TWI690625B - 黑色化表面處理銅箔、黑色化表面處理銅箔的製造方法、使用黑色化表面處理銅箔得到的銅包覆積層板及可撓式印刷電路板 - Google Patents

黑色化表面處理銅箔、黑色化表面處理銅箔的製造方法、使用黑色化表面處理銅箔得到的銅包覆積層板及可撓式印刷電路板 Download PDF

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Publication number
TWI690625B
TWI690625B TW103106970A TW103106970A TWI690625B TW I690625 B TWI690625 B TW I690625B TW 103106970 A TW103106970 A TW 103106970A TW 103106970 A TW103106970 A TW 103106970A TW I690625 B TWI690625 B TW I690625B
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TW
Taiwan
Prior art keywords
copper foil
printed circuit
flexible printed
treated copper
black
Prior art date
Application number
TW103106970A
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English (en)
Chinese (zh)
Other versions
TW201447051A (zh
Inventor
溝口美智
小畠真一
立岡步
平岡慎哉
橋口隆司
Original Assignee
日商三井金屬鑛業股份有限公司
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=51428422&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI690625(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 日商三井金屬鑛業股份有限公司 filed Critical 日商三井金屬鑛業股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/028—Electroplating of selected surface areas one side electroplating, e.g. substrate conveyed in a bath with inhibited background plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0692—Regulating the thickness of the coating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0137—Materials
    • H05K2201/0154—Polyimide
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0332—Structure of the conductor
    • H05K2201/0335—Layered conductors or foils
    • H05K2201/0355—Metal foils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Structure Of Printed Boards (AREA)
  • ing And Chemical Polishing (AREA)
TW103106970A 2013-02-28 2014-03-03 黑色化表面處理銅箔、黑色化表面處理銅箔的製造方法、使用黑色化表面處理銅箔得到的銅包覆積層板及可撓式印刷電路板 TWI690625B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-039388 2013-02-28
JP2013039388 2013-02-28

Publications (2)

Publication Number Publication Date
TW201447051A TW201447051A (zh) 2014-12-16
TWI690625B true TWI690625B (zh) 2020-04-11

Family

ID=51428422

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103106970A TWI690625B (zh) 2013-02-28 2014-03-03 黑色化表面處理銅箔、黑色化表面處理銅箔的製造方法、使用黑色化表面處理銅箔得到的銅包覆積層板及可撓式印刷電路板

Country Status (6)

Country Link
JP (1) JP5705381B2 (ko)
KR (2) KR102116928B1 (ko)
CN (1) CN105008593B (ko)
MY (1) MY181562A (ko)
TW (1) TWI690625B (ko)
WO (1) WO2014133164A1 (ko)

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KR101895256B1 (ko) * 2014-09-02 2018-09-05 미쓰이금속광업주식회사 흑색화 표면 처리 동박 및 캐리어박 부착 동박
CN107003257B (zh) * 2014-12-08 2020-07-03 三井金属矿业株式会社 印刷板线路板的制造方法
KR102031065B1 (ko) * 2015-01-22 2019-10-11 미쓰이금속광업주식회사 캐리어 부착 극박 동박 및 그 제조 방법, 동장 적층판, 및 프린트 배선판의 제조 방법
JP6487704B2 (ja) 2015-02-12 2019-03-20 福田金属箔粉工業株式会社 処理銅箔及び該処理銅箔を用いた銅張積層板並びにプリント配線板
CN107429417B (zh) * 2015-03-31 2019-11-22 三井金属矿业株式会社 粗糙化处理铜箔、带载体铜箔、覆铜层叠板及印刷电路板
JP2017014608A (ja) * 2015-07-06 2017-01-19 古河電気工業株式会社 電解銅箔、リチウムイオン二次電池用負極電極及びリチウムイオン二次電池、プリント配線板並びに電磁波シールド材
US9397343B1 (en) 2015-10-15 2016-07-19 Chang Chun Petrochemical Co., Ltd. Copper foil exhibiting anti-swelling properties
MY186859A (en) * 2016-04-14 2021-08-26 Mitsui Mining & Smelting Co Ltd Treated surface copper foil, copper foil with carrier as well as methods for manufacturing copper-clad laminate and printed circuit board using same
CN106229344B (zh) 2016-08-19 2019-10-15 京东方科技集团股份有限公司 薄膜晶体管、其制备方法及显示装置
KR102180926B1 (ko) 2017-06-28 2020-11-19 에스케이넥실리스 주식회사 우수한 작업성 및 충방전 특성을 갖는 동박, 그것을 포함하는 전극, 그것을 포함하는 이차전지, 및 그것의 제조방법
TWI694176B (zh) * 2018-08-10 2020-05-21 南韓商Ｋｃｆ科技有限公司 具有較佳工作性及充放電特性之銅箔、包含其之電極、包含其之二次電池及其製造方法
CN111058063B (zh) * 2018-10-16 2021-02-02 长春石油化学股份有限公司 电解铜箔、包含其的电极、及包含其的锂离子电池
US11365486B2 (en) 2018-10-16 2022-06-21 Chang Chun Petrochemical Co., Ltd. Electrolytic copper foil, electrode comprising the same, and lithium ion battery comprising the same
JP7456578B2 (ja) * 2019-05-09 2024-03-27 ナミックス株式会社 銅表面の加工装置
JP7352939B2 (ja) * 2019-05-09 2023-09-29 ナミックス株式会社 複合銅部材
JP7409602B2 (ja) * 2019-05-09 2024-01-09 ナミックス株式会社 複合銅部材
JPWO2022202540A1 (ko) 2021-03-26 2022-09-29
CN116997683A (zh) 2021-03-26 2023-11-03 三井金属矿业株式会社 粗糙化处理铜箔、带载体铜箔、覆铜层叠板及印刷电路板
JPWO2022209989A1 (ko) 2021-03-29 2022-10-06
US12104265B2 (en) 2021-03-29 2024-10-01 Mitsui Mining & Smelting Co., Ltd. Roughened copper foil, copper-clad laminate and printed wiring board
CN115135043B (zh) * 2022-07-18 2023-03-07 东莞市国盈电子有限公司 一种传感器线路板及其制造工艺

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Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
TWI246398B (en) * 2004-02-17 2005-12-21 Nikko Materials Co Ltd Copper foil having blackened surface or layer
TW200702161A (en) * 2005-04-04 2007-01-16 Ube Industries Copper-clad laminated board
TW200738913A (en) * 2006-03-10 2007-10-16 Mitsui Mining & Smelting Co Surface treated elctrolytic copper foil and process for producing the same

Also Published As

Publication number Publication date
TW201447051A (zh) 2014-12-16
KR20160135369A (ko) 2016-11-25
MY181562A (en) 2020-12-29
CN105008593B (zh) 2018-08-24
JP5705381B2 (ja) 2015-04-22
WO2014133164A1 (ja) 2014-09-04
JPWO2014133164A1 (ja) 2017-02-09
KR102116928B1 (ko) 2020-05-29
CN105008593A (zh) 2015-10-28
KR20150090265A (ko) 2015-08-05

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