TWI823989B - 磁氣記錄媒體之軟磁性層用濺鍍靶材及磁氣記錄媒體 - Google Patents
磁氣記錄媒體之軟磁性層用濺鍍靶材及磁氣記錄媒體 Download PDFInfo
- Publication number
- TWI823989B TWI823989B TW108129579A TW108129579A TWI823989B TW I823989 B TWI823989 B TW I823989B TW 108129579 A TW108129579 A TW 108129579A TW 108129579 A TW108129579 A TW 108129579A TW I823989 B TWI823989 B TW I823989B
- Authority
- TW
- Taiwan
- Prior art keywords
- soft magnetic
- based alloy
- magnetic recording
- magnetic layer
- recording media
- Prior art date
Links
- 238000005477 sputtering target Methods 0.000 title claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 45
- 239000000956 alloy Substances 0.000 claims abstract description 45
- 230000004907 flux Effects 0.000 claims abstract description 25
- 229910052742 iron Inorganic materials 0.000 claims abstract description 12
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 10
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 10
- 239000012535 impurity Substances 0.000 claims abstract description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 7
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 7
- 238000005452 bending Methods 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 abstract description 8
- 239000013077 target material Substances 0.000 abstract description 7
- 229910052725 zinc Inorganic materials 0.000 abstract description 4
- 239000000463 material Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 8
- 239000010949 copper Substances 0.000 description 7
- 229910000765 intermetallic Inorganic materials 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 125000001475 halogen functional group Chemical group 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- 229910000975 Carbon steel Inorganic materials 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- 239000010962 carbon steel Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009689 gas atomisation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018-154016 | 2018-08-20 | ||
| JP2018154016A JP6784733B2 (ja) | 2018-08-20 | 2018-08-20 | 磁気記録媒体の軟磁性層用Ｃｏ系合金 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202015039A TW202015039A (zh) | 2020-04-16 |
| TWI823989B true TWI823989B (zh) | 2023-12-01 |
Family
ID=69593104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108129579A TWI823989B (zh) | 2018-08-20 | 2019-08-20 | 磁氣記錄媒體之軟磁性層用濺鍍靶材及磁氣記錄媒體 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6784733B2 (ja) |
| CN (1) | CN112585285A (ja) |
| SG (1) | SG11202101584XA (ja) |
| TW (1) | TWI823989B (ja) |
| WO (1) | WO2020040082A1 (ja) |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08249643A (ja) * | 1995-03-13 | 1996-09-27 | Kobe Steel Ltd | 磁気記録媒体および磁性膜形成用ターゲット |
| US20060093864A1 (en) * | 2004-10-28 | 2006-05-04 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic recording medium with corrosion resistance and manufacturing method |
| US20080080093A1 (en) * | 2006-09-29 | 2008-04-03 | Fujitsu Limited | Magnetic recording medium and magnetic recording device |
| JP2009211791A (ja) * | 2008-03-06 | 2009-09-17 | Hitachi Global Storage Technologies Netherlands Bv | 磁気記録媒体の製造方法及び製造装置 |
| KR20090105746A (ko) * | 2008-04-03 | 2009-10-07 | 성균관대학교산학협력단 | 수직자기기록매체의 제조방법 |
| JP2012216273A (ja) * | 2011-03-30 | 2012-11-08 | Hitachi Metals Ltd | 垂直磁気記録媒体用Ｆｅ−Ｃｏ系合金軟磁性膜および垂直磁気記録媒体のＦｅ−Ｃｏ系合金軟磁性膜形成用粉末焼結スパッタリングターゲット材 |
| JP2013143156A (ja) * | 2012-01-10 | 2013-07-22 | Hitachi Metals Ltd | Ｃｏ−Ｆｅ系合金軟磁性下地層 |
| JP2015222609A (ja) * | 2014-05-01 | 2015-12-10 | 山陽特殊製鋼株式会社 | 磁気記録用軟磁性合金及びスパッタリングターゲット材並びに磁気記録媒体 |
| JP2016149170A (ja) * | 2015-02-12 | 2016-08-18 | 日立金属株式会社 | Ｆｅ−Ｃｏ−Ｎｂ系合金スパッタリングターゲット材および軟磁性膜 |
| JP2018070994A (ja) * | 2016-10-26 | 2018-05-10 | 光洋應用材料科技股▲分▼有限公司 | Ｃｏ−Ｆｅ−Ｎｂ系スパッタリングターゲット |
| JP2018085156A (ja) * | 2016-11-22 | 2018-05-31 | 日立金属株式会社 | 軟磁性膜形成用スパッタリングターゲット |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5778052B2 (ja) * | 2012-02-03 | 2015-09-16 | 山陽特殊製鋼株式会社 | 磁気記録媒体に用いる低飽和磁束密度を有する軟磁性膜層用合金およびスパッタリングターゲット材 |
| JP6050050B2 (ja) * | 2012-08-14 | 2016-12-21 | 山陽特殊製鋼株式会社 | Ｆｅ−Ｃｏ系合金スパッタリングターゲット材およびその製造方法 |
-
2018
- 2018-08-20 JP JP2018154016A patent/JP6784733B2/ja active Active
-
2019
- 2019-08-19 CN CN201980054140.8A patent/CN112585285A/zh active Pending
- 2019-08-19 SG SG11202101584XA patent/SG11202101584XA/en unknown
- 2019-08-19 WO PCT/JP2019/032255 patent/WO2020040082A1/ja active Application Filing
- 2019-08-20 TW TW108129579A patent/TWI823989B/zh active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08249643A (ja) * | 1995-03-13 | 1996-09-27 | Kobe Steel Ltd | 磁気記録媒体および磁性膜形成用ターゲット |
| US20060093864A1 (en) * | 2004-10-28 | 2006-05-04 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic recording medium with corrosion resistance and manufacturing method |
| US20080080093A1 (en) * | 2006-09-29 | 2008-04-03 | Fujitsu Limited | Magnetic recording medium and magnetic recording device |
| JP2009211791A (ja) * | 2008-03-06 | 2009-09-17 | Hitachi Global Storage Technologies Netherlands Bv | 磁気記録媒体の製造方法及び製造装置 |
| KR20090105746A (ko) * | 2008-04-03 | 2009-10-07 | 성균관대학교산학협력단 | 수직자기기록매체의 제조방법 |
| JP2012216273A (ja) * | 2011-03-30 | 2012-11-08 | Hitachi Metals Ltd | 垂直磁気記録媒体用Ｆｅ−Ｃｏ系合金軟磁性膜および垂直磁気記録媒体のＦｅ−Ｃｏ系合金軟磁性膜形成用粉末焼結スパッタリングターゲット材 |
| JP2013143156A (ja) * | 2012-01-10 | 2013-07-22 | Hitachi Metals Ltd | Ｃｏ−Ｆｅ系合金軟磁性下地層 |
| JP2015222609A (ja) * | 2014-05-01 | 2015-12-10 | 山陽特殊製鋼株式会社 | 磁気記録用軟磁性合金及びスパッタリングターゲット材並びに磁気記録媒体 |
| JP2016149170A (ja) * | 2015-02-12 | 2016-08-18 | 日立金属株式会社 | Ｆｅ−Ｃｏ−Ｎｂ系合金スパッタリングターゲット材および軟磁性膜 |
| JP2018070994A (ja) * | 2016-10-26 | 2018-05-10 | 光洋應用材料科技股▲分▼有限公司 | Ｃｏ−Ｆｅ−Ｎｂ系スパッタリングターゲット |
| JP2018085156A (ja) * | 2016-11-22 | 2018-05-31 | 日立金属株式会社 | 軟磁性膜形成用スパッタリングターゲット |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2020029576A (ja) | 2020-02-27 |
| JP6784733B2 (ja) | 2020-11-11 |
| TW202015039A (zh) | 2020-04-16 |
| WO2020040082A1 (ja) | 2020-02-27 |
| SG11202101584XA (en) | 2021-03-30 |
| CN112585285A (zh) | 2021-03-30 |
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