JPWO2021117670A1 - - Google Patents

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Publication number
JPWO2021117670A1
JPWO2021117670A1 JP2021563945A JP2021563945A JPWO2021117670A1 JP WO2021117670 A1 JPWO2021117670 A1 JP WO2021117670A1 JP 2021563945 A JP2021563945 A JP 2021563945A JP 2021563945 A JP2021563945 A JP 2021563945A JP WO2021117670 A1 JPWO2021117670 A1 JP WO2021117670A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021563945A
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Japanese (ja)
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JP7522763B2 (ja
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Publication of JPWO2021117670A1 publication Critical patent/JPWO2021117670A1/ja
Application granted granted Critical
Publication of JP7522763B2 publication Critical patent/JP7522763B2/ja
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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • G01N2021/888Marking defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Mathematical Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Polarising Elements (AREA)
JP2021563945A 2019-12-10 2020-12-07 長尺光学積層体の検査方法及び検査システム Active JP7522763B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019222918 2019-12-10
JP2019222918 2019-12-10
PCT/JP2020/045454 WO2021117670A1 (ja) 2019-12-10 2020-12-07 長尺光学積層体の検査方法及び検査システム

Publications (2)

Publication Number Publication Date
JPWO2021117670A1 true JPWO2021117670A1 (https=) 2021-06-17
JP7522763B2 JP7522763B2 (ja) 2024-07-25

Family

ID=76328979

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021563945A Active JP7522763B2 (ja) 2019-12-10 2020-12-07 長尺光学積層体の検査方法及び検査システム

Country Status (5)

Country Link
JP (1) JP7522763B2 (https=)
KR (1) KR20220106744A (https=)
CN (1) CN114846320A (https=)
TW (2) TWI834897B (https=)
WO (2) WO2021117273A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117944373A (zh) * 2024-03-12 2024-04-30 合肥德瑞格光电科技有限公司 一种偏光片自动光学检测缺陷喷印系统及其喷印方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7297969B1 (en) * 2003-06-09 2007-11-20 Cognex Technology And Investment Corporation Web marking and inspection system
DE102007043408A1 (de) * 2007-09-12 2009-03-19 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Detektion von Trägerfolienresten oder Trägerfehlstellen sowie Applikationsmaschine
JP2009243911A (ja) * 2008-03-28 2009-10-22 Toray Ind Inc 欠陥検査システム
JP2010534835A (ja) * 2007-07-26 2010-11-11 スリーエム イノベイティブ プロパティズ カンパニー 画像検査システムでの複数プロセスの空間的同期化方法
KR101512142B1 (ko) * 2013-12-31 2015-04-14 (주)엔에스 필름 제조 장치
JP2018146580A (ja) * 2017-03-03 2018-09-20 住友化学株式会社 欠陥マーキング方法及び欠陥マーキング装置、原反の製造方法及び原反、並びにシートの製造方法及びシート

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5925609B2 (ja) 1980-02-14 1984-06-19 椿本興業株式会社 水の除鹿装置
JP3974400B2 (ja) * 2002-01-07 2007-09-12 日東電工株式会社 シート状成形体の検査結果記録方法及び検査結果記録システム及びロール状成形体
KR20050013491A (ko) * 2003-07-28 2005-02-04 닛토덴코 가부시키가이샤 시트형상 제품의 검사 방법 및 검사 시스템
JP2005114624A (ja) * 2003-10-09 2005-04-28 Nitto Denko Corp シート状製品の検査方法及びシート状製品の検査システム及びシート状製品及び枚葉物
JP4960161B2 (ja) * 2006-10-11 2012-06-27 日東電工株式会社 検査データ処理装置及び検査データ処理方法
JP2008175940A (ja) * 2007-01-17 2008-07-31 Sekisui Chem Co Ltd 光学フィルムの欠陥のマーキング方法
JP2008256852A (ja) * 2007-04-03 2008-10-23 Nitto Denko Corp 光学フィルム体および光学フィルム体の製造方法
JP5578759B2 (ja) 2007-08-10 2014-08-27 日東電工株式会社 フィルム及びその製造方法
JP2009244064A (ja) * 2008-03-31 2009-10-22 Sumitomo Chemical Co Ltd 偏光フィルムの検査方法
KR20150086633A (ko) * 2014-01-20 2015-07-29 동우 화인켐 주식회사 광학 필름의 검사 장치 및 방법
JP2015225041A (ja) * 2014-05-29 2015-12-14 住友化学株式会社 積層偏光フィルムの欠陥検査方法
JP6641093B2 (ja) * 2015-03-20 2020-02-05 住友化学株式会社 光学フィルム及び積層光学フィルムの欠陥検査方法
JP6749894B2 (ja) * 2015-04-09 2020-09-02 住友化学株式会社 積層光学フィルムの欠陥検査方法、光学フィルムの欠陥検査方法及び積層光学フィルムの製造方法
CN111736240A (zh) * 2015-07-17 2020-10-02 大日本印刷株式会社 光学部件用层积体以及图像显示装置
JP7097666B2 (ja) * 2016-02-02 2022-07-08 日東電工株式会社 フィルムの製造方法および真空成膜装置
JP6970550B2 (ja) * 2017-07-24 2021-11-24 住友化学株式会社 欠陥検査システム及び欠陥検査方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7297969B1 (en) * 2003-06-09 2007-11-20 Cognex Technology And Investment Corporation Web marking and inspection system
JP2010534835A (ja) * 2007-07-26 2010-11-11 スリーエム イノベイティブ プロパティズ カンパニー 画像検査システムでの複数プロセスの空間的同期化方法
DE102007043408A1 (de) * 2007-09-12 2009-03-19 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Detektion von Trägerfolienresten oder Trägerfehlstellen sowie Applikationsmaschine
JP2009243911A (ja) * 2008-03-28 2009-10-22 Toray Ind Inc 欠陥検査システム
KR101512142B1 (ko) * 2013-12-31 2015-04-14 (주)엔에스 필름 제조 장치
JP2018146580A (ja) * 2017-03-03 2018-09-20 住友化学株式会社 欠陥マーキング方法及び欠陥マーキング装置、原反の製造方法及び原反、並びにシートの製造方法及びシート

Also Published As

Publication number Publication date
TW202129265A (zh) 2021-08-01
TW202129264A (zh) 2021-08-01
TWI868273B (zh) 2025-01-01
WO2021117273A1 (ja) 2021-06-17
CN114846320A (zh) 2022-08-02
TWI834897B (zh) 2024-03-11
JP7522763B2 (ja) 2024-07-25
KR20220106744A (ko) 2022-07-29
WO2021117670A1 (ja) 2021-06-17

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