TWI687301B - Imprinting method and imprinting device - Google Patents

Imprinting method and imprinting device Download PDF

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TWI687301B
TWI687301B TW104143137A TW104143137A TWI687301B TW I687301 B TWI687301 B TW I687301B TW 104143137 A TW104143137 A TW 104143137A TW 104143137 A TW104143137 A TW 104143137A TW I687301 B TWI687301 B TW I687301B
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substrate
mold
resin
adhesive sheet
curable resin
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TW104143137A
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TW201639689A (en
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岩瀨鐵平
石川明弘
和田紀彥
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日商松下知識產權經營股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/021Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of profiled articles, e.g. hollow or tubular articles, beams
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0003Discharging moulded articles from the mould
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023Microembossing

Abstract

本發明提供一種壓印方法及壓印裝置。【課題】其目的在於提升壓印之脫模性,並使微細圖案之轉印品質穩定。【解決手段】其特徵在於具有以下步驟:樹脂塗佈步驟,在已將基板的背面貼附於黏著片的狀態下,以覆蓋基板的表面,且超出基板之外周來與黏著片接觸的方式塗佈光硬化樹脂;事先硬化步驟,藉由從基板的背面側照射光線,使與黏著片接觸之光硬化樹脂硬化;加壓步驟,將形成於模具上之微細圖案壓抵於基板的表面上之光硬化性樹脂上;硬化步驟,藉由從基板的表面側照射光線,使基板的表面上之光硬化樹脂硬化;以及脫模步驟,藉由從黏著片上硬化之處進行剝離,而將模具自光硬化樹脂脫模。 The invention provides an imprinting method and an imprinting device. [Subject] Its purpose is to improve the mold release property and stabilize the transfer quality of fine patterns. [Solution] It is characterized by the following steps: a resin coating step, in a state where the back surface of the substrate has been attached to the adhesive sheet, to cover the surface of the substrate, and to extend beyond the periphery of the substrate to come into contact with the adhesive sheet Light curing resin; pre-hardening step, by irradiating light from the back side of the substrate to harden the photo-hardening resin in contact with the adhesive sheet; pressing step, pressing the fine pattern formed on the mold against the surface of the substrate On the photo-curable resin; the hardening step, by irradiating light from the surface side of the substrate, hardens the photo-curable resin on the surface of the substrate; and the demolding step, by peeling from the hardened place on the adhesive sheet, the mold is removed from Light-hardening resin release.

Description

壓印方法及壓印裝置 Imprinting method and imprinting device 發明領域 Field of invention

本發明是有關於一種壓印方法及壓印裝置。 The invention relates to an imprinting method and an imprinting device.

發明背景 Background of the invention

(壓印技術之背景,適用領域) (Background of imprint technology, applicable fields)

近年來,在顯示器、照明等商品上所使用的光學零件方面,備受期待的是,實現已發現下列以往所沒有之新機能的裝置:藉由形成發揮特殊光學特性之奈米(nm)級到微米(μm)級的微細圖案,來控制了光的反射、繞射。作為形成這種微細圖案之方法,除了光刻(photolithography)技術與電子束蝕刻技術之外,近年壓印技術也受到矚目。 In recent years, for optical components used in products such as displays and lighting, it is highly expected to realize devices that have discovered the following new functions that have not been previously available: by forming nanometer (nm) grades that exert special optical characteristics Fine patterns down to the micrometer (μm) level control the reflection and diffraction of light. As a method of forming such a fine pattern, in addition to photolithography technology and electron beam etching technology, imprint technology has also attracted attention in recent years.

所謂壓印技術,是指藉由將在表面預先加工微細圖案之模具按壓在已塗佈在基板表面之樹脂上,以形成模具之微細圖案微細的方法。 The so-called imprint technique refers to a method of forming a fine pattern of a mold by pressing a mold with a fine pattern pre-processed on the surface against a resin that has been coated on the surface of the substrate.

作為壓印方法,有熱壓印法與UV壓印法,該熱壓印法是藉由將被塗佈於基板表面之熱可塑性樹脂加熱到玻璃轉移溫度以上之壓抵模具之作法來轉印微細圖案,該UV壓印法是藉由在使用UV硬化樹脂且已壓抵模具的狀態下照射UV光的作法來轉印微細圖案。 As the imprinting method, there are a thermal imprinting method and a UV imprinting method. The thermal imprinting method is transferred by pressing a mold against the thermoplastic resin coated on the surface of the substrate to a temperature above the glass transition temperature. For the fine pattern, this UV imprinting method transfers the fine pattern by irradiating UV light in a state where the UV hardening resin is used and pressed against the mold.

熱壓印法雖具有材料的選擇性較廣之特徵,但在轉印微細圖案之時需要將模具升溫以及降溫,故會有產量(throughput)較低的問題。另一方面,UV壓印法雖然因為限定於以紫外線硬化的材料,因而與熱壓印法相比較選擇性較少,但因可在數秒~數十秒內完成硬化,故有產量非常高的優點。要採用熱壓印法及UV壓印法的哪一個,會依所要應用之裝置而異,但在不存在材料因素之問題的情況下,經考慮為以UV壓印法作為量產工法較適合。 Although the hot imprinting method has the characteristics of wide material selectivity, when transferring fine patterns, the mold needs to be heated and cooled, so there is a problem of low throughput. On the other hand, although the UV imprinting method is limited to materials hardened by ultraviolet rays, it has less selectivity than the thermal imprinting method, but it can be cured in a few seconds to several tens of seconds, so it has the advantage of very high yield. . Which of the hot imprinting method and the UV imprinting method will be used will vary according to the device to be applied, but when there is no problem of material factors, it is considered that the UV imprinting method is more suitable as a mass production method .

(壓印技術) (Imprint technology)

以下說明以UV壓印法形成微細圖案之一般的步驟流程。圖13為一般的平板式壓印步驟的概要示意圖。首先,在基板11的表面上,使用旋轉塗佈法等來全面塗佈UV硬化樹脂12。接著在平坦的載物台13上配置基板11,並從上方將已形成有微細構造之模具14加壓而使其接觸。作為加壓手段而以平整工具15按壓的方法是常見的。並且,從模具14及平整工具15的上方,以UV照射器16進行UV照射,以使UV硬化樹脂12硬化。最後將平整工具15及模具14移往上方,藉此將模具14從UV硬化樹脂12脫模。 The following describes the general procedure of forming a fine pattern by UV imprinting. FIG. 13 is a schematic diagram of a general flat plate imprinting step. First, on the surface of the substrate 11, the UV-curable resin 12 is entirely coated using a spin coating method or the like. Next, the substrate 11 is placed on the flat stage 13 and the mold 14 having the fine structure formed thereon is pressed and brought into contact from above. The method of pressing with the leveling tool 15 as a pressing means is common. Then, from above the mold 14 and the leveling tool 15, UV irradiation is performed with a UV irradiator 16 to harden the UV-curable resin 12. Finally, the leveling tool 15 and the mold 14 are moved upward, thereby releasing the mold 14 from the UV hardening resin 12.

然而,此方法的情況,因脫模方向相對於轉印平面為垂直方向,故在模具14與已硬化的UV硬化樹脂12之間會產生很大的脫模阻抗。因此,欲將模具14從UV硬化樹脂12脫模時,UV硬化樹脂12與基板11之間會有產生膜剝落的情形,而有造成微細圖案之轉印品質不穩定的問題。 However, in the case of this method, since the release direction is perpendicular to the transfer plane, a large release resistance is generated between the mold 14 and the cured UV-curable resin 12. Therefore, when the mold 14 is to be released from the UV-curable resin 12, the film may peel off between the UV-curable resin 12 and the substrate 11, which may cause unstable transfer quality of the fine pattern.

(針對以往課題之先前文獻) (Prior literature on previous topics)

如圖14所示,專利文獻1揭示的是,藉由將模具14做成薄膜狀,並在轉印後使配置於端部之模具把持具17上升,以使模具14剝離並脫模之壓印方法。由於並不是相對於轉印平面在垂直方向上進行脫模,而是以剝離來進行脫膜,故可以減少脫模阻抗而使微細圖案的轉印品質穩定。又,如圖15所示,專利文獻2揭示的壓印方法是同樣地將模具14做成薄膜狀,並使用加壓滾輪151作為加壓手段,於轉印後在以加壓滾輪151一面按壓模具14一面移往圖中之左方的同時使模具把持具17上升,藉此來剝離模具14而使其脫模。此時,也可減少脫模阻抗而使微細圖案之轉印品質穩定。 As shown in FIG. 14, Patent Document 1 discloses that the mold 14 is made into a film shape, and after the transfer, the mold holder 17 disposed at the end is lifted to peel and release the mold 14.印方法。 Printing method. Since the mold release is not carried out in the vertical direction with respect to the transfer plane, but is carried out by peeling, the mold release resistance can be reduced and the transfer quality of the fine pattern can be stabilized. Also, as shown in FIG. 15, the imprint method disclosed in Patent Document 2 similarly makes the mold 14 into a film shape, and uses a pressure roller 151 as a pressure means, and presses the pressure roller 151 side after transfer As the mold 14 moves to the left in the figure, the mold holder 17 is raised, and the mold 14 is peeled off and released. At this time, the mold release resistance can also be reduced to stabilize the transfer quality of the fine pattern.

先前技術文獻 Prior technical literature 專利文獻 Patent Literature

專利文獻1:日本專利特許5499306號公報 Patent Document 1: Japanese Patent No. 5499306

專利文獻2:日本專利特開2014-54735號公報 Patent Document 2: Japanese Patent Laid-Open No. 2014-54735

發明概要 Summary of the invention

雖然將任一種方法作為提升脫模性的方法都有一定程度的效果,但會因UV硬化樹脂12與基板11之接著性或與模具14的脫模性而變困難,並非所有的情況中都可良好地脫模。以下,具體例示因前述各種材料、接著性以及脫模性而產生之脫模不良的機制。 Although any method has a certain degree of effect as a method for improving the releasability, it will be difficult due to the adhesion of the UV-curable resin 12 to the substrate 11 or the releasability with the mold 14, and this is not the case in all cases. Can be demolded well. In the following, specific examples of the mechanism of mold release failure due to the aforementioned various materials, adhesiveness and mold release properties will be exemplified.

圖16為將以往的壓印方法中的基板11端部之脫模步驟之情形放大的截面圖。實際上,作為基板11而使用 的材料多為矽或玻璃等無機材料,大多無法與UV硬化樹脂12之有機類樹脂有充分的接著性。因此,雖然在基板11上可進行藉由預先施行矽烷耦合(silane coupling)處理等以確保接著性之作法,但也有因耦合處理之溫度條件等而無法確保穩定的接著性的例子。因此,會有導致UV硬化樹脂12與基板11之接著處P1的接著力不穩定且變小的狀況。又,使用於模具14的材料多為壓克力或環氧樹脂等有機類樹脂,因為與UV硬化樹脂12為相同性質,故硬化時大多會形成較大的接著力。雖然可進行使模具14或UV硬化樹脂12中含有氟類的材料以降低接著力之作法,但這些也有因硬化條件等而不穩定的例子。因此,會有導致UV硬化樹脂12與模具14之接著處P2的接著力變大的狀況。從而,會有下列問題:在脫模時,UV硬化樹脂12之與模具14之接著處P2的接著力,超過與基板11之接著處P1的接著力,而如圖16所示,在基板11與UV硬化樹脂12之間產生膜剝落,並造成微細圖案之轉印品質不穩定。 16 is an enlarged cross-sectional view of the state of the step of demolding the end of the substrate 11 in the conventional imprint method. Actually, used as the substrate 11 Most of the materials are inorganic materials such as silicon or glass, and most of them do not have sufficient adhesion with organic resins such as UV-curable resin 12. Therefore, although it is possible to perform a silane coupling process or the like on the substrate 11 in advance to ensure adhesion, there are also examples in which stable adhesion cannot be ensured due to the temperature conditions of the coupling process and the like. Therefore, there may be a situation where the adhesive force at the junction P1 between the UV-curable resin 12 and the substrate 11 becomes unstable and becomes small. In addition, the materials used for the mold 14 are mostly organic resins such as acrylic or epoxy resin. Since they have the same properties as the UV-curable resin 12, they often form a large adhesive force during curing. Although it is possible to make the mold 14 or the UV-curable resin 12 contain a fluorine-based material to reduce the adhesive force, there are examples where these are unstable due to curing conditions and the like. Therefore, there may be a situation where the adhesive force at the junction P2 between the UV hardening resin 12 and the mold 14 becomes large. Therefore, there will be the following problem: at the time of demolding, the adhesive force of the UV curing resin 12 at the junction P2 with the mold 14 exceeds the adhesion to the substrate 11 at the junction P1, and as shown in FIG. 16, the substrate 11 Film peeling occurs with the UV hardening resin 12, and the transfer quality of the fine pattern is unstable.

本發明鑒於上述以往的問題點,其目的在於藉由提升壓印之脫模性,來使微細圖案之轉印品質穩定。 In view of the above-mentioned conventional problems, the present invention aims to stabilize the transfer quality of fine patterns by improving the mold releasability.

為了解決上述課題,本發明之壓印方法的特徵在於具有以下步驟:樹脂塗佈步驟,在已將基板的背面貼附於黏著片的狀態下,以覆蓋前述基板的表面,且超出前述基板之外周來與前述黏著片接觸的方式塗佈光硬化樹脂; 事先硬化步驟,藉由從前述基板的背面側照射光線,使與前述黏著片接觸之光硬化樹脂硬化;加壓步驟,將形成於模具上之微細圖案壓抵於前述基板的表面上之光硬化性樹脂上;硬化步驟,藉由從前述基板的表面側照射光線,使前述基板的表面上之光硬化樹脂硬化;以及脫模步驟,藉由從前述黏著片上硬化之處進行剝離,而將前述模具自前述光硬化樹脂脫模。 In order to solve the above problems, the imprint method of the present invention is characterized by the following steps: a resin coating step, in a state where the back surface of the substrate has been attached to the adhesive sheet, to cover the surface of the substrate and exceed the substrate Apply light-curing resin on the outer periphery in contact with the aforementioned adhesive sheet; The pre-hardening step, by irradiating light from the back side of the substrate, hardens the photo-curable resin in contact with the adhesive sheet; the pressing step, presses the fine pattern formed on the mold against the photo-curing on the surface of the substrate Hardening step, by irradiating light from the surface side of the substrate to harden the photocurable resin on the surface of the substrate; and a demolding step, by peeling from the hardened place on the adhesive sheet, the The mold is released from the aforementioned photo-curable resin.

根據本發明之壓印方法,可以提升壓印之脫模性,並可以使微細圖案之轉印品質穩定。 According to the imprint method of the present invention, the releasability of imprint can be improved, and the transfer quality of fine patterns can be stabilized.

11、21:基板 11, 21: substrate

21a:表面 21a: surface

21b:背面 21b: back

21c:基板最上游之一邊 21c: the most upstream side of the substrate

21d:基板最上游之一端 21d: the most upstream end of the substrate

12、22:UV硬化樹脂 12, 22: UV hardening resin

22a:事先硬化步驟中被硬化之部分(樹脂塗佈步驟中塗佈 UV硬化樹脂的部分) 22a: The part that was hardened in the prior hardening step (Coated in the resin coating step (UV hardening resin part)

22b:事先硬化步驟中未被硬化之部分(樹脂塗佈步驟中未塗佈UV硬化樹脂的部分) 22b: The uncured part in the pre-curing step (the part where the UV curable resin is not applied in the resin coating step)

22c:事先硬化步驟中可被硬化,亦可不被硬化的部分(樹脂塗佈步驟中可被塗佈,亦可不被塗佈的部分) 22c: The part that can be hardened or not hardened in the prior hardening step (the part that can be coated or not coated in the resin coating step)

13、23:載物台 13, 23: stage

14、24:模具 14, 24: mold

24a:第1面 24a: Face 1

24b:第2面 24b: Face 2

15、25:平整工具 15, 25: leveling tool

151、251:加壓滾輪 151, 251: Pressure roller

252:保持滾輪 252: Keep the wheel

16、26:UV照射器 16, 26: UV irradiator

17、27:模具把持具 17, 27: mold holding tool

28:黏著片 28: Adhesive sheet

281:黏著片矯正夾具 281: Adhesive sheet correction jig

29:事先UV照射器 29: Prior UV irradiator

30:流體壓 30: fluid pressure

P1、P4:UV硬化樹脂與基板之接著處 P1, P4: the junction between the UV hardening resin and the substrate

P2:UV硬化樹脂與模具之接著處 P2: Adjacent part of UV hardening resin and mold

P3:UV硬化樹脂與黏著片之接著處 P3: Adjacent part of UV hardening resin and adhesive sheet

X:進給方向 X: Feed direction

圖1A顯示本發明之實施形態1中的壓印方法的樹脂塗佈步驟。 FIG. 1A shows the resin coating step of the imprint method in Embodiment 1 of the present invention.

圖1B顯示同壓印方法之事先硬化步驟。 Figure 1B shows the pre-hardening step of the same imprint method.

圖1C顯示同壓印方法之加壓步驟。 FIG. 1C shows the pressing step of the same imprint method.

圖1D顯示同壓印方法之硬化步驟。 Figure 1D shows the hardening step of the same imprint method.

圖1E顯示同壓印方法之脫模步驟。 Fig. 1E shows the demolding step of the same imprint method.

圖2為說明本發明之實施形態1中的效果的示意圖。 FIG. 2 is a schematic diagram illustrating the effect in Embodiment 1 of the present invention.

圖3為說明為本發明之實施形態1中的效果的示意圖。 FIG. 3 is a schematic diagram illustrating the effect of Embodiment 1 of the present invention.

圖4顯示與本發明之實施形態1中的加壓步驟相關的其他例子。 FIG. 4 shows another example related to the pressurizing step in Embodiment 1 of the present invention.

圖5顯示與本發明之實施形態1中的脫模步驟相關的其他例子。 FIG. 5 shows another example related to the demolding step in Embodiment 1 of the present invention.

圖6顯示與本發明之實施形態1中的黏著片之貼附方法相關的其他例子。 FIG. 6 shows another example related to the method of attaching the adhesive sheet in Embodiment 1 of the present invention.

圖7顯示與本發明之實施形態1中的黏著片之貼附方法相關的其他例子。 FIG. 7 shows another example related to the method of attaching the adhesive sheet in Embodiment 1 of the present invention.

圖8顯示與本發明之實施形態1中的黏著片之貼附方法相關的其他例子。 FIG. 8 shows another example related to the method of attaching the adhesive sheet in Embodiment 1 of the present invention.

圖9A顯示本發明之實施形態2中的壓印方法的樹脂塗佈步驟。 FIG. 9A shows the resin coating step of the imprint method in Embodiment 2 of the present invention.

圖9B顯示同壓印方法之事先硬化步驟。 Fig. 9B shows the pre-hardening step of the same imprint method.

圖9C顯示同壓印方法之加壓、硬化步驟。 Fig. 9C shows the pressing and hardening steps of the same imprint method.

圖9D顯示同壓印方法之脫模步驟。 Fig. 9D shows the demolding step of the same imprint method.

圖10為說明同壓印方法之在事先硬化步驟使其硬化處之圖。 Fig. 10 is a diagram for explaining the hardening part of the same imprinting method in the prior hardening step.

圖11為說明同壓印方法之在事先硬化步驟使其硬化處之圖。 Fig. 11 is a diagram for explaining the hardening part of the same imprint method in the prior hardening step.

圖12為顯示與本發明之實施形態2中的樹脂塗佈步驟相關的其他例子。 12 is a diagram showing another example related to the resin coating step in Embodiment 2 of the present invention.

圖13顯示一般的UV壓印技術之概要。 Figure 13 shows an overview of general UV imprinting technology.

圖14為專利文獻1中所記載之滾輪壓印工法的示意圖。 14 is a schematic diagram of the roller imprinting method described in Patent Document 1.

圖15為專利文獻2中所記載之滾輪壓印工法的示意圖。 15 is a schematic diagram of the roller imprinting method described in Patent Document 2.

圖16為用於說明以往的壓印方式之課題的示意圖。 16 is a schematic diagram for explaining the problem of the conventional imprint method.

用以實施發明之形態 Forms for carrying out the invention

(實施形態1) (Embodiment 1)

以下針對本發明之實施形態1中的壓印方法及壓印裝置,一面參照圖式一面作說明。如圖1A~圖1E所示,本發明之壓印裝置具備黏著片28、載物台23、模具24、平整工具25、UV照射器26、事先UV照射器29、與圖未示之樹脂塗佈裝置。各構成之具體動作和以下之壓印方法的說明一起進行。 The imprinting method and imprinting apparatus in Embodiment 1 of the present invention will be described below with reference to the drawings. As shown in FIGS. 1A to 1E, the imprint apparatus of the present invention includes an adhesive sheet 28, a stage 23, a mold 24, a leveling tool 25, a UV irradiator 26, a prior UV irradiator 29, and a resin coating not shown布装置。 Cloth device. The specific operation of each configuration is performed together with the following description of the imprint method.

圖1A~圖1D為顯示本發明之實施形態1中的壓印方法的步驟流程之示意圖。首先,在圖1A所示之樹脂塗佈步驟中,是在基板21上塗佈UV硬化樹脂22。基板21是預先將背面21b黏貼保持於黏著片28上。將黏著片28固定、黏貼於黏著片矯正夾具281上,以對黏著片28本身施加預定的張力。以樹脂塗佈裝置對在該種狀態下之基板21塗佈UV硬化樹脂22。此時,以覆蓋基板21之表面21a,且超出基板21之外周來與黏著片28接觸的方式進行塗佈。亦可因應材料的黏性而採用旋轉塗佈法或網版印刷法、靜電塗佈法等各種方式作為塗佈之方式。樹脂塗佈裝置的態樣也會依塗佈之方式而有多種。又,基板21可依作為對象的製品等而考慮各種材質,可列舉出例如矽、藍寶石、氮化鎵等。 1A to 1D are schematic diagrams showing the flow of steps of the imprint method in Embodiment 1 of the present invention. First, in the resin coating step shown in FIG. 1A, the UV curable resin 22 is coated on the substrate 21. In the substrate 21, the back surface 21b is pasted and held on the adhesive sheet 28 in advance. The adhesive sheet 28 is fixed and adhered to the adhesive sheet correction jig 281 to apply a predetermined tension to the adhesive sheet 28 itself. The substrate 21 in this state is coated with UV-curable resin 22 with a resin coating device. At this time, the coating is performed so as to cover the surface 21 a of the substrate 21 and contact the adhesive sheet 28 beyond the outer periphery of the substrate 21. Depending on the viscosity of the material, various methods such as spin coating, screen printing, and electrostatic coating can also be used as the coating method. The appearance of the resin coating device will vary depending on the coating method. In addition, various materials can be considered for the substrate 21 depending on the target product and the like, and examples thereof include silicon, sapphire, and gallium nitride.

其次,在圖1B所示之事先硬化步驟中,是使塗佈有UV硬化樹脂22之基板21的外周部分的UV硬化樹脂22硬化。被黏貼於黏著片28上之基板21是隔著黏著片28而設置於載物台23上。載物台23是以光可穿透之材料所形成, 可為例如石英玻璃製。載物台23的下方設置有可朝上方照射UV光之事先UV照射器29,以在基板21的設置後自下方照射UV光。此時,因為基板21是UV光不穿透的,故可在使該基板21成為遮蔽物,而基板表面21a上的UV硬化樹脂22不硬化的情況下,僅硬化超出前述基板21的外周且與黏著片28接觸之UV硬化樹脂22。 Next, in the pre-curing step shown in FIG. 1B, the UV-curable resin 22 of the outer peripheral portion of the substrate 21 coated with the UV-curable resin 22 is cured. The substrate 21 adhered to the adhesive sheet 28 is provided on the stage 23 via the adhesive sheet 28. The stage 23 is formed of a material that can penetrate light, It may be made of, for example, quartz glass. Below the stage 23, a prior UV irradiator 29 that can irradiate UV light upward is provided to irradiate UV light from below after the substrate 21 is installed. At this time, since the substrate 21 is not transparent to UV light, the substrate 21 can be shielded, and the UV-curable resin 22 on the substrate surface 21a is not cured, but only cured beyond the outer periphery of the substrate 21 and UV hardening resin 22 in contact with the adhesive sheet 28.

並且,在圖1C所示之加壓步驟中,是對配置在載物台23上的基板21,以平整工具25加壓在第1面24a形成微細圖案之模具24的第2面24b。成形方式可適用於各種方式,但此處是以平板方式為代表例來說明。具體而言,模具24是薄膜狀,且是在已加上預定之張力的狀態下被安裝於模具把持具27。此外,自上方以平整工具25加壓模具24的第2面24b,並將形成於模具24之第1面24a的微細圖案壓抵在基板21上的UV硬化樹脂22上,使UV硬化樹脂22充填於微細圖案。 In the pressing step shown in FIG. 1C, the second surface 24 b of the mold 24 that forms a fine pattern on the first surface 24 a is pressed against the substrate 21 disposed on the stage 23 by the leveling tool 25. The forming method can be applied to various methods, but here the flat plate method is used as a representative example for description. Specifically, the mold 24 is in the form of a film, and is attached to the mold gripper 27 with a predetermined tension applied. In addition, the second surface 24b of the mold 24 is pressed with a leveling tool 25 from above, and the fine pattern formed on the first surface 24a of the mold 24 is pressed against the UV-curable resin 22 on the substrate 21 to make the UV-curable resin 22 Fill in fine patterns.

之後,在圖1D所示之硬化步驟中,是使塗佈於基板21上之UV硬化樹脂22硬化。平整工具25具有透光性,且可為例如石英玻璃製。又,因為模具24具有透光性,且能讓以配置於上方之UV照射器26所照射之UV光幾乎全量往下方穿透,故可使UV硬化樹脂22硬化。 After that, in the curing step shown in FIG. 1D, the UV-curable resin 22 coated on the substrate 21 is cured. The leveling tool 25 has light permeability, and may be made of, for example, quartz glass. In addition, since the mold 24 is light transmissive and allows the UV light irradiated by the UV irradiator 26 disposed above to penetrate almost completely downward, the UV hardening resin 22 can be hardened.

最後,在圖1E所示之脫模步驟中,是使硬化之UV硬化樹脂22與模具24脫模。此時,會使平整工具25解除加壓而先往上方退避。在將薄膜狀之模具24脫模之時,是做成藉由使模具把持具27上升,而自基板21的端部剝離的 方式來使其脫模。藉此,可提升壓印之脫模性,並可以提升微細圖案之轉印品質。以下,參照圖2及圖3來詳細說明。 Finally, in the demolding step shown in FIG. 1E, the cured UV-curable resin 22 and the mold 24 are demolded. At this time, the leveling tool 25 is released from the pressurization and retracted first. When the film-like mold 24 is demolded, it is peeled off from the end of the substrate 21 by raising the mold gripper 27 Way to demold it. In this way, the mold releasability can be improved, and the transfer quality of fine patterns can be improved. Hereinafter, the details will be described with reference to FIGS. 2 and 3.

圖2為顯示本實施形態之加壓步驟中的基板端部之狀態的放大截面圖,圖3為顯示本實施形態之脫模步驟中的基板端部之狀態的放大截面圖。對於與圖1相同之部分或相當的部分,會附上相同的符號。在圖2所示之加壓步驟中,是使模具24與UV硬化樹脂22接觸。在基板21的表面21a上,因為UV硬化樹脂22是硬化前的黏性體,故被充填於模具24的圖案內。另一方面,在從基板21超出於外周來與黏著片28接觸的區域中,因為在圖1B之事先硬化步驟中已將UV硬化樹脂22硬化,故並無黏著性及黏性,而成為具有特定之硬度之彈性體。因此,UV硬化樹脂22與模具24之接著處P2的接著力會明顯變小。另一方面,在該區域中的UV硬化樹脂22與黏著片28的接著處P3的接著力會因為以下原因而明顯變高:以事先硬化步驟使UV硬化樹脂22硬化,且黏著片28之黏著性發揮作用,而在UV硬化樹脂22與黏著片28之間形成固接界面。 2 is an enlarged cross-sectional view showing the state of the substrate end portion in the pressurization step of the present embodiment, and FIG. 3 is an enlarged cross-sectional view showing the state of the substrate end portion in the demolding step of the present embodiment. The same symbols as those in Fig. 1 or equivalent parts will be attached. In the pressurizing step shown in FIG. 2, the mold 24 is brought into contact with the UV hardening resin 22. On the surface 21a of the substrate 21, since the UV-curable resin 22 is a viscous body before curing, it is filled in the pattern of the mold 24. On the other hand, in the area beyond the outer periphery of the substrate 21 and in contact with the adhesive sheet 28, since the UV-curable resin 22 has been cured in the pre-curing step of FIG. 1B, there is no adhesiveness and stickiness, and it has Elastomer with specific hardness. Therefore, the adhesive force of the junction P2 between the UV-curable resin 22 and the mold 24 becomes significantly smaller. On the other hand, the adhesion force between the UV curing resin 22 and the adhesive sheet 28 at the junction P3 in this region will be significantly increased due to the following reasons: the UV curing resin 22 is cured in a pre-curing step, and the adhesion of the adhesive sheet 28 Performance, and a fixed interface is formed between the UV hardening resin 22 and the adhesive sheet 28.

於此狀態下移動到圖3所示之脫模步驟時,會使UV硬化樹脂22之與黏著片28之接著處P3的接著力變得大幅超過UV硬化樹脂22之與模具24的接著處P2的接著力。因此,必定從模具24側剝離。並且,為了將基板21上之模具的部分從UV硬化樹脂22剝離,在基板21與UV硬化樹脂22之接著處P4中需要特定的脫模阻抗。此處,模具24因為已從端部開始進行剝離,故接著處P4之脫模阻抗會相較於接 著處P3的接著力充分地變小。又,剝離時之力點因為存在於接著處P4,且距接著處P3的部分較遠,所以難以在基板21與UV硬化樹脂22之間產生膜剝落。因此,可提升壓印之脫模性,且可以使微細圖案之轉印品質穩定。 When moving to the demolding step shown in FIG. 3 in this state, the adhesive force of the bonding point P3 of the UV hardening resin 22 and the adhesive sheet 28 becomes significantly greater than the bonding point P2 of the UV hardening resin 22 and the mold 24 Adhesion. Therefore, it must be peeled off from the mold 24 side. In addition, in order to peel off the part of the mold on the substrate 21 from the UV hardening resin 22, a specific mold release impedance is required at the junction P4 between the substrate 21 and the UV hardening resin 22. Here, since the mold 24 has been peeled off from the end, the demolding resistance at the next P4 will be The adhesion force at the point P3 becomes sufficiently small. In addition, since the force point at the time of peeling is present at the junction P4 and is far away from the portion at the junction P3, it is difficult to cause film peeling between the substrate 21 and the UV-curable resin 22. Therefore, the mold releasability can be improved, and the transfer quality of fine patterns can be stabilized.

再者,在實施形態1中,雖然列舉了使用平整工具之方式來作為加壓方式之代表例,但加壓方式並不受限於此,例如圖4所示,以空氣等之流體壓30將基板21的表面全面加壓之方式,也能期待同樣的效果。再者,在圖4中,對與圖1相同之部分或相當的部分,會附上相同的符號。又,也可採用將如後述之加壓滾筒作為加壓方式的態樣。 Furthermore, in the first embodiment, the method of using a flattening tool is cited as a representative example of the pressure method, but the pressure method is not limited to this. For example, as shown in FIG. 4, a fluid pressure of 30 such as air is used. The same effect can be expected by pressing the entire surface of the substrate 21. In addition, in FIG. 4, the same symbols as those in FIG. 1 or equivalent parts are attached. In addition, a pressure roller as described below may be used as the pressure method.

此外,雖然在脫模步驟中所採用的是藉由使模具把持具27上升而從模具24之端部剝離的方式,但藉由如圖5所示,採用超音波振動等,在微觀上像是將模具把持具27朝上下方向搖動的方式,而使基板21上的模具24與UV硬化樹脂22之間的脫模阻抗降低,可以實現更穩定的脫模。此外,藉由同時使黏著片矯正夾具281往下方移動,可以將模具24與UV硬化樹脂22之打開角度更為加大,而可以提升脫模性。 In addition, although the method used in the demolding step is to peel off the end of the mold 24 by raising the mold gripper 27, as shown in FIG. 5, by using ultrasonic vibration, etc., the microscopic image It is a method of swinging the mold holding tool 27 in the up and down direction, so that the mold release resistance between the mold 24 on the substrate 21 and the UV hardening resin 22 is reduced, and a more stable mold release can be achieved. In addition, by simultaneously moving the adhesive sheet correction jig 281 downward, the opening angle of the mold 24 and the UV hardening resin 22 can be further increased, and the mold releasability can be improved.

再者,固定黏著片28之黏著片矯止夾具281之形狀可依作為對象之基板21的形態等,而採用各種態樣。圖6~8為本實施形態中的黏著片28及黏著片矯正夾具281的各種形狀製作例。基板21為四角形時,是將黏著片矯正夾具281例如,如圖6所示地配置於基板21之左右兩側,或如圖7所示地配置成包圍基板21的周圍。藉此,可使黏著片28之 張力穩定。又,基板21為圓形時,如圖8所示,是將黏著片矯正夾具281做成圓環狀。藉此,可將黏著片28之張力形成為各向同性。 In addition, the shape of the adhesive sheet correction jig 281 to which the adhesive sheet 28 is fixed can take various forms depending on the shape of the target substrate 21 and the like. 6 to 8 are examples of manufacturing various shapes of the adhesive sheet 28 and the adhesive sheet correction jig 281 in this embodiment. When the substrate 21 has a quadrangular shape, the adhesive sheet correction jig 281 is, for example, arranged on the left and right sides of the substrate 21 as shown in FIG. 6 or is arranged to surround the periphery of the substrate 21 as shown in FIG. 7. By this, the adhesive sheet 28 can be made Tension is stable. When the substrate 21 is circular, as shown in FIG. 8, the adhesive sheet correction jig 281 is formed into a circular ring shape. Thereby, the tension of the adhesive sheet 28 can be made isotropic.

(實施形態2) (Embodiment 2)

其次,針對本發明之實施形態2之壓印方法,一面參照圖式一面說明。再者,在實施形態1中所敘述的是圖1B所示之在事先硬化步驟中使超出基板21之外周的UV硬化樹脂22硬化的態樣。另一方面,實施形態2,在超出基板21之外周的UV硬化樹脂22之中使一部分不硬化之點上,與實施形態1不同。 Next, the imprint method of Embodiment 2 of the present invention will be described with reference to the drawings. In addition, what was described in Embodiment 1 is the state shown in FIG. 1B in which the UV curing resin 22 beyond the outer periphery of the substrate 21 is cured in the preliminary curing step. On the other hand, the second embodiment is different from the first embodiment in that a part of the UV curable resin 22 beyond the outer periphery of the substrate 21 is not cured.

圖9A~D為顯示本發明之實施形態2中的壓印方法的步驟流程之示意圖。為求簡便,與圖1A~E相同之部分或相當的部分,會附上相同的符號。圖9A所示之樹脂塗佈步驟,因與實施形態1中的圖1A所說明的情形同樣,故省略說明。 9A to D are schematic diagrams showing the flow of steps of the imprint method in Embodiment 2 of the present invention. For simplicity, the same symbols as those in Figure 1A~E or equivalent parts will be attached. The resin coating step shown in FIG. 9A is the same as the case described in FIG. 1A in Embodiment 1, and therefore description will be omitted.

在圖9B所示之事先硬化步驟中,在超出基板21之外周來與黏著片28接觸之UV硬化樹脂22之中,雖然使比基板21更位於圖中左側之UV硬化樹脂22硬化,但並未使位於基板21的右邊之UV硬化樹脂22硬化。細節容後述。 In the pre-curing step shown in FIG. 9B, among the UV-curable resin 22 that has been in contact with the adhesive sheet 28 beyond the periphery of the substrate 21, although the UV-curable resin 22 located on the left side in the figure than the substrate 21 is cured, it does not The UV hardening resin 22 located on the right side of the substrate 21 is not hardened. Details will be described later.

在圖9C所示之加壓、硬化步驟中,作為加壓方式,是藉由使用加壓滾輪251,一面加壓以將薄膜狀之模具24壓抵於UV硬化樹脂22上,一面往與加壓滾輪251之軸向Z及加壓方向Y垂直的進給方向X(圖中從左到右的方向)進給,以依序加壓下去。同時從上方藉由使UV照射器26也與加壓 滾輪251同步移動,以使UV硬化樹脂22依序硬化下去。又,為了防止加壓滾輪251通過後之模具24的部分在使UV硬化樹脂22硬化前就脫離之情形,設置有保持滾輪252。保持滾輪252是設置於在進給方向X上比UV照射器26還上游側。 In the pressing and curing step shown in FIG. 9C, as a pressing method, a pressing roller 251 is used to press the film-like mold 24 against the UV-curable resin 22 while applying pressure The axial direction Z of the pressing roller 251 and the feeding direction X (the direction from left to right in the figure) perpendicular to the pressing direction Y are fed to pressurize sequentially. At the same time, the UV irradiator 26 is also pressurized from above The roller 251 moves synchronously, so that the UV hardening resin 22 is hardened in sequence. In addition, in order to prevent the portion of the mold 24 after the pressure roller 251 passes through before the UV hardening resin 22 is hardened, a holding roller 252 is provided. The holding roller 252 is provided upstream of the UV irradiator 26 in the feed direction X.

並且,在圖9D所示之脫模步驟中,是藉由一面將保持滾輪252朝進給方向X進給,一面使上游側之模具把持具27上升,而僅從進給方向X中的上游側進行剝離。此處,在進給方向X上比基板21還上游側之UV硬化樹脂22因為已在圖9B所示之步驟中事先被硬化,故與模具24的接著力會變小,而與黏著片28之接著力會變大。藉此,因為可防止在基板21與UV硬化樹脂22之間產生膜剝落之情形,故可以提升壓印的脫模性,並可以使微細圖案之轉印品質穩定。 In the demolding step shown in FIG. 9D, the holding roller 252 is fed in the feed direction X while raising the mold gripper 27 on the upstream side only from the upstream in the feed direction X Side. Here, the UV curable resin 22 upstream of the substrate 21 in the feed direction X has been previously cured in the step shown in FIG. 9B, so the adhesion force with the mold 24 becomes smaller, and the adhesive sheet 28 The adhesion will become greater. Thereby, since the film peeling between the substrate 21 and the UV-curable resin 22 can be prevented, the mold releasability can be improved, and the transfer quality of the fine pattern can be stabilized.

又,因為不使在進給方向X上位於基板21下游之UV硬化樹脂22事先硬化,故可促進UV硬化樹脂22的流出,而使微細圖案之轉印品質穩定。以下說明細節。 In addition, since the UV-curable resin 22 located downstream of the substrate 21 in the feed direction X is not cured in advance, the outflow of the UV-curable resin 22 can be promoted, and the transfer quality of the fine pattern can be stabilized. The details are explained below.

在實施形態2中,因為加壓滾輪251一面加壓UV硬化樹脂22一面朝進給方向X進給,故形成為也將基板21上之UV硬化樹脂22也朝進給方向X擠壓。假設,在圖9B中,使超出基板21之外周之UV硬化樹脂22的整個範圍都硬化時,則朝進給方向X被擠壓的UV硬化樹脂22會因為已在基板21的下游硬化之UV硬化樹脂22而被堵住。因此,UV硬化樹脂22變得難以朝下游流出,使UV硬化樹脂22之膜厚在下游側變得比上游側厚,恐有降低微細圖案之轉印品質的疑慮。 In the second embodiment, since the pressure roller 251 feeds the UV curable resin 22 while pressing the UV curing resin 22, the UV curable resin 22 on the substrate 21 is also pressed toward the feed direction X. It is assumed that, in FIG. 9B, when the entire range of the UV-curable resin 22 beyond the outer periphery of the substrate 21 is cured, the UV-curable resin 22 that is squeezed in the feed direction X will be because the UV that has been cured downstream of the substrate 21 The resin 22 is hardened and blocked. Therefore, it becomes difficult for the UV curable resin 22 to flow downstream, and the film thickness of the UV curable resin 22 becomes thicker on the downstream side than on the upstream side, and there is a possibility that the transfer quality of the fine pattern may be reduced.

另一方面,在本實施形態中,因為未事先使位於基板21之下游的UV硬化樹脂22硬化,故朝進給方向X被擠壓的UV硬化樹脂22會流出到比基板21還下游的黏著片28上。因此,可以均勻化UV硬化樹脂22的膜厚,並可提升微細圖案之轉印品質。 On the other hand, in this embodiment, since the UV-curable resin 22 located downstream of the substrate 21 is not cured in advance, the UV-curable resin 22 that is squeezed in the feed direction X flows out to the adhesive downstream of the substrate 21 On sheet 28. Therefore, the film thickness of the UV hardening resin 22 can be uniformized, and the transfer quality of the fine pattern can be improved.

圖10及11是說明在基板21為矩形時或圓形時,於事先硬化步驟中使其硬化之處的平面圖。在圖中,符號22a為於事先硬化步驟中被硬化之部分,且是表示在進給方向X上比基板21還上游側之UV硬化樹脂的部分。符號22b為於事先硬化步驟中未被硬化之部分,且是表示在進給方向X上位於基板21之下游之UV硬化樹脂的部分。符號22c表示其以外之UV硬化樹脂的部分,且為在事先硬化步驟中可被硬化,亦可不被硬化的部分。 10 and 11 are plan views illustrating where the substrate 21 is hardened in the prior hardening step when the substrate 21 is rectangular or circular. In the figure, the symbol 22a is a portion that is cured in the pre-curing step, and represents a portion of the UV-curable resin that is upstream of the substrate 21 in the feeding direction X. Symbol 22b is a portion that has not been cured in the prior curing step, and indicates a portion of the UV-curable resin located downstream of the substrate 21 in the feeding direction X. Symbol 22c indicates a portion of the UV-curable resin other than that, and is a portion that may or may not be cured in the prior curing step.

基板21為矩形時,如圖10所示,是使在進給方向X上比基板21的最上游之一邊21c更上游側之UV硬化樹脂的部分22a硬化。又,為了促進UV硬化樹脂22的流出,做成不使在進給方向X上位於基板21之下游的UV硬化樹脂的部分22b硬化。基板21為圓形時,如圖11所示,必須使進給方向X比基板21的最上游之一端21d更上游側的UV硬化樹脂的部分22a硬化。此區域會成為以圓弧與弦所構成的形狀。又,為了促進UV硬化樹脂22的流出,做成不使在進給方向X上位於基板21的下游之UV硬化樹脂的部分22b硬化。 When the substrate 21 is rectangular, as shown in FIG. 10, the UV curing resin portion 22 a on the upstream side of the most upstream side 21 c of the substrate 21 in the feed direction X is cured. In order to promote the outflow of the UV-curable resin 22, the portion 22b of the UV-curable resin located downstream of the substrate 21 in the feed direction X is not cured. When the substrate 21 is circular, as shown in FIG. 11, it is necessary to harden the portion 22 a of the UV-curable resin on the upstream side of the feeding direction X than the one of the most upstream end 21 d of the substrate 21. This area becomes a shape formed by arcs and strings. In order to promote the outflow of the UV curable resin 22, the portion 22b of the UV curable resin located downstream of the substrate 21 in the feed direction X is not cured.

又,在實施形態2中,是做成在圖9B所示之事先硬化步驟中,使在進給方向X上比基板21還上游側之UV硬 化樹脂22硬化,而不使位於基板21的下游之UV硬化樹脂硬化。可替代地,也可做成在樹脂塗佈步驟中,將UV硬化樹脂22塗佈於在進給方向X上比基板21還上游側之黏著片28,對於基板21的下游之黏著片28則不塗佈。藉此,可獲得與上述同樣的效果。 In the second embodiment, in the pre-curing step shown in FIG. 9B, the UV on the upstream side of the substrate 21 in the feed direction X is made hard The hardening resin 22 hardens without hardening the UV hardening resin located downstream of the substrate 21. Alternatively, in the resin coating step, the UV-curable resin 22 may be applied to the adhesive sheet 28 on the upstream side of the substrate 21 in the feed direction X, and the adhesive sheet 28 on the downstream side of the substrate 21 Not coated. With this, the same effect as described above can be obtained.

亦即,藉由對比基板21還上游側之UV硬化樹脂22照射UV光而進行硬化,UV硬化樹脂22之與模具24的接著力即變小,與黏著片28之接著力即變大。藉此,因為可以防止在基板21與UV硬化樹脂22之間產生膜剝落之情形,故可提升壓印的脫模性,且可以使微細圖案之轉印品質穩定。又,因為在進給方向X上於基板21之下游並未塗佈UV硬化樹脂22,故可以促進UV硬化樹脂22的流出,並使微細圖案之轉印品質穩定。 That is, when the UV curing resin 22 on the upstream side of the comparison substrate 21 is irradiated with UV light for curing, the adhesion between the UV curing resin 22 and the mold 24 becomes smaller, and the adhesion with the adhesive sheet 28 becomes larger. This can prevent the film from peeling between the substrate 21 and the UV curable resin 22, so that the mold releasability can be improved, and the transfer quality of the fine pattern can be stabilized. In addition, since the UV curable resin 22 is not applied downstream of the substrate 21 in the feed direction X, the outflow of the UV curable resin 22 can be promoted, and the transfer quality of the fine pattern can be stabilized.

此處,一面參照圖10及11一面說明在樹脂塗佈步驟中塗佈UV硬化樹脂之處。在圖中,符號22a表示在樹脂塗佈步驟中塗佈UV硬化樹脂22的部分。符號22b表示在樹脂塗佈步驟中未塗佈UV硬化樹脂22的部分。符號22c表示在樹脂塗佈步驟中可被塗佈,亦可不被塗佈的部分。又,亦可做成下列態樣:預測可將基板21上之UV硬化樹脂22朝進給方向X擠壓到一定程度之情形,而如圖12所示,於基板22的表面之中,在不覆蓋整個面的情形下,使於進給方向X中的下游側的一部分露出。 Here, with reference to FIGS. 10 and 11, a description will be given of where UV curable resin is applied in the resin application step. In the figure, the symbol 22a indicates a portion where the UV-curable resin 22 is applied in the resin application step. Symbol 22b indicates a portion where the UV-curable resin 22 is not applied in the resin application step. Symbol 22c indicates a portion that may or may not be coated in the resin coating step. In addition, it can also be made as follows: It is predicted that the UV hardening resin 22 on the substrate 21 can be squeezed to a certain extent in the feed direction X, and as shown in FIG. 12, in the surface of the substrate 22, Without covering the entire surface, a part of the downstream side in the feed direction X is exposed.

再者,在實施形態2中所敘述的是下列態樣:使用加壓滾輪251作為加壓構件,不使超出基板21的外周之 UV硬化樹脂22的整個面都硬化,而使剝離之側的UV硬化樹脂22硬化。可替代地,即使是做成使用如實施形態1所說明之平整工具或流體壓作為加壓構件,不使超出基板21的外周之UV硬化樹脂22的整個面都硬化,而使剝離之側的UV硬化樹脂22硬化的態樣,也能獲得同樣的效果。 In addition, the second embodiment is described as follows: the pressure roller 251 is used as a pressure member so as not to exceed the outer periphery of the substrate 21 The entire surface of the UV hardening resin 22 is hardened, and the UV hardening resin 22 on the peeling side is hardened. Alternatively, even if a flattening tool or fluid pressure as described in Embodiment 1 is used as the pressurizing member, the entire surface of the UV-curable resin 22 beyond the outer periphery of the substrate 21 is not hardened, and the side of the peeling is not The same effect can be obtained even if the UV hardening resin 22 is hardened.

再者,在實施形態1及2中,雖然都敘述了UV照射器隔著具UV穿透性之模具24來對UV硬化樹脂22照射UV光以使其硬化之情形,但並不受限於此,也可做成下列態樣:使模具24對UV以外之光具有穿透性,並使用可在UV以外之光下硬化的樹脂,且使用照射UV以外之光的光照射器。 Furthermore, in the first and second embodiments, although the case where the UV irradiator irradiates the UV hardening resin 22 with UV light through the mold 24 having UV transparency to harden it, it is not limited to In this case, the mold 24 can be made transparent to light other than UV, a resin that can be cured under light other than UV, and a light irradiator that emits light other than UV can be used.

產業上之可利用性 Industrial availability

本發明對於可以藉由提升脫模性而使微細圖案之轉印品質提升之壓印方法及壓印裝置是有用的。 The present invention is useful for an imprinting method and an imprinting device that can improve the transfer quality of fine patterns by improving mold releasability.

21:基板 21: substrate

21a:表面 21a: surface

22:UV硬化樹脂 22: UV hardening resin

24:模具 24: mold

25:平整工具 25: Leveling tool

P2:UV硬化樹脂與模具之接著處 P2: Adjacent part of UV hardening resin and mold

P3:UV硬化樹脂與黏著片之接著處 P3: Adjacent part of UV hardening resin and adhesive sheet

28:黏著片 28: Adhesive sheet

Claims (10)

一種壓印方法,其特徵在於具有以下步驟:樹脂塗佈步驟,在已將基板的背面貼附於黏著片的狀態下,以覆蓋前述基板的表面且超出前述基板之外周而與前述黏著片接觸的方式,塗佈光硬化樹脂;事先硬化步驟,藉由從前述基板的背面側照射光線,使與前述黏著片接觸之光硬化樹脂硬化;加壓步驟,將形成於模具上之微細圖案壓抵於前述基板的表面上之光硬化性樹脂上;硬化步驟,藉由從前述基板的表面側照射光線,使前述基板的表面上之光硬化樹脂硬化;以及脫模步驟,藉由從前述黏著片上硬化之處進行剝離,而將前述模具自前述光硬化樹脂脫模。 An imprinting method characterized by the following steps: a resin coating step, in a state where the back surface of the substrate has been attached to the adhesive sheet, to cover the surface of the substrate and extend beyond the outer periphery of the substrate to come into contact with the adhesive sheet Way, applying photo-curing resin; pre-hardening step, by irradiating light from the back side of the substrate, hardening the photo-curing resin in contact with the adhesive sheet; pressing step, pressing the fine pattern formed on the mold On the photo-curable resin on the surface of the substrate; the hardening step, by irradiating light from the surface side of the substrate, hardening the photo-curable resin on the surface of the substrate; and the demolding step, from the adhesive sheet The hardened portion is peeled off, and the mold is released from the photocurable resin. 如請求項1之壓印方法,其中,前述加壓步驟是藉由具有透光性之平板工具加壓前述模具之方式來進行,前述硬化步驟是藉由隔著前述平板工具而照射光線之方式來進行。 The embossing method according to claim 1, wherein the pressing step is performed by pressing the mold with a transparent plate tool, and the hardening step is by irradiating light through the plate tool Come on. 如請求項1之壓印方法,其中,前述加壓步驟是藉由使流體加壓前述模具之方式來進行。 The imprint method of claim 1, wherein the pressurizing step is performed by pressurizing the mold with a fluid. 如請求項1之壓印方法,其中,前述加壓步驟是藉由使加壓滾輪一面加壓前述模具,一面朝垂直於前述加壓滾輪之軸向與加壓方向的進給方向進給的方式來進行,前述硬化步驟是藉由與前述加壓滾輪之移動同步 而移動的光照射器使前述基板的表面上之光硬化樹脂依序硬化的方式來進行。 The imprint method according to claim 1, wherein the pressurizing step is to feed the mold toward the feeding direction perpendicular to the axial direction of the pressurizing roller and the pressurizing direction while pressing the mold with the pressurizing roller The hardening step is performed in synchronization with the movement of the pressure roller The moving light irradiator sequentially hardens the photo-curable resin on the surface of the substrate. 如請求項4之壓印方法,其中,前述事先硬化步驟中,是在前述進給方向上,對位於前述基板的下游之光硬化樹脂不照射光線,而對位在比前述基板之最上游的部分更上游側之光硬化樹脂照射光線,前述脫模步驟是藉由從前述進給方向中的上游側剝離之方式來進行。 The imprint method according to claim 4, wherein, in the pre-curing step, the photo-curable resin located downstream of the substrate is not irradiated with light in the feed direction, but is positioned at the most upstream of the substrate. Part of the light hardening resin on the upstream side is irradiated with light, and the aforementioned demolding step is performed by peeling from the upstream side in the aforementioned feed direction. 如請求項4之壓印方法,其中,在前述樹脂塗佈步驟中,對在前述進給方向上位於前述基板之下游的前述黏著片不塗佈光硬化樹脂,而對位在比前述基板之最上游的部分更上游側之前述黏著片則塗佈光硬化樹脂,前述脫模步驟是藉由從前述進給方向中的上游側剝離之方式來進行。 The imprint method according to claim 4, wherein, in the resin coating step, the adhesive sheet located downstream of the substrate in the feed direction is not coated with a photocurable resin, but is positioned at a position higher than that of the substrate The most upstream part of the adhesive sheet on the more upstream side is coated with a photo-curable resin, and the mold release step is performed by peeling from the upstream side in the feed direction. 一種壓印裝置,其特徵在於具備:黏著片,可貼在基板的背面而保持,且具有透光性及可撓性;樹脂塗佈裝置,可將光硬化樹脂塗佈成覆蓋前述基板的表面且從前述基板的外周超出而與前述黏著片接觸;載物台,可隔著前述黏著片而設置前述基板,且具有透光性;第1光照射器,可隔著前述載物台及前述黏著片而對從前述基板的外周超出的光硬化樹脂之至少一部分 照射光線;模具,在與前述基板的表面相向之第1面上形成微細圖案,且具有透光性及可撓性;加壓構件,可加壓前述模具之與前述第1面相反的第2面;以及第2光照射器,可隔著前述模具對前述基板的表面照射光線。 An imprinting device is characterized by comprising: an adhesive sheet that can be attached to and held on the back surface of a substrate, and has translucency and flexibility; and a resin coating device that can coat a surface of the substrate with a photo-curable resin And extends beyond the outer periphery of the substrate to contact the adhesive sheet; the stage can be provided with the substrate through the adhesive sheet, and has translucency; the first light irradiator can be placed between the stage and the aforementioned At least a part of the photo-curable resin exceeding the outer periphery of the substrate is adhered to the sheet Irradiation of light; mold, forming a fine pattern on the first surface facing the surface of the substrate, and having translucency and flexibility; pressing member, which can press the second surface of the mold opposite to the first surface And the second light irradiator, which can irradiate light onto the surface of the substrate through the mold. 如請求項7之壓印裝置,其中,前述加壓構件為具有透光性之平板狀,而前述第2光照射器是隔著前述加壓構件對前述基板的表面照射光線。 The imprint apparatus according to claim 7, wherein the pressing member has a flat plate shape having translucency, and the second light irradiator irradiates light onto the surface of the substrate via the pressing member. 如請求項7之壓印裝置,其中,前述加壓構件為流體。 The imprint apparatus according to claim 7, wherein the aforementioned pressurizing member is a fluid. 如請求項7之壓印裝置,其中,前述加壓構件是具有中心軸之滾輪形狀,且藉由一面加壓前述模具之第2面,一面朝垂直於前述中心軸方向及加壓方向之進給方向進給,以將前述模具依序加壓於前述光硬化樹脂,前述第2光照射器是與前述加壓構件之移動同步而移動,而依序使基板的表面上之光硬化樹脂依序硬化。 The embossing device according to claim 7, wherein the pressing member has a roller shape having a central axis, and by pressing the second surface of the mold on one side, the second side faces the direction perpendicular to the central axis direction and the pressing direction Feed in the feeding direction to sequentially press the mold against the photo-curable resin, and the second light irradiator moves in synchronization with the movement of the pressing member, and sequentially causes the photo-curable resin on the surface of the substrate Harden in sequence.
TW104143137A 2015-05-14 2015-12-22 Imprinting method and imprinting device TWI687301B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
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