TWI693692B - 積體電路裝置 - Google Patents
積體電路裝置 Download PDFInfo
- Publication number
- TWI693692B TWI693692B TW107126640A TW107126640A TWI693692B TW I693692 B TWI693692 B TW I693692B TW 107126640 A TW107126640 A TW 107126640A TW 107126640 A TW107126640 A TW 107126640A TW I693692 B TWI693692 B TW I693692B
- Authority
- TW
- Taiwan
- Prior art keywords
- type
- bipolar junction
- junction transistor
- well
- bidirectional
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/711—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements
- H10D89/713—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements including a PNP transistor and a NPN transistor, wherein each of said transistors has its base region coupled to the collector region of the other transistor, e.g. silicon controlled rectifier [SCR] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/111—Field plates
- H10D64/112—Field plates comprising multiple field plate segments
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/80—PNPN diodes, e.g. Shockley diodes or break-over diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/611—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using diodes as protective elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/911—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using passive elements as protective elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/931—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs characterised by the dispositions of the protective arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48145—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49575—Assemblies of semiconductor devices on lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
- H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]
- H10D62/106—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/113—Isolations within a component, i.e. internal isolations
- H10D62/115—Dielectric isolations, e.g. air gaps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/111—Field plates
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
- Thyristors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/674,218 | 2017-08-10 | ||
| US15/674,218 US10249609B2 (en) | 2017-08-10 | 2017-08-10 | Apparatuses for communication systems transceiver interfaces |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201921629A TW201921629A (zh) | 2019-06-01 |
| TWI693692B true TWI693692B (zh) | 2020-05-11 |
Family
ID=65084562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107126640A TWI693692B (zh) | 2017-08-10 | 2018-08-01 | 積體電路裝置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10249609B2 (enExample) |
| JP (1) | JP6743096B2 (enExample) |
| CN (1) | CN109390334B (enExample) |
| DE (1) | DE102018118033A1 (enExample) |
| TW (1) | TWI693692B (enExample) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10734806B2 (en) | 2016-07-21 | 2020-08-04 | Analog Devices, Inc. | High voltage clamps with transient activation and activation release control |
| US10861845B2 (en) | 2016-12-06 | 2020-12-08 | Analog Devices, Inc. | Active interface resistance modulation switch |
| US10374092B2 (en) * | 2017-04-17 | 2019-08-06 | Globalfoundries Inc. | Power amplifier ramping and power control with forward and reverse back-gate bias |
| US10608431B2 (en) | 2017-10-26 | 2020-03-31 | Analog Devices, Inc. | Silicon controlled rectifier dynamic triggering and shutdown via control signal amplification |
| TWI661530B (zh) * | 2018-02-13 | 2019-06-01 | 力晶積成電子製造股份有限公司 | 靜電放電保護元件 |
| US10930650B2 (en) | 2018-06-28 | 2021-02-23 | Stmicroelectronics International N.V. | Latch-up immunization techniques for integrated circuits |
| JP7201288B2 (ja) * | 2018-07-26 | 2023-01-10 | ラピスセミコンダクタ株式会社 | 半導体装置 |
| US10581423B1 (en) | 2018-08-17 | 2020-03-03 | Analog Devices Global Unlimited Company | Fault tolerant low leakage switch |
| US10700056B2 (en) | 2018-09-07 | 2020-06-30 | Analog Devices, Inc. | Apparatus for automotive and communication systems transceiver interfaces |
| US11387648B2 (en) | 2019-01-10 | 2022-07-12 | Analog Devices International Unlimited Company | Electrical overstress protection with low leakage current for high voltage tolerant high speed interfaces |
| US11004849B2 (en) | 2019-03-06 | 2021-05-11 | Analog Devices, Inc. | Distributed electrical overstress protection for large density and high data rate communication applications |
| US11152352B2 (en) * | 2019-03-28 | 2021-10-19 | Intel Corporation | Dual mode snap back circuit device |
| DE102020111863A1 (de) | 2019-05-03 | 2020-11-05 | Analog Devices International Unlimited Company | Gegen elektrische Überlastung tolerante Mikrowellenverstärker |
| US11469717B2 (en) | 2019-05-03 | 2022-10-11 | Analog Devices International Unlimited Company | Microwave amplifiers tolerant to electrical overstress |
| US11342323B2 (en) * | 2019-05-30 | 2022-05-24 | Analog Devices, Inc. | High voltage tolerant circuit architecture for applications subject to electrical overstress fault conditions |
| CN110335866B (zh) * | 2019-06-26 | 2021-09-24 | 电子科技大学 | 一种基于纳米级集成电路工艺的双向低触发esd保护器件 |
| US10804887B1 (en) * | 2019-09-26 | 2020-10-13 | Texas Instruments Incorporated | Slow clamp circuit for bipolar junction transistor (BJT) buffers |
| US11362203B2 (en) | 2019-09-26 | 2022-06-14 | Analog Devices, Inc. | Electrical overstress protection for electronic systems subject to electromagnetic compatibility fault conditions |
| US11595036B2 (en) | 2020-04-30 | 2023-02-28 | Analog Devices, Inc. | FinFET thyristors for protecting high-speed communication interfaces |
| US12033999B2 (en) * | 2020-07-23 | 2024-07-09 | Changxin Memory Technologies, Inc. | Electrostatic discharge protection device |
| EP4067917A4 (en) * | 2021-02-03 | 2023-10-18 | Changxin Memory Technologies, Inc. | INTEGRATED CIRCUIT LOCKING TEST STRUCTURE |
| CN114859206A (zh) * | 2021-02-03 | 2022-08-05 | 长鑫存储技术有限公司 | 集成电路闩锁测试结构 |
| US11728381B2 (en) | 2021-04-23 | 2023-08-15 | Globalfoundries Singapore Pte. Ltd. | Electrostatic discharge (ESD) device with improved turn-on voltage |
| US11978733B2 (en) | 2021-08-05 | 2024-05-07 | Globalfoundries Singapore Pte. Ltd. | High-voltage electrostatic discharge devices |
| US11942472B2 (en) | 2021-09-15 | 2024-03-26 | Globalfoundries Singapore Pte. Ltd. | High-voltage electrostatic discharge devices |
| CN113675189B (zh) * | 2021-10-22 | 2021-12-31 | 武汉市聚芯微电子有限责任公司 | 一种静电防护器件及芯片 |
| US12446322B2 (en) * | 2022-04-20 | 2025-10-14 | Globalfoundries U.S. Inc. | Electrostatic discharge protection devices including a silicon-controlled rectifier |
| CN115050736B (zh) * | 2022-06-10 | 2023-05-23 | 深圳市晶扬电子有限公司 | 低压工艺的静电保护器件及整体静电防护方法 |
| US11942473B2 (en) | 2022-06-14 | 2024-03-26 | Analog Devices, Inc. | Electrostatic discharge protection for high speed transceiver interface |
| TWI819717B (zh) * | 2022-07-25 | 2023-10-21 | 國立陽明交通大學 | 半導體裝置及其製造方法 |
| US12389690B2 (en) * | 2022-12-05 | 2025-08-12 | Amazing Microelectronic Corp. | Transient voltage suppressor with adjustable trigger and holding voltages |
| US20250093211A1 (en) * | 2023-09-20 | 2025-03-20 | Taiwan Semiconductor Manufacturing Company Ltd | Lateral bipolar junction transistor device and method of forming same |
| US12477836B2 (en) | 2023-12-08 | 2025-11-18 | Analog Devices, Inc. | Low capacitance silicon controlled rectifier topology for overvoltage protection |
| TWI881759B (zh) * | 2024-03-21 | 2025-04-21 | 華邦電子股份有限公司 | 輸入/輸出驅動器 |
| US12336302B1 (en) * | 2024-05-03 | 2025-06-17 | Globalfoundries U.S. Inc. | Vertical device triggered silicon control rectifier |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007012864A (ja) * | 2005-06-30 | 2007-01-18 | Nippon Telegr & Teleph Corp <Ntt> | 静電放電保護回路 |
| US9356011B2 (en) * | 2012-11-20 | 2016-05-31 | Analog Devices, Inc. | Junction-isolated blocking voltage structures with integrated protection structures |
| US20160300830A1 (en) * | 2015-04-07 | 2016-10-13 | Analog Devices, Inc. | High speed interface protection apparatus |
Family Cites Families (157)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3436667A (en) | 1964-12-08 | 1969-04-01 | Electric Associates Inc | Protection circuit for an amplifier system |
| SE430450B (sv) | 1979-04-03 | 1983-11-14 | Asea Ab | Tvapoligt overstromsskydd for inkoppling i en stromforande ledning |
| US4626882A (en) | 1984-07-18 | 1986-12-02 | International Business Machines Corporation | Twin diode overvoltage protection structure |
| US4633283A (en) | 1985-03-11 | 1986-12-30 | Rca Corporation | Circuit and structure for protecting integrated circuits from destructive transient voltages |
| US5061652A (en) | 1990-01-23 | 1991-10-29 | International Business Machines Corporation | Method of manufacturing a semiconductor device structure employing a multi-level epitaxial structure |
| IT1253682B (it) | 1991-09-12 | 1995-08-22 | Sgs Thomson Microelectronics | Struttura di protezione dalle scariche elettrostatiche |
| US5182220A (en) | 1992-04-02 | 1993-01-26 | United Microelectronics Corporation | CMOS on-chip ESD protection circuit and semiconductor structure |
| US5276582A (en) | 1992-08-12 | 1994-01-04 | National Semiconductor Corporation | ESD protection using npn bipolar transistor |
| US5343053A (en) | 1993-05-21 | 1994-08-30 | David Sarnoff Research Center Inc. | SCR electrostatic discharge protection for integrated circuits |
| US5369041A (en) | 1993-07-14 | 1994-11-29 | Texas Instruments Incorporated | Method for forming a silicon controlled rectifier |
| US5475335A (en) | 1994-04-01 | 1995-12-12 | National Semiconductor Corporation | High voltage cascaded charge pump |
| US5600525A (en) | 1994-08-17 | 1997-02-04 | David Sarnoff Research Center Inc | ESD protection circuit for integrated circuit |
| US5652689A (en) | 1994-08-29 | 1997-07-29 | United Microelectronics Corporation | ESD protection circuit located under protected bonding pad |
| JPH08139528A (ja) | 1994-09-14 | 1996-05-31 | Oki Electric Ind Co Ltd | トランジスタ保護回路 |
| US5576557A (en) | 1995-04-14 | 1996-11-19 | United Microelectronics Corp. | Complementary LVTSCR ESD protection circuit for sub-micron CMOS integrated circuits |
| US5541801A (en) | 1995-05-26 | 1996-07-30 | United Microelectronics Corporation | Low-voltage gate trigger SCR (LVGTSCR) ESD protection circuit for input and output pads |
| US5745323A (en) | 1995-06-30 | 1998-04-28 | Analog Devices, Inc. | Electrostatic discharge protection circuit for protecting CMOS transistors on integrated circuit processes |
| FR2743938B1 (fr) | 1996-01-19 | 1998-04-10 | Sgs Thomson Microelectronics | Composant de protection d'interface de lignes telephoniques |
| TW299495B (en) | 1996-05-03 | 1997-03-01 | Winbond Electronics Corp | Electrostatic discharge protection circuit |
| US5663860A (en) | 1996-06-28 | 1997-09-02 | Harris Corporation | High voltage protection circuits |
| JP3601252B2 (ja) | 1996-09-13 | 2004-12-15 | 株式会社デンソー | ノックセンサ |
| KR100240872B1 (ko) | 1997-02-17 | 2000-01-15 | 윤종용 | 정전기 방전 보호 회로 및 그것을 구비하는 집적 회로 |
| US5889644A (en) | 1997-02-19 | 1999-03-30 | Micron Technology, Inc. | Device and method for electrostatic discharge protection of a circuit device |
| US6057184A (en) | 1997-03-21 | 2000-05-02 | International Business Machines Corporation | Semiconductor device fabrication method using connecting implants |
| US6784489B1 (en) | 1997-03-28 | 2004-08-31 | Stmicroelectronics, Inc. | Method of operating a vertical DMOS transistor with schottky diode body structure |
| DE19721655C1 (de) | 1997-05-23 | 1998-12-03 | Daimler Benz Ag | Thyristor mit Selbstschutz |
| EP0915508A1 (en) | 1997-10-10 | 1999-05-12 | STMicroelectronics S.r.l. | Integrated circuit with highly efficient junction insulation |
| US6137140A (en) | 1997-11-26 | 2000-10-24 | Texas Instruments Incorporated | Integrated SCR-LDMOS power device |
| US6365924B1 (en) | 1998-06-19 | 2002-04-02 | National Semiconductor Corporation | Dual direction over-voltage and over-current IC protection device and its cell structure |
| KR100307554B1 (ko) | 1998-06-30 | 2001-11-15 | 박종섭 | Esd 소자를 구비하는 반도체장치 |
| JP3244057B2 (ja) | 1998-07-16 | 2002-01-07 | 日本電気株式会社 | 基準電圧源回路 |
| US6236087B1 (en) | 1998-11-02 | 2001-05-22 | Analog Devices, Inc. | SCR cell for electrical overstress protection of electronic circuits |
| US6369427B1 (en) | 1998-11-03 | 2002-04-09 | Vlsi, Technology, Inc. | Integrated circuitry, interface circuit of an integrated circuit device, and cascode circuitry |
| US6172403B1 (en) | 1998-12-15 | 2001-01-09 | Winbond Electronics Corp. | Electrostatic discharge protection circuit triggered by floating-base transistor |
| US6144542A (en) | 1998-12-15 | 2000-11-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | ESD bus lines in CMOS IC's for whole-chip ESD protection |
| GB9907021D0 (en) | 1999-03-27 | 1999-05-19 | Koninkl Philips Electronics Nv | Switch circuit and semiconductor switch for battery-powered equipment |
| US6310379B1 (en) | 1999-06-03 | 2001-10-30 | Texas Instruments Incorporated | NMOS triggered NMOS ESD protection circuit using low voltage NMOS transistors |
| US6873505B2 (en) | 1999-09-14 | 2005-03-29 | United Microelectronics Corp. | Electrostatic discharge protective circuitry equipped with a common discharge line |
| US6512662B1 (en) | 1999-11-30 | 2003-01-28 | Illinois Institute Of Technology | Single structure all-direction ESD protection for integrated circuits |
| US6358781B1 (en) | 2000-06-30 | 2002-03-19 | Taiwan Semiconductor Manufacturing Company | Uniform current distribution SCR device for high voltage ESD protection |
| US6538266B2 (en) | 2000-08-11 | 2003-03-25 | Samsung Electronics Co., Ltd. | Protection device with a silicon-controlled rectifier |
| US6492208B1 (en) | 2000-09-28 | 2002-12-10 | Taiwan Semiconductor Manufacturing Company | Embedded SCR protection device for output and input pad |
| US6621126B2 (en) | 2000-10-10 | 2003-09-16 | Sarnoff Corporation | Multifinger silicon controlled rectifier structure for electrostatic discharge protection |
| JP4065104B2 (ja) | 2000-12-25 | 2008-03-19 | 三洋電機株式会社 | 半導体集積回路装置およびその製造方法 |
| TW483143B (en) | 2001-02-05 | 2002-04-11 | Vanguard Int Semiconduct Corp | Voltage control device for electrostatic discharge protection and its related circuit |
| US6498357B2 (en) | 2001-02-09 | 2002-12-24 | United Microelectronics Corp. | Lateral SCR device for on-chip ESD protection in shallow-trench-isolation CMOS process |
| US6448123B1 (en) | 2001-02-20 | 2002-09-10 | Taiwan Semiconductor Manufacturing Company | Low capacitance ESD protection device |
| TW511269B (en) | 2001-03-05 | 2002-11-21 | Taiwan Semiconductor Mfg | Silicon-controlled rectifier device having deep well region structure and its application on electrostatic discharge protection circuit |
| EP1368874B2 (en) | 2001-03-16 | 2015-02-18 | Sofics BVBA | Electrostatic discharge protection structures for high speed technologies with mixed and ultra-low voltage supplies |
| JP4005920B2 (ja) | 2001-03-16 | 2007-11-14 | サーノフ コーポレーション | ラッチアップ耐性のための高保持電流を有する静電放電保護構造 |
| US7548401B2 (en) | 2001-03-16 | 2009-06-16 | Sarnoff Corporation | Electrostatic discharge protection structures for high speed technologies with mixed and ultra-low voltage supplies |
| US6403992B1 (en) | 2001-06-05 | 2002-06-11 | Integrated Technology Express Inc. | Complementary metal-oxide semiconductor device |
| US7005708B2 (en) | 2001-06-14 | 2006-02-28 | Sarnoff Corporation | Minimum-dimension, fully-silicided MOS driver and ESD protection design for optimized inter-finger coupling |
| TW504828B (en) | 2001-08-17 | 2002-10-01 | Winbond Electronics Corp | Bi-directional electrical overstress and electrostatic discharge protection apparatus |
| US20030076636A1 (en) | 2001-10-23 | 2003-04-24 | Ming-Dou Ker | On-chip ESD protection circuit with a substrate-triggered SCR device |
| WO2003041170A1 (fr) | 2001-11-07 | 2003-05-15 | Shindengen Electric Manufacturing Co., Ltd. | Dispositif semi-conducteur de protection contre la surtension |
| US6667870B1 (en) | 2001-12-12 | 2003-12-23 | Natiional Semiconductor Corporation | Fully distributed slave ESD clamps formed under the bond pads |
| US6704180B2 (en) | 2002-04-25 | 2004-03-09 | Medtronic, Inc. | Low input capacitance electrostatic discharge protection circuit utilizing feedback |
| US6717214B2 (en) | 2002-05-21 | 2004-04-06 | Koninklijke Philips Electronics N.V. | SOI-LDMOS device with integral voltage sense electrodes |
| US7179691B1 (en) | 2002-07-29 | 2007-02-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for four direction low capacitance ESD protection |
| US6724603B2 (en) | 2002-08-09 | 2004-04-20 | Motorola, Inc. | Electrostatic discharge protection circuitry and method of operation |
| JP4240983B2 (ja) | 2002-10-07 | 2009-03-18 | 沖電気工業株式会社 | 入力ピン容量の設定方法 |
| US6960811B2 (en) | 2002-11-07 | 2005-11-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Low capacitance ESD protection device, and integrated circuit including the same |
| US20040190208A1 (en) | 2003-03-26 | 2004-09-30 | Maxim Levit | Electrostatic discharge protection and methods thereof |
| US6909149B2 (en) | 2003-04-16 | 2005-06-21 | Sarnoff Corporation | Low voltage silicon controlled rectifier (SCR) for electrostatic discharge (ESD) protection of silicon-on-insulator technologies |
| US6756834B1 (en) | 2003-04-29 | 2004-06-29 | Pericom Semiconductor Corp. | Direct power-to-ground ESD protection with an electrostatic common-discharge line |
| US7196887B2 (en) | 2003-05-28 | 2007-03-27 | Texas Instruments Incorporated | PMOS electrostatic discharge (ESD) protection device |
| US7244992B2 (en) | 2003-07-17 | 2007-07-17 | Ming-Dou Ker | Turn-on-efficient bipolar structures with deep N-well for on-chip ESD protection |
| US6960792B1 (en) | 2003-09-30 | 2005-11-01 | National Semiconductor Corporation | Bi-directional silicon controlled rectifier structure with high holding voltage for latchup prevention |
| US6979869B2 (en) | 2003-10-01 | 2005-12-27 | Lsi Logic Corporation | Substrate-biased I/O and power ESD protection circuits in deep-submicron twin-well process |
| US7582938B2 (en) | 2003-10-01 | 2009-09-01 | Lsi Corporation | I/O and power ESD protection circuits by enhancing substrate-bias in deep-submicron CMOS process |
| US6906387B1 (en) | 2003-10-15 | 2005-06-14 | Altera Corporation | Method for implementing electro-static discharge protection in silicon-on-insulator devices |
| US20050088794A1 (en) | 2003-10-23 | 2005-04-28 | International Business Machines Corporation | Removeable ESD for improving I/O pin bandwidth |
| US7038280B2 (en) | 2003-10-28 | 2006-05-02 | Analog Devices, Inc. | Integrated circuit bond pad structures and methods of making |
| US7067883B2 (en) | 2003-10-31 | 2006-06-27 | Lattice Semiconductor Corporation | Lateral high-voltage junction device |
| TWI223432B (en) | 2003-12-18 | 2004-11-01 | Univ Nat Chiao Tung | Double-triggered silicon controller rectifier and relevant circuitry |
| US7202114B2 (en) | 2004-01-13 | 2007-04-10 | Intersil Americas Inc. | On-chip structure for electrostatic discharge (ESD) protection |
| US7285458B2 (en) | 2004-02-11 | 2007-10-23 | Chartered Semiconductor Manufacturing Ltd. | Method for forming an ESD protection circuit |
| DE102004009981B4 (de) | 2004-03-01 | 2005-12-29 | Infineon Technologies Ag | ESD-Schutzschaltkreis mit Kollektorstrom-gesteuerter Zündung für eine monolithisch integrierte Schaltung |
| KR100635874B1 (ko) | 2004-04-07 | 2006-10-18 | 매그나칩 반도체 유한회사 | Esd 보호 회로 및 그 방법 |
| TWI231033B (en) | 2004-06-04 | 2005-04-11 | Macronix Int Co Ltd | ESD protection circuit |
| CN100377321C (zh) | 2004-06-28 | 2008-03-26 | 中芯国际集成电路制造(上海)有限公司 | 用于高电压操作的金属氧化物半导体器件及其制造方法 |
| US8890248B2 (en) | 2004-08-26 | 2014-11-18 | Texas Instruments Incorporation | Bi-directional ESD protection circuit |
| JP4282581B2 (ja) | 2004-09-29 | 2009-06-24 | 株式会社東芝 | 静電保護回路 |
| TWI237893B (en) | 2004-12-10 | 2005-08-11 | Richtek Technology Corp | Booster-type power management chip containing electrostatic discharge protection mechanism of output electrode |
| KR100627134B1 (ko) | 2004-12-14 | 2006-09-25 | 한국전자통신연구원 | 반도체 제어 정류기를 이용한 정전기 방전 보호 회로 |
| KR100638456B1 (ko) | 2004-12-30 | 2006-10-24 | 매그나칩 반도체 유한회사 | 이에스디 보호회로 및 그 제조방법 |
| US7285828B2 (en) | 2005-01-12 | 2007-10-23 | Intersail Americas Inc. | Electrostatic discharge protection device for digital circuits and for applications with input/output bipolar voltage much higher than the core circuit power supply |
| US7414287B2 (en) | 2005-02-21 | 2008-08-19 | Texas Instruments Incorporated | System and method for making a LDMOS device with electrostatic discharge protection |
| DE102005013686A1 (de) | 2005-03-18 | 2006-10-05 | Atmel Germany Gmbh | ESD-Schutzschaltung mit skalierbarer Stromfestigkeit und Spannungsfestigkeit |
| US7232711B2 (en) | 2005-05-24 | 2007-06-19 | International Business Machines Corporation | Method and structure to prevent circuit network charging during fabrication of integrated circuits |
| US7566914B2 (en) | 2005-07-07 | 2009-07-28 | Intersil Americas Inc. | Devices with adjustable dual-polarity trigger- and holding-voltage/current for high level of electrostatic discharge protection in sub-micron mixed signal CMOS/BiCMOS integrated circuits |
| US7372083B2 (en) | 2005-08-09 | 2008-05-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Embedded silicon-controlled rectifier (SCR) for HVPMOS ESD protection |
| JP2007129163A (ja) * | 2005-11-07 | 2007-05-24 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| JP4995455B2 (ja) | 2005-11-30 | 2012-08-08 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| US7465995B2 (en) | 2006-01-10 | 2008-12-16 | Taiwan Semiconductor Manufacturing Co. | Resistor structure for ESD protection circuits |
| US7385793B1 (en) | 2006-01-24 | 2008-06-10 | Cypress Semiconductor Corporation | Cascode active shunt gate oxide project during electrostatic discharge event |
| US7345341B2 (en) | 2006-02-09 | 2008-03-18 | Taiwan Semiconductor Manufacturing Co., Ltd. | High voltage semiconductor devices and methods for fabricating the same |
| US8218276B2 (en) | 2006-05-31 | 2012-07-10 | Alpha and Omega Semiconductor Inc. | Transient voltage suppressor (TVS) with improved clamping voltage |
| US7626243B2 (en) | 2006-08-04 | 2009-12-01 | Advanced Analogic Technologies, Inc. | ESD protection for bipolar-CMOS-DMOS integrated circuit devices |
| US20080029782A1 (en) | 2006-08-04 | 2008-02-07 | Texas Instruments, Inc. | Integrated ESD protection device |
| US7605431B2 (en) | 2006-09-20 | 2009-10-20 | Himax Technologies Limited | Electrostatic discharge protection apparatus for semiconductor devices |
| TWI370515B (en) | 2006-09-29 | 2012-08-11 | Megica Corp | Circuit component |
| US8431958B2 (en) | 2006-11-16 | 2013-04-30 | Alpha And Omega Semiconductor Ltd | Optimized configurations to integrate steering diodes in low capacitance transient voltage suppressor (TVS) |
| US7701012B2 (en) | 2007-02-26 | 2010-04-20 | Freescale Semiconductor, Inc. | Complementary zener triggered bipolar ESD protection |
| TW200905860A (en) | 2007-07-31 | 2009-02-01 | Amazing Microelectroing Corp | Symmetric type bi-directional silicon control rectifier |
| US7834378B2 (en) | 2007-08-28 | 2010-11-16 | Fairchild Korea Semiconductor Ltd | SCR controlled by the power bias |
| DE102007040875B4 (de) | 2007-08-29 | 2017-11-16 | Austriamicrosystems Ag | Schaltungsanordnung zum Schutz vor elektrostatischen Entladungen und Verfahren zum Betreiben einer solchen |
| US7663190B2 (en) | 2007-10-08 | 2010-02-16 | Intersil Americas Inc. | Tunable voltage isolation ground to ground ESD clamp |
| JP2009194301A (ja) | 2008-02-18 | 2009-08-27 | Sanyo Electric Co Ltd | 半導体装置 |
| US7786504B2 (en) | 2008-03-20 | 2010-08-31 | Amazing Microelectronic Corp. | Bidirectional PNPN silicon-controlled rectifier |
| KR100976410B1 (ko) | 2008-05-28 | 2010-08-17 | 주식회사 하이닉스반도체 | 정전기 방전 장치 |
| US7868387B2 (en) | 2008-06-13 | 2011-01-11 | Analog Devices, Inc. | Low leakage protection device |
| KR20100003569A (ko) | 2008-07-01 | 2010-01-11 | 서경대학교 산학협력단 | 사이리스터를 이용한 esd 보호 회로 |
| US8198651B2 (en) | 2008-10-13 | 2012-06-12 | Infineon Technologies Ag | Electro static discharge protection device |
| JP2010129893A (ja) | 2008-11-28 | 2010-06-10 | Sony Corp | 半導体集積回路 |
| US8039868B2 (en) * | 2008-12-23 | 2011-10-18 | International Business Machines Corporation | Structure and method for an electrostatic discharge (ESD) silicon controlled rectifier (SCR) structure |
| JP5172654B2 (ja) | 2008-12-27 | 2013-03-27 | 株式会社東芝 | 半導体装置 |
| EP2246885A1 (fr) | 2009-04-27 | 2010-11-03 | STmicroelectronics SA | Structure de protection d'un circuit intégré contre des décharges électrostatiques |
| US8222698B2 (en) | 2009-06-29 | 2012-07-17 | Analog Devices, Inc. | Bond pad with integrated transient over-voltage protection |
| US8044457B2 (en) | 2009-06-29 | 2011-10-25 | Analog Devices, Inc. | Transient over-voltage clamp |
| US9520486B2 (en) | 2009-11-04 | 2016-12-13 | Analog Devices, Inc. | Electrostatic protection device |
| US8648419B2 (en) | 2010-01-20 | 2014-02-11 | Freescale Semiconductor, Inc. | ESD protection device and method |
| US8952456B2 (en) | 2010-02-24 | 2015-02-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Electrostatic discharge circuit using inductor-triggered silicon-controlled rectifier |
| US8368116B2 (en) | 2010-06-09 | 2013-02-05 | Analog Devices, Inc. | Apparatus and method for protecting electronic circuits |
| US8665571B2 (en) | 2011-05-18 | 2014-03-04 | Analog Devices, Inc. | Apparatus and method for integrated circuit protection |
| US8432651B2 (en) | 2010-06-09 | 2013-04-30 | Analog Devices, Inc. | Apparatus and method for electronic systems reliability |
| US8553380B2 (en) | 2010-07-08 | 2013-10-08 | Analog Devices, Inc. | Apparatus and method for electronic circuit protection |
| US8416543B2 (en) | 2010-07-08 | 2013-04-09 | Analog Devices, Inc. | Apparatus and method for electronic circuit protection |
| US8217461B1 (en) | 2010-07-09 | 2012-07-10 | Altera Corporation | ESD protection circuit |
| US8686470B2 (en) | 2011-01-07 | 2014-04-01 | Nxp, B.V. | ESD protection circuit |
| US8466489B2 (en) | 2011-02-04 | 2013-06-18 | Analog Devices, Inc. | Apparatus and method for transient electrical overstress protection |
| US8592860B2 (en) | 2011-02-11 | 2013-11-26 | Analog Devices, Inc. | Apparatus and method for protection of electronic circuits operating under high stress conditions |
| US8476736B2 (en) | 2011-02-18 | 2013-07-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Low leakage diodes |
| US8680620B2 (en) | 2011-08-04 | 2014-03-25 | Analog Devices, Inc. | Bi-directional blocking voltage protection devices and methods of forming the same |
| US8947841B2 (en) | 2012-02-13 | 2015-02-03 | Analog Devices, Inc. | Protection systems for integrated circuits and methods of forming the same |
| US8829570B2 (en) | 2012-03-09 | 2014-09-09 | Analog Devices, Inc. | Switching device for heterojunction integrated circuits and methods of forming the same |
| US8946822B2 (en) | 2012-03-19 | 2015-02-03 | Analog Devices, Inc. | Apparatus and method for protection of precision mixed-signal electronic circuits |
| US8610251B1 (en) | 2012-06-01 | 2013-12-17 | Analog Devices, Inc. | Low voltage protection devices for precision transceivers and methods of forming the same |
| US8637899B2 (en) | 2012-06-08 | 2014-01-28 | Analog Devices, Inc. | Method and apparatus for protection and high voltage isolation of low voltage communication interface terminals |
| US8963200B2 (en) | 2012-06-20 | 2015-02-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods and apparatus for increased holding voltage in silicon controlled rectifiers for ESD protection |
| US8860080B2 (en) | 2012-12-19 | 2014-10-14 | Analog Devices, Inc. | Interface protection device with integrated supply clamp and method of forming the same |
| US9123540B2 (en) | 2013-01-30 | 2015-09-01 | Analog Devices, Inc. | Apparatus for high speed signal processing interface |
| US9006781B2 (en) | 2012-12-19 | 2015-04-14 | Analog Devices, Inc. | Devices for monolithic data conversion interface protection and methods of forming the same |
| US9147677B2 (en) | 2013-05-16 | 2015-09-29 | Analog Devices Global | Dual-tub junction-isolated voltage clamp devices for protecting low voltage circuitry connected between high voltage interface pins and methods of forming the same |
| US9171832B2 (en) | 2013-05-24 | 2015-10-27 | Analog Devices, Inc. | Analog switch with high bipolar blocking voltage in low voltage CMOS process |
| US9478608B2 (en) | 2014-11-18 | 2016-10-25 | Analog Devices, Inc. | Apparatus and methods for transceiver interface overvoltage clamping |
| US10068894B2 (en) | 2015-01-12 | 2018-09-04 | Analog Devices, Inc. | Low leakage bidirectional clamps and methods of forming the same |
| US9929142B2 (en) | 2015-03-04 | 2018-03-27 | Analog Devices, Inc. | Apparatus and methods for overvoltage switches with active leakage current compensation |
| US9871373B2 (en) | 2015-03-27 | 2018-01-16 | Analog Devices Global | Electrical overstress recording and/or harvesting |
| US9954356B2 (en) | 2015-05-15 | 2018-04-24 | Analog Devices, Inc. | Electrostatic discharge protection circuits for radio frequency communication systems |
| US9831233B2 (en) * | 2016-04-29 | 2017-11-28 | Analog Devices Global | Apparatuses for communication systems transceiver interfaces |
| US10177566B2 (en) | 2016-06-21 | 2019-01-08 | Analog Devices, Inc. | Apparatus and methods for actively-controlled trigger and latch release thyristor |
| US10734806B2 (en) | 2016-07-21 | 2020-08-04 | Analog Devices, Inc. | High voltage clamps with transient activation and activation release control |
| US10861845B2 (en) | 2016-12-06 | 2020-12-08 | Analog Devices, Inc. | Active interface resistance modulation switch |
| US10319714B2 (en) | 2017-01-24 | 2019-06-11 | Analog Devices, Inc. | Drain-extended metal-oxide-semiconductor bipolar switch for electrical overstress protection |
| US10404059B2 (en) | 2017-02-09 | 2019-09-03 | Analog Devices, Inc. | Distributed switches to suppress transient electrical overstress-induced latch-up |
-
2017
- 2017-08-10 US US15/674,218 patent/US10249609B2/en active Active
-
2018
- 2018-07-25 DE DE102018118033.0A patent/DE102018118033A1/de active Pending
- 2018-08-01 TW TW107126640A patent/TWI693692B/zh active
- 2018-08-09 JP JP2018150118A patent/JP6743096B2/ja active Active
- 2018-08-10 CN CN201810905265.4A patent/CN109390334B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007012864A (ja) * | 2005-06-30 | 2007-01-18 | Nippon Telegr & Teleph Corp <Ntt> | 静電放電保護回路 |
| US9356011B2 (en) * | 2012-11-20 | 2016-05-31 | Analog Devices, Inc. | Junction-isolated blocking voltage structures with integrated protection structures |
| US20160300830A1 (en) * | 2015-04-07 | 2016-10-13 | Analog Devices, Inc. | High speed interface protection apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102018118033A1 (de) | 2019-02-14 |
| US10249609B2 (en) | 2019-04-02 |
| TW201921629A (zh) | 2019-06-01 |
| US20190051646A1 (en) | 2019-02-14 |
| CN109390334A (zh) | 2019-02-26 |
| CN109390334B (zh) | 2023-07-04 |
| JP2019041101A (ja) | 2019-03-14 |
| JP6743096B2 (ja) | 2020-08-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI693692B (zh) | 積體電路裝置 | |
| TWI661655B (zh) | 用於通訊系統收發器介面之裝置 | |
| CN110890359B (zh) | 用于机动车和通信系统收发器接口的设备 | |
| CN109713916B (zh) | 通过控制信号放大控硅整流器动态触发和关断 | |
| DE102017111285B4 (de) | Vorrichtung und verfahren für einen aktiv gesteuerten auslöse- und latch-löse-thyristor | |
| CN113272956B (zh) | 用于耐高电压高速接口的具有低漏电流的电过应力保护 | |
| US9478608B2 (en) | Apparatus and methods for transceiver interface overvoltage clamping | |
| US8680620B2 (en) | Bi-directional blocking voltage protection devices and methods of forming the same | |
| CN108701693B (zh) | 用于静电放电保护的嵌入式pmos触发可控硅整流器 | |
| US8455949B2 (en) | ESD protection element and ESD protection device for use in an electrical circuit | |
| CN103456731B (zh) | 精密收发器的低电压保护设备及其形成方法 | |
| CN103887304B (zh) | 用于单片数据转换接口保护的装置及其形成方法 | |
| CN107230673B (zh) | 使用防护区域的静电放电保护设备和方法 | |
| US10163891B2 (en) | High voltage ESD protection apparatus | |
| CN104934381A (zh) | 串联esd保护电路 | |
| CN107799517A (zh) | 用于半导体结构的esd装置 | |
| WO2020177141A1 (en) | Low capacitance and high-holding-voltage transient-voltage-suppressor (tvs) device for electro-static-discharge (esd) protection | |
| US8941959B2 (en) | ESD protection apparatus | |
| US12322953B2 (en) | ESD protection circuit | |
| CN117238913A (zh) | 高速收发器接口的静电放电保护 | |
| CN110062960A (zh) | 用于静电放电(esd)保护的低电容和高保持电压瞬态电压抑制器(tvs)器件 | |
| US20240332283A1 (en) | ESD Protection Device |