WO2000023282A1 - Tete d'impression thermique a couches epaisses et son procede de fabrication - Google Patents
Tete d'impression thermique a couches epaisses et son procede de fabrication Download PDFInfo
- Publication number
- WO2000023282A1 WO2000023282A1 PCT/JP1999/005724 JP9905724W WO0023282A1 WO 2000023282 A1 WO2000023282 A1 WO 2000023282A1 JP 9905724 W JP9905724 W JP 9905724W WO 0023282 A1 WO0023282 A1 WO 0023282A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coat layer
- glass
- glass coat
- heating resistor
- less
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
- B41J2/33505—Constructional details
- B41J2/33525—Passivation layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
- B41J2/33505—Constructional details
- B41J2/3353—Protective layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
- B41J2/33545—Structure of thermal heads characterised by dimensions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
- B41J2/33555—Structure of thermal heads characterised by type
- B41J2/3357—Surface type resistors
Definitions
- the present invention relates to a thick film type thermal print head.
- the present invention relates to a thick-film type thermal printhead provided with a hard glass layer for protection of exothermic antibodies.
- the present invention also relates to a method for manufacturing such a thick-film type thermal print head.
- FIG. 5 shows an example of a conventional thick film type thermal print head.
- the illustrated thermal print head includes an insulating substrate 51, a thermal storage layer 52 formed on the substrate 51, and a conductor formed on the glaze layer 52. Includes 53 and 53 days.
- the conductor pattern 53 has a common electrode, an individual electrode, and the like.
- the thermal print head includes a heating resistor 54 electrically connected to the conductor pattern 53 and a first resistor for protecting the heating resistor 54, the conductor pattern 53 and the glaze layer. And a glass coat layer 55.
- the conventional thermal print head has a second glass coat layer 56 formed on the first glass coat layer 55.
- the second glass coat layer 56 is made of a high-strength glass material. Such a configuration is provided for the purpose of surely protecting the heat generating resistor 54 and the like.
- the heating resistor 54 is formed by printing a predetermined resistor paste on the glaze layer 52 and firing the paste.
- this paste material is a mixture of ruthenium oxide and glass frit in a solvent, and the average particle size of the glass frit is about 5 // m.
- the first glass coat layer 55 is made of, for example, amorphous lead glass having a resin component of about 26.5% and a glass component of about 73.5%.
- the glass paste used for forming the glass layer 55 is obtained by mixing a glass frit into a solvent.
- the maximum particle size of the glass frit is about 10 m.
- the average particle size of the glass frit contained in the resistor paste is about 5 ⁇ m.
- the surface roughness of the heating resistor 54 formed from such a resistor paste is a relatively large value of about 0.6 m when represented by the center line average roughness Ra.
- the maximum particle size of the glass frit contained in the glass paste is about 10 as described above.
- the surface roughness of the glass coat layer 55 made of such a glass base is about 0.2 ⁇ m when represented by the center line average roughness Ra, which is a relatively large value.
- the thermal print head provided by the first aspect of the present invention comprises:
- the heating resistor has a center line average roughness of 0.3 or less.
- the first glass coat layer has a center line average roughness of 0.1 / zm or less.
- the heating resistor is made of a paste material containing glass frit having an average particle size of 2 m or less.
- the first glass coat layer may be formed from a paste material containing glass frit having an average particle diameter of 1.5 or less.
- said glass frit has a maximum particle size of 6 m or less.
- an insulating substrate a heating resistor formed on the substrate, and a first glass coat layer formed on the substrate so as to cover the heating resistor. And a second glass coat layer formed on the first glass coat layer.
- the heating resistor is made of a paste material containing a glass frit having an average particle size of 2 m or less.
- the method further comprises printing and baking the paste material.
- the first glass coat layer is formed of a paste material containing a glass frit having an average particle size of 1.5 / im or less.
- the glass frit has a maximum particle size of not more than 6 m.
- the second glass coat layer can be formed by sputtering.
- FIG. 1 is a plan view showing a main part of a thick film type thermal print head according to the present invention. You.
- FIG. 2 is a sectional view taken along the line II-II in FIG.
- FIG. 3 is a graph showing the relationship between the average particle size of the glass frit contained in the resistor paste and the center line average roughness Ra on the surface of the heating resistor.
- FIG. 4 is a graph showing the relationship between the center line average roughness Ra and the rate of occurrence of peeling of the second glass coat layer.
- FIG. 5 is a cross-sectional view showing a main part of a conventional thermal print head.
- the thermal printhead 1 has a ceramic insulating substrate 2 (FIG. 2). On the upper surface of the substrate 2, a glaze layer 6 for heat storage is formed. On the upper surface of the glaze layer, a wiring pattern including one common electrode 3 and a plurality of individual electrodes 4 is formed. Have been.
- the common electrode 3 has a plurality of comb-shaped electrode portions 3a (hereinafter, simply referred to as “teeth”).
- the teeth 3a and the individual electrodes 4 are arranged alternately, and each individual electrode 4 partially enters between two adjacent teeth 3a.
- a bonding pad 4a is formed at the end of each individual electrode 4. These bonding pads 4a are electrically connected to a driving IC (not shown).
- a linear heating resistor 5 is formed on the upper surface of the glaze layer 6 so as to be electrically connected to the teeth 3 a and the individual electrodes 4.
- the heating resistor 5 has a plurality of regions H (only one is shown in FIG. 1) defined by the adjacent teeth 3a, and each region H functions as a heating dot.
- a first glass coat layer 7 is formed on the upper surface of the glaze layer 6, and covers the common electrode 3, the individual electrode 4, and the heating resistor 5.
- a second glass coat layer 8 having high hardness is formed, and covers the first glass coat layer 7.
- a glaze layer 6 is formed by applying a glass material to the upper surface of the substrate 2 and firing it. After that, the common electrode 3 and the individual electrode 4 are formed on the glaze layer 6. These electrodes are formed by printing resinate gold in a predetermined pattern on the glaze layer 6, firing the printed pattern, and removing unnecessary portions of the fired pattern by etching.
- a heating resistor 5 is formed so as to cross the common electrode 3 and the individual electrode 4.
- the heating resistor is formed by printing a resistor paste on the glaze layer 6 and firing the paste.
- the resistor paste used to form the heating resistor 5 is a mixture of ruthenium oxide and glass frit in a solvent, and the average particle size of the glass frit is 2 or less.
- the surface of the finished heating resistor 5 can be made extremely smooth.
- the center line average roughness Ra of the surface of the heat generating resistor 5 is equal to or less than 0.3 m.
- the maximum thickness of the heating resistor 5 is about 9 im.
- the first glass coat layer 7 is formed so as to cover the common electrode 3, the individual electrode 4 and the heating resistor 5.
- the first glass coat layer is formed by printing a glass paste and baking it. This glass paste is obtained by mixing glass frit into a solvent, and the average particle size of the glass frit is 1.5 m or less or the maximum particle size is 6 m or less. Therefore, the surface of the completed glass coat layer 7 is extremely smooth. Specifically, the surface roughness of the glass coat layer 7 is such that the center line average roughness Ra is 0.1 / zm or less. The thickness of the glass coat layer 7 is approximately 6 m.
- the second glass coat layer 8 having high hardness is formed by sputtering so as to cover the upper surface of the glass coat layer 7.
- the thickness of the second glass coat layer 8 is about 4 m.
- the second glass coat layer 8 obtained by sputtering.
- stress concentration may occur at a specific portion of the second glass coat layer 8.
- the second glass coat layer 8 may be scratched, or the second glass coat layer 8 may be peeled off from the first glass coat layer 7 to cause a problem.
- the surface of the first glass coat layer 7 is extremely smooth. Therefore, it is possible to effectively prevent the above-described problem from occurring.
- FIG. 3 is a graph showing the results obtained in the experiment. According to this graph, it can be seen that the center line average roughness Ra increases as the average particle size of the glass frit increases.
- the average particle size of the glass frit is set to 2 zm or less.
- the center line average roughness Ra is 0.2 m (see point B). Therefore, if the average particle size is set to 2 m or less, the center line average roughness Ra can be set to 0.2 m or less.
- the graph of FIG. 4 shows the relationship between the center line average roughness Ra on the surface of the heating resistor and the rate of occurrence of peeling of the second glass coat layer. Obtained based on experiments).
- the center line average roughness Ra increases, the occurrence rate of the peeling increases.
- the center line average roughness Ra was about 0.6 m, so that the rate of occurrence of peeling was about 10% (see point C).
- the center line average roughness Ra is 0.2, the above-mentioned rate of occurrence of peeling is about 1% (see point D).
- the center line average roughness Ra is set to 0.2 zm or less. it can.
- the thick film type thermal print head and the method of manufacturing the same according to the preferred embodiment of the present invention have been described, but the present invention is not limited to this embodiment.
- a glass frit having a small average particle size is used for both the resistor paste used for forming the heating resistor and the glass paste used for forming the first glass coat layer. Using.
- a glass frit having a small average particle size for only one of the resistor base and the glass base.
Landscapes
- Electronic Switches (AREA)
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE69934600T DE69934600T2 (de) | 1998-10-22 | 1999-10-15 | Dickfilmthermodruckkopf und herstellungsverfahren |
US09/807,817 US6469724B1 (en) | 1998-10-22 | 1999-10-15 | Thick-film thermal print head and its manufacturing method |
EP99947936A EP1123807B1 (en) | 1998-10-22 | 1999-10-15 | Thick-film thermal print head and its manufacturing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10/300776 | 1998-10-22 | ||
JP30077698A JP3993325B2 (ja) | 1998-10-22 | 1998-10-22 | 厚膜型サーマルプリントヘッド、およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000023282A1 true WO2000023282A1 (fr) | 2000-04-27 |
Family
ID=17888962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1999/005724 WO2000023282A1 (fr) | 1998-10-22 | 1999-10-15 | Tete d'impression thermique a couches epaisses et son procede de fabrication |
Country Status (7)
Country | Link |
---|---|
US (1) | US6469724B1 (ja) |
EP (1) | EP1123807B1 (ja) |
JP (1) | JP3993325B2 (ja) |
KR (1) | KR100380034B1 (ja) |
CN (1) | CN1096361C (ja) |
DE (1) | DE69934600T2 (ja) |
WO (1) | WO2000023282A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3563734B2 (ja) * | 2002-10-29 | 2004-09-08 | ローム株式会社 | サーマルプリントヘッド装置 |
US20050275936A1 (en) * | 2004-06-14 | 2005-12-15 | Anurag Gupta | Bandpass reflector with heat removal |
JP4367771B2 (ja) * | 2004-06-15 | 2009-11-18 | ローム株式会社 | サーマルヘッド |
JP4584947B2 (ja) * | 2007-03-15 | 2010-11-24 | ローム株式会社 | サーマルプリントヘッド |
JP5230455B2 (ja) * | 2009-01-08 | 2013-07-10 | 京セラ株式会社 | 記録ヘッドとその製造方法、ならびに多数個取り基体および記録装置 |
JP2010158873A (ja) * | 2009-01-09 | 2010-07-22 | Tdk Corp | サーマルヘッド |
JP6531423B2 (ja) * | 2015-02-24 | 2019-06-19 | セイコーエプソン株式会社 | 印刷装置 |
CN108944064B (zh) * | 2018-06-07 | 2021-02-23 | 广州四为科技有限公司 | 调测装置、调测热敏头阻值的方法 |
JP7245684B2 (ja) * | 2019-03-19 | 2023-03-24 | ローム株式会社 | サーマルプリントヘッド及びサーマルプリントヘッドの製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0263845A (ja) * | 1988-08-31 | 1990-03-05 | Aisin Seiki Co Ltd | サーマルヘツド |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5444798A (en) * | 1977-09-16 | 1979-04-09 | Hitachi Ltd | Manufacturing process of thick film resistance |
JPS5485394A (en) * | 1977-12-21 | 1979-07-06 | Hitachi Ltd | Thick film resistor for heater |
DE69019592T2 (de) * | 1989-05-02 | 1996-01-11 | Rohm Co Ltd | Thermo-Druckkopf vom Dickschichttyp. |
JPH05335106A (ja) * | 1992-05-28 | 1993-12-17 | Murata Mfg Co Ltd | 抵抗ペースト |
EP0782152B1 (en) * | 1994-09-13 | 2004-08-18 | Kabushiki Kaisha Toshiba | Thermal print head and its manufacture |
-
1998
- 1998-10-22 JP JP30077698A patent/JP3993325B2/ja not_active Expired - Fee Related
-
1999
- 1999-10-15 EP EP99947936A patent/EP1123807B1/en not_active Expired - Lifetime
- 1999-10-15 US US09/807,817 patent/US6469724B1/en not_active Expired - Lifetime
- 1999-10-15 WO PCT/JP1999/005724 patent/WO2000023282A1/ja active IP Right Grant
- 1999-10-15 DE DE69934600T patent/DE69934600T2/de not_active Expired - Fee Related
- 1999-10-15 CN CN99812386A patent/CN1096361C/zh not_active Expired - Fee Related
- 1999-10-15 KR KR10-2001-7004897A patent/KR100380034B1/ko not_active IP Right Cessation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0263845A (ja) * | 1988-08-31 | 1990-03-05 | Aisin Seiki Co Ltd | サーマルヘツド |
Non-Patent Citations (1)
Title |
---|
See also references of EP1123807A4 * |
Also Published As
Publication number | Publication date |
---|---|
DE69934600D1 (de) | 2007-02-08 |
EP1123807A4 (en) | 2002-01-16 |
KR20010080241A (ko) | 2001-08-22 |
DE69934600T2 (de) | 2007-11-15 |
EP1123807B1 (en) | 2006-12-27 |
KR100380034B1 (ko) | 2003-04-14 |
CN1324304A (zh) | 2001-11-28 |
JP3993325B2 (ja) | 2007-10-17 |
JP2000127471A (ja) | 2000-05-09 |
US6469724B1 (en) | 2002-10-22 |
EP1123807A1 (en) | 2001-08-16 |
CN1096361C (zh) | 2002-12-18 |
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