TWI574100B - Piege film assembly container - Google Patents

Piege film assembly container Download PDF

Info

Publication number
TWI574100B
TWI574100B TW105100860A TW105100860A TWI574100B TW I574100 B TWI574100 B TW I574100B TW 105100860 A TW105100860 A TW 105100860A TW 105100860 A TW105100860 A TW 105100860A TW I574100 B TWI574100 B TW I574100B
Authority
TW
Taiwan
Prior art keywords
pellicle
assembly
pellicle frame
adhesive layer
support device
Prior art date
Application number
TW105100860A
Other languages
English (en)
Chinese (zh)
Other versions
TW201635010A (zh
Inventor
関原一敏
Original Assignee
信越化學工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信越化學工業股份有限公司 filed Critical 信越化學工業股份有限公司
Publication of TW201635010A publication Critical patent/TW201635010A/zh
Application granted granted Critical
Publication of TWI574100B publication Critical patent/TWI574100B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67383—Closed carriers characterised by substrate supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Mechanical Engineering (AREA)
TW105100860A 2015-01-19 2016-01-13 Piege film assembly container TWI574100B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015007461A JP6320309B2 (ja) 2015-01-19 2015-01-19 ペリクル収納容器

Publications (2)

Publication Number Publication Date
TW201635010A TW201635010A (zh) 2016-10-01
TWI574100B true TWI574100B (zh) 2017-03-11

Family

ID=56437828

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105100860A TWI574100B (zh) 2015-01-19 2016-01-13 Piege film assembly container

Country Status (4)

Country Link
JP (1) JP6320309B2 (ko)
KR (2) KR102544490B1 (ko)
CN (1) CN105807560A (ko)
TW (1) TWI574100B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI785393B (zh) * 2019-10-03 2022-12-01 日商凸版印刷股份有限公司 蒸鍍遮罩用盒

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102172217B1 (ko) * 2018-07-31 2020-10-30 주식회사 시엠테크놀로지 펠리클 수납용기 및 이를 이용한 파티클 제거 방법
TWI767515B (zh) * 2020-05-14 2022-06-11 家登精密工業股份有限公司 提供有效密封之用於容納基板的容器
US20220102177A1 (en) * 2020-09-30 2022-03-31 Gudeng Precision Industrial Co., Ltd. Reticle pod with antistatic capability

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200923571A (en) * 2007-11-22 2009-06-01 Shinetsu Chemical Co A pellicle, a pellicle-receiving container for receiving a pellicle, and a method for storing a pellicle in a pellicle-receiving container
TW201105555A (en) * 2009-08-06 2011-02-16 Shinetsu Chemical Co Pellicle container
TW201139233A (en) * 2010-04-23 2011-11-16 Shinetsu Chemical Co Pellicle container
TWM427592U (en) * 2010-05-10 2012-04-21 Asahi Kasei E Materials Corp Protective film storage container
TW201346435A (zh) * 2012-03-29 2013-11-16 Shinetsu Chemical Co 防塵薄膜組件收納容器

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4697701A (en) * 1986-05-30 1987-10-06 Inko Industrial Corporation Dust free storage container for a membrane assembly such as a pellicle and its method of use
JPH06208221A (ja) * 1993-01-12 1994-07-26 Fujitsu Ltd ペリクルケース
JP2855044B2 (ja) * 1993-04-19 1999-02-10 信越化学工業株式会社 ペリクル収納容器
JP4478558B2 (ja) * 2004-12-08 2010-06-09 大日本印刷株式会社 大型ペリクルの搬送方法、搬送用治具及びペリクルケース
JP2007025183A (ja) * 2005-07-15 2007-02-01 Shin Etsu Polymer Co Ltd ペリクル用収納容器
JP2007047238A (ja) * 2005-08-08 2007-02-22 Shin Etsu Polymer Co Ltd ペリクル用収納容器
JP4614845B2 (ja) * 2005-08-11 2011-01-19 信越ポリマー株式会社 ペリクル用収納容器
JP4955449B2 (ja) 2007-05-10 2012-06-20 信越化学工業株式会社 ペリクル収納容器
JP5864399B2 (ja) * 2012-10-22 2016-02-17 信越化学工業株式会社 ペリクル収納容器

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200923571A (en) * 2007-11-22 2009-06-01 Shinetsu Chemical Co A pellicle, a pellicle-receiving container for receiving a pellicle, and a method for storing a pellicle in a pellicle-receiving container
TW201105555A (en) * 2009-08-06 2011-02-16 Shinetsu Chemical Co Pellicle container
TW201139233A (en) * 2010-04-23 2011-11-16 Shinetsu Chemical Co Pellicle container
TWM427592U (en) * 2010-05-10 2012-04-21 Asahi Kasei E Materials Corp Protective film storage container
TW201346435A (zh) * 2012-03-29 2013-11-16 Shinetsu Chemical Co 防塵薄膜組件收納容器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI785393B (zh) * 2019-10-03 2022-12-01 日商凸版印刷股份有限公司 蒸鍍遮罩用盒

Also Published As

Publication number Publication date
CN105807560A (zh) 2016-07-27
KR20160089276A (ko) 2016-07-27
JP6320309B2 (ja) 2018-05-09
TW201635010A (zh) 2016-10-01
JP2016133585A (ja) 2016-07-25
KR20230088663A (ko) 2023-06-20
KR102544490B1 (ko) 2023-06-16

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