KR970005031B1 - 기체환경에서 2차 전자의 발생,증폭 및 검출장치와 그 방법 - Google Patents

기체환경에서 2차 전자의 발생,증폭 및 검출장치와 그 방법 Download PDF

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Publication number
KR970005031B1
KR970005031B1 KR1019890700124A KR890700124A KR970005031B1 KR 970005031 B1 KR970005031 B1 KR 970005031B1 KR 1019890700124 A KR1019890700124 A KR 1019890700124A KR 890700124 A KR890700124 A KR 890700124A KR 970005031 B1 KR970005031 B1 KR 970005031B1
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KR
South Korea
Prior art keywords
sample
secondary electrons
support means
electrode
electron
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Expired - Fee Related
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KR1019890700124A
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English (en)
Korean (ko)
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KR890702234A (ko
Inventor
에프 맨쿠소 제임스
비이 맥스웰 윌리암
디이 대닐라토스 제라시모시
Original Assignee
일렉트로-스캔 코오포레이션
리차드 에스 밀랜슨
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Publication of KR890702234A publication Critical patent/KR890702234A/ko
Application granted granted Critical
Publication of KR970005031B1 publication Critical patent/KR970005031B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Electron Tubes For Measurement (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1019890700124A 1987-05-21 1988-05-17 기체환경에서 2차 전자의 발생,증폭 및 검출장치와 그 방법 Expired - Fee Related KR970005031B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US052700 1987-05-21
US07/052,700 US4785182A (en) 1987-05-21 1987-05-21 Secondary electron detector for use in a gaseous atmosphere
PCT/US1988/001654 WO1988009564A1 (en) 1987-05-21 1988-05-17 Secondary electron detector for use in a gaseous atmosphere

Publications (2)

Publication Number Publication Date
KR890702234A KR890702234A (ko) 1989-12-23
KR970005031B1 true KR970005031B1 (ko) 1997-04-11

Family

ID=21979339

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890700124A Expired - Fee Related KR970005031B1 (ko) 1987-05-21 1988-05-17 기체환경에서 2차 전자의 발생,증폭 및 검출장치와 그 방법

Country Status (15)

Country Link
US (1) US4785182A (enExample)
EP (1) EP0314763B1 (enExample)
JP (1) JPH01502225A (enExample)
KR (1) KR970005031B1 (enExample)
CN (1) CN1012402B (enExample)
AT (1) ATE86409T1 (enExample)
AU (1) AU603226B2 (enExample)
CA (1) CA1293337C (enExample)
DE (1) DE3878828T2 (enExample)
ES (1) ES2007856A6 (enExample)
IL (1) IL86430A (enExample)
MX (1) MX174400B (enExample)
RU (1) RU2020643C1 (enExample)
WO (1) WO1988009564A1 (enExample)
ZA (1) ZA883273B (enExample)

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US4880976A (en) * 1987-05-21 1989-11-14 Electroscan Corporation Secondary electron detector for use in a gaseous atmosphere
US5352435A (en) * 1989-12-22 1994-10-04 Unger Evan C Ionophore containing liposomes for ultrasound imaging
JPH0740306Y2 (ja) * 1990-02-19 1995-09-13 矢崎総業株式会社 端子係止具付コネクタ
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
JPH06168695A (ja) * 1992-11-30 1994-06-14 Nikon Corp 荷電粒子顕微鏡
US5446282A (en) * 1993-04-05 1995-08-29 Nikon Corporation Scanning photoelectron microscope
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
JPH07262959A (ja) * 1994-03-24 1995-10-13 Nikon Corp 走査型電子顕微鏡
US5485008A (en) * 1994-06-23 1996-01-16 University Of Maryland, College Park Low magnification gas limiting aperture assembly for electron microscopy devices
GB9623768D0 (en) * 1996-11-15 1997-01-08 Leo Electron Microscopy Limite Scanning electron microscope
EP1034557A4 (en) 1997-11-24 2007-01-17 Gerasimos Daniel Danilatos HIGH FREQUENCY GAS DETECTION DEVICE
EP0958590B1 (en) 1997-12-08 2003-06-11 Fei Company Environmental sem with multipole fields for improved secondary electron detection
WO1999030345A1 (en) * 1997-12-08 1999-06-17 Philips Electron Optics B.V. Environmental sem with a magnetic field for improved secondary electron detection
US5945672A (en) * 1998-01-29 1999-08-31 Fei Company Gaseous backscattered electron detector for an environmental scanning electron microscope
WO1999046797A1 (de) 1998-03-10 1999-09-16 Erik Essers Rasterelektronenmikroskop
DE19845329C2 (de) * 1998-03-10 2001-09-27 Erik Essers Rasterelektronenmikroskop
JP4066078B2 (ja) * 1999-05-27 2008-03-26 株式会社ニコン 写像型電子顕微鏡
DE50113837D1 (de) * 2000-07-07 2008-05-21 Zeiss Carl Nts Gmbh Detektor für variierende druckbereiche und elektronenmikroskop mit einem entsprechenden detektor
DE10032607B4 (de) 2000-07-07 2004-08-12 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät
GB2367686B (en) * 2000-08-10 2002-12-11 Leo Electron Microscopy Ltd Improvements in or relating to particle detectors
AUPQ932200A0 (en) * 2000-08-11 2000-08-31 Danilatos, Gerasimos Daniel Environmental scanning electron microscope
JP2002289129A (ja) 2001-03-26 2002-10-04 Jeol Ltd 低真空走査電子顕微鏡
GB2374723B (en) * 2001-04-20 2005-04-20 Leo Electron Microscopy Ltd Scanning electron microscope
US7223974B2 (en) * 2002-05-22 2007-05-29 Applied Materials, Israel, Ltd. Charged particle beam column and method for directing a charged particle beam
EP1367630B1 (en) 2002-05-31 2011-09-14 Carl Zeiss SMT Limited Improvements in or relating to particle detectors
CZ20022105A3 (cs) * 2002-06-17 2004-02-18 Tescan, S. R. O. Detektor sekundárních elektronů, zejména v rastrovacím elektronovém mikroskopu
KR101015116B1 (ko) 2002-09-18 2011-02-16 에프이아이 컴파니 하전(荷電) 입자 빔 시스템
DE10256718B4 (de) * 2002-12-04 2004-10-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Probenuntersuchung mittels eines atmosphärischen oder druckvariablen Rasterelektronenmikroskops
US7388218B2 (en) * 2005-04-04 2008-06-17 Fei Company Subsurface imaging using an electron beam
WO2007117397A2 (en) 2006-03-31 2007-10-18 Fei Company Improved detector for charged particle beam instrument
JP5758577B2 (ja) * 2007-02-06 2015-08-05 エフ・イ−・アイ・カンパニー 高圧荷電粒子ビーム・システム
CZ2007685A3 (cs) 2007-10-04 2008-12-17 Ústav prístrojové techniky AV CR, v.v.i. Ionizacní detektor environmentálního rastrovacíhoelektronového mikroskopu
EP2105944A1 (en) 2008-03-28 2009-09-30 FEI Company Environmental cell for a particle-optical apparatus
US7791020B2 (en) * 2008-03-31 2010-09-07 Fei Company Multistage gas cascade amplifier
US8299432B2 (en) 2008-11-04 2012-10-30 Fei Company Scanning transmission electron microscope using gas amplification
JP5352262B2 (ja) 2009-02-06 2013-11-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8222600B2 (en) * 2009-05-24 2012-07-17 El-Mul Technologies Ltd. Charged particle detection system and method
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
JP5936424B2 (ja) * 2012-04-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2014022429A1 (en) 2012-07-30 2014-02-06 Fei Company Environmental sem gas injection system
US9123506B2 (en) 2013-06-10 2015-09-01 Fei Company Electron beam-induced etching
CN105987924A (zh) * 2015-02-11 2016-10-05 中国科学院空间科学与应用研究中心 卫星金属表面的二次电子发射的测量装置及其使用方法
US9799490B2 (en) 2015-03-31 2017-10-24 Fei Company Charged particle beam processing using process gas and cooled surface
US9633816B2 (en) 2015-05-18 2017-04-25 Fei Company Electron beam microscope with improved imaging gas and method of use
US10068744B2 (en) 2015-12-01 2018-09-04 Carl Zeiss Microscopy Gmbh Charged particle optical apparatus for through-the lens detection of particles
EP3176808B1 (en) * 2015-12-03 2019-10-16 Carl Zeiss Microscopy Ltd. Method for detecting charged particles and particle beam device for carrying out the method
DE102016116765B3 (de) * 2016-09-07 2018-02-22 Specs Surface Nano Analysis Gmbh Vorrichtung mit teilchenoptischer Linsenwirkung zur Untersuchung einer nicht gasförmigen Probe in einer gasförmigen Umgebung, Elektronen- und/oder ionenoptisches System sowie Verfahren zum Untersuchen
DE112018007565B4 (de) 2018-07-02 2024-02-08 Hitachi High-Tech Corporation Rasterelektronenmikroskop
CN113495082B (zh) * 2020-03-19 2022-10-18 清华大学 二次电子发射系数测量装置
CN117650032B (zh) * 2023-11-08 2024-10-15 北京中科科仪股份有限公司 一种探头装置、二次电子探测器及扫描电镜

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US2884529A (en) * 1955-04-18 1959-04-28 Eggler Charles Gaseous scintillation counter
US3612859A (en) * 1968-01-31 1971-10-12 Westinghouse Electric Corp Method for measuring and controlling the density of a metallic vapor
NL7902963A (nl) * 1979-04-13 1980-10-15 Philips Nv Detektor voor elektronenmikroskoop.
AU534811B2 (en) * 1979-07-03 1984-02-16 Unisearch Limited Atmospheric scanning electron microscope
DE3206309A1 (de) * 1982-02-22 1983-09-15 Siemens AG, 1000 Berlin und 8000 München Sekundaerelektronen-spektrometer und verfahren zu seinem betrieb
US4720633A (en) * 1986-01-17 1988-01-19 Electro-Scan Corporation Scanning electron microscope for visualization of wet samples

Also Published As

Publication number Publication date
EP0314763B1 (en) 1993-03-03
JPH0532860B2 (enExample) 1993-05-18
CN1012402B (zh) 1991-04-17
ES2007856A6 (es) 1989-07-01
JPH01502225A (ja) 1989-08-03
EP0314763A4 (en) 1989-12-13
RU2020643C1 (ru) 1994-09-30
MX174400B (es) 1994-05-13
EP0314763A1 (en) 1989-05-10
ZA883273B (en) 1988-11-11
AU1790088A (en) 1988-12-21
IL86430A (en) 1992-02-16
CN1031154A (zh) 1989-02-15
US4785182A (en) 1988-11-15
DE3878828D1 (de) 1993-04-08
ATE86409T1 (de) 1993-03-15
AU603226B2 (en) 1990-11-08
IL86430A0 (en) 1988-11-15
KR890702234A (ko) 1989-12-23
WO1988009564A1 (en) 1988-12-01
CA1293337C (en) 1991-12-17
DE3878828T2 (de) 1993-06-09

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