WO2002024788A1 - Materiau et vernis pour film isolant, film isolant et dispositif a semiconducteurs faisant appel a ce materiau et a ce vernis - Google Patents

Materiau et vernis pour film isolant, film isolant et dispositif a semiconducteurs faisant appel a ce materiau et a ce vernis Download PDF

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Publication number
WO2002024788A1
WO2002024788A1 PCT/JP2001/008210 JP0108210W WO0224788A1 WO 2002024788 A1 WO2002024788 A1 WO 2002024788A1 JP 0108210 W JP0108210 W JP 0108210W WO 0224788 A1 WO0224788 A1 WO 0224788A1
Authority
WO
WIPO (PCT)
Prior art keywords
insulating film
layer
semiconductor device
coating
same
Prior art date
Application number
PCT/JP2001/008210
Other languages
English (en)
French (fr)
Inventor
Takashi Enoki
Hidenori Saito
Nobuhiro Higashida
Yuichi Ishida
Original Assignee
Sumitomo Bakelite Company, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Company, Ltd. filed Critical Sumitomo Bakelite Company, Ltd.
Priority to EP01967765A priority Critical patent/EP1333050B1/en
Priority to DE60125575T priority patent/DE60125575T2/de
Priority to KR1020037004154A priority patent/KR100787265B1/ko
Priority to US10/380,872 priority patent/US7049371B2/en
Publication of WO2002024788A1 publication Critical patent/WO2002024788A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/38—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes condensation products of aldehydes with amines or amides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/48—Polymers modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02203—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being porous
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/312—Organic layers, e.g. photoresist
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2377/00—Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Formation Of Insulating Films (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Organic Insulating Materials (AREA)
  • Insulating Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
PCT/JP2001/008210 2000-09-22 2001-09-20 Materiau et vernis pour film isolant, film isolant et dispositif a semiconducteurs faisant appel a ce materiau et a ce vernis WO2002024788A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP01967765A EP1333050B1 (en) 2000-09-22 2001-09-20 Material for insulating film, coating varnish for insulating film, and insulating film and semiconductor device using the same
DE60125575T DE60125575T2 (de) 2000-09-22 2001-09-20 Material für isolierfilm, decklack für isolierfilm und isolierfilm und damit hergestellte halbleitervorrichtung
KR1020037004154A KR100787265B1 (ko) 2000-09-22 2001-09-20 절연막용 재료, 절연막용 코팅 니스 및 이들을 이용한절연막 및 반도체 장치
US10/380,872 US7049371B2 (en) 2000-09-22 2001-09-20 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000-288271 2000-09-22
JP2000288271 2000-09-22
JP2000-401237 2000-12-28
JP2000401237A JP3492316B2 (ja) 2000-09-22 2000-12-28 絶縁膜用材料、絶縁膜用コーティングワニス及びこれらを用いた絶縁膜並びに半導体装置

Publications (1)

Publication Number Publication Date
WO2002024788A1 true WO2002024788A1 (fr) 2002-03-28

Family

ID=26600496

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/008210 WO2002024788A1 (fr) 2000-09-22 2001-09-20 Materiau et vernis pour film isolant, film isolant et dispositif a semiconducteurs faisant appel a ce materiau et a ce vernis

Country Status (9)

Country Link
US (1) US7049371B2 (ja)
EP (1) EP1333050B1 (ja)
JP (1) JP3492316B2 (ja)
KR (1) KR100787265B1 (ja)
CN (1) CN1231525C (ja)
AT (1) ATE349481T1 (ja)
DE (1) DE60125575T2 (ja)
TW (1) TWI277629B (ja)
WO (1) WO2002024788A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8337982B2 (en) 2004-12-28 2012-12-25 Sumitomo Bakelite Co., Ltd. Benzoxazole resin precursor, polybenzoxazole resin, resin film and semiconductor device

Families Citing this family (20)

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JP2002105202A (ja) * 2000-10-03 2002-04-10 Daikin Ind Ltd ビス（３−アミノ−５−アリール−４−ヒドロキシアリール）フルオロアルカン誘導体
US20050075696A1 (en) 2003-10-02 2005-04-07 Medtronic, Inc. Inductively rechargeable external energy source, charger, system and method for a transcutaneous inductive charger for an implantable medical device
JP4520724B2 (ja) * 2003-11-05 2010-08-11 ダイセル化学工業株式会社 プレポリマー組成物の製造法、及び絶縁膜の製造法
WO2005068535A1 (ja) * 2004-01-20 2005-07-28 Asahi Kasei Emd Corporation 樹脂及び樹脂組成物
JP2005255612A (ja) * 2004-03-11 2005-09-22 Sumitomo Bakelite Co Ltd エチニル基を有する芳香族ジカルボン酸エステル及びその製造方法
WO2005114724A1 (ja) 2004-05-21 2005-12-01 Jsr Corporation 積層体および半導体装置
EP1813637A4 (en) * 2004-09-30 2011-08-31 Sumitomo Bakelite Co RESIN COMPOSITION, POLYIMIDE RESIN COMPOSITION, POLYBENZOZAZOL RESIN COMPOSITION, RESIN FILMS, AND SEMICONDUCTOR EQUIPMENT MANUFACTURED THEREWITH
US8178631B2 (en) * 2005-09-21 2012-05-15 Sumitomo Bakelite Company, Ltd. Resin composition, varnish, resin film and semiconductor device
TWI407255B (zh) * 2005-09-22 2013-09-01 Hitachi Chem Dupont Microsys 負片型感光性樹脂組成物、圖案形成方法以及電子零件
US20100159217A1 (en) * 2006-06-20 2010-06-24 Hitachi Chemical Dupont Microsystems, Ltd Negative-type photosensitive resin composition, method for forming patterns, and electronic parts
JP4911454B2 (ja) * 2006-09-19 2012-04-04 富士フイルム株式会社 ポリベンゾオキサゾール前駆体、それを用いた感光性樹脂組成物及び半導体装置の製造方法
WO2008111470A1 (ja) * 2007-03-12 2008-09-18 Hitachi Chemical Dupont Microsystems, Ltd. 感光性樹脂組成物、該樹脂組成物を用いたパターン硬化膜の製造方法及び電子部品
JP5176872B2 (ja) * 2007-10-29 2013-04-03 日立化成デュポンマイクロシステムズ株式会社 ポジ型感光性樹脂組成物、パタ−ンの製造方法及び電子部品
KR101138800B1 (ko) * 2009-11-26 2012-04-24 제일모직주식회사 고내열성 투명 고분자 수지 및 이의 제조방법
CN103260890B (zh) * 2010-11-01 2016-05-18 太阳化学公司 平版胶印油墨用的润版液
JP6006716B2 (ja) * 2011-03-03 2016-10-12 株式会社カネカ 新規な絶縁膜及び絶縁膜付きプリント配線板
CN102925024B (zh) * 2012-11-15 2015-07-08 中国科学院深圳先进技术研究院 绝缘膜用组合物及三维垂直孔的孔壁上形成绝缘膜的方法
US9620378B1 (en) * 2015-12-24 2017-04-11 Jsr Corporation Composition for film formation, film, production method of patterned substrate, and compound
KR101906064B1 (ko) 2017-07-25 2018-10-08 송기용 저온경화 가능한 유기절연체 조성물 및 이를 이용한 유기절연막 제조방법
CN114716858B (zh) * 2022-04-24 2022-11-11 住井科技(深圳)有限公司 低介电耐电涌清漆及绝缘电线

Citations (3)

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WO1995012628A1 (en) * 1993-11-01 1995-05-11 Research Corporation Technologies, Inc. Conjugated polymer exciplexes and applications thereof
JP2000344896A (ja) * 1999-03-31 2000-12-12 Sumitomo Bakelite Co Ltd 有機絶縁膜材料、有機絶縁膜及びその製造方法
JP2001283638A (ja) * 2000-03-30 2001-10-12 Sumitomo Bakelite Co Ltd 絶縁材用樹脂組成物及びこれを用いた絶縁材

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Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
WO1995012628A1 (en) * 1993-11-01 1995-05-11 Research Corporation Technologies, Inc. Conjugated polymer exciplexes and applications thereof
JP2000344896A (ja) * 1999-03-31 2000-12-12 Sumitomo Bakelite Co Ltd 有機絶縁膜材料、有機絶縁膜及びその製造方法
JP2001283638A (ja) * 2000-03-30 2001-10-12 Sumitomo Bakelite Co Ltd 絶縁材用樹脂組成物及びこれを用いた絶縁材

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8337982B2 (en) 2004-12-28 2012-12-25 Sumitomo Bakelite Co., Ltd. Benzoxazole resin precursor, polybenzoxazole resin, resin film and semiconductor device

Also Published As

Publication number Publication date
JP2002167442A (ja) 2002-06-11
KR100787265B1 (ko) 2007-12-21
US7049371B2 (en) 2006-05-23
CN1461323A (zh) 2003-12-10
EP1333050A1 (en) 2003-08-06
TWI277629B (en) 2007-04-01
DE60125575D1 (de) 2007-02-08
KR20040030416A (ko) 2004-04-09
US20040002572A1 (en) 2004-01-01
EP1333050A4 (en) 2005-03-02
EP1333050B1 (en) 2006-12-27
JP3492316B2 (ja) 2004-02-03
CN1231525C (zh) 2005-12-14
ATE349481T1 (de) 2007-01-15
DE60125575T2 (de) 2007-04-19

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