TWI546323B - 酚醛清漆型酚樹脂、光阻用樹脂組成物及液晶裝置之製造方法 - Google Patents
酚醛清漆型酚樹脂、光阻用樹脂組成物及液晶裝置之製造方法 Download PDFInfo
- Publication number
- TWI546323B TWI546323B TW101132974A TW101132974A TWI546323B TW I546323 B TWI546323 B TW I546323B TW 101132974 A TW101132974 A TW 101132974A TW 101132974 A TW101132974 A TW 101132974A TW I546323 B TWI546323 B TW I546323B
- Authority
- TW
- Taiwan
- Prior art keywords
- novolac type
- type phenol
- phenol resin
- resin
- photoresist
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/12—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with monohydric phenols having only one hydrocarbon substituent ortho on para to the OH group, e.g. p-tert.-butyl phenol
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011205833 | 2011-09-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201323488A TW201323488A (zh) | 2013-06-16 |
TWI546323B true TWI546323B (zh) | 2016-08-21 |
Family
ID=48180857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101132974A TWI546323B (zh) | 2011-09-21 | 2012-09-10 | 酚醛清漆型酚樹脂、光阻用樹脂組成物及液晶裝置之製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6031905B2 (ja) |
KR (1) | KR20130031799A (ja) |
TW (1) | TWI546323B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5939450B1 (ja) | 2014-07-09 | 2016-06-22 | Dic株式会社 | フェノール性水酸基含有樹脂、その製造方法、感光性組成物、レジスト材料、塗膜、硬化性組成物とその硬化物、及びレジスト下層膜 |
RU2677493C1 (ru) * | 2018-02-07 | 2019-01-17 | Федеральное государственное унитарное предприятие "Государственный научный центр "Научно-исследовательский институт органических полупродуктов и красителей" | Алкилфенолоформальдегидные смолы - пленкообразующие для фоторезистов |
TWI846611B (zh) * | 2023-09-27 | 2024-06-21 | 臺灣永光化學工業股份有限公司 | 化學增幅型正型光阻組成物及其用途 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60189739A (ja) * | 1984-03-09 | 1985-09-27 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
CA2023791A1 (en) * | 1989-08-24 | 1991-02-25 | Ayako Ida | Radiation-sensitive positive resist composition |
JP3472994B2 (ja) * | 1995-02-17 | 2003-12-02 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP3478378B2 (ja) * | 1998-12-18 | 2003-12-15 | Jsr株式会社 | アルカリ可溶性ノボラック樹脂 |
JP2000338660A (ja) * | 1999-05-27 | 2000-12-08 | Toray Ind Inc | ポジ型電子線レジスト組成物およびこれを用いたレジストパターンの製造法 |
JP2002268214A (ja) * | 2001-03-08 | 2002-09-18 | Sumitomo Bakelite Co Ltd | フォトレジスト用フェノ−ル樹脂 |
JP4156400B2 (ja) * | 2003-02-24 | 2008-09-24 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物及びレジストパターンの形成方法 |
JP2005221515A (ja) * | 2004-01-08 | 2005-08-18 | Tokyo Ohka Kogyo Co Ltd | システムlcd製造用ポジ型ホトレジスト組成物およびレジストパターンの形成方法 |
JP4929733B2 (ja) * | 2005-01-28 | 2012-05-09 | 住友ベークライト株式会社 | ノボラック型フェノール樹脂の製造方法 |
JP2007254547A (ja) * | 2006-03-22 | 2007-10-04 | Sumitomo Bakelite Co Ltd | フォトレジスト用フェノール樹脂とその製造方法、及びフォトレジスト用樹脂組成物 |
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2012
- 2012-09-10 JP JP2012198809A patent/JP6031905B2/ja active Active
- 2012-09-10 TW TW101132974A patent/TWI546323B/zh active
- 2012-09-20 KR KR1020120104401A patent/KR20130031799A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP6031905B2 (ja) | 2016-11-24 |
KR20130031799A (ko) | 2013-03-29 |
TW201323488A (zh) | 2013-06-16 |
JP2013079369A (ja) | 2013-05-02 |
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