TWI486411B - 表面處理劑 - Google Patents

表面處理劑 Download PDF

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Publication number
TWI486411B
TWI486411B TW099123103A TW99123103A TWI486411B TW I486411 B TWI486411 B TW I486411B TW 099123103 A TW099123103 A TW 099123103A TW 99123103 A TW99123103 A TW 99123103A TW I486411 B TWI486411 B TW I486411B
Authority
TW
Taiwan
Prior art keywords
surface treatment
group
treatment agent
substrate
film
Prior art date
Application number
TW099123103A
Other languages
English (en)
Chinese (zh)
Other versions
TW201105757A (en
Inventor
Hisanobu Minamisawa
Original Assignee
Jnc Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jnc Corp filed Critical Jnc Corp
Publication of TW201105757A publication Critical patent/TW201105757A/zh
Application granted granted Critical
Publication of TWI486411B publication Critical patent/TWI486411B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00Inking and printing with a printer's forme
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • C08G77/442Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
TW099123103A 2009-08-12 2010-07-14 表面處理劑 TWI486411B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009187389 2009-08-12

Publications (2)

Publication Number Publication Date
TW201105757A TW201105757A (en) 2011-02-16
TWI486411B true TWI486411B (zh) 2015-06-01

Family

ID=43775100

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099123103A TWI486411B (zh) 2009-08-12 2010-07-14 表面處理劑

Country Status (3)

Country Link
JP (1) JP5510126B2 (ko)
KR (1) KR101675446B1 (ko)
TW (1) TWI486411B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6123194B2 (ja) * 2011-11-11 2017-05-10 Jnc株式会社 熱硬化性組成物
KR101929862B1 (ko) 2011-11-11 2018-12-17 제이엔씨 주식회사 열경화성 조성물
KR20230093895A (ko) * 2021-12-20 2023-06-27 주식회사 케이씨텍 유무기 하이브리드 조성물용 표면처리제

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11227325A (ja) * 1998-02-17 1999-08-24 Toagosei Co Ltd インクジェット記録用シート
JP2005169832A (ja) * 2003-12-11 2005-06-30 Daicel Chem Ind Ltd インク記録体用樹脂組成物及びインク記録体

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2638612B2 (ja) * 1988-06-20 1997-08-06 日信化学工業株式会社 シリコーン/アクリル共重合体組成物
JP2000239601A (ja) 1999-02-22 2000-09-05 Kansai Paint Co Ltd 滑水性表面を形成し得るポリマー組成物
JP2004006700A (ja) 2002-03-27 2004-01-08 Seiko Epson Corp 表面処理方法、表面処理基板、膜パターンの形成方法、電気光学装置の製造方法、電気光学装置、及び電子機器
JP2005251809A (ja) 2004-03-01 2005-09-15 Seiko Epson Corp 薄膜トランジスタの製造方法、薄膜トランジスタ、薄膜トランジスタ回路、電子デバイスおよび電子機器

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11227325A (ja) * 1998-02-17 1999-08-24 Toagosei Co Ltd インクジェット記録用シート
JP2005169832A (ja) * 2003-12-11 2005-06-30 Daicel Chem Ind Ltd インク記録体用樹脂組成物及びインク記録体

Also Published As

Publication number Publication date
TW201105757A (en) 2011-02-16
JP5510126B2 (ja) 2014-06-04
KR20110016823A (ko) 2011-02-18
KR101675446B1 (ko) 2016-11-11
JP2011057963A (ja) 2011-03-24

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MM4A Annulment or lapse of patent due to non-payment of fees