Fee Related
- 2005-06-29 TW TW094121816A patent/TWI356817B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5865261A (ja) * | 1981-10-13 | 1983-04-18 | Canon Inc | ヒドラゾン化合物の合成法 |
JPH01224333A (ja) * | 1988-03-01 | 1989-09-07 | Inui Kk | N,n−ジ置換ヒドラジンの製造法 |
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Cited By (1)
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EP2090576A1 (en) | 2008-02-01 | 2009-08-19 | Merz Pharma GmbH & Co.KGaA | 6-halo-pyrazolo[1,5-a]pyridines, a process for their preparation and their use as metabotropic glutamate receptor (mGluR) modulators |
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JP4824564B2 (ja) | 2011-11-30 |
KR20070036080A (ko) | 2007-04-02 |
KR101180563B1 (ko) | 2012-09-06 |
CN1976896A (zh) | 2007-06-06 |
EP1762564A4 (en) | 2008-05-28 |
JPWO2006001537A1 (ja) | 2008-04-17 |
EP1762564B1 (en) | 2013-12-25 |
TWI356817B (en) | 2012-01-21 |
US7884245B2 (en) | 2011-02-08 |
TW200621717A (en) | 2006-07-01 |
EP1762564A1 (en) | 2007-03-14 |
US20080015387A1 (en) | 2008-01-17 |
CN103232364A (zh) | 2013-08-07 |
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