TWI575312B - Coloring the photosensitive resin composition - Google Patents

Coloring the photosensitive resin composition Download PDF

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Publication number
TWI575312B
TWI575312B TW101113202A TW101113202A TWI575312B TW I575312 B TWI575312 B TW I575312B TW 101113202 A TW101113202 A TW 101113202A TW 101113202 A TW101113202 A TW 101113202A TW I575312 B TWI575312 B TW I575312B
Authority
TW
Taiwan
Prior art keywords
group
carbon atoms
resin composition
photosensitive resin
hydrocarbon group
Prior art date
Application number
TW101113202A
Other languages
English (en)
Chinese (zh)
Other versions
TW201303491A (zh
Inventor
Takakiyo Terakawa
Yasuyuki Kiryu
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW201303491A publication Critical patent/TW201303491A/zh
Application granted granted Critical
Publication of TWI575312B publication Critical patent/TWI575312B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW101113202A 2011-04-15 2012-04-13 Coloring the photosensitive resin composition TWI575312B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011090788 2011-04-15

Publications (2)

Publication Number Publication Date
TW201303491A TW201303491A (zh) 2013-01-16
TWI575312B true TWI575312B (zh) 2017-03-21

Family

ID=46992142

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101113202A TWI575312B (zh) 2011-04-15 2012-04-13 Coloring the photosensitive resin composition

Country Status (4)

Country Link
JP (1) JP6094050B2 (ja)
KR (1) KR101946643B1 (ja)
CN (2) CN108845481A (ja)
TW (1) TWI575312B (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102914943B (zh) * 2011-08-04 2018-01-12 住友化学株式会社 着色固化性树脂组合物
JP2013036006A (ja) * 2011-08-11 2013-02-21 Sumitomo Chemical Co Ltd 化合物
WO2013089197A1 (ja) * 2011-12-14 2013-06-20 日本化薬株式会社 キサンテン化合物
JP2013205834A (ja) * 2012-03-29 2013-10-07 Fujifilm Corp 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに画像表示装置
KR20150103210A (ko) * 2013-02-13 2015-09-09 후지필름 가부시키가이샤 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법, 경화막, 액정 표시 장치 및 유기 el 표시 장치
JP2018009043A (ja) * 2014-11-14 2018-01-18 昭和電工株式会社 樹脂組成物、その製造方法、カラーフィルター及び画像表示素子
KR102555416B1 (ko) * 2015-03-30 2023-07-13 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물
TWI696889B (zh) * 2015-06-30 2020-06-21 南韓商東友精細化工有限公司 著色固化性樹脂組合物、濾色器和液晶顯示裝置
TWI721087B (zh) * 2016-01-27 2021-03-11 日商住友化學股份有限公司 著色硬化性樹脂組成物、彩色濾光片及含有該濾光片之顯示裝置
US10101655B2 (en) 2016-02-26 2018-10-16 Samsung Sdi Co., Ltd. Compound, polymer, photosensitive resin composition, and color filter
JP6971055B2 (ja) * 2016-07-20 2021-11-24 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. 青色硬化性樹脂組成物、カラーフィルタ、及び表示装置
KR102025478B1 (ko) 2017-11-28 2019-09-25 주식회사 엘지화학 착색제 조성물 제조방법, 이를 이용하여 제조된 착색제 조성물, 착색제 분산액, 감광성 수지 조성물, 컬러필터 및 액정 표시 장치
KR102355812B1 (ko) * 2017-12-05 2022-01-26 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR20210069007A (ko) * 2019-12-02 2021-06-10 주식회사 엘지화학 착색제 조성물, 감광성 수지 조성물, 감광재, 컬러필터 및 액정 표시 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201042368A (en) * 2009-02-13 2010-12-01 Sumitomo Chemical Co Coloring photo-sensitive resin composition and color filter

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JP3841497B2 (ja) * 1996-05-17 2006-11-01 凸版印刷株式会社 感光性着色組成物
JP2002062651A (ja) * 2000-08-18 2002-02-28 Mitsubishi Chemicals Corp 光重合性組成物及びそれを用いたカラーフィルタ
JP2002072475A (ja) * 2000-08-28 2002-03-12 Mitsubishi Chemicals Corp 光重合性組成物及びそれを用いたカラーフィルター
US7371783B2 (en) * 2001-09-25 2008-05-13 Nippon Shokubai Co., Ltd. Alkali-soluble maleimide copolymer and liquid crystal display comprising the same
JP4645346B2 (ja) * 2005-07-29 2011-03-09 住友化学株式会社 感光性樹脂組成物
JP4788485B2 (ja) * 2006-06-13 2011-10-05 住友化学株式会社 着色感光性樹脂組成物
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Also Published As

Publication number Publication date
JP2012230365A (ja) 2012-11-22
KR20120117658A (ko) 2012-10-24
TW201303491A (zh) 2013-01-16
KR101946643B1 (ko) 2019-02-11
CN108845481A (zh) 2018-11-20
CN102736416A (zh) 2012-10-17
JP6094050B2 (ja) 2017-03-15

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