TWI834897B - 長條光學積層體之檢查方法及檢查系統 - Google Patents

長條光學積層體之檢查方法及檢查系統 Download PDF

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Publication number
TWI834897B
TWI834897B TW109124438A TW109124438A TWI834897B TW I834897 B TWI834897 B TW I834897B TW 109124438 A TW109124438 A TW 109124438A TW 109124438 A TW109124438 A TW 109124438A TW I834897 B TWI834897 B TW I834897B
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Taiwan
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long optical
mentioned
identification information
optical film
laminated body
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TW109124438A
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English (en)
Chinese (zh)
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TW202129264A (zh
Inventor
三笠康之
松林恭平
田壺宏和
村上洋介
神丸剛
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日商日東電工股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • G01N2021/888Marking defects

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  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Mathematical Physics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Polarising Elements (AREA)
TW109124438A 2019-12-10 2020-07-20 長條光學積層體之檢查方法及檢查系統 TWI834897B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019222918 2019-12-10
JP2019-222918 2019-12-10

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Publication Number Publication Date
TW202129264A TW202129264A (zh) 2021-08-01
TWI834897B true TWI834897B (zh) 2024-03-11

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TW109124438A TWI834897B (zh) 2019-12-10 2020-07-20 長條光學積層體之檢查方法及檢查系統
TW109143559A TWI868273B (zh) 2019-12-10 2020-12-10 長條光學積層體之檢查方法及檢查系統

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Country Link
JP (1) JP7522763B2 (https=)
KR (1) KR20220106744A (https=)
CN (1) CN114846320A (https=)
TW (2) TWI834897B (https=)
WO (2) WO2021117273A1 (https=)

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* Cited by examiner, † Cited by third party
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CN117944373A (zh) * 2024-03-12 2024-04-30 合肥德瑞格光电科技有限公司 一种偏光片自动光学检测缺陷喷印系统及其喷印方法

Citations (2)

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TW201706627A (zh) * 2015-07-17 2017-02-16 Dainippon Printing Co Ltd 光學構件用積層體及影像顯示裝置
JP2018146580A (ja) * 2017-03-03 2018-09-20 住友化学株式会社 欠陥マーキング方法及び欠陥マーキング装置、原反の製造方法及び原反、並びにシートの製造方法及びシート

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US7297969B1 (en) * 2003-06-09 2007-11-20 Cognex Technology And Investment Corporation Web marking and inspection system
KR20050013491A (ko) * 2003-07-28 2005-02-04 닛토덴코 가부시키가이샤 시트형상 제품의 검사 방법 및 검사 시스템
JP2005114624A (ja) * 2003-10-09 2005-04-28 Nitto Denko Corp シート状製品の検査方法及びシート状製品の検査システム及びシート状製品及び枚葉物
JP4960161B2 (ja) * 2006-10-11 2012-06-27 日東電工株式会社 検査データ処理装置及び検査データ処理方法
JP2008175940A (ja) * 2007-01-17 2008-07-31 Sekisui Chem Co Ltd 光学フィルムの欠陥のマーキング方法
JP2008256852A (ja) * 2007-04-03 2008-10-23 Nitto Denko Corp 光学フィルム体および光学フィルム体の製造方法
US7542821B2 (en) * 2007-07-26 2009-06-02 3M Innovative Properties Company Multi-unit process spatial synchronization of image inspection systems
JP5578759B2 (ja) 2007-08-10 2014-08-27 日東電工株式会社 フィルム及びその製造方法
DE102007043408A1 (de) * 2007-09-12 2009-03-19 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Detektion von Trägerfolienresten oder Trägerfehlstellen sowie Applikationsmaschine
JP2009243911A (ja) * 2008-03-28 2009-10-22 Toray Ind Inc 欠陥検査システム
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KR101512142B1 (ko) * 2013-12-31 2015-04-14 (주)엔에스 필름 제조 장치
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JP6749894B2 (ja) * 2015-04-09 2020-09-02 住友化学株式会社 積層光学フィルムの欠陥検査方法、光学フィルムの欠陥検査方法及び積層光学フィルムの製造方法
JP7097666B2 (ja) * 2016-02-02 2022-07-08 日東電工株式会社 フィルムの製造方法および真空成膜装置
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TW201706627A (zh) * 2015-07-17 2017-02-16 Dainippon Printing Co Ltd 光學構件用積層體及影像顯示裝置
JP2018146580A (ja) * 2017-03-03 2018-09-20 住友化学株式会社 欠陥マーキング方法及び欠陥マーキング装置、原反の製造方法及び原反、並びにシートの製造方法及びシート
TW201837456A (zh) * 2017-03-03 2018-10-16 日商住友化學股份有限公司 缺陷標記方法及缺陷標記裝置、原材的製造方法及原材,以及片的製造方法及片

Also Published As

Publication number Publication date
KR20220106744A (ko) 2022-07-29
TW202129264A (zh) 2021-08-01
CN114846320A (zh) 2022-08-02
TW202129265A (zh) 2021-08-01
JP7522763B2 (ja) 2024-07-25
WO2021117670A1 (ja) 2021-06-17
TWI868273B (zh) 2025-01-01
WO2021117273A1 (ja) 2021-06-17
JPWO2021117670A1 (https=) 2021-06-17

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