TWI486411B - Surface treatment agent - Google Patents

Surface treatment agent Download PDF

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TWI486411B
TWI486411B TW099123103A TW99123103A TWI486411B TW I486411 B TWI486411 B TW I486411B TW 099123103 A TW099123103 A TW 099123103A TW 99123103 A TW99123103 A TW 99123103A TW I486411 B TWI486411 B TW I486411B
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surface treatment
group
treatment agent
substrate
film
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TW099123103A
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TW201105757A (en
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Hisanobu Minamisawa
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Jnc Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00Inking and printing with a printer's forme
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • C08G77/442Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
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  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)

Description

表面處理劑Surface treatment agent

本發明是有關於一種使用噴墨法等之印刷手法,於基板上形成規定之固體薄膜(solid film)或圖案膜時,可形成微細之圖案膜或凹凸較少之固體薄膜的表面處理劑。The present invention relates to a surface treatment agent capable of forming a fine pattern film or a solid film having less unevenness when a predetermined solid film or pattern film is formed on a substrate by a printing method such as an inkjet method.

圖案化之透明膜被用於間隔件(spacer)、絕緣膜、保護膜等液晶顯示元件的諸多部分中。迄今為止,開始將各種感光性組成物用於該些用途中。The patterned transparent film is used in many parts of a liquid crystal display element such as a spacer, an insulating film, or a protective film. To date, various photosensitive compositions have been used for such applications.

而且,於近年來,開始使用以噴墨法為代表之印刷手法,可隨選(on-demand)地形成圖案的噴墨法對環境優異、且亦可期待成本優勢(cost merit),因此開始受到關注。Further, in recent years, printing methods typified by an inkjet method have been used, and an inkjet method capable of forming an on-demand pattern is excellent in the environment and can also be expected to cost merit. Having attention.

另外,在近年來,亦要求藉由噴墨法而實現與藉由微影(photolithographic method)所獲得之圖案匹敵的微細圖案,但以現在之噴墨法,於噴附油墨後,油墨濕潤擴散,且一次噴出之液量較多,因此難以實現該要求。In addition, in recent years, it is also required to realize a fine pattern which is superior to a pattern obtained by a photolithographic method by an inkjet method, but in the current inkjet method, the ink is wet-diffused after the ink is sprayed. And the amount of liquid discharged at one time is large, so it is difficult to achieve this requirement.

為了藉由噴墨法於基板上描畫微細圖案,需要進行基板之表面處理(斥墨處理),作為表面處理之方法,例如提出了日本專利特開2005-251809號公報及日本專利特開2004-6700號公報中記載的技術。於該些文獻中記載的技術中,藉由使用了四氟甲烷等氟碳系氣體的電漿處理(plasma treatment)、或者藉由將十七氟-1,1,2,2-四氫癸基三乙氧基矽烷等氟烷基矽烷與基板放入至同一容器中放置一定時間而進行基板之表面處理。In order to draw a fine pattern on a substrate by an inkjet method, it is necessary to perform surface treatment (ink repellency treatment) of the substrate. As a method of surface treatment, for example, Japanese Patent Laid-Open Publication No. 2005-251809 and Japanese Patent Laid-Open No. 2004- The technique described in the publication No. 6700. In the techniques described in these documents, plasma treatment using a fluorocarbon gas such as tetrafluoromethane or by heptafluoro-1,1,2,2-tetrahydroanthracene is used. The fluoroalkyl decane such as triethoxy decane is placed in the same container and placed in the same container for a certain period of time to perform surface treatment of the substrate.

然而,於所述電漿處理法中,需要適當的裝置,自成本方面、以及存在產生有毒氣體之現象等製程(process)方面考慮亦存在問題;且於放置一定時間之方法中,存在如下問題:表面處理所需要的時間長、至最終產品的製造效率差。因此,要求可容易地對基板進行表面處理的方法。However, in the plasma processing method, an appropriate device is required, and there are problems in terms of a process such as a cost and a phenomenon in which a toxic gas is generated; and in the method of placing a certain time, the following problems exist. : The time required for surface treatment is long, and the manufacturing efficiency of the final product is poor. Therefore, a method of easily performing surface treatment on a substrate is required.

另外,於日本專利特開2000-239601號公報中揭示了一種可形成滑水性表面之聚合物組成物,其特徵在於含有含水解性烷氧基矽烷基之矽氧烷聚合物(A)作為必須成分,所述含水解性烷氧基矽烷基之矽氧烷聚合物(A)是藉由如下成分之共聚合而所得的:(甲)以下述式所表示之矽氧烷巨單體(macromonomer)及/或特定之矽氧烷巨單體1 wt%~40 wt%、(乙)含水解性烷氧基矽烷基之單體5 wt%~50 wt%、及(丙)可與該些化合物共聚合之其他不飽和單體10 wt%~94 wt%。Further, a polymer composition capable of forming a water-sliding surface is disclosed in Japanese Laid-Open Patent Publication No. 2000-239601, which is characterized in that a hydroxane polymer (A) containing a hydrolyzable alkoxyalkyl group is required as a necessity. The component, the hydrolyzable alkoxyalkylalkyl group-containing alkoxyalkyl polymer (A) is obtained by copolymerization of the following components: (a) a macromonomer represented by the following formula (macromonomer) And/or a specific alkoxyalkyl macromonomer 1 wt% to 40 wt%, (b) a hydrolyzable alkoxyalkyl group-containing monomer 5 wt% to 50 wt%, and (c) may be The other unsaturated monomers in which the compound is copolymerized are from 10 wt% to 94 wt%.

[化1][Chemical 1]

於上述式中,Z1 表示碳數為1~10之烷基,Z2 表示碳數為1~6之二價烴基,Z3 表示氫原子或甲基,y為6~300之數。In the above formula, Z 1 represents an alkyl group having 1 to 10 carbon atoms, Z 2 represents a divalent hydrocarbon group having 1 to 6 carbon atoms, Z 3 represents a hydrogen atom or a methyl group, and y is a number of 6 to 300.

於日本專利特開2000-239601號公報中,揭示了將所述聚合物組成物用於如下用途:於某物體上附著水之情形時,即使不藉由拭去等機械性方法而將水強制性地除去,亦可僅僅傾斜物體而使附著之水滴滾落。In Japanese Patent Laid-Open Publication No. 2000-239601, it is disclosed that the polymer composition is used for the purpose of forcing water on an object, even if the water is not forced by mechanical means such as wiping off. If it is removed sexually, it is also possible to tilt the object and roll the attached water droplets.

本發明之課題在於提供一種為了即使於噴墨法等印刷手法中亦可形成微細之圖案膜,而能夠於基板上容易地進行斥墨化處理的表面處理劑。An object of the present invention is to provide a surface treatment agent capable of easily performing an ink repellent treatment on a substrate even when a fine pattern film can be formed in a printing method such as an inkjet method.

而且,若對基板進行表面處理,則於基板上形成表面處理膜,但由於構成電子零件之材料,而存在表面處理膜之斥墨性(斥液性)過高,對所述材料之基板(表面處理膜)的濕潤性不足之現象。若考慮此種情形,則較佳的是所述表面處理膜可於將濕潤性較低之材料塗佈於基板上時容易地除去。本發明之課題亦在於提供一種可形成能夠容易地除去之表面處理膜的表面處理劑。Further, when the substrate is subjected to a surface treatment, a surface treatment film is formed on the substrate. However, since the material constituting the electronic component is too high, the ink repellency (liquid repellency) of the surface treatment film is too high, and the substrate of the material is The surface treatment film) has insufficient wettability. In consideration of such a case, it is preferred that the surface treatment film can be easily removed when a material having low wettability is applied onto a substrate. Another object of the present invention is to provide a surface treatment agent which can form a surface treatment film which can be easily removed.

另外,於藉由噴墨法於基板上形成固體薄膜時,通常藉由使噴墨頭(inkjet head)一面於基板上往復若干次一面噴出油墨而形成固體薄膜。於此情形時,存在噴附於基板上之油墨濕潤擴散、部分性產生油墨重複塗佈之現象。構成該重複塗佈之部分的油墨膜厚比未構成重複塗佈之部分厚,其結果於固體薄膜上產生凹凸,無法獲得平坦之固體薄膜。Further, when a solid film is formed on a substrate by an inkjet method, a solid film is usually formed by ejecting ink on an inkjet head while reciprocating a plurality of times on the substrate. In this case, there is a phenomenon in which the ink sprayed on the substrate spreads and the ink is partially applied repeatedly. The thickness of the ink film constituting the portion to be repeatedly applied was thicker than the portion where the repeated coating was not formed, and as a result, irregularities were formed on the solid film, and a flat solid film could not be obtained.

因此,本發明之課題亦在於提供一種藉由賦予基板斥墨性,而能夠防止上述之油墨濕潤擴散,可形成無凹凸之平坦之固體薄膜的表面處理劑。Accordingly, an object of the present invention is to provide a surface treatment agent capable of preventing the above-described ink from being wet-diffused by imparting ink repellency to a substrate, thereby forming a flat solid film having no unevenness.

另外,於本案說明書中,所述固體薄膜是表示基板表面的整個面由構成電子零件之材料(油墨)所覆蓋的膜,上述圖案膜是指混合存在有基板表面露出的部位與由構成電子零件之材料(油墨)所覆蓋的部位之情形的由所述材料所形成之膜。Further, in the present specification, the solid film is a film in which the entire surface of the substrate surface is covered with a material (ink) constituting the electronic component, and the pattern film refers to a portion where the surface of the substrate is exposed and is composed of electronic components. A film formed of the material in the case of a portion covered by the material (ink).

本發明者為了解決上述課題而進行了銳意研究,結果發現由包含共聚物(所述共聚物具有由含有矽之特定化合物所衍生之結構單元、由具有親水性基之自由基聚合性單體所衍生之結構單元)及溶劑的表面處理劑可賦予基板優異之斥墨性,且可形成能夠容易地除去的表面處理膜,從而完成發明。The present inventors have conducted intensive studies to solve the above problems, and as a result, have found that a copolymer containing a structural unit derived from a specific compound containing ruthenium and a radically polymerizable monomer having a hydrophilic group is found. The surface treatment agent derived from the structural unit) and the solvent can impart excellent ink repellency to the substrate, and can form a surface treatment film which can be easily removed, thereby completing the invention.

本發明包含以下之事項。The present invention includes the following matters.

[1] 一種用以賦予基板斥墨性的表面處理劑,其特徵在於其包含共聚物以及溶劑(e),其中所述共聚物具有由下述通式(1)所表示之化合物(a)所衍生之結構單元與由具有親水性基之自由基聚合性單體(b)所衍生之結構單元:[1] A surface treatment agent for imparting ink repellency to a substrate, characterized in that it comprises a copolymer and a solvent (e), wherein the copolymer has a compound (a) represented by the following formula (1) The structural unit derived from the structural unit derived from the radical polymerizable monomer (b) having a hydrophilic group:

[化2][Chemical 2]

(於式(1)中,R1 、R2 及R5 分別獨立地表示氫或碳數為1~30之直鏈或分枝狀烷基,於該烷基中,任意之甲基亦可被環烷基取代,任意之不連續的亞甲基亦可被-O-或伸環烷基取代,任意之次甲基亦可被環烷三基(cycloalkane triyl)取代,任意之甲烷四基(methanetetrayl)亦可被環烷四基取代,R3 及R4 分別獨立地表示氫、碳數為1~30之直鏈或分枝狀烷基或者下述通式(2)所表示之基,於所述烷基中,任意之甲基亦可被環烷基取代,任意之不連續的亞甲基亦可被-O-或伸環烷基取代,任意之次甲基亦可被環烷三基取代,任意之甲烷四基亦可被環烷四基取代,n為1~1,000之整數,於n為2以上之情形時,多個存在之R3 以及R4 分別可相同亦可不同,A1 表示自由基聚合性官能基);(In the formula (1), R 1 , R 2 and R 5 each independently represent hydrogen or a linear or branched alkyl group having 1 to 30 carbon atoms, and any methyl group in the alkyl group may be used. Substituted by a cycloalkyl group, any discontinuous methylene group may be substituted by -O- or a cycloalkyl group, and any methine group may be substituted by cycloalkane triyl, any methane tetra group. (methanetetrayl) may also be substituted by a cycloalkyltetrayl group, and R 3 and R 4 each independently represent hydrogen, a linear or branched alkyl group having 1 to 30 carbon atoms or a group represented by the following formula (2) In the alkyl group, any methyl group may be substituted by a cycloalkyl group, and any discontinuous methylene group may be substituted by -O- or a cycloalkyl group, and any methine group may also be substituted by a ring. Alkyntriyl substitution, any methane tetrayl group may be substituted by a cycloalkyltetrayl group, n is an integer of from 1 to 1,000, and when n is 2 or more, a plurality of R 3 and R 4 may be the same or different Different, A 1 represents a radical polymerizable functional group);

[化3][Chemical 3]

(於式(2)中,R6 、R7 及R8 分別獨立地表示氫或碳數為1~30之直鏈或分枝狀烷基,於該烷基中,任意之甲基亦可被環烷基取代,任意之不連續的亞甲基亦可被-O-或伸環烷基取代,任意之次甲基亦可被環烷三基取代,任意之甲烷四基亦可被環烷四基取代,m為1~500之整數,於m為2以上之情形時,多個存在之R6 及R7 分別可相同亦可不同)。(In the formula (2), R 6 , R 7 and R 8 each independently represent hydrogen or a linear or branched alkyl group having 1 to 30 carbon atoms, and any methyl group may be used in the alkyl group. Substituted by a cycloalkyl group, any discontinuous methylene group may be substituted by -O- or a cycloalkyl group, and any methine group may be substituted by a cycloalkane group, and any methane tetra group may also be substituted by a ring. The alkynyl group is substituted, and m is an integer of from 1 to 500. When m is 2 or more, a plurality of R 6 and R 7 may be the same or different.

[2] 如[1]所述之表面處理劑,其中所述自由基聚合性單體(b)中之親水性基為羥基、羧基或酚性羥基。[2] The surface treatment agent according to [1], wherein the hydrophilic group in the radical polymerizable monomer (b) is a hydroxyl group, a carboxyl group or a phenolic hydroxyl group.

[3] 如[1]所述之表面處理劑,其中所述共聚物更具有由除了所述自由基聚合性單體(b)以外之自由基聚合性單體(c)所衍生之結構單元。[3] The surface treatment agent according to [1], wherein the copolymer further has a structural unit derived from a radical polymerizable monomer (c) other than the radical polymerizable monomer (b) .

[4] 如[1]所述之表面處理劑,其中於所述通式(1)及通式(2)中,所述直鏈或分枝狀烷基之碳數為1~20,A1 為(甲基)丙烯醯氧基烷基、(甲基)丙烯基或乙烯基,m為1~300之整數。[4] The surface treatment agent according to [1], wherein in the general formula (1) and the general formula (2), the linear or branched alkyl group has a carbon number of from 1 to 20, A. 1 is a (meth) propylene methoxyalkyl group, a (meth) propylene group or a vinyl group, and m is an integer of from 1 to 300.

[5] 如[1]~[4]中任一項所述之表面處理劑,其中所述化合物(a)為3-甲基丙烯醯氧基丙基三(methacryloxypropyl tris)(三甲基矽烷氧基)矽烷或下述通式(3)所表示之化合物:[5] The surface treatment agent according to any one of [1] to [4] wherein the compound (a) is 3-methacryloxypropyl tris (trimethylnonane) Oxy) decane or a compound represented by the following formula (3):

[化4][Chemical 4]

(於式(3)中,R9 為氫或碳數為1~20之直鏈或分枝狀烷基,於該烷基中,任意之甲基亦可被環烷基取代,任意之不連續的亞甲基亦可被-O-或伸環烷基取代,任意之次甲基亦可被環烷三基取代,任意之甲烷四基亦可被環烷四基取代,n為1~1000之整數)。(In the formula (3), R 9 is hydrogen or a linear or branched alkyl group having 1 to 20 carbon atoms, and any methyl group may be substituted by a cycloalkyl group in the alkyl group, and any The continuous methylene group may also be substituted by -O- or a cycloalkyl group, and any methine group may be substituted by a cycloalkane group, and any methane tetra group may also be substituted by a cycloalkane group, n is 1 to An integer of 1000).

[6] 如[1]所述之表面處理劑,其中所述自由基聚合性單體(b)為(甲基)丙烯酸或4-羥基苯基乙烯基酮。[6] The surface treatment agent according to [1], wherein the radical polymerizable monomer (b) is (meth)acrylic acid or 4-hydroxyphenylvinylketone.

[7] 如[3]所述之表面處理劑,其中所述自由基聚合性單體(c)為N-苯基馬來醯亞胺、(甲基)丙烯酸二甲基胺基乙酯或(甲基)丙烯酸丁酯。[7] The surface treatment agent according to [3], wherein the radical polymerizable monomer (c) is N-phenylmaleimide, dimethylaminoethyl (meth)acrylate or Butyl (meth)acrylate.

[8] 一種賦予基板斥墨性之方法,其具有使用如[1]所述之表面處理劑於基板上形成表面處理膜的步驟。[8] A method of imparting ink repellency to a substrate, comprising the step of forming a surface treatment film on a substrate using the surface treatment agent according to [1].

[9] 一種圖案膜之形成方法,其是藉由噴墨塗佈方法,於藉由如[8]所述之方法而賦予了斥墨性的基板上形成寬度為200 μm以下之圖案膜的方法。[9] A method of forming a pattern film by forming a pattern film having a width of 200 μm or less on a substrate to which ink repellent property is imparted by the method according to [8] by an inkjet coating method method.

[10] 一種電子零件,其具有:藉由如[9]所述之方法而形成之圖案膜。[10] An electronic component comprising: a pattern film formed by the method according to [9].

[11] 一種電子零件之製造方法,其特徵在於具有:使用如[1]所述之表面處理劑於基板上形成表面處理膜,於該表面處理膜上形成固體薄膜或圖案膜的步驟。[11] A method of producing an electronic component, comprising: forming a surface treatment film on a substrate using the surface treatment agent according to [1], and forming a solid film or a pattern film on the surface treatment film.

[發明效果][Effect of the invention]

由本發明之表面處理劑所形成之表面處理膜對噴墨噴出之液滴顯示出斥墨性,因此可藉由噴墨而形成微細之圖案膜及平坦之固體薄膜。另外,變得無用的表面處理膜可藉由鹼性水溶液等而容易地除去。因此,本發明之表面處理劑最適於在基板上形成電子電路圖案之用途等中。Since the surface treatment film formed by the surface treatment agent of the present invention exhibits ink repellent properties to the ink droplets ejected by the ink jet, a fine pattern film and a flat solid film can be formed by ink ejection. Further, the surface treatment film which becomes useless can be easily removed by an alkaline aqueous solution or the like. Therefore, the surface treatment agent of the present invention is most suitable for use in forming an electronic circuit pattern on a substrate or the like.

為讓本發明之上述和其他目的、特徵和優點能更明顯易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下。The above and other objects, features and advantages of the present invention will become more <RTIgt;

用以賦予本發明之基板斥墨性的表面處理劑(以下亦簡稱為「本發明之表面處理劑」)包含:共聚物,所述共聚物具有由下述通式(1)所表示之化合物(a)所衍生之結構單元、由具有親水性基之自由基聚合性單體(b)所衍生之結構單元,以及溶劑(e)。The surface treatment agent (hereinafter also referred to simply as "the surface treatment agent of the present invention") for imparting ink repellency to the substrate of the present invention comprises a copolymer having a compound represented by the following formula (1) (a) a structural unit derived, a structural unit derived from a radical polymerizable monomer (b) having a hydrophilic group, and a solvent (e).

[通式(1)所表示之化合物(a)][Compound (a) represented by the formula (1)]

構成本發明之表面處理劑中所含有之共聚物的由下述通式(1)所表示之化合物(a)所衍生之結構單元(以下亦簡稱為「結構單元(a)」),具有賦予基板為了形成微細之圖案膜而所需的充分的斥墨性的功能。The structural unit derived from the compound (a) represented by the following formula (1) (hereinafter also referred to simply as "structural unit (a)"), which is a copolymer contained in the surface treatment agent of the present invention, is imparted A sufficient ink repellency function required for the substrate to form a fine patterned film.

[化5][Chemical 5]

於式(1)中,R1 、R2 及R5 分別獨立地表示氫或碳數為1~30之直鏈或分枝狀烷基,於該烷基中,任意之甲基亦可被環烷基取代,任意之不連續的亞甲基亦可被-O-或伸環烷基取代,任意之次甲基亦可被環烷三基取代,任意之甲烷四基亦可被環烷四基取代,R3 及R4 分別獨立地表示氫、碳數為1~30之直鏈或分枝狀烷基或下述通式(2)所表示之基,於所述烷基中,任意之甲基亦可被環烷基取代,任意之不連續的亞甲基亦可被-O-或伸環烷基取代,任意之次甲基亦可被環烷三基取代,任意之甲烷四基亦可被環烷四基取代,n為1~1,000之整數,於n為2以上之情形時,多個存在之R3 及R4 分別可相同亦可不同,A1 表示自由基聚合性官能基。In the formula (1), R 1 , R 2 and R 5 each independently represent hydrogen or a linear or branched alkyl group having 1 to 30 carbon atoms, and in the alkyl group, any methyl group may be Substituted by a cycloalkyl group, any discontinuous methylene group may be substituted by -O- or a cycloalkyl group, and any methine group may be substituted by a cycloalkane group, and any methane tetra group may also be substituted by a naphthenic group. a tetra-substituent, wherein R 3 and R 4 each independently represent hydrogen, a linear or branched alkyl group having 1 to 30 carbon atoms, or a group represented by the following formula (2), in the alkyl group, Any methyl group may be substituted by a cycloalkyl group, and any discontinuous methylene group may be substituted by -O- or a cycloalkyl group, and any methine group may be substituted by a cycloalkane group, and any methane may be substituted. The tetra group may be substituted by a cycloalkane group, and n is an integer of from 1 to 1,000. When n is 2 or more, a plurality of R 3 and R 4 may be the same or different, and A 1 represents a radical polymerization. Sex functional group.

[化6][Chemical 6]

於式(2)中,R6 、R7 及R8 分別獨立地表示氫或碳數為1~30之直鏈或分枝狀烷基,於該烷基中,任意之甲基亦可被環烷基取代,任意之不連續的亞甲基亦可被-O-或伸環烷基取代,任意之次甲基亦可被環烷三基取代,任意之甲烷四基亦可被環烷四基取代,m為1~500之整數,於m為2以上之情形時,多個存在之R6 及R7 分別可相同亦可不同。In the formula (2), R 6 , R 7 and R 8 each independently represent hydrogen or a linear or branched alkyl group having 1 to 30 carbon atoms, and in the alkyl group, any methyl group may be Substituted by a cycloalkyl group, any discontinuous methylene group may be substituted by -O- or a cycloalkyl group, and any methine group may be substituted by a cycloalkane group, and any methane tetra group may also be substituted by a naphthenic group. The tetra group is substituted, and m is an integer of from 1 to 500. When m is 2 or more, a plurality of R 6 and R 7 may be the same or different.

上述式(1)及式(2)之說明中所記載的「碳數為1~30之直鏈或分枝狀烷基」中,所謂次甲基是自甲烷去掉3個氫的結構,於在構成烷基之任一碳中形成有1個分枝之情形時存在,所謂甲烷四基是自甲烷去掉4個氫的結構,於在構成烷基之一處的碳中形成有2個分枝之情形時存在。In the "linear or branched alkyl group having 1 to 30 carbon atoms" described in the description of the above formulas (1) and (2), the methine group is a structure in which three hydrogens are removed from methane. It is present in the case where one branch is formed in any of the carbons constituting the alkyl group, and the so-called methane tetra group is a structure in which four hydrogens are removed from methane, and two points are formed in carbon constituting one of the alkyl groups. The situation of the branch exists.

例如,所述烷基為戊基、且構成該戊基之一個亞甲基被伸環己基所取代之結構的例子可列舉如下。另外,於以下之結構中,「*」表示化學鍵。For example, examples of the structure in which the alkyl group is a pentyl group and one methylene group constituting the pentyl group is substituted by a cyclohexyl group can be exemplified below. In addition, in the following structure, "*" represents a chemical bond.

[化7][Chemistry 7]

而且,所述烷基為5-丙基辛基、且構成該5-丙基辛基之次甲基被環己烷三基所取代之結構的例子可列舉如下。另外,於以下之結構中,「*」表示化學鍵。Further, examples of the structure in which the alkyl group is a 5-propyloctyl group and the methine group constituting the 5-propyloctyl group is substituted with a cyclohexane triyl group are as follows. In addition, in the following structure, "*" represents a chemical bond.

[化8][化8]

上述環烷基、伸環烷基、環烷三基及環烷四基之碳數通常為4~12,自賦予基板優異之斥墨性之觀點考慮,較佳的是5~10,更佳的是6~8。The number of carbon atoms of the above cycloalkyl group, cycloalkylene group, cycloalkanetriyl group and cycloalkane group is usually 4 to 12, and preferably 5 to 10, more preferably from the viewpoint of imparting excellent ink repellency to the substrate. It is 6-8.

自賦予基板優異之斥墨性之觀點考慮,上述碳數為1~30之直鏈或分枝狀烷基的碳數較佳的是1~25,更佳的是1~20。另外,於該直鏈或分枝狀烷基中,當判斷所述烷基是否相當於所述「碳數為1~30之直鏈或分枝狀烷基」時,將亦可取代構成該烷基之甲基等的環烷基等的碳數設為1。即,例如下述式所表示之12-(5-癸基)環癸基十二烷基相當於本發明中之碳數為1~30之直鏈或分枝狀烷基。The carbon number of the linear or branched alkyl group having 1 to 30 carbon atoms is preferably from 1 to 25, more preferably from 1 to 20, from the viewpoint of imparting excellent ink repellency to the substrate. Further, in the linear or branched alkyl group, when it is judged whether or not the alkyl group corresponds to the "linear or branched alkyl group having 1 to 30 carbon atoms", it may be substituted for The number of carbon atoms such as a cycloalkyl group such as an alkyl group is set to 1. That is, for example, 12-(5-fluorenyl)cyclodecyldodecyl group represented by the following formula corresponds to a linear or branched alkyl group having 1 to 30 carbon atoms in the present invention.

[化9][Chemistry 9]

於上述式中,「*」表示化學鍵。In the above formula, "*" represents a chemical bond.

自賦予基板優異之斥墨性之觀點考慮,R1 、R2 及R5 較佳的是碳數為1~8之烷基,更佳的是碳數為1~4之烷基。From the viewpoint of imparting excellent ink repellency to the substrate, R 1 , R 2 and R 5 are preferably an alkyl group having 1 to 8 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms.

自賦予基板優異之斥墨性之觀點考慮,R3 及R4 較佳的是碳數為1~8之烷基,更佳的是碳數為1~4之烷基。From the viewpoint of imparting excellent ink repellency to the substrate, R 3 and R 4 are preferably an alkyl group having 1 to 8 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms.

而且,於通式(1)中,n為1~1000之整數,自賦予基板優異之斥墨性之觀點考慮,較佳的是1~500之整數,更佳的是1~300之整數。Further, in the formula (1), n is an integer of from 1 to 1,000, and is preferably an integer of from 1 to 500, more preferably an integer of from 1 to 300, from the viewpoint of imparting excellent ink repellency to the substrate.

另外,於通式(1)中,A1 表示自由基聚合性官能基。所謂「自由基聚合性」是指利用藉由照射光或進行加熱而產生之自由基從而開始聚合之性質。自由基聚合性官能基之例可列舉(甲基)丙烯醯氧基烷基、(甲基)丙烯基及乙烯基。於該些基中,特佳的是(甲基)丙烯醯氧基烷基。另外,(甲基)丙烯醯氧基烷基中之烷基的碳數通常為1~30,較佳的是1~20。Further, in the formula (1), A 1 represents a radical polymerizable functional group. The term "radical polymerizability" refers to a property in which polymerization is started by radicals generated by irradiation of light or heating. Examples of the radical polymerizable functional group include a (meth)acryloxyalkyl group, a (meth)acryl group, and a vinyl group. Of these groups, particularly preferred are (meth)acryloxyalkyl groups. Further, the alkyl group in the (meth)acryloxyalkyl group usually has 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms.

於上述通式(2)中,自賦予基板優異之斥墨性之觀點考慮,R6 、R7 及R8 較佳的是碳數為1~8之烷基,更佳的是碳數為1~4之烷基。In the above formula (2), R 6 , R 7 and R 8 are preferably an alkyl group having 1 to 8 carbon atoms, more preferably a carbon number, from the viewpoint of imparting excellent ink repellency to the substrate. Alkyl groups of 1 to 4.

而且,於通式(2)中,m為1~500之整數,但自賦予基板優異之斥墨性之觀點考慮,較佳的是1~300之整數,更佳的是1~100之整數。Further, in the formula (2), m is an integer of from 1 to 500, but from the viewpoint of imparting excellent ink repellency to the substrate, an integer of from 1 to 300 is preferable, and an integer of from 1 to 100 is more preferable. .

此種化合物(a)之較佳的具體例可列舉3-甲基丙烯醯氧基丙基三(三甲基矽烷氧基)矽烷及下述通式(3)所表示之單甲基丙烯醯基末端-二甲基矽氧烷。Preferable specific examples of the compound (a) include 3-methacryloxypropyltris(trimethyldecyloxy)decane and monomethylpropene oxime represented by the following formula (3). Base end - dimethyl methoxy alkane.

[化10][化10]

於式(3)中,R9 為氫或碳數為1~20之直鏈或分枝狀烷基,於該烷基中,任意之甲基亦可被環烷基取代,任意之不連續的亞甲基亦可被-O-或伸環烷基取代,任意之次甲基亦可被環烷三基取代,任意之甲烷四基亦可被環烷四基取代,n為1~1000之整數。In the formula (3), R 9 is hydrogen or a linear or branched alkyl group having 1 to 20 carbon atoms, and in the alkyl group, any methyl group may be substituted by a cycloalkyl group, and any discontinuity thereof The methylene group may also be substituted by -O- or a cycloalkyl group, and any methine group may be substituted by a cycloalkane group, and any methane tetra group may be substituted by a cycloalkane group, n is from 1 to 1000. The integer.

於式(3)中,自賦予基板優異之斥墨性之觀點考慮,R9 較佳的是丁基,n較佳的是1~100之整數。In the formula (3), R 9 is preferably a butyl group, and n is preferably an integer of from 1 to 100 from the viewpoint of imparting excellent ink repellency to the substrate.

於製造本發明之表面處理劑中所含之共聚物時,上述化合物(a)可單獨使用一種,亦可併用兩種以上。In the case of producing the copolymer contained in the surface treatment agent of the present invention, the above compound (a) may be used alone or in combination of two or more.

另外,化合物(a)之製造方法已為眾人所公知,且亦有所市售。Further, a method for producing the compound (a) is well known and commercially available.

[具有親水性基之自由基聚合性單體(b)][Free radical polymerizable monomer (b) having a hydrophilic group]

由具有親水性基之自由基聚合性單體(b)所衍生之結構單元(以下亦簡稱為「結構單元(b)」),對本發明之表面處理劑中所含之共聚物賦予鹼可溶性,且可藉由鹼性水溶液而容易地除去於基板上塗佈本發明之表面處理劑、使塗膜乾燥或對塗膜進行煅燒所形成的表面處理膜。The structural unit derived from the radical polymerizable monomer (b) having a hydrophilic group (hereinafter also referred to simply as "structural unit (b)") imparts alkali solubility to the copolymer contained in the surface treatment agent of the present invention. Further, the surface treatment film formed by coating the surface treatment agent of the present invention on the substrate, drying the coating film, or calcining the coating film can be easily removed by an aqueous alkaline solution.

自由基聚合性單體(b)若為具有親水性基且可進行自由基聚合之化合物,則無特別之限定。The radical polymerizable monomer (b) is not particularly limited as long as it is a compound having a hydrophilic group and capable of undergoing radical polymerization.

所述親水性基可列舉羥基、羧基、酚性羥基及胺基等,自除去表面處理膜之容易性、賦予斥墨性之觀點考慮,該些親水性基中較佳的是羥基、羧基及酚性羥基。The hydrophilic group may, for example, be a hydroxyl group, a carboxyl group, a phenolic hydroxyl group or an amine group. From the viewpoint of easiness of removing the surface treatment film and imparting ink repellency, the hydrophilic group is preferably a hydroxyl group or a carboxyl group. Phenolic hydroxyl group.

此種具有親水性基之自由基聚合性單體(b)之具體例可列舉(甲基)丙烯酸、伊康酸及乙烯基乙酸等具有不飽和羧酸部位之自由基聚合性單體,4-羥基苯基乙烯基酮及羥基苯乙烯等具有酚性羥基之自由基聚合性單體。Specific examples of the radically polymerizable monomer (b) having such a hydrophilic group include a radical polymerizable monomer having an unsaturated carboxylic acid moiety such as (meth)acrylic acid, itaconic acid or vinyl acetic acid, and 4 a radical polymerizable monomer having a phenolic hydroxyl group such as hydroxyphenyl vinyl ketone or hydroxystyrene.

自提高本發明之表面處理膜的鹼可溶性之觀點考慮,該些化合物中較佳的是(甲基)丙烯酸及4-羥基苯基乙烯基酮。Preferred from the viewpoint of improving the alkali solubility of the surface-treating film of the present invention, (meth)acrylic acid and 4-hydroxyphenylvinylketone are preferred among the compounds.

於製造本發明之表面處理劑中所含之共聚物時,上述自由基聚合性單體(b)可單獨使用一種,亦可併用兩種以上。In the case of producing the copolymer contained in the surface treatment agent of the present invention, the above-mentioned radical polymerizable monomer (b) may be used alone or in combination of two or more.

[自由基聚合性單體(b)以外之自由基聚合性單體(c)]本發明之表面處理劑中所含之共聚物,除上述結構單元(a)及結構單元(b)以外,亦可視需要具有由自由基聚合性單體(b)以外之自由基聚合性單體(c)所衍生之結構單元(以下亦簡稱為「結構單元(c)」)。所述共聚物藉由具有結構單元(c)而提高本發明之表面處理劑之對基板的塗佈性。[The radically polymerizable monomer (c) other than the radically polymerizable monomer (b)] The copolymer contained in the surface treatment agent of the present invention, in addition to the above structural unit (a) and structural unit (b), It is also possible to have a structural unit derived from a radical polymerizable monomer (c) other than the radical polymerizable monomer (b) (hereinafter also referred to simply as "structural unit (c)"). The copolymer improves the coatability of the surface treatment agent of the present invention to the substrate by having the structural unit (c).

自由基聚合性單體(c)若為自由基聚合性單體(b)以外之自由基聚合性單體則並無特別限制,例如為(甲基)丙烯酸酯、具有不飽和羧酸酐部位之自由基聚合性單體、乙烯系化合物以及醯亞胺化合物。所述具有不飽和羧酸酐部位之自由基聚合性單體之例子可列舉馬來酸酐及伊康酸酐。The radical polymerizable monomer (c) is not particularly limited as long as it is a radical polymerizable monomer other than the radical polymerizable monomer (b), and is, for example, a (meth) acrylate having an unsaturated carboxylic anhydride moiety. A radical polymerizable monomer, a vinyl compound, and a quinone imine compound. Examples of the radical polymerizable monomer having an unsaturated carboxylic anhydride moiety include maleic anhydride and itaconic anhydride.

自由基聚合性單體(c)之具體例可列舉:N-苯基馬來醯亞胺、環己基馬來醯亞胺、馬來酸酐、伊康酸酐、乙酸乙烯酯、丙烯酸二甲基胺基乙酯、(甲基)丙烯酸二環戊基酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯及(甲基)丙烯酸丁酯。自提高塗佈性之觀點考慮,該些化合物中較佳的是N-苯基馬來醯亞胺、(甲基)丙烯酸二甲基胺基乙酯及(甲基)丙烯酸丁酯。Specific examples of the radical polymerizable monomer (c) include N-phenylmaleimide, cyclohexylmaleimide, maleic anhydride, itaconic anhydride, vinyl acetate, and dimethylamine acrylate. Ethyl ethyl ester, dicyclopentyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate and butyl (meth) acrylate. Preferred among these compounds are N-phenylmaleimide, dimethylaminoethyl (meth)acrylate and butyl (meth)acrylate from the viewpoint of improving coatability.

於製造本發明之表面處理劑中所含之共聚物時,上述自由基聚合性單體(c)可單獨使用一種,亦可併用兩種以上。In the case of producing the copolymer contained in the surface treatment agent of the present invention, the above-mentioned radical polymerizable monomer (c) may be used alone or in combination of two or more.

<共聚物之聚合方法><Copolymerization method of copolymer>

化合物(a)、自由基聚合性單體(b)及視需要而使用之自由基聚合性單體(c)的聚合方法並無特別限定,可採用通常之自由基聚合方法。The polymerization method of the compound (a), the radically polymerizable monomer (b), and the radically polymerizable monomer (c) used as needed is not particularly limited, and a usual radical polymerization method can be employed.

例如,可將化合物(a)、自由基聚合性單體(b)及自由基聚合性單體(c)之混合物於溶劑中進行攪拌、回流,由此使其進行自由基聚合而獲得本發明之表面處理劑中所含之共聚物。另外,用作聚合溶劑之所述溶劑亦可直接用作後述之溶劑(e)。For example, the mixture of the compound (a), the radical polymerizable monomer (b), and the radical polymerizable monomer (c) can be stirred and refluxed in a solvent to carry out radical polymerization to obtain the present invention. The copolymer contained in the surface treatment agent. Further, the solvent used as a polymerization solvent can also be directly used as the solvent (e) to be described later.

較佳的是添加聚合起始劑(d)而實施自由基聚合。聚合起始劑(d)通常為藉由熱而產生自由基之化合物,其具體例可列舉偶氮雙異丁腈及2,2-偶氮雙(2-甲基丙酸)二甲酯等偶氮系起始劑、以及過氧化苯甲醯等過氧化物系起始劑。It is preferred to carry out radical polymerization by adding a polymerization initiator (d). The polymerization initiator (d) is usually a compound which generates a radical by heat, and specific examples thereof include azobisisobutyronitrile and 2,2-azobis(2-methylpropionic acid) dimethyl ester. An azo-based initiator and a peroxide-based initiator such as benzamidine peroxide.

聚合反應中之回流溫度為所使用之溶劑的沸點,且必須為由聚合起始劑(d)而充分地產生自由基之溫度。滿足此種條件之溶劑之沸點通常為50℃~150℃之範圍。The reflux temperature in the polymerization reaction is the boiling point of the solvent to be used, and must be a temperature at which radicals are sufficiently generated from the polymerization initiator (d). The boiling point of the solvent satisfying such conditions is usually in the range of 50 ° C to 150 ° C.

關於回流時間亦無特別之限定,通常為1小時~24小時之範圍。而且,該聚合亦可於加壓、減壓或大氣壓之任意壓力下進行。The reflux time is also not particularly limited and is usually in the range of 1 hour to 24 hours. Further, the polymerization can also be carried out under any pressure of pressure, reduced pressure or atmospheric pressure.

而且,為了調整共聚物之分子量,亦可於聚合反應系統內適量添加巰乙酸(thioglycolic acid)等鏈轉移劑。Further, in order to adjust the molecular weight of the copolymer, a chain transfer agent such as thioglycolic acid may be added in an appropriate amount in the polymerization reaction system.

<共聚物之組成比例><Composition ratio of copolymer>

於以上述方式而製造的本發明之表面處理劑中所含之共聚物中,結構單元(a)之組成比例,自表現出表面處理膜之斥墨性的觀點考慮,相對於結構單元(a)及結構單元(b)之合計100 wt%而言較佳的是1 wt%~95 wt%,更佳的是5 wt%~90 wt%,進一步更佳的是10 wt%~85 wt%。In the copolymer contained in the surface treatment agent of the present invention produced in the above manner, the composition ratio of the structural unit (a) is relative to the structural unit from the viewpoint of exhibiting the ink repellent property of the surface treatment film. And 100 wt% of the structural unit (b) is preferably from 1 wt% to 95 wt%, more preferably from 5 wt% to 90 wt%, still more preferably from 10 wt% to 85 wt%. .

而且,結構單元(b)於所述共聚物中之組成比例,自提高表面處理膜於鹼性水溶液中之溶解性的觀點考慮,相對於結構單元(a)及結構單元(b)之合計100 wt%而言較佳的是5 wt%~99 wt%,更佳的是10 wt%~95 wt%,進一步更佳的是15 wt%~90 wt%。Further, the composition ratio of the structural unit (b) in the copolymer is from the viewpoint of improving the solubility of the surface treatment film in the alkaline aqueous solution, with respect to the total of the structural unit (a) and the structural unit (b) The wt% is preferably from 5 wt% to 99 wt%, more preferably from 10 wt% to 95 wt%, still more preferably from 15 wt% to 90 wt%.

所述共聚物亦可具有結構單元(c),於此情形時,結構單元(c)之組成比例相對於共聚物100 wt%而言較佳的是10 wt%~90 wt%,更佳的是20 wt%~87 wt%,進一步更佳的是25 wt%~85 wt%。The copolymer may also have a structural unit (c). In this case, the composition ratio of the structural unit (c) is preferably 10% by weight to 90% by weight based on 100% by weight of the copolymer, more preferably It is 20 wt% to 87 wt%, and more preferably 25 wt% to 85 wt%.

可以藉由調節聚合反應中之化合物(a)、自由基聚合性單體(b)及自由基聚合性單體(c)的裝入量,而將由各化合物所衍生之結構單元之組成比例調整為上述範圍。The composition ratio of the structural unit derived from each compound can be adjusted by adjusting the loading amount of the compound (a), the radical polymerizable monomer (b), and the radical polymerizable monomer (c) in the polymerization reaction. For the above range.

<共聚物之重量平均分子量><weight average molecular weight of copolymer>

本發明之表面處理劑中所含有之共聚物的重量平均分子量並無特別之限制,通常為1000~100000,自塗佈性之觀點考慮,較佳的是5000~50000。另外,於本說明書中,所謂重量平均分子量是藉由GPC而測定之標準聚苯乙烯換算之重量平均分子量。更詳細而言,是使用島津製作所股份有限公司製造之LC-10AT系統、RID-6A(RI檢測器)、CTO-6A(管柱烘箱)作為GPC裝置,使用POLYMER Laboratories製造之THF系管柱(PLgel 5 μm MIXED-D管柱)作為管柱,藉由GPC法(管柱溫度:35℃、流速:1 ml/min)而求得之聚苯乙烯換算之值。The weight average molecular weight of the copolymer contained in the surface treatment agent of the present invention is not particularly limited, but is usually from 1,000 to 100,000, and from the viewpoint of coatability, it is preferably from 5,000 to 50,000. In the present specification, the weight average molecular weight is a weight average molecular weight in terms of standard polystyrene measured by GPC. More specifically, the LC-10AT system manufactured by Shimadzu Corporation, RID-6A (RI detector), CTO-6A (column oven) was used as the GPC apparatus, and the THF piping column manufactured by POLYMER Laboratories was used. PLgel 5 μm MIXED-D column) The polystyrene conversion value obtained by the GPC method (column temperature: 35 ° C, flow rate: 1 ml/min) as a column.

可藉由調整化合物(a)之種類(通式(1)及通式(2)中之n及m之數)、回流時間、聚合起始劑之添加量等而使共聚物之重量平均分子量為上述範圍。The weight average molecular weight of the copolymer can be adjusted by adjusting the kind of the compound (a) (the number of n and m in the formula (1) and the formula (2)), the reflux time, the addition amount of the polymerization initiator, and the like. For the above range.

[溶劑(e)][solvent (e)]

於本發明之表面處理劑中,為了提高該處理劑之塗佈性而包含溶劑(e)。溶劑(e)較佳的是可溶解化合物(a)及自由基聚合性單體(b)、進一步可溶解自由基聚合性單體(c)之溶劑。其原因在於:於將此種溶劑用於製造所述共聚物之情形時,若於聚合反應結束時殘存有所述溶劑,則可將其直接用作溶劑(e)。In the surface treatment agent of the present invention, the solvent (e) is contained in order to improve the coatability of the treatment agent. The solvent (e) is preferably a solvent which can dissolve the compound (a) and the radical polymerizable monomer (b) and further dissolve the radical polymerizable monomer (c). The reason for this is that when such a solvent is used for the production of the copolymer, if the solvent remains at the end of the polymerization reaction, it can be directly used as the solvent (e).

自塗佈於基板上的本發明之表面處理劑之乾燥的容易性之觀點考慮,較佳的是本發明中所使用之溶劑(e)的沸點為50℃~250℃。The solvent (e) used in the present invention preferably has a boiling point of 50 ° C to 250 ° C from the viewpoint of easiness of drying the surface treatment agent of the present invention applied to the substrate.

沸點為50℃~250℃之溶劑(e)的具體例可列舉甲醇、丁酮、乙醇、1-丙醇、2-丙醇、乙酸乙酯、二甲苯、甲苯、己烷、異丁醇、甲基異丁基酮、甲基丁基酮、丙酮、3-甲氧基丙酸甲酯、乙二醇單乙醚、丙二醇單甲醚、丙二醇單甲醚乙酸酯、二乙二醇甲基乙基醚、二乙二醇單乙醚、二乙二醇單丁醚、二乙二醇單丁醚乙酸酯、二乙二醇丁基甲基醚、二丙二醇甲基醚乙酸酯、三乙二醇二甲醚、三丙二醇單甲醚及三丙二醇二甲醚。Specific examples of the solvent (e) having a boiling point of 50 ° C to 250 ° C include methanol, methyl ethyl ketone, ethanol, 1-propanol, 2-propanol, ethyl acetate, xylene, toluene, hexane, isobutanol, Methyl isobutyl ketone, methyl butyl ketone, acetone, methyl 3-methoxypropionate, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, diethylene glycol methyl Ethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol butyl methyl ether, dipropylene glycol methyl ether acetate, triethylene glycol Alcohol dimethyl ether, tripropylene glycol monomethyl ether and tripropylene glycol dimethyl ether.

於將表面處理劑塗佈於基板上後,並不進行煅燒而作為表面處理膜使用之情形時,較佳的是使用乙醇、丙酮及丁酮等低沸點溶劑。When the surface treatment agent is applied to a substrate and then used as a surface treatment film without being calcined, it is preferred to use a low boiling point solvent such as ethanol, acetone or methyl ethyl ketone.

本發明中所使用之溶劑(e)可以是單一之化合物,亦可為2種以上之混合溶劑。The solvent (e) used in the present invention may be a single compound or a mixed solvent of two or more kinds.

而且,於本發明之表面處理劑中,較佳的是以固形物之共聚物相對於共聚物及溶劑(e)之總量而成為0.01 wt%~50 wt%之方式調配溶劑(e)。Further, in the surface treatment agent of the present invention, it is preferred to prepare the solvent (e) such that the copolymer of the solid matter is 0.01 wt% to 50 wt% with respect to the total amount of the copolymer and the solvent (e).

另外,較佳之固形物濃度根據本發明之表面處理劑之塗佈方法而有所變化。例如,於藉由浸漬法塗佈表面處理劑之情形時,固形物濃度較佳的是0.01 wt%~30 wt%,更佳的是0.05 wt%~20 wt%;於利用布等之塗封法之情形時,固形物濃度較佳的是0.01 wt%~20 wt%,更佳的是0.5 wt%~15 wt%;於旋塗法之情形時,固形物濃度較佳的是0.01 wt%~50 wt%,更佳的是0.05~40 wt%。Further, the preferred solid content concentration varies depending on the coating method of the surface treatment agent of the present invention. For example, when the surface treatment agent is applied by the dipping method, the solid content concentration is preferably 0.01 wt% to 30 wt%, more preferably 0.05 wt% to 20 wt%; and coated with a cloth or the like. In the case of the method, the solid concentration is preferably 0.01 wt% to 20 wt%, more preferably 0.5 wt% to 15 wt%; in the case of the spin coating method, the solid concentration is preferably 0.01 wt%. ~50 wt%, more preferably 0.05 to 40 wt%.

[添加劑][additive]

於用以賦予本發明之基板斥墨性之表面處理劑中,為了提高塗佈均勻性、表面處理膜與基板之密著性、鹼溶解性等,可視需要添加添加劑。添加劑可列舉陰離子系、陽離子系、非離子系、氟系或矽系之界面活性劑,矽烷偶合劑等密著性促進劑,烷氧基二苯甲酮類等紫外線吸收劑等。In the surface treatment agent for imparting ink repellency to the substrate of the present invention, an additive may be added as needed in order to improve coating uniformity, adhesion between the surface treatment film and the substrate, alkali solubility, and the like. Examples of the additives include anionic, cationic, nonionic, fluorine- or quinone-based surfactants, adhesion promoters such as decane coupling agents, and ultraviolet absorbers such as alkoxybenzophenones.

[表面處理劑之保存][Preservation of surface treatment agent]

用以賦予本發明之基板斥墨性之表面處理劑若於溫度為-30℃~30℃之範圍內遮光保存,則經時穩定性良好而較佳。若保存溫度為-10℃~20℃,則無析出物而更佳。When the surface treatment agent for imparting ink repellency to the substrate of the present invention is stored in a light-shielding manner at a temperature of from -30 ° C to 30 ° C, the stability over time is good. If the storage temperature is -10 ° C to 20 ° C, there is no precipitate and it is more preferable.

[本發明之表面處理劑之塗佈法][Coating method of surface treatment agent of the present invention]

本發明之表面處理劑之表面處理膜,可利用於噴墨領域中通常進行之方法或者其他公知之方法,於玻璃等基板上塗佈表面處理劑而形成。The surface treatment film of the surface treatment agent of the present invention can be formed by applying a surface treatment agent to a substrate such as glass by a method generally performed in the field of inkjet or other known methods.

塗佈方法例如可列舉旋塗、輥塗、狹縫塗佈、或噴墨法、絲網印刷法等。Examples of the coating method include spin coating, roll coating, slit coating, or an inkjet method, a screen printing method, and the like.

塗佈本發明之表面處理劑之基板例如可列舉:白板玻璃、青板玻璃、二氧化矽塗層青板玻璃等透明玻璃基板,聚碳酸酯、聚醚碸、聚酯、丙烯酸樹脂、聚氯乙烯樹脂、芳香族聚醯胺樹脂、聚醯胺-醯亞胺、聚醯亞胺等之合成樹脂製薄板、膜或基板,鋁板、銅板、鎳板、不鏽鋼板等金屬板,其他陶瓷板,具有光電轉換元件之半導體基板等。Examples of the substrate to which the surface treatment agent of the present invention is applied include a transparent glass substrate such as white plate glass, blue plate glass, ceria coated green plate glass, polycarbonate, polyether oxime, polyester, acrylic resin, and polychlorinated chloride. a synthetic resin sheet, a film or a substrate made of a vinyl resin, an aromatic polyamide resin, a polyamide, a phthalimide or a polyimide, a metal plate such as an aluminum plate, a copper plate, a nickel plate or a stainless steel plate, or another ceramic plate. A semiconductor substrate or the like having a photoelectric conversion element.

該些基板不必為平面狀,若為可塗佈本發明之表面處理劑之基板,則亦可為曲面狀。These substrates do not have to be planar, and may be curved when they are coated with the surface treatment agent of the present invention.

而且,亦可不利用上述方法,而是使本發明之表面處理劑含浸於碎紗、布等中,藉由該些對基板表面進行擦拭而於基板上塗佈本發明之表面處理劑,或者將基板一同浸漬於表面處理劑中,經過規定時間後取出而進行塗佈。Further, the surface treatment agent of the present invention may be impregnated into the pulverized yarn, the cloth or the like without using the above method, and the surface treatment agent of the present invention may be applied to the substrate by wiping the surface of the substrate, or The substrate is immersed in the surface treatment agent together, and after a predetermined period of time, it is taken out and applied.

以上述方法而塗佈有表面處理劑之基板可直接風乾,亦可進行煅燒以進一步提高表面處理膜對基板之密著性或者可靠性。煅燒溫度若為使表面處理劑中之溶劑(e)乾燥的溫度則並無特別之限定,較佳的是50℃~300℃,更佳的是70℃~250℃,進一步更佳的是80℃~230℃。The substrate coated with the surface treatment agent by the above method may be directly air-dried or calcined to further improve the adhesion or reliability of the surface treatment film to the substrate. The calcination temperature is not particularly limited as long as the solvent (e) in the surface treatment agent is dried, and is preferably 50 to 300 ° C, more preferably 70 to 250 ° C, still more preferably 80. °C ~ 230 °C.

若賦予進行了表面處理之基板斥墨性,於基板上(確切而言為表面處理膜上)藉由噴墨法、絲網印刷法等描繪所期望之圖案,則可形成通常情況下寬度為200 μm以下、較佳的是寬度為100 μm以下之微細圖案膜。而且,於以噴墨法形成固體薄膜之情形時,藉由賦予基板斥墨性,而獲得油墨並不濕潤擴散、即使實施噴墨法亦不出現重複塗佈之部分、且無凹凸之平坦之固體薄膜。When the surface repellency of the surface-treated substrate is imparted, a desired pattern can be formed on the substrate (specifically, on the surface-treated film) by an inkjet method, a screen printing method, or the like, and the width can be normally formed. 200 μm or less, preferably a fine pattern film having a width of 100 μm or less. Further, when a solid film is formed by an inkjet method, ink is imparted to the substrate to obtain ink repellency, and the ink is not wet-diffused, and even if the ink-jet method is applied, the portion to be repeatedly coated does not appear, and the unevenness is not flat. Solid film.

而且,於描繪圖案等之後,變得不要之部位的表面處理部分可藉由鹼性水溶液等而容易地除去。Further, after the pattern or the like is drawn, the surface-treated portion of the portion which becomes unnecessary may be easily removed by an alkaline aqueous solution or the like.

<不要部分之表面處理膜之除去法><Do not remove part of the surface treatment film>

藉由噴墨法、絲網印刷法等而用油墨描繪所期望之圖案等後,進一步塗佈對表面處理膜之濕潤性不足的材料之情形時,於塗佈材料之部分所形成之不要之表面處理膜,可藉由鹼性水溶液而容易地除去。When a desired pattern or the like is drawn with ink by an inkjet method, a screen printing method, or the like, and a material having insufficient wettability to the surface treatment film is further applied, the portion formed in the coating material is not formed. The surface treatment film can be easily removed by an aqueous alkaline solution.

鹼性水溶液中所含之鹼之具體例可列舉四甲基氫氧化銨(TMAH)、四乙基氫氧化銨、2-羥基乙基三甲基氫氧化銨、碳酸鈉、碳酸氫鈉、碳酸鉀、碳酸氫鉀、氫氧化鈉及氫氧化鉀。Specific examples of the base contained in the alkaline aqueous solution include tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide, 2-hydroxyethyltrimethylammonium hydroxide, sodium carbonate, sodium hydrogencarbonate, and carbonic acid. Potassium, potassium bicarbonate, sodium hydroxide and potassium hydroxide.

於鹼性水溶液中,為了提高表面處理膜對於鹼性水溶液之溶解性等,亦可添加甲醇、乙醇或界面活性劑。界面活性劑例如可使用選自陰離子系、陽離子系及非離子系之界面活性劑。In the alkaline aqueous solution, methanol, ethanol or a surfactant may be added in order to increase the solubility of the surface treatment film to the alkaline aqueous solution. As the surfactant, for example, an anionic, cationic or nonionic surfactant can be used.

鹼性水溶液之濃度並無特別之限定,較佳的是0.01 wt%~10 wt%,更佳的是0.05 wt%~5 wt%,進一步更佳的是0.1 wt%~3 wt%。而且,將基板浸漬於鹼性水溶液中之時間,若為可完全除去不要之表面處理膜的時間則無特別之限定,較佳的是30秒~120秒,更佳的是40秒~100秒,進一步更佳的是50秒~90秒。另外,鹼性水溶液之溫度並無特別之限定,通常為15℃~35℃,較佳的是20℃~30℃。The concentration of the alkaline aqueous solution is not particularly limited, and is preferably 0.01 wt% to 10 wt%, more preferably 0.05 wt% to 5 wt%, still more preferably 0.1 wt% to 3 wt%. Further, the time during which the substrate is immersed in the alkaline aqueous solution is not particularly limited as long as the surface treatment film can be completely removed, and preferably 30 seconds to 120 seconds, more preferably 40 seconds to 100 seconds. Further better is 50 seconds to 90 seconds. Further, the temperature of the alkaline aqueous solution is not particularly limited, and is usually 15 ° C to 35 ° C, preferably 20 ° C to 30 ° C.

以如上方式於基板上形成微細之圖案膜後,經過塗佈彩墨等規定之製造步驟,製造被稱為液晶顯示元件之電子零件。可藉由本發明之表面處理劑於經表面處理之基板上形成微細之圖案膜,因此可獲得更小型之電子零件。After forming a fine pattern film on the substrate as described above, an electronic component called a liquid crystal display element is produced by a predetermined manufacturing process such as applying color ink. A fine patterned film can be formed on the surface-treated substrate by the surface treating agent of the present invention, so that a smaller electronic component can be obtained.

[實例][Example]

以下,藉由實例對本發明進一步加以說明,但本發明不限定於該些實例。Hereinafter, the present invention will be further illustrated by way of examples, but the invention is not limited to the examples.

於以下中,有時藉由如下所示之記號表示合成例及比較合成例中所使用之化合物(a)、自由基聚合性單體(b)、自由基聚合性單體(c)、聚合起始劑(d)及溶劑(e)。In the following, the compound (a), the radical polymerizable monomer (b), the radical polymerizable monomer (c), and the polymerization used in the synthesis example and the comparative synthesis example are indicated by the following symbols. Starting agent (d) and solvent (e).

<化合物(a)><compound (a)>

a-1:3-甲基丙烯醯氧基丙基三(三甲基矽烷氧基)矽烷A-1: 3-methacryloxypropyltris(trimethyldecyloxy)decane

a-2:α-丁基-ω-(3-甲基丙烯醯氧基丙基)聚二甲基矽氧烷(於上述通式(3)中,R9 為正丁基、n為2之化合物)。A-2: α-butyl-ω-(3-methylpropenyloxypropyl)polydimethyloxane (in the above formula (3), R 9 is n-butyl group, and n is 2 Compound).

<自由基聚合性單體(b)><Free radical polymerizable monomer (b)>

b-1:甲基丙烯酸B-1: methacrylic acid

b-2:4-羥基苯基乙烯基酮。B-2: 4-hydroxyphenyl vinyl ketone.

<自由基聚合性單體(c)><Free radical polymerizable monomer (c)>

c-1:甲基丙烯酸丁酯C-1: butyl methacrylate

c-2:N-苯基馬來醯亞胺C-2: N-phenyl maleimide

c-3:丙烯酸二甲基胺基乙酯。C-3: dimethylaminoethyl acrylate.

<聚合起始劑(d)><Polymerization initiator (d)>

d-1:2,2-偶氮雙(2-甲基丙酸)二甲酯。D-1: 2,2-azobis(2-methylpropionic acid) dimethyl ester.

<溶劑(e)><solvent (e)>

e-1:丁酮。E-1: methyl ethyl ketone.

[合成例1]共聚物(A1)之合成[Synthesis Example 1] Synthesis of Copolymer (A1)

於附有攪拌器之四口燒瓶中,按照下述重量比例裝入作為化合物(a)之α-丁基-ω-(3-甲基丙烯醯氧基丙基)聚二甲基矽氧烷(a-2)、作為自由基聚合性單體(b)之甲基丙烯酸(b-1)、作為自由基聚合性單體(c)之甲基丙烯酸丁酯(c-1)、作為聚合起始劑(d)之2,2-偶氮雙(2-甲基丙酸)二甲酯(d-1)、作為溶劑(e)之丁酮(e-1),於80℃下進行2小時之回流。Into a four-necked flask equipped with a stirrer, α-butyl-ω-(3-methylpropenyloxypropyl)polydimethyloxane as a compound (a) was charged in the following weight ratio. (a-2), methacrylic acid (b-1) as the radical polymerizable monomer (b), butyl methacrylate (c-1) as the radical polymerizable monomer (c), and polymerization 2,2-azobis(2-methylpropionic acid) dimethyl ester (d-1) as initiator (d), butanone (e-1) as solvent (e), carried out at 80 ° C 2 hours of reflux.

a-2 8.100 gA-2 8.100 g

b-1 2.025 gB-1 2.025 g

c-1 3.375 gC-1 3.375 g

d-1 2.025 gD-1 2.025 g

e-1 27.0 g。E-1 27.0 g.

將反應混合物冷卻至室溫,獲得共聚物(A1)。取樣出溶液之一部分,藉由GPC分析(聚苯乙烯標準)測定共聚物(A1)之重量平均分子量。其結果,重量平均分子量為15,000。The reaction mixture was cooled to room temperature to obtain a copolymer (A1). A portion of the solution was sampled and the weight average molecular weight of the copolymer (A1) was determined by GPC analysis (polystyrene standard). As a result, the weight average molecular weight was 15,000.

[合成例2]共聚物(A2)之合成[Synthesis Example 2] Synthesis of Copolymer (A2)

以與合成例1同樣地按照下述之重量比例裝入下述之成分,進行回流。In the same manner as in Synthesis Example 1, the following components were charged in the following weight ratios, and refluxed.

a-1 8.100 gA-1 8.100 g

b-1 2.025 gB-1 2.025 g

c-1 3.375 gC-1 3.375 g

d-1 2.025 gD-1 2.025 g

e-1 27.0 g。E-1 27.0 g.

進行與合成例1同樣之處理,所得之共聚物(A2)之藉由GPC分析(聚苯乙烯標準)所求得之重量平均分子量為14,800。The same treatment as in Synthesis Example 1 was carried out, and the weight average molecular weight determined by GPC analysis (polystyrene standard) of the obtained copolymer (A2) was 14,800.

[合成例3]共聚物(A3)之合成[Synthesis Example 3] Synthesis of Copolymer (A3)

以與合成例1同樣地按照下述之重量比例裝入下述之成分,進行回流。In the same manner as in Synthesis Example 1, the following components were charged in the following weight ratios, and refluxed.

a-1 11.475 gA-1 11.475 g

b-1 2.025 g B-1 2.025 g

進行與合成例1同樣之處理,所得之共聚物(A3)之藉由GPC分析(聚苯乙烯標準)所求得之重量平均分子量為15,800。The same treatment as in Synthesis Example 1 was carried out, and the weight average molecular weight determined by GPC analysis (polystyrene standard) of the obtained copolymer (A3) was 15,800.

[合成例4]共聚物(A4)之合成[Synthesis Example 4] Synthesis of Copolymer (A4)

以與合成例1同樣地按照下述之重量比例裝入下述之成分,進行回流。In the same manner as in Synthesis Example 1, the following components were charged in the following weight ratios, and refluxed.

進行與合成例1同樣之處理,所得之共聚物(A4)之藉由GPC分析(聚苯乙烯標準)所求得之重量平均分子量為15,200。The same treatment as in Synthesis Example 1 was carried out, and the weight average molecular weight of the obtained copolymer (A4) as determined by GPC analysis (polystyrene standard) was 15,200.

[合成例5]共聚物(A5)之合成[Synthesis Example 5] Synthesis of Copolymer (A5)

以與合成例1同樣地按照下述之重量比例裝入下述之成分,進行回流。In the same manner as in Synthesis Example 1, the following components were charged in the following weight ratios, and refluxed.

進行與合成例1同樣之處理,所得之共聚物(A5)之藉由GPC分析(聚苯乙烯標準)所求得之重量平均分子量為16,200。The same treatment as in Synthesis Example 1 was carried out, and the weight average molecular weight of the obtained copolymer (A5) as determined by GPC analysis (polystyrene standard) was 16,200.

[比較合成例1]比較共聚物(B1)之合成[Comparative Synthesis Example 1] Comparison of Synthesis of Copolymer (B1)

以與合成例1同樣地按照下述之重量比例裝入下述之成分,進行回流。In the same manner as in Synthesis Example 1, the following components were charged in the following weight ratios, and refluxed.

b-1 2.025 gB-1 2.025 g

c-3 11.475 gC-3 11.475 g

d-1 2.025 gD-1 2.025 g

e-1 27.0 g。E-1 27.0 g.

進行與合成例1同樣之處理,所得之比較共聚物(B1)之藉由GPC分析(聚苯乙烯標準)所求得之重量平均分子量為13,900。The same treatment as in Synthesis Example 1 was carried out, and the weight average molecular weight determined by GPC analysis (polystyrene standard) of the comparative copolymer (B1) was 13,900.

[比較合成例2]比較共聚物(B2)之合成[Comparative Synthesis Example 2] Comparison of Synthesis of Copolymer (B2)

以與合成例1同樣地按照下述之重量比例裝入下述之成分,進行回流。In the same manner as in Synthesis Example 1, the following components were charged in the following weight ratios, and refluxed.

b-2 2.7 gB-2 2.7 g

c-3 10.8 gC-3 10.8 g

d-1 2.025 gD-1 2.025 g

e-1 27.0 g。E-1 27.0 g.

進行與合成例1同樣之處理,所得之比較共聚物(B2)之藉由GPC分析(聚苯乙烯標準)所求得之重量平均分子量為16,100。The same treatment as in Synthesis Example 1 was carried out, and the weight average molecular weight determined by GPC analysis (polystyrene standard) of the comparative copolymer (B2) was 16,100.

[實例1~實例5、比較例1~比較例4][Examples 1 to 5, Comparative Examples 1 to 4]

<表面處理膜之形成><Formation of surface treatment film>

將合成例1~合成例5以及比較合成例1及比較合成例2中所得之共聚物用丁酮稀釋至333倍,調製表面處理劑。The copolymer obtained in Synthesis Example 1 to Synthesis Example 5 and Comparative Synthesis Example 1 and Comparative Synthesis Example 2 was diluted to 333 times with methyl ethyl ketone to prepare a surface treatment agent.

將所得之表面處理劑以3000 rpm旋塗於玻璃基板上10秒,直接進行風乾,藉此於玻璃基板上形成表面處理膜。另外,作為比較例3,並未形成表面處理膜,而是使用玻璃基板本身。另外,作為比較例4,依照日本專利特開2004-6700號公報之實例1中記載的方法,於玻璃基板上形成十七氟-1,1,2,2-四氫癸基三乙氧基矽烷之表面處理膜。The obtained surface treatment agent was spin-coated on a glass substrate at 3000 rpm for 10 seconds, and air-dried directly to form a surface-treated film on the glass substrate. Further, as Comparative Example 3, the surface treatment film was not formed, but the glass substrate itself was used. Further, as Comparative Example 4, heptadecafluoro-1,1,2,2-tetrahydroindenyltriethoxy group was formed on a glass substrate in accordance with the method described in Example 1 of JP-A-2004-6700. Surface treatment film of decane.

<表面處理膜之評價方法><Evaluation method of surface treatment film>

1)接觸角測定1) Contact angle measurement

所得之表面處理膜或玻璃基板之斥墨性是藉由使用協和界面化學公司製造之DropMaster500,於25℃下測定被經常用作噴墨用油墨之構成成分的(甲基)丙烯酸系單體之甲基丙烯酸-2-羥基乙酯(HEMA)及甲基丙烯酸環己酯(CH)的接觸角而進行評價。將液滴附著1秒後之值作為接觸角。The ink repellency of the obtained surface-treated film or glass substrate was measured by using DropMaster 500 manufactured by Kyowa Interface Chemical Co., Ltd. at 25 ° C to measure a (meth)acrylic monomer which is often used as a constituent component of the ink for inkjet. The contact angle of 2-hydroxyethyl methacrylate (HEMA) and cyclohexyl methacrylate (CH) was evaluated. The value after the droplet was attached for 1 second was taken as the contact angle.

2)描繪評價2) Descriptive evaluation

使用(甲基)丙烯酸系單體之甲基丙烯酸-2-羥基乙酯(HEMA)及甲基丙烯酸環己酯(CH),藉由噴墨法於表面處理膜或基板上進行描繪,評價由於表面處理劑之種類及表面處理之有無所造成之所形成之線圖案膜的寬度的不同。Using a (meth)acrylic monomer, 2-hydroxyethyl methacrylate (HEMA) and cyclohexyl methacrylate (CH), the inkjet method was used for drawing on a surface treated film or a substrate, and the evaluation was performed. The difference in the width of the formed line pattern film caused by the type of the surface treatment agent and the presence or absence of the surface treatment.

(噴墨描繪條件)(Inkjet drawing conditions)

印刷裝置:DMP-2831(商品名:FUJIFILM Dimatix公司製造)Printing device: DMP-2831 (trade name: manufactured by FUJIFILM Dimatix Co., Ltd.)

各設定值:噴頭溫度(30℃)、壓電電壓(19 V)、驅動頻率(5 kHz)、噴頭(10 pL)Setting values: head temperature (30 ° C), piezoelectric voltage (19 V), drive frequency (5 kHz), nozzle (10 pL)

塗佈:一次性塗佈。Coating: Disposable coating.

3)鹼可溶性3) Alkali solubility

將所述<表面處理膜之形成>中製作之以表面處理劑或十七氟(heptadecanefluro)-1,1,2,2-四氫癸基三乙氧基矽烷進行了表面處理之玻璃基板,於25℃下浸漬於0.4 wt%之TMAH水溶液中60秒後,取出玻璃基板,用超純水進行沖洗,加以乾燥後,測定基板表面之25℃之純水的接觸角,藉此確認是否除去了表面處理膜。判定是如果接觸角不足50度則判定為AA,如果接觸角為50度以上則判定為BB。a glass substrate surface-treated with a surface treatment agent or heptadecanefluro-1,1,2,2-tetrahydroindenyltriethoxydecane prepared in the formation of the surface treatment film, After immersing in a 0.4 wt% TMAH aqueous solution at 25 ° C for 60 seconds, the glass substrate was taken out, rinsed with ultrapure water, dried, and then the contact angle of pure water at 25 ° C on the surface of the substrate was measured to confirm whether or not the glass substrate was removed. A surface treatment film. It is determined that AA is determined if the contact angle is less than 50 degrees, and BB is determined if the contact angle is 50 degrees or more.

將以上之評價結果示於下述表1中。The above evaluation results are shown in Table 1 below.

[表1][Table 1]

如表1所示,由包含共聚物(所述共聚物具有由含矽之特定化合物所衍生之結構單元、由具有親水性基之自由基聚合性單體所衍生之結構單元)及溶劑之表面處理劑所形成之膜(表面處理膜),可提高噴墨油墨中經常使用之HEMA或CH對於基板之接觸角,可藉由噴墨法於基板上(確切而言為所述表面處理膜上)形成微細之圖案膜。另外可知所述表面處理膜於鹼溶液中之溶解性高,且可容易地除去。而且,藉由此種本發明之表面處理劑,可簡單且迅速地形成與先前技術(日本專利特開2004-6700號公報等)同等水準之表面處理膜。As shown in Table 1, the surface comprising a copolymer having a structural unit derived from a specific compound containing ruthenium, a structural unit derived from a radical polymerizable monomer having a hydrophilic group, and a solvent The film formed by the treating agent (surface treatment film) can improve the contact angle of HEMA or CH which is often used in the inkjet ink with respect to the substrate, and can be applied to the substrate by inkjet method (specifically, the surface treatment film) ) Forming a fine patterned film. Further, it is understood that the surface treatment film has high solubility in an alkali solution and can be easily removed. Further, the surface treatment agent of the present invention can form a surface treatment film of the same level as the prior art (Japanese Patent Laid-Open No. 2004-6700, etc.) in a simple and rapid manner.

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.

Claims (9)

一種用以賦予基板斥墨性的表面處理劑,其特徵在於其包含:共聚物,其中所述共聚物具有由3-甲基丙烯醯氧基丙基三(三甲基矽烷氧基)矽烷或下述通式(3)所表示之化合物(a)所衍生之結構單元與由具有親水性基之自由基聚合性單體(b)所衍生之結構單元;以及溶劑(e): 於式(3)中,R9 為碳數為1~8之烷基,n為1~1000之整數。A surface treatment agent for imparting ink repellency to a substrate, characterized in that it comprises: a copolymer, wherein the copolymer has a 3-methacryloxypropyltris(trimethyldecyloxy)decane or a structural unit derived from the compound (a) represented by the following formula (3) and a structural unit derived from a radical polymerizable monomer (b) having a hydrophilic group; and a solvent (e): In the formula (3), R 9 is an alkyl group having 1 to 8 carbon atoms, and n is an integer of 1 to 1000. 如申請專利範圍第1項所述之表面處理劑,其中所述自由基聚合性單體(b)中之親水性基為羥基、羧基或酚性羥基。 The surface treatment agent according to claim 1, wherein the hydrophilic group in the radical polymerizable monomer (b) is a hydroxyl group, a carboxyl group or a phenolic hydroxyl group. 如申請專利範圍第1項所述之表面處理劑,其中所述共聚物更具有由除了所述自由基聚合性單體(b)以外之自由基聚合性單體(c)所衍生之結構單元。 The surface treatment agent according to claim 1, wherein the copolymer further has a structural unit derived from a radical polymerizable monomer (c) other than the radical polymerizable monomer (b) . 如申請專利範圍第1項所述之表面處理劑,其中所述自由基聚合性單體(b)為(甲基)丙烯酸或4-羥基苯基乙烯基酮。 The surface treatment agent according to claim 1, wherein the radical polymerizable monomer (b) is (meth)acrylic acid or 4-hydroxyphenylvinylketone. 如申請專利範圍第3項所述之表面處理劑,其中所述自由基聚合性單體(c)為N-苯基馬來醯亞胺、(甲基)丙烯酸二甲基胺基乙酯或(甲基)丙烯酸丁酯。 The surface treatment agent according to claim 3, wherein the radical polymerizable monomer (c) is N-phenylmaleimide, dimethylaminoethyl (meth)acrylate or Butyl (meth)acrylate. 一種賦予基板斥墨性之方法,其包括使用如申請專利範圍第1項所述之表面處理劑於基板上形成表面處理膜的步驟。 A method of imparting ink repellency to a substrate, comprising the step of forming a surface treatment film on a substrate using a surface treatment agent as described in claim 1. 一種圖案膜之形成方法,其是藉由噴墨塗佈方法,於藉由如申請專利範圍第6項所述之方法而在賦予了斥墨性的基板上形成寬度為200μm以下之圖案膜的方法。 A method of forming a pattern film by forming a pattern film having a width of 200 μm or less on a substrate to which ink repellent property is imparted by the inkjet coating method according to the method of claim 6 method. 一種電子零件,其具有藉由如申請專利範圍第7項所述之方法而形成之圖案膜。 An electronic component having a patterned film formed by the method of claim 7 of the patent application. 一種電子零件之製造方法,其特徵在於具有使用如申請專利範圍第1項所述之表面處理劑於基板上形成表面處理膜,於該表面處理膜上形成固體薄膜或圖案膜的步驟。 A method of producing an electronic component, comprising the step of forming a surface treatment film on a substrate using the surface treatment agent according to claim 1 of the patent application, and forming a solid film or a pattern film on the surface treatment film.
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