WO1999027567A1 - Procede de detection de marque et capteur de position de marque - Google Patents
Procede de detection de marque et capteur de position de marque Download PDFInfo
- Publication number
- WO1999027567A1 WO1999027567A1 PCT/JP1998/005226 JP9805226W WO9927567A1 WO 1999027567 A1 WO1999027567 A1 WO 1999027567A1 JP 9805226 W JP9805226 W JP 9805226W WO 9927567 A1 WO9927567 A1 WO 9927567A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- alignment mark
- mark
- light
- substrate
- coherent
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP98954761A EP1041608B1 (en) | 1997-11-20 | 1998-11-19 | Method and system for detecting a mark |
AU11745/99A AU1174599A (en) | 1997-11-20 | 1998-11-19 | Mark detection method and mark position sensor |
JP2000522614A JP4192423B2 (ja) | 1997-11-20 | 1998-11-19 | マーク検出方法、位置検出装置、露光方法及び装置、デバイス製造方法、並びにデバイス |
DE69840031T DE69840031D1 (de) | 1997-11-20 | 1998-11-19 | Methode und System zur Detektion einer Marke |
US09/573,223 US6285455B1 (en) | 1997-11-20 | 2000-05-19 | Mark detection method, optical system and mark position detector |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9/319239 | 1997-11-20 | ||
JP31923997 | 1997-11-20 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/573,223 Continuation US6285455B1 (en) | 1997-11-20 | 2000-05-19 | Mark detection method, optical system and mark position detector |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1999027567A1 true WO1999027567A1 (fr) | 1999-06-03 |
Family
ID=18107976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1998/005226 WO1999027567A1 (fr) | 1997-11-20 | 1998-11-19 | Procede de detection de marque et capteur de position de marque |
Country Status (7)
Country | Link |
---|---|
US (1) | US6285455B1 (ja) |
EP (1) | EP1041608B1 (ja) |
JP (1) | JP4192423B2 (ja) |
AT (1) | ATE408857T1 (ja) |
AU (1) | AU1174599A (ja) |
DE (1) | DE69840031D1 (ja) |
WO (1) | WO1999027567A1 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6285455B1 (en) | 1997-11-20 | 2001-09-04 | Nikon Corporation | Mark detection method, optical system and mark position detector |
JP2002231620A (ja) * | 2001-01-12 | 2002-08-16 | Samsung Electronics Co Ltd | 整列マーク並びにこれを用いた露光整列システム及び整列方法 |
JP2009094512A (ja) * | 2007-10-09 | 2009-04-30 | Asml Netherlands Bv | 位置合わせ方法及び装置、リソグラフィ装置、計測装置、及びデバイス製造方法 |
JP2009147317A (ja) * | 2007-11-20 | 2009-07-02 | Asml Netherlands Bv | リソグラフィ装置および方法 |
US7875850B2 (en) | 2007-04-11 | 2011-01-25 | Hitachi High-Technologies Corporation | Standard component for calibration and electron-beam system using the same |
JP2011040549A (ja) * | 2009-08-10 | 2011-02-24 | Canon Inc | 検出装置、露光装置及びデバイスの製造方法 |
KR20200067248A (ko) * | 2017-02-01 | 2020-06-12 | 가부시기가이샤 디스코 | 가공 방법 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7057299B2 (en) * | 2000-02-03 | 2006-06-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Alignment mark configuration |
US6704089B2 (en) * | 2000-04-28 | 2004-03-09 | Asml Netherlands B.V. | Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
US6633048B2 (en) * | 2001-05-03 | 2003-10-14 | Northrop Grumman Corporation | High output extreme ultraviolet source |
US20040005769A1 (en) * | 2002-07-03 | 2004-01-08 | Cabot Microelectronics Corp. | Method and apparatus for endpoint detection |
SG120949A1 (en) * | 2002-09-20 | 2006-04-26 | Asml Netherlands Bv | Alignment system and methods for lithographic systems using at least two wavelengths |
US6774452B1 (en) | 2002-12-17 | 2004-08-10 | Cypress Semiconductor Corporation | Semiconductor structure having alignment marks with shallow trench isolation |
KR100519948B1 (ko) * | 2003-05-20 | 2005-10-10 | 엘지.필립스 엘시디 주식회사 | 비정질 실리콘의 결정화 공정 및 이를 이용한 스위칭 소자 |
DE10356519A1 (de) * | 2003-12-03 | 2005-07-07 | Infineon Technologies Ag | Verfahren und optisches System zum Erfassen einer geometrischen Form auf einem Halbleitersubstrat |
US7565219B2 (en) * | 2003-12-09 | 2009-07-21 | Asml Netherlands B.V. | Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby |
JP4777731B2 (ja) * | 2005-03-31 | 2011-09-21 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
US7612892B2 (en) * | 2005-10-06 | 2009-11-03 | Nikon Corporation | Imaging optical system configured with through the lens optics for producing control information |
JP5425363B2 (ja) * | 2006-11-28 | 2014-02-26 | ルネサスエレクトロニクス株式会社 | 半導体装置、及び表示装置 |
JP2008270072A (ja) * | 2007-04-24 | 2008-11-06 | Sii Nanotechnology Inc | 荷電粒子ビーム装置 |
CN101435997B (zh) * | 2007-11-15 | 2012-06-27 | 上海华虹Nec电子有限公司 | 光刻套刻精度的测试图形及测量方法 |
US8088633B2 (en) * | 2009-12-02 | 2012-01-03 | Ultratech, Inc. | Optical alignment methods for forming LEDs having a rough surface |
CN102243442B (zh) * | 2010-05-12 | 2014-11-12 | 上海微电子装备有限公司 | 硅片对准光源幅度调制装置 |
US8422027B2 (en) | 2010-06-08 | 2013-04-16 | Nikon Corporation | Imaging optical system for producing control information regarding lateral movement of an image plane or an object plane |
DE102013220190B4 (de) * | 2013-10-07 | 2021-08-12 | Dr. Johannes Heidenhain Gmbh | Messteilung und lichtelektrische Positionsmesseinrichtung mit dieser Messteilung |
CN104359410B (zh) * | 2014-12-01 | 2017-05-17 | 清华大学 | 一种利用可旋转光栅测量的位移测量系统 |
JP6378117B2 (ja) * | 2015-03-13 | 2018-08-22 | 東芝メモリ株式会社 | アライメントマークの形成方法および半導体装置 |
JP6553817B2 (ja) | 2016-01-19 | 2019-07-31 | エーエスエムエル ネザーランズ ビー.ブイ. | 位置センシング機構、そのような機構を含むリソグラフィ装置、位置センシング方法、及びデバイス製造方法 |
NL2019155A (en) | 2016-08-30 | 2018-03-06 | Asml Netherlands Bv | Position sensor, lithographic apparatus and method for manufacturing devices |
JP6584567B1 (ja) * | 2018-03-30 | 2019-10-02 | キヤノン株式会社 | リソグラフィ装置、パターン形成方法及び物品の製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08250391A (ja) * | 1995-03-10 | 1996-09-27 | Nikon Corp | 位置検出用マーク及び位置検出方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63240018A (ja) | 1987-03-27 | 1988-10-05 | Matsushita Electric Ind Co Ltd | アライメント方法 |
JP2773147B2 (ja) * | 1988-08-19 | 1998-07-09 | 株式会社ニコン | 露光装置の位置合わせ装置及び方法 |
JP2906433B2 (ja) | 1989-04-25 | 1999-06-21 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
US5151750A (en) | 1989-04-14 | 1992-09-29 | Nikon Corporation | Alignment apparatus |
JPH032504A (ja) * | 1989-05-30 | 1991-01-08 | Nikon Corp | 位置合わせ装置 |
JPH05326360A (ja) * | 1992-05-20 | 1993-12-10 | Victor Co Of Japan Ltd | 半導体装置の製造方法及び製造装置 |
JPH06260389A (ja) | 1993-03-05 | 1994-09-16 | Nikon Corp | アライメント装置 |
JPH07321030A (ja) | 1994-03-29 | 1995-12-08 | Nikon Corp | アライメント装置 |
US5721605A (en) | 1994-03-29 | 1998-02-24 | Nikon Corporation | Alignment device and method with focus detection system |
AU1174599A (en) | 1997-11-20 | 1999-06-15 | Nikon Corporation | Mark detection method and mark position sensor |
-
1998
- 1998-11-19 AU AU11745/99A patent/AU1174599A/en not_active Abandoned
- 1998-11-19 JP JP2000522614A patent/JP4192423B2/ja not_active Expired - Fee Related
- 1998-11-19 EP EP98954761A patent/EP1041608B1/en not_active Expired - Lifetime
- 1998-11-19 WO PCT/JP1998/005226 patent/WO1999027567A1/ja active IP Right Grant
- 1998-11-19 AT AT98954761T patent/ATE408857T1/de not_active IP Right Cessation
- 1998-11-19 DE DE69840031T patent/DE69840031D1/de not_active Expired - Lifetime
-
2000
- 2000-05-19 US US09/573,223 patent/US6285455B1/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08250391A (ja) * | 1995-03-10 | 1996-09-27 | Nikon Corp | 位置検出用マーク及び位置検出方法 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6285455B1 (en) | 1997-11-20 | 2001-09-04 | Nikon Corporation | Mark detection method, optical system and mark position detector |
JP2002231620A (ja) * | 2001-01-12 | 2002-08-16 | Samsung Electronics Co Ltd | 整列マーク並びにこれを用いた露光整列システム及び整列方法 |
US7875850B2 (en) | 2007-04-11 | 2011-01-25 | Hitachi High-Technologies Corporation | Standard component for calibration and electron-beam system using the same |
JP2009094512A (ja) * | 2007-10-09 | 2009-04-30 | Asml Netherlands Bv | 位置合わせ方法及び装置、リソグラフィ装置、計測装置、及びデバイス製造方法 |
JP2009147317A (ja) * | 2007-11-20 | 2009-07-02 | Asml Netherlands Bv | リソグラフィ装置および方法 |
JP2011040549A (ja) * | 2009-08-10 | 2011-02-24 | Canon Inc | 検出装置、露光装置及びデバイスの製造方法 |
KR20200067248A (ko) * | 2017-02-01 | 2020-06-12 | 가부시기가이샤 디스코 | 가공 방법 |
KR102363110B1 (ko) | 2017-02-01 | 2022-02-15 | 가부시기가이샤 디스코 | 가공 방법 |
Also Published As
Publication number | Publication date |
---|---|
DE69840031D1 (de) | 2008-10-30 |
EP1041608A1 (en) | 2000-10-04 |
JP4192423B2 (ja) | 2008-12-10 |
US6285455B1 (en) | 2001-09-04 |
EP1041608A4 (en) | 2003-11-19 |
AU1174599A (en) | 1999-06-15 |
ATE408857T1 (de) | 2008-10-15 |
EP1041608B1 (en) | 2008-09-17 |
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