WO2005096622A1 - 受光部および固体撮像装置 - Google Patents
受光部および固体撮像装置 Download PDFInfo
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- WO2005096622A1 WO2005096622A1 PCT/JP2005/006301 JP2005006301W WO2005096622A1 WO 2005096622 A1 WO2005096622 A1 WO 2005096622A1 JP 2005006301 W JP2005006301 W JP 2005006301W WO 2005096622 A1 WO2005096622 A1 WO 2005096622A1
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- 239000003990 capacitor Substances 0.000 claims abstract description 73
- 230000003321 amplification Effects 0.000 claims abstract description 11
- 238000003199 nucleic acid amplification method Methods 0.000 claims abstract description 11
- 238000003384 imaging method Methods 0.000 claims description 39
- 230000010354 integration Effects 0.000 claims description 31
- 238000005513 bias potential Methods 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 3
- 238000001514 detection method Methods 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 15
- 230000000875 corresponding effect Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 10
- 229920006395 saturated elastomer Polymers 0.000 description 7
- 238000007599 discharging Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/571—Control of the dynamic range involving a non-linear response
- H04N25/575—Control of the dynamic range involving a non-linear response with a response composed of multiple slopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
- G01J1/46—Electric circuits using a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/40—Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled
- H04N25/46—Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled by combining or binning pixels
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/58—Control of the dynamic range involving two or more exposures
- H04N25/581—Control of the dynamic range involving two or more exposures acquired simultaneously
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/58—Control of the dynamic range involving two or more exposures
- H04N25/581—Control of the dynamic range involving two or more exposures acquired simultaneously
- H04N25/583—Control of the dynamic range involving two or more exposures acquired simultaneously with different integration times
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/59—Control of the dynamic range by controlling the amount of charge storable in the pixel, e.g. modification of the charge conversion ratio of the floating node capacitance
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/60—Noise processing, e.g. detecting, correcting, reducing or removing noise
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/766—Addressed sensors, e.g. MOS or CMOS sensors comprising control or output lines used for a plurality of functions, e.g. for pixel output, driving, reset or power
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
- H04N25/771—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising storage means other than floating diffusion
Definitions
- the present invention relates to a light receiving unit and a solid-state imaging device.
- a solid-state imaging device includes a light detection unit in which a plurality of light receiving units are arranged one-dimensionally or two-dimensionally, and converts an electric signal value representing an incident intensity to the light receiving unit at each pixel position into a light receiving unit. And an image can be captured based on the electric signal value.
- a solid-state imaging device even when the difference in the amount of incident light between pixel positions is large (that is, when the contrast of the image to be imaged is high), an image with excellent contrast can be obtained by imaging. Required.
- the photosensor circuit disclosed in Patent Document 1 includes a photodiode as a light receiving unit, and accumulates a charge generated due to light incident on the photodiode in a capacitance unit in an integration circuit. A voltage corresponding to the amount of accumulated charge is output from the integration circuit. Further, in this solid-state imaging device, the capacitance value of the capacitance section in the integrating circuit is variable, thereby expanding the dynamic range of light detection. By using the technology disclosed in Patent Document 1 in a solid-state imaging device, a solid-state imaging device capable of obtaining an image with excellent contrast by imaging may be realized.
- Patent Document 1 Japanese Patent No. 3146502
- the light receiving unit includes: (1) a photodiode that generates an amount of electric charge according to the intensity of incident light; (2) a first capacitance unit and a second capacitance unit that respectively accumulate electric charge; (3) A gate terminal is connected to one or both of the first capacitance unit and the second capacitance unit, and the gate terminal is stored in one of the first capacitance unit and the second capacitance unit connected to the gate terminal. (4) The charge generated by the photodiode is transferred to the first capacitor via the first switch, and the second capacitor is transferred via the second switch. (5) Discharge transistor that initializes the charge of each of the first and second capacitance units, and (6) Amplification transistor force Outputs the output voltage selectively. And a selection transistor.
- This light receiving section is provided with a first capacitance section and a second capacitance section for accumulating electric charge, respectively, and the electric charge of each of the first capacitance section and the second capacitance section is initialized by a discharging transistor.
- the charge generated in the photodiode due to the incidence of light is transferred to the first capacitance section via the first switch via the transfer transistor, and to the second capacitance section via the second switch.
- the first capacitor and / or the second capacitor are connected to the gate terminal of the amplifying transistor and stored in the first capacitor and the second capacitor connected to the gate terminal. A voltage corresponding to the amount of the charged electric charge is output via the amplification transistor and the selection transistor.
- the solid-state imaging device includes: (1) MXN sections A to A arranged one-dimensionally or two-dimensionally, and K sections A in the m-th row and the n-th column.
- each of the K light receiving units included in the section A is output from each of the K light receiving units and held in the holding unit.
- M and N are integers of 1 or more, at least one of M and N is an integer of 2 or more, K is an integer of 2 or more, and m is any integer of 1 or more and M or less. , N is any integer from 1 to N.
- m, n are integers of 1 or more, at least one of M and N is an integer of 2 or more, K is an integer of 2 or more, and m is any integer of 1 or more and M or less.
- N is any integer from 1 to N.
- a light receiving unit is arranged.
- the amplifying transistor power also passes through the selection transistor.
- the second voltage is held by the holding unit.
- the arithmetic unit outputs m, n output from each of the K light receiving units included in section A.
- the addition value of the first voltage held in the holding unit is calculated and output, and the second voltage of the second voltage held and held in the holding unit is output from each of the K light receiving units included in m and n in section A.
- the average value is calculated and output.
- the selection unit inputs the addition value and the average value output from the calculation unit for each section A, and adds the addition values m and n.
- the added value is selected and output. Otherwise, the average value is selected and output.
- the solid-state imaging device provides (1) K light receiving units m and n included in section A, respectively.
- An input terminal is connected to the third end of the connection switching unit, and the first terminal and the first end of the connection switching unit are connected from the K light receiving units included in the section A to the input terminal.
- the integrated value output from the integrating circuit card is input, and if the absolute value of the added value is smaller than the first predetermined value, the added value is output. If the absolute value of the added value is greater than or equal to the first predetermined value, It is preferable to further include a selection unit that outputs an average value when the absolute value of the average value is smaller than the second predetermined value, and outputs an integrated value when none of these values is used.
- the electric charge generated in the above is input to the integration circuit via the connection switching unit, and is accumulated in the capacitor of the integration circuit. Then, an integration value corresponding to the amount of the accumulated charge is output as the integration circuit power. If a selection unit is further provided, this selection unit
- any one of the added value and average value output by the operation unit and the integrated value output by the integration circuit is selected and output.
- the solid-state imaging device according to the present invention can obtain an image having both excellent contrast and excellent S / N ratio.
- FIG. 1 is a schematic configuration diagram of a solid-state imaging device 1 according to the present embodiment.
- FIG. 2 is a diagram showing a section A and a storage section in the photodetection section 10 of the solid-state imaging device 1 according to the present embodiment.
- FIG. 5 is a configuration diagram of a holding circuit H in an m, n holding unit 20.
- FIG. 3 is a diagram illustrating light reception of a section A in the light detection unit 10 of the solid-state imaging device 1 according to the present embodiment.
- FIG. 9 is a circuit diagram of an m and n section a and a partial holding circuit h of a holding circuit H in the holding section 20.
- FIG. 4 is a sectional view of a photodiode PD.
- FIG. 5 is an explanatory diagram of a calculation unit 30 of the solid-state imaging device 1 according to the present embodiment.
- FIG. 6 is a circuit diagram of an integration circuit 40 and a CDS circuit 50 of the solid-state imaging device 1 according to the present embodiment.
- FIG. 7 is a timing chart illustrating the operation of the solid-state imaging device 1 according to the present embodiment.
- FIG. 8 is a timing chart illustrating the operation of the solid-state imaging device 1 according to the present embodiment.
- FIG. 1 is a schematic configuration diagram of a solid-state imaging device 1 according to the present embodiment.
- the solid-state imaging device 1 shown in FIG. 1 includes a light detection unit 10, a holding unit 20, an operation unit 30, an integration circuit 40, a CDS circuit 50, a selection unit 60, an AZD conversion circuit 70, and a bit shift circuit 80. Be prepared. In this figure, wires are shown between the elements. The number of these wires does not always match the actual number of wires.
- the light detection unit 10 includes M X N sections A to A that are arranged one-dimensionally or two-dimensionally in a substantially rectangular area as a whole and have a common configuration.
- Block A is row m
- M and N are integers of 1 or more, at least one of M and N is an integer of 2 or more, K is an integer of 2 or more, and m is any integer of 1 or more and M or less. Where n is any integer from 1 to N.
- the holding unit 20 includes N holding circuits H to H having a common configuration.
- Each holding circuit H is N holding circuits H to H having a common configuration.
- the arithmetic unit 30 is held and output by each of the ⁇ holding circuits ⁇ to ⁇ in the holding unit 20.
- the obtained voltage is input, a required operation is performed based on the input voltage, and a voltage representing the result of the operation is output.
- Only one integration circuit 40 is provided for ⁇ ⁇ ⁇ ⁇ sections A to A in the light detection unit 10.
- the integrating circuit 40 includes K receiving sections included in each section ⁇ in the light detecting section 10.
- the charge output from the optical unit is stored in a capacitor, and a voltage corresponding to the amount of the stored charge is output.
- a CDS (Correlated Double Sampling) circuit 50 inputs a voltage output from the integration circuit and outputs a voltage corresponding to a difference between input voltages at a certain time and another time.
- the selection unit 60 receives voltages output from the calculation unit 30 and the CDS circuit 50, selects one of the voltages, and outputs the selected voltage.
- the AZD conversion circuit 70 receives the voltage (analog value) output from the selection unit 60, converts this voltage into a digital value, and outputs this digital value.
- the bit shift circuit 80 receives the digital value output from the AZD conversion circuit 70, shifts the digital value by the required number of bits according to which is selected by the selector 60, and outputs the result.
- FIG. 2 is a diagram showing a section A in the light detection unit 10 of the solid-state imaging device 1 according to the present embodiment.
- FIG. 4 is a configuration diagram of a holding circuit H in a holding unit 20.
- FIG. Each partition A has a shared configuration
- the circuit H includes 15 partial holding circuits h to h having a common configuration. Each retention time n 1,1 3,5
- the partial holding circuit h in the path H is provided corresponding to each of the light receiving units a of the M sections A to A ⁇ ,]], ⁇ , ⁇ in the n-th column in the light detection unit 10. I have. Where i is any number from 1 to 3
- FIG. 3 shows a light receiving section a of a section A in the light detecting section 10 of the solid-state imaging device 1 according to the present embodiment.
- FIG. 3 is a circuit diagram of a partial holding circuit h of a holding circuit H in the holding unit 20.
- Part a is a photodiode PD that generates an amount of electric charge according to the incident light intensity, and The first and second capacitors C and C, and the first and second capacitors C and C
- an amplifying transistor T having a gate terminal connected to both or one of C and C;
- the gate terminal of the amplifying transistor T is directly connected to the first capacitance unit C, and the first switch
- the drain terminal of the transistor T is set to the bias potential V.
- the 1 dd 1 source terminal is connected to the drain terminal of the selection transistor ⁇ . Tran for selection
- the source terminal of the transistor T is connected to the wiring L. 1st capacity part C and 2nd capacity
- Each of 12 11 12 may be a parasitic capacitance, or may be a capacitance portion intentionally created.
- the drain terminal of the transfer transistor ⁇ is connected to the source terminal of the discharge transistor ⁇
- the source terminal of transistor ⁇ is connected to the power source terminal of photodiode PD.
- the Anode terminal of the photodiode PD is grounded.
- the transfer transistor T inputs a transfer control signal Trans to its gate terminal, and
- the transistor T inputs a discharge control signal Reset to its gate terminal, and outputs the discharge control signal.
- the selection transistor T has its gate terminal connected to the m-th row
- the voltage output from the amplification transistor T is output to the wiring L.
- Each wiring L is connected to each of the M sections A to A in the n-th column in the light detection unit 10 by receiving ⁇ , ⁇ ,] ⁇ , ⁇ ⁇ , ⁇ It is connected to the selection transistor T of the optical section a.
- a constant current source is connected to each wire L. ij n, i, j
- the switch SW functions as a connection switching unit provided for each light receiving unit a, and has a first end connected to the discharge transistor T of the light receiving unit a, and a first end of the light receiving unit a.
- the potential V is input to the discharging transistor T.
- the switch SW is electrically connected between the first end and the bias 3 ⁇ ,] third end, and each of the discharge control signal Reset and the transfer control signal Trans is at a high level, the light receiving unit a Triggered by photodiode PD inside
- the generated charge is input to the integration circuit 40.
- each of the partial holding circuits h includes switches SW to SW and keys i, j 2126 capacitors C to C.
- Each partial holding circuit h has three capacitors corresponding to capacitors C to C.
- One voltage can be held.
- a capacitor C is provided between the connection point between switch SW and switch SW and the ground potential.
- the voltage V held in the capacitor C is output to the wiring L.
- One end of the switch SW and one end of the switch SW are connected to each other.
- a capacitor C is provided between the connection point between switch SW and switch SW and the ground potential.
- the voltage V held in the capacitor C is output to the wiring L.
- a capacitor C is provided between the connection point between switch SW and switch SW and the ground potential.
- the voltage V held in the capacitor C is output to the wiring L.
- FIG. 4 is a cross-sectional view of the photodiode PD (see FIG. 3).
- Each photodiode PD is preferably of an embedded type as shown in this figure. That is, these photodiodes have an i-type second semiconductor region 102 on a p-type first semiconductor region 101 and a ⁇ + -type third semiconductor region 103 on this second semiconductor region 102. Then, the first semiconductor region 101 and the second semiconductor region 102 form a ⁇ junction, and the second semiconductor region 102 and the third semiconductor region 103 form a ⁇ junction. Further, an insulating layer 104 is provided over these semiconductor regions, and the second semiconductor region 102 is electrically connected to the metal layer 105. Thus, when the photodiode is a buried type, the occurrence of a leak current is suppressed, and the SZN ratio of light detection is excellent.
- FIG. 5 is an explanatory diagram of the calculation unit 30 of the solid-state imaging device 1 according to the present embodiment.
- the arithmetic unit 30 is connected to the 15 partial holding circuits h (see FIG. 3) in the holding unit circuit H via the wirings ⁇ L.
- Each of them has an adder 31 and an averaging unit 32.
- the adder 31 outputs, for each MXN section A in the photodetector 10 (see Fig. 1), the output from the 15 light receiving sections a (see Fig. 2) in the section Am, nm, n. Then, the addition value of the voltage V held in the capacitor C of each of the 15 partial holding circuits h in the holding circuit H is calculated.
- the value V is obtained for each MXN section A in the photodetector 10 and is expressed by the following equation (1).
- the averaging unit 32 is output from the 15 light receiving units a (see FIG. 2) in each of the MXN sections A in the photodetecting unit 10 (see FIG. 1) (see FIG. 1). Calculates the average value of the voltage V held in the capacitor C of each of the 15 partial holding circuits h, and outputs the average value V. At this time, the average value of the voltage V held in the capacitor C is subtracted from the average value of the voltage V held in the capacitor C. That is, the average value V is obtained for each of the M X N blocks A in the light detection unit 10 and is represented by the following equation (2).
- FIG. 6 is a circuit diagram of the integration circuit 40 and the CDS circuit 50 of the solid-state imaging device 1 according to the present embodiment.
- the integration circuit 40 includes an amplifier A, a capacitor C, and a switch SW.
- the non-inverting input terminal of amplifier A is grounded.
- the inverting input terminal of amplifier A is connected to wiring L.
- the capacitor C and the switch SW are connected in parallel with each other, and are provided between the inverting input terminal and the output terminal of the amplifier A.
- the switch SW when the switch SW is closed, the capacitor C is discharged, and the output voltage is initialized.
- the switch SW is open, the electric charge flowing through the wiring is stored in the capacitor C, and a voltage V corresponding to the amount of the electric charge stored in the capacitor C is output.
- the CDS circuit 50 has switches SW and SW, a capacitor C, and an amplifier A. One end of the capacitor C is grounded via the switch SW, and is connected to the input terminal of the amplifier A. The other end of the capacitor C is connected to the output terminal of the amplifier A of the integrating circuit 40 via the switch SW.
- the switch SW Changes to the closed state and opens at the second time, and switches to the open state at the second time.
- the selection unit 60 receives the addition value V and the average value V sum mean output from the calculation unit 30 and receives the voltage V output from the CDS circuit 50 (output from the integration circuit 40).
- the thl mean th2 selection unit 60 outputs the average value V.
- the selector 60 If neither of them is selected, the selector 60 outputs the integrated value V (that is, the voltage V) as mt cds. That is, the voltage V output from the selection unit 60 is expressed by the following equation (3). Also out
- Any one of the addition value V, the average value V, and the voltage V is selected from the selection unit 60.
- the AZD conversion circuit 70 receives the voltage V output from the selection unit 60,
- the shift circuit 80 does not bit shift the digital value output from the AZD conversion circuit 70. If the voltage V output from the selection unit 60 is the average value V,
- the shift circuit 80 shifts the digital value output from the AZD conversion circuit 70 by p bits.
- the bit out cds When the voltage V output from the selection unit 60 is the voltage V, the bit out cds
- the shift circuit 80 increases the digital value output from the AZD conversion circuit 70 by q bits. Shift (but p then q).
- FIGS. 7 and 8 are timing charts illustrating the operation of the solid-state imaging device 1 according to the present embodiment. The operation described below is performed based on various control signals output from a control unit (not shown).
- the switch SW provided for each light receiving section a is set so that the bias potential V is input to the discharging transistor T.
- FIG. 7 shows, in order of the upward force, the gate terminal of the discharge transistor T (see FIG. 3) of the light receiving section a.
- the operation shown in the figure is performed for all the light receiving sections a included in all the sections A in the light detection section 10.
- each of the discharge control signal Reset and the transfer control signal Trans goes low.
- the switch SW opens and closes at time t after closing and then
- each light receiving unit a the above operation is performed, so that the time t to the time t
- the charge generated by the photodiode PD by 13 is accumulated in the first capacitor C, and from time t
- the charge generated by the photodiode PD by time t is accumulated in the second capacitor C.
- the capacitance value of the first capacitance portion C is smaller and stronger than the junction capacitance portion of the photodiode PD.
- FIG. 8 shows, in order of the upward force, the gate terminal of the discharge transistor T (see FIG. 3) of the light receiving section a.
- the opening / closing operation of the switch SW on the road h and the opening / closing operation i, j 22 i, j 23 of the switch SW of the partial holding circuit h are shown.
- the opening / closing operation is performed for all m, lm, N included in the N sections A to A in the m-th row in the light detection unit 10.
- discharge control is performed for a certain period from time t.
- the first capacitor C is connected to the gate terminal of the amplification transistor T.
- the voltage V output to the wiring L via the line 12 4 is equal to the sum of the amounts of the electric charges stored in the first and second capacitors C and C, respectively. It depends. During this period, when the switch SW of the partial holding circuit h is closed and then opened, the capacitor C of the partial holding circuit h is connected to the capacitor C.
- the voltage V of 22 i, j 22 is held.
- This noise component includes fixed pattern noise generated by variation in the threshold value of the transistor ⁇ of each pixel, and the opening of the discharging transistor ⁇ of each pixel.
- kTC noise is generated at the time of emission. During this period, when the switch SW of the partial holding circuit h is closed and then opened, the key of the partial holding circuit h is opened.
- the holding circuits H 1 to H 2 in the holding unit 20 are sequentially turned into the partial holding times.
- U 24 26 U 1, U 3, i, j Output to lines L to L. And an operation unit to which these voltages V, V, and V are input.
- the addition value V and the average value V output from the calculation unit 30 are input to the selection unit 60.
- the first capacitance section C saturates and m, n ⁇ ,] 11
- the addition value V is selected as the voltage V output from the selector 60.
- the average value V is selected as the voltage V output from the selector 60.
- the light receiving sensitivity when the addition value V is output from the selection unit 60 is ⁇ , and the selection unit 6
- K 15. 1st capacity part C and 2nd capacity
- this ratio can be set to, for example, 64: 1.
- both the first capacitance part C and the second capacitance part C may be saturated. This i, j 11 12
- the discharge control signal Re is applied to each light receiving section a included in the section A.
- the set and the transfer control signal Trans are set to the high level, and the charge generated by the photodiode PD is input to the integration circuit 40 via the switch SW and the wiring L.
- the integration circuit 40 4 4 int is output from the integration circuit 40. Further, in the CDS circuit 50, the voltage output from the integration circuit 40 is input over the charge accumulation period in the integration circuit 40, and the charge accumulation period The voltage V corresponding to the difference between the voltages output from the integration circuit 40 is output at each of the initial time and the end time.
- the capacitor c can be hardly saturated.
- the average value V is output as the voltage V output from the selection section 60. Selected.
- the voltage V is selected as the voltage V output from the selection unit 60. That is, select out cds
- the voltage V output from the selector 60 is expressed by the above equation (3).
- the voltage V output from the selection unit 60 is AZD-converted by the AZD conversion circuit 70 and
- a digital value corresponding to the voltage V is output from the AZD conversion circuit 70. This AZD conversion out
- the digital value output from the circuit 70 is shifted by the bit shift circuit 80 by the required number of bits in accordance with which is selected in the selector 60.
- the digital value output from the AZD conversion circuit 70 is not bit-shifted.
- the digital value output from the AZD conversion circuit 70 is shifted upward by ⁇ bits.
- the digital value output from the AZD conversion circuit 70 is shifted upward by 3 ⁇ 4 bits.
- p and q are the capacitance value of the first capacitance portion C of each light receiving portion a, the sum of the capacitance values of the first capacitance portion C and the second capacitance portion C of each light receiving portion a, and the division A Included receiver a
- the digital value output from the bit shift circuit 80 Represents the amount of light incident on each section A, regardless of whether or not is selected.
- the solid-state imaging device 1 reduces the amount of light incident on each section A.
- the solid-state imaging device 1 does not amplify the signal charge output from the photodiode together with the noise together with the noise by the integrating circuit when the incident light power s is small.
- the charge generated by the PD is
- Transistor ⁇ and the selection transistor ⁇ output through the source follower circuit.
- the capacitance value of the capacitance section that accumulates charges in the integration circuit 40 can be set in multiple stages. By doing so, the dynamic range of light detection can be further increased.
- the present invention can be used for a light receiving unit and a solid-state imaging device.
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- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05727978A EP1732315A4 (en) | 2004-04-01 | 2005-03-31 | LIGHT RECEPTION PART AND TUBE-FREE IMAGE BUILDING BLOCK |
US11/291,999 US20060158542A1 (en) | 2004-04-01 | 2005-12-02 | Photosensitive part and solid-state image pickup device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004109301A JP4421353B2 (ja) | 2004-04-01 | 2004-04-01 | 固体撮像装置 |
JP2004-109301 | 2004-04-01 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/291,999 Continuation-In-Part US20060158542A1 (en) | 2004-04-01 | 2005-12-02 | Photosensitive part and solid-state image pickup device |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005096622A1 true WO2005096622A1 (ja) | 2005-10-13 |
Family
ID=35064153
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/006301 WO2005096622A1 (ja) | 2004-04-01 | 2005-03-31 | 受光部および固体撮像装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060158542A1 (ja) |
EP (1) | EP1732315A4 (ja) |
JP (1) | JP4421353B2 (ja) |
KR (1) | KR20060130547A (ja) |
CN (1) | CN100409671C (ja) |
TW (1) | TW200537080A (ja) |
WO (1) | WO2005096622A1 (ja) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100794314B1 (ko) * | 2005-12-29 | 2008-01-11 | 엠텍비젼 주식회사 | 저장체를 포함하는 이미지 센서 및 이를 이용한 이미지데이터 생성 방법 |
US7916199B2 (en) | 2006-02-02 | 2011-03-29 | National University Corporation Nara | Photo detection device |
JP2008042826A (ja) * | 2006-08-10 | 2008-02-21 | Matsushita Electric Ind Co Ltd | 固体撮像素子およびカメラ |
JP2008042828A (ja) * | 2006-08-10 | 2008-02-21 | Matsushita Electric Ind Co Ltd | 固体撮像素子及びその駆動方法。 |
JP4959449B2 (ja) * | 2006-12-27 | 2012-06-20 | 三星モバイルディスプレイ株式會社 | 周辺光感知回路及びこれを有する平板表示装置 |
JP5259132B2 (ja) * | 2006-12-27 | 2013-08-07 | 三星ディスプレイ株式會社 | 周辺光感知回路及びこれを有する平板表示装置 |
DE102007045448A1 (de) * | 2007-09-24 | 2009-04-02 | Arnold & Richter Cine Technik Gmbh & Co. Betriebs Kg | Bildsensor |
KR100887887B1 (ko) * | 2007-11-06 | 2009-03-06 | 주식회사 동부하이텍 | 이미지센서 |
KR100957947B1 (ko) | 2008-01-09 | 2010-05-13 | 삼성모바일디스플레이주식회사 | 광센서 및 그를 이용한 평판표시장치 |
KR100957948B1 (ko) * | 2008-02-19 | 2010-05-13 | 삼성모바일디스플레이주식회사 | 광센서 및 그를 이용한 평판표시장치 |
FR2929055B1 (fr) * | 2008-03-19 | 2010-05-28 | Commissariat Energie Atomique | Systeme de conversion de charges en tension et procede de pilotage d'un tel systeme |
JP5155759B2 (ja) * | 2008-07-17 | 2013-03-06 | 浜松ホトニクス株式会社 | 固体撮像装置 |
KR101010202B1 (ko) * | 2008-10-09 | 2011-01-21 | 송성근 | 태양전지를 구비한 자전거 |
WO2010116974A1 (ja) | 2009-04-07 | 2010-10-14 | ローム株式会社 | 光電変換装置および撮像装置 |
US8994843B2 (en) | 2010-09-01 | 2015-03-31 | Qualcomm Incorporated | High dynamic range image sensor |
JP5476319B2 (ja) | 2011-01-12 | 2014-04-23 | 浜松ホトニクス株式会社 | 固体撮像装置および固体撮像装置の駆動方法 |
CN102523393B (zh) * | 2011-12-30 | 2014-02-26 | 中国科学院上海高等研究院 | 金属氧化物半导体图像传感器 |
CN102547159B (zh) * | 2012-02-16 | 2014-01-22 | 中国科学院上海高等研究院 | 高动态范围图像传感器及其控制方法 |
FR3018351B1 (fr) * | 2014-03-07 | 2016-04-01 | Soc Fr Detecteurs Infrarouges Sofradir | Circuit de detection de rayonnement lumineux |
JP6331674B2 (ja) * | 2014-05-13 | 2018-05-30 | 株式会社リコー | 光電変換素子、画像読取装置及び画像形成装置 |
JP2016111425A (ja) | 2014-12-03 | 2016-06-20 | ルネサスエレクトロニクス株式会社 | 撮像装置 |
JP2016139660A (ja) * | 2015-01-26 | 2016-08-04 | 株式会社東芝 | 固体撮像装置 |
US9819882B2 (en) * | 2015-06-05 | 2017-11-14 | Caeleste Cvba | Global shutter high dynamic range sensor |
CN107040732B (zh) * | 2016-02-03 | 2019-11-05 | 原相科技股份有限公司 | 影像感测电路及方法 |
JP6659447B2 (ja) * | 2016-05-02 | 2020-03-04 | 浜松ホトニクス株式会社 | 距離センサ |
US11343454B2 (en) * | 2019-08-16 | 2022-05-24 | Semiconductor Components Industries, Llc | Imaging systems and methods for performing pixel binning and variable integration for analog domain regional feature extraction |
GB2604099A (en) | 2021-02-15 | 2022-08-31 | Leonardo UK Ltd | An image sensing device |
KR20240042621A (ko) | 2021-08-10 | 2024-04-02 | 에이엠에스 센서스 유에스에이 인코포레이티드 | 복수의 장벽들, 이중 변환 이득 및 낮은 영역을 갖는 자체 교정 장벽 변조 픽셀 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08122149A (ja) * | 1994-10-24 | 1996-05-17 | Nissan Motor Co Ltd | イメージセンサ |
JPH08256293A (ja) * | 1995-03-17 | 1996-10-01 | Fujitsu Ltd | 固体撮像素子及び固体撮像ユニット並びに撮像カメラ |
JP2000165754A (ja) * | 1998-11-27 | 2000-06-16 | Canon Inc | 固体撮像装置および固体撮像装置の信号読出し方法 |
JP2000221005A (ja) * | 1999-01-29 | 2000-08-11 | Hamamatsu Photonics Kk | 固体撮像装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5705807A (en) * | 1994-10-24 | 1998-01-06 | Nissan Motor Co., Ltd. | Photo detecting apparatus for detecting reflected light from an object and excluding an external light componet from the reflected light |
US5769384A (en) * | 1996-01-25 | 1998-06-23 | Hewlett-Packard Company | Low differential light level photoreceptors |
KR100574535B1 (ko) * | 1997-11-07 | 2006-04-27 | 마츠시타 덴끼 산교 가부시키가이샤 | 광전변환장치 및 고체촬상소자 |
US6734907B1 (en) * | 1998-04-30 | 2004-05-11 | Minolta Co., Ltd. | Solid-state image pickup device with integration and amplification |
JP4397105B2 (ja) * | 1999-06-28 | 2010-01-13 | 富士通株式会社 | 固体撮像装置 |
JP2001285717A (ja) * | 2000-03-29 | 2001-10-12 | Toshiba Corp | 固体撮像装置 |
JP2002164751A (ja) * | 2000-11-28 | 2002-06-07 | Nec Corp | 進行波管増幅器 |
JP2002330349A (ja) * | 2001-04-26 | 2002-11-15 | Fujitsu Ltd | Xyアドレス型固体撮像装置 |
US7286174B1 (en) * | 2001-06-05 | 2007-10-23 | Dalsa, Inc. | Dual storage node pixel for CMOS sensor |
US20030076431A1 (en) * | 2001-10-24 | 2003-04-24 | Krymski Alexander I. | Image sensor with pixels having multiple capacitive storage elements |
US20040141079A1 (en) * | 2003-01-10 | 2004-07-22 | Matsushita Electric Industrial Co., Ltd. | Solid-state imaging device and camera using the same |
US20040246354A1 (en) * | 2003-06-04 | 2004-12-09 | Hongli Yang | CMOS image sensor having high speed sub sampling |
JP4268492B2 (ja) * | 2003-10-02 | 2009-05-27 | 浜松ホトニクス株式会社 | 光検出装置 |
JP4290071B2 (ja) * | 2004-06-02 | 2009-07-01 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
JP4229884B2 (ja) * | 2004-07-29 | 2009-02-25 | シャープ株式会社 | 増幅型固体撮像装置 |
-
2004
- 2004-04-01 JP JP2004109301A patent/JP4421353B2/ja not_active Expired - Fee Related
-
2005
- 2005-03-31 WO PCT/JP2005/006301 patent/WO2005096622A1/ja not_active Application Discontinuation
- 2005-03-31 CN CNB2005800006914A patent/CN100409671C/zh not_active Expired - Fee Related
- 2005-03-31 KR KR1020067006373A patent/KR20060130547A/ko not_active Application Discontinuation
- 2005-03-31 EP EP05727978A patent/EP1732315A4/en not_active Withdrawn
- 2005-04-01 TW TW094110491A patent/TW200537080A/zh unknown
- 2005-12-02 US US11/291,999 patent/US20060158542A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08122149A (ja) * | 1994-10-24 | 1996-05-17 | Nissan Motor Co Ltd | イメージセンサ |
JPH08256293A (ja) * | 1995-03-17 | 1996-10-01 | Fujitsu Ltd | 固体撮像素子及び固体撮像ユニット並びに撮像カメラ |
JP2000165754A (ja) * | 1998-11-27 | 2000-06-16 | Canon Inc | 固体撮像装置および固体撮像装置の信号読出し方法 |
JP2000221005A (ja) * | 1999-01-29 | 2000-08-11 | Hamamatsu Photonics Kk | 固体撮像装置 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1732315A4 * |
Also Published As
Publication number | Publication date |
---|---|
CN1820498A (zh) | 2006-08-16 |
TW200537080A (en) | 2005-11-16 |
EP1732315A1 (en) | 2006-12-13 |
EP1732315A4 (en) | 2011-11-30 |
JP2005295336A (ja) | 2005-10-20 |
US20060158542A1 (en) | 2006-07-20 |
KR20060130547A (ko) | 2006-12-19 |
CN100409671C (zh) | 2008-08-06 |
JP4421353B2 (ja) | 2010-02-24 |
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