WO1988009564A1 - Secondary electron detector for use in a gaseous atmosphere - Google Patents

Secondary electron detector for use in a gaseous atmosphere Download PDF

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Publication number
WO1988009564A1
WO1988009564A1 PCT/US1988/001654 US8801654W WO8809564A1 WO 1988009564 A1 WO1988009564 A1 WO 1988009564A1 US 8801654 W US8801654 W US 8801654W WO 8809564 A1 WO8809564 A1 WO 8809564A1
Authority
WO
WIPO (PCT)
Prior art keywords
sample
secondary electrons
electron beam
electrode
emitted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1988/001654
Other languages
English (en)
French (fr)
Inventor
James F. Mancuso
William B. Maxwell
Gerasimos D. Danilatos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ElectroScan Corp
Electro Scan Corp
Original Assignee
ElectroScan Corp
Electro Scan Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ElectroScan Corp, Electro Scan Corp filed Critical ElectroScan Corp
Priority to DE8888904896T priority Critical patent/DE3878828T2/de
Priority to AT88904896T priority patent/ATE86409T1/de
Priority to KR1019890700124A priority patent/KR970005031B1/ko
Publication of WO1988009564A1 publication Critical patent/WO1988009564A1/en
Priority to SU894613422A priority patent/RU2020643C1/ru
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Definitions

  • the sample is scanned with an electron beam and the electrons reflected or emitted from the sample are detected.
  • the sample is usually scanned within a vacuum to maintain the vacuum integrity of the electron optics column and to permit the operation of electron detectors.
  • the scope and efficiency of the gaseous detector device depends on a number of variables such as: (a) . nature of the gas, (b) pressure of the gas, (c) temperature of the gas, (d) electrode configuration, (e) electrode bias, (f) accelerating voltage, (g) intensity of the primary beam current, (h) scanning speed, (i) nature of specimen. "
  • the present invention also provides a scanning electron microscope which comprises a vacuum envelope having a pressure limiting aperture, an electron beam source located within the vacuum envelope and capable of emitting an electron beam, focusing means located within the vacuum envelope and capable of directing an electron beam emitted by the electron beam source through the pressure limiting aperture, electron beam scanning means located within the vacuum envelope and capable of scanning an electron beam emitted by the electron beam source across the diameter of the pressure limiting aperture, sample platform means disposed outside the vacuum envelope and capable of maintaining a sample enveloped in gas at a pressure of at least .05 torr in registration with the pressure limiting aperture such that a surface of the sample may be exposed to an electron beam emitted from the electron beam source and directed through the pressure limiting aperture, an electrode disposed outside of the vacuum envelope and positiond within between about 1 and 200 mm of the sample platform means such that secondary electrons emitted from a surface of a sample located on the sample platform means and exposed to an electron beam emitted from the electron beam source may come into contact with it, a voltage source connected between

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
PCT/US1988/001654 1987-05-21 1988-05-17 Secondary electron detector for use in a gaseous atmosphere Ceased WO1988009564A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE8888904896T DE3878828T2 (de) 1987-05-21 1988-05-17 Sekundaerelektronen-detektor zur anwendung in einer gasumgebung.
AT88904896T ATE86409T1 (de) 1987-05-21 1988-05-17 Sekundaerelektronen-detektor zur anwendung in einer gasumgebung.
KR1019890700124A KR970005031B1 (ko) 1987-05-21 1988-05-17 기체환경에서 2차 전자의 발생,증폭 및 검출장치와 그 방법
SU894613422A RU2020643C1 (ru) 1987-05-21 1989-01-20 Электронный микроскоп

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/052,700 US4785182A (en) 1987-05-21 1987-05-21 Secondary electron detector for use in a gaseous atmosphere
US052,700 1987-05-21

Publications (1)

Publication Number Publication Date
WO1988009564A1 true WO1988009564A1 (en) 1988-12-01

Family

ID=21979339

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1988/001654 Ceased WO1988009564A1 (en) 1987-05-21 1988-05-17 Secondary electron detector for use in a gaseous atmosphere

Country Status (15)

Country Link
US (1) US4785182A (enExample)
EP (1) EP0314763B1 (enExample)
JP (1) JPH01502225A (enExample)
KR (1) KR970005031B1 (enExample)
CN (1) CN1012402B (enExample)
AT (1) ATE86409T1 (enExample)
AU (1) AU603226B2 (enExample)
CA (1) CA1293337C (enExample)
DE (1) DE3878828T2 (enExample)
ES (1) ES2007856A6 (enExample)
IL (1) IL86430A (enExample)
MX (1) MX174400B (enExample)
RU (1) RU2020643C1 (enExample)
WO (1) WO1988009564A1 (enExample)
ZA (1) ZA883273B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19845329C2 (de) * 1998-03-10 2001-09-27 Erik Essers Rasterelektronenmikroskop
US6590210B1 (en) 1998-03-10 2003-07-08 Erik Essers Scanning electron microscope
US8222600B2 (en) 2009-05-24 2012-07-17 El-Mul Technologies Ltd. Charged particle detection system and method
US10068744B2 (en) 2015-12-01 2018-09-04 Carl Zeiss Microscopy Gmbh Charged particle optical apparatus for through-the lens detection of particles

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0275306B1 (en) * 1986-08-01 1990-10-24 Electro-Scan Corporation Multipurpose gaseous detector device for electron microscopes
US4897545A (en) * 1987-05-21 1990-01-30 Electroscan Corporation Electron detector for use in a gaseous environment
US4880976A (en) * 1987-05-21 1989-11-14 Electroscan Corporation Secondary electron detector for use in a gaseous atmosphere
US5352435A (en) * 1989-12-22 1994-10-04 Unger Evan C Ionophore containing liposomes for ultrasound imaging
JPH0740306Y2 (ja) * 1990-02-19 1995-09-13 矢崎総業株式会社 端子係止具付コネクタ
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
JPH06168695A (ja) * 1992-11-30 1994-06-14 Nikon Corp 荷電粒子顕微鏡
US5446282A (en) * 1993-04-05 1995-08-29 Nikon Corporation Scanning photoelectron microscope
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
JPH07262959A (ja) * 1994-03-24 1995-10-13 Nikon Corp 走査型電子顕微鏡
US5485008A (en) * 1994-06-23 1996-01-16 University Of Maryland, College Park Low magnification gas limiting aperture assembly for electron microscopy devices
GB9623768D0 (en) * 1996-11-15 1997-01-08 Leo Electron Microscopy Limite Scanning electron microscope
WO1999027559A1 (en) * 1997-11-24 1999-06-03 Gerasimos Daniel Danilatos Radiofrequency gaseous detection device (rf-gdd)
AU748781B2 (en) * 1997-12-08 2002-06-13 Fei Company Environmental SEM with a magnetic field for improved secondary electron detection
AU748840B2 (en) 1997-12-08 2002-06-13 Fei Company Environmental SEM with multipole fields for improved secondary electron detection
US5945672A (en) * 1998-01-29 1999-08-31 Fei Company Gaseous backscattered electron detector for an environmental scanning electron microscope
JP4066078B2 (ja) * 1999-05-27 2008-03-26 株式会社ニコン 写像型電子顕微鏡
EP1299897B1 (de) * 2000-07-07 2008-04-09 Carl Zeiss NTS GmbH Detektor für variierende druckbereiche und elektronenmikroskop mit einem entsprechenden detektor
DE10032607B4 (de) 2000-07-07 2004-08-12 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät
GB2367686B (en) * 2000-08-10 2002-12-11 Leo Electron Microscopy Ltd Improvements in or relating to particle detectors
AUPQ932200A0 (en) * 2000-08-11 2000-08-31 Danilatos, Gerasimos Daniel Environmental scanning electron microscope
JP2002289129A (ja) 2001-03-26 2002-10-04 Jeol Ltd 低真空走査電子顕微鏡
GB2374723B (en) * 2001-04-20 2005-04-20 Leo Electron Microscopy Ltd Scanning electron microscope
US7223974B2 (en) * 2002-05-22 2007-05-29 Applied Materials, Israel, Ltd. Charged particle beam column and method for directing a charged particle beam
GB2391696B (en) 2002-05-31 2005-12-21 Leo Electron Microscopy Ltd Improvements in or relating to particle detectors
CZ20022105A3 (cs) * 2002-06-17 2004-02-18 Tescan, S. R. O. Detektor sekundárních elektronů, zejména v rastrovacím elektronovém mikroskopu
AU2003275028A1 (en) 2002-09-18 2004-04-08 Fei Company Particle-optical device and detection means
DE10256718B4 (de) * 2002-12-04 2004-10-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Probenuntersuchung mittels eines atmosphärischen oder druckvariablen Rasterelektronenmikroskops
US7388218B2 (en) * 2005-04-04 2008-06-17 Fei Company Subsurface imaging using an electron beam
EP2002459B1 (en) * 2006-03-31 2014-11-26 Fei Company Improved detector for charged particle beam instrument
JP5758577B2 (ja) * 2007-02-06 2015-08-05 エフ・イ−・アイ・カンパニー 高圧荷電粒子ビーム・システム
CZ2007685A3 (cs) 2007-10-04 2008-12-17 Ústav prístrojové techniky AV CR, v.v.i. Ionizacní detektor environmentálního rastrovacíhoelektronového mikroskopu
EP2105944A1 (en) 2008-03-28 2009-09-30 FEI Company Environmental cell for a particle-optical apparatus
US7791020B2 (en) 2008-03-31 2010-09-07 Fei Company Multistage gas cascade amplifier
US8299432B2 (en) * 2008-11-04 2012-10-30 Fei Company Scanning transmission electron microscope using gas amplification
JP5352262B2 (ja) 2009-02-06 2013-11-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
JP5936424B2 (ja) * 2012-04-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置
CN104508791B (zh) 2012-07-30 2017-03-01 Fei 公司 环境扫描电子显微镜气体喷射系统
US9123506B2 (en) * 2013-06-10 2015-09-01 Fei Company Electron beam-induced etching
CN105987924A (zh) * 2015-02-11 2016-10-05 中国科学院空间科学与应用研究中心 卫星金属表面的二次电子发射的测量装置及其使用方法
US9799490B2 (en) 2015-03-31 2017-10-24 Fei Company Charged particle beam processing using process gas and cooled surface
US9633816B2 (en) 2015-05-18 2017-04-25 Fei Company Electron beam microscope with improved imaging gas and method of use
EP3176808B1 (en) 2015-12-03 2019-10-16 Carl Zeiss Microscopy Ltd. Method for detecting charged particles and particle beam device for carrying out the method
DE102016116765B3 (de) * 2016-09-07 2018-02-22 Specs Surface Nano Analysis Gmbh Vorrichtung mit teilchenoptischer Linsenwirkung zur Untersuchung einer nicht gasförmigen Probe in einer gasförmigen Umgebung, Elektronen- und/oder ionenoptisches System sowie Verfahren zum Untersuchen
US11251018B2 (en) 2018-07-02 2022-02-15 Hitachi High-Tech Corporation Scanning electron microscope
CN113495082B (zh) * 2020-03-19 2022-10-18 清华大学 二次电子发射系数测量装置
CN117650032B (zh) * 2023-11-08 2024-10-15 北京中科科仪股份有限公司 一种探头装置、二次电子探测器及扫描电镜

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3612859A (en) * 1968-01-31 1971-10-12 Westinghouse Electric Corp Method for measuring and controlling the density of a metallic vapor
US4596928A (en) * 1979-07-03 1986-06-24 Unisearch Limited Method and apparatus for an atmospheric scanning electron microscope
US4720633A (en) * 1986-01-17 1988-01-19 Electro-Scan Corporation Scanning electron microscope for visualization of wet samples

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2884529A (en) * 1955-04-18 1959-04-28 Eggler Charles Gaseous scintillation counter
NL7902963A (nl) * 1979-04-13 1980-10-15 Philips Nv Detektor voor elektronenmikroskoop.
DE3206309A1 (de) * 1982-02-22 1983-09-15 Siemens AG, 1000 Berlin und 8000 München Sekundaerelektronen-spektrometer und verfahren zu seinem betrieb

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3612859A (en) * 1968-01-31 1971-10-12 Westinghouse Electric Corp Method for measuring and controlling the density of a metallic vapor
US4596928A (en) * 1979-07-03 1986-06-24 Unisearch Limited Method and apparatus for an atmospheric scanning electron microscope
US4720633A (en) * 1986-01-17 1988-01-19 Electro-Scan Corporation Scanning electron microscope for visualization of wet samples

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19845329C2 (de) * 1998-03-10 2001-09-27 Erik Essers Rasterelektronenmikroskop
US6590210B1 (en) 1998-03-10 2003-07-08 Erik Essers Scanning electron microscope
US8222600B2 (en) 2009-05-24 2012-07-17 El-Mul Technologies Ltd. Charged particle detection system and method
US10068744B2 (en) 2015-12-01 2018-09-04 Carl Zeiss Microscopy Gmbh Charged particle optical apparatus for through-the lens detection of particles
US10522321B2 (en) 2015-12-01 2019-12-31 Carl Zeiss Microscopy Gmbh Charged particle optical apparatus for through-the-lens detection of particles
US10861670B2 (en) 2015-12-01 2020-12-08 Carl Zeiss Microscopy Gmbh Charged particle optical apparatus for through-the-lens detection of particles
US11276547B2 (en) 2015-12-01 2022-03-15 Carl Zeiss Microscopy Gmbh Charged particle optical apparatus for through-the-lens detection of particles

Also Published As

Publication number Publication date
CA1293337C (en) 1991-12-17
CN1031154A (zh) 1989-02-15
ES2007856A6 (es) 1989-07-01
KR970005031B1 (ko) 1997-04-11
EP0314763A1 (en) 1989-05-10
EP0314763B1 (en) 1993-03-03
DE3878828D1 (de) 1993-04-08
EP0314763A4 (en) 1989-12-13
IL86430A0 (en) 1988-11-15
RU2020643C1 (ru) 1994-09-30
JPH01502225A (ja) 1989-08-03
KR890702234A (ko) 1989-12-23
ATE86409T1 (de) 1993-03-15
IL86430A (en) 1992-02-16
AU1790088A (en) 1988-12-21
MX174400B (es) 1994-05-13
US4785182A (en) 1988-11-15
AU603226B2 (en) 1990-11-08
DE3878828T2 (de) 1993-06-09
CN1012402B (zh) 1991-04-17
JPH0532860B2 (enExample) 1993-05-18
ZA883273B (en) 1988-11-11

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