TWI564112B - 研磨裝置 - Google Patents

研磨裝置 Download PDF

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Publication number
TWI564112B
TWI564112B TW102147895A TW102147895A TWI564112B TW I564112 B TWI564112 B TW I564112B TW 102147895 A TW102147895 A TW 102147895A TW 102147895 A TW102147895 A TW 102147895A TW I564112 B TWI564112 B TW I564112B
Authority
TW
Taiwan
Prior art keywords
pure water
gas
unit
polishing
dissolved
Prior art date
Application number
TW102147895A
Other languages
English (en)
Chinese (zh)
Other versions
TW201436946A (zh
Inventor
石橋知淳
Original Assignee
荏原製作所股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荏原製作所股份有限公司 filed Critical 荏原製作所股份有限公司
Publication of TW201436946A publication Critical patent/TW201436946A/zh
Application granted granted Critical
Publication of TWI564112B publication Critical patent/TWI564112B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/04—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW102147895A 2012-12-28 2013-12-24 研磨裝置 TWI564112B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012287119A JP2014130881A (ja) 2012-12-28 2012-12-28 研磨装置

Publications (2)

Publication Number Publication Date
TW201436946A TW201436946A (zh) 2014-10-01
TWI564112B true TWI564112B (zh) 2017-01-01

Family

ID=51017685

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102147895A TWI564112B (zh) 2012-12-28 2013-12-24 研磨裝置

Country Status (4)

Country Link
US (1) US9162337B2 (https=)
JP (1) JP2014130881A (https=)
KR (1) KR101604519B1 (https=)
TW (1) TWI564112B (https=)

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* Cited by examiner, † Cited by third party
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JP6587379B2 (ja) * 2014-09-01 2019-10-09 株式会社荏原製作所 研磨装置
US10058975B2 (en) 2016-02-12 2018-08-28 Applied Materials, Inc. In-situ temperature control during chemical mechanical polishing with a condensed gas
US9962805B2 (en) * 2016-04-22 2018-05-08 Taiwan Semiconductor Manufacturing Company, Ltd. Chemical mechanical polishing apparatus and method
JP6920849B2 (ja) * 2017-03-27 2021-08-18 株式会社荏原製作所 基板処理方法および装置
CN108818278B (zh) * 2018-06-25 2020-05-19 浙江铁流离合器股份有限公司 一种机械联动式的可调型离合器摩擦片抛光装置
JP7287987B2 (ja) 2018-06-27 2023-06-06 アプライド マテリアルズ インコーポレイテッド 化学機械研磨の温度制御
TWI838459B (zh) 2019-02-20 2024-04-11 美商應用材料股份有限公司 化學機械拋光裝置及化學機械拋光方法
TWI859239B (zh) 2019-05-29 2024-10-21 美商應用材料股份有限公司 用於化學機械研磨系統的蒸氣處置站的設備及方法
US11633833B2 (en) 2019-05-29 2023-04-25 Applied Materials, Inc. Use of steam for pre-heating of CMP components
US11628478B2 (en) 2019-05-29 2023-04-18 Applied Materials, Inc. Steam cleaning of CMP components
TWI872101B (zh) 2019-08-13 2025-02-11 美商應用材料股份有限公司 Cmp溫度控制的裝置及方法
US11897079B2 (en) 2019-08-13 2024-02-13 Applied Materials, Inc. Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity
CN115103738A (zh) 2020-06-29 2022-09-23 应用材料公司 Cmp中的温度和浆体流动速率控制
KR102905650B1 (ko) 2020-06-29 2025-12-30 어플라이드 머티어리얼스, 인코포레이티드 화학 기계적 연마를 위한 스팀 생성의 제어
KR20250004369A (ko) 2020-06-30 2025-01-07 어플라이드 머티어리얼스, 인코포레이티드 Cmp 온도 제어를 위한 장치 및 방법
US11577358B2 (en) 2020-06-30 2023-02-14 Applied Materials, Inc. Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing
CN111975471A (zh) * 2020-08-19 2020-11-24 蚌埠知博自动化技术开发有限公司 一种金属材料表面处理的超声波表面强化处理设备
TWI861570B (zh) 2022-06-06 2024-11-11 美商應用材料股份有限公司 凝結氣體墊調節器

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TW200425329A (en) * 2003-03-12 2004-11-16 Ebara Corp Apparatus for cleaning a substrate having metal
TW200507954A (en) * 2003-06-11 2005-03-01 Goldfinger Technologies Llc Megasonic cleaning using supersaturated cleaning solution
TW201102215A (en) * 2009-05-14 2011-01-16 jian-min Song Methods and systems for water jet assisted CMP processing

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JP3438388B2 (ja) * 1995-03-16 2003-08-18 ソニー株式会社 化学的機械研磨方法および化学的機械研磨装置
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JP3696690B2 (ja) * 1996-04-23 2005-09-21 不二越機械工業株式会社 ウェーハの研磨装置システム
JPH10323631A (ja) * 1997-05-23 1998-12-08 Ebara Corp 洗浄部材のセルフクリーニング装置
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JP4532580B2 (ja) * 2008-08-20 2010-08-25 株式会社カイジョー 超音波洗浄装置
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Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200425329A (en) * 2003-03-12 2004-11-16 Ebara Corp Apparatus for cleaning a substrate having metal
TW200507954A (en) * 2003-06-11 2005-03-01 Goldfinger Technologies Llc Megasonic cleaning using supersaturated cleaning solution
TW201102215A (en) * 2009-05-14 2011-01-16 jian-min Song Methods and systems for water jet assisted CMP processing

Also Published As

Publication number Publication date
KR20140086839A (ko) 2014-07-08
US20140187122A1 (en) 2014-07-03
US9162337B2 (en) 2015-10-20
JP2014130881A (ja) 2014-07-10
KR101604519B1 (ko) 2016-03-17
TW201436946A (zh) 2014-10-01

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