TWI687301B - Imprinting method and imprinting device - Google Patents
Imprinting method and imprinting device Download PDFInfo
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- TWI687301B TWI687301B TW104143137A TW104143137A TWI687301B TW I687301 B TWI687301 B TW I687301B TW 104143137 A TW104143137 A TW 104143137A TW 104143137 A TW104143137 A TW 104143137A TW I687301 B TWI687301 B TW I687301B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/021—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of profiled articles, e.g. hollow or tubular articles, beams
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
- B29C37/0003—Discharging moulded articles from the mould
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
Abstract
本發明提供一種壓印方法及壓印裝置。【課題】其目的在於提升壓印之脫模性,並使微細圖案之轉印品質穩定。【解決手段】其特徵在於具有以下步驟:樹脂塗佈步驟,在已將基板的背面貼附於黏著片的狀態下,以覆蓋基板的表面,且超出基板之外周來與黏著片接觸的方式塗佈光硬化樹脂;事先硬化步驟,藉由從基板的背面側照射光線,使與黏著片接觸之光硬化樹脂硬化;加壓步驟,將形成於模具上之微細圖案壓抵於基板的表面上之光硬化性樹脂上;硬化步驟,藉由從基板的表面側照射光線,使基板的表面上之光硬化樹脂硬化;以及脫模步驟,藉由從黏著片上硬化之處進行剝離,而將模具自光硬化樹脂脫模。 The invention provides an imprinting method and an imprinting device. [Subject] Its purpose is to improve the mold release property and stabilize the transfer quality of fine patterns. [Solution] It is characterized by the following steps: a resin coating step, in a state where the back surface of the substrate has been attached to the adhesive sheet, to cover the surface of the substrate, and to extend beyond the periphery of the substrate to come into contact with the adhesive sheet Light curing resin; pre-hardening step, by irradiating light from the back side of the substrate to harden the photo-hardening resin in contact with the adhesive sheet; pressing step, pressing the fine pattern formed on the mold against the surface of the substrate On the photo-curable resin; the hardening step, by irradiating light from the surface side of the substrate, hardens the photo-curable resin on the surface of the substrate; and the demolding step, by peeling from the hardened place on the adhesive sheet, the mold is removed from Light-hardening resin release.
Description
本發明是有關於一種壓印方法及壓印裝置。 The invention relates to an imprinting method and an imprinting device.
(壓印技術之背景,適用領域) (Background of imprint technology, applicable fields)
近年來,在顯示器、照明等商品上所使用的光學零件方面,備受期待的是,實現已發現下列以往所沒有之新機能的裝置:藉由形成發揮特殊光學特性之奈米(nm)級到微米(μm)級的微細圖案,來控制了光的反射、繞射。作為形成這種微細圖案之方法,除了光刻(photolithography)技術與電子束蝕刻技術之外,近年壓印技術也受到矚目。 In recent years, for optical components used in products such as displays and lighting, it is highly expected to realize devices that have discovered the following new functions that have not been previously available: by forming nanometer (nm) grades that exert special optical characteristics Fine patterns down to the micrometer (μm) level control the reflection and diffraction of light. As a method of forming such a fine pattern, in addition to photolithography technology and electron beam etching technology, imprint technology has also attracted attention in recent years.
所謂壓印技術,是指藉由將在表面預先加工微細圖案之模具按壓在已塗佈在基板表面之樹脂上,以形成模具之微細圖案微細的方法。 The so-called imprint technique refers to a method of forming a fine pattern of a mold by pressing a mold with a fine pattern pre-processed on the surface against a resin that has been coated on the surface of the substrate.
作為壓印方法,有熱壓印法與UV壓印法,該熱壓印法是藉由將被塗佈於基板表面之熱可塑性樹脂加熱到玻璃轉移溫度以上之壓抵模具之作法來轉印微細圖案,該UV壓印法是藉由在使用UV硬化樹脂且已壓抵模具的狀態下照射UV光的作法來轉印微細圖案。 As the imprinting method, there are a thermal imprinting method and a UV imprinting method. The thermal imprinting method is transferred by pressing a mold against the thermoplastic resin coated on the surface of the substrate to a temperature above the glass transition temperature. For the fine pattern, this UV imprinting method transfers the fine pattern by irradiating UV light in a state where the UV hardening resin is used and pressed against the mold.
熱壓印法雖具有材料的選擇性較廣之特徵,但在轉印微細圖案之時需要將模具升溫以及降溫,故會有產量(throughput)較低的問題。另一方面,UV壓印法雖然因為限定於以紫外線硬化的材料,因而與熱壓印法相比較選擇性較少,但因可在數秒~數十秒內完成硬化,故有產量非常高的優點。要採用熱壓印法及UV壓印法的哪一個,會依所要應用之裝置而異,但在不存在材料因素之問題的情況下,經考慮為以UV壓印法作為量產工法較適合。 Although the hot imprinting method has the characteristics of wide material selectivity, when transferring fine patterns, the mold needs to be heated and cooled, so there is a problem of low throughput. On the other hand, although the UV imprinting method is limited to materials hardened by ultraviolet rays, it has less selectivity than the thermal imprinting method, but it can be cured in a few seconds to several tens of seconds, so it has the advantage of very high yield. . Which of the hot imprinting method and the UV imprinting method will be used will vary according to the device to be applied, but when there is no problem of material factors, it is considered that the UV imprinting method is more suitable as a mass production method .
(壓印技術) (Imprint technology)
以下說明以UV壓印法形成微細圖案之一般的步驟流程。圖13為一般的平板式壓印步驟的概要示意圖。首先,在基板11的表面上,使用旋轉塗佈法等來全面塗佈UV硬化樹脂12。接著在平坦的載物台13上配置基板11,並從上方將已形成有微細構造之模具14加壓而使其接觸。作為加壓手段而以平整工具15按壓的方法是常見的。並且,從模具14及平整工具15的上方,以UV照射器16進行UV照射,以使UV硬化樹脂12硬化。最後將平整工具15及模具14移往上方,藉此將模具14從UV硬化樹脂12脫模。
The following describes the general procedure of forming a fine pattern by UV imprinting. FIG. 13 is a schematic diagram of a general flat plate imprinting step. First, on the surface of the
然而,此方法的情況,因脫模方向相對於轉印平面為垂直方向,故在模具14與已硬化的UV硬化樹脂12之間會產生很大的脫模阻抗。因此,欲將模具14從UV硬化樹脂12脫模時,UV硬化樹脂12與基板11之間會有產生膜剝落的情形,而有造成微細圖案之轉印品質不穩定的問題。
However, in the case of this method, since the release direction is perpendicular to the transfer plane, a large release resistance is generated between the
(針對以往課題之先前文獻) (Prior literature on previous topics)
如圖14所示,專利文獻1揭示的是,藉由將模具14做成薄膜狀,並在轉印後使配置於端部之模具把持具17上升,以使模具14剝離並脫模之壓印方法。由於並不是相對於轉印平面在垂直方向上進行脫模,而是以剝離來進行脫膜,故可以減少脫模阻抗而使微細圖案的轉印品質穩定。又,如圖15所示,專利文獻2揭示的壓印方法是同樣地將模具14做成薄膜狀,並使用加壓滾輪151作為加壓手段,於轉印後在以加壓滾輪151一面按壓模具14一面移往圖中之左方的同時使模具把持具17上升,藉此來剝離模具14而使其脫模。此時,也可減少脫模阻抗而使微細圖案之轉印品質穩定。
As shown in FIG. 14, Patent Document 1 discloses that the
專利文獻1:日本專利特許5499306號公報 Patent Document 1: Japanese Patent No. 5499306
專利文獻2:日本專利特開2014-54735號公報 Patent Document 2: Japanese Patent Laid-Open No. 2014-54735
雖然將任一種方法作為提升脫模性的方法都有一定程度的效果,但會因UV硬化樹脂12與基板11之接著性或與模具14的脫模性而變困難,並非所有的情況中都可良好地脫模。以下,具體例示因前述各種材料、接著性以及脫模性而產生之脫模不良的機制。
Although any method has a certain degree of effect as a method for improving the releasability, it will be difficult due to the adhesion of the UV-
圖16為將以往的壓印方法中的基板11端部之脫模步驟之情形放大的截面圖。實際上,作為基板11而使用
的材料多為矽或玻璃等無機材料,大多無法與UV硬化樹脂12之有機類樹脂有充分的接著性。因此,雖然在基板11上可進行藉由預先施行矽烷耦合(silane coupling)處理等以確保接著性之作法,但也有因耦合處理之溫度條件等而無法確保穩定的接著性的例子。因此,會有導致UV硬化樹脂12與基板11之接著處P1的接著力不穩定且變小的狀況。又,使用於模具14的材料多為壓克力或環氧樹脂等有機類樹脂,因為與UV硬化樹脂12為相同性質,故硬化時大多會形成較大的接著力。雖然可進行使模具14或UV硬化樹脂12中含有氟類的材料以降低接著力之作法,但這些也有因硬化條件等而不穩定的例子。因此,會有導致UV硬化樹脂12與模具14之接著處P2的接著力變大的狀況。從而,會有下列問題:在脫模時,UV硬化樹脂12之與模具14之接著處P2的接著力,超過與基板11之接著處P1的接著力,而如圖16所示,在基板11與UV硬化樹脂12之間產生膜剝落,並造成微細圖案之轉印品質不穩定。
16 is an enlarged cross-sectional view of the state of the step of demolding the end of the
本發明鑒於上述以往的問題點,其目的在於藉由提升壓印之脫模性,來使微細圖案之轉印品質穩定。 In view of the above-mentioned conventional problems, the present invention aims to stabilize the transfer quality of fine patterns by improving the mold releasability.
為了解決上述課題,本發明之壓印方法的特徵在於具有以下步驟:樹脂塗佈步驟,在已將基板的背面貼附於黏著片的狀態下,以覆蓋前述基板的表面,且超出前述基板之外周來與前述黏著片接觸的方式塗佈光硬化樹脂; 事先硬化步驟,藉由從前述基板的背面側照射光線,使與前述黏著片接觸之光硬化樹脂硬化;加壓步驟,將形成於模具上之微細圖案壓抵於前述基板的表面上之光硬化性樹脂上;硬化步驟,藉由從前述基板的表面側照射光線,使前述基板的表面上之光硬化樹脂硬化;以及脫模步驟,藉由從前述黏著片上硬化之處進行剝離,而將前述模具自前述光硬化樹脂脫模。 In order to solve the above problems, the imprint method of the present invention is characterized by the following steps: a resin coating step, in a state where the back surface of the substrate has been attached to the adhesive sheet, to cover the surface of the substrate and exceed the substrate Apply light-curing resin on the outer periphery in contact with the aforementioned adhesive sheet; The pre-hardening step, by irradiating light from the back side of the substrate, hardens the photo-curable resin in contact with the adhesive sheet; the pressing step, presses the fine pattern formed on the mold against the photo-curing on the surface of the substrate Hardening step, by irradiating light from the surface side of the substrate to harden the photocurable resin on the surface of the substrate; and a demolding step, by peeling from the hardened place on the adhesive sheet, the The mold is released from the aforementioned photo-curable resin.
根據本發明之壓印方法,可以提升壓印之脫模性,並可以使微細圖案之轉印品質穩定。 According to the imprint method of the present invention, the releasability of imprint can be improved, and the transfer quality of fine patterns can be stabilized.
11、21:基板 11, 21: substrate
21a:表面 21a: surface
21b:背面 21b: back
21c:基板最上游之一邊 21c: the most upstream side of the substrate
21d:基板最上游之一端 21d: the most upstream end of the substrate
12、22:UV硬化樹脂 12, 22: UV hardening resin
22a:事先硬化步驟中被硬化之部分(樹脂塗佈步驟中塗佈 UV硬化樹脂的部分) 22a: The part that was hardened in the prior hardening step (Coated in the resin coating step (UV hardening resin part)
22b:事先硬化步驟中未被硬化之部分(樹脂塗佈步驟中未塗佈UV硬化樹脂的部分) 22b: The uncured part in the pre-curing step (the part where the UV curable resin is not applied in the resin coating step)
22c:事先硬化步驟中可被硬化,亦可不被硬化的部分(樹脂塗佈步驟中可被塗佈,亦可不被塗佈的部分) 22c: The part that can be hardened or not hardened in the prior hardening step (the part that can be coated or not coated in the resin coating step)
13、23:載物台 13, 23: stage
14、24:模具 14, 24: mold
24a:第1面 24a: Face 1
24b:第2面 24b: Face 2
15、25:平整工具 15, 25: leveling tool
151、251:加壓滾輪 151, 251: Pressure roller
252:保持滾輪 252: Keep the wheel
16、26:UV照射器 16, 26: UV irradiator
17、27:模具把持具 17, 27: mold holding tool
28:黏著片 28: Adhesive sheet
281:黏著片矯正夾具 281: Adhesive sheet correction jig
29:事先UV照射器 29: Prior UV irradiator
30:流體壓 30: fluid pressure
P1、P4:UV硬化樹脂與基板之接著處 P1, P4: the junction between the UV hardening resin and the substrate
P2:UV硬化樹脂與模具之接著處 P2: Adjacent part of UV hardening resin and mold
P3:UV硬化樹脂與黏著片之接著處 P3: Adjacent part of UV hardening resin and adhesive sheet
X:進給方向 X: Feed direction
圖1A顯示本發明之實施形態1中的壓印方法的樹脂塗佈步驟。 FIG. 1A shows the resin coating step of the imprint method in Embodiment 1 of the present invention.
圖1B顯示同壓印方法之事先硬化步驟。 Figure 1B shows the pre-hardening step of the same imprint method.
圖1C顯示同壓印方法之加壓步驟。 FIG. 1C shows the pressing step of the same imprint method.
圖1D顯示同壓印方法之硬化步驟。 Figure 1D shows the hardening step of the same imprint method.
圖1E顯示同壓印方法之脫模步驟。 Fig. 1E shows the demolding step of the same imprint method.
圖2為說明本發明之實施形態1中的效果的示意圖。 FIG. 2 is a schematic diagram illustrating the effect in Embodiment 1 of the present invention.
圖3為說明為本發明之實施形態1中的效果的示意圖。 FIG. 3 is a schematic diagram illustrating the effect of Embodiment 1 of the present invention.
圖4顯示與本發明之實施形態1中的加壓步驟相關的其他例子。 FIG. 4 shows another example related to the pressurizing step in Embodiment 1 of the present invention.
圖5顯示與本發明之實施形態1中的脫模步驟相關的其他例子。 FIG. 5 shows another example related to the demolding step in Embodiment 1 of the present invention.
圖6顯示與本發明之實施形態1中的黏著片之貼附方法相關的其他例子。 FIG. 6 shows another example related to the method of attaching the adhesive sheet in Embodiment 1 of the present invention.
圖7顯示與本發明之實施形態1中的黏著片之貼附方法相關的其他例子。 FIG. 7 shows another example related to the method of attaching the adhesive sheet in Embodiment 1 of the present invention.
圖8顯示與本發明之實施形態1中的黏著片之貼附方法相關的其他例子。 FIG. 8 shows another example related to the method of attaching the adhesive sheet in Embodiment 1 of the present invention.
圖9A顯示本發明之實施形態2中的壓印方法的樹脂塗佈步驟。 FIG. 9A shows the resin coating step of the imprint method in Embodiment 2 of the present invention.
圖9B顯示同壓印方法之事先硬化步驟。 Fig. 9B shows the pre-hardening step of the same imprint method.
圖9C顯示同壓印方法之加壓、硬化步驟。 Fig. 9C shows the pressing and hardening steps of the same imprint method.
圖9D顯示同壓印方法之脫模步驟。 Fig. 9D shows the demolding step of the same imprint method.
圖10為說明同壓印方法之在事先硬化步驟使其硬化處之圖。 Fig. 10 is a diagram for explaining the hardening part of the same imprinting method in the prior hardening step.
圖11為說明同壓印方法之在事先硬化步驟使其硬化處之圖。 Fig. 11 is a diagram for explaining the hardening part of the same imprint method in the prior hardening step.
圖12為顯示與本發明之實施形態2中的樹脂塗佈步驟相關的其他例子。 12 is a diagram showing another example related to the resin coating step in Embodiment 2 of the present invention.
圖13顯示一般的UV壓印技術之概要。 Figure 13 shows an overview of general UV imprinting technology.
圖14為專利文獻1中所記載之滾輪壓印工法的示意圖。 14 is a schematic diagram of the roller imprinting method described in Patent Document 1.
圖15為專利文獻2中所記載之滾輪壓印工法的示意圖。 15 is a schematic diagram of the roller imprinting method described in Patent Document 2.
圖16為用於說明以往的壓印方式之課題的示意圖。 16 is a schematic diagram for explaining the problem of the conventional imprint method.
(實施形態1) (Embodiment 1)
以下針對本發明之實施形態1中的壓印方法及壓印裝置,一面參照圖式一面作說明。如圖1A~圖1E所示,本發明之壓印裝置具備黏著片28、載物台23、模具24、平整工具25、UV照射器26、事先UV照射器29、與圖未示之樹脂塗佈裝置。各構成之具體動作和以下之壓印方法的說明一起進行。
The imprinting method and imprinting apparatus in Embodiment 1 of the present invention will be described below with reference to the drawings. As shown in FIGS. 1A to 1E, the imprint apparatus of the present invention includes an
圖1A~圖1D為顯示本發明之實施形態1中的壓印方法的步驟流程之示意圖。首先,在圖1A所示之樹脂塗佈步驟中,是在基板21上塗佈UV硬化樹脂22。基板21是預先將背面21b黏貼保持於黏著片28上。將黏著片28固定、黏貼於黏著片矯正夾具281上,以對黏著片28本身施加預定的張力。以樹脂塗佈裝置對在該種狀態下之基板21塗佈UV硬化樹脂22。此時,以覆蓋基板21之表面21a,且超出基板21之外周來與黏著片28接觸的方式進行塗佈。亦可因應材料的黏性而採用旋轉塗佈法或網版印刷法、靜電塗佈法等各種方式作為塗佈之方式。樹脂塗佈裝置的態樣也會依塗佈之方式而有多種。又,基板21可依作為對象的製品等而考慮各種材質,可列舉出例如矽、藍寶石、氮化鎵等。
1A to 1D are schematic diagrams showing the flow of steps of the imprint method in Embodiment 1 of the present invention. First, in the resin coating step shown in FIG. 1A, the UV
其次,在圖1B所示之事先硬化步驟中,是使塗佈有UV硬化樹脂22之基板21的外周部分的UV硬化樹脂22硬化。被黏貼於黏著片28上之基板21是隔著黏著片28而設置於載物台23上。載物台23是以光可穿透之材料所形成,
可為例如石英玻璃製。載物台23的下方設置有可朝上方照射UV光之事先UV照射器29,以在基板21的設置後自下方照射UV光。此時,因為基板21是UV光不穿透的,故可在使該基板21成為遮蔽物,而基板表面21a上的UV硬化樹脂22不硬化的情況下,僅硬化超出前述基板21的外周且與黏著片28接觸之UV硬化樹脂22。
Next, in the pre-curing step shown in FIG. 1B, the UV-
並且,在圖1C所示之加壓步驟中,是對配置在載物台23上的基板21,以平整工具25加壓在第1面24a形成微細圖案之模具24的第2面24b。成形方式可適用於各種方式,但此處是以平板方式為代表例來說明。具體而言,模具24是薄膜狀,且是在已加上預定之張力的狀態下被安裝於模具把持具27。此外,自上方以平整工具25加壓模具24的第2面24b,並將形成於模具24之第1面24a的微細圖案壓抵在基板21上的UV硬化樹脂22上,使UV硬化樹脂22充填於微細圖案。
In the pressing step shown in FIG. 1C, the
之後,在圖1D所示之硬化步驟中,是使塗佈於基板21上之UV硬化樹脂22硬化。平整工具25具有透光性,且可為例如石英玻璃製。又,因為模具24具有透光性,且能讓以配置於上方之UV照射器26所照射之UV光幾乎全量往下方穿透,故可使UV硬化樹脂22硬化。
After that, in the curing step shown in FIG. 1D, the UV-
最後,在圖1E所示之脫模步驟中,是使硬化之UV硬化樹脂22與模具24脫模。此時,會使平整工具25解除加壓而先往上方退避。在將薄膜狀之模具24脫模之時,是做成藉由使模具把持具27上升,而自基板21的端部剝離的
方式來使其脫模。藉此,可提升壓印之脫模性,並可以提升微細圖案之轉印品質。以下,參照圖2及圖3來詳細說明。
Finally, in the demolding step shown in FIG. 1E, the cured UV-
圖2為顯示本實施形態之加壓步驟中的基板端部之狀態的放大截面圖,圖3為顯示本實施形態之脫模步驟中的基板端部之狀態的放大截面圖。對於與圖1相同之部分或相當的部分,會附上相同的符號。在圖2所示之加壓步驟中,是使模具24與UV硬化樹脂22接觸。在基板21的表面21a上,因為UV硬化樹脂22是硬化前的黏性體,故被充填於模具24的圖案內。另一方面,在從基板21超出於外周來與黏著片28接觸的區域中,因為在圖1B之事先硬化步驟中已將UV硬化樹脂22硬化,故並無黏著性及黏性,而成為具有特定之硬度之彈性體。因此,UV硬化樹脂22與模具24之接著處P2的接著力會明顯變小。另一方面,在該區域中的UV硬化樹脂22與黏著片28的接著處P3的接著力會因為以下原因而明顯變高:以事先硬化步驟使UV硬化樹脂22硬化,且黏著片28之黏著性發揮作用,而在UV硬化樹脂22與黏著片28之間形成固接界面。
2 is an enlarged cross-sectional view showing the state of the substrate end portion in the pressurization step of the present embodiment, and FIG. 3 is an enlarged cross-sectional view showing the state of the substrate end portion in the demolding step of the present embodiment. The same symbols as those in Fig. 1 or equivalent parts will be attached. In the pressurizing step shown in FIG. 2, the
於此狀態下移動到圖3所示之脫模步驟時,會使UV硬化樹脂22之與黏著片28之接著處P3的接著力變得大幅超過UV硬化樹脂22之與模具24的接著處P2的接著力。因此,必定從模具24側剝離。並且,為了將基板21上之模具的部分從UV硬化樹脂22剝離,在基板21與UV硬化樹脂22之接著處P4中需要特定的脫模阻抗。此處,模具24因為已從端部開始進行剝離,故接著處P4之脫模阻抗會相較於接
著處P3的接著力充分地變小。又,剝離時之力點因為存在於接著處P4,且距接著處P3的部分較遠,所以難以在基板21與UV硬化樹脂22之間產生膜剝落。因此,可提升壓印之脫模性,且可以使微細圖案之轉印品質穩定。
When moving to the demolding step shown in FIG. 3 in this state, the adhesive force of the bonding point P3 of the
再者,在實施形態1中,雖然列舉了使用平整工具之方式來作為加壓方式之代表例,但加壓方式並不受限於此,例如圖4所示,以空氣等之流體壓30將基板21的表面全面加壓之方式,也能期待同樣的效果。再者,在圖4中,對與圖1相同之部分或相當的部分,會附上相同的符號。又,也可採用將如後述之加壓滾筒作為加壓方式的態樣。
Furthermore, in the first embodiment, the method of using a flattening tool is cited as a representative example of the pressure method, but the pressure method is not limited to this. For example, as shown in FIG. 4, a fluid pressure of 30 such as air is used. The same effect can be expected by pressing the entire surface of the
此外,雖然在脫模步驟中所採用的是藉由使模具把持具27上升而從模具24之端部剝離的方式,但藉由如圖5所示,採用超音波振動等,在微觀上像是將模具把持具27朝上下方向搖動的方式,而使基板21上的模具24與UV硬化樹脂22之間的脫模阻抗降低,可以實現更穩定的脫模。此外,藉由同時使黏著片矯正夾具281往下方移動,可以將模具24與UV硬化樹脂22之打開角度更為加大,而可以提升脫模性。
In addition, although the method used in the demolding step is to peel off the end of the
再者,固定黏著片28之黏著片矯止夾具281之形狀可依作為對象之基板21的形態等,而採用各種態樣。圖6~8為本實施形態中的黏著片28及黏著片矯正夾具281的各種形狀製作例。基板21為四角形時,是將黏著片矯正夾具281例如,如圖6所示地配置於基板21之左右兩側,或如圖7所示地配置成包圍基板21的周圍。藉此,可使黏著片28之
張力穩定。又,基板21為圓形時,如圖8所示,是將黏著片矯正夾具281做成圓環狀。藉此,可將黏著片28之張力形成為各向同性。
In addition, the shape of the adhesive
(實施形態2) (Embodiment 2)
其次,針對本發明之實施形態2之壓印方法,一面參照圖式一面說明。再者,在實施形態1中所敘述的是圖1B所示之在事先硬化步驟中使超出基板21之外周的UV硬化樹脂22硬化的態樣。另一方面,實施形態2,在超出基板21之外周的UV硬化樹脂22之中使一部分不硬化之點上,與實施形態1不同。
Next, the imprint method of Embodiment 2 of the present invention will be described with reference to the drawings. In addition, what was described in Embodiment 1 is the state shown in FIG. 1B in which the
圖9A~D為顯示本發明之實施形態2中的壓印方法的步驟流程之示意圖。為求簡便,與圖1A~E相同之部分或相當的部分,會附上相同的符號。圖9A所示之樹脂塗佈步驟,因與實施形態1中的圖1A所說明的情形同樣,故省略說明。 9A to D are schematic diagrams showing the flow of steps of the imprint method in Embodiment 2 of the present invention. For simplicity, the same symbols as those in Figure 1A~E or equivalent parts will be attached. The resin coating step shown in FIG. 9A is the same as the case described in FIG. 1A in Embodiment 1, and therefore description will be omitted.
在圖9B所示之事先硬化步驟中,在超出基板21之外周來與黏著片28接觸之UV硬化樹脂22之中,雖然使比基板21更位於圖中左側之UV硬化樹脂22硬化,但並未使位於基板21的右邊之UV硬化樹脂22硬化。細節容後述。
In the pre-curing step shown in FIG. 9B, among the UV-
在圖9C所示之加壓、硬化步驟中,作為加壓方式,是藉由使用加壓滾輪251,一面加壓以將薄膜狀之模具24壓抵於UV硬化樹脂22上,一面往與加壓滾輪251之軸向Z及加壓方向Y垂直的進給方向X(圖中從左到右的方向)進給,以依序加壓下去。同時從上方藉由使UV照射器26也與加壓
滾輪251同步移動,以使UV硬化樹脂22依序硬化下去。又,為了防止加壓滾輪251通過後之模具24的部分在使UV硬化樹脂22硬化前就脫離之情形,設置有保持滾輪252。保持滾輪252是設置於在進給方向X上比UV照射器26還上游側。
In the pressing and curing step shown in FIG. 9C, as a pressing method, a
並且,在圖9D所示之脫模步驟中,是藉由一面將保持滾輪252朝進給方向X進給,一面使上游側之模具把持具27上升,而僅從進給方向X中的上游側進行剝離。此處,在進給方向X上比基板21還上游側之UV硬化樹脂22因為已在圖9B所示之步驟中事先被硬化,故與模具24的接著力會變小,而與黏著片28之接著力會變大。藉此,因為可防止在基板21與UV硬化樹脂22之間產生膜剝落之情形,故可以提升壓印的脫模性,並可以使微細圖案之轉印品質穩定。
In the demolding step shown in FIG. 9D, the holding
又,因為不使在進給方向X上位於基板21下游之UV硬化樹脂22事先硬化,故可促進UV硬化樹脂22的流出,而使微細圖案之轉印品質穩定。以下說明細節。
In addition, since the UV-
在實施形態2中,因為加壓滾輪251一面加壓UV硬化樹脂22一面朝進給方向X進給,故形成為也將基板21上之UV硬化樹脂22也朝進給方向X擠壓。假設,在圖9B中,使超出基板21之外周之UV硬化樹脂22的整個範圍都硬化時,則朝進給方向X被擠壓的UV硬化樹脂22會因為已在基板21的下游硬化之UV硬化樹脂22而被堵住。因此,UV硬化樹脂22變得難以朝下游流出,使UV硬化樹脂22之膜厚在下游側變得比上游側厚,恐有降低微細圖案之轉印品質的疑慮。
In the second embodiment, since the
另一方面,在本實施形態中,因為未事先使位於基板21之下游的UV硬化樹脂22硬化,故朝進給方向X被擠壓的UV硬化樹脂22會流出到比基板21還下游的黏著片28上。因此,可以均勻化UV硬化樹脂22的膜厚,並可提升微細圖案之轉印品質。
On the other hand, in this embodiment, since the UV-
圖10及11是說明在基板21為矩形時或圓形時,於事先硬化步驟中使其硬化之處的平面圖。在圖中,符號22a為於事先硬化步驟中被硬化之部分,且是表示在進給方向X上比基板21還上游側之UV硬化樹脂的部分。符號22b為於事先硬化步驟中未被硬化之部分,且是表示在進給方向X上位於基板21之下游之UV硬化樹脂的部分。符號22c表示其以外之UV硬化樹脂的部分,且為在事先硬化步驟中可被硬化,亦可不被硬化的部分。
10 and 11 are plan views illustrating where the
基板21為矩形時,如圖10所示,是使在進給方向X上比基板21的最上游之一邊21c更上游側之UV硬化樹脂的部分22a硬化。又,為了促進UV硬化樹脂22的流出,做成不使在進給方向X上位於基板21之下游的UV硬化樹脂的部分22b硬化。基板21為圓形時,如圖11所示,必須使進給方向X比基板21的最上游之一端21d更上游側的UV硬化樹脂的部分22a硬化。此區域會成為以圓弧與弦所構成的形狀。又,為了促進UV硬化樹脂22的流出,做成不使在進給方向X上位於基板21的下游之UV硬化樹脂的部分22b硬化。
When the
又,在實施形態2中,是做成在圖9B所示之事先硬化步驟中,使在進給方向X上比基板21還上游側之UV硬
化樹脂22硬化,而不使位於基板21的下游之UV硬化樹脂硬化。可替代地,也可做成在樹脂塗佈步驟中,將UV硬化樹脂22塗佈於在進給方向X上比基板21還上游側之黏著片28,對於基板21的下游之黏著片28則不塗佈。藉此,可獲得與上述同樣的效果。
In the second embodiment, in the pre-curing step shown in FIG. 9B, the UV on the upstream side of the
亦即,藉由對比基板21還上游側之UV硬化樹脂22照射UV光而進行硬化,UV硬化樹脂22之與模具24的接著力即變小,與黏著片28之接著力即變大。藉此,因為可以防止在基板21與UV硬化樹脂22之間產生膜剝落之情形,故可提升壓印的脫模性,且可以使微細圖案之轉印品質穩定。又,因為在進給方向X上於基板21之下游並未塗佈UV硬化樹脂22,故可以促進UV硬化樹脂22的流出,並使微細圖案之轉印品質穩定。
That is, when the
此處,一面參照圖10及11一面說明在樹脂塗佈步驟中塗佈UV硬化樹脂之處。在圖中,符號22a表示在樹脂塗佈步驟中塗佈UV硬化樹脂22的部分。符號22b表示在樹脂塗佈步驟中未塗佈UV硬化樹脂22的部分。符號22c表示在樹脂塗佈步驟中可被塗佈,亦可不被塗佈的部分。又,亦可做成下列態樣:預測可將基板21上之UV硬化樹脂22朝進給方向X擠壓到一定程度之情形,而如圖12所示,於基板22的表面之中,在不覆蓋整個面的情形下,使於進給方向X中的下游側的一部分露出。
Here, with reference to FIGS. 10 and 11, a description will be given of where UV curable resin is applied in the resin application step. In the figure, the
再者,在實施形態2中所敘述的是下列態樣:使用加壓滾輪251作為加壓構件,不使超出基板21的外周之
UV硬化樹脂22的整個面都硬化,而使剝離之側的UV硬化樹脂22硬化。可替代地,即使是做成使用如實施形態1所說明之平整工具或流體壓作為加壓構件,不使超出基板21的外周之UV硬化樹脂22的整個面都硬化,而使剝離之側的UV硬化樹脂22硬化的態樣,也能獲得同樣的效果。
In addition, the second embodiment is described as follows: the
再者,在實施形態1及2中,雖然都敘述了UV照射器隔著具UV穿透性之模具24來對UV硬化樹脂22照射UV光以使其硬化之情形,但並不受限於此,也可做成下列態樣:使模具24對UV以外之光具有穿透性,並使用可在UV以外之光下硬化的樹脂,且使用照射UV以外之光的光照射器。
Furthermore, in the first and second embodiments, although the case where the UV irradiator irradiates the
本發明對於可以藉由提升脫模性而使微細圖案之轉印品質提升之壓印方法及壓印裝置是有用的。 The present invention is useful for an imprinting method and an imprinting device that can improve the transfer quality of fine patterns by improving mold releasability.
21:基板 21: substrate
21a:表面 21a: surface
22:UV硬化樹脂 22: UV hardening resin
24:模具 24: mold
25:平整工具 25: Leveling tool
P2:UV硬化樹脂與模具之接著處 P2: Adjacent part of UV hardening resin and mold
P3:UV硬化樹脂與黏著片之接著處 P3: Adjacent part of UV hardening resin and adhesive sheet
28:黏著片 28: Adhesive sheet
Claims (10)
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JP2015098654A JP6489309B2 (en) | 2015-05-14 | 2015-05-14 | Imprint method and imprint apparatus |
JP2015-098654 | 2015-05-14 |
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JP (1) | JP6489309B2 (en) |
KR (1) | KR20160134466A (en) |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI672212B (en) * | 2016-08-25 | 2019-09-21 | 國立成功大學 | Nano imprinting assembly and imprinting method thereof |
US11571862B2 (en) * | 2016-11-03 | 2023-02-07 | Sram, Llc | Surface feature transfer media and methods of use |
KR20180086819A (en) * | 2017-01-23 | 2018-08-01 | 에스케이하이닉스 주식회사 | Method of forming imprinted patterns |
KR102574036B1 (en) * | 2018-02-28 | 2023-09-04 | 삼성디스플레이 주식회사 | Imprinting apparatus and method of imprinting using the same |
JP7182036B2 (en) * | 2018-06-28 | 2022-12-02 | パナソニックIpマネジメント株式会社 | Component crimping device, sheet installation unit and installation method of sheet installation unit |
JP6538252B1 (en) * | 2018-09-19 | 2019-07-03 | デクセリアルズ株式会社 | Method of manufacturing image display device |
FI128257B (en) * | 2018-12-14 | 2020-01-31 | Teknologian Tutkimuskeskus Vtt Oy | Method for roll-to-roll imprinting of components |
JP7245973B2 (en) * | 2019-02-04 | 2023-03-27 | パナソニックIpマネジメント株式会社 | PATTERN FORMATION METHOD AND APPARATUS |
JP7178600B2 (en) * | 2019-03-11 | 2022-11-28 | パナソニックIpマネジメント株式会社 | Film structure manufacturing method and manufacturing apparatus |
KR102218676B1 (en) * | 2019-07-19 | 2021-02-22 | 한국기계연구원 | Imprint method via selectively forming a release film |
WO2021182532A1 (en) * | 2020-03-11 | 2021-09-16 | Scivax株式会社 | Imprint device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011016148A1 (en) * | 2009-08-07 | 2011-02-10 | ニッタ株式会社 | Adhesive sheet for fixing mold, and adhesive tape for fixing mold, and process for producing fine structure |
US8770965B2 (en) * | 2011-02-10 | 2014-07-08 | Hitachi High-Technologies Corporation | Device and method for transferring micro structure |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6334108A (en) | 1986-07-30 | 1988-02-13 | Hitachi Ltd | Manufacture of substrate for optical disc and device therefor |
JP2002202535A (en) | 2000-12-28 | 2002-07-19 | Canon Inc | Display device |
EP1362682A1 (en) * | 2002-05-13 | 2003-11-19 | ZBD Displays Ltd, | Method and apparatus for liquid crystal alignment |
KR100568581B1 (en) * | 2003-04-14 | 2006-04-07 | 주식회사 미뉴타텍 | Composition for mold used in forming micropattern, and mold prepared therefrom |
TWI261308B (en) * | 2005-03-02 | 2006-09-01 | Ind Tech Res Inst | Micro-nanometer transfer printer |
JP4789039B2 (en) | 2005-06-10 | 2011-10-05 | 独立行政法人産業技術総合研究所 | Nanoimprint equipment |
JP4902229B2 (en) | 2006-03-07 | 2012-03-21 | ソニーケミカル&インフォメーションデバイス株式会社 | Implementation method |
GB0809062D0 (en) * | 2008-05-19 | 2008-06-25 | Zbd Displays Ltd | Method for patterning a surface using selective adhesion |
JP2010067796A (en) | 2008-09-11 | 2010-03-25 | Canon Inc | Imprint device |
EP2287666B1 (en) * | 2009-08-22 | 2012-06-27 | EV Group E. Thallner GmbH | Device for embossing substrates |
JP2011161832A (en) * | 2010-02-10 | 2011-08-25 | Canon Inc | Production process of imprint apparatus and article |
JP5559574B2 (en) | 2010-03-08 | 2014-07-23 | 東芝機械株式会社 | Transfer method |
JP5585138B2 (en) | 2010-03-17 | 2014-09-10 | オムロン株式会社 | Channel tip and jig |
JP2010250940A (en) * | 2010-07-14 | 2010-11-04 | Toshiba Corp | Imprinting apparatus |
KR20140057261A (en) | 2011-07-11 | 2014-05-12 | 에스씨아이브이에이엑스 가부시키가이샤 | Fluid pressure imprinting device provided with pressurization unit securing tool |
TW201334948A (en) * | 2012-02-21 | 2013-09-01 | Coretronic Corp | Imprinting apparatus and imprinting method |
JP6200135B2 (en) * | 2012-07-24 | 2017-09-20 | キヤノン株式会社 | Imprint apparatus, imprint method, and article manufacturing method |
JP5944800B2 (en) | 2012-09-11 | 2016-07-05 | 東芝機械株式会社 | Transfer device |
JP6083565B2 (en) * | 2013-04-09 | 2017-02-22 | パナソニックIpマネジメント株式会社 | Manufacturing method of fine structure |
-
2015
- 2015-05-14 JP JP2015098654A patent/JP6489309B2/en not_active Expired - Fee Related
- 2015-12-22 TW TW104143137A patent/TWI687301B/en not_active IP Right Cessation
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- 2016-01-29 CN CN201610064225.2A patent/CN106142528B/en not_active Expired - Fee Related
- 2016-02-01 KR KR1020160012347A patent/KR20160134466A/en active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011016148A1 (en) * | 2009-08-07 | 2011-02-10 | ニッタ株式会社 | Adhesive sheet for fixing mold, and adhesive tape for fixing mold, and process for producing fine structure |
US8770965B2 (en) * | 2011-02-10 | 2014-07-08 | Hitachi High-Technologies Corporation | Device and method for transferring micro structure |
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CN106142528B (en) | 2019-08-02 |
CN106142528A (en) | 2016-11-23 |
JP6489309B2 (en) | 2019-03-27 |
KR20160134466A (en) | 2016-11-23 |
US20160332341A1 (en) | 2016-11-17 |
US10105874B2 (en) | 2018-10-23 |
JP2016213423A (en) | 2016-12-15 |
TW201639689A (en) | 2016-11-16 |
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