TWI536119B - Photometric devices and exposure devices - Google Patents

Photometric devices and exposure devices Download PDF

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Publication number
TWI536119B
TWI536119B TW101105585A TW101105585A TWI536119B TW I536119 B TWI536119 B TW I536119B TW 101105585 A TW101105585 A TW 101105585A TW 101105585 A TW101105585 A TW 101105585A TW I536119 B TWI536119 B TW I536119B
Authority
TW
Taiwan
Prior art keywords
line
light
light receiving
spectral
sensitivity
Prior art date
Application number
TW101105585A
Other languages
English (en)
Chinese (zh)
Other versions
TW201239550A (en
Inventor
Akiyoshi Fujimori
Nobuo Kanai
Kazumasa FUJIHARA
Kei Kamijo
Yosuke Magumo
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW201239550A publication Critical patent/TW201239550A/zh
Application granted granted Critical
Publication of TWI536119B publication Critical patent/TWI536119B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0219—Electrical interface; User interface
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0233—Handheld
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/82—Lamps with high-pressure unconstricted discharge having a cold pressure > 400 Torr
    • H01J61/822—High-pressure mercury lamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/84—Lamps with discharge constricted by high pressure
    • H01J61/86—Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/36—Controlling
    • H05B41/38—Controlling the intensity of light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW101105585A 2011-03-30 2012-02-21 Photometric devices and exposure devices TWI536119B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011074420A JP5723652B2 (ja) 2011-03-30 2011-03-30 測光装置および露光装置

Publications (2)

Publication Number Publication Date
TW201239550A TW201239550A (en) 2012-10-01
TWI536119B true TWI536119B (zh) 2016-06-01

Family

ID=46931318

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101105585A TWI536119B (zh) 2011-03-30 2012-02-21 Photometric devices and exposure devices

Country Status (5)

Country Link
JP (1) JP5723652B2 (ko)
KR (1) KR101867527B1 (ko)
CN (1) CN103460137B (ko)
TW (1) TWI536119B (ko)
WO (1) WO2012133616A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI629568B (zh) 2013-08-09 2018-07-11 日商奧克製作所股份有限公司 照明裝置及包含該照明裝置的曝光裝置
KR20150134527A (ko) 2014-05-22 2015-12-02 주식회사 만도 유압 밸브의 코일 전류 측정 장치 및 그 코일 전류 측정 방법

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4319830A (en) * 1979-08-06 1982-03-16 Terence Roach Multispectral light detection system
JPS58165324A (ja) * 1982-03-25 1983-09-30 Nec Corp マスクアライナ−の積算露光量の測定法
JPS62137527A (ja) * 1985-12-12 1987-06-20 Toshiba Corp 分光分布検査装置
JPH036011A (ja) * 1989-06-02 1991-01-11 Nec Yamagata Ltd 半導体装置製造用ウェーハ露光装置
JPH04142020A (ja) * 1990-10-02 1992-05-15 Nec Yamagata Ltd 露光装置
JPH04343032A (ja) * 1991-05-21 1992-11-30 Nec Yamagata Ltd 露光装置用照度計
JP2947303B2 (ja) * 1991-07-08 1999-09-13 三菱電機株式会社 放電灯点灯装置
JP3526652B2 (ja) * 1995-05-11 2004-05-17 倉敷紡績株式会社 光学的測定方法および光学的測定装置
JP2002005736A (ja) * 2000-06-23 2002-01-09 Orc Mfg Co Ltd 紫外線照度分布測定装置
JP2002340667A (ja) * 2001-05-15 2002-11-27 Nikon Corp 照度計測装置および露光装置
JP2003257846A (ja) * 2002-03-07 2003-09-12 Nikon Corp 光源ユニット、照明装置、露光装置及び露光方法
JP2004170325A (ja) * 2002-11-22 2004-06-17 Shimadzu Corp 分光計測装置
JP4262032B2 (ja) * 2003-08-25 2009-05-13 キヤノン株式会社 Ｅｕｖ光源スペクトル計測装置
JP4428403B2 (ja) * 2006-06-28 2010-03-10 ソニー株式会社 赤外線信号受光装置、液晶ディスプレイ及び光学素子
JP5181138B2 (ja) * 2006-11-02 2013-04-10 友達光電股▲ふん▼有限公司 液晶パネル製造装置及び液晶パネルの製造方法
JP2009021971A (ja) * 2007-06-15 2009-01-29 Toshiba Lighting & Technology Corp 光通信システム
JP2009251551A (ja) * 2008-04-11 2009-10-29 Ushio Inc 紫外線照射装置および該装置の制御方法
JP5320006B2 (ja) 2008-10-03 2013-10-23 株式会社オーク製作所 露光描画装置

Also Published As

Publication number Publication date
KR20140061305A (ko) 2014-05-21
JP5723652B2 (ja) 2015-05-27
WO2012133616A1 (ja) 2012-10-04
CN103460137B (zh) 2016-05-25
TW201239550A (en) 2012-10-01
JP2012208351A (ja) 2012-10-25
CN103460137A (zh) 2013-12-18
KR101867527B1 (ko) 2018-06-15

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