JP7441076B2 - 描画装置 - Google Patents
描画装置 Download PDFInfo
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- JP7441076B2 JP7441076B2 JP2020035878A JP2020035878A JP7441076B2 JP 7441076 B2 JP7441076 B2 JP 7441076B2 JP 2020035878 A JP2020035878 A JP 2020035878A JP 2020035878 A JP2020035878 A JP 2020035878A JP 7441076 B2 JP7441076 B2 JP 7441076B2
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- 239000000463 material Substances 0.000 claims description 143
- 230000007246 mechanism Effects 0.000 claims description 36
- 238000001514 detection method Methods 0.000 claims description 28
- 238000011084 recovery Methods 0.000 claims description 12
- 238000012937 correction Methods 0.000 description 34
- 238000003384 imaging method Methods 0.000 description 23
- 230000032258 transport Effects 0.000 description 20
- 230000003028 elevating effect Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 238000004891 communication Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H18/00—Winding webs
- B65H18/08—Web-winding mechanisms
- B65H18/10—Mechanisms in which power is applied to web-roll spindle
- B65H18/103—Reel-to-reel type web winding and unwinding mechanisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H20/00—Advancing webs
- B65H20/02—Advancing webs by friction roller
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2301/00—Handling processes for sheets or webs
- B65H2301/50—Auxiliary process performed during handling process
- B65H2301/51—Modifying a characteristic of handled material
- B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
- B65H2301/5111—Printing; Marking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2701/00—Handled material; Storage means
- B65H2701/10—Handled articles or webs
- B65H2701/19—Specific article or web
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Confectionery (AREA)
- Formation And Processing Of Food Products (AREA)
- Control And Other Processes For Unpacking Of Materials (AREA)
Description
4 ステージ移動機構
6 校正値取得部
9 基材
31 光出射部
50 ベース部
51 供給部
52 テーブル
53 回収部
54 搬送部
61 校正用検出部
71 補正用撮像部
96 参照マーク
511 供給ロール
521 保持面
531 回収ロール
541~546 ローラ
Claims (4)
- 長尺の基材にパターンを描画する描画装置であって、
長尺の基材が巻回された供給ロールを保持する供給部と、
前記供給部から引き出された前記基材を保持面にて保持するテーブルと、
前記保持面を通過した前記基材を回収ロールにて巻き取る回収部と、
搬送ローラを有し、パターンの非描画時に前記供給部から前記保持面を通過して前記回収部へと至る搬送経路に沿って前記基材を搬送する搬送部と、
パターンの描画時に前記保持面上の前記基材に向けて変調した光を出射する光出射部と、
パターンの描画時に、前記保持面上に保持される前記基材の長手方向に沿う移動方向に、前記テーブルを前記光出射部に対して相対的に移動する移動機構と、
前記テーブルに対する相対的な位置が固定された校正用検出部を有し、校正動作において前記光出射部からの光が前記校正用検出部に照射されることにより、前記光出射部と前記テーブルとの相対位置に関する校正値を取得する校正値取得部と、
を備え、
前記保持面上の前記基材の幅方向に沿って見た場合に、前記移動方向における前記テーブルの一端近傍に位置する折返位置にて前記搬送経路が前記移動方向に関して折り返され、
前記折返位置よりも前記テーブル側に、前記供給部および前記回収部が配置され、
前記移動方向に沿って、前記テーブル、前記折返位置および前記校正用検出部が順に並ぶことを特徴とする描画装置。 - 請求項1に記載の描画装置であって、
前記移動機構が、前記テーブルを前記移動方向に連続的に移動し、
前記供給部および前記回収部が、前記移動方向に移動可能であることを特徴とする描画装置。 - 請求項2に記載の描画装置であって、
前記テーブル、前記供給部および前記回収部を支持するベース部をさらに備え、
前記移動機構が前記ベース部を移動することを特徴とする描画装置。 - 請求項1ないし3のいずれか1つに記載の描画装置であって、
前記供給部および前記回収部が互いに隣接して配置されることを特徴とする描画装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020035878A JP7441076B2 (ja) | 2020-03-03 | 2020-03-03 | 描画装置 |
TW110102918A TWI801801B (zh) | 2020-03-03 | 2021-01-27 | 描繪裝置 |
KR1020210022014A KR102578965B1 (ko) | 2020-03-03 | 2021-02-18 | 묘화 장치 |
CN202110226010.7A CN113341657B (zh) | 2020-03-03 | 2021-03-01 | 描画装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020035878A JP7441076B2 (ja) | 2020-03-03 | 2020-03-03 | 描画装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021139978A JP2021139978A (ja) | 2021-09-16 |
JP7441076B2 true JP7441076B2 (ja) | 2024-02-29 |
Family
ID=77467634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020035878A Active JP7441076B2 (ja) | 2020-03-03 | 2020-03-03 | 描画装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7441076B2 (ja) |
KR (1) | KR102578965B1 (ja) |
TW (1) | TWI801801B (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006136897A (ja) | 2004-11-10 | 2006-06-01 | Hitachi Via Mechanics Ltd | シート状ワークの保持方法および保持装置 |
JP2009149427A (ja) | 2007-12-21 | 2009-07-09 | Orc Mfg Co Ltd | 搬送装置及び露光装置 |
JP2017215535A (ja) | 2016-06-01 | 2017-12-07 | 株式会社オーク製作所 | 露光装置 |
JP2019053140A (ja) | 2017-09-13 | 2019-04-04 | 株式会社オーク製作所 | 露光装置 |
JP2020052284A (ja) | 2018-09-27 | 2020-04-02 | 株式会社オーク製作所 | 露光装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4696420B2 (ja) | 2001-07-31 | 2011-06-08 | 凸版印刷株式会社 | テープキャリア用露光装置 |
JP2006106505A (ja) | 2004-10-07 | 2006-04-20 | Fuji Photo Film Co Ltd | 画像記録装置及び画像記録方法 |
CN109343214B (zh) * | 2014-04-28 | 2021-05-18 | 株式会社尼康 | 图案描绘装置 |
KR102379193B1 (ko) * | 2016-05-19 | 2022-03-28 | 가부시키가이샤 니콘 | 기판 지지 장치, 노광 장치, 및 패터닝 장치 |
-
2020
- 2020-03-03 JP JP2020035878A patent/JP7441076B2/ja active Active
-
2021
- 2021-01-27 TW TW110102918A patent/TWI801801B/zh active
- 2021-02-18 KR KR1020210022014A patent/KR102578965B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006136897A (ja) | 2004-11-10 | 2006-06-01 | Hitachi Via Mechanics Ltd | シート状ワークの保持方法および保持装置 |
JP2009149427A (ja) | 2007-12-21 | 2009-07-09 | Orc Mfg Co Ltd | 搬送装置及び露光装置 |
JP2017215535A (ja) | 2016-06-01 | 2017-12-07 | 株式会社オーク製作所 | 露光装置 |
JP2019053140A (ja) | 2017-09-13 | 2019-04-04 | 株式会社オーク製作所 | 露光装置 |
JP2020052284A (ja) | 2018-09-27 | 2020-04-02 | 株式会社オーク製作所 | 露光装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI801801B (zh) | 2023-05-11 |
KR20210111680A (ko) | 2021-09-13 |
JP2021139978A (ja) | 2021-09-16 |
TW202141199A (zh) | 2021-11-01 |
CN113341657A (zh) | 2021-09-03 |
KR102578965B1 (ko) | 2023-09-14 |
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