TWI624689B - Pattern drawing device - Google Patents

Pattern drawing device Download PDF

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Publication number
TWI624689B
TWI624689B TW104113456A TW104113456A TWI624689B TW I624689 B TWI624689 B TW I624689B TW 104113456 A TW104113456 A TW 104113456A TW 104113456 A TW104113456 A TW 104113456A TW I624689 B TWI624689 B TW I624689B
Authority
TW
Taiwan
Prior art keywords
light
scanning
light beam
optical element
substrate
Prior art date
Application number
TW104113456A
Other languages
English (en)
Chinese (zh)
Other versions
TW201602636A (zh
Inventor
Masaki Kato
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2014092862A external-priority patent/JP6349924B2/ja
Priority claimed from JP2015083669A external-priority patent/JP6569281B2/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW201602636A publication Critical patent/TW201602636A/zh
Application granted granted Critical
Publication of TWI624689B publication Critical patent/TWI624689B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/11—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW104113456A 2014-04-28 2015-04-28 Pattern drawing device TWI624689B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014092862A JP6349924B2 (ja) 2014-04-28 2014-04-28 パターン描画装置
JP2015083669A JP6569281B2 (ja) 2015-04-15 2015-04-15 ビーム走査装置およびビーム走査方法

Publications (2)

Publication Number Publication Date
TW201602636A TW201602636A (zh) 2016-01-16
TWI624689B true TWI624689B (zh) 2018-05-21

Family

ID=54358637

Family Applications (5)

Application Number Title Priority Date Filing Date
TW104113456A TWI624689B (zh) 2014-04-28 2015-04-28 Pattern drawing device
TW108148374A TWI695187B (zh) 2014-04-28 2015-04-28 圖案曝光裝置
TW109123862A TWI712819B (zh) 2014-04-28 2015-04-28 圖案曝光裝置
TW107105593A TWI684789B (zh) 2014-04-28 2015-04-28 圖案描繪裝置
TW109123865A TWI712820B (zh) 2014-04-28 2015-04-28 圖案曝光裝置

Family Applications After (4)

Application Number Title Priority Date Filing Date
TW108148374A TWI695187B (zh) 2014-04-28 2015-04-28 圖案曝光裝置
TW109123862A TWI712819B (zh) 2014-04-28 2015-04-28 圖案曝光裝置
TW107105593A TWI684789B (zh) 2014-04-28 2015-04-28 圖案描繪裝置
TW109123865A TWI712820B (zh) 2014-04-28 2015-04-28 圖案曝光裝置

Country Status (4)

Country Link
KR (7) KR102060289B1 (ko)
CN (5) CN109061874B (ko)
TW (5) TWI624689B (ko)
WO (1) WO2015166910A1 (ko)

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KR20230173214A (ko) * 2015-06-17 2023-12-26 가부시키가이샤 니콘 패턴 묘화 장치 및 패턴 묘화 방법
JP6651768B2 (ja) * 2015-09-28 2020-02-19 株式会社ニコン パターン描画装置
JP6607002B2 (ja) * 2015-11-30 2019-11-20 株式会社ニコン パターン描画装置
JP6547609B2 (ja) * 2015-12-02 2019-07-24 株式会社ニコン デバイス形成装置およびパターン形成装置
JP6743884B2 (ja) * 2016-03-30 2020-08-19 株式会社ニコン パターン描画装置、パターン描画方法
CN109196423B (zh) * 2016-05-06 2021-08-27 株式会社尼康 光束扫描装置
JP7056572B2 (ja) * 2016-09-29 2022-04-19 株式会社ニコン ビーム走査装置およびパターン描画装置
WO2018066285A1 (ja) * 2016-10-04 2018-04-12 株式会社ニコン ビーム走査装置、パターン描画装置、およびパターン描画装置の精度検査方法
JP7099321B2 (ja) * 2016-10-04 2022-07-12 株式会社ニコン ビーム走査装置およびパターン描画装置
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
WO2018066338A1 (ja) * 2016-10-05 2018-04-12 株式会社ニコン パターン描画装置
CN110325922B (zh) * 2017-02-20 2022-06-17 株式会社尼康 图案描绘装置、及图案描绘方法
WO2018164087A1 (ja) * 2017-03-10 2018-09-13 株式会社ニコン パターン描画装置、及びパターン露光装置
CN111279244B (zh) 2017-10-25 2022-03-18 株式会社尼康 图案描绘装置
JP7178819B2 (ja) * 2018-07-18 2022-11-28 浜松ホトニクス株式会社 半導体光検出装置
JP2020021079A (ja) * 2019-09-04 2020-02-06 株式会社ニコン パターン描画装置
JP7441076B2 (ja) * 2020-03-03 2024-02-29 株式会社Ｓｃｒｅｅｎホールディングス 描画装置
JP6910086B1 (ja) * 2020-06-09 2021-07-28 株式会社片岡製作所 レーザ加工装置、レーザ加工システム、ローテータユニット装置、レーザ加工方法、及び、プローブカードの生産方法
JP2022105463A (ja) * 2021-01-02 2022-07-14 大船企業日本株式会社 プリント基板のレーザ加工方法およびプリント基板のレーザ加工機

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JP2003048093A (ja) * 2001-08-03 2003-02-18 Matsushita Electric Ind Co Ltd レーザ加工装置およびその加工方法
US20050105154A1 (en) * 2003-11-03 2005-05-19 Yun Sang K. Scanning apparatus using light modulator
US20130321898A1 (en) * 2011-08-19 2013-12-05 Laser Imaging Systems Gmbh & Co. Kg System and method for direct imaging

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Publication number Priority date Publication date Assignee Title
JP2000263271A (ja) * 1999-01-14 2000-09-26 Hitachi Via Mechanics Ltd レーザ加工方法およびレーザ加工機
JP2003048093A (ja) * 2001-08-03 2003-02-18 Matsushita Electric Ind Co Ltd レーザ加工装置およびその加工方法
US20050105154A1 (en) * 2003-11-03 2005-05-19 Yun Sang K. Scanning apparatus using light modulator
US20130321898A1 (en) * 2011-08-19 2013-12-05 Laser Imaging Systems Gmbh & Co. Kg System and method for direct imaging

Also Published As

Publication number Publication date
KR20190067259A (ko) 2019-06-14
KR102078979B1 (ko) 2020-02-19
TWI684789B (zh) 2020-02-11
KR20180108870A (ko) 2018-10-04
TW202014756A (zh) 2020-04-16
KR20190033661A (ko) 2019-03-29
CN109061874B (zh) 2021-05-18
KR20200018727A (ko) 2020-02-19
KR20190039610A (ko) 2019-04-12
CN109212748B (zh) 2021-05-18
TW202040211A (zh) 2020-11-01
TWI712819B (zh) 2020-12-11
CN109343214A (zh) 2019-02-15
CN109343214B (zh) 2021-05-18
KR101967598B1 (ko) 2019-04-09
KR101998541B1 (ko) 2019-07-09
KR102164337B1 (ko) 2020-10-12
TWI695187B (zh) 2020-06-01
CN110095862B (zh) 2021-08-27
CN106489093A (zh) 2017-03-08
CN110095862A (zh) 2019-08-06
CN106489093B (zh) 2019-04-19
KR20190011826A (ko) 2019-02-07
CN109212748A (zh) 2019-01-15
KR101963488B1 (ko) 2019-03-28
KR102060289B1 (ko) 2019-12-27
TW201819986A (zh) 2018-06-01
KR101988825B1 (ko) 2019-06-12
TW201602636A (zh) 2016-01-16
TWI712820B (zh) 2020-12-11
KR20160145611A (ko) 2016-12-20
TW202040212A (zh) 2020-11-01
WO2015166910A1 (ja) 2015-11-05
CN109061874A (zh) 2018-12-21

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