TWI687301B - 壓印方法及壓印裝置 - Google Patents
壓印方法及壓印裝置 Download PDFInfo
- Publication number
- TWI687301B TWI687301B TW104143137A TW104143137A TWI687301B TW I687301 B TWI687301 B TW I687301B TW 104143137 A TW104143137 A TW 104143137A TW 104143137 A TW104143137 A TW 104143137A TW I687301 B TWI687301 B TW I687301B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- mold
- resin
- adhesive sheet
- curable resin
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 67
- 229920005989 resin Polymers 0.000 claims abstract description 146
- 239000011347 resin Substances 0.000 claims abstract description 146
- 239000000758 substrate Substances 0.000 claims abstract description 117
- 239000000853 adhesive Substances 0.000 claims abstract description 61
- 230000001070 adhesive effect Effects 0.000 claims abstract description 61
- 238000003825 pressing Methods 0.000 claims abstract description 30
- 238000000576 coating method Methods 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 19
- 230000001678 irradiating effect Effects 0.000 claims abstract description 8
- 238000011144 upstream manufacturing Methods 0.000 claims description 21
- 238000001723 curing Methods 0.000 claims description 18
- 239000012530 fluid Substances 0.000 claims description 5
- 238000000016 photochemical curing Methods 0.000 claims description 3
- 238000004049 embossing Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 238000003848 UV Light-Curing Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009503 electrostatic coating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/021—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of profiled articles, e.g. hollow or tubular articles, beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
- B29C37/0003—Discharging moulded articles from the mould
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- General Physics & Mathematics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing & Machinery (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015098654A JP6489309B2 (ja) | 2015-05-14 | 2015-05-14 | インプリント方法およびインプリント装置 |
| JP2015-098654 | 2015-05-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201639689A TW201639689A (zh) | 2016-11-16 |
| TWI687301B true TWI687301B (zh) | 2020-03-11 |
Family
ID=57276543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104143137A TWI687301B (zh) | 2015-05-14 | 2015-12-22 | 壓印方法及壓印裝置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10105874B2 (enExample) |
| JP (1) | JP6489309B2 (enExample) |
| KR (1) | KR20160134466A (enExample) |
| CN (1) | CN106142528B (enExample) |
| TW (1) | TWI687301B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI672212B (zh) * | 2016-08-25 | 2019-09-21 | 國立成功大學 | 奈米壓印組合體及其壓印方法 |
| US11571862B2 (en) | 2016-11-03 | 2023-02-07 | Sram, Llc | Surface feature transfer media and methods of use |
| KR102730502B1 (ko) * | 2017-01-23 | 2024-11-14 | 에스케이하이닉스 주식회사 | 임프린트 패턴 형성 방법 |
| KR102574036B1 (ko) * | 2018-02-28 | 2023-09-04 | 삼성디스플레이 주식회사 | 임프린팅 장치 및 이를 이용한 임프린팅 방법 |
| JP7182036B2 (ja) * | 2018-06-28 | 2022-12-02 | パナソニックIpマネジメント株式会社 | 部品圧着装置、シート設置ユニットおよびシート設置ユニットの取付け方法 |
| JP6538252B1 (ja) * | 2018-09-19 | 2019-07-03 | デクセリアルズ株式会社 | 画像表示装置の製造方法 |
| FI128257B (en) * | 2018-12-14 | 2020-01-31 | Teknologian Tutkimuskeskus Vtt Oy | Procedure for roll to roll printing of components |
| JP7245973B2 (ja) * | 2019-02-04 | 2023-03-27 | パナソニックIpマネジメント株式会社 | パターンの形成方法および装置 |
| JP7178600B2 (ja) * | 2019-03-11 | 2022-11-28 | パナソニックIpマネジメント株式会社 | フィルム構造体の製造方法及び製造装置 |
| KR102218676B1 (ko) * | 2019-07-19 | 2021-02-22 | 한국기계연구원 | 이형막의 선택적 형성을 통한 임프린트 방법 |
| JP7374666B2 (ja) * | 2019-08-29 | 2023-11-07 | キヤノン株式会社 | インプリント方法、前処理装置、インプリント用基板、および基板の製造方法 |
| WO2021182532A1 (ja) * | 2020-03-11 | 2021-09-16 | Scivax株式会社 | インプリント装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011016148A1 (ja) * | 2009-08-07 | 2011-02-10 | ニッタ株式会社 | モールド固定用粘着シートおよびモールド固定用粘着テープ、並びに微細構造の製造方法 |
| US8770965B2 (en) * | 2011-02-10 | 2014-07-08 | Hitachi High-Technologies Corporation | Device and method for transferring micro structure |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6334108A (ja) | 1986-07-30 | 1988-02-13 | Hitachi Ltd | 光デイスク用基板の製造方法および装置 |
| JP2002202535A (ja) | 2000-12-28 | 2002-07-19 | Canon Inc | 表示装置 |
| EP1362682A1 (en) * | 2002-05-13 | 2003-11-19 | ZBD Displays Ltd, | Method and apparatus for liquid crystal alignment |
| KR100568581B1 (ko) * | 2003-04-14 | 2006-04-07 | 주식회사 미뉴타텍 | 미세패턴 형성 몰드용 조성물 및 이로부터 제작된 몰드 |
| TWI261308B (en) * | 2005-03-02 | 2006-09-01 | Ind Tech Res Inst | Micro-nanometer transfer printer |
| JP4789039B2 (ja) | 2005-06-10 | 2011-10-05 | 独立行政法人産業技術総合研究所 | ナノインプリント装置 |
| JP4902229B2 (ja) | 2006-03-07 | 2012-03-21 | ソニーケミカル&インフォメーションデバイス株式会社 | 実装方法 |
| GB0809062D0 (en) * | 2008-05-19 | 2008-06-25 | Zbd Displays Ltd | Method for patterning a surface using selective adhesion |
| JP2010067796A (ja) | 2008-09-11 | 2010-03-25 | Canon Inc | インプリント装置 |
| EP2287666B1 (de) * | 2009-08-22 | 2012-06-27 | EV Group E. Thallner GmbH | Vorrichtung zum Prägen von Substraten |
| JP2011161832A (ja) * | 2010-02-10 | 2011-08-25 | Canon Inc | インプリント装置及び物品の製造方法 |
| JP5559574B2 (ja) | 2010-03-08 | 2014-07-23 | 東芝機械株式会社 | 転写方法 |
| JP5585138B2 (ja) | 2010-03-17 | 2014-09-10 | オムロン株式会社 | 流路チップ及び治具 |
| JP2010250940A (ja) * | 2010-07-14 | 2010-11-04 | Toshiba Corp | インプリント装置 |
| CN103826829B (zh) | 2011-07-11 | 2015-12-23 | Scivax股份有限公司 | 具有用于加压部的固定工具的流体压印装置 |
| TW201334948A (zh) * | 2012-02-21 | 2013-09-01 | Coretronic Corp | 壓印設備及壓印方法 |
| JP6200135B2 (ja) * | 2012-07-24 | 2017-09-20 | キヤノン株式会社 | インプリント装置、インプリント方法、および、物品製造方法 |
| JP5944800B2 (ja) | 2012-09-11 | 2016-07-05 | 東芝機械株式会社 | 転写装置 |
| JP6083565B2 (ja) * | 2013-04-09 | 2017-02-22 | パナソニックIpマネジメント株式会社 | 微細構造体の製造方法 |
-
2015
- 2015-05-14 JP JP2015098654A patent/JP6489309B2/ja not_active Expired - Fee Related
- 2015-12-22 TW TW104143137A patent/TWI687301B/zh not_active IP Right Cessation
-
2016
- 2016-01-17 US US14/997,535 patent/US10105874B2/en not_active Expired - Fee Related
- 2016-01-29 CN CN201610064225.2A patent/CN106142528B/zh not_active Expired - Fee Related
- 2016-02-01 KR KR1020160012347A patent/KR20160134466A/ko not_active Abandoned
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011016148A1 (ja) * | 2009-08-07 | 2011-02-10 | ニッタ株式会社 | モールド固定用粘着シートおよびモールド固定用粘着テープ、並びに微細構造の製造方法 |
| US8770965B2 (en) * | 2011-02-10 | 2014-07-08 | Hitachi High-Technologies Corporation | Device and method for transferring micro structure |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106142528A (zh) | 2016-11-23 |
| US20160332341A1 (en) | 2016-11-17 |
| JP2016213423A (ja) | 2016-12-15 |
| TW201639689A (zh) | 2016-11-16 |
| KR20160134466A (ko) | 2016-11-23 |
| JP6489309B2 (ja) | 2019-03-27 |
| US10105874B2 (en) | 2018-10-23 |
| CN106142528B (zh) | 2019-08-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |