TWI566067B - Pressure flow control device - Google Patents

Pressure flow control device Download PDF

Info

Publication number
TWI566067B
TWI566067B TW103141600A TW103141600A TWI566067B TW I566067 B TWI566067 B TW I566067B TW 103141600 A TW103141600 A TW 103141600A TW 103141600 A TW103141600 A TW 103141600A TW I566067 B TWI566067 B TW I566067B
Authority
TW
Taiwan
Prior art keywords
pressure
control device
flow rate
control
control valve
Prior art date
Application number
TW103141600A
Other languages
English (en)
Chinese (zh)
Other versions
TW201535081A (zh
Inventor
廣瀬□
吉田俊英
松本篤諮
平田薰
池田信一
西野功二
土肥亮介
杉田勝幸
Original Assignee
富士金股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士金股份有限公司 filed Critical 富士金股份有限公司
Publication of TW201535081A publication Critical patent/TW201535081A/zh
Application granted granted Critical
Publication of TWI566067B publication Critical patent/TWI566067B/zh

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
    • F16K31/007—Piezoelectric stacks
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K7/00—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves
    • F16K7/12—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm
    • F16K7/14—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Flow Control (AREA)
TW103141600A 2013-12-05 2014-12-01 Pressure flow control device TWI566067B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013252167A JP6372998B2 (ja) 2013-12-05 2013-12-05 圧力式流量制御装置

Publications (2)

Publication Number Publication Date
TW201535081A TW201535081A (zh) 2015-09-16
TWI566067B true TWI566067B (zh) 2017-01-11

Family

ID=53273128

Family Applications (2)

Application Number Title Priority Date Filing Date
TW103141600A TWI566067B (zh) 2013-12-05 2014-12-01 Pressure flow control device
TW105118225A TWI658351B (zh) 2013-12-05 2014-12-01 壓力式流量控制裝置

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW105118225A TWI658351B (zh) 2013-12-05 2014-12-01 壓力式流量控制裝置

Country Status (7)

Country Link
US (1) US10372145B2 (enExample)
JP (1) JP6372998B2 (enExample)
KR (2) KR101902855B1 (enExample)
CN (1) CN105556411A (enExample)
DE (1) DE112014005572T5 (enExample)
TW (2) TWI566067B (enExample)
WO (1) WO2015083343A1 (enExample)

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WO2017073038A1 (ja) 2015-10-28 2017-05-04 株式会社フジキン 流量信号補正方法およびこれを用いた流量制御装置
US10641407B2 (en) * 2016-02-29 2020-05-05 Fujikin Incorporated Flow rate control device
US10665430B2 (en) * 2016-07-11 2020-05-26 Tokyo Electron Limited Gas supply system, substrate processing system and gas supply method
JP6786096B2 (ja) * 2016-07-28 2020-11-18 株式会社フジキン 圧力式流量制御装置
WO2018070464A1 (ja) * 2016-10-14 2018-04-19 株式会社フジキン 流体制御装置
JP7245600B2 (ja) 2016-12-15 2023-03-24 株式会社堀場エステック 流量制御装置、及び、流量制御装置用プログラム
US11054052B2 (en) * 2016-12-26 2021-07-06 Fujikin Incorporated Piezoelectric-element-driven valve and flow rate control device
CN106876304B (zh) * 2017-02-24 2019-09-10 成都京东方光电科技有限公司 一种湿法刻蚀排气系统及湿法刻蚀装置
WO2019102882A1 (ja) * 2017-11-24 2019-05-31 株式会社フジキン バルブ装置およびその制御装置を用いた制御方法、流体制御装置および半導体製造装置
WO2021005879A1 (ja) * 2019-07-08 2021-01-14 株式会社堀場エステック 流量制御装置、流量測定方法、及び、流量制御装置用プログラム
KR20220058536A (ko) * 2019-09-05 2022-05-09 가부시키가이샤 호리바 에스텍 유량 제어 밸브 또는 유량 제어 장치
US12334355B2 (en) * 2019-12-25 2025-06-17 Fujikin Incorporated Pressure control device
KR102725477B1 (ko) 2020-03-05 2024-11-04 가부시키가이샤 후지킨 유량 제어 장치 및 유량 제어 방법
JP2022029854A (ja) * 2020-08-05 2022-02-18 株式会社堀場エステック 流量制御装置、流量制御方法、及び、流量制御プログラム
US20240101446A1 (en) 2021-03-11 2024-03-28 Fujikin Incorporated Vaporizer and vaporization supply device
JP7045738B1 (ja) * 2021-03-23 2022-04-01 株式会社リンテック 常時閉型流量制御バルブ
KR20230000975A (ko) * 2021-06-25 2023-01-03 가부시키가이샤 호리바 에스텍 유체 제어 장치, 유체 제어 시스템, 유체 제어 장치용 프로그램 및 유체 제어 방법
CN113977451B (zh) * 2021-10-25 2023-08-25 长鑫存储技术有限公司 半导体设备的检测系统及检测方法
CN119103392B (zh) * 2024-11-08 2025-01-28 陕西星环聚能科技有限公司 一种用于可控核聚变装置的压电阀和可控核聚变装置

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US6289923B1 (en) * 1998-05-29 2001-09-18 Fujikin Incorporated Gas supply system equipped with pressure-type flow rate control unit
JP2001296198A (ja) * 2000-04-14 2001-10-26 Nagano Keiki Co Ltd 圧力センサ
JP2005149075A (ja) * 2003-11-14 2005-06-09 Fujikin Inc 流体制御装置
TW201234155A (en) * 2010-07-09 2012-08-16 Entegris Inc Flow controller

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US5669408A (en) * 1995-06-12 1997-09-23 Fujikin Incorporated Pressure type flow rate control apparatus
US6289923B1 (en) * 1998-05-29 2001-09-18 Fujikin Incorporated Gas supply system equipped with pressure-type flow rate control unit
JP2001296198A (ja) * 2000-04-14 2001-10-26 Nagano Keiki Co Ltd 圧力センサ
JP2005149075A (ja) * 2003-11-14 2005-06-09 Fujikin Inc 流体制御装置
TW201234155A (en) * 2010-07-09 2012-08-16 Entegris Inc Flow controller

Also Published As

Publication number Publication date
TW201535081A (zh) 2015-09-16
JP6372998B2 (ja) 2018-08-15
TW201701095A (zh) 2017-01-01
KR20160028474A (ko) 2016-03-11
US10372145B2 (en) 2019-08-06
JP2015109022A (ja) 2015-06-11
WO2015083343A1 (ja) 2015-06-11
US20160349763A1 (en) 2016-12-01
TWI658351B (zh) 2019-05-01
KR101902855B1 (ko) 2018-10-01
KR20180108851A (ko) 2018-10-04
KR102087645B1 (ko) 2020-03-11
CN105556411A (zh) 2016-05-04
DE112014005572T5 (de) 2016-12-01

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