Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
  • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
  • B23K26/08—Devices involving relative movement between laser beam and workpiece
  • B23K26/083—Devices involving movement of the workpiece in at least one axial direction
  • B23K26/0838—Devices involving movement of the workpiece in at least one axial direction by using an endless conveyor belt
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
  • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
  • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
  • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
  • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
  • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks

Definitions

• the present invention relates to a laser marking system and a method therefor, and more particularly to a laser marking system and a method suitable for marking marks such as numbers and identification marks on products in a semiconductor manufacturing process.
• an ink jet method is generally employed.
• recording is performed by changing the relative positions of the nozzles of the ink jet and the ink jet by the transfer device, and the linkage between the transfer device and the ink jet is indispensable. (Showa 57-149981).
• Such a laser marking device requires a deflector for raster XY deflection scanning of a laser beam incident on a pattern displayed on a mask, and deflects the laser beam transmitted through the mask toward a work transfer line.
• a deflector that performs XY deflection scanning along the work plane so as to form a divided pattern is required.
• an XY deflection scanning drive system is required both in the optical path of the laser beam incident on the mask and in the optical path of the mask, and the equipment load is large and there are many control targets.
• a laser marking device using a liquid crystal mask displays patterns on this mask in a time-division manner, but the positioning accuracy of the marking depends on the dot pitch of this mask. That is, the mark displayed on the mask is turned on and off depending on whether or not the dot transmits the laser beam, and therefore, the position accuracy cannot be more than the dot pitch. Since the gap between the dots cannot be marked, the marked mark is unclear. Disclosure of the invention
• a first aspect of the present invention is to provide a laser marking device that scans a laser beam from a laser oscillator on a mask surface with a first deflector and irradiates the transmitted light with a second deflector for marking the work surface, and a work transfer device.
• Transport device consisting of a rack, an installation plate on which the transport device can be moved up and down, a loader unit for supplying the work and an unloader unit for unloading the work, and integrated control of these devices via a communication line.
• a production control host computer that transmits and receives the control unit and manages the marking process. That have a marking data generating computer evening annexed to the marking device.
• This transport device is composed of a feeder unit, a first feeder unit disposed before and after the feeder unit, an escape unit and a second feeder unit, and an escape unit force. These first and second feeder units are provided.
• a first loader / unloader unit and a second loader / unloader unit for supplying or unloading a mark may be provided outside the escape unit escape unit.
• This laser marking device includes a first deflector that scans a laser beam from a laser oscillator in one direction, and a division pattern obtained by dividing a marking pattern so as to match a scanning line of the laser beam from the first deflector. And a second deflector that deflects the scanning light selectively transmitted through the mask to irradiate a marking pattern on the work surface, and that the divided pattern is continuously displayed on the mask.
• control means is provided for controlling the second deflector so as to deflect it in the division direction for each divided pattern scanning light, and for marking a pattern synthesized by scanning by the first deflector and the second deflector on the work. I have.
• the laser marking device is provided with a first optical system that divides a laser beam from a laser oscillator in a plurality of directions, and is arranged on each of the divided laser light paths so as to fill a gap between mask dots.
• a first optical system that divides a laser beam from a laser oscillator in a plurality of directions, and is arranged on each of the divided laser light paths so as to fill a gap between mask dots.
• a plurality of masks A plurality of masks; a first deflector provided between the first optical system and the plurality of masks; a second optical system for integrating light transmitted through the plurality of masks in a single direction; and a second optical system.
• the apparatus may further include a second deflector provided later, and control means for marking a pattern on the workpiece with a pattern synthesized by scanning by the first deflector and the second deflector.
• the mask used in the laser marking device is a transmissive liquid crystal mask.
• the production management host computer overnight includes the units of the transfer device and the installation plate thereof, and the loader unit and the fan loader unit that supplies and unloads the work. It can be controlled individually according to time. In addition, it is possible to control the transport and supply and unloading of workpieces in accordance with the speeding up of marking by the laser marking device. Therefore, not only can the speed of simple marking be increased, but also the operation timing of the entire system can be set to maximize efficiency, and a large amount of workpieces can be marked in a short time.
• a one-way scanning line of the first deflector for example, a division pattern obtained by dividing a marking pattern so as to correspond to the X direction is sequentially displayed on a mask, and this is displayed on each mask. Scanning is performed for each pattern.
• the first deflector only needs to be scanned in one direction, so that it can be composed of, for example, only a polygon mirror.
• the scanning transmitted light of the mask is irradiated on the work surface by the second deflector, but the deflection position of the second deflector on the work surface is fixed in the X direction, and the transmitted light of the one-divided pattern ends in the Y direction. Sometimes it is moved by the division pitch.
• the incident light side of the mask is scanned in the X direction, and the emitted light side is scanned in the Y direction, and the marks divided by the two can be combined for marking. Therefore, it is not necessary to perform the raster scanning of the irradiation laser on the mask, and the elements to be controlled and driven can be reduced, so that the controllability can be improved.
• the display pattern at this time fills the gap between the mask dots. And the same marking pattern is displayed. Then, the laser beam is divided and scanned on each mask, Since the light is integrated in a single direction and added to the second deflector, and the synthesized pattern is marked on the work, the positioning accuracy of the marking, which was limited by the pitch interval of the mask dots, can be improved.
• a laser beam from a laser oscillator is scanned on a mask surface by a first deflector, and the transmitted light is applied to a mark surface by a second deflector, and a workpiece before marking is supplied.
• the workpiece after marking is carried out, (1) the workpiece is fixed and moved to the feed unit provided at the irradiation position of the marking, and the marking is released after the marking is completed. (2) At that time, the work supplied from the loader section is fixed and moved to the feeder introduction unit located in front of this feeder unit, and the work is released and the work is released. (3) At that time, feed to the feeder escape unit located after this feed unit.
• the process of fixing and moving the workpiece unloaded from the unit, releasing the workpiece, transporting it to the unloader unit, and returning to the original position is performed by the control unit that transmits and receives to and from the production management host computer.
• the first deflector that scans the laser light from the laser oscillator in one direction sequentially uses the divided pattern corresponding to one scan line as a mask. Scanning light is displayed continuously, and the scanning light selectively transmitted through the mask is deflected by the second deflector to irradiate the divided surface onto the work surface, and the second deflector is turned on for each divided scanning light.
• the pattern is controlled so as to be deflected in the dividing direction, and a pattern synthesized by scanning by the first deflector and scanning by the second deflector is marked on the work.
• the laser beam from the laser oscillator is divided in a plurality of directions by the first optical system, and the gap between the mask dots is formed by a plurality of masks arranged in the divided laser light paths.
• the same masking pattern is displayed while being shifted so as to fill it, and the laser beam incident on these masks is deflected by the first deflector.
• the transmitted light of these masks may be integrated in a single direction by the second optical system, and the pattern synthesized via the second deflector may be marked on the work.
• FIG. 1 is a configuration diagram of a laser marking system according to a first embodiment of the present invention
• FIG. 2 is a schematic explanatory diagram of a laser marking device
• FIG. 3 is a processing flowchart of a loader section
• FIG. Fig. 5 is a flow chart of the feeder unit
• Fig. 6 is a flow chart of the feeder escape unit
• Fig. 7 is a flowchart of the feeder unit.
• FIG. 8 is an operation chart of the marking system of the first embodiment
• FIG. 9 is an explanatory view of the feedback receiving state of the feed unit
• FIG. 10 is an explanatory view of the work marking state
• FIG. 1 is an explanatory diagram of a work escape state
• FIG. 12 is a configuration diagram of a marking system according to a second embodiment
• FIG. 13 is a configuration diagram of a laser marking device according to a third embodiment
• FIG. 14 is a liquid crystal mask display
• Fig. 15 is a flowchart of the processing of the laser marking device
• Fig. 6 is an im- munication chart of the operation of the laser marking device
• Fig. 17 is the marking pattern and division.
• FIG. 18 is an explanatory view of a pattern
• FIG. 18 is an explanatory view of a main part of a laser marking apparatus according to a fourth embodiment
• FIGS. 19A, 19B, and 19C are display patterns of respective masks according to the fourth embodiment. It is explanatory drawing of those integration patterns.
• a laser beam emitted from a YAG laser oscillator 1 serving as a light source is irradiated to an X-direction deflection mirror 2 and The reflected light is sequentially marked by the scanning operation of the X-direction deflection mirror 2.
• the light is deflected by a predetermined angle in the X direction on the switching surface 10.
• the reflected light is applied to the polygon mirror 4 via the relay lens 3, and the rotation of the polygon mirror 4 scans the marking surface 10 in one row in the Y direction in the Y direction.
• the laser beam is condensed to a desired size by a field lens 5, passes through a liquid crystal mask 6, a deflection mirror 7, and a relay lens 9, and is marked according to the setting pattern of the liquid crystal mask 6.
• FIG. 1 shows the overall configuration of a laser marking system including such a laser marking device 48.
• the work 11 is carried in and out by the transfer device 14 so that the marking surface 10 is located at the focal position of the relay lens 9 serving as the laser emission port of the laser marking device 48.
• the transport device 14 is located immediately below the relay lens 9 and moves the workpiece 12 to the marking location in accordance with the marking state.
• the transport unit 14F is located on the upstream side of the feeder unit 16.
• Feeder introduction unit 16I that supplies work 12 to feeder unit 16F, and work 1 after marking that is arranged downstream of feeder unit 16F 2 and feeder escape unit 16E which carries out from feeder unit 16F.
• Units 16F, 161, and 16E installed on the installation plate 18 are screw shafts 2 2F that are provided concentrically along the paper transport direction. , 221, 22E and feeder table 24F, supply table 24I screwed into each screw shaft 22F, 221.22E and movable in the axial direction , Escape Table 24 E respectively.
• Each of the screw shafts 22F, 22I, and 22E is provided with a respective rotary drive motor 26F, 261, 26E, and is independently driven.
• guide rails 28 are installed in parallel with each screw shaft 22F, 221, 22E and guide the travel of each table 24F, 241, 24E. ing. The guide rail 28 penetrates the tables 24 F, 24 1 and 24 E to perform the guide function.
• the feeder table 24F has a concave portion formed at the center to support both side edges of the workpiece 12.
• the feeding table 24 I and the escape table 24 E are formed so as to be able to be fitted into the concave portions, and supply and carry out the work 12 to and from the feeder table 24 F.
• the work 12 can be mutually transferred by providing an arbitrary work stopper at each of the tables 24 F, 24 1 and 24 E. That is, the work 12 is placed on the feed table 21 on the feeder introduction unit 16 I side, moved to the feed unit 16 F side, and transferred to the feeder table 24 F. After the work 12 is marked, it is transferred to the escape table 24 E on the feeder escape unit 16 E side and carried out to the downstream side of the line.
• the installation plate 18 on which the transport device 14 is mounted is provided with a focus adjustment mechanism 8 so that the focus can be adjusted to the focus of the relay lens 9. That is, the base plate 30 is provided below the installation plate 18, and the installation plate 18 can be moved up and down with respect to the base plate 30 via the elevating guide 32.
• the elevating drive is performed by an elevating drive motor 33 attached to the base plate 30 and an elevating screw 34 screwed to the installation plate 18.
• the lifting drive may be performed by a hydraulic cylinder. As a result, the focal position can be adjusted even when the thickness of the workpiece changes.
• the base plate 30 is provided integrally with a stock table 36 at the side of each of the units 16I, 16F, and 16E.
• a port 3 8 which is located beside the feeder introduction unit 16 I and supplies the unmarked work 12 to the supply table 14 I.
• a fan loader section 40 which is located beside the feeder escape unit 16E and receives the workpiece 12 after marking from the escape table 24E.
• the mouth part 38 and the unloader part 40 both suction and lift the work 12 by the suction means, and move between the stock table 36 and the feeder introduction unit 16 I and the storage section. Move between table 36 and feeder escape unit.
• Host computer for production control to control contents and quantity It is equipped with a user computer (hereinafter referred to as a host computer) 44 and an engraving data creation computer (hereinafter simply referred to as a computer) 46 attached to the laser marking device 48.
• a network is set up so that data transmission and reception between these devices is performed via a communication line.
• the data flow between the host computer 44 and the transport device 14 is as follows.
• the host computer 44 transmits the data (marking content and number, work dimensions, etc.) relating to the work 12 to be marked from now on to the transfer device 14.
• the control unit 42 controls and drives each unit such as the units 16 1, 16 F, and 16 E of the transfer device 14, the loader unit 38, and the unloader unit 40 based on this.
• the flow of data between the transport device 14 and the laser marking device 48 is as follows. That is, a mark request signal, a marking data change request signal, a request data identification number flowing from the transfer device 14 to the laser marking device 48, and a flow flowing from the laser marking device 48 to the transfer device 14. Marking is performed sequentially by the mark transport request signal and the error notification signal that flows mutually.
• the operator creates a plurality of marking data including the marking content and its position, the state setting of the laser marking device 48, etc. It is registered in the memory of computer 46.
• the computer 46 outputs the requested marking data.
• control unit 42 is provided with various elements of the transfer device 14, mainly the loader unit 38, the feeder introduction unit 16I, and the feeder unit in order to increase the marking efficiency.
• 16 F feeder escape unit 16 E
• loader unit 38 controlling the unloader unit 40
• the hand 38a with the suction pad is moved to (Step 100).
• Host computer -1 o-The computer 44 determines whether or not there is a workpiece 12 in the stock unit 39 by a sensor (not shown) (step 101). End the tuning work. If there is a stock, the work 12 is sucked and fixed (Step 2).
• the feeder introduction unit 16I is moved above the fixed position (step 103).
• step 104 the process waits until the supply table 241 reaches the fixed position (step 104). After confirming that the supply table 24 has moved, lower the work 12 and transfer it to the supply table 24I to confirm whether or not it is fixed thereto (step 105). . Thereafter, the work fixation by the loader section 38 is released (step 106), and these processes are repeated.
• the feeder introduction unit 16I is moved to a position for receiving a work from the loader section 38 as shown in FIG. 4 (step 200). Here, it waits until it is confirmed whether or not the work 12 has been supplied from the loader section 38 (step 201), and when the work 12 is supplied, the work 12 is fixed to the supply table 24 1 ( Steps 202, 203). Feed table 24 I moves toward feed unit 16 F (step 202).
• step 204 The work 12 is waited at the transfer position to the feeder table 24F (step 205). Then, the fixing state of the work 12 is confirmed (step 206), and after the fixing operation, the fixing of the supply table 24 I side is released (step 207). Thereafter, the flow returns to step 200 and the above processing is repeated.
• feeder table 24F is moved to the parking position as shown in FIG. 5 (step 300), and work 1 is fed from feeder introduction unit 16I. Wait until 2 is supplied (step 301). When it is confirmed that the work 12 has been transferred (step 302), it is fixed (step 303). Then, the laser marking device 48 is driven to perform marking (step
• step 304 while marking position is moved, marking is performed on all patterns (step 304).
• step 300 the work 12 is made to wait until the escape table 24E can be received (step 300), and the escape table 24E becomes the feeder table 24F. Sink into and fix work 1 2 It is confirmed whether or not it has been performed (step 308).
• step 309 the fixing by the feeder table 24 is released to complete the transfer. Then, the process returns to the first step 300 and waits for the supply of the next work 12.
• the workpiece 12 on which the marking on the feeder table 24F has been completed is moved to a position where it can be received (step 400) and the apparatus stands by. (Step 401).
• escape table 24 E fixes work 12 (steps 402 and 40 3), moves it downstream, and unloads it.
• steps 404, 405 To the standby position (steps 404, 405).
• step 406 it is confirmed whether or not the work 12 has been unloaded by the unloader section 40 (step 406), and if it has not been unloaded, the standby state is continued. If unloaded, return to the first step 400 and repeat the same process thereafter.
• the hand 40a with the suction pad is moved to the open position of the workpiece 12 after the marking on the escape table 24E and is put on standby (step 5). 0 0, 5 0 1).
• the host computer 44 checks whether or not the escape table 24 E has reached the work release position (step 502). If the escape table 24 E has reached, the hand with suction pad 40a is determined. Is lowered to suck and fix the work 1 2 (Step 503).
• the hand 40a with the suction pad is moved upward, and then the marking-completed workstock part 41 is pulled in and moved (step 504). Here, the fixing of the work 12 is released (step 505), and thereafter, these processes are repeated.
• the operations of the transport device 14 and the laser marking device 48 that are driven and controlled in this manner are controlled by the host computer 44 based on a timing chart as shown in FIG.
• c full I Dayuni' preparative 1 6 F Fi Dayuni' preparative 1 6 F that contribute to the marking directly it is necessary to perform a minimum action constantly Fi Dateburu 2 4 Fixing work 1 and 2 to F, Marking the work 12 while moving the feeder table 24F, releasing the work 12 that has finished marking, and returning the feeder table 24F to the fixed position of the work 12 Repeat the operation.
• the feeder introduction unit 1 6 1 is the feeder unit 6) Marking table on 6F 2 4
• the following operations are performed simultaneously with the operation such as return movement of 4F. That is, the work 12 for the next masking is received from the loader section 38, fixed to the supply table 24I, and the supply tape 24I is fed to the feed transfer position to the feeder unit 16F. And wait until the fiduciary 16 F comes to pick up the work 12. Further, in response to a request from the feeder unit 16F, the work 12 is delivered to the feeder unit 16F, and the supplied table 24I returns to the loader position.
• the mouth unit 38 In response to a request from the feeder introduction unit 16I, the mouth unit 38 passes the work 12 onto the supply table 24I of the feeder introduction unit 16I. Next, the hand 38 a with the suction pad is moved, the next mark 12 is gripped by the peak stock part 39 before marking, and then the feeder introduction unit 16 I Return to the delivery position and wait.
• the feeder escape unit 16E is waiting at the marking end position of the feeder unit 16F until the work 12 finishes the marking.
• the escape table 24E is moved to the unload position, and the work 12 is released. After that, it returns to the marking end position on Fidunit 16F.
• the mouth opening section 40 grips the work 12 from above the escape table 24E. Next, the window 40a with the suction pad is moved, and the workpiece 12 is stacked on the marking end work stock part 4 1, and then the work transfer position of the feeder escape unit 16 E Return and wait.
• FIG. 9 shows the state of each unit while the work 12 is being transferred from the supply table 24 I to the feeder table 24 F.
• the loader unit 38 prepares for the transfer of the next work 11, and the escape table 24 E is passing the marked work 12 to the unloader unit 40.
• FIG. 10 shows the state of each unit during marking on the feeder table 24F.
• the loader section 38 is placing the next workpiece 12 on the supply table 24 I, and the unloader section 40 is waiting for the end of marking:
• FIG. 11 shows the state of each unit while the work 12 on which the feeder table 24F has finished marking is being transferred to the escape table 24E.
• the supply table 24I is waiting to deliver the next work 12 to the feeder table 24F.
• each of these units is set by the control unit 42 according to the peak size and the marking content obtained from the host computer 44.
• the elevation amount of the installation plate 18 is adjusted by the focus adjustment mechanism 33, and the height of the installation plate 18 is set.
• This embodiment is basically the same as the first embodiment, but the unit before and after the transfer of the work 12 to / from the feed unit I 6 F is performed by using both the introduction and escape work.
• I have. That is, the first feeder introduction / escape unit 16L is movably arranged on the left side of the feeder unit 16F, and the workstock section before marking is placed on both sides of the table 24L. 48 L and a 50 L working-work section after marking are provided, and a first loader / unloader section 52 L is provided outside the 48 L working-work section before marking.
• the second feeder is installed on the right side of feeder 16F.Escape unit 16R is movably arranged, and the markings are placed on both sides of the transfer table 24R before marking.
• the work load section 48R and the work load section 5OR after marking are provided, and the second loader / unloader section 52R is provided outside the work load section 48R before marking. .
• the feeder unit 16F receives the mark 12 from the feeder introduction 'esk unit 16L and marks it. After marking, feeder 16F introduces the second feeder and hands over this work 12 to escape unit 16R.
• transfer the work 12 with the 1st feeder introduction 'escape unit 16L' Do. In this embodiment, the transfer of the work 12 is performed more efficiently, and a large amount of the work 12 can be marked.
• the laser marking device 68 includes a YAG laser oscillator 61 serving as a laser light source, an optical lens 62 for shaping the oscillated laser beam, and a laser beam for shaping the laser beam.
• a first deflector 63 for deflecting and scanning only in the X direction is provided.
• the first deflector 63 is a 36-sided polygon mirror 63a, and its rotation is a constant-speed rotation mode of several stages, and an optimum mode is selected for each work.
• one surface of the polygon mirror 63 corresponds to one line in the X direction on the liquid crystal mask 66 described later, and one rotation of the polygon mirror 63 makes a line-shaped division plot of 36 lines in the X direction. Scan of the work.
• the liquid crystal mask 66 receives the laser beam scanned by the first deflector 63 through the field lens 65 and arbitrarily displays a pattern for transmitting or scattering the laser beam. Thus, a desired mark pattern is formed.
• the liquid crystal mask 66 is what is called a polymer composite type liquid crystal mask.
• a liquid crystal resin composite composed of a liquid crystal and a resin (see Japanese Patent Application Laid-Open No. 9-6714) corresponds to this. I do.
• an infinite number of parallel electrode lines are provided on the front and back sides of the liquid crystal, and intersect each other between the front and back sides.
• the liquid crystal in the voltage application section is in a laser beam transmitting state, and the liquid crystal in the voltage non-applying section is in a laser beam scattering state.
• a TN type liquid crystal can be applied to this device, and a desired pattern can be instantaneously formed by selectively applying a voltage to the parallel electrode wires.
• Heel A liquid crystal mask 66 using a polymer composite liquid crystal does not require a deflecting plate, and the intensity of laser light transmitted through the liquid crystal mask is more than twice that of the conventional one.
• the liquid crystal mask 66 is displayed as each divided pattern by a line-shaped dot matrix consisting of 8 dots vertically and 256 dots horizontally.
• Various kinds of liquid crystal masks 66 can be prepared, for example, 16 dots ⁇ 512 dots.
• the liquid crystal mask 66 is designed to divide and display the pattern to be marked. As shown in FIG. 14, the displayed divided pattern is one scanning line scanned through the first deflector 63. It is configured to be displayed with a width corresponding to the This is done by controller 70 and is displayed as: That is, the entire pattern 90 consisting of the figure 91 and the characters 92 shown in FIG. 17 is stored in the main memory of the controller ⁇ 0 in a width of 256 dots and a height of 128 dots. Input and store the print information as "1" for the print part and "0" for the non-print part. This is divided into line-shaped division pattern information AP of 16 divisions so that the laser light from the first deflector 63 can be irradiated in one scan. For such overall pattern information and division pattern information, the controller 70 supplies division pattern A and division pattern B to the liquid crystal mask 66 as shown in (1) of FIG. Are displayed sequentially.
• a second deflector 67 for deflecting the laser light transmitted according to the pattern to be formed toward the surface of the workpiece 4 to be marked is provided.
• the second deflector 67 has an X-direction deflector 7X composed of a mirror that directly reflects the laser beam transmitted through the liquid crystal mask 66, and deflects the laser beam from the X-direction deflector 7X in the Y direction. And a Y-direction deflector 7Y composed of a lens.
• the second deflector 67 stops toward the marking area of the divided pattern until the scanning of the divided pattern displayed on the liquid crystal mask 66 is completed. Then, while the division pattern of the liquid crystal mask 66 changes, the second deflector 67 is driven toward the marking area of the next division pattern, and remains at this position until the scanning of the next division pattern is completed. Has been stopped.
• the X-direction deflector 7 X has a drive mode 7 1 for positioning the reflected light in the X direction.
• the Y-direction deflector 7 is provided with means 72, 73 for translating the Y-direction deflector 7Y along the marking surface 74a of the work 74.
• 72 is a motor driven by an operation timing command of the controller 70
• 73 is a translation table. Both are connected via a link mechanism connected to the output shaft of the motor 72, and the translation table 73 is moved in the Y direction by driving the motor 72.
• an objective lens 69 is arranged between the X-direction deflector 7X and the Y-direction deflector 7Y, which is independent of the Y-direction deflector 7Y.
• the size of the lens system in the deflector 67 is reduced, and the displacement of the marking and the reduction in the density of the irradiated laser beam are prevented.
• the YAG laser oscillator 61 has a system in which CW oscillation is controlled by a Q switch.
• the Q switch is based on the method using the acousto-optic effect (A / 0).
• the degree of decrease in the oscillation intensity of the laser beam due to the Q switch may be, for example, smaller than the minimum value of the laser energy capable of marking the peak 74, and the light condensed by the first deflector 63.
• the shaping optical system is constituted by a collimating lens 62 provided between the laser oscillator 61 and the polygon mirror 63. This is provided to increase the energy density of the beam when the beam diameter of the laser beam from the laser oscillator 61 is large.
• the controller 70 is a liquid crystal mask 66, a driving unit 63 b of the first deflector 63, a Q switch of the laser oscillator 61, an X-direction deflector 7 X driving unit 71 of the second deflector 7 1
• the following processing is performed with the drive motor 72 of the Y-direction deflector 7Y as the control target.
• the controller 70 creates the entire pattern to be marked on the workpiece 74 by the computer 78 attached to the laser marking device 68, as shown in the flowchart of FIG. Alternatively, enter the information in the predetermined address group of the internal main memory as the dot information of “ ⁇ ” and store it (step 600).
• Step 61 Dividing into line-shaped pattern information composed of a plurality of address groups. Then, the power to drive the laser oscillator 611; First, the intensity of the laser beam emitted from the laser oscillator 61 is reduced by the Q switch (step 61).
• one line-shaped division pattern information is transferred from the main memory to the controller.
• the extracted pattern is extracted in the temporary memory 70 (step 603), and the divided pattern is displayed on the liquid crystal mask 66 based on the extracted divided pattern information (step 604).
• the display line pattern width is extracted and displayed so as to match the line width that can be scanned in one X-direction scan by the polygon mirror 63a.
• the second deflector 67 is driven in the marking direction on the workpiece 74 in accordance with the address information of the divided pattern and then stopped (step 605). Then, the laser beam is oscillated by the Q switch (step 606), and the liquid crystal mask 66 is scanned by the first deflector 63 (step 607). After detection (Step 608), the intensity of laser oscillation is reduced by the Q switch (Step 609).
• steps 603 to 609 are repeated until the extraction of all the divided pattern information is completed, that is, until the composite marking of the entire pattern is completed on the panel 74 (step 610).
• the laser oscillator 61 is stopped from oscillating (steps 611 and 612).
• the next mark 7 4 wait for the work 7 4 to be transported to the marking position (step 6 13), and if the same pattern as before is to be marked, the first The process returns to the step of extracting the division pattern information, which is the address (step 603). In this way, a predetermined overall pattern is compositely marked on the work 74.
• the new entire pattern is input as dot information into the main memory in the controller 70 and stored (step 600). May repeat the same steps.
• the entire pattern 90 including the graphic 91 and the character 92 shown in FIG. 17 as a marking pattern is stored in the main memory in the controller 70. That is, the marking part is input as “1” and the non-marking part is input as “0” marking information in the area of 256 dots in the horizontal direction and 128 dots in the vertical direction of this main memory.
• the marking information is divided into line-shaped division pattern information AP of 16 divisions in the vertical direction.
• the controller 70 causes the liquid crystal mask 66 to sequentially display the division pattern A, as shown in FIG.
• the X-direction deflector 7X of the second deflector 67 is moved to the marking start position on the workpiece 74, and thereafter the position is fixed until the marking of the entire pattern is completed.
• (3) the Y-direction deflector 7Y of the second deflector 67 moves to the marking start position when the division pattern A is displayed on the liquid crystal mask 6G and is fixed there. Deflection scanning is performed in the Y direction by the pattern division pitch, and marking is performed at a marking position that is continuous with the division pattern A previously marked. This is performed every time the display pattern on the liquid crystal mask 66 is switched.
• the first deflector 63 performs X scanning on the divided pattern displayed on the mask 66 and emits a transmission laser to the second deflector 67 side. Then, the laser oscillator 61 oscillates only during each X-direction scan corresponding to each divided pattern by the first deflector 63, and lowers the oscillation intensity by operating the Q switch when switching the pattern. .
• the controller 70 described above uses the signal from the drive motor 75 a of the table 75 on which a large number of works 74 are sequentially installed, and the rotation and stop of the work 74 to reach the predetermined marking position. Signals from the sensors 76 and 77 for detecting this are input. The controller 70 performs the composite marking of the same overall pattern on the surface of each work 74 while adjusting the operation timing with the table 75 using these signals.
• the laser beam incident on the pattern displayed on the liquid crystal mask 66 scans in only one direction, so that the scanning control mechanism has a very simple configuration and the control itself is also simplified. Therefore, the marking speed is improved.
• the YAG laser has the advantage that the thermal load on the optical system is small.
• the scanning of the first deflector 63 is different from the conventional batch irradiation by beam expansion, which is a so-called pinpoint irradiation of the laser beam itself. Therefore, the laser irradiation on the liquid crystal mask 66 is made uniform and the intensity is increased. I do.
• the laser oscillator 61 has a Q switch, The peak value of the irradiation laser intensity can be increased.
• the liquid crystal mask 66 does not require a polarizing plate, the transmitted laser intensity is more than doubled. As a result, not only can the YAG laser oscillator 61 be miniaturized, but also the laser beam with such high intensity need only be scanned in one direction on the liquid crystal mask 66 in a pinpoint state, so that the mark is clear. Is marked.
• the second deflector 67 can composite mark the entire pattern over a large area without moving the workpiece 74.
• the focusing optical system focuses the large-diameter and deflected incident laser light to a minimum, so that the deformation, variation, and laser loss of the markings can be reduced, and the size of each deflector can be reduced. is there.
• the controller 70 optimally controls the driving of the first deflector 63, the change of the display of the liquid crystal mask 66, the driving of the second modifier 67, and the driving timing of the Q switch.
• Q-switch control reduces the oscillation intensity of laser light that does not need to be marked to prevent laser light distortion and beam scattering to other places. Therefore, effective synthetic marking can be performed on metals, ceramics, and the like. In addition, self-damage of the apparatus due to high-intensity laser light can be prevented.
• a fourth embodiment will be described with reference to FIGS. 18 to 19C.
• the laser beam incident portion and the emitting portion including the liquid crystal mask 66 of the third embodiment shown in FIG. 13 are improved.
• the same components are denoted by the same reference numerals and description thereof is omitted.
• the laser beam oscillated from the laser oscillator 61 passes through an expander lens 86 as a first optical system and is split into two optical paths by a beam splitter 80 as shown in FIG. Then, a first liquid crystal mask 81 receiving the transmitted light from the beam splitter 80 and a second liquid crystal mask 82 receiving the reflected light of the mirror 83 arranged on the other shunt are provided. I have.
• the transmitted light is integrated again by the mirror 84 and the beam splitter 85 as the second optical system, and the condensing lens 87 After that, the work 74 is irradiated.
• the display patterns on the first liquid crystal mask 81 and the second liquid crystal mask 82 are the same.
• the display positions on the first liquid crystal mask 81 and the second liquid crystal mask 82 are shifted so as to fill the gap between the mask dots. That is, the display patterns on the first liquid crystal mask 81 and the second liquid crystal mask 82 are the same as shown in FIG. 19A and FIG. 19B, but the display location is the display pattern of the first liquid crystal mask 81.
• the display pattern of the second liquid crystal mask 82 it is set so as to be located at the upper left in FIG.
• the display pattern for integrating and marking these is integrated so as to fill the gap between the mask dots of the first and second liquid crystal masks 81 and 82 as shown in FIG. 19C.
• the shift of the display position to the first and second liquid crystal masks 81 and 82 can be performed during the manufacture of the first and second liquid crystal masks 81 and 82 or by adjusting the positions of these arrangements. And implement it.
• As the first and second liquid crystal masks 81, 82 composite dispersed liquid crystal of a transmission type mask is used. By using an appropriate optical system,
• liquid crystal masks such as TN liquid crystal.
• the beam splitter 80 and the mirror 83 are arranged on the incident side of the first deflector 63 and the first deflector 63 is used. Is provided and a pair is divided and scanned on the first and second liquid crystal masks 8 1 and 8 2.
• the mirror 84 and the beam splitter 85 are arranged on the incident side of the second deflector 67, and the pattern combined via the second deflector is marked on the mark.
• the present invention it is possible to mark a large number of workpieces in a short time by setting the overall operation timing of the loading / unloading of the workpiece by the workpiece transfer device and the marking by the marking device to the maximum efficiency, and particularly to use the mark as a mask.
• it is useful as a laser marking system and a method for improving the position accuracy of the marking and simplifying the marking operation.

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• Physics & Mathematics (AREA)
• Optics & Photonics (AREA)
• Engineering & Computer Science (AREA)
• Plasma & Fusion (AREA)
• Mechanical Engineering (AREA)
• Laser Beam Processing (AREA)

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• 1994
  • 1994-01-19 TW TW083100433A patent/TW245844B/zh active
  • 1994-01-20 US US08/495,451 patent/US5821497A/en not_active Expired - Fee Related
  • 1994-01-20 WO PCT/JP1994/000069 patent/WO1994016858A1/ja active Application Filing
  • 1994-01-20 GB GB9515713A patent/GB2290495B/en not_active Expired - Fee Related
  • 1994-01-20 SG SG1996001813A patent/SG47455A1/en unknown

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