TWI481746B - Metal foil - Google Patents
Metal foil Download PDFInfo
- Publication number
- TWI481746B TWI481746B TW102107462A TW102107462A TWI481746B TW I481746 B TWI481746 B TW I481746B TW 102107462 A TW102107462 A TW 102107462A TW 102107462 A TW102107462 A TW 102107462A TW I481746 B TWI481746 B TW I481746B
- Authority
- TW
- Taiwan
- Prior art keywords
- coating layer
- foil
- alloy
- metal foil
- copper
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0692—Regulating the thickness of the coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/018—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of a noble metal or a noble metal alloy
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012083265A JP5858849B2 (ja) | 2012-03-30 | 2012-03-30 | 金属箔 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201343976A TW201343976A (zh) | 2013-11-01 |
| TWI481746B true TWI481746B (zh) | 2015-04-21 |
Family
ID=49259363
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102107462A TWI481746B (zh) | 2012-03-30 | 2013-03-04 | Metal foil |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5858849B2 (https=) |
| KR (2) | KR20140141704A (https=) |
| CN (1) | CN104271812B (https=) |
| TW (1) | TWI481746B (https=) |
| WO (1) | WO2013146088A1 (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MY183238A (en) * | 2015-03-24 | 2021-02-18 | Mitsui Mining & Smelting Co Ltd | Ultra-thin copper foil with carrier, manufacturing method therefor, copper-clad laminate, and printed wiring board |
| JP6023367B1 (ja) * | 2015-06-17 | 2016-11-09 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
| JP6683507B2 (ja) * | 2015-07-22 | 2020-04-22 | サトーホールディングス株式会社 | ラベルを用いた加工物の生産を管理する方法 |
| JP6594108B2 (ja) * | 2015-08-25 | 2019-10-23 | サトーホールディングス株式会社 | ラベル、および、当該ラベルを用いた加工物の生産を管理する方法 |
| JP6605271B2 (ja) * | 2015-09-24 | 2019-11-13 | Jx金属株式会社 | 離型層付き電解銅箔、積層体、半導体パッケージの製造方法、電子機器の製造方法及びプリント配線板の製造方法 |
| JP6204430B2 (ja) * | 2015-09-24 | 2017-09-27 | Jx金属株式会社 | 金属箔、離型層付き金属箔、積層体、プリント配線板、半導体パッケージ、電子機器及びプリント配線板の製造方法 |
| JP6945523B2 (ja) * | 2016-04-14 | 2021-10-06 | 三井金属鉱業株式会社 | 表面処理銅箔、キャリア付銅箔、並びにそれらを用いた銅張積層板及びプリント配線板の製造方法 |
| JP6782116B2 (ja) * | 2016-08-02 | 2020-11-11 | 古河電気工業株式会社 | 銀被覆材料 |
| JP7251928B2 (ja) * | 2018-06-05 | 2023-04-04 | Jx金属株式会社 | 表面処理銅箔、銅張積層板及びプリント配線板 |
| JP7251927B2 (ja) * | 2018-06-05 | 2023-04-04 | Jx金属株式会社 | 表面処理銅箔、銅張積層板及びプリント配線板 |
| KR102098475B1 (ko) | 2018-07-06 | 2020-04-07 | 주식회사 포스코 | 내식성, 도장성이 우수한 표면처리된 Zn-Ni 합금 전기도금강판의 제조방법 |
| WO2023028983A1 (zh) * | 2021-09-03 | 2023-03-09 | 宁德时代新能源科技股份有限公司 | 金属箔及制备方法、集流体、电极、电池及用电装置 |
| WO2023117127A1 (en) * | 2021-12-24 | 2023-06-29 | Circuit Foil Luxembourg | Electrolytic copper foil and secondary battery comprising the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1053818A (zh) * | 1989-09-13 | 1991-08-14 | 古尔德有限公司 | 用于印刷电路板且其性质得到控制的箔片以及生产该箔片的工艺方法和电解液 |
| TW201021639A (en) * | 2008-11-25 | 2010-06-01 | Nippon Mining Co | Copper foil for printed circuit |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR9105776A (pt) * | 1990-05-30 | 1992-08-04 | Gould Inc | Pelicula de cobre eletrodepositada e processo para produzir pelicula de cobre eletrodepositada |
| JP3313277B2 (ja) * | 1995-09-22 | 2002-08-12 | 古河サーキットフォイル株式会社 | ファインパターン用電解銅箔とその製造方法 |
| JPH1036992A (ja) * | 1996-07-19 | 1998-02-10 | Japan Energy Corp | 電解銅箔及びその製造方法 |
| JP4419161B2 (ja) * | 1999-10-27 | 2010-02-24 | Dowaホールディングス株式会社 | 電解銅箔の製造方法 |
| JP4445616B2 (ja) * | 1999-10-27 | 2010-04-07 | Dowaホールディングス株式会社 | 電解銅箔 |
| JP2004226615A (ja) * | 2003-01-22 | 2004-08-12 | Ricoh Co Ltd | 現像装置およびこれを使用する画像形成装置 |
| TW200500199A (en) * | 2003-02-12 | 2005-01-01 | Furukawa Circuit Foil | Copper foil for fine patterned printed circuits and method of production of same |
| JP4172704B2 (ja) | 2003-07-31 | 2008-10-29 | 日鉱金属株式会社 | 表面処理銅箔およびそれを使用した基板 |
| EP1895024A4 (en) * | 2005-06-23 | 2009-12-23 | Nippon Mining Co | COPPER FOIL FOR PCB |
| JP2009170771A (ja) | 2008-01-18 | 2009-07-30 | Toppan Printing Co Ltd | 太陽電池バックシート及び太陽電池モジュール |
| JP2011061151A (ja) | 2009-09-14 | 2011-03-24 | Toppan Printing Co Ltd | 太陽電池用裏面保護シートおよびその製造方法、太陽電池モジュール |
| JP5493797B2 (ja) * | 2009-12-10 | 2014-05-14 | 富士ゼロックス株式会社 | 画像形成装置および定着装置 |
| KR20120091304A (ko) * | 2009-12-24 | 2012-08-17 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | 표면 처리 동박 |
| JP2011216598A (ja) * | 2010-03-31 | 2011-10-27 | Kuraray Co Ltd | 高周波回路基板 |
| JP5885054B2 (ja) * | 2010-04-06 | 2016-03-15 | 福田金属箔粉工業株式会社 | 銅張積層板用処理銅箔及び該処理銅箔を絶縁性樹脂基材に接着してなる銅張積層板並びに該銅張積層板を用いたプリント配線板。 |
| JP5634103B2 (ja) | 2010-04-06 | 2014-12-03 | 福田金属箔粉工業株式会社 | 銅張積層板用処理銅箔及び該処理銅箔を絶縁性樹脂基材に接着してなる銅張積層板並びに該銅張積層板を用いたプリント配線板。 |
| JP5128695B2 (ja) * | 2010-06-28 | 2013-01-23 | 古河電気工業株式会社 | 電解銅箔、リチウムイオン二次電池用電解銅箔、該電解銅箔を用いたリチウムイオン二次電池用電極、該電極を使用したリチウムイオン二次電池 |
-
2012
- 2012-03-30 JP JP2012083265A patent/JP5858849B2/ja active Active
-
2013
- 2013-02-28 KR KR1020147030582A patent/KR20140141704A/ko not_active Ceased
- 2013-02-28 CN CN201380018605.7A patent/CN104271812B/zh active Active
- 2013-02-28 KR KR1020167032633A patent/KR102095619B1/ko active Active
- 2013-02-28 WO PCT/JP2013/055572 patent/WO2013146088A1/ja not_active Ceased
- 2013-03-04 TW TW102107462A patent/TWI481746B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1053818A (zh) * | 1989-09-13 | 1991-08-14 | 古尔德有限公司 | 用于印刷电路板且其性质得到控制的箔片以及生产该箔片的工艺方法和电解液 |
| TW201021639A (en) * | 2008-11-25 | 2010-06-01 | Nippon Mining Co | Copper foil for printed circuit |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013213250A (ja) | 2013-10-17 |
| JP5858849B2 (ja) | 2016-02-10 |
| KR102095619B1 (ko) | 2020-03-31 |
| CN104271812A (zh) | 2015-01-07 |
| CN104271812B (zh) | 2016-10-05 |
| WO2013146088A1 (ja) | 2013-10-03 |
| TW201343976A (zh) | 2013-11-01 |
| KR20140141704A (ko) | 2014-12-10 |
| KR20160137678A (ko) | 2016-11-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI481746B (zh) | Metal foil | |
| CN103857833B (zh) | 与树脂粘着性优良的铜箔、其制造方法以及使用该电解铜箔的印刷布线板或电池用负极材料 | |
| CN102168289B (zh) | 电解铜箔及其制造方法 | |
| CN100571483C (zh) | 带载体的极薄铜箔以及使用带载体的极薄铜箔的电路板 | |
| KR102802888B1 (ko) | 표면 처리 구리박, 캐리어 구비 구리박, 동장 적층판 및 프린트 배선판 | |
| CN107429417B (zh) | 粗糙化处理铜箔、带载体铜箔、覆铜层叠板及印刷电路板 | |
| JPWO2012046804A1 (ja) | 銅箔及びその製造方法、キャリア付き銅箔及びその製造方法、プリント配線板、多層プリント配線板 | |
| KR101822251B1 (ko) | 구리박, 캐리어 부착 구리박, 구리 피복 적층체, 프린트 배선판, 반도체 패키지용 회로 형성 기판, 반도체 패키지, 전자 기기, 수지 기재, 회로의 형성 방법, 세미 애디티브 공법, 프린트 배선판의 제조 방법 | |
| WO2017179416A1 (ja) | 表面処理銅箔、キャリア付銅箔、並びにそれらを用いた銅張積層板及びプリント配線板の製造方法 | |
| TWI530234B (zh) | Printed wiring board with copper foil and the use of its laminated body, printed wiring board and electronic components | |
| CN101827495B (zh) | 复合金属箔及其制造方法以及印刷布线板 | |
| JP2013213250A5 (https=) | ||
| CN115261942A (zh) | 一种pcb用电解铜箔表面处理方法 | |
| KR101695236B1 (ko) | 동박, 이를 포함하는 전기부품 및 전지 | |
| CN111771015A (zh) | 电解铜箔以及使用该电解铜箔的锂离子二次电池用负极、锂离子二次电池、覆铜层叠板和印刷布线板 | |
| CN114929944B (zh) | 表面处理铜箔及其制造方法 | |
| JP2009214308A (ja) | キャリア付き銅箔 | |
| CN103857178A (zh) | 具有黑色极薄铜箔的铜箔结构及其制造方法 | |
| CN102548202B (zh) | 经粗化处理的铜箔及其制造方法 | |
| CN100572608C (zh) | 铜箔的粗面化处理方法以及粗面化处理液 | |
| JPWO2013118416A1 (ja) | キャリア付銅箔、キャリア付銅箔の製造方法、プリント配線板、プリント回路板及び銅張積層板 | |
| JP2011216478A (ja) | 二次電池集電体用穴あき粗化処理銅箔、その製造方法及びリチウムイオン二次電池負極電極 | |
| CN116356317A (zh) | 一种带载体的金属箔及其制造方法 | |
| JP4330979B2 (ja) | 表面処理電解銅箔 | |
| HK1194111B (zh) | 与树脂粘着性优良的铜箔、其制造方法以及使用该电解铜箔的印刷布线板或电池用负极材料 |