CN114846320A - 长条光学层叠体的检查方法以及检查系统 - Google Patents

长条光学层叠体的检查方法以及检查系统 Download PDF

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Publication number
CN114846320A
CN114846320A CN202080085745.6A CN202080085745A CN114846320A CN 114846320 A CN114846320 A CN 114846320A CN 202080085745 A CN202080085745 A CN 202080085745A CN 114846320 A CN114846320 A CN 114846320A
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Prior art keywords
long optical
identification information
optical film
film
defect
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CN202080085745.6A
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English (en)
Chinese (zh)
Inventor
三笠康之
松林恭平
田壶宏和
村上洋介
神丸刚
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Nitto Denko Corp
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Nitto Denko Corp
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Publication of CN114846320A publication Critical patent/CN114846320A/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/888—Marking defects

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  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Mathematical Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Polarising Elements (AREA)
CN202080085745.6A 2019-12-10 2020-12-07 长条光学层叠体的检查方法以及检查系统 Pending CN114846320A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019-222918 2019-12-10
JP2019222918 2019-12-10
PCT/JP2020/045454 WO2021117670A1 (ja) 2019-12-10 2020-12-07 長尺光学積層体の検査方法及び検査システム

Publications (1)

Publication Number Publication Date
CN114846320A true CN114846320A (zh) 2022-08-02

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CN202080085745.6A Pending CN114846320A (zh) 2019-12-10 2020-12-07 长条光学层叠体的检查方法以及检查系统

Country Status (5)

Country Link
JP (1) JP7522763B2 (https=)
KR (1) KR20220106744A (https=)
CN (1) CN114846320A (https=)
TW (2) TWI834897B (https=)
WO (2) WO2021117273A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117944373A (zh) * 2024-03-12 2024-04-30 合肥德瑞格光电科技有限公司 一种偏光片自动光学检测缺陷喷印系统及其喷印方法

Citations (17)

* Cited by examiner, † Cited by third party
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JP2003202298A (ja) * 2002-01-07 2003-07-18 Nitto Denko Corp シート状成形体の検査結果記録方法及び検査結果記録システム及びロール状成形体及び枚葉物
CN1576828A (zh) * 2003-07-28 2005-02-09 日东电工株式会社 薄片状制品的检查方法及检查系统
CN1605859A (zh) * 2003-10-09 2005-04-13 日东电工株式会社 薄片状制品及其检查方法和检查系统、图像显示装置
US7297969B1 (en) * 2003-06-09 2007-11-20 Cognex Technology And Investment Corporation Web marking and inspection system
US20080088790A1 (en) * 2006-10-11 2008-04-17 Nitto Denko Corporation Test data processing apparatus and test data processing method
JP2008175940A (ja) * 2007-01-17 2008-07-31 Sekisui Chem Co Ltd 光学フィルムの欠陥のマーキング方法
CN101281258A (zh) * 2007-04-03 2008-10-08 日东电工株式会社 光学薄膜体及光学薄膜体的制造方法
DE102007043408A1 (de) * 2007-09-12 2009-03-19 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Detektion von Trägerfolienresten oder Trägerfehlstellen sowie Applikationsmaschine
JP2009243911A (ja) * 2008-03-28 2009-10-22 Toray Ind Inc 欠陥検査システム
CN101802869A (zh) * 2007-07-26 2010-08-11 3M创新有限公司 图像检测系统的多单元加工空间同步
CN101981438A (zh) * 2008-03-31 2011-02-23 住友化学株式会社 偏光薄膜的检查方法
KR101512142B1 (ko) * 2013-12-31 2015-04-14 (주)엔에스 필름 제조 장치
WO2015182541A1 (ja) * 2014-05-29 2015-12-03 住友化学株式会社 積層偏光フィルムの欠陥検査方法、製造方法および製造装置
JP2017137527A (ja) * 2016-02-02 2017-08-10 日東電工株式会社 マーキング形成方法およびマーキング装置、ならびにフィルムの製造方法および真空成膜装置
CN107407641A (zh) * 2015-03-20 2017-11-28 住友化学株式会社 层叠光学膜的缺陷检查方法、光学膜的缺陷检查方法以及层叠光学膜的制造方法
CN107407642A (zh) * 2015-04-09 2017-11-28 住友化学株式会社 层叠光学膜的缺陷检查方法、光学膜的缺陷检查方法以及层叠光学膜的制造方法
CN108535259A (zh) * 2017-03-03 2018-09-14 住友化学株式会社 缺陷标注方法及装置、卷料和片的制造方法及卷料和片

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* Cited by examiner, † Cited by third party
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JPS5925609B2 (ja) 1980-02-14 1984-06-19 椿本興業株式会社 水の除鹿装置
JP5578759B2 (ja) 2007-08-10 2014-08-27 日東電工株式会社 フィルム及びその製造方法
KR20150086633A (ko) * 2014-01-20 2015-07-29 동우 화인켐 주식회사 광학 필름의 검사 장치 및 방법
CN111736240A (zh) * 2015-07-17 2020-10-02 大日本印刷株式会社 光学部件用层积体以及图像显示装置
JP6970550B2 (ja) * 2017-07-24 2021-11-24 住友化学株式会社 欠陥検査システム及び欠陥検査方法

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003202298A (ja) * 2002-01-07 2003-07-18 Nitto Denko Corp シート状成形体の検査結果記録方法及び検査結果記録システム及びロール状成形体及び枚葉物
US7297969B1 (en) * 2003-06-09 2007-11-20 Cognex Technology And Investment Corporation Web marking and inspection system
CN1576828A (zh) * 2003-07-28 2005-02-09 日东电工株式会社 薄片状制品的检查方法及检查系统
CN1605859A (zh) * 2003-10-09 2005-04-13 日东电工株式会社 薄片状制品及其检查方法和检查系统、图像显示装置
US20080088790A1 (en) * 2006-10-11 2008-04-17 Nitto Denko Corporation Test data processing apparatus and test data processing method
JP2008175940A (ja) * 2007-01-17 2008-07-31 Sekisui Chem Co Ltd 光学フィルムの欠陥のマーキング方法
CN101281258A (zh) * 2007-04-03 2008-10-08 日东电工株式会社 光学薄膜体及光学薄膜体的制造方法
CN101802869A (zh) * 2007-07-26 2010-08-11 3M创新有限公司 图像检测系统的多单元加工空间同步
DE102007043408A1 (de) * 2007-09-12 2009-03-19 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Detektion von Trägerfolienresten oder Trägerfehlstellen sowie Applikationsmaschine
JP2009243911A (ja) * 2008-03-28 2009-10-22 Toray Ind Inc 欠陥検査システム
CN101981438A (zh) * 2008-03-31 2011-02-23 住友化学株式会社 偏光薄膜的检查方法
KR101512142B1 (ko) * 2013-12-31 2015-04-14 (주)엔에스 필름 제조 장치
WO2015182541A1 (ja) * 2014-05-29 2015-12-03 住友化学株式会社 積層偏光フィルムの欠陥検査方法、製造方法および製造装置
CN107407641A (zh) * 2015-03-20 2017-11-28 住友化学株式会社 层叠光学膜的缺陷检查方法、光学膜的缺陷检查方法以及层叠光学膜的制造方法
CN107407642A (zh) * 2015-04-09 2017-11-28 住友化学株式会社 层叠光学膜的缺陷检查方法、光学膜的缺陷检查方法以及层叠光学膜的制造方法
JP2017137527A (ja) * 2016-02-02 2017-08-10 日東電工株式会社 マーキング形成方法およびマーキング装置、ならびにフィルムの製造方法および真空成膜装置
CN108535259A (zh) * 2017-03-03 2018-09-14 住友化学株式会社 缺陷标注方法及装置、卷料和片的制造方法及卷料和片

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117944373A (zh) * 2024-03-12 2024-04-30 合肥德瑞格光电科技有限公司 一种偏光片自动光学检测缺陷喷印系统及其喷印方法

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TW202129265A (zh) 2021-08-01
TW202129264A (zh) 2021-08-01
TWI868273B (zh) 2025-01-01
WO2021117273A1 (ja) 2021-06-17
TWI834897B (zh) 2024-03-11
JPWO2021117670A1 (https=) 2021-06-17
JP7522763B2 (ja) 2024-07-25
KR20220106744A (ko) 2022-07-29
WO2021117670A1 (ja) 2021-06-17

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