WO2004060802A1 - シリカ微粒子 - Google Patents
シリカ微粒子 Download PDFInfo
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- WO2004060802A1 WO2004060802A1 PCT/JP2003/016726 JP0316726W WO2004060802A1 WO 2004060802 A1 WO2004060802 A1 WO 2004060802A1 JP 0316726 W JP0316726 W JP 0316726W WO 2004060802 A1 WO2004060802 A1 WO 2004060802A1
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- WO
- WIPO (PCT)
- Prior art keywords
- fine particles
- silica fine
- resin
- silica
- toner
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09716—Inorganic compounds treated with organic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09725—Silicon-oxides; Silicates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/259—Silicic material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
Definitions
- the present invention relates to novel silica fine particles. More specifically, it has a special particle shape that is simpler than fumed silica and more complex than spherical fused silica, and is particularly suitable for various uses such as filler for semiconductor encapsulation resin and toner external additive for electrophotography.
- the present invention relates to silica fine particles capable of exhibiting excellent characteristics in the above. Background art
- Silica fine particles having an average particle diameter of 1 / m or less are widely used in applications such as fillers for semiconductor encapsulation resins and external additives for electrophotographic toner.
- the silica fine particles having such a particle diameter settle in a resin in a liquid state (hereinafter also referred to as a liquid resin) in a molten state or a solution state before molding. This is advantageous in maintaining a uniform composition because of its low property.
- the silica fine particles having such a particle diameter have an adhesive property to the surface of the toner resin. This is because it is high and is advantageous in giving fluidity of the toner resin. Hitherto, there have been many reports of using fumed silica (so-called dry silica) produced by a flame hydrolysis method of chlorosilane as a filler for a resin for semiconductor encapsulation. Reference A).
- the above-mentioned fumed silica has a property of imparting high viscosity only by adding a small amount to a liquid resin, and when the amount of addition is increased, molding of a resin for semiconductor encapsulation is performed. A problem arises.
- the use of the above-mentioned spherical fused silica certainly suppresses an increase in the viscosity of the resin to be filled, and can increase the filling rate of the filler.
- the strength of the highly filled resin is insufficient, and there is room for improvement.
- an object of the present invention is to use fumed silica and spherical fused silica as silica fine particles of 1 m or less in various applications such as a filler for semiconductor encapsulation resin and an external additive for electrophotographic toner.
- the problem is to solve the problem.
- the present inventors have studied the production conditions of silica fine particles, the viscosity of the obtained silica fine particles, the effect of reinforcing resin strength, the effect of imparting fluidity, and the effect of preventing the silica particles from falling off the surface of the toner resin particles.
- a flame reaction method such as a flame hydrolysis method or a flame pyrolysis method are adjusted to a specific range.
- the average particle diameter is 0.05 to 1 / m
- the fractal shape parameter of the analysis target range of 50 nm to 150 nm and the analysis target range of 150 nm is calculated by the following equations (1) and (2):
- S represents the BET specific surface area (m 2 Zg) of the silica fine particles.
- silica fine particles satisfying the following conditions: Further, according to the present invention, there is provided a filler for a semiconductor encapsulating resin comprising the above-mentioned silica fine particles, and an external additive for a toner for electrophotography.
- the fractal shape parameter (direct d) determined from the scattering pattern obtained when small-angle X-ray scattering measurement of powder is used as an index indicating the degree of complexity of the shape of the independent particles. I have. In other words, the closer the ⁇ is to 4, the closer the particle shape is to a true spherical particle (the value of a true spherical particle is 4), and the smaller the value, the more complex the particle shape.
- the present inventors have compared the values of the silica fine particles of the present invention having the specific particle structure with those of the existing silica fine particles. It was confirmed that the ⁇ -direct (0?) Obtained from the scattering pattern from 50 nm to 150 nm and the value ( 2 ) obtained from the scattering pattern from 150 nm to 353 nm in the analysis range showed unique values.
- the silica fine particles having the above-mentioned special structure have an effect of suppressing an increase in viscosity when highly filled in a liquid resin, and exhibiting an effect of exhibiting good strength in a cured resin.
- the particles when used for an external additive for an electrophotographic toner, exhibit an excellent effect of imparting fluidity and an effect of preventing the particles from falling off the surface of the toner resin particles. According to the small-angle X-ray scattering measurement, it is possible to obtain information on the periodic structure of nanometers or more (information on the period and frequency of the structure) that cannot be obtained by ordinary X-ray diffraction. Can be determined.
- fumed silica when the fumed silica force is measured by small-angle X-ray scattering, fumed silica is an extremely strong material having a variety of shapes and particle diameters due to the solidification of multiple primary particles due to its manufacturing method.
- the small-angle X-ray scattering curves obtained because of the aggregate of aggregated particles (or fused particles) are superpositions of the scattering curves with periods of various sizes. Therefore, by analyzing the obtained small-angle X-ray scattering curves, the “fractal shape parameter (value) that is an index of the shape of agglomerated (fused) particles” corresponding to the frequency of periodic structures of various sizes can be determined. Can be determined.
- the unit of k is nm- 1 ; ⁇ is the pi; I is the wavelength of the incident X-ray (unit is nm); 0 is the X-ray scattering angle (where 0 is the scanning angle of the detector at 0. 5 times).
- monochromatic X-rays are first squeezed finely using slits and blocks, irradiate the sample, and scattered by the sample while changing the scanning angle of the detector. X-rays are detected, and the horizontal axis is k and the vertical axis is I.
- the silica fine particles of the present invention have the characteristics of both spherical particles and particles having a complicated structure in shape.For example, even if a large amount is added to a liquid semiconductor encapsulating resin before curing, its viscosity is low. It has the characteristic that it is difficult to increase. Also, in the preparation of a silica dispersion as an abrasive or a coating liquid for inkjet paper, the amount of filler can be increased without increasing the viscosity of the liquid, and the amount of filler can be increased.
- the silica fine particles of the present invention when used as an external additive for an electrophotographic toner, the toner can have good fluidity due to its special particle structure, and can also be used for toner resin particles. Demonstrates good drop-prevention properties. Description of the drawings
- Figure 1 illustrates the method for obtaining and 2 from a graph in which the logarithm of the scattering intensity (I) is plotted against the logarithm of the scattering vector (k) when the inorganic powder is measured by small-angle X-ray scattering.
- FIG. BEST MODE FOR CARRYING OUT THE INVENTION
- the silica fine particles of the present invention have an average particle diameter of 0.05 to 1 im, preferably 0.1 to 1 / im. That is, when the average particle diameter of 0. 05 jum smaller than, given later fractal shape parameter ⁇ ! And 2, becomes smaller than the range of formula (1) and (2), an average particle If the diameter exceeds 1 jUm, 0 ⁇ ⁇ and 0? 2 will be larger than the range shown by equations (1) and (2).
- the average particle diameter means the average value based on volume measured by a laser diffraction scattering method (D 5.).
- the greatest feature of the silica fine particles of the present invention is that the analysis range is 50 nm to 150 nm.
- the fractal shape parameter in nm satisfies the following equation (1)
- the fractal shape parameter 2 in the range of analysis 150 to 353 nm satisfies the following equation (2).
- the fractal shape parameters in the analysis range of 50 nm to 150 nm, and among the aggregated particles having various shapes and particle diameters in which a plurality of primary particles are fused together relatively small It indicates the complexity of the shape in the aggregate particle size range
- the fractal shape parameter 2 for the analysis range of 150 nm to 353 nm is the shape complexity in the relatively large aggregate particle size range. It shows the degree. In general, the monument ⁇ ! And the 2, Oh to> 2 of the relationship.
- Silica fine particles having the above-mentioned complicated particle shape are first proposed by the present invention. That is, known fumed silica described above is also shown in Comparative Examples described later, arsenic, and / or second value is less than the lower limit of the above range, has a complicated shape far from a spherical
- the spherical fused silica has the values of and ⁇ or 2 exceeding the upper limit of the above range, and has a shape close to a sphere.
- the silica fine particles of the present invention in which the values of and ⁇ 2 are within the ranges of the above formulas (1) and (2) have a particle shape with a complexity of the above-mentioned fumed silica force and spherical fused silica. In the middle.
- the BET specific surface area of the silica fine particles of the present invention which indicates the average particle diameter and the fractal shape parameter, is generally 5 to 300 m 2 / g at an average particle diameter of 0.05 to 1 jtim, and 0 to 1!
- the Zm can have a range of 5 to 150 m 2 g
- the BET specific surface area is a value measured by a nitrogen adsorption method.
- the silica fine particles of the present invention having the special particle structure, can reduce the problematic properties while enjoying the advantageous properties of fumed silica and fused spherical silica in the application. Become.
- the It in the application of a filler for semiconductor encapsulation resin, the It can be filled, and when used as an external additive for electrophotographic toner, it can impart high fluidity to the toner resin particles and exhibit high drop-off prevention properties.
- the silica fine particles of the present invention are not particularly limited in other properties and the like as long as the above conditions are satisfied, but the concentration of the halogen element and the alkali element such as sodium contained is 50 ppm or less, Preferably, the content is 30 ppm or less.
- corrosion of metal wiring and the like due to silica fine particles can be reduced. It is suitable for suppressing variation in the rising speed of the size and the charge amount.
- the method for producing silica fine particles of the present invention can be obtained by a reaction in a flame such as a flame hydrolysis method or a flame pyrolysis method, and particularly by performing partial welding while adjusting the aggregation of particles in the flame. can get.
- flammable gas hydrogen, hydrogen, or hydrocarbons (hereinafter, these gases are collectively referred to as flammable gas) and oxygen are supplied to the outer periphery of a supply port for supplying the raw material silicon compound in a gaseous state, and oxygen is supplied to the outer periphery.
- the silicon compound is converted into silica fine particles and fused appropriately in a flame.
- the fused silica fine particles are cooled and collected in a dispersed state (for example, After passing through the pipe, the particles are collected by a bag filter), whereby the silica fine particles of the present invention can be produced.
- one of the conditions that particularly affects the value of the fractal shape parameter is the flow rate at the burner outlet, and the flow rate is preferably adjusted to 0.5 to 10 mZ seconds.
- the concentration of the starting silicon compound i.e., at a silica force concentration in the flame there, in such a concentration, S i 0 2 conversion. 0.5 to 5 mol / m 3 , particularly preferably 0.1 to 3 mol Zm 3 .
- the adjustment of the average particle diameter ⁇ the specific surface area includes the concentration of the raw material silicon compound, the flow rate at the burner outlet, the length of the peripheral flame, and the like.
- the average particle diameter is increased, the specific surface area is decreased, and the value of the fractal shape parameter is increased.
- the flow velocity at the outlet of the noner is increased, the average particle diameter becomes smaller, the specific surface area becomes larger, and the value of the fractal shape parameter becomes smaller.
- the length of the peripheral flame is increased, the average particle diameter increases, the specific surface area decreases, and the value of the fractal shape parameter increases.
- the temperature of the peripheral flame is increased, the average particle diameter increases, the specific surface area decreases, and the value of the fractal shape parameter increases.
- a silicon compound which is gaseous or liquid at room temperature is used without any particular limitation.
- siloxanes such as hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, hexamethyldisiloxane, and octamethyltrisiloxane, tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, and dimethyldimethoxysilane Alkoxysilanes such as toxoxysilane and methyltriethoxysilane; organic silane compounds such as tetramethylsilane, getylsilane, and hexamethyldisilazane; silicon halides such as monochlorosilane, dichlorosilane, trichlorosilane, and tetrachlorosilane; monosilane,
- siloxanes and / or silazanes or alkoxysilanes as the silicon compound, it is possible to obtain high-purity silicon oxide (silica fine particles) in which impurities such as chlorine are significantly reduced. Also, the handleability is improved.
- the silica fine particles of the present invention are subjected to a surface treatment with at least one treatment agent selected from the group consisting of silylating agents, silicone oils, siloxanes, metal alkoxides, fatty acids and metal salts thereof, depending on the application. May be.
- silylating agents include tetramethoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, phenylrimethoxysilane, diphenyldimethoxysilane, o-methylphenyltrimethoxysilane, p-methylphenylsilane.
- Silicone oils include dimethyl silicone oil, methyl hydrogen silicone oil, methylphenyl silicone oil, alkyl-modified silicone oil, fatty acid-modified silicone oil, polyether-modified silicone oil, alkoxy-modified silicone oil, and carbinol Modified silicone oil, amino-modified silicone oil, terminal-reactive silicone oil, and the like.
- Examples of siloxanes include hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, hexamethyldisiloxane, and octamethyltrisiloxane.
- metal alkoxides examples include trimethoxyaluminum, triethoxyaluminum, tripropoxyaluminum, trir> -butoxyaluminum, tris-butoxyaluminum, tri-t-butoxyaluminum, and mono-s-aluminum.
- fatty acids and metal salts thereof include pendecylic acid, lauric acid, tridecylic acid, dodecylic acid, myristic acid, palmitic acid, pentadecylic acid, stearic acid, heptadecylic acid, araquinic acid, and montanic acid.
- long-chain fatty acids such as oleic acid, linoleic acid and arachidonic acid.
- the metal salts thereof include salts with metals such as zinc, iron, magnesium, aluminum, calcium, sodium and lithium.
- silica fine particles for use as an external additive for electrophotographic toner include hexamethyldisilazane, dimethylsilicone oil, r-aminopropyltriethoxysilane, and mono (2-aminoethyl). It is more preferred that the surface is treated with at least one treating agent selected from the group consisting of aminopropylmethyldimethoxysilane.
- Known methods can be used for the surface treatment using the surface treatment agent without any limitation.
- a method of spraying a surface treating agent while stirring silica fine particles or bringing them into contact with steam is generally used.
- the concentration of the halogen element and / or the elemental element of the surface-treated silica fine particles to 5 O ppm or less, preferably 30 ppm or less, corrosion of metals and the like caused by the filled silica fine particles can be prevented. It is suitable for reducing the amount of charge and the variation in the rate of rise of the charge amount in applications such as reduction and use as an external additive for electrophotography toners. It is preferable to use a refined one.
- the mixing amount thereof can be 5 to 300 parts by weight based on 100 parts by weight of the liquid resin.
- epoxy resin, phenol resin, polyimide An uncured thermosetting resin used for semiconductor encapsulation, such as a resin or a maleimide resin, is used.
- this liquid resin is used together with the above-mentioned fillers together with a curing agent, a curing accelerator, a coloring agent, A release agent and the like are blended.
- the above-mentioned silica fine particles of the present invention having a small average particle diameter are mixed with particles of another filler having a large average particle diameter (for example, fused spherical silica particles) and the like, and the gaps of the particles of the filler having a large particle diameter are mixed. It should be used in a form that fills in the space.
- the external addition amount is generally 0.2 to 3 parts by weight based on 100 parts by weight of the toner resin particles. is there.
- Silica microparticles of the sample were filled in through holes (40 mm long, 5 mm wide, 1 mm high) provided on the substrate, and both sides of the filled sample were held by scissors with 6 jUm thick polypropylene film. Those were subjected to measurement.
- Incident X-ray Cu—KQf ray
- Detector scanning angle 0.025 degrees to 0.900 degrees
- silica fine particles After adding 4 parts by weight of silica fine particles to an epoxy resin (Epicoat 815, manufactured by Japan Epoxy Resin Co., Ltd.) and dispersing it at room temperature for 2 minutes at 3000 rpm using a homomixer manufactured by Tokushu Kika Kogyo Co., Ltd. The mixture was allowed to stand in a constant temperature bath at 25 degrees Celsius for 2 hours, and the viscosity at 60 rpm was measured using a BL-type rotational viscometer.
- epoxy resin Epicoat 815, manufactured by Japan Epoxy Resin Co., Ltd.
- This epoxy resin composition was thermally cured in a mold heated to 175 ° C. to obtain a cured epoxy resin of 1 Omm ⁇ 2 Omm ⁇ 5 mm. After standing for 10 hours in a thermo-hygrostat set at a temperature of 25 ° C and a relative humidity of 80% for 24 hours, the epoxy resin cured product was immersed in a 250 ° C oil bath for 10 seconds, and the number of cracks The strength of the cured epoxy resin was evaluated.
- Epoxy resin (biphenyl type epoxy resin) 100 parts by weight
- Curing agent phenol novolak resin
- Curing accelerator triphenylphosphine
- Silane coupling agent epoxy silane
- Fused spherical silica average particle size 17 / m: 1 238
- Sample silica fine particles 74.
- silica fine particles obtained by hydrophobizing the surface of silica fine particles with hexamethyldisilazane were used.
- the method of hydrophobization treatment with hexamethyldisilazane is as follows. Ri. First, the silica fine particles were placed in a mixer and stirred, replaced with a nitrogen atmosphere, and simultaneously heated to 250 ° C. Thereafter, the mixer was closed and 60 parts by weight of hexamethyldisilazane was sprayed, and the mixture was stirred for 30 minutes to perform a hydrophobic treatment.
- a silica sample was added so as to be 2% by weight, and mixed with a mixer for 5 minutes. This was humidified at 35 ° C, 850/0 relative humidity.
- the fluidity of this mixed powder sample was evaluated by measuring the degree of compressibility with a powder tester (manufactured by Hosokawa Micron Corporation, PT-R type). The compression degree is expressed by the following equation (3).
- Loose apparent specific gravity Specific gravity measured without tapping by placing sample powder in a 10 Om I cup
- Solidified apparent specific gravity Apparent specific gravity after placing sample powder in a 10 Om I cup and tapping 180 times
- the degree of compression was measured when the mixing time in the mixer was changed from 5 minutes to 60 minutes, and the durability against a decrease in fluidity when the number of developed sheets increased in actual use was evaluated.
- toner composition To the toner having an average particle diameter of 7 / m, 1 ⁇ 7 of the above silica sample was added, and the mixture was stirred and mixed to prepare a toner composition. Using this toner composition, 30,000 copies were made with a commercially available copying machine, and then 10 sheets of a full-size B4 size image were output. The smaller the occurrence of white spots in the image, the better the image characteristics.
- the silica particles shown in Table 2 were obtained by burning and oxidizing octamethylcyclotetrasiloxane in an oxyhydrogen flame under the combustion conditions shown in Table 1 in the outer flame formed by the oxygen-hydrogen flame. Was manufactured.
- Table 1 also shows the average particle size, BET specific surface area, fractal shape parameter value, binary value, viscosity, and cured resin strength of the obtained silica fine particles calculated by small-angle X-ray scattering measurement. In each case, no large increase in viscosity was observed as compared with the comparative example.
- Table 3 shows the impurity measurement results.
- Table 2 shows the average particle size, BET specific surface area, fractal shape parameters, binary values, viscosity, and cured resin strength of commercially available fumed silica particles and fused silica particles.
- silica fine particles were produced under the combustion conditions shown in Table 4.
- Table 4 shows the average particle size, BET specific surface area, fractal shape parameter value, binary value of the obtained silica fine particles, and evaluation of properties as an external additive for electrophotographic toner (fluidity, image characteristics, cleaning properties). Are shown together.
- Table 5 shows the impurity measurement results.
- the average particle diameter, BET specific surface area, fractal shape parameter value, binary value, and property evaluation as toner external additives for electrophotography of commercially available fumed silica particles and fused silica particles (fluidity, image characteristics, Table 4 shows the cleaning properties.
- Table 5 shows the impurity measurement results. Table 4.
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- Condensed Matter Physics & Semiconductors (AREA)
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- Crystallography & Structural Chemistry (AREA)
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- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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US10/540,886 US7452599B2 (en) | 2002-12-27 | 2003-12-25 | Fine silica particles having specific fractal structure parameter |
EP03782898.5A EP1591419B1 (en) | 2002-12-27 | 2003-12-25 | Fine silica particles |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2002380774 | 2002-12-27 | ||
JP2002-380774 | 2002-12-27 |
Publications (1)
Publication Number | Publication Date |
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WO2004060802A1 true WO2004060802A1 (ja) | 2004-07-22 |
Family
ID=32708453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2003/016726 WO2004060802A1 (ja) | 2002-12-27 | 2003-12-25 | シリカ微粒子 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7452599B2 (ja) |
EP (1) | EP1591419B1 (ja) |
KR (1) | KR100714942B1 (ja) |
CN (1) | CN100569642C (ja) |
TW (1) | TWI260307B (ja) |
WO (1) | WO2004060802A1 (ja) |
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TWI444114B (zh) * | 2011-12-26 | 2014-07-01 | Chi Mei Corp | 具有離型層的基板結構及其製造方法 |
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JP6564517B1 (ja) * | 2018-12-17 | 2019-08-21 | 株式会社アドマテックス | 電子材料用フィラー及びその製造方法、電子材料用樹脂組成物の製造方法、高周波用基板、並びに電子材料用スラリー |
CN110272665B (zh) * | 2019-06-25 | 2021-05-18 | 东南大学 | 一种常温固化透明耐磨防雾涂料及其制备方法和应用 |
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- 2003-12-25 EP EP03782898.5A patent/EP1591419B1/en not_active Expired - Lifetime
- 2003-12-25 CN CNB2003801100223A patent/CN100569642C/zh not_active Expired - Lifetime
- 2003-12-25 KR KR1020057012136A patent/KR100714942B1/ko active IP Right Grant
- 2003-12-25 WO PCT/JP2003/016726 patent/WO2004060802A1/ja active Application Filing
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US7452599B2 (en) * | 2002-12-27 | 2008-11-18 | Tokuyama Corporation | Fine silica particles having specific fractal structure parameter |
CN107108240A (zh) * | 2015-01-23 | 2017-08-29 | 株式会社德山 | 硅油处理二氧化硅粒子以及电子照相用调色剂 |
CN107108240B (zh) * | 2015-01-23 | 2021-10-22 | 株式会社德山 | 硅油处理二氧化硅粒子以及电子照相用调色剂 |
Also Published As
Publication number | Publication date |
---|---|
KR20050091754A (ko) | 2005-09-15 |
EP1591419A1 (en) | 2005-11-02 |
US20060150527A1 (en) | 2006-07-13 |
US7452599B2 (en) | 2008-11-18 |
KR100714942B1 (ko) | 2007-05-07 |
CN1756720A (zh) | 2006-04-05 |
CN100569642C (zh) | 2009-12-16 |
TWI260307B (en) | 2006-08-21 |
EP1591419B1 (en) | 2017-11-15 |
EP1591419A4 (en) | 2008-04-09 |
TW200416199A (en) | 2004-09-01 |
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