TWI838119B - 半導體裝置 - Google Patents

半導體裝置 Download PDF

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Publication number
TWI838119B
TWI838119B TW112104689A TW112104689A TWI838119B TW I838119 B TWI838119 B TW I838119B TW 112104689 A TW112104689 A TW 112104689A TW 112104689 A TW112104689 A TW 112104689A TW I838119 B TWI838119 B TW I838119B
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TW
Taiwan
Prior art keywords
gate
gate trench
low
concentration impurity
impurity layer
Prior art date
Application number
TW112104689A
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English (en)
Chinese (zh)
Other versions
TW202349707A (zh
Inventor
中村浩尚
大河亮介
安田英司
Original Assignee
日商新唐科技日本股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 日商新唐科技日本股份有限公司 filed Critical 日商新唐科技日本股份有限公司
Publication of TW202349707A publication Critical patent/TW202349707A/zh
Application granted granted Critical
Publication of TWI838119B publication Critical patent/TWI838119B/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66—Vertical DMOS [VDMOS] FETs
    • H10D30/668—Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/028—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs
    • H10D30/0291—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs of vertical DMOS [VDMOS] FETs
    • H10D30/0297—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs of vertical DMOS [VDMOS] FETs using recessing of the gate electrodes, e.g. to form trench gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126—Top-view geometrical layouts of the regions or the junctions
    • H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149—Source or drain regions of field-effect devices
    • H10D62/151—Source or drain regions of field-effect devices of IGFETs 
    • H10D62/152—Source regions of DMOS transistors
    • H10D62/153—Impurity concentrations or distributions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/393—Body regions of DMOS transistors or IGBTs 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/111—Field plates
    • H10D64/117—Recessed field plates, e.g. trench field plates or buried field plates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/512—Disposition of the gate electrodes, e.g. buried gates
    • H10D64/513—Disposition of the gate electrodes, e.g. buried gates within recesses in the substrate, e.g. trench gates, groove gates or buried gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H10D64/519—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251—Source or drain electrodes for field-effect devices
    • H10D64/252—Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices
    • H10D64/2527—Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices for vertical devices wherein the source or drain electrodes are recessed in semiconductor bodies

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
TW112104689A 2022-02-24 2023-02-10 半導體裝置 TWI838119B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202263313320P 2022-02-24 2022-02-24
US63/313,320 2022-02-24

Publications (2)

Publication Number Publication Date
TW202349707A TW202349707A (zh) 2023-12-16
TWI838119B true TWI838119B (zh) 2024-04-01

Family

ID=87765761

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112104689A TWI838119B (zh) 2022-02-24 2023-02-10 半導體裝置

Country Status (5)

Country Link
US (1) US12142678B2 (https=)
JP (1) JP7393593B1 (https=)
CN (1) CN118056281B (https=)
TW (1) TWI838119B (https=)
WO (1) WO2023162735A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140264432A1 (en) * 2013-03-12 2014-09-18 Infineon Technologies Ag Semiconductor Device
WO2018123799A1 (ja) * 2016-12-27 2018-07-05 パナソニックＩｐマネジメント株式会社 半導体装置
TW202137554A (zh) * 2020-03-04 2021-10-01 曙明 許 金屬氧化物半導體場效應電晶體元件及其製造方法
TW202201697A (zh) * 2020-06-15 2022-01-01 台灣積體電路製造股份有限公司 半導體結構

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5580150B2 (ja) 2010-09-09 2014-08-27 株式会社東芝 半導体装置
JP6022777B2 (ja) * 2012-02-28 2016-11-09 エスアイアイ・セミコンダクタ株式会社 半導体装置の製造方法
JP5825201B2 (ja) 2012-03-05 2015-12-02 株式会社デンソー 半導体装置およびその製造方法
JP6679892B2 (ja) 2015-05-15 2020-04-15 富士電機株式会社 半導体装置
US10217738B2 (en) 2015-05-15 2019-02-26 Smk Corporation IGBT semiconductor device
JP6509674B2 (ja) 2015-08-10 2019-05-08 株式会社東芝 半導体装置
JP6869791B2 (ja) 2017-04-21 2021-05-12 三菱電機株式会社 半導体スイッチング素子及びその製造方法
JP7055052B2 (ja) 2018-04-05 2022-04-15 三菱電機株式会社 半導体装置および電力変換装置
TWI761740B (zh) * 2018-12-19 2022-04-21 日商新唐科技日本股份有限公司 半導體裝置
JP7167717B2 (ja) * 2019-01-07 2022-11-09 株式会社デンソー 半導体装置
JP7118033B2 (ja) * 2019-06-07 2022-08-15 三菱電機株式会社 半導体装置
WO2021024813A1 (ja) * 2019-08-02 2021-02-11 ローム株式会社 半導体装置
JP7330092B2 (ja) * 2019-12-25 2023-08-21 三菱電機株式会社 半導体装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140264432A1 (en) * 2013-03-12 2014-09-18 Infineon Technologies Ag Semiconductor Device
WO2018123799A1 (ja) * 2016-12-27 2018-07-05 パナソニックＩｐマネジメント株式会社 半導体装置
TW202137554A (zh) * 2020-03-04 2021-10-01 曙明 許 金屬氧化物半導體場效應電晶體元件及其製造方法
TW202201697A (zh) * 2020-06-15 2022-01-01 台灣積體電路製造股份有限公司 半導體結構

Also Published As

Publication number Publication date
TW202349707A (zh) 2023-12-16
CN118056281B (zh) 2025-02-18
US20240332416A1 (en) 2024-10-03
JP7393593B1 (ja) 2023-12-06
CN118056281A (zh) 2024-05-17
JPWO2023162735A1 (https=) 2023-08-31
WO2023162735A1 (ja) 2023-08-31
US12142678B2 (en) 2024-11-12

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