US20060188386A1 - Silver alloy sputtering target for forming reflective layer of optical recording media - Google Patents
Silver alloy sputtering target for forming reflective layer of optical recording media Download PDFInfo
- Publication number
- US20060188386A1 US20060188386A1 US10/548,778 US54877805A US2006188386A1 US 20060188386 A1 US20060188386 A1 US 20060188386A1 US 54877805 A US54877805 A US 54877805A US 2006188386 A1 US2006188386 A1 US 2006188386A1
- Authority
- US
- United States
- Prior art keywords
- remainder
- mass
- reflective layer
- optical recording
- silver alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/266—Sputtering or spin-coating layers
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
- C22C5/08—Alloys based on silver with copper as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
Definitions
- the present invention relates to a silver alloy sputtering target for forming, by the sputtering process, a semi-transparent reflective layer or a reflective layer (hereinafter collectively referred to as the reflective layer) that constitutes an optical recording medium such as optical recording disk (CD-RW, DVD-RAM, etc.) whereon signals representing audio, visual and/or text information are reproduced, or recorded, reproduced and erased by means of a laser beam emitted by a semiconductor laser or the like.
- an optical recording medium such as optical recording disk (CD-RW, DVD-RAM, etc.
- Reflective layers formed from Ag or Ag alloy are used in optical recording media such as magneto-optical recording disks (MD, MO) and optical recording disks (CD-RW, DVD-RAM).
- the reflective layers formed from Ag or Ag alloy are preferably used due to high reflectivity for light of broad wavelengths ranging from 400 to 830 nm, and particularly high reflectivity for laser beam having a short wavelength used in high density recording of optical recording media.
- optical recording media in those that have recording layer formed from a phase change recording material and are subject to repetitive recording, reproducing and erasing, reflectivity of the reflective layer formed from Ag or Ag alloy decreases as the number of repetitions of recording, reproducing and erasing increases, thus failing to endure repetitive recording and reproducing operations over a long period of time.
- the present inventors have found that one of the causes of the problem described above is that, when recording, reproducing and erasing are carried out repetitively on the optical recording medium, the Ag reflective layer is repetitively heated by the irradiation of laser beam and cooled down, during which the Ag reflective layer recrystallizes to cause the crystal grains to grow into coarse grains that result in lower reflectivity.
- the present inventors conducted research into ways to obtain an Ag alloy reflective layer that experiences less decrease in reflectivity of the reflective layer as the number of repetitions of recording, reproducing and erasing increases, and found the following facts:
- the present invention has been completed based on the research described above, and is characterized by:
- a silver alloy sputtering target for forming a reflective layer of optical recording media made of a silver alloy having a composition of 0.5 to 3% by mass of Cu and 0.1 to 3% by mass in total of one or more elements selected from among Dy, La, Nd, Tb and Gd, with the remainder consisting of Ag;
- a silver alloy sputtering target for forming a reflective layer of optical recording media made of a silver alloy having a composition of 0.5 to 3% by mass of Cu and 0.005 to 0.05% by mass in total of one or more elements selected from among Ca, Be and Si, with the remainder consisting of Ag;
- a silver alloy sputtering target for forming a reflective layer of optical recording media made of a silver alloy having composition of 0.5 to 3% by mass of Cu, 0.1 to 3% by mass in total of one or more elements selected from among Dy, La, Nd, Tb and Gd and 0.005 to 0.05% by mass in total of one or more elements selected from among Ca, Be and Si, with the remainder consisting of Ag.
- the sputtering target for forming the silver alloy reflective layer of the present invention can be manufactured by preparing high-purity Ag having purity of 99.99% by mass or higher, and Cu, Dy, La, Nd, Tb and Gd having purity of 99.9% by mass or higher as raw materials, melting these materials in high vacuum or inert gas atmosphere, casting the molten material into an ingot in high vacuum or inert gas atmosphere and machining the ingot after applying hot working.
- Ca, Be and Si that hardly form solid solution with Ag are weighed with Ag in such a proportion that concentration of each element is 0.20% by mass. They are melted in a high-frequency vacuum melting furnace and, after melting, with the furnace filled with Ar gas to atmospheric pressure, and cast in a graphite mold to make a mother alloy that includes Ca, Be and Si. The mother alloy and Cu are added into the weighed Ag, melted and cast into an ingot. Then the target can be made by applying hot working and machining it.
- Cu has the effects of increasing the strength of crystal grains by forming a solid solution with Ag, preventing the crystal grains from recrystallizing, thereby to restrain reflectivity from decreasing. Recrystallization of the crystal grains cannot be prevented satisfactorily and therefore reflectivity cannot be prevented from decreasing, when the Cu content is less than 0.5% by mass.
- initial reflectivity of the Ag alloy reflective layer becomes lower. Accordingly, the Cu content in the Ag alloy reflective layer and in the sputtering target for forming the Ag alloy reflective layer is set within the range from 0.5 to 3% by mass (more preferably from 0.5 to 1.5% by mass).
- the content of these elements in the Ag alloy reflective layer and in the sputtering target for forming the Ag alloy reflective layer is set within the range from 0.1 to 3% by mass (more preferably from 0.2 to 1.5% by mass).
- the content of these elements in the Ag alloy reflective layer and in the sputtering target for forming the Ag alloy reflective layer is set within the range from 0.005 to 0.05% by mass (more preferably from 0.010 to 0.035% by mass).
- High-purity Ag having purity of 99.99% by mass or higher, and Cu, Dy, La, Nd, Tb and Gd having purity of 99.9% by mass or higher were prepared as raw materials and were melted in a high-frequency vacuum melting furnace.
- the molten material was cast into an ingot in a graphite mold in Ar gas atmosphere.
- the ingot was heated at 600° C. for two hours, then rolled and machined thereby to make targets Nos. 1 through 22 of the present invention which dimensions are 125 mm in diameter and 5 mm in thickness and having compositions shown in Tables 1 and 2, comparative targets Nos. 1 through 7 and prior art target.
- DC sputtering power of 100 W was supplied from a DC power source to the target, so as to generate plasma in a space between the target and a glass substrate, which dimensions are 30 mm in diameter and 0.5 mm in thickness and which is disposed to oppose the target in parallel to and with a space of 70 mm from the target, thereby to form the Ag alloy reflective layer having thickness of 100 nm.
- Reflectivity of the Ag alloy reflective layer formed as described above was measured with a spectrophotometer immediately after being formed. Then after leaving the Ag alloy reflective layer in a temperature and humidity chamber that was controlled to 80° C. in temperature and 85% in relative humidity for 200 hours, reflectivity was measured again under the same conditions. Based on the reflectivity data thus obtained, reflectivity to light was determined for wavelengths 400 nm and 650 nm. The results as shown in Tables 1 and 2 were used to evaluate the durability of the reflective layer as the optical recording medium in recording and reproducing of data. TABLE 1 Reflectivity to Reflectivity to wavelength 400 nm wavelength 650 nm (%) (%) Immediately After Immediately After Composition (% by mass) after 200 after 200 Sample No.
- the mother alloy was added together with Cu to Ag, that was then melted and cast into an ingot.
- the ingot was heated at 600° C. for two hours, then rolled and machined thereby to make targets Nos. 23 through 36 of the present invention and comparative targets Nos. 8 through 13 which dimensions were 125 mm in diameter and 5 mm in thickness and having compositions shown in Tables 3 and 4.
- the targets Nos. 23 through 36 of the present invention, and the comparative targets Nos. 8 through 13 were used to form the Ag alloy reflective layer having thickness of 100 nm on glass substrate similarly to Example 1. Reflectivity of the Ag alloy reflective layer was measured with a spectrophotometer immediately after being formed. Then after leaving the Ag alloy reflective layer in a temperature and humidity chamber that was controlled to 80° C. in temperature and 85% in relative humidity for 200 hours, reflectivity was measured again under the same conditions. Based on the reflectivity data thus obtained, reflectivity to light was determined for wavelengths of 400 nm and 650 nm. The results as shown in Tables 3 and 4 were used to evaluate the durability of the reflective layer as the optical recording medium in recording and reproducing of data.
- Example 1 and the mother alloy including Ca, Be and Si prepared in Example 2 were used to make targets Nos. 37 through 50 of the present invention having the compositions shown in Table 5. These targets were used to form the Ag alloy reflective layers having thickness of 100 nm on glass substrate similarly to Example 1. Reflectivity of the Ag alloy reflective layer was measured with a spectrophotometer immediately after being formed. Then after leaving the Ag alloy reflective layer in a temperature and humidity chamber that was controlled to 80° C. in temperature and 85% in relative humidity for 200 hours, reflectivity was measured again under the same conditions. Based on the reflectivity data thus obtained, reflectivity to light was determined for wavelengths of 400 nm and 650 nm.
- the reflective layer formed by using the silver alloy sputtering target for forming a reflective layer of optical recording media according to the present invention experiences less decrease in reflectivity caused by aging than the reflective layer formed by using the silver alloy sputtering target for forming a reflective layer of optical recording media of the prior art does, and makes it possible to manufacture optical recording media that can be used over an extended period of time, so as to make great contribution to the development of the recording media industry.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2003/003006 WO2004081929A1 (ja) | 2003-03-13 | 2003-03-13 | 光記録媒体の反射層形成用銀合金スパッタリングターゲット |
Publications (1)
Publication Number | Publication Date |
---|---|
US20060188386A1 true US20060188386A1 (en) | 2006-08-24 |
Family
ID=32983459
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/548,778 Abandoned US20060188386A1 (en) | 2003-03-13 | 2003-03-13 | Silver alloy sputtering target for forming reflective layer of optical recording media |
Country Status (4)
Country | Link |
---|---|
US (1) | US20060188386A1 (ja) |
EP (1) | EP1603129A4 (ja) |
CN (1) | CN100446101C (ja) |
WO (1) | WO2004081929A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006089815A (ja) * | 2004-09-24 | 2006-04-06 | Tanaka Kikinzoku Kogyo Kk | 太陽電池のインターコネクタ用材料 |
JP2007035104A (ja) * | 2005-07-22 | 2007-02-08 | Kobe Steel Ltd | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
CN102011094B (zh) * | 2010-11-25 | 2012-07-25 | 福州阿石创光电子材料有限公司 | 一种光学蒸镀用材料的制备方法 |
CN102337506B (zh) * | 2011-09-21 | 2012-09-05 | 广州市尤特新材料有限公司 | 一种银合金溅射靶的制造方法 |
CN106947879B (zh) * | 2017-04-11 | 2019-02-19 | 东北大学 | 用于真空磁控溅射银基合金靶材坯料及其制备方法和应用 |
CN114395749B (zh) * | 2021-11-13 | 2023-06-02 | 丰联科光电(洛阳)股份有限公司 | 一种大尺寸、多元Ag基合金溅射靶材的制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2199458A (en) * | 1939-08-15 | 1940-05-07 | Mallory & Co Inc P R | Electric contact |
US4709363A (en) * | 1981-05-11 | 1987-11-24 | U.S. Philips Corporation | Optically readable information disc having a reflection layer formed from a metal alloy |
US20020150772A1 (en) * | 2000-12-26 | 2002-10-17 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Reflection layer or semi-transparent reflection layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media |
US20040005432A1 (en) * | 2002-07-08 | 2004-01-08 | Ridout James W. | Reflective or semi-reflective metal alloy coatings |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10177742A (ja) * | 1996-10-15 | 1998-06-30 | Kao Corp | 光記録媒体 |
JPH11131218A (ja) * | 1997-10-28 | 1999-05-18 | Mitsui Chem Inc | 金属薄膜ならびにそれを用いた光記録媒体 |
JPH11154354A (ja) * | 1997-11-20 | 1999-06-08 | Ricoh Co Ltd | 光記録媒体 |
US6544616B2 (en) * | 2000-07-21 | 2003-04-08 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
JP2000228032A (ja) * | 1999-02-08 | 2000-08-15 | Teijin Ltd | 光情報媒体 |
CA2344926C (en) * | 1999-07-22 | 2009-10-20 | Sony Corporation | Optical recording medium, optical recording method, optical reproducing method, optical recording device, optical reproducing device, and optical recording/reproducing device |
JP3957259B2 (ja) * | 2000-04-12 | 2007-08-15 | 株式会社神戸製鋼所 | 光情報記録媒体用反射層および光情報記録媒体 |
JP3365762B2 (ja) * | 2000-04-28 | 2003-01-14 | 株式会社神戸製鋼所 | 光情報記録媒体用の反射層または半透明反射層、光情報記録媒体及び光情報記録媒体用スパッタリングターゲット |
JP4336464B2 (ja) * | 2001-03-06 | 2009-09-30 | 株式会社リコー | 光情報記録媒体 |
JP2002312980A (ja) * | 2001-04-16 | 2002-10-25 | Sony Corp | 光学記録媒体およびその製造方法、並びにスパッタリング用ターゲット |
JP2002319185A (ja) * | 2001-04-23 | 2002-10-31 | Sumitomo Metal Mining Co Ltd | 光記録ディスク反射膜用銀合金 |
JP4801279B2 (ja) * | 2001-05-09 | 2011-10-26 | 石福金属興業株式会社 | スパッタリングターゲット材 |
JP2002373452A (ja) * | 2001-06-14 | 2002-12-26 | Ricoh Co Ltd | 光記録媒体 |
JP2003006926A (ja) * | 2001-06-19 | 2003-01-10 | Mitsubishi Materials Corp | 光記録媒体用反射膜 |
CN1238554C (zh) * | 2002-06-24 | 2006-01-25 | 株式会社钢臂功科研 | 银合金溅射靶及其制造方法 |
ATE327553T1 (de) * | 2002-06-28 | 2006-06-15 | Williams Advanced Materials In | Korrosionsbeständige silbermetalllegierungen für optisches aufzeichnen und beschreibbare optische aufzeichnungsmedien welche diese legierung enthalten |
-
2003
- 2003-03-13 EP EP03712681A patent/EP1603129A4/en not_active Withdrawn
- 2003-03-13 US US10/548,778 patent/US20060188386A1/en not_active Abandoned
- 2003-03-13 WO PCT/JP2003/003006 patent/WO2004081929A1/ja active Application Filing
- 2003-03-13 CN CNB038261235A patent/CN100446101C/zh not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2199458A (en) * | 1939-08-15 | 1940-05-07 | Mallory & Co Inc P R | Electric contact |
US4709363A (en) * | 1981-05-11 | 1987-11-24 | U.S. Philips Corporation | Optically readable information disc having a reflection layer formed from a metal alloy |
US20020150772A1 (en) * | 2000-12-26 | 2002-10-17 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Reflection layer or semi-transparent reflection layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media |
US20040005432A1 (en) * | 2002-07-08 | 2004-01-08 | Ridout James W. | Reflective or semi-reflective metal alloy coatings |
Also Published As
Publication number | Publication date |
---|---|
CN1751345A (zh) | 2006-03-22 |
EP1603129A1 (en) | 2005-12-07 |
WO2004081929A1 (ja) | 2004-09-23 |
EP1603129A4 (en) | 2008-03-26 |
CN100446101C (zh) | 2008-12-24 |
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Owner name: MITSUBISHI MATERIALS CORPORATION, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:MISHIMA, AKIFUMI;REEL/FRAME:017741/0128 Effective date: 20050905 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |