MX174400B - Detector de electrones secundarios para usarse en una atmosfera gaseosa - Google Patents
Detector de electrones secundarios para usarse en una atmosfera gaseosaInfo
- Publication number
- MX174400B MX174400B MX011583A MX1158388A MX174400B MX 174400 B MX174400 B MX 174400B MX 011583 A MX011583 A MX 011583A MX 1158388 A MX1158388 A MX 1158388A MX 174400 B MX174400 B MX 174400B
- Authority
- MX
- Mexico
- Prior art keywords
- sample
- charged particle
- particle beam
- secondary electrons
- vacuum envelope
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Tubes For Measurement (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Abstract
La presente invención se refiere a un dispositivo para generar, amplificar y detectar electrones secundarios a partir de una superficie de una muestra; que comprende: (a) un envolvente de vacío que tiene una abertura limitadora de presión; (b) una fuente de haces de partículas cargadas colocadas dentro del envolvente de vacío y capaz de emitir un haz de partículas cargadas; (c) medios de enfoque colocados dentro del envolvente de vacío y capaces de dirigir un haz de partículas cargadas emitido por la fuente de haces de partículas cargadas, a través de la abertura limitadora de presión; (d) medios de plataforma de muestra colocados al exterior del envolvente de vacío, capaces de mantener una muestra envuelta en gas, a una presión por lo menos de 0.680 Kg/m2, en coincidencia con la abertura limitadora de presión, de manera tal que una superficie de la muestra pueda quedar expuesta a un haz de partículas cargadas emitido desde la fuente de haces de partículas cargadas y dirigido a través de la abertura limitadora de presión; (e) un electrodo colocado al exterior del envolvente de vacío y dispuesto dentro de entre aproximadamente 1 y aproximadamente 200 milímetros desde los medios de plataforma de muestra, de manera tal que los electrones secundarios emitidos desde una superficie de una muestra colocada sobre los medios de plataforma de muestra y expuesta a un haz de partículas cargadas emitido desde la fuente de haces de partículas cargadas, puedan ponerse en contacto con el mismo; (f) una fuente de voltaje conectada entre el electrodo y una tierra eléctrica, capaz de mantener una diferencia de potencial eléctrico entre el electrodo y los medios de plataforma de muestra, de más de aproximadamente 50 voltios y de menos de aproximadamente 2000 voltios, siendo el potencial del electrodo positivo con relación al potencial de los medios de plataforma de muestra, a fin de acelerar los electrones secundarios emitidos desde una superficie de una muestra colocada sobre los medios de plataforma de muestra, con un campo eléctrico de intensidad suficiente para ocasionar que los electrones secundarios emitidos choquen con moléculas de gas y produzcan portadoras de carga negativa que puedan producir subsecuentemente portadoras de carga negativa adicionales, a través de choques múltiples con otras moléculas de gas, dando por resultado un número de portadoras de carga negativas mayor que y proporcional al número de electrones secundarios originales, siendo la intensidad del campo eléctrico suficientemente baja para evitar una descarga eléctrica catastrófica o una formación de arco eléctrico; (g) un amplificador de corriente conectado con el electrodo; y (h) medios de detección de corriente conectados entre el amplificador de corriente y una tierra eléctrica.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/052,700 US4785182A (en) | 1987-05-21 | 1987-05-21 | Secondary electron detector for use in a gaseous atmosphere |
Publications (1)
Publication Number | Publication Date |
---|---|
MX174400B true MX174400B (es) | 1994-05-13 |
Family
ID=21979339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX011583A MX174400B (es) | 1987-05-21 | 1988-05-20 | Detector de electrones secundarios para usarse en una atmosfera gaseosa |
Country Status (15)
Country | Link |
---|---|
US (1) | US4785182A (es) |
EP (1) | EP0314763B1 (es) |
JP (1) | JPH01502225A (es) |
KR (1) | KR970005031B1 (es) |
CN (1) | CN1012402B (es) |
AT (1) | ATE86409T1 (es) |
AU (1) | AU603226B2 (es) |
CA (1) | CA1293337C (es) |
DE (1) | DE3878828T2 (es) |
ES (1) | ES2007856A6 (es) |
IL (1) | IL86430A (es) |
MX (1) | MX174400B (es) |
RU (1) | RU2020643C1 (es) |
WO (1) | WO1988009564A1 (es) |
ZA (1) | ZA883273B (es) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0687410B2 (ja) * | 1986-08-01 | 1994-11-02 | エレクトロ‐スキャン コーポレーション | 走査電子顕微鏡及び試料の表面を電子顕微鏡的に像形成する方法 |
US4880976A (en) * | 1987-05-21 | 1989-11-14 | Electroscan Corporation | Secondary electron detector for use in a gaseous atmosphere |
US4897545A (en) * | 1987-05-21 | 1990-01-30 | Electroscan Corporation | Electron detector for use in a gaseous environment |
US5352435A (en) * | 1989-12-22 | 1994-10-04 | Unger Evan C | Ionophore containing liposomes for ultrasound imaging |
JPH0740306Y2 (ja) * | 1990-02-19 | 1995-09-13 | 矢崎総業株式会社 | 端子係止具付コネクタ |
US5396067A (en) * | 1992-06-11 | 1995-03-07 | Nikon Corporation | Scan type electron microscope |
JPH06168695A (ja) * | 1992-11-30 | 1994-06-14 | Nikon Corp | 荷電粒子顕微鏡 |
US5446282A (en) * | 1993-04-05 | 1995-08-29 | Nikon Corporation | Scanning photoelectron microscope |
US5412211A (en) * | 1993-07-30 | 1995-05-02 | Electroscan Corporation | Environmental scanning electron microscope |
US5362964A (en) * | 1993-07-30 | 1994-11-08 | Electroscan Corporation | Environmental scanning electron microscope |
JPH07262959A (ja) * | 1994-03-24 | 1995-10-13 | Nikon Corp | 走査型電子顕微鏡 |
US5485008A (en) * | 1994-06-23 | 1996-01-16 | University Of Maryland, College Park | Low magnification gas limiting aperture assembly for electron microscopy devices |
GB9623768D0 (en) * | 1996-11-15 | 1997-01-08 | Leo Electron Microscopy Limite | Scanning electron microscope |
AU737394B2 (en) * | 1997-11-24 | 2001-08-16 | Gerasimos Daniel Danilatos | Radiofrequency gaseous detection device (RF-GDD) |
DE69821467T2 (de) * | 1997-12-08 | 2004-07-22 | Fei Co., Hillsboro | Rasterelektronenmikroskop unter kontrollierter umgebung mit einem magnetfeld zur erhöhten sekundärelektronenerfassung |
EP0958590B1 (en) | 1997-12-08 | 2003-06-11 | Fei Company | Environmental sem with multipole fields for improved secondary electron detection |
US5945672A (en) * | 1998-01-29 | 1999-08-31 | Fei Company | Gaseous backscattered electron detector for an environmental scanning electron microscope |
JP2002507045A (ja) | 1998-03-10 | 2002-03-05 | エッサーズ、エリック | 走査型電子顕微鏡 |
DE19845329C2 (de) * | 1998-03-10 | 2001-09-27 | Erik Essers | Rasterelektronenmikroskop |
JP4066078B2 (ja) * | 1999-05-27 | 2008-03-26 | 株式会社ニコン | 写像型電子顕微鏡 |
JP5143990B2 (ja) * | 2000-07-07 | 2013-02-13 | カール・ツァイス・エヌティーエス・ゲーエムベーハー | 変化する圧力領域のための検出器、およびこのような検出器を備える電子顕微鏡 |
DE10032607B4 (de) | 2000-07-07 | 2004-08-12 | Leo Elektronenmikroskopie Gmbh | Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät |
GB2367686B (en) * | 2000-08-10 | 2002-12-11 | Leo Electron Microscopy Ltd | Improvements in or relating to particle detectors |
AUPQ932200A0 (en) * | 2000-08-11 | 2000-08-31 | Danilatos, Gerasimos Daniel | Environmental scanning electron microscope |
JP2002289129A (ja) | 2001-03-26 | 2002-10-04 | Jeol Ltd | 低真空走査電子顕微鏡 |
GB2374723B (en) * | 2001-04-20 | 2005-04-20 | Leo Electron Microscopy Ltd | Scanning electron microscope |
GB2391696B (en) | 2002-05-31 | 2005-12-21 | Leo Electron Microscopy Ltd | Improvements in or relating to particle detectors |
CZ20022105A3 (cs) * | 2002-06-17 | 2004-02-18 | Tescan, S. R. O. | Detektor sekundárních elektronů, zejména v rastrovacím elektronovém mikroskopu |
WO2004027808A2 (en) | 2002-09-18 | 2004-04-01 | Fei Company | Particle-optical device and detection means |
DE10256718B4 (de) * | 2002-12-04 | 2004-10-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zur Probenuntersuchung mittels eines atmosphärischen oder druckvariablen Rasterelektronenmikroskops |
US7388218B2 (en) * | 2005-04-04 | 2008-06-17 | Fei Company | Subsurface imaging using an electron beam |
US7541580B2 (en) * | 2006-03-31 | 2009-06-02 | Fei Company | Detector for charged particle beam instrument |
WO2008098084A1 (en) * | 2007-02-06 | 2008-08-14 | Fei Company | High pressure charged particle beam system |
CZ2007685A3 (cs) | 2007-10-04 | 2008-12-17 | Ústav prístrojové techniky AV CR, v.v.i. | Ionizacní detektor environmentálního rastrovacíhoelektronového mikroskopu |
EP2105944A1 (en) | 2008-03-28 | 2009-09-30 | FEI Company | Environmental cell for a particle-optical apparatus |
US7791020B2 (en) | 2008-03-31 | 2010-09-07 | Fei Company | Multistage gas cascade amplifier |
US8299432B2 (en) * | 2008-11-04 | 2012-10-30 | Fei Company | Scanning transmission electron microscope using gas amplification |
JP5352262B2 (ja) | 2009-02-06 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
US8222600B2 (en) * | 2009-05-24 | 2012-07-17 | El-Mul Technologies Ltd. | Charged particle detection system and method |
US9679741B2 (en) | 2010-11-09 | 2017-06-13 | Fei Company | Environmental cell for charged particle beam system |
JP5936424B2 (ja) * | 2012-04-20 | 2016-06-22 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
US9070533B2 (en) | 2012-07-30 | 2015-06-30 | Fei Company | Environmental scanning electron microscope (ESEM/SEM) gas injection apparatus with anode integrated with gas concentrating structure |
US9123506B2 (en) * | 2013-06-10 | 2015-09-01 | Fei Company | Electron beam-induced etching |
CN105987924A (zh) * | 2015-02-11 | 2016-10-05 | 中国科学院空间科学与应用研究中心 | 卫星金属表面的二次电子发射的测量装置及其使用方法 |
US9799490B2 (en) | 2015-03-31 | 2017-10-24 | Fei Company | Charged particle beam processing using process gas and cooled surface |
US9633816B2 (en) | 2015-05-18 | 2017-04-25 | Fei Company | Electron beam microscope with improved imaging gas and method of use |
US10068744B2 (en) | 2015-12-01 | 2018-09-04 | Carl Zeiss Microscopy Gmbh | Charged particle optical apparatus for through-the lens detection of particles |
EP3176808B1 (en) * | 2015-12-03 | 2019-10-16 | Carl Zeiss Microscopy Ltd. | Method for detecting charged particles and particle beam device for carrying out the method |
DE102016116765B3 (de) * | 2016-09-07 | 2018-02-22 | Specs Surface Nano Analysis Gmbh | Vorrichtung mit teilchenoptischer Linsenwirkung zur Untersuchung einer nicht gasförmigen Probe in einer gasförmigen Umgebung, Elektronen- und/oder ionenoptisches System sowie Verfahren zum Untersuchen |
WO2020008492A1 (ja) | 2018-07-02 | 2020-01-09 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
CN113495082B (zh) * | 2020-03-19 | 2022-10-18 | 清华大学 | 二次电子发射系数测量装置 |
CN117650032A (zh) * | 2023-11-08 | 2024-03-05 | 北京中科科仪股份有限公司 | 一种探头装置、二次电子探测器及扫描电镜 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2884529A (en) * | 1955-04-18 | 1959-04-28 | Eggler Charles | Gaseous scintillation counter |
US3612859A (en) * | 1968-01-31 | 1971-10-12 | Westinghouse Electric Corp | Method for measuring and controlling the density of a metallic vapor |
NL7902963A (nl) * | 1979-04-13 | 1980-10-15 | Philips Nv | Detektor voor elektronenmikroskoop. |
AU534811B2 (en) * | 1979-07-03 | 1984-02-16 | Unisearch Limited | Atmospheric scanning electron microscope |
DE3206309A1 (de) * | 1982-02-22 | 1983-09-15 | Siemens AG, 1000 Berlin und 8000 München | Sekundaerelektronen-spektrometer und verfahren zu seinem betrieb |
US4720633A (en) * | 1986-01-17 | 1988-01-19 | Electro-Scan Corporation | Scanning electron microscope for visualization of wet samples |
-
1987
- 1987-05-21 US US07/052,700 patent/US4785182A/en not_active Expired - Lifetime
-
1988
- 1988-05-09 ZA ZA883273A patent/ZA883273B/xx unknown
- 1988-05-17 WO PCT/US1988/001654 patent/WO1988009564A1/en active IP Right Grant
- 1988-05-17 KR KR1019890700124A patent/KR970005031B1/ko not_active IP Right Cessation
- 1988-05-17 AU AU17900/88A patent/AU603226B2/en not_active Ceased
- 1988-05-17 DE DE8888904896T patent/DE3878828T2/de not_active Expired - Lifetime
- 1988-05-17 JP JP63504609A patent/JPH01502225A/ja active Granted
- 1988-05-17 AT AT88904896T patent/ATE86409T1/de not_active IP Right Cessation
- 1988-05-17 EP EP88904896A patent/EP0314763B1/en not_active Expired - Lifetime
- 1988-05-18 IL IL86430A patent/IL86430A/xx unknown
- 1988-05-18 ES ES8801554A patent/ES2007856A6/es not_active Expired
- 1988-05-20 CA CA000567347A patent/CA1293337C/en not_active Expired - Lifetime
- 1988-05-20 MX MX011583A patent/MX174400B/es unknown
- 1988-05-21 CN CN88103140A patent/CN1012402B/zh not_active Expired
-
1989
- 1989-01-20 RU SU894613422A patent/RU2020643C1/ru active
Also Published As
Publication number | Publication date |
---|---|
DE3878828T2 (de) | 1993-06-09 |
AU1790088A (en) | 1988-12-21 |
CA1293337C (en) | 1991-12-17 |
CN1031154A (zh) | 1989-02-15 |
KR890702234A (ko) | 1989-12-23 |
IL86430A0 (en) | 1988-11-15 |
ES2007856A6 (es) | 1989-07-01 |
RU2020643C1 (ru) | 1994-09-30 |
ATE86409T1 (de) | 1993-03-15 |
WO1988009564A1 (en) | 1988-12-01 |
DE3878828D1 (de) | 1993-04-08 |
EP0314763A4 (en) | 1989-12-13 |
IL86430A (en) | 1992-02-16 |
ZA883273B (en) | 1988-11-11 |
KR970005031B1 (ko) | 1997-04-11 |
CN1012402B (zh) | 1991-04-17 |
EP0314763A1 (en) | 1989-05-10 |
AU603226B2 (en) | 1990-11-08 |
JPH0532860B2 (es) | 1993-05-18 |
JPH01502225A (ja) | 1989-08-03 |
US4785182A (en) | 1988-11-15 |
EP0314763B1 (en) | 1993-03-03 |
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