WO2004096935A1 - 光触媒塗工液、光触媒膜および光触媒部材 - Google Patents
光触媒塗工液、光触媒膜および光触媒部材 Download PDFInfo
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- WO2004096935A1 WO2004096935A1 PCT/JP2004/005349 JP2004005349W WO2004096935A1 WO 2004096935 A1 WO2004096935 A1 WO 2004096935A1 JP 2004005349 W JP2004005349 W JP 2004005349W WO 2004096935 A1 WO2004096935 A1 WO 2004096935A1
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- Prior art keywords
- photocatalyst
- film
- group
- coating liquid
- coating
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- 239000011248 coating agent Substances 0.000 title claims abstract description 111
- 238000000576 coating method Methods 0.000 title claims abstract description 109
- 239000011941 photocatalyst Substances 0.000 title claims abstract description 109
- 239000007788 liquid Substances 0.000 title claims abstract description 50
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 53
- 230000001699 photocatalysis Effects 0.000 claims abstract description 53
- -1 titanium alkoxide Chemical class 0.000 claims abstract description 52
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 25
- 239000010936 titanium Substances 0.000 claims abstract description 22
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 22
- 239000011230 binding agent Substances 0.000 claims abstract description 18
- 239000007787 solid Substances 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims description 31
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 29
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 20
- 239000002131 composite material Substances 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 16
- 239000013078 crystal Substances 0.000 claims description 8
- 239000010419 fine particle Substances 0.000 claims description 5
- 239000000084 colloidal system Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 19
- 150000007530 organic bases Chemical class 0.000 abstract description 11
- 239000008119 colloidal silica Substances 0.000 abstract description 10
- 239000007859 condensation product Substances 0.000 abstract description 4
- 239000000243 solution Substances 0.000 description 50
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- 229910052751 metal Inorganic materials 0.000 description 25
- 239000002184 metal Substances 0.000 description 25
- 239000000463 material Substances 0.000 description 22
- 239000000178 monomer Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 19
- 150000001875 compounds Chemical class 0.000 description 17
- 238000012360 testing method Methods 0.000 description 16
- 230000007062 hydrolysis Effects 0.000 description 15
- 238000006460 hydrolysis reaction Methods 0.000 description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 10
- 229910017604 nitric acid Inorganic materials 0.000 description 10
- 125000004429 atom Chemical group 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 8
- 238000012423 maintenance Methods 0.000 description 8
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 229910044991 metal oxide Inorganic materials 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 229920000620 organic polymer Polymers 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229920002050 silicone resin Polymers 0.000 description 4
- 239000004408 titanium dioxide Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000003373 anti-fouling effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- RASBDVLERRNNLJ-UHFFFAOYSA-N CCCCO[Ti] Chemical group CCCCO[Ti] RASBDVLERRNNLJ-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 125000005595 acetylacetonate group Chemical group 0.000 description 2
- 239000011149 active material Substances 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 238000007611 bar coating method Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000012024 dehydrating agents Substances 0.000 description 2
- 238000007607 die coating method Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000007146 photocatalysis Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000007870 radical polymerization initiator Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000011973 solid acid Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- VOYADQIFGGIKAT-UHFFFAOYSA-N 1,3-dibutyl-4-hydroxy-2,6-dioxopyrimidine-5-carboximidamide Chemical compound CCCCn1c(O)c(C(N)=N)c(=O)n(CCCC)c1=O VOYADQIFGGIKAT-UHFFFAOYSA-N 0.000 description 1
- BOVQCIDBZXNFEJ-UHFFFAOYSA-N 1-chloro-3-ethenylbenzene Chemical compound ClC1=CC=CC(C=C)=C1 BOVQCIDBZXNFEJ-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- HWCUCNKPBMGSSC-UHFFFAOYSA-N 1-phenylethenyl acetate Chemical compound CC(=O)OC(=C)C1=CC=CC=C1 HWCUCNKPBMGSSC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- AWFYPPSBLUWMFQ-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(1,4,6,7-tetrahydropyrazolo[4,3-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=C2 AWFYPPSBLUWMFQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ISRGONDNXBCDBM-UHFFFAOYSA-N 2-chlorostyrene Chemical compound ClC1=CC=CC=C1C=C ISRGONDNXBCDBM-UHFFFAOYSA-N 0.000 description 1
- SNOJPWLNAMAYSX-UHFFFAOYSA-N 2-methylpropan-1-ol;titanium Chemical compound [Ti].CC(C)CO.CC(C)CO.CC(C)CO.CC(C)CO SNOJPWLNAMAYSX-UHFFFAOYSA-N 0.000 description 1
- GRWPYGBKJYICOO-UHFFFAOYSA-N 2-methylpropan-2-olate;titanium(4+) Chemical compound [Ti+4].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-] GRWPYGBKJYICOO-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- PRITYMRQBPHKEZ-UHFFFAOYSA-N C(CC)O[AlH]OCCC Chemical group C(CC)O[AlH]OCCC PRITYMRQBPHKEZ-UHFFFAOYSA-N 0.000 description 1
- VHQMSJOKQWPUSE-UHFFFAOYSA-N CCC(C)O[Zr](OC(C)CC)OC(C)CC Chemical group CCC(C)O[Zr](OC(C)CC)OC(C)CC VHQMSJOKQWPUSE-UHFFFAOYSA-N 0.000 description 1
- KFDGIFZCOIOUIL-UHFFFAOYSA-N CCCCO[Zr](OCCCC)OCCCC Chemical group CCCCO[Zr](OCCCC)OCCCC KFDGIFZCOIOUIL-UHFFFAOYSA-N 0.000 description 1
- TYXCJKRJSAWBMB-UHFFFAOYSA-N CCCO[Zr](OCCC)OCCC Chemical group CCCO[Zr](OCCC)OCCC TYXCJKRJSAWBMB-UHFFFAOYSA-N 0.000 description 1
- GJEZUWLUOLSPJE-UHFFFAOYSA-N C[Ti](C)C Chemical group C[Ti](C)C GJEZUWLUOLSPJE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 1
- IDCBOTIENDVCBQ-UHFFFAOYSA-N TEPP Chemical compound CCOP(=O)(OCC)OP(=O)(OCC)OCC IDCBOTIENDVCBQ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical group Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- JPUHCPXFQIXLMW-UHFFFAOYSA-N aluminium triethoxide Chemical compound CCO[Al](OCC)OCC JPUHCPXFQIXLMW-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- HWCXFDGMZPRMRX-UHFFFAOYSA-N butan-2-olate;titanium(4+) Chemical compound CCC(C)O[Ti](OC(C)CC)(OC(C)CC)OC(C)CC HWCXFDGMZPRMRX-UHFFFAOYSA-N 0.000 description 1
- XWQLYVIMMBLXPY-UHFFFAOYSA-N butan-2-yloxysilane Chemical compound CCC(C)O[SiH3] XWQLYVIMMBLXPY-UHFFFAOYSA-N 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- DYHSMQWCZLNWGO-UHFFFAOYSA-N di(propan-2-yloxy)alumane Chemical group CC(C)O[AlH]OC(C)C DYHSMQWCZLNWGO-UHFFFAOYSA-N 0.000 description 1
- RGHVMFZEKLHZBU-UHFFFAOYSA-N dibutoxyalumane Chemical group C(CCC)O[AlH]OCCCC RGHVMFZEKLHZBU-UHFFFAOYSA-N 0.000 description 1
- WCNOPGVIIPWIRJ-UHFFFAOYSA-N diethoxyalumane Chemical group C(C)O[AlH]OCC WCNOPGVIIPWIRJ-UHFFFAOYSA-N 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- NNRZFZBJEDXBPK-UHFFFAOYSA-N ethanolate;titanium(3+) Chemical group [Ti+3].CC[O-].CC[O-].CC[O-] NNRZFZBJEDXBPK-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- OZZYKXXGCOLLLO-TWTPFVCWSA-N ethyl (2e,4e)-hexa-2,4-dienoate Chemical compound CCOC(=O)\C=C\C=C\C OZZYKXXGCOLLLO-TWTPFVCWSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910003471 inorganic composite material Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- ITNVWQNWHXEMNS-UHFFFAOYSA-N methanolate;titanium(4+) Chemical compound [Ti+4].[O-]C.[O-]C.[O-]C.[O-]C ITNVWQNWHXEMNS-UHFFFAOYSA-N 0.000 description 1
- 125000006178 methyl benzyl group Chemical group 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- FGHSTPNOXKDLKU-UHFFFAOYSA-N nitric acid;hydrate Chemical compound O.O[N+]([O-])=O FGHSTPNOXKDLKU-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- BDDFDYYYZGKVEP-UHFFFAOYSA-N propan-1-olate;titanium(3+) Chemical group [Ti+3].CCC[O-].CCC[O-].CCC[O-] BDDFDYYYZGKVEP-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000003642 reactive oxygen metabolite Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000005315 stained glass Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- UVVUGWBBCDFNSD-UHFFFAOYSA-N tetraisocyanatosilane Chemical compound O=C=N[Si](N=C=O)(N=C=O)N=C=O UVVUGWBBCDFNSD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- BCLLLHFGVQKVKL-UHFFFAOYSA-N tetratert-butyl silicate Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C BCLLLHFGVQKVKL-UHFFFAOYSA-N 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 description 1
- MYWQGROTKMBNKN-UHFFFAOYSA-N tributoxyalumane Chemical compound [Al+3].CCCC[O-].CCCC[O-].CCCC[O-] MYWQGROTKMBNKN-UHFFFAOYSA-N 0.000 description 1
- DFJSZWHUOKADCX-UHFFFAOYSA-N triisocyanato(methyl)silane Chemical compound O=C=N[Si](C)(N=C=O)N=C=O DFJSZWHUOKADCX-UHFFFAOYSA-N 0.000 description 1
- UAEJRRZPRZCUBE-UHFFFAOYSA-N trimethoxyalumane Chemical compound [Al+3].[O-]C.[O-]C.[O-]C UAEJRRZPRZCUBE-UHFFFAOYSA-N 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
- DAOVYDBYKGXFOB-UHFFFAOYSA-N tris(2-methylpropoxy)alumane Chemical compound [Al+3].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-] DAOVYDBYKGXFOB-UHFFFAOYSA-N 0.000 description 1
- MDDPTCUZZASZIQ-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]alumane Chemical compound [Al+3].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-] MDDPTCUZZASZIQ-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000009681 x-ray fluorescence measurement Methods 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/0009—Use of binding agents; Moulding; Pressing; Powdering; Granulating; Addition of materials ameliorating the mechanical properties of the product catalyst
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/08—Silica
-
- B01J35/39—
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/36—Compounds of titanium
- C09C1/3607—Titanium dioxide
- C09C1/3653—Treatment with inorganic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
Definitions
- the present invention relates to a photocatalyst coating liquid, a photocatalyst film, and a photocatalyst member. More specifically, the present invention provides a photocatalytic film having excellent photocatalytic functions, such as superhydrophilicity and superhydrophilic maintenance performance in place, and having good durability capable of maintaining those functions for a long period of time.
- a photocatalyst coating solution that can be formed on an organic substrate and has excellent stability, a photocatalyst film having the above performance formed using the same, and a photocatalyst such as an antifouling film having the photocatalyst film on the surface It relates to members. Background art
- a photocatalytic active material (hereinafter sometimes simply referred to as a photocatalyst) is irradiated with light having an energy higher than the band gap, electrons are generated in the conduction band and holes are generated in the valence band. Then, generated electrons are superoxide ⁇ anion by reducing surface oxygen (& 0 2 -) with to produce, holes oxidize surface hydroxyl groups to produce the hydroxyl radical ( ⁇ Omicron Eta), these It is known that reactive reactive oxygen species exert a strong oxidative decomposition function and decompose organic substances attached to the surface of a photocatalyst with high efficiency.
- photocatalysts examples include compounds having various semiconductor properties, for example, metal oxides such as titanium dioxide, iron oxide, tungsten oxide, and zinc oxide, and metal sulfides such as sulfur dioxide, zinc sulfide, and the like.
- metal oxides such as titanium dioxide, iron oxide, tungsten oxide, and zinc oxide
- metal sulfides such as sulfur dioxide, zinc sulfide, and the like.
- titanium dioxide particularly an anatase type titanium dioxide, is useful as a practical photocatalyst. This titanium dioxide exhibits excellent photocatalytic activity by absorbing light of a specific wavelength in the ultraviolet region included in ordinary light such as sunlight.
- an intermediate layer is usually provided to prevent deterioration of the base film due to photocatalysis and to improve adhesion to the base film.
- a layer having a thickness of about several ⁇ made of a silicone resin, an atalinole-modified silicone resin, or the like is used.
- these intermediate layers are inferior in the ability to prevent deterioration of the organic base material, and have a problem that the organic base material is easily deteriorated in a short time due to photocatalysis.
- the present inventors have previously proposed various uses as a novel functional material, for example, a coating film, an adhesive between an organic material and an inorganic or metal material, and a coating between an organic substrate and a photocatalytic coating film.
- the composition is continuous in the thickness direction, which is useful for applications such as an intermediate film that prevents the deterioration of the organic base material and an intermediate film that improves the adhesion between the organic base material and the inorganic or metallic material layer. (See, for example, Japanese Patent Application Laid-Open Publication No. 2000-33628).
- This organic-inorganic composite gradient material is an organic-inorganic composite material containing a chemical compound of an organic polymer compound and a metal compound, and the content of the metal compound is continuous in the thickness direction of the material. It is a novel material that has a component gradient structure that changes into a variety of materials, and is useful for the various applications described above.
- Methods for forming a photocatalyst layer on a substrate include, for example, a PVD (physical vapor deposition) method such as a vacuum evaporation method and a sputtering method, a dry method such as a metal spraying method, and a coating solution.
- a PVD (physical vapor deposition) method such as a vacuum evaporation method and a sputtering method
- a dry method such as a metal spraying method
- a coating solution a coating solution.
- the wet method to be used is used.
- the substrate is an organic substrate, it is often not preferable to use a dry method for forming the photocatalyst layer because of its heat resistance, etc .
- a wet method using a coating liquid is adopted. .
- a coating solution comprising a photocatalytically active material and a dispersion containing a photocatalyst accelerator and an inorganic binder used as needed is usually prepared in an appropriate solvent.
- a method of forming a photocatalyst layer by applying the coating liquid to a substrate and performing a drying treatment is used.
- a hydrolysis product of a hydrolyzable silicon compound such as alkoxysilane is disclosed (for example, JP-A-2000-86938, (See Japanese Patent Application Publication No. 2002-2014).
- JP-A-2000-86938 See Japanese Patent Application Publication No. 2002-2014.
- the photocatalyst layer using such a binder is inferior in water resistance, and silica as a binder is eluted by water, and accordingly, titanium oxide particles as a photocatalyst are dropped off, resulting in a decrease in photocatalytic function. There is a problem.
- Hydrolysis 14 A sol of titanium oxide that has not been terminated by the hydrolysis and condensation of the titanium compound and a coating containing oxide particles that have completed the reaction, for example, titanium oxide particles and colloidal silicide. After applying the liquid to the substrate surface to form a film,
- a method for forming a photocatalyst film by firing at 250 to 85 ° C. is disclosed (for example,
- this method requires a high sintering temperature to burn ditrocellulose used as a thickening component, and has a problem that it is difficult to form a photocatalytic film on an organic substrate.
- a coating film is heat-treated at a temperature of 200 ° C. or less to form a photocatalytic film on an organic substrate, a large amount of the thickening component remains in the coating film to obtain a dry film. As a result, it is expected that sufficient strength of the coating film, such as tacking, will not be obtained.
- a photocatalyst structure having a photocatalyst film obtained from a coating solution containing a titanium oxide sol and a stabilized titanium alkoxide on the surface of a heat-resistant substrate has been disclosed (for example, Japanese Patent Application Laid-Open No. 9-284846). See).
- the photocatalyst film is made of only a titanium compound, there is a problem that a super-hydrophilic maintenance performance at the time of holding in a dark place, which is required as a self-cleaning material, is hardly exhibited.
- Glycols or diketones are used Therefore, the formation of the photocatalytic film is performed at a temperature of 350 to 75 ° C. after the film formation.
- Japanese Patent Application Laid-Open No. Hei 0-2373373 discloses a hydrophilic coating agent containing an amorphous titanium oxide, a silicon oxide, and a photocatalyst. Refers to substantially amorphous titanium peroxide TiO 3 , which crystallizes at a relatively low temperature of about 100 ° C. and easily changes to an anatase type titanium oxide.
- the sol of the hydrophilic coating agent when the sol of the hydrophilic coating agent is dispersed in an organic solvent to form a photocatalytic film on various organic substrates, the sol immediately causes aggregation, and even when the film is formed, the sol is homogeneous and smooth. No film is obtained. For this reason, the dispersion medium of the hydrophilic coating agent needs to be substantially aqueous.
- the surface energy of the obtained coating liquid itself is high, the material of the substrate to be applied is limited. For substrates with relatively low surface energy, such as materials, it is expected to lack versatility, such as requiring a pretreatment step. Disclosure of the invention
- the present invention has excellent photocatalytic functions, such as superhydrophilicity, superhydrophilicity maintenance performance in a dark place, and the like, and has good durability that can maintain those functions for a long period of time.
- a photocatalyst coating solution capable of forming a photocatalyst film on an organic substrate and having excellent stability, a photocatalyst film having the above performance formed using the same, and a photocatalyst member having the photocatalyst film on the surface. It is intended to provide.
- the present inventors have conducted intensive studies in order to achieve the above object, and as a result, even if a coating solution having a specific composition is kept at 200 ° C. or less after film formation, the above-described performance is maintained. It has been found that a photocatalyst film having the following characteristics can be provided, and that the stability can be improved. The purpose of the present invention can be achieved by this coating solution. I got it.
- a photocatalytic film having excellent photocatalytic functions such as superhydrophilicity and superhydrophilicity maintaining properties in place, and having good durability capable of maintaining those functions for a long period of time
- Photocatalytic coating that can be formed on materials and has excellent stability It is possible to provide a liquid, a photocatalytic film having the above performance formed by using the liquid, and a photocatalytic member having the photocatalytic film on the surface.
- the photocatalyst coating liquid of the present invention is a coating liquid containing (A) a titanium oxide fine particle containing anatase type crystal as a main component, (B) a colloidal silica and (C) a binder composed of a hydrolyzed condensate of titanium alkoxide. is there.
- the titanium oxide fine particles (hereinafter sometimes referred to as anatase crystal titanium oxide particles) mainly composed of the anatase type crystal of the component (A) are photocatalyst particles and contain a small amount of rutile type crystal. Visible light responsive photocatalyst particles partially containing titanium nitride, low order titanium oxide, and the like can also be used.
- the average particle size of the anatase crystalline titanium oxide particles is preferably in the range of 1 to 500 nm,
- the range of 100 nm is more preferable, and the range of 1 to 50 nm is most preferable because of having an excellent photocatalytic function.
- the average particle diameter can be measured by a scattering method using laser light.
- the metal compound include metal oxides, hydroxides, oxyhydroxides, sulfates, halides, nitrates, and metal ions.
- the content of the second component is appropriately selected according to the type of the substance.
- anatase crystalline titanium oxide particles can be produced by a conventionally known method, but are preferably used in the form of a titanium oxide sol in order to uniformly disperse them in a coating solution.
- a titanium oxide sol for example, powdered anatase crystalline titanium oxide may be pulverized in the presence of an acid or alkali, or the particle size may be controlled by pulverization.
- the hydrous titanium oxide obtained by thermally decomposing or neutralizing titanium sulfate and titanium chloride is used to physically and chemically reduce the crystallite size and particle size. Control may be performed.
- a dispersion stabilizer can be used to impart dispersion stability in the sol liquid.
- the colloidal silicic acid used as the component (B) has a function of causing the photocatalytic film to exhibit superhydrophilic maintenance performance even when kept in a dark place.
- Photocatalysts exhibit the property of decomposing organic substances present on the surface by irradiation with light such as ultraviolet rays, and exhibit superhydrophilization, but generally do not exhibit such photocatalytic functions in dark places.
- colloidal silica in the photocatalyst film as in the present invention, the photocatalyst film exhibits superhydrophilic maintenance performance in any place.
- the colloidal silica is a high purity silicon dioxide (S i 0 2) a product obtained by colloidally by distributed in an aqueous medium, the average particle diameter is usually l ⁇ 2 0 0 nm, preferably 5 to It is in the range of 50 nm.
- Silica sol or the hydrolysis / condensation product of silicon alkoxide the reaction is not completed, so it is easily eluted with water, and the photocatalyst film containing it is poor in water resistance.
- colloidal silica is a reaction-terminated fine particle, it is hardly eluted with water, and the photocatalytic film containing the same has good water resistance.
- the hydrolysis-condensation product of titanium alkoxide used as the component (C) functions as a water-resistant binder.
- the titanium alkoxide a titanium tetraalkoxide having 1 to 4 carbon atoms in an alkoxyl group is preferably used.
- the four alkoxyl groups may be the same or different, but the same one is preferably used from the viewpoint of easy access.
- titanium tetranoreoxide examples include titanium tetramethoxide, titanium tetraethoxide, titanium tetra- ⁇ -propoxide, titanium tetraisopropoxide, titanium tetra ⁇ -butoxide, titanium tetraisobutoxide, titanium tetra-sec-butoxide and titanium tetra-tert-butoxide. Is mentioned. These may be used alone or in a combination of two or more.
- the titanium alkoxide is hydrolyzed and condensed to form a binder, and the hydrolysis and condensation reaction is carried out in an organic solvent described below, for example.
- water is preferably used in an amount of 0.5 to 4 moles, more preferably 1 to 3 moles with respect to titanium tetraalkoxide, in the presence of an inorganic acid such as hydrochloric acid, sulfuric acid or nitric acid.
- the binder comprising the hydrolysis-condensation product of titanium alkoxide according to the present invention which can be carried out at a temperature in the range of 70 ° C., preferably 20 to 50 ° C., contains a considerable amount of organic unreacted groups.
- T i O x C n has a H m structure crystallization is unlikely to occur in the following combustion temperature of the organic substrate. That is, the amorphous form is maintained at a temperature of 200 ° C. or less without maintaining the amorphous state and without causing the coating film to become brittle due to crystallization. It is different.
- ethylene glycol monoalkyl ethers or ethylene glycol monoalkyl is used as a solvent from the viewpoint of coating liquid stability such as dispersion stability of each particle in the coating liquid. It preferably contains a mixture of ethers and monoalcohols having 4 or less carbon atoms.
- ethylene glycol monoalkyl ethers examples include single-solvent solvents such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether. These may be used alone or in a combination of two or more.
- Monoalcohols having 4 or less carbon atoms that can be used in combination with the ethylene glycol monoalkyl ethers include, for example, methanol, ethanol, n -propanol, isopropanol, n-butanol, isobutanol, sec -Butanol, tert-butanol and the like. One of these may be used alone, or two or more may be used in combination.
- the mixture of ethylene glycol monoalkyl ethers or monoalcohols having 4 or less carbon atoms as the dispersing medium is not limited to a base material, and particularly has good wettability with various organic base materials. Easy.
- Coating liquids tend to cause gelation and sedimentation, causing stability problems and
- the mass ratio of the ethylene glycol monoalkyl ethers and the monoalcohols is preferably from 10: 0 to 4: 6 by mass.
- the concentration of water in the photocatalyst coating liquid is adjusted in order to prevent aggregation of the added particles, stabilize the coating liquid, and obtain a uniform and smooth coating film.
- X mole / liter the hydrogen atom concentration of the inorganic acid is Y mole liter
- X 14 makes it difficult to obtain a uniform and smooth film, and even X 14 does not satisfy the above relational expressions (a) to (b), so that the stability of the coating liquid may deteriorate. There is.
- the method for preparing the photocatalyst coating liquid of the present invention is not particularly limited, and can be prepared, for example, as follows.
- Water, preferably 1 to 3 moles, and a predetermined amount of an inorganic acid are added, and the hydrolysis and condensation reaction of the titanium alkoxide is performed at a temperature of about 0 to 70 ° C, preferably 20 to 50 ° C.
- a predetermined amount of anatase crystalline titanium oxide sol and colloidal silica are added and uniformly dispersed, whereby the photocatalyst coating solution of the present invention can be prepared.
- the photocatalyst coating solution thus prepared is applied to a suitable substrate by a known method, for example, a dip coating method, a spin coating method, a spray coating method, a bar coating method, Coating by fuchcoat method, roll coating method, blade coating method, die coating method, gravure coating method, etc., forming a film, followed by natural drying or heat drying
- the photocatalyst film of the present invention is obtained.
- a temperature of 200 ° C. or less can be employed.
- the formed photocatalyst film can exhibit a sufficient photocatalytic function by holding treatment at a low temperature after the film is formed. Therefore, as a base material, for example, a ceramic, glass, metal, alloy, etc.
- an organic base having poor heat resistance can also be suitably used.
- the organic substrate examples include acrylic resins such as polymethyl methacrylate, styrene resins such as polystyrene and ABS resin, olefin resins such as polyethylene and polypropylene, polyester resins such as polyethylene terephthalate and polyethylene naphthalate, and the like.
- Polyamide resins such as nylon and 6,6-nylon, polyvinyl chloride resins, polycarbonate resins, polyphenylene sulfide resins, polyphenylene ether resins, polyimide resins, cellulose acetate, etc. Substrates made of such cellulose-based resins.
- the organic substrate in the present invention is a material other than the organic material, for example, a metal material.
- an intermediate film for suppressing deterioration is inserted.
- various intermediate films such as a silicone resin film, an acryl-modified silicone resin film, and an organic-inorganic composite gradient film have been known.
- an organic substrate and a photocatalyst are used.
- the organic-inorganic composite gradient film is preferably used from the viewpoints of adhesion to the film and prevention of deterioration of the organic substrate.
- This organic-inorganic composite gradient film contains a composite in which an organic polymer compound and a metal oxide compound are chemically bonded, and the content of the metal component changes continuously in the thickness direction of the film. It has a component gradient structure.
- a composite gradient film comprises (X) a metal-containing group capable of bonding to a metal oxide by hydrolysis in a molecule (hereinafter referred to as a hydrolyzable Sometimes referred to as a metal-containing group. ) And a coating agent obtained by subjecting a metal-containing compound capable of forming a metal oxide by hydrolysis to a hydrolysis treatment.
- the organic polymer compound having a hydrolyzable metal-containing group as the component (X) includes, for example, (a) an ethylenically unsaturated monomer having a hydrolyzable metal-containing group, and (b) an ethylenic monomer containing no metal.
- the ethylenically unsaturated monomer having a hydrolyzable metal-containing group as the component (X) (a), which can be obtained by copolymerizing an unsaturated monomer, has the general formula (I)
- R 1 is a hydrogen atom or a methyl group
- A is an alkylene group, preferably an alkylene group having 1 to 4 carbon atoms
- R 2 is a hydrolyzable group or a non-hydrolyzable group.
- at least one hydrolysis, (Y) must be a component chemically bonded may hydrolyzable group
- each R 2 is a mutually identical
- M 1 is a metal atom such as silicon, titanium, zirconium, indium, tin, and aluminum
- k is the valence of the metal atom M 1.
- examples of the hydrolyzable group of R 2 which can be chemically bonded to the component (Y) by hydrolysis include, for example, a halogen atom such as an alkoxyl group, an isocyanate group and a chlorine atom, and an oxyhalogen group. And an acetyl acetonate group and a hydroxyl group.
- a halogen atom such as an alkoxyl group, an isocyanate group and a chlorine atom
- an oxyhalogen group an acetyl acetonate group and a hydroxyl group.
- a lower alkyl group is preferably exemplified.
- Examples of the metal-containing group represented by are, for example, a trimethoxysilyl group, a triethoxysilyl group, a tri-n-propoxysilyl group.
- Triisopropoxysilyl group Tri-n-butoxysilyl group, triisobutoxysilyl group, tri-sec-butoxysilyl group, tri-tert-butoxysilyl group, trichlorosilyl group, dimethylmethoxysilyl group, methyldimethoxysilyl group Trimethyltitanium group, triethoxytitanium group, tri-n-propoxytitanium group, triisopropoxytitanium group, etc.
- tri _ n - butoxy titanium group tri isobutoxy titanate Yes No group, tri one sec _ butoxytitanium group, tree tert- Butokishichita two ⁇ beam group, trichloro port titanium group, further, trimethylene butoxy zirconium based, preparative Rietokishi Zirconium group, tri-n-propoxy zirconium group, triisopropoxy zirconium group, tri-n-butoxy zirconium group, triisobutoxy zirconium group, tri-sec-butoxy zirconium group, tri-tert-butoxy zirconium Dimethoxy aluminum group, diethoxy aluminum group, di-n-propoxy aluminum group, diisopropoxy aluminum group, di-n-butoxy aluminum group, di isobutoxy group Examples include a noreminium group, a G-sec-butoxyaluminum group, a G-tert-butoxyaluminum group, and a trichloride aluminum group.
- the metal-free ethylenically unsaturated monomer as the component (b) for example, a compound represented by the general formula (II):
- R 3 is the same as described above, and R 4 represents a hydrocarbon group.
- R 5 represents a hydrogen atom or a methyl group
- R 6 represents an epoxy group, a halogen atom or a hydrocarbon group having an ether bond.
- the hydrocarbon group represented by R 4 includes a linear or branched alkyl group having 1 to 10 carbon atoms
- Preferable examples include a cycloalkyl group having 3 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, and an aralkyl group having 7 to 10 carbon atoms.
- Examples of the alkyl group having 1 to 10 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and various butyl, pentyl, hexyl, octyl, and decyl groups.
- cycloalkyl group having 3 to 10 carbon atoms examples include a cyclopentyl group, a cyclohexyl group, a methylcyclohexyl group, and a cyclooctyl group.
- aryl group having 6 to 10 carbon atoms include a phenyl group
- aralkyl group having a carbon number of 7 to 10 examples include a trinole group, an xylyl group, a naphthyl group, and a methylnaphthyl group.
- the aralkyl group examples include a benzyl group, a methylbenzyl group, a phenethyl group, and a naphthylmethyl group.
- Examples of the ethylenically unsaturated monomer represented by the general formula (II-a) include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, and butyl (meth) acrylate. ) Atharylate, hexyl (meth) acrylate, 2-ethylhexynole (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, etc. . These may be used alone or in combination of two or more.
- the epoxy group represented by R 6 a halogen atom or a hydrocarbon group having an ether bond has 1 to 10 carbon atoms.
- a halogen atom for the above substituent a chlorine atom and a bromine atom are preferable.
- hydrocarbon group examples include the aforementioned general formula (II) I)
- ethylenically unsaturated monomer represented by the general formula ( ⁇ —b) examples include dalicidyl (meth) atali Rate, 3-glycidoxypropyl (meth) acrylate, 2 _ (3,4-epoxycyclohexyl) ethyl (meth) acrylate, 2-chloroethynole (meth) acrylate, 2-bromoethynole (meth) acrylate And the like.
- Examples of the ethylenically unsaturated monomer represented by the general formula (II) include styrene, ⁇ -methynolestyrene, ⁇ -acetoxystyrene, m—, o-, or p-bromo. Styrene, m-, o_ or p-chlorostyrene, m-, o- or p-bulfenol, 1- or 2-biernaphthalene, etc., and a stabilizer for a polymerizable polymer having an ethylenically unsaturated group, For example, an antioxidant, an ultraviolet absorber, a light stabilizer and the like having an ethylenically unsaturated group can be used. These may be used alone or in combination of two or more.
- the former ethylenic unsaturated monomer is used. It is preferable to use the latter ethylenically unsaturated monomer in a proportion of 1 to 100 mol% with respect to the unsaturated monomer.
- the ethylenically unsaturated monomer having a hydrolyzable metal-containing group as the component (a) and the metal-free ethylenically unsaturated monomer as the component (b) are reacted with a radical polymerization initiator in the presence of a radical polymerization initiator.
- a radical polymerization initiator By copolymerization, an organic polymer compound having a hydrolyzable metal-containing group as the component (X) can be obtained.
- the metal-containing compound (hydrolyzable metal-containing compound) capable of forming a metal oxide by hydrolysis of the component (Y) the general formula (III) R 7 m . N M 2 R 8 n ⁇ -(IN )
- R 7 is a non-hydrolyzable group
- R 8 is a hydrolyzable group
- M 2 is a metal atom
- m is the valence of the metal atom M 2
- n satisfies the relationship 0 ⁇ nm
- the compound represented by the formula or a condensed oligomer thereof is used.
- R 7 have more than one plurality of R 7 may be different even shall apply the same, if R 8 is more, even more R 8 may be the same different It may be.
- Preferred examples of the non-hydrolysable group represented by R 7 include an alkyl group, an aryl group, and an alkenyl group.
- Examples of the hydrolysable group represented by R 8 include a hydroxyl group, an alkoxyl group, an isocyanate group, and chlorine.
- Examples include a halogen atom such as an atom, an oxyhalogen group, and an acetyl acetonate group.
- the metal atom shown by M 2 for example Kei-containing, titanium, Jinorekoni ⁇ beam, indium, tin, and aluminum.
- Examples of the compound represented by the general formula (II) or the condensation oligomer thereof include tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetraisopropoxysilane, tetra-n-butoxysilane, tetraisobutoxysilane, sec-butoxysilane, tetra-tert-butoxysilane, etc., and the corresponding tetraalkoxytitanium and tetraalkoxyzirconium, as well as trimethoxyaluminum, triethoxyaluminum, tri-n-propoxyaluminum, triisopropoxyaluminum Metal alkoxides such as aluminum, tri-n-butoxyaluminum, triisobutoxyaluminum, trisec-butoxyaluminum, and tri-tert-butoxyaluminum; Alternatively, metal alkoxide oligomers
- a mixture of one type of hydrolyzable metal-containing compound is usually used at 0 to 100 ° C, preferably using an acid such as hydrochloric acid, sulfuric acid, nitric acid, or a cation exchange resin as a solid acid. Is hydrolyzed at a temperature of 20 to 60 ° C, and if a solid acid is used, after removing it, and further, if necessary, distilling off or adding a solvent, and is suitable for coating. Adjust the viscosity to prepare a coating agent consisting of a coating solution.
- the hydrolysis does not proceed, while if it is too high, the hydrolysis and polymerization reaction proceeds too quickly, making it difficult to control, resulting in a decrease in the gradient of the resulting gradient coating.
- a solid dehydrating agent insoluble in the coating solution for example, sulfuric anhydride Addition of magnesium or the like can prevent a decrease in pot life.
- the coating liquid is used for coating after removing the dehydrating agent.
- the coating agent comprising the coating solution thus obtained was applied to the organic substrate surface by a dip coating method so that the average thickness after drying was in the range of 40 to 300 nm.
- a coating film is formed by a known method such as a spin coating method, a spray coating method, a bar coating method, a knife coating method, a roll coating method, a blade coating method, a die coating method, a gravure coating method, and a known drying treatment, for example, 4
- the desired organic-inorganic composite gradient film is formed by heating and drying at a temperature of about 0 to 150 ° C. If the average thickness of the composite gradient film is less than 40 nm, the function as an intermediate film will not be sufficiently exerted.
- the surface layer has a metal component content of approximately 100% in the composite film, and gradually decreases in the direction of the base material. It is almost 0% near the material. That is, in the organic-inorganic composite gradient film, the surface in contact with the organic base material is substantially composed of only the organic polymer compound component, and the other open system surface is composed of only the metal oxide-based compound component. I have.
- the above-described photocatalyst coating liquid of the present invention is applied onto the organic-inorganic composite gradient film formed as described above, a film is formed, and the holding treatment is performed at a temperature of 200 ° C. or lower.
- a photocatalytic film can be provided.
- the thickness of this photocatalyst film is usually 10 nm
- the preferred thickness is from 30 nm to 3 ⁇ m, particularly preferably from 30 nm to 1 ⁇ m.
- the photocatalyst film of the present invention thus formed is excellent in photocatalytic function such as superhydrophilicity and superhydrophilic maintenance performance in place, and has good water resistance and mechanical strength. Has good durability that can be maintained for a long period of time.
- the present invention also provides a photocatalyst member having the photocatalyst film on a surface.
- the shape of the photocatalyst member is not particularly limited, and may be, for example, any of a film, a sheet, a plate, a structure having various shapes, and the like.
- the photocatalyst member is suitably used for various applications, for example, as an antifouling member.
- the photocatalyst member of the present invention when in the form of a film, it can be used for various purposes including, for example, bodies of various transportation devices such as automobiles, railways, ships, windows, mirrors, houses, buildings, condominiums and other buildings, and skylights and skylights.
- bodies of various transportation devices such as automobiles, railways, ships, windows, mirrors, houses, buildings, condominiums and other buildings, and skylights and skylights.
- Windows store windows, vending machines, surveillance cameras, solar batteries, road lighting, various types of cover glass, such as aviation guide lights, transparent walls, stained glass, road signs and tariffs, transportation platform signs, Timetables, signs for various venues and facilities, internal traffic signs, LED traffic signs, LED information signs, etc., interior lighting installation signboards, interior lighting moving shop signboards, various building sleeve signs, station stands, Various types of self-contained signboards such as turrets, roadsides, EL light-emitting display signboards, LED signboards, tent signboards, neon signboards, and telephone pole signboards, roads Various types of reflectors, such as road reflectors and road reflector poles, noise barriers for highways, carports, weather shields, veranda covers, car mirrors, curve mirrors, bathroom mirrors, various labels and stickers, and various painted boards Alternatively, it can be attached to the inside of a frozen or refrigerated showcase or greenhouse to prevent contamination of the attached object, prevent adhesion of water droplets
- it can be used as a wrap film for food packaging or as an inner surface of a plastic container for storing drinking water by utilizing its antibacterial function.
- the film formability of the produced photocatalyst film was evaluated by visual observation as follows. ⁇ : Good transparency maintained. X: White and cloudy.
- a sample that has been sufficiently exposed to ultraviolet light to exhibit super-hydrophilicity is stored in a place, taken out at regular intervals, and used as a water contact angle meter [G-I water contact angle measuring device manufactured by Elma Sales Co., Ltd.] 1-1000 ”Temperature: 25 ° C, Humidity: 50%].
- the case where the contact angle was less than 10 degrees was defined as the period for exhibiting superhydrophilic maintenance performance, and the number of days required to exceed 10 ° C was defined as the number of days for maintaining superhydrophilicity at a place.
- a pencil pulling test was performed under a load of 100 g according to JIS K5400. When three or more of the five measurements were made, the hardness one rank below was determined as the hardness of the coating film.
- Carbon arc type sunshine weather meter testing machine according to JIS K 7350 [Testing machine: Suga Test Machine Co., Ltd. sunshine weather meter “S300
- a component gradient film coating solution After adding 5 ml of the organic component solution to 20 ml of methyl isobutyl ketone, 16.7 ml of ethyl acetate solvent and then 8.8 ml of the organic component solution were added to prepare a component gradient film coating solution.
- This coating solution was bar-coated with a Meyer bar on a 50 Am-thick polyethylene terephthalate (PET) film (Tetron HB-3, manufactured by Teijin Dupont Film Co., Ltd.), and the solvent was evaporated.
- PET polyethylene terephthalate
- Titanium tetraisopropoxide 10. 00 g of (0.035 mol) in solution in Echiruse port cellosolve 19. 90 g (0. 221 mol), 60 mass 0/0 nitric acid water Slowly drop a mixed solution of 1.68 g (0.016 mol) of liquid, 0.61 g (0.034 mol) of water, and 7.80 g (0.087 mol) of Echilse Mouth Solve. Then, the mixture was stirred at 30 ° C. for 4 hours. Thereafter, 77.60 g (0.863 mol) of ethyl sorbate was added to prepare a binder solution having a solid content concentration of 2.38% by mass in terms of TiO 2 .
- the water in the binder solution is 1.28 g of the water (0.67 g) and the added water (0.61 g) in the 60% by mass nitric acid aqueous solution,
- the nitric acid contained in the aqueous solution is 1. Olg.
- the amount of water contained in the photocatalyst coating solution was 0.48 g in the binder solution, 0.32 g in the 60% by mass nitric acid aqueous solution, 20.40 g of the added water, and the amount of the anatase crystal. It is 1.12 g in the titanium oxide particle dispersion liquid, and the total is 22.32 g, which is 1.24 mol.
- the amount of nitric acid was 0.38 g in the binder solution, 0.50 g in the added 60% by mass aqueous nitric acid solution, 0.03 g in the dispersion of anatase type titanium oxide particles, and colloidal silica dispersion.
- Ri 5 50 X 10- 5 g der in, total 0.
- the adjustment photocatalyst coating liquid 300 g since a specific gravity of 0.86, the concentration of water, 3.6 molar liter, the concentration of hydrogen atoms nitric 4. 1 X 10- 2 mole / liter Met Then, on the inclined film of an organic one inorganic composite graded film coated film obtained in Production Example 1, it was deposited on Kinurikoeki at Meyer bar, thickness evaporate the solvent of 4 5 nm photocatalyst A film was formed to produce a photocatalyst film.
- a coating solution was prepared in the same manner as in Example 1 except that the content ratio of each component in the coating solution was changed as shown in Table 1, and a photocatalytic film was produced.
- Table 1 shows the composition ratio of each coating solution
- Table 2 shows the performance of the photocatalytic film.
- the durability of the coating film was good, and there was almost no change in the composition after the weathering test.
- a coating liquid was prepared in the same manner as in Example 1 except that the amounts of water and acid to be added were changed, and the concentrations of water and acid in the coating liquid were changed as shown in Table 1. Produced.
- Table 1 shows the composition ratio of each coating solution
- Table 2 shows the performance of the photocatalytic film.
- a coating solution was prepared in the same manner as in Example 1 except that the content ratio of each component in the coating solution was changed as shown in Table 1, and a photocatalytic film was produced.
- Table 1 shows the properties of each coating solution, and Table 2 shows the performance of the photocatalytic film.
- a coating solution was prepared in the same manner as in Example 1 except that tetraethoxysilane was used instead of titanium tetraisopropoxide, and a photocatalytic film was produced.
- Table 1 shows the properties of the coating solution and Table 2 shows the performance of the photocatalytic film.
- the durability of the coating film was NG, and after the weathering test, the silica decreased and the composition changed. Comparative Example 5
- a coating solution was prepared in the same manner as in Example 4 except that the partially hydrolyzed condensate of tetraalkoxysilane used in Comparative Example 4 was used instead of the colloidal silica in Example 4, and a photocatalytic film was produced. .
- Table 1 shows the properties of the coating solution, and Table 2 shows the performance of the photocatalytic film.
- a coating liquid was prepared in the same manner as in Example 1 except that the amounts of water and acid to be added were changed, and the concentrations of water and acid in the coating liquid were changed as shown in Table 1. Produced.
- Table 1 shows the composition ratio of each coating solution
- Table 2 shows the performance of the photocatalytic film.
- the stability or film formability of the coating solution was NG, and it was not worth evaluating the performance of the photocatalytic film.
- the photocatalyst film which has excellent durability especially while being excellent in photocatalytic functions, such as superhydrophilicity and superhydrophilic maintenance performance in place, can be obtained. It can be suitably used for photocatalyst members such as.
Abstract
Description
Claims
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US10/529,498 US20060162617A1 (en) | 2003-04-30 | 2004-04-15 | Photocatalyst coating liquid, photocatalyst film and photocatalyst member |
EP04727687A EP1544269A4 (en) | 2003-04-30 | 2004-04-15 | PHOTO CATALYSER LACQUER, PHOTO CATALYST FILM AND PHOTO CATALYST ORGAN |
JP2005505838A JPWO2004096935A1 (ja) | 2003-04-30 | 2004-04-15 | 光触媒塗工液、光触媒膜および光触媒部材 |
HK06101138A HK1081217A1 (en) | 2003-04-30 | 2006-01-25 | Photocatalyst coating liquid, photocatalyst film and photocatalyst member |
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JP2010202733A (ja) * | 2009-03-02 | 2010-09-16 | Idemitsu Technofine Co Ltd | 看板用コート剤 |
JP2010254887A (ja) * | 2009-04-28 | 2010-11-11 | Shin-Etsu Chemical Co Ltd | 光応答性に優れる光触媒薄膜を与える光触媒塗工液及び該光触媒薄膜 |
CN108165053A (zh) * | 2018-02-01 | 2018-06-15 | 广西七色珠光材料股份有限公司 | 锐钛矿型高色饱和度珠光颜料及其制备方法 |
CN108165053B (zh) * | 2018-02-01 | 2020-12-18 | 广西七色珠光材料股份有限公司 | 锐钛矿型高色饱和度珠光颜料及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1544269A4 (en) | 2009-12-09 |
CN1701105A (zh) | 2005-11-23 |
JPWO2004096935A1 (ja) | 2006-07-13 |
US20060162617A1 (en) | 2006-07-27 |
TW200507936A (en) | 2005-03-01 |
KR20060002733A (ko) | 2006-01-09 |
HK1081217A1 (en) | 2006-05-12 |
CN100381527C (zh) | 2008-04-16 |
EP1544269A1 (en) | 2005-06-22 |
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