JP6320309B2 - ペリクル収納容器 - Google Patents

ペリクル収納容器 Download PDF

Info

Publication number
JP6320309B2
JP6320309B2 JP2015007461A JP2015007461A JP6320309B2 JP 6320309 B2 JP6320309 B2 JP 6320309B2 JP 2015007461 A JP2015007461 A JP 2015007461A JP 2015007461 A JP2015007461 A JP 2015007461A JP 6320309 B2 JP6320309 B2 JP 6320309B2
Authority
JP
Japan
Prior art keywords
pellicle
storage container
support means
frame support
pellicle frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015007461A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016133585A (ja
Inventor
一敏 関原
一敏 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2015007461A priority Critical patent/JP6320309B2/ja
Priority to KR1020160000305A priority patent/KR102544490B1/ko
Priority to TW105100860A priority patent/TWI574100B/zh
Priority to CN201610022706.7A priority patent/CN105807560A/zh
Publication of JP2016133585A publication Critical patent/JP2016133585A/ja
Application granted granted Critical
Publication of JP6320309B2 publication Critical patent/JP6320309B2/ja
Priority to KR1020230075304A priority patent/KR20230088663A/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67383—Closed carriers characterised by substrate supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Mechanical Engineering (AREA)
JP2015007461A 2015-01-19 2015-01-19 ペリクル収納容器 Active JP6320309B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2015007461A JP6320309B2 (ja) 2015-01-19 2015-01-19 ペリクル収納容器
KR1020160000305A KR102544490B1 (ko) 2015-01-19 2016-01-04 펠리클 수납 용기
TW105100860A TWI574100B (zh) 2015-01-19 2016-01-13 Piege film assembly container
CN201610022706.7A CN105807560A (zh) 2015-01-19 2016-01-14 防尘薄膜组件收纳容器
KR1020230075304A KR20230088663A (ko) 2015-01-19 2023-06-13 펠리클 수납 용기

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015007461A JP6320309B2 (ja) 2015-01-19 2015-01-19 ペリクル収納容器

Publications (2)

Publication Number Publication Date
JP2016133585A JP2016133585A (ja) 2016-07-25
JP6320309B2 true JP6320309B2 (ja) 2018-05-09

Family

ID=56437828

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015007461A Active JP6320309B2 (ja) 2015-01-19 2015-01-19 ペリクル収納容器

Country Status (4)

Country Link
JP (1) JP6320309B2 (ko)
KR (2) KR102544490B1 (ko)
CN (1) CN105807560A (ko)
TW (1) TWI574100B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102172217B1 (ko) * 2018-07-31 2020-10-30 주식회사 시엠테크놀로지 펠리클 수납용기 및 이를 이용한 파티클 제거 방법
CN213444112U (zh) * 2019-10-03 2021-06-15 凸版印刷株式会社 蒸镀掩模用盒体
TWI767515B (zh) * 2020-05-14 2022-06-11 家登精密工業股份有限公司 提供有效密封之用於容納基板的容器
US12087605B2 (en) * 2020-09-30 2024-09-10 Gudeng Precision Industrial Co., Ltd. Reticle pod with antistatic capability

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4697701A (en) * 1986-05-30 1987-10-06 Inko Industrial Corporation Dust free storage container for a membrane assembly such as a pellicle and its method of use
JPH06208221A (ja) * 1993-01-12 1994-07-26 Fujitsu Ltd ペリクルケース
JP2855044B2 (ja) * 1993-04-19 1999-02-10 信越化学工業株式会社 ペリクル収納容器
JP4478558B2 (ja) * 2004-12-08 2010-06-09 大日本印刷株式会社 大型ペリクルの搬送方法、搬送用治具及びペリクルケース
JP2007025183A (ja) * 2005-07-15 2007-02-01 Shin Etsu Polymer Co Ltd ペリクル用収納容器
JP2007047238A (ja) * 2005-08-08 2007-02-22 Shin Etsu Polymer Co Ltd ペリクル用収納容器
JP4614845B2 (ja) * 2005-08-11 2011-01-19 信越ポリマー株式会社 ペリクル用収納容器
JP4955449B2 (ja) 2007-05-10 2012-06-20 信越化学工業株式会社 ペリクル収納容器
JP5051840B2 (ja) * 2007-11-22 2012-10-17 信越化学工業株式会社 ペリクル収納容器内にペリクルを保管する方法
JP2011034020A (ja) * 2009-08-06 2011-02-17 Shin-Etsu Chemical Co Ltd ペリクル収納容器
JP5528190B2 (ja) * 2010-04-23 2014-06-25 信越化学工業株式会社 ペリクル収納容器
KR200469200Y1 (ko) * 2010-05-10 2013-09-26 아사히 가세이 이-매터리얼즈 가부시키가이샤 펠리클 수납 용기
JP5684752B2 (ja) * 2012-03-29 2015-03-18 信越化学工業株式会社 ペリクル収納容器
JP5864399B2 (ja) * 2012-10-22 2016-02-17 信越化学工業株式会社 ペリクル収納容器

Also Published As

Publication number Publication date
TWI574100B (zh) 2017-03-11
JP2016133585A (ja) 2016-07-25
CN105807560A (zh) 2016-07-27
KR20230088663A (ko) 2023-06-20
KR20160089276A (ko) 2016-07-27
KR102544490B1 (ko) 2023-06-16
TW201635010A (zh) 2016-10-01

Similar Documents

Publication Publication Date Title
KR20230088663A (ko) 펠리클 수납 용기
TWI388475B (zh) 防塵薄膜組件收納容器
JP5051840B2 (ja) ペリクル収納容器内にペリクルを保管する方法
JP5854511B2 (ja) ペリクルおよびペリクルの貼付け方法
KR102666696B1 (ko) 펠리클 및 그 장착 방법
JP4796946B2 (ja) ペリクル収納容器
KR101450683B1 (ko) 펠리클 수납 용기
JP5864399B2 (ja) ペリクル収納容器
JP2008216846A (ja) ペリクル収納容器
TWI590999B (zh) 防塵薄膜組件收納容器
JP2010060992A (ja) 大型ペリクル構造体及び大型ペリクル収納構造体
JP2008257208A (ja) 大型ペリクルの保護フィルム及び大型ペリクルの収納方法
JP5981122B2 (ja) ペリクル収納容器
JP6604651B2 (ja) ペリクル収納容器
JP6156998B2 (ja) ペリクル
JP6351178B2 (ja) ペリクル収納容器およびペリクルの取り出し方法
TWI474957B (zh) 防塵薄膜組件收容容器
TWI574102B (zh) Piege film assembly container
EP4325290A1 (en) Pellicle frame laminate and method for manufacturing pellicle using said laminate
JPWO2006059388A1 (ja) 大型ペリクルの収納方法
JP2012106799A (ja) ペリクル収納容器

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20161221

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20170913

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20171002

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171106

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180403

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180403

R150 Certificate of patent or registration of utility model

Ref document number: 6320309

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150