TWI719751B - 基板搬送裝置及基板搬送系統 - Google Patents

基板搬送裝置及基板搬送系統 Download PDF

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Publication number
TWI719751B
TWI719751B TW108145341A TW108145341A TWI719751B TW I719751 B TWI719751 B TW I719751B TW 108145341 A TW108145341 A TW 108145341A TW 108145341 A TW108145341 A TW 108145341A TW I719751 B TWI719751 B TW I719751B
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TW
Taiwan
Prior art keywords
transfer
substrate
vacuum
robot
chamber
Prior art date
Application number
TW108145341A
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English (en)
Chinese (zh)
Other versions
TW202029396A (zh
Inventor
開田準一
Original Assignee
日商平田機工股份有限公司
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Publication date
Application filed by 日商平田機工股份有限公司 filed Critical 日商平田機工股份有限公司
Publication of TW202029396A publication Critical patent/TW202029396A/zh
Application granted granted Critical
Publication of TWI719751B publication Critical patent/TWI719751B/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J5/00—Manipulators mounted on wheels or on carriages
    • B25J5/02—Manipulators mounted on wheels or on carriages travelling along a guideway
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)
TW108145341A 2018-12-11 2019-12-11 基板搬送裝置及基板搬送系統 TWI719751B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-231644 2018-12-11
JP2018231644A JP7154986B2 (ja) 2018-12-11 2018-12-11 基板搬送装置及び基板搬送システム

Publications (2)

Publication Number Publication Date
TW202029396A TW202029396A (zh) 2020-08-01
TWI719751B true TWI719751B (zh) 2021-02-21

Family

ID=71076427

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108145341A TWI719751B (zh) 2018-12-11 2019-12-11 基板搬送裝置及基板搬送系統

Country Status (4)

Country Link
JP (1) JP7154986B2 (ja)
CN (1) CN113195170B (ja)
TW (1) TWI719751B (ja)
WO (1) WO2020122121A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102348259B1 (ko) * 2021-05-31 2022-01-10 (주) 티로보틱스 기판 이송 로봇을 진공 챔버 내에서 주행하기 위한 주행 로봇
KR102307687B1 (ko) * 2021-06-25 2021-10-05 (주) 티로보틱스 기판 이송 로봇을 진공 챔버 내에서 주행하기 위한 주행 로봇

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001075965A1 (fr) 2000-04-05 2001-10-11 Tokyo Electron Limited Dispositif de traitement
TW201138007A (en) * 2009-12-24 2011-11-01 Tokyo Electron Ltd Substrate processing apparatus and method
JP2012216614A (ja) * 2011-03-31 2012-11-08 Tokyo Electron Ltd 基板処理装置
TW201814804A (zh) * 2016-09-28 2018-04-16 日商國際電氣股份有限公司 基板處理裝置、半導體裝置之製造方法及記錄媒體
TW201834060A (zh) * 2017-02-16 2018-09-16 日商東京威力科創股份有限公司 真空處理裝置及維護裝置

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Publication number Priority date Publication date Assignee Title
JP3953751B2 (ja) * 2001-05-28 2007-08-08 Ｔｄｋ株式会社 ウェーハマッピング装置
CN1205652C (zh) * 2001-06-01 2005-06-08 S.E.S.株式会社 基板清洗系统
JP4850372B2 (ja) * 2001-09-28 2012-01-11 キヤノンアネルバ株式会社 基板処理装置
JP4354675B2 (ja) * 2002-06-04 2009-10-28 ローツェ株式会社 薄板状電子部品クリーン移載装置および薄板状電子製品製造システム
JP2004263206A (ja) * 2003-02-10 2004-09-24 Fuyuutec Furness:Kk 熱処理装置
JP4283559B2 (ja) * 2003-02-24 2009-06-24 東京エレクトロン株式会社 搬送装置及び真空処理装置並びに常圧搬送装置
JP4493955B2 (ja) * 2003-09-01 2010-06-30 東京エレクトロン株式会社 基板処理装置及び搬送ケース
JP2006052063A (ja) * 2004-08-12 2006-02-23 Murata Mach Ltd 搬送台車システム
JP4695406B2 (ja) * 2005-02-10 2011-06-08 パナソニック株式会社 部品実装装置及び部品実装方法
JP2007251090A (ja) * 2006-03-20 2007-09-27 Tokyo Electron Ltd 真空処理装置の搬送位置合わせ方法、真空処理装置及びコンピュータ記憶媒体
JP4606388B2 (ja) * 2006-06-12 2011-01-05 川崎重工業株式会社 基板移載装置の搬送系ユニット
JP4472005B2 (ja) * 2008-04-24 2010-06-02 キヤノンアネルバ株式会社 真空処理装置及び真空処理方法
JP5139253B2 (ja) * 2008-12-18 2013-02-06 東京エレクトロン株式会社 真空処理装置及び真空搬送装置
KR101755047B1 (ko) * 2009-05-18 2017-07-06 크로씽 오토메이션, 인코포레이티드 기판 컨테이너 보관 시스템과 연결하기 위한 일체형 시스템
EP2433299B1 (en) * 2009-05-18 2022-10-26 Brooks Automation US, LLC Substrate container storage system
CN102064095A (zh) * 2010-12-03 2011-05-18 孙丽杰 半导体基板加工设备
JP5609856B2 (ja) * 2011-12-20 2014-10-22 株式会社安川電機 搬送ロボット
JP6454201B2 (ja) * 2015-03-26 2019-01-16 東京エレクトロン株式会社 基板搬送方法及び基板処理装置
JP2016219464A (ja) * 2015-05-14 2016-12-22 株式会社日立ハイテクノロジーズ 真空処理装置および搬送ロボット
KR102484165B1 (ko) * 2017-03-31 2023-01-03 스미또모 가가꾸 가부시키가이샤 반송 시스템 및 반송 방법
JP2018174186A (ja) * 2017-03-31 2018-11-08 東京エレクトロン株式会社 基板処理装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001075965A1 (fr) 2000-04-05 2001-10-11 Tokyo Electron Limited Dispositif de traitement
TW201138007A (en) * 2009-12-24 2011-11-01 Tokyo Electron Ltd Substrate processing apparatus and method
JP2012216614A (ja) * 2011-03-31 2012-11-08 Tokyo Electron Ltd 基板処理装置
TW201814804A (zh) * 2016-09-28 2018-04-16 日商國際電氣股份有限公司 基板處理裝置、半導體裝置之製造方法及記錄媒體
TW201834060A (zh) * 2017-02-16 2018-09-16 日商東京威力科創股份有限公司 真空處理裝置及維護裝置

Also Published As

Publication number Publication date
CN113195170B (zh) 2023-12-22
CN113195170A (zh) 2021-07-30
JP7154986B2 (ja) 2022-10-18
TW202029396A (zh) 2020-08-01
WO2020122121A1 (ja) 2020-06-18
JP2020096033A (ja) 2020-06-18

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