JP6499969B2 - 流体制御弁 - Google Patents
流体制御弁 Download PDFInfo
- Publication number
- JP6499969B2 JP6499969B2 JP2015543809A JP2015543809A JP6499969B2 JP 6499969 B2 JP6499969 B2 JP 6499969B2 JP 2015543809 A JP2015543809 A JP 2015543809A JP 2015543809 A JP2015543809 A JP 2015543809A JP 6499969 B2 JP6499969 B2 JP 6499969B2
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- Prior art keywords
- fluid
- valve
- valve seat
- pair
- fluid resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000012530 fluid Substances 0.000 title claims description 223
- 238000004891 communication Methods 0.000 claims description 10
- 238000010030 laminating Methods 0.000 claims description 3
- 230000004044 response Effects 0.000 description 10
- 230000007246 mechanism Effects 0.000 description 9
- 238000011144 upstream manufacturing Methods 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K7/00—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves
- F16K7/12—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
- F16K31/007—Piezoelectric stacks
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/02—Construction of housing; Use of materials therefor of lift valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/02—Construction of housing; Use of materials therefor of lift valves
- F16K27/0236—Diaphragm cut-off apparatus
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K47/00—Means in valves for absorbing fluid energy
- F16K47/08—Means in valves for absorbing fluid energy for decreasing pressure or noise level and having a throttling member separate from the closure member, e.g. screens, slots, labyrinths
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/01—Control of flow without auxiliary power
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
- Valve Housings (AREA)
- Indication Of The Valve Opening Or Closing Status (AREA)
Description
H ・・・一対の挟持部材
4 ・・・弁体
5 ・・・流体抵抗
6 ・・・弁座ブロック
61 ・・・弁座部
S2 ・・・下流側弁内空間(弁内空間)
前記流体制御弁100は、例えば半導体製造プロセスにおいて反応ガスや成分ガス等の流体の流量を制御するために用いられるものである。そして、第1実施形態の流体制御弁100は、流路上に1つ設けるだけで流体の流量を制御できるように構成してある。
Claims (6)
- 弁座部と、
前記弁座部に対して接離可能に設けられた弁体と、
流路が形成された薄板を積層してなる流体抵抗と、
前記流体抵抗を挟持する一対の挟持部材とを備え、
前記流体抵抗及び前記一対の挟持部材が、前記弁体又は前記弁体を移動させる駆動部材の少なくとも一部が収容される弁内空間を形成しており、流体が前記弁内空間から前記流体抵抗を通過して外部へ流出する、あるいは、流体が外部から前記流体抵抗を通過して前記弁内空間へ流入するように構成されており、
前記弁内空間における流体の圧力を測定する圧力センサをさらに備え、
前記圧力センサで測定される前記弁内空間の圧力に基づいて、前記弁座部と前記弁体との離間距離が制御されるものであることを特徴とする流体制御弁。 - 前記流体抵抗が平板状に形成されたものであり、
前記一対の挟持部材がそれぞれ前記流体抵抗の各面板部のいずれか一方に接触して挟持するように構成されている請求項1記載の流体制御弁。 - 前記一対の挟持部材の一方が、内部に流体が流れる内部流路が形成されており、前記内部流路の流出開口の周囲に前記弁座部が形成された弁座ブロックであり、
前記一対の挟持部材の他方が、前記弁体を前記弁座部側へと押圧する弾性体を保持する弾性体保持ブロックであり、
前記弁座ブロックと前記弾性体保持ブロックとの間に前記流体抵抗が挟持されるよう構成されている請求項1に記載の流体制御弁。 - 内部に流体が流れる内部流路が形成されており、前記内部流路の流出開口の周囲に前記弁座部が形成された弁座ブロックをさらに備え、
前記弁座ブロックが前記一対の挟持部材の一方を押圧することで、前記流体抵抗が前記一対の挟持部材に挟持されるように構成されている請求項1に記載の流体制御弁。 - 前記一対の挟持部材の一方が、内部に流体が流れる内部流路が形成されており、当該内部流路の流入開口の周囲に前記弁座部が形成された弁座ブロックであり、
前記一対の挟持部材の他方が、前記内部流路を介して前記弁体を押圧するダイヤフラム構造体であり、
前記弁座ブロックと前記ダイヤフラム構造体との間に前記流体抵抗が挟持されるように構成されている請求項1に記載の流体制御弁。 - 前記一対の挟持部材のいずれかが、前記圧力センサを収容する収容部と、前記収容部と前記弁内空間とを連通させる連通部とを具備する請求項1記載の流体制御弁。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013218744 | 2013-10-21 | ||
JP2013218744 | 2013-10-21 | ||
PCT/JP2014/077464 WO2015060176A1 (ja) | 2013-10-21 | 2014-10-15 | 流体制御弁 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2015060176A1 JPWO2015060176A1 (ja) | 2017-03-09 |
JP6499969B2 true JP6499969B2 (ja) | 2019-04-10 |
Family
ID=52992776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015543809A Active JP6499969B2 (ja) | 2013-10-21 | 2014-10-15 | 流体制御弁 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10114385B2 (ja) |
JP (1) | JP6499969B2 (ja) |
KR (1) | KR102210858B1 (ja) |
CN (1) | CN105144013B (ja) |
WO (1) | WO2015060176A1 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9958302B2 (en) | 2011-08-20 | 2018-05-01 | Reno Technologies, Inc. | Flow control system, method, and apparatus |
US9188989B1 (en) | 2011-08-20 | 2015-11-17 | Daniel T. Mudd | Flow node to deliver process gas using a remote pressure measurement device |
US11639865B2 (en) | 2019-08-05 | 2023-05-02 | Ichor Systems, Inc. | Laminar flow restrictor |
US10679880B2 (en) | 2016-09-27 | 2020-06-09 | Ichor Systems, Inc. | Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same |
US10303189B2 (en) | 2016-06-30 | 2019-05-28 | Reno Technologies, Inc. | Flow control system, method, and apparatus |
US11585444B2 (en) | 2019-08-05 | 2023-02-21 | Ichor Systems, Inc. | Seal for a flow restrictor |
US11144075B2 (en) | 2016-06-30 | 2021-10-12 | Ichor Systems, Inc. | Flow control system, method, and apparatus |
US10838437B2 (en) | 2018-02-22 | 2020-11-17 | Ichor Systems, Inc. | Apparatus for splitting flow of process gas and method of operating same |
US10663337B2 (en) | 2016-12-30 | 2020-05-26 | Ichor Systems, Inc. | Apparatus for controlling flow and method of calibrating same |
US10927920B2 (en) * | 2017-10-04 | 2021-02-23 | Illinois Tool Works, Inc | Passive damping system for mass flow controller |
JP6651586B1 (ja) * | 2018-08-31 | 2020-02-19 | サーパス工業株式会社 | 流量調整装置及び流量調整装置の制御方法 |
US11841036B2 (en) | 2019-08-05 | 2023-12-12 | Ichor Systems, Inc. | Laminar flow restrictor and seal for same |
KR102092226B1 (ko) * | 2020-01-07 | 2020-03-23 | 성신하스코 주식회사 | 멤브레인을 이용하여 진공 센서를 보호하는 진공형성장치 |
JP7353197B2 (ja) * | 2020-01-31 | 2023-09-29 | 川崎重工業株式会社 | 減圧弁及びバルブユニット |
KR102205334B1 (ko) * | 2020-03-10 | 2021-01-20 | 성신하스코 주식회사 | 멤브레인을 이용하여 진공 센서를 보호하는 진공형성장치 |
US11899477B2 (en) | 2021-03-03 | 2024-02-13 | Ichor Systems, Inc. | Fluid flow control system comprising a manifold assembly |
CN113418024B (zh) * | 2021-06-16 | 2022-10-14 | 太原理工大学 | 一种电液比例节流流量复合控制方向阀 |
US12000723B2 (en) | 2022-02-18 | 2024-06-04 | Mks Instruments, Inc. | Method and apparatus for pressure based mass flow control |
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-
2014
- 2014-10-15 KR KR1020157030470A patent/KR102210858B1/ko active IP Right Grant
- 2014-10-15 JP JP2015543809A patent/JP6499969B2/ja active Active
- 2014-10-15 CN CN201480023273.6A patent/CN105144013B/zh active Active
- 2014-10-15 US US14/894,932 patent/US10114385B2/en active Active
- 2014-10-15 WO PCT/JP2014/077464 patent/WO2015060176A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JPWO2015060176A1 (ja) | 2017-03-09 |
KR20160070721A (ko) | 2016-06-20 |
US10114385B2 (en) | 2018-10-30 |
US20160124439A1 (en) | 2016-05-05 |
CN105144013A (zh) | 2015-12-09 |
KR102210858B1 (ko) | 2021-02-02 |
WO2015060176A1 (ja) | 2015-04-30 |
CN105144013B (zh) | 2019-03-08 |
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