MX174400B - Detector de electrones secundarios para usarse en una atmosfera gaseosa - Google Patents

Detector de electrones secundarios para usarse en una atmosfera gaseosa

Info

Publication number
MX174400B
MX174400B MX011583A MX1158388A MX174400B MX 174400 B MX174400 B MX 174400B MX 011583 A MX011583 A MX 011583A MX 1158388 A MX1158388 A MX 1158388A MX 174400 B MX174400 B MX 174400B
Authority
MX
Mexico
Prior art keywords
sample
charged particle
particle beam
secondary electrons
vacuum envelope
Prior art date
Application number
MX011583A
Other languages
English (en)
Spanish (es)
Inventor
James F Mancuso
William B Maxwell
Gerasimos D Danilatos
Original Assignee
Electroscan Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Electroscan Corp filed Critical Electroscan Corp
Publication of MX174400B publication Critical patent/MX174400B/es

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Electron Tubes For Measurement (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Electron Sources, Ion Sources (AREA)
MX011583A 1987-05-21 1988-05-20 Detector de electrones secundarios para usarse en una atmosfera gaseosa MX174400B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/052,700 US4785182A (en) 1987-05-21 1987-05-21 Secondary electron detector for use in a gaseous atmosphere

Publications (1)

Publication Number Publication Date
MX174400B true MX174400B (es) 1994-05-13

Family

ID=21979339

Family Applications (1)

Application Number Title Priority Date Filing Date
MX011583A MX174400B (es) 1987-05-21 1988-05-20 Detector de electrones secundarios para usarse en una atmosfera gaseosa

Country Status (15)

Country Link
US (1) US4785182A (enExample)
EP (1) EP0314763B1 (enExample)
JP (1) JPH01502225A (enExample)
KR (1) KR970005031B1 (enExample)
CN (1) CN1012402B (enExample)
AT (1) ATE86409T1 (enExample)
AU (1) AU603226B2 (enExample)
CA (1) CA1293337C (enExample)
DE (1) DE3878828T2 (enExample)
ES (1) ES2007856A6 (enExample)
IL (1) IL86430A (enExample)
MX (1) MX174400B (enExample)
RU (1) RU2020643C1 (enExample)
WO (1) WO1988009564A1 (enExample)
ZA (1) ZA883273B (enExample)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0275306B1 (en) * 1986-08-01 1990-10-24 Electro-Scan Corporation Multipurpose gaseous detector device for electron microscopes
US4897545A (en) * 1987-05-21 1990-01-30 Electroscan Corporation Electron detector for use in a gaseous environment
US4880976A (en) * 1987-05-21 1989-11-14 Electroscan Corporation Secondary electron detector for use in a gaseous atmosphere
US5352435A (en) * 1989-12-22 1994-10-04 Unger Evan C Ionophore containing liposomes for ultrasound imaging
JPH0740306Y2 (ja) * 1990-02-19 1995-09-13 矢崎総業株式会社 端子係止具付コネクタ
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
JPH06168695A (ja) * 1992-11-30 1994-06-14 Nikon Corp 荷電粒子顕微鏡
US5446282A (en) * 1993-04-05 1995-08-29 Nikon Corporation Scanning photoelectron microscope
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
JPH07262959A (ja) * 1994-03-24 1995-10-13 Nikon Corp 走査型電子顕微鏡
US5485008A (en) * 1994-06-23 1996-01-16 University Of Maryland, College Park Low magnification gas limiting aperture assembly for electron microscopy devices
GB9623768D0 (en) * 1996-11-15 1997-01-08 Leo Electron Microscopy Limite Scanning electron microscope
EP1034557A4 (en) 1997-11-24 2007-01-17 Gerasimos Daniel Danilatos HIGH FREQUENCY GAS DETECTION DEVICE
EP0958590B1 (en) 1997-12-08 2003-06-11 Fei Company Environmental sem with multipole fields for improved secondary electron detection
WO1999030345A1 (en) * 1997-12-08 1999-06-17 Philips Electron Optics B.V. Environmental sem with a magnetic field for improved secondary electron detection
US5945672A (en) * 1998-01-29 1999-08-31 Fei Company Gaseous backscattered electron detector for an environmental scanning electron microscope
WO1999046797A1 (de) 1998-03-10 1999-09-16 Erik Essers Rasterelektronenmikroskop
DE19845329C2 (de) * 1998-03-10 2001-09-27 Erik Essers Rasterelektronenmikroskop
JP4066078B2 (ja) * 1999-05-27 2008-03-26 株式会社ニコン 写像型電子顕微鏡
DE50113837D1 (de) * 2000-07-07 2008-05-21 Zeiss Carl Nts Gmbh Detektor für variierende druckbereiche und elektronenmikroskop mit einem entsprechenden detektor
DE10032607B4 (de) 2000-07-07 2004-08-12 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät
GB2367686B (en) * 2000-08-10 2002-12-11 Leo Electron Microscopy Ltd Improvements in or relating to particle detectors
AUPQ932200A0 (en) * 2000-08-11 2000-08-31 Danilatos, Gerasimos Daniel Environmental scanning electron microscope
JP2002289129A (ja) 2001-03-26 2002-10-04 Jeol Ltd 低真空走査電子顕微鏡
GB2374723B (en) * 2001-04-20 2005-04-20 Leo Electron Microscopy Ltd Scanning electron microscope
US7223974B2 (en) * 2002-05-22 2007-05-29 Applied Materials, Israel, Ltd. Charged particle beam column and method for directing a charged particle beam
EP1367630B1 (en) 2002-05-31 2011-09-14 Carl Zeiss SMT Limited Improvements in or relating to particle detectors
CZ20022105A3 (cs) * 2002-06-17 2004-02-18 Tescan, S. R. O. Detektor sekundárních elektronů, zejména v rastrovacím elektronovém mikroskopu
KR101015116B1 (ko) 2002-09-18 2011-02-16 에프이아이 컴파니 하전(荷電) 입자 빔 시스템
DE10256718B4 (de) * 2002-12-04 2004-10-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Probenuntersuchung mittels eines atmosphärischen oder druckvariablen Rasterelektronenmikroskops
US7388218B2 (en) * 2005-04-04 2008-06-17 Fei Company Subsurface imaging using an electron beam
WO2007117397A2 (en) 2006-03-31 2007-10-18 Fei Company Improved detector for charged particle beam instrument
JP5758577B2 (ja) * 2007-02-06 2015-08-05 エフ・イ−・アイ・カンパニー 高圧荷電粒子ビーム・システム
CZ2007685A3 (cs) 2007-10-04 2008-12-17 Ústav prístrojové techniky AV CR, v.v.i. Ionizacní detektor environmentálního rastrovacíhoelektronového mikroskopu
EP2105944A1 (en) 2008-03-28 2009-09-30 FEI Company Environmental cell for a particle-optical apparatus
US7791020B2 (en) * 2008-03-31 2010-09-07 Fei Company Multistage gas cascade amplifier
US8299432B2 (en) 2008-11-04 2012-10-30 Fei Company Scanning transmission electron microscope using gas amplification
JP5352262B2 (ja) 2009-02-06 2013-11-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8222600B2 (en) * 2009-05-24 2012-07-17 El-Mul Technologies Ltd. Charged particle detection system and method
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
JP5936424B2 (ja) * 2012-04-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2014022429A1 (en) 2012-07-30 2014-02-06 Fei Company Environmental sem gas injection system
US9123506B2 (en) 2013-06-10 2015-09-01 Fei Company Electron beam-induced etching
CN105987924A (zh) * 2015-02-11 2016-10-05 中国科学院空间科学与应用研究中心 卫星金属表面的二次电子发射的测量装置及其使用方法
US9799490B2 (en) 2015-03-31 2017-10-24 Fei Company Charged particle beam processing using process gas and cooled surface
US9633816B2 (en) 2015-05-18 2017-04-25 Fei Company Electron beam microscope with improved imaging gas and method of use
US10068744B2 (en) 2015-12-01 2018-09-04 Carl Zeiss Microscopy Gmbh Charged particle optical apparatus for through-the lens detection of particles
EP3176808B1 (en) * 2015-12-03 2019-10-16 Carl Zeiss Microscopy Ltd. Method for detecting charged particles and particle beam device for carrying out the method
DE102016116765B3 (de) * 2016-09-07 2018-02-22 Specs Surface Nano Analysis Gmbh Vorrichtung mit teilchenoptischer Linsenwirkung zur Untersuchung einer nicht gasförmigen Probe in einer gasförmigen Umgebung, Elektronen- und/oder ionenoptisches System sowie Verfahren zum Untersuchen
DE112018007565B4 (de) 2018-07-02 2024-02-08 Hitachi High-Tech Corporation Rasterelektronenmikroskop
CN113495082B (zh) * 2020-03-19 2022-10-18 清华大学 二次电子发射系数测量装置
CN117650032B (zh) * 2023-11-08 2024-10-15 北京中科科仪股份有限公司 一种探头装置、二次电子探测器及扫描电镜

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2884529A (en) * 1955-04-18 1959-04-28 Eggler Charles Gaseous scintillation counter
US3612859A (en) * 1968-01-31 1971-10-12 Westinghouse Electric Corp Method for measuring and controlling the density of a metallic vapor
NL7902963A (nl) * 1979-04-13 1980-10-15 Philips Nv Detektor voor elektronenmikroskoop.
AU534811B2 (en) * 1979-07-03 1984-02-16 Unisearch Limited Atmospheric scanning electron microscope
DE3206309A1 (de) * 1982-02-22 1983-09-15 Siemens AG, 1000 Berlin und 8000 München Sekundaerelektronen-spektrometer und verfahren zu seinem betrieb
US4720633A (en) * 1986-01-17 1988-01-19 Electro-Scan Corporation Scanning electron microscope for visualization of wet samples

Also Published As

Publication number Publication date
EP0314763B1 (en) 1993-03-03
JPH0532860B2 (enExample) 1993-05-18
CN1012402B (zh) 1991-04-17
ES2007856A6 (es) 1989-07-01
JPH01502225A (ja) 1989-08-03
EP0314763A4 (en) 1989-12-13
RU2020643C1 (ru) 1994-09-30
KR970005031B1 (ko) 1997-04-11
EP0314763A1 (en) 1989-05-10
ZA883273B (en) 1988-11-11
AU1790088A (en) 1988-12-21
IL86430A (en) 1992-02-16
CN1031154A (zh) 1989-02-15
US4785182A (en) 1988-11-15
DE3878828D1 (de) 1993-04-08
ATE86409T1 (de) 1993-03-15
AU603226B2 (en) 1990-11-08
IL86430A0 (en) 1988-11-15
KR890702234A (ko) 1989-12-23
WO1988009564A1 (en) 1988-12-01
CA1293337C (en) 1991-12-17
DE3878828T2 (de) 1993-06-09

Similar Documents

Publication Publication Date Title
MX174400B (es) Detector de electrones secundarios para usarse en una atmosfera gaseosa
JP2002500809A (ja) シールドされたカソードを有する電子ソース
US20080142707A1 (en) X-ray photoelectron spectroscopy analysis system for surface analysis and method therefor
US5053184A (en) Device for improving the service life and the reliability of a sealed high-flux neutron tube
US3946268A (en) Field emission gun improvement
US4020387A (en) Field emission electron gun
US3931519A (en) Field emission electron gun
US3731089A (en) Mass spectrometer ion source having means for rapidly expelling ions from the source and method of operation
US3287589A (en) Electron-collision ion source, particularly for electric mass spectrometers
US3663852A (en) Double cell high intensity ion source
KR840006554A (ko) 음극선관
Sinor et al. New frontiers in 21st century microchannel plate (MCP) technology: bulk conductive MCP-based image intensifiers
WO1994007258A3 (en) Electron energy spectrometer
KR20210050902A (ko) 방사형 핀 부재를 갖는 광 이오나이저
US3925664A (en) Field emission electron gun
JPH0228227B2 (enExample)
SU1238614A1 (ru) Способ работы точечного автоэлектронного катода
SU801141A1 (ru) Квадрупольный трехмерный масс- СпЕКТРОМЕТР и СпОСОб ЕгО изгО-ТОВлЕНи
US3811059A (en) Electron gun device of field emission type
JPH05190148A (ja) 発光素子
JPS631699B2 (enExample)
SU1102407A1 (ru) Лазерно-плазменный источник электронов
GB1242031A (en) An improved multipole mass filter
JPH06338279A (ja) 電子銃
RU2002105838A (ru) Устройство для электронно-лучевой сварки