TWI694313B - 曝光裝置及物品之製造方法 - Google Patents

曝光裝置及物品之製造方法 Download PDF

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Publication number
TWI694313B
TWI694313B TW107119099A TW107119099A TWI694313B TW I694313 B TWI694313 B TW I694313B TW 107119099 A TW107119099 A TW 107119099A TW 107119099 A TW107119099 A TW 107119099A TW I694313 B TWI694313 B TW I694313B
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TW
Taiwan
Prior art keywords
light
exposure
shutter member
substrate
change
Prior art date
Application number
TW107119099A
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English (en)
Chinese (zh)
Other versions
TW201905601A (zh
Inventor
村上瑞真
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW201905601A publication Critical patent/TW201905601A/zh
Application granted granted Critical
Publication of TWI694313B publication Critical patent/TWI694313B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW107119099A 2017-06-19 2018-06-04 曝光裝置及物品之製造方法 TWI694313B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017119884A JP6929142B2 (ja) 2017-06-19 2017-06-19 露光装置、および物品の製造方法
JP2017-119884 2017-06-19

Publications (2)

Publication Number Publication Date
TW201905601A TW201905601A (zh) 2019-02-01
TWI694313B true TWI694313B (zh) 2020-05-21

Family

ID=65006119

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107119099A TWI694313B (zh) 2017-06-19 2018-06-04 曝光裝置及物品之製造方法

Country Status (3)

Country Link
JP (1) JP6929142B2 (enExample)
KR (1) KR102359802B1 (enExample)
TW (1) TWI694313B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7241564B2 (ja) * 2019-02-22 2023-03-17 キヤノン株式会社 露光装置、および物品の製造方法
JP7286365B2 (ja) * 2019-03-25 2023-06-05 キヤノン株式会社 シャッタ装置、露光装置および物品製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04229843A (ja) * 1990-12-27 1992-08-19 Canon Inc 露光装置用シャッタ

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5952246A (ja) * 1982-09-20 1984-03-26 Nippon Kogaku Kk <Nikon> 露光制御装置
JPS60144745A (ja) * 1984-01-05 1985-07-31 Nippon Kogaku Kk <Nikon> 露光装置
JPH04361522A (ja) * 1991-06-10 1992-12-15 Hitachi Ltd シャッタ制御装置
JPH0555106A (ja) * 1991-08-28 1993-03-05 Canon Inc 露光量制御装置
JPH06120103A (ja) * 1992-10-07 1994-04-28 Canon Inc 露光装置
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置
JP5025250B2 (ja) * 2006-12-15 2012-09-12 キヤノン株式会社 露光装置及びデバイス製造方法
JP6415057B2 (ja) * 2014-02-07 2018-10-31 キヤノン株式会社 露光装置、および物品の製造方法
JP6861463B2 (ja) * 2015-06-16 2021-04-21 キヤノン株式会社 露光装置及び物品の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04229843A (ja) * 1990-12-27 1992-08-19 Canon Inc 露光装置用シャッタ

Also Published As

Publication number Publication date
KR20180138167A (ko) 2018-12-28
JP6929142B2 (ja) 2021-09-01
TW201905601A (zh) 2019-02-01
KR102359802B1 (ko) 2022-02-09
JP2019003145A (ja) 2019-01-10

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